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SG11201901065TA - Imprint material - Google Patents

Imprint material

Info

Publication number
SG11201901065TA
SG11201901065TA SG11201901065TA SG11201901065TA SG11201901065TA SG 11201901065T A SG11201901065T A SG 11201901065TA SG 11201901065T A SG11201901065T A SG 11201901065TA SG 11201901065T A SG11201901065T A SG 11201901065TA SG 11201901065T A SG11201901065T A SG 11201901065TA
Authority
SG
Singapore
Prior art keywords
imprint material
component
group
compound
independently
Prior art date
Application number
SG11201901065TA
Inventor
Junpei Kobayashi
Danielantonio Sahade
Takehiro Nagasawa
Keisuke Shuto
Taku Kato
Masayoshi Suzuki
Original Assignee
Nissan Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Chemical Corp filed Critical Nissan Chemical Corp
Publication of SG11201901065TA publication Critical patent/SG11201901065TA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C08F220/303—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and one or more carboxylic moieties in the chain
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7042—Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/20—Esters of polyhydric alcohols or phenols, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Polymerisation Methods In General (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

IMPRINT MATERIAL There is provided a novel imprint material. An imprint material comprising the following components (A), (B), and (C): 5 Component (A): a compound of the following formula (1): 04 0 R * *** X L *0 (1) (wherein two Rs are each independently a hydrogen atom or a methyl group), Component (B): a compound having a linear alkylene group having a carbon atom number of 6 to 10 and/or an alicyclic structure selected from the group consisting of a 10 cyclopentane structure, a cyclohexane structure, a norbornane structure, an isobornyl structure, and an adamantane structure, and at least one polymerizable group, and Component (C): a photopolymerization initiator.
SG11201901065TA 2016-08-10 2017-08-07 Imprint material SG11201901065TA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016157321 2016-08-10
PCT/JP2017/028619 WO2018030351A1 (en) 2016-08-10 2017-08-07 Imprint material

Publications (1)

Publication Number Publication Date
SG11201901065TA true SG11201901065TA (en) 2019-03-28

Family

ID=61162334

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201901065TA SG11201901065TA (en) 2016-08-10 2017-08-07 Imprint material

Country Status (6)

Country Link
JP (1) JP6802532B2 (en)
KR (1) KR102401727B1 (en)
CN (1) CN109563194B (en)
SG (1) SG11201901065TA (en)
TW (1) TWI729185B (en)
WO (1) WO2018030351A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2018155013A1 (en) * 2017-02-22 2019-12-12 日産化学株式会社 Photo-curable composition for imprint
WO2022075162A1 (en) 2020-10-08 2022-04-14 Dic株式会社 Active energy ray curable composition, cured product, lens, and camera module

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2537644B2 (en) * 1987-11-05 1996-09-25 日本化薬株式会社 Overcoat composition for optical disk
US5772905A (en) 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
JP3918991B2 (en) * 2002-01-16 2007-05-23 日本化薬株式会社 Polymerizable compound, resin composition containing the same, and cured product thereof
JP2003206323A (en) * 2002-01-16 2003-07-22 Nippon Kayaku Co Ltd Resin composition for light guide and its cured product
JP4655840B2 (en) * 2004-10-07 2011-03-23 Ｊｓｒ株式会社 Radiation-sensitive resin composition for microlens formation, microlens and method for forming the same, and liquid crystal display element
JP2008202022A (en) 2007-01-23 2008-09-04 Fujifilm Corp Curable composition for optical nanoimprint lithography and pattern forming method using the same
KR20080105414A (en) 2007-05-31 2008-12-04 (주)티에이치엔 Cutting / peeling edge
WO2009001629A1 (en) * 2007-06-26 2008-12-31 Konica Minolta Opto, Inc. Clear hard coat film, and antireflection film, polarizing plates and displays, made by using the same
EP2436704A4 (en) * 2009-05-29 2012-12-05 Nissan Chemical Ind Ltd Highly branched fluorinated polymer and resin composition containing same
WO2011132616A1 (en) * 2010-04-19 2011-10-27 日産化学工業株式会社 Highly abrasion-resistant imprint material
KR101615795B1 (en) * 2010-07-02 2016-04-26 가부시끼가이샤 도꾸야마 Photocurable composition for imprint and method for formation of pattern using the composition
JP2012130863A (en) * 2010-12-22 2012-07-12 Kansai Paint Co Ltd Multilayer coating film forming method and coated article
JP6061073B2 (en) * 2012-09-27 2017-01-18 日産化学工業株式会社 Imprint material
WO2014171302A1 (en) * 2013-04-18 2014-10-23 日産化学工業株式会社 Imprint material
KR102440445B1 (en) * 2013-08-02 2022-09-06 쇼와덴코머티리얼즈가부시끼가이샤 photosensitive resin composition
US9920227B2 (en) * 2014-01-29 2018-03-20 Hitachi Chemical Company, Ltd. Resin composition, method for manufacturing semiconductor device using resin composition, and solid-state imaging element
JP6477504B2 (en) * 2014-01-29 2019-03-06 日立化成株式会社 Adhesive composition, method for manufacturing semiconductor device using adhesive composition, and solid-state imaging device
JP6234864B2 (en) * 2014-03-28 2017-11-22 富士フイルム株式会社 Photosensitive resin composition, laminate, semiconductor device manufacturing method, semiconductor device
TWI514073B (en) * 2014-06-11 2015-12-21 Chi Mei Corp Photosensitive resin composition and its application
JP2016035042A (en) * 2014-07-31 2016-03-17 太陽インキ製造株式会社 Curable resin composition, dry film, cured product, and printed wiring board
JP6704701B2 (en) * 2014-12-15 2020-06-03 キヤノン株式会社 Adhesion layer forming composition, adhesion layer production method, cured product pattern production method, optical component production method, circuit board production method, imprint mold production method, and device component

Also Published As

Publication number Publication date
CN109563194B (en) 2021-06-22
TW201825534A (en) 2018-07-16
TWI729185B (en) 2021-06-01
KR102401727B1 (en) 2022-05-25
CN109563194A (en) 2019-04-02
KR20190039082A (en) 2019-04-10
JPWO2018030351A1 (en) 2019-06-13
WO2018030351A1 (en) 2018-02-15
JP6802532B2 (en) 2020-12-16

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