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KR970010866A - 에폭시-함유 수계 광영상화 조성물 - Google Patents

에폭시-함유 수계 광영상화 조성물 Download PDF

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Publication number
KR970010866A
KR970010866A KR1019960030552A KR19960030552A KR970010866A KR 970010866 A KR970010866 A KR 970010866A KR 1019960030552 A KR1019960030552 A KR 1019960030552A KR 19960030552 A KR19960030552 A KR 19960030552A KR 970010866 A KR970010866 A KR 970010866A
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KR
South Korea
Prior art keywords
weight
epoxy
weight percent
water
molecular weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
KR1019960030552A
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English (en)
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KR100211200B1 (ko
Inventor
엘레나 허낸디즈 마리아
리엔 샤운
신 맥드빅 패트릭
Original Assignee
제럴드 케이. 화이트
모르톤 인터내쇼날, 인코오포레이티드
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Application filed by 제럴드 케이. 화이트, 모르톤 인터내쇼날, 인코오포레이티드 filed Critical 제럴드 케이. 화이트
Publication of KR970010866A publication Critical patent/KR970010866A/ko
Application granted granted Critical
Publication of KR100211200B1 publication Critical patent/KR100211200B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/285—Permanent coating compositions
    • H05K3/287—Photosensitive compositions
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Epoxy Resins (AREA)

Abstract

본 발명은 알칼리성 수용액중에 현상 가능하며, 솔더 마스크로서 적합한 경질의 영구층을 형성하는 경화가능한 하기 (A) 내지 (F) 성분을 포함하는 수계 광영상화 조성물에 관한 것이다; A) 내지 F)의 총중량을 기준으로, A) 약 125 내지 약 200의 산가, 약 20,000 내지 약 80,000의 평균 분자량을 갖는 라텍스 아크릴 결합제 중합체 약 25 내지 약 40중량%; B) 약 100 내지 약 700의 에폭시 당량을 갖는 수계 에폭시 수지 약 13 내지 약 30중량%; C) 광중합가능하며, 다작용성이고, 약 500 내지 약 2000의 분자량을 갖는 α,β-에틸렌계 불포화 단량체 및/또는 단쇄 올리고머 약 20 내지 약 25중량%; D) 자유-라디칼 발생 화학 시스템 약 4 내지 약 20중량%; E) 에폭시 경화제 및/또는 경화 촉매 약 0.5 내지 약 10중량%; 및 F) 계면 활성제(들) 약 3 내지 약 12중량%.

Description

에폭시-함유 수계 광영상화 조성물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (1)

  1. 하기 (A) 내지 (F) 성분을 포함하는 광영상화 조성물로서, 이 조성물은 수성매체중에 포함되며, 기판으로서 한 층에 도포되는 경우 알칼리성 수용액중에 현상가능하며, 현상 후 경질로 영구적으로 경화되는 광영상화 조성물(하기 중량%는 (A) 내지 (F)의 총중량을 기준으로 함); A) 약 125 내지 약 200의 산가, 약 20,000 내지 약 80,000의 수평균 분자량을 갖는 라텍스 아크릴 결합제 중합체 약 25 내지 약 40중량%; B) 약 100 내지 약 700의 에폭시 당량을 갖는 수계 에폭시 수지 약 13 내지 약 30중량%; C) 광중합가능하며, 다작용성이고, 약 500 내지 약 2000의 분자량을 갖는 α,β-에틸렌계 불포화 단량체 및/또는 단쇄 올리고머 약 20 내지 약 25중량%; D) 자유-라디칼 발생 화학 시스템 약 4 내지 약 20중량%; E) 에폭시 경화제 및/또는 경화 촉매 약 0.5 내지 약 10중량%; 및 F) 계면 활성제(들) 약 3 내지 약 12중량%.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019960030552A 1995-08-01 1996-07-26 에폭시-함유 수계 광영상화 조성물 Expired - Fee Related KR100211200B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/509,887 US5925499A (en) 1995-08-01 1995-08-01 Epoxy-containing waterborne photoimageable composition
US8/509,887 1995-08-01
US08/509,887 1995-08-01

Publications (2)

Publication Number Publication Date
KR970010866A true KR970010866A (ko) 1997-03-27
KR100211200B1 KR100211200B1 (ko) 1999-07-15

Family

ID=24028506

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960030552A Expired - Fee Related KR100211200B1 (ko) 1995-08-01 1996-07-26 에폭시-함유 수계 광영상화 조성물

Country Status (9)

