TW201235213A - Barrier laminate and method for producing barrier laminate - Google Patents
Barrier laminate and method for producing barrier laminate Download PDFInfo
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- TW201235213A TW201235213A TW101106050A TW101106050A TW201235213A TW 201235213 A TW201235213 A TW 201235213A TW 101106050 A TW101106050 A TW 101106050A TW 101106050 A TW101106050 A TW 101106050A TW 201235213 A TW201235213 A TW 201235213A
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- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/02—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
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- Wood Science & Technology (AREA)
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- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
Description
201235213 六、發明說明: 【發明所屬之技術領域】 障膜本於—種阻障性積層體及使用其的氣體阻 IV膜’且疋有關於-種該阻障性積層體的製造方法。 【先前技術】 先前已研究了各種氣體阻障膜(日本專利特開2⑼2_ 205354 號、2010-30290 號、2010_105321 號、平 1〇 278167 號、2006-193596 號、2007_76282 號公報)。已知於 機層時’若使官能基數多的單體光硬化而形成有機層 阻障性能提高。此種單體較佳是藉由塗布而形成層 【發明内容】 ;、、'、而^知,若將官能基數多的單體塗布形成層狀並硬 化之,則高溫處科會產生有機層的發料缺陷,對鄰接 的無機層造成損傷,而夾在2層無機層間的有機層尤其合 對鄰接的無機層造成大損傷本發明是為了解決該問題: 目的在提供一種即便藉塗布將有機層形成層狀,亦不易產 生有機層的發跑等缺陷的阻障性積層體以及其製造方法。 本發明者研究上述狀況後發現,如塗布並硬化含有特 定黏度以上之聚合性單體的聚合性組成物來形成有機層] 可使咼溫處理時有機層的缺陷發生率明顯下降該效果在塗 布並硬化烷氧基矽烷基單體組成物而形成有機層時則更明 顯。進而得知,如使光硬化的光照射量為特定量以下,則 可特別明顯地抑制有機層的發泡等缺陷。 、 具體而§是發現,上述課題可藉由以下手段來解決。 201235213 (1) 一種阻障性積層體,具有無機層 '有機層及無機層 依序鄰接的構造’此有機層是將含有以IU體成分計50 wt% 以上之(甲基)丙烯酸酯以及含(甲基)丙烯醯氧基之矽烷偶 合劑的聚合性組成物塗布為層狀並硬化之而成,上述(甲基) 丙烯酸酯為於25。〇-大氣壓下硬化前的黏度為4〇〇mPa s 以上的液體或固體,且(甲基)丙烯酸當量為26〇以下。 (2) 如(1)所述的阻障性積層體,其中(甲基)丙烯酸酯的 (甲基)丙稀酿氧基之數量為3〜5。 (3) 如(1)或(2)所述的阻障性積層體,其中(甲基)丙烯酸 S旨為於25C、-大氣壓下硬化前黏度為麵⑺―以上的 液體或固體。 (4) 如(1)或(2)所述的阻障性積層體,其中(甲基)丙烯酸 醋至少含有於25°C、-大氣壓下為固體的化合物。 (5) 如(1)〜(4)中任一項所述的阻障性積層體,其中(甲基) 丙烯酸酯的(曱基)丙烯醯氧基之數量為4。 (6) 如⑴〜(5)中任一項所述的阻障性積層體其中無機 層含有鋁及/或矽的氧化物及/或氮化物。 (7) 如⑴〜(6)中任一項所述的阻障性積層體,其中聚合 性組成物更含有酸性單體。 (8) 種氣體阻障膜,其是於基材膜上具有⑴〜⑺中任 一項所述的阻障性積層體。 (9) 士(8)所述的氣體阻障膜,其中基材膜為玻璃轉移溫 度(Tg)為l〇〇°c以上的基材膜。 (10) 種器件’含有⑴〜⑺中任一項所述的阻障性積 4 201235213r 層體或者(8)或(9)所述的氣體阻障膜。 (11) 一種阻障性積層體的製造方法,是具有無機層、 有機層及無機層依序鄰接的構造的阻障性積層體的製造方 法,特徵在於:將含有以固體成分計5〇wt%以上之(曱基) 丙烯酸酯的聚合性組成物塗布於無機層上並硬化之,此(曱 基)丙稀酸醋為於25°C、-大氣壓下硬化前黏度4〇〇mPa s 以上的液體或固體,且(曱基)丙稀酸當量為2⑼以下。 (12) 如(11)所述的製造方法,其中聚合性組成物更含有 含(曱基)丙烯醯氧基的石夕院偶合劑。 (13) 如(11)或(12)所述的阻障性積層體的製造方法,其 中以紫外線波長365 nm的照度為1200 mw/sec以下的條件 對上述聚合性組成物進行光硬化而照射。 (14) 如(11)〜(13)中任一項所述的阻障性積層體的製造 方法,其中使聚合性組成物硬化時的紫外線的累計光量為 1500 mj/sec 以下。 (15) 如(11)〜(14)中任一項所述的阻障性積層體的製造 方法,其中無機層是藉由電漿化學氣相沈積法而成膜。 (16) 如(11)〜(15)中任一項所述的阻障性積層體製造方 法,其中(曱基)丙烯酸酯的(曱基)丙烯醯氧基數量為3〜5。 (17) 如(11)〜(16)中任一項所述的阻障性積層體的製造 方法,其中(曱基)丙烯酸酯為於25〇C、一大氣壓下硬化前 黏度為1000 mPa.s以上的液體或固體。 (18) 如(11)〜(17)中任一項所述的阻障性積層體的製造 方法,其中(甲基)丙烯酸酯至少含有於25。(:、一大氣壓下 201235213 為固體的化合物。 氣體的製造方法,包含:應用⑻或⑼所述的 札聽阻障膜後,於15代以上處理1小時以上。 [發明的效果] 障性發!二可提供一種有機層的發泡得到抑制的阻 I5早ϋ積層體以及氣體阻障骐。 【實施方式】 以下详細說明本發明的内容。又本說明書中「〜 以包含其紐所記餘值為下限及上雜的含帛而使用。 本發明的阻障性積層體具有無機層、有機層及無機層 依序鄰接的構造’特徵在:有機収將含有㈣體成分計 5〇 wt/0以上的(甲基)丙稀酸醋w及含(甲基)丙烯酿氧基的 石夕院偶合劑的聚合性組成物塗布為層狀並硬化之而成,此 (甲基)丙稀酸醋為於25t、— A氣壓下硬化前的黏度為彻 mPa.si^上的液體或固體,且(甲基)丙烯酸當量為26〇以下。 先前-直認為,使衫官能(?基)丙賴g旨作為有機 層的材料時’宜藉塗布使有機層成為層狀並硬化之。然而, 本發明者研究後得知,若讀布形成使好官能(甲基)丙 烯酸酯的有機層(無機層祕的層),則高溫處理時性能會 劣化。據此,本發明採用特定的聚合性組成物,而成功製 作出即便以塗布形成有機層,亦維持阻障性且不發生性能 劣化的阻障性積層體,因此不會對鄰接該有機層的無機層 造成損傷。此種問題於氣相蒸鍍聚合的情況下影響少,是 以溶劑塗布方式大面積製作有機層時所產生的問題。 6 201235213 接著說明本發明聚合性組成物所含(甲基)丙稀酸醋。 ((曱基)丙烯酸酯) 帝本發明使用的聚合性組成物含有(甲基)丙烯酸酯為必 需成分’其為於25<t、一大氣壓下硬化前黏度為400 mPa.s $上的液體或固體,且(曱基)丙烯酸當量為260以下。