KR920010097B1 - Transparent inorganic conductive coating composition - Google Patents
Transparent inorganic conductive coating composition Download PDFInfo
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- KR920010097B1 KR920010097B1 KR1019890013822A KR890013822A KR920010097B1 KR 920010097 B1 KR920010097 B1 KR 920010097B1 KR 1019890013822 A KR1019890013822 A KR 1019890013822A KR 890013822 A KR890013822 A KR 890013822A KR 920010097 B1 KR920010097 B1 KR 920010097B1
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- coating composition
- compound
- conductive coating
- inorganic conductive
- transparent inorganic
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- 239000008199 coating composition Substances 0.000 title claims description 10
- 239000000203 mixture Substances 0.000 claims description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 7
- 150000002472 indium compounds Chemical class 0.000 claims description 5
- 150000003606 tin compounds Chemical class 0.000 claims description 4
- 150000003138 primary alcohols Chemical class 0.000 claims description 3
- 150000003755 zirconium compounds Chemical class 0.000 claims description 3
- 150000003509 tertiary alcohols Chemical class 0.000 claims description 2
- OAYXXLSXZOKTDM-UHFFFAOYSA-N tin(4+);hydrate Chemical compound O.[Sn+4] OAYXXLSXZOKTDM-UHFFFAOYSA-N 0.000 claims description 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 claims 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 claims 2
- 125000003158 alcohol group Chemical group 0.000 claims 1
- KYCHGXYBBUEKJK-UHFFFAOYSA-K indium(3+);trichloride;hydrate Chemical compound O.Cl[In](Cl)Cl KYCHGXYBBUEKJK-UHFFFAOYSA-K 0.000 claims 1
- 150000002736 metal compounds Chemical class 0.000 claims 1
- 239000011259 mixed solution Substances 0.000 claims 1
- 150000003333 secondary alcohols Chemical class 0.000 claims 1
- 150000003623 transition metal compounds Chemical class 0.000 claims 1
- 239000012780 transparent material Substances 0.000 claims 1
- 238000000034 method Methods 0.000 description 9
- 230000000694 effects Effects 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000002270 dispersing agent Substances 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 230000005611 electricity Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000003381 stabilizer Substances 0.000 description 3
- 230000003068 static effect Effects 0.000 description 3
- XURCIPRUUASYLR-UHFFFAOYSA-N Omeprazole sulfide Chemical compound N=1C2=CC(OC)=CC=C2NC=1SCC1=NC=C(C)C(OC)=C1C XURCIPRUUASYLR-UHFFFAOYSA-N 0.000 description 2
- ZICYSHJXIHXTOG-UHFFFAOYSA-N chloro hypochlorite zirconium hydrate Chemical compound O.[Zr].ClOCl ZICYSHJXIHXTOG-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000006703 hydration reaction Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- -1 silicate compound Chemical class 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- GFGLXZFJKQWOAR-UHFFFAOYSA-J O.[Cl-].[Cl-].[Cl-].[Cl-].[Zr+4] Chemical compound O.[Cl-].[Cl-].[Cl-].[Cl-].[Zr+4] GFGLXZFJKQWOAR-UHFFFAOYSA-J 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000003966 growth inhibitor Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- DTYLIDIBRGIDOC-UHFFFAOYSA-N indium(3+);hydrate Chemical compound O.[In+3] DTYLIDIBRGIDOC-UHFFFAOYSA-N 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- KKHJTSPUUIRIOP-UHFFFAOYSA-J tetrachlorostannane;hydrate Chemical compound O.Cl[Sn](Cl)(Cl)Cl KKHJTSPUUIRIOP-UHFFFAOYSA-J 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
- H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/63—Additives non-macromolecular organic
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Dispersion Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Paints Or Removers (AREA)
Abstract
내용 없음.No content.
Description
본 발명은 투명한 무기 도전성 코팅 조성물에 관한 것이며, 특히 초미립 금속입자 및 안정제, 분산제를 사용하지 않는 투명 무기 도전성 코팅 조성물에 관한 것이다. 규소를 주원료로 하는 음극선관 및 그외 디스플레이장치는 표면에 발생하는 정전기로 인하여 인체에 악영향을 주며 먼지등이 부착되어 해상도를 저하시키게 되므로, 정전기를 제거 또는 감소시키기 위해 투명한 도전성 코팅막을 음극선관 및 디스플레이장치에 형성시켜 발생되는 정전기를 분산시키는 방식이 있는 바 도전성 조성물의 제조방법은 통상 은분등의 초미립 금속을 실리카용액에 분산시키는 방법을 채용하고 있다.The present invention relates to a transparent inorganic conductive coating composition, and more particularly, to a transparent inorganic conductive coating composition without using ultrafine metal particles, stabilizers and dispersants. Cathode ray tubes and other display devices, which are mainly made of silicon, adversely affect the human body due to static electricity generated on the surface and deteriorate the resolution by attaching dust or the like. Therefore, a transparent conductive coating film is used to remove or reduce static electricity. Since there is a method of dispersing static electricity generated by forming in the apparatus, the method for producing a conductive composition usually employs a method of dispersing ultrafine metal such as silver powder in a silica solution.