Country Link
US (1) US5925499A (ko)
EP (1) EP0762209A1 (ko)
JP (1) JP2966350B2 (ko)
KR (1) KR100211200B1 (ko)
CN (1) CN1145480A (ko)
CA (1) CA2182463A1 (ko)
IL (1) IL118896A0 (ko)
SG (1) SG55221A1 (ko)
TW (1) TW350931B (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102247821B1 (ko) * 2021-03-18 2021-05-06 (주)와이앤피홀딩스 기능성 석탄첨가제 및 석탄첨가제 제조방법
WO2025178145A1 (ko) * 2024-02-20 2025-08-28 주식회사 에너지파워 기능성 석탄첨가제 및 석탄첨가제 제조방법

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WO2000002091A1 (fr) * 1998-07-07 2000-01-13 Kansai Paint Co., Ltd. Composition de resist de soudage a base d'eau
DE69906195T2 (de) * 1998-07-31 2003-10-09 Dai Nippon Printing Co., Ltd. Fotoempfindliche Harzzusammensetzung und Farbfilter
JP2001222103A (ja) * 1999-08-05 2001-08-17 Nippon Paint Co Ltd 水性フォトソルダーレジスト組成物
US6784024B2 (en) * 2000-01-18 2004-08-31 Micron Technology, Inc. Die attach curing method for semiconductor device
DE10119127A1 (de) * 2001-04-19 2002-10-24 Cognis Deutschland Gmbh Wäßrige Beschichtungszusammensetzungen auf Basis von Epoxidharzen
JP4175079B2 (ja) * 2002-10-17 2008-11-05 日立化成工業株式会社 感光性樹脂組成物およびこれを用いた感光性エレメント
PL2078063T3 (pl) * 2006-10-24 2010-09-30 Whitford B V Kompozycja powłoki nieprzywierającej

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US3929743A (en) * 1972-10-10 1975-12-30 Johnson & Son Inc S C Polyampholytes
US4092443A (en) * 1976-02-19 1978-05-30 Ciba-Geigy Corporation Method for making reinforced composites
JPS568146A (en) * 1979-07-03 1981-01-27 Kansai Paint Co Ltd Manufacture of screen plate material
US5364736A (en) * 1987-12-07 1994-11-15 Morton International, Inc. Photoimageable compositions
JP2694037B2 (ja) * 1987-12-07 1997-12-24 モートン サイオコール，インコーポレイティド 光画像形成組成物，ドライフィルムの調製方法及び光画像形成要素
US5045435A (en) * 1988-11-25 1991-09-03 Armstrong World Industries, Inc. Water-borne, alkali-developable, photoresist coating compositions and their preparation
US5229252A (en) * 1989-06-09 1993-07-20 Morton International, Inc. Photoimageable compositions
DE3931467A1 (de) * 1989-09-21 1991-04-04 Hoechst Ag Durch strahlung polymerisierbares gemisch und verfahren zur herstellung einer loetstopmaske
DE59108989D1 (de) * 1990-12-18 1998-06-25 Ciba Geigy Ag Strahlungsempfindliche Zusammensetzung auf Basis von Wasser als Lösungs- bzw. Dispersionsmittel
DE4234072A1 (de) * 1992-10-09 1994-04-14 Morton Int Inc Durch Strahlung polymerisierbares Gemisch und Verfahren zur Herstellung einer Lötstoppmaske
US5439779A (en) * 1993-02-22 1995-08-08 International Business Machines Corporation Aqueous soldermask
DE69502741T2 (de) * 1994-01-10 1998-10-01 Du Pont Lichtempfindliche wässrige Emulsion, lichtempfindlicher Film und Verfahren zur Herstellung
US5364737A (en) * 1994-01-25 1994-11-15 Morton International, Inc. Waterbone photoresists having associate thickeners
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TW353158B (en) * 1994-03-09 1999-02-21 Nat Starch Chem Invest Aqueous photoresist composition, method for preparing the same and circuit board comprising thereof
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102247821B1 (ko) * 2021-03-18 2021-05-06 (주)와이앤피홀딩스 기능성 석탄첨가제 및 석탄첨가제 제조방법
WO2025178145A1 (ko) * 2024-02-20 2025-08-28 주식회사 에너지파워 기능성 석탄첨가제 및 석탄첨가제 제조방법

Also Published As

Publication number Publication date
US5925499A (en) 1999-07-20
CN1145480A (zh) 1997-03-19
IL118896A0 (en) 1996-10-31
EP0762209A1 (en) 1997-03-12
TW350931B (en) 1999-01-21
KR100211200B1 (ko) 1999-07-15
JPH09120161A (ja) 1997-05-06
CA2182463A1 (en) 1997-02-02
JP2966350B2 (ja) 1999-10-25
SG55221A1 (en) 1998-12-21

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