如 3有此種(甲基)丙稀酸酯,則即便以塗布形成有機層,亦 可抑制發泡。 (甲基)丙烯酸酯為硬化前黏度4〇〇 mPa.s以上的液體 或固體,更佳為硬化前黏度5〇〇mPa.s以上的液體或固體, 又更佳為硬化前黏度1〇〇〇 mpa.s以上的液體或固體,特佳 為固體。為液體時黏度的上限值無特別限制,通常較佳為 30000 mPa.s以下的液體。 又’(曱基)丙烯酸酯的(甲基)丙烯酸當量為260以下。 使用此種化合物即可維持高阻障性。此處所謂(甲基)丙烯 酸當量,是指每丨莫耳(曱基)丙烯醯基的分子量。於本發 明中’(曱基)丙烯酸當量較佳為2〇〇以下。(曱基)丙烯酸當 量的下限值並無特別限制,通常為70以上。 另外,本發明使用的夕)7 U k—卜(1)的(甲基)丙 烯酿氧基之數量較佳為3〜5,更佳為4。 本發明使用的(曱基)丙烯酸酯較佳僅含碳原子、氧原 子、氫原子’更佳為以下通式(A)或(B)表示的化合物。201235213 VI. Description of the Invention: [Technical Field] The barrier film is a barrier-type laminate and a gas barrier IV film using the same, and a method for producing the barrier laminate is described. [Prior Art] Various gas barrier films have been previously studied (Japanese Patent Laid-Open No. Hei 2 (9) No. 2-205354, No. 2010-30290, No. 2010-105321, No. Hei No. 278167, No. 2006-193596, No. 2007-76282). When it is known in the case of an organic layer, when a monomer having a large number of functional groups is photohardened, the organic layer is improved in barrier properties. Preferably, such a monomer is formed by coating to form a layer. [Invention] [,], and, if a monomer having a large number of functional groups is coated and formed into a layer and hardened, an organic layer is formed at a high temperature. The defect of the material causes damage to the adjacent inorganic layer, and the organic layer sandwiched between the two inorganic layers particularly causes damage to the adjacent inorganic layer. The present invention is to solve the problem: the object is to provide an organic A barrier layered product in which a layer is formed into a layer shape and which is less likely to cause defects such as running of an organic layer, and a method for producing the same. The inventors of the present invention have found that, if the polymerizable composition containing a polymerizable monomer having a specific viscosity or more is applied and cured to form an organic layer, the inventors can significantly reduce the defect rate of the organic layer during the temperature treatment. It is more pronounced when the alkoxyalkylene monomer composition is hardened to form an organic layer. Further, it has been found that when the amount of light irradiation for curing the light is a specific amount or less, defects such as foaming of the organic layer can be remarkably suppressed. Specifically, it is found that the above problems can be solved by the following means. 201235213 (1) A barrier laminated body having an inorganic layer 'organic layer and an inorganic layer sequentially adjacent to each other'. The organic layer is composed of (meth) acrylate containing 50 wt% or more of IU body component and The polymerizable composition of the (meth)acryloxyl decane coupling agent was applied in a layered form and cured, and the above (meth) acrylate was 25. 