일본 공개특허공보 소화 54-110265호는 수요성규산염 화합물과 수용성 실리콘 화합불에 도전성 분말을 혼합하는 방식을 채용하고 있으며, 일본 공개특허공보 소화 63-277286호에서는 금속 알콕시드중에 금속분말을 분산시키는 방식을 취하고 있다. 또한 일본 공개특허공보 소화 63-195686호에서는 지르코늄의 옥시산염과 비침강성 실리카와 콜로이드입자를 물과 성장방지제 및 희석제에 균일하게 분산시키는 방식을 사용하고 있다.Japanese Patent Laid-Open No. 54-110265 employs a method in which conductive powder is mixed with a soluble silicate compound and a water-soluble silicone compound. Japanese Laid-Open Patent No. 63-277286 uses a method for dispersing a metal powder in a metal alkoxide. The way it is. In addition, Japanese Patent Laid-Open No. 63-195686 uses a method of uniformly dispersing zirconium oxate, non-precipitated silica, and colloidal particles in water, growth inhibitors, and diluents.
이러한 기존의 조성물의 제조는 금속분말 또는 산화물 입자를 직접 분산시키기 되어 안정제, 분산제등을 사용하여야 하므로 공정이 복잡해지고 따라서 장치 및 원료의 종류가 많아지는 단점이 있으며, 분산효과도 충분하지 않았다.In the production of such existing compositions, since the metal powder or oxide particles are directly dispersed, a stabilizer, a dispersant, or the like must be used, the process is complicated, and thus, a device and a variety of raw materials are disadvantageous, and the dispersion effect is not sufficient.
이러한 단점을 해결하기 위하여 안출해낸 본 발명의 요지는 다음과 같다. 옥시 염화 지르코늄 수화물(ZrOcl2·8H2O)등의 지르코늄 화합물에 알콜에 용해시킨 후 질산인듐(Ⅲ) 수화물(In(No3)3·xH2O) 또는 염화주석(Ⅳ) 수화물(Scnl4·xH2O)등의 인듐화합물 또는 주석화합물을 마찬가지로 알콜에 용해시켜 테트라에틸올소실리케이트(tetraethyl Orthosilicate, TEOS)와 각각 0.01~5% : 0.5~6% : 1.5~10%(부피비의 비율로 혼합한 후 수화반응을 일으켜 도전성 조성물을 만든다.The gist of the present invention devised to solve these disadvantages is as follows. Zirconium oxychloride hydrate (ZrOcl 2 · 8H 2 O) was dissolved in the alcohol to a zirconium compound such as indium nitrate (Ⅲ) hydrate (In (No 3) 3 · xH 2 O) or a tin (Ⅳ) hydrate chloride (Scnl 4 Indium or tin compounds such as xH 2 O) are dissolved in alcohol as well and mixed with tetraethyl orthosilicate (TEOS) in 0.01 ~ 5%: 0.5 ~ 6%: 1.5 ~ 10% (volume ratio) Then, a hydration reaction is performed to form a conductive composition.
이하 본 명세서에 사용되는 비율 %는 모두 부피비이다.The percentages used herein are all volume ratios.
본 발명은 기존 기술의 가진 분산 방식상의 문제를 해결하여 공정을 단순화하고 투명성과 도전성이 향상된 투명도전성 코팅조성물을 제공하는 것을 목적으로 한다.An object of the present invention is to provide a transparent conductive coating composition which simplifies the process and improves transparency and conductivity by solving the problem of the dispersion method with the existing technology.
본 발명을 실시예를 들어 상세히 설명하면 다음과 같다. 실리콘알콕시드에 알콜 및 물을 혼합하여 수화반응과 동시에 중축 반응을 일으켜 일종의 무기물 용액을 생성시킨다. 이러한 무기물 용액에 도전성 무기 코팅 조성물을 제조하는 것이다.Hereinafter, the present invention will be described in detail with reference to Examples. Alcohol and water are mixed with silicon alkoxide to cause a polycondensation reaction simultaneously with a hydration reaction to produce a kind of inorganic solution. It is to prepare a conductive inorganic coating composition in such an inorganic solution.