〇-liquid or solid before viscosity at atmospheric pressure is 4 〇〇 mPa s or more, and the (meth)acrylic equivalent is 26 〇 or less. (2) The barrier laminate according to (1), wherein the amount of the (meth) acryloyloxy group of the (meth) acrylate is from 3 to 5. (3) The barrier layered product according to (1) or (2), wherein the (meth)acrylic acid S is a liquid or a solid having a viscosity of from (7) to above at 25 C and at atmospheric pressure. (4) The barrier layered product according to (1) or (2), wherein the (meth)acrylic acid vinegar contains at least a compound which is solid at 25 ° C and at atmospheric pressure. (5) The barrier layered product according to any one of (1) to (4) wherein the number of (mercapto)acryloxyl groups of the (meth) acrylate is 4. (6) The barrier layered product according to any one of (1) to (5) wherein the inorganic layer contains an oxide and/or a nitride of aluminum and/or bismuth. (7) The barrier layered product according to any one of (1) to (6) wherein the polymerizable composition further contains an acidic monomer. (8) A gas barrier film which has the barrier layered product according to any one of (1) to (7). (9) The gas barrier film according to (8), wherein the substrate film is a substrate film having a glass transition temperature (Tg) of 10 ° C or more. (10) A device comprising the barrier product 4 201235213r layer body according to any one of (1) to (7), or the gas barrier film according to (8) or (9). (11) A method for producing a barrier laminate, which is a method for producing a barrier laminate having a structure in which an inorganic layer, an organic layer, and an inorganic layer are sequentially adjacent to each other, characterized in that it contains 5 〇wt based on solid content The polymerizable composition of the above (fluorenyl) acrylate is coated on the inorganic layer and hardened, and the (mercapto) acrylic acid vinegar has a viscosity of 4 〇〇 mPa s or more before hardening at 25 ° C and atmospheric pressure. Liquid or solid, and (mercapto) acrylic acid equivalent is 2 (9) or less. (12) The production method according to (11), wherein the polymerizable composition further contains a Shixiyuan coupling agent containing a (fluorenyl) acryloxy group. (13) The method for producing a barrier layered product according to the above aspect, wherein the polymerizable composition is photocured and irradiated under conditions of an illuminance at an ultraviolet wavelength of 365 nm of 1200 mW/sec or less. . (14) The method for producing a barrier laminate according to any one of the aspects of the present invention, wherein the cumulative amount of ultraviolet light when the polymerizable composition is cured is 1500 mj/sec or less. (15) The method for producing a barrier laminate according to any one of (11) to (14) wherein the inorganic layer is formed by a plasma chemical vapor deposition method. (16) The method for producing a barrier laminate according to any one of (11) to (15) wherein the (mercapto) acrylate has a (fluorenyl) acryloxy group in an amount of from 3 to 5. The method for producing a barrier laminate according to any one of (11) to (16), wherein the (mercapto) acrylate has a viscosity of 1000 mPa before hardening at 25 ° C under atmospheric pressure. Liquid or solid above s. (18) The method for producing a barrier laminate according to any one of (11) to (17) wherein the (meth) acrylate is contained in at least 25. (:, a compound which is solid at 201235213 under atmospheric pressure. The method for producing a gas includes: applying the barrier film described in (8) or (9), and treating it for 15 hours or more for 1 hour or more. [Effect of the invention] Further, an apparatus for suppressing the foaming of the organic layer and a gas barrier layer can be provided. [Embodiment] The content of the present invention will be described in detail below. In the present specification, "~ The residual value of the barrier layered body of the present invention has a structure in which the inorganic layer, the organic layer and the inorganic layer are adjacently adjacent to each other. The characteristic is: the organic content will contain (4) the body composition is 5 〇wt The (meth)acrylic acid vinegar w of /0 or more and the polymerizable composition of the Shixiayuan coupling agent containing a (meth)acryloyloxy group are coated and hardened, and this (meth)-propyl The dilute vinegar is a liquid or solid on the mPa.si^ at 25t, -A pressure, and the (meth)acrylic equivalent is 26〇 or less. Previously, it is believed that the shirt function is ) When Bray is used as a material for the organic layer, However, the inventors of the present invention have found that if the cloth is formed into an organic layer (inorganic layer) which is a good functional (meth) acrylate, the performance at the time of high temperature treatment is deteriorated. Therefore, the present invention adopts a specific polymerizable composition, and succeeds in producing a barrier layered body which maintains barrier properties and does not deteriorate in performance even if an organic layer is formed by coating, and thus does not affect the inorganic layer adjacent to the organic layer. The layer is damaged. This problem is less affected by vapor phase vapor deposition polymerization, and is caused by a large area of the organic layer by solvent coating. 6 201235213 Next, the polymerizable composition of the present invention is contained. Acrylic vinegar. ((Mercapto) acrylate) The polymerizable composition used in the present invention contains (meth) acrylate as an essential component, which is a viscosity of 400 mPa at 25 ° t at atmospheric pressure. .s liquid or solid on $s, and the (meth)acrylic acid equivalent is 260 or less. If 3 (meth) acrylate is used, the foaming can be suppressed even if the organic layer is formed by coating. Propylene The ester is a liquid or solid having a viscosity of 4 〇〇 mPa·s or more before hardening, more preferably a liquid or solid having a viscosity of 5 〇〇 mPa·s or more before hardening, and more preferably a viscosity of 1 〇〇〇 mPa.s or more before hardening. The liquid or solid is particularly preferably a solid. The upper limit of the viscosity in the case of a liquid is not particularly limited, and is usually preferably a liquid of 30,000 mPa·s or less. The (meth)acrylic equivalent of '(fluorenyl) acrylate is 260 or less. The high barrier property can be maintained by using such a compound. Here, the (meth)acrylic acid equivalent means the molecular weight per mole of fluorenyl fluorenyl group. In the present invention, '(sulfanyl) The acrylic acid equivalent is preferably 2 Å or less. The lower limit of the (fluorenyl) acrylic acid equivalent is not particularly limited, and is usually 70 or more. Further, the amount of the (meth)acryloxy group of 7 U k-Bu(1) used in the present invention is preferably from 3 to 5, more preferably 4. The (fluorenyl) acrylate used in the present invention preferably contains only a carbon atom, an oxygen atom, and a hydrogen atom, and more preferably a compound represented by the following formula (A) or (B).