이러한 조성물을 얻기 위하여 본 발명은 테트라 에틸올소실리케이트(TEOS)를 약 1.5~10%를 정량한후 1차 알콜 20~50%, 2찰 알콜 0.1~8%, 3차 알콜 10~55%, 4차 알콜 15~25% 비율로 정량하여 상기 알콜 용액중에 지르코늄화합물 0.01~5%, 인듐화합물 또는 주석화합물 0.5~6%를 가한 후 혼합한다. 상기 혼합물용액에 물 5~17%를 가하여 혼합 후 상온에서 5시간 내지 30일간 동안 숙성시키면 투명 무기 도전성 코팅 조성물이 된다.In order to obtain such a composition, the present invention quantifies about 1.5 to 10% of tetraethylolsosilicate (TEOS), and then, 20 to 50% primary alcohol, 0.1 to 8% double alcohol, 10 to 55% tertiary alcohol, 4 Quantify the content of the primary alcohol at 15-25%, add 0.01-5% zirconium compound, 0.5-6% indium compound or tin compound to the alcohol solution, and mix. 5 to 17% of water is added to the mixture solution, followed by mixing at room temperature for 5 hours to 30 days to form a transparent inorganic conductive coating composition.
[실시예 1]Example 1
메탄올 100ml, 이소프로판올 60ml, 부탄올 55ml 및 t-부탄올 50ml와 테트라 에틸올소실리케이트 20ml를 혼합한 용액에 옥시 염화지르코늄 수화물 [ZrOcl2·8H2O] 0.5g과 질산인듐(Ⅲ) 수화물[In(NO3·xH2O] 10g을 가하여 혼합한 후 물 45ml를 가하여 상온에서 15일간 숙성시킨다. 이렇게 하여 생성된 본 실시예의 조성물은 기존에 비해 표면 조항이 크게 낮아져 대전방지효과가 향상되었다. (표 1참조)0.5 g of zirconium chloride hydrate [ZrOcl 2 · 8H 2 O] and indium (III) hydrate [In (NO 3) 10 g of xH 2 O] are mixed, and 45 ml of water is added thereto, followed by aging at room temperature for 15 days.The resulting composition of the present embodiment has significantly lowered the surface provisions compared with the existing ones, thereby improving the antistatic effect (see Table 1). )
[실시예 2]Example 2
테트라 에틸올소실리케이트 20ml, 메탄올 100ml 이소프로판올 60ml, 부탄올 55ml, t-부탄올 10ml을 혼합한 용액에 옥시염화 지르코늄 수화물 [ZrOcl2·8H2O] 0.5g과 염화주석(Ⅳ) 수화물[In(NO3·xH2O] 12g 가하여 혼합한 후 물 25ml를 가하여 상온에서 15일간 숙성시킨다.0.5 g of zirconium oxychloride hydrate [ZrOcl 2 · 8H 2 O] and tin (IV) hydrate [In (NO 3 ·) xH 2 O] 12g were mixed and 25ml of water were added and aged at room temperature for 15 days.
상기 각 실시예의 조성물을 음극선관의 전며에 코팅막을 형성시킨 후 표면저항을 측정하여 기존 상품과 비고하였다. 표면 저항의 특성은 측정기에 500V를 인가하여 측정한 수치이다.The composition of each example was formed on the top of the cathode ray tube and the surface resistance was measured and compared with the existing product. The surface resistance is measured by applying 500V to the measuring instrument.
[표 1]TABLE 1
상기 표에 도시된 바와 같이 기존제품에 비해 표면저항이 낮아져 대전방지효과가 향상 되었음을 알수 있다.As shown in the table, it can be seen that the surface resistance is lowered compared to the existing products, thereby improving the antistatic effect.
본 발명의 조성물을 사용하면 안정제, 분산제등의 참가제를 필요로 하지 않으므로 기존의 복잡한 공정을 단순화시킬 수 있음은 물론 생산원가를 낮출수 있으며, 기존의 입자 분산의 조성물에 비해 투명성이 양호하고 대전방지 또는 분산효과가 뛰어난 코팅막을 얻을 수 있는 효과가 있다.The composition of the present invention does not require a stabilizer, a dispersant, or the like, so that the existing complex process can be simplified, and the production cost can be reduced. There is an effect to obtain a coating film excellent in the prevention or dispersion effect.
Claims (4)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019890013822A KR920010097B1 (en) | 1989-09-26 | 1989-09-26 | Transparent inorganic conductive coating composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019890013822A KR920010097B1 (en) | 1989-09-26 | 1989-09-26 | Transparent inorganic conductive coating composition |
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| Publication Number | Publication Date |
|---|---|
| KR910006433A KR910006433A (en) | 1991-04-29 |
| KR920010097B1 true KR920010097B1 (en) | 1992-11-14 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019890013822A Expired KR920010097B1 (en) | 1989-09-26 | 1989-09-26 | Transparent inorganic conductive coating composition |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100472496B1 (en) * | 1997-07-23 | 2005-05-16 | 삼성에스디아이 주식회사 | Transparent conductive composition, transparent conductive layer formed therefrom and manufacturing method of the transparent conductive layer |
-
1989
- 1989-09-26 KR KR1019890013822A patent/KR920010097B1/en not_active Expired
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| Publication number | Publication date |
|---|---|
| KR910006433A (en) | 1991-04-29 |
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