Ac ί —丨—u—AcAc ί —丨—u—Ac
Ac 通式(A) 201235213^ (通式(A)中各Ac表示(曱基)丙烯醯氧基,L1、L2、L3及 L4各自為-CH2-、-CH(0H)-、-0-或包含該等的組合的基。) J 一Ac General formula (A) 201235213^ (In the general formula (A), each Ac represents a (fluorenyl) acryloxy group, and each of L1, L2, L3 and L4 is -CH2-, -CH(0H)-, -0- Or a base containing the combination of these.) J
I 0I 0
一U-AC 通式(B) (通式(B)中各Ac表示(曱基)丙烯醯氧基,L1、L2、L3及 L4各自為-CH2-、CH(OH)-、-0-或包含該等的組合的基, R1及R2各自為氫原子或碳數1〜3的烷基。) 於通式(A)及(B)中,Ι^1、!^、!^及L4各自較佳為-CH2-、 -Ο-或包含該等的組合的基。 於通式(Β)中,R1及R2各自較佳為乙基。 以下揭示本發明使用的(曱基)丙烯酸酯的例子,但本 發明當然不限定於該等。A U-AC Formula (B) (In the formula (B), each Ac represents a (fluorenyl) acryloxy group, and each of L1, L2, L3 and L4 is -CH2-, CH(OH)-, -0- Or a group containing such a combination, each of R1 and R2 is a hydrogen atom or an alkyl group having 1 to 3 carbon atoms.) In the general formulae (A) and (B), Ι^1, ! ^,! Each of ^ and L4 is preferably -CH2-, -Ο- or a group comprising the combinations. In the formula (Β), R1 and R2 are each preferably an ethyl group. Examples of the (fluorenyl) acrylate used in the present invention are disclosed below, but the present invention is of course not limited to these.
201235213201235213
l+m+n+o<4l+m+n+o<4
201235213.201235213.
l+m+n+o<4l+m+n+o<4
於本發明中 相對於聚合性組成物的固體成分而含有 5〇 Wt%以上的(曱基)丙稀酸醋,較佳是含有70 wt%以上。 上限值並無制_,通常為95㈣以下。 發明亦可含有兩種以上的(曱基)丙烯酸酯, 此時,、要_的合計量為5Qwt%以上即可。 (矽烷偶合劑) 本發明使用的聚合性级成物較 酿氧基的魏偶,,如麟 = 基)丙稀 含(曱基)丙稀發泡。 201235213. 基’更佳含有烷氧曱基、烷氧乙基。 不 石夕烧偶合劑所含的烷氧矽烷基較佳以下通式(1)表 0^)m_Si-(R2)n 通式⑴ [上式中’R1為院氧基,R2表示含(曱基)丙_氧基的 基。m為1〜3的整數,n=4-m。111為2或3時,2或3個 Rl可彼此相同亦可不同。另外,η為2或3時,2或3個 R2可彼此相同亦可不同。] 通式(1)中,R1較佳為碳數1〜6的烷氧基,更佳為碳數 1〜4的院氧基。通式⑴中有多個Ri時,各Rl可彼此相同 亦可不同,較佳是相同。 通式⑴中,R2表示的有機基的碳數較佳為2〜18,更 佳為3〜14,又更佳為4〜10。通式⑴中有多個R2時,R2 可彼此相同亦可不同,較佳是相同。(曱基)丙烯醯氧基通 常位於分子的末端。 通式(1)中m為1〜3的整數,n=4-m,較佳是m為2 或3、η為1或2的情形,更佳是m為3、η為1的情形。 以下揭示本發明所用之矽烷偶合劑的例子,但本發明 當然不限於該等。 201235213In the present invention, (〇-based) acrylic acid vinegar is contained in an amount of 5 〇 Wt% or more, preferably 70% by weight or more, based on the solid content of the polymerizable composition. The upper limit is not _, usually 95 (four) or less. The invention may contain two or more kinds of (fluorenyl) acrylates, and in this case, the total amount of the oxime may be 5 Qwt% or more. (Centane coupling agent) The polymerizable grade product used in the present invention is foamed with a fluorene-containing acetophenone, such as a propyl group. 201235213. The base is more preferably an alkoxyfluorenyl group or an alkoxyethyl group. The alkoxyalkyl group contained in the catalyst is preferably the following formula (1) Table 0^) m_Si-(R2)n Formula (1) [In the above formula, 'R1 is a hospitaloxy group, and R2 is a group (R2) Base) a propyl-oxy group. m is an integer of 1 to 3, and n = 4 m. When 111 is 2 or 3, 2 or 3 R1 may be the same or different from each other. Further, when η is 2 or 3, 2 or 3 R2 may be the same or different from each other. In the formula (1), R1 is preferably an alkoxy group having 1 to 6 carbon atoms, more preferably an alkoxy group having 1 to 4 carbon atoms. When a plurality of Ris are present in the formula (1), each R1 may be the same or different, and is preferably the same. In the formula (1), the organic group represented by R2 preferably has 2 to 18 carbon atoms, more preferably 3 to 14 carbon atoms, still more preferably 4 to 10 carbon atoms. When there are a plurality of R2 in the formula (1), R2 may be the same or different from each other, and is preferably the same. The (mercapto) acryloxy group is usually located at the end of the molecule. In the formula (1), m is an integer of 1 to 3, n = 4 to m, preferably m is 2 or 3, and η is 1 or 2. More preferably, m is 3 and η is 1. Examples of the decane coupling agent used in the present invention are disclosed below, but the present invention is of course not limited to these. 201235213
〇ch3〇ch3
i<_ 〇ch3i<_ 〇ch3
於本發明中’較佳是相對於聚合性組成物的固體成分 而含有3〜3Gwt%_^偶合劑,更佳是含有1G〜25wt%。 另外,本發明中亦可含有兩種以上的石夕烧偶合劑,此 情形下該等的合計量在上述範圍内。 (酸性單體) 本發,所用的聚合性組成物中亦可含有酸性單體以 進一步提高所得阻障性積層體的層間密合性。另外,與 烧偶合劑組合使用時,可促進魏偶合劑的水解,而更 效地抑制本發__。因此,魏單驗佳是 使用的矽烷偶合劑併用。 〃 & π 所謂酸性單體,是指含有舰、續酸、鱗酸、鱗酸等 酸性基的單體。本發明所用的雜單賴 :酸=;’更佳為含_基或魏基的_« 西曰,更佳為含磷酸酯基的(曱基)丙烯酸酯。 12 201235213, (含磷酸酯基的(甲基)丙烯醆酯) 含構酸酯基的(甲基)丙烯酸酯更佳是含有以下通式(p) 表示的化合物。含有含磷酸酯基的(甲基)丙烯酸酯即可進 一步提高與無機層的密合性。 〇In the present invention, it is preferred to contain 3 to 3 Gwt% of a coupling agent, more preferably 1 G to 25% by weight, based on the solid content of the polymerizable composition. Further, in the present invention, it is also possible to contain two or more kinds of zeaday couplers, and in this case, the total amount of these is within the above range. (Acid monomer) In the present invention, the polymerizable composition to be used may further contain an acidic monomer to further improve the interlayer adhesion of the resulting barrier layered product. Further, when used in combination with a blistering agent, hydrolysis of the Wei coupling agent can be promoted, and the present invention can be more effectively suppressed. Therefore, Wei Shanzheng is used in combination with a decane coupling agent. 〃 & π The so-called acidic monomer refers to a monomer containing an acidic group such as a ship, a continuous acid, a scaly acid or a scaly acid. The catalyst used in the present invention is: acid =; 'more preferably _-containing or carbyl-based oxime, more preferably a phosphate group-containing (fluorenyl) acrylate. 12 201235213, ((meth) propylene oxime containing a phosphate group) The (meth) acrylate containing a carboxylic acid group is more preferably a compound represented by the following formula (p). The (meth) acrylate containing a phosphate group can further improve the adhesion to the inorganic layer. 〇
II Α〇ι-〇-Χ1-〇_ρ~〇·_ζ1 1 通式(Ρ) ο-ζ2 (通式(Ρ)中,Ζ1表示ac2-〇-x2-、不含聚合性基的取代基 或氫^子,Z2表示Ac3-〇X3-、不含聚合性基的取代基或 氫原子,Ac1、Ac2及Ac3各自表示丙烯醯基或甲基丙烯醯 i,x、x2及X3各自表乔二價連結基。) 通弋(p)表示的化合物較佳為以下通式(P-1)表示的單 官能ii、以下通式(p-2)表示的2官能單體、以下通式(ρ·3) 表示的3官能單體,或該等的混合物。 〇II Α〇ι-〇-Χ1-〇_ρ~〇·_ζ1 1 Formula (Ρ) ο-ζ2 (In the formula (Ρ), Ζ1 represents ac2-〇-x2-, a substituent containing no polymerizable group Or hydrogen, Z2 represents Ac3-〇X3-, a substituent containing no polymerizable group or a hydrogen atom, and Ac1, Ac2 and Ac3 each represent an acryloyl group or a methyl propylene group i, x, x2 and X3 each The divalent linking group. The compound represented by the above formula (p) is preferably a monofunctional ii represented by the following formula (P-1), a bifunctional monomer represented by the following formula (p-2), and the following formula ( a trifunctional monomer represented by ρ·3), or a mixture thereof. 〇
IIII
一 〇 — P 一 〇 — R 通式(P-1)One 〇 — P — 〇 — R General formula (P-1)
I O-R2 Ο 2-0 —A cI O-R2 Ο 2-0 —A c
Ac O-R2 通式(P-2) 13 201235213Ac O-R2 Formula (P-2) 13 201235213
Ac n—〇 — χ1_〇—p —Ο — X2 —O — Ac2 I ^ ^ 〇 —X3 —o —A c 3 通式(P-3)Ac n—〇 — χ1_〇—p —Ο — X2 —O — Ac2 I ^ ^ 〇 —X3 —o —A c 3 General Formula (P-3)
Ac〗、Ac2、Ac3、X!、X2及X3的定義與通式(p)中的相 同。於通式(P-1)及(P_2)中’ R1表示不含聚合性基的取代基 或氫原子’ R2表示不含聚合性基的取代基或氫原子。 於通式(P)、(Ρ-1)〜(Ρ-3)中,X1、X2及χ3表示二價連 結基’其例子可舉:伸炫基(如伸乙基、1,2_伸丙基、2 2 伸丙基(亦稱2,2-亞丙基、1,1-二甲基亞曱基)、13伸丙 基、2,2-二曱基-U·伸丙基、2_丁基_2_乙基_u伸丙基、 1,6-伸己基、ι,9-伸壬基、ι,ΐ2-伸十二烧基、^丨卜伸十六烷 基等)、伸芳基(如伸苯基、伸萘基)、醚基、亞胺基、羰 基、,醯基、及該些二價基多個串接成的二價殘基(如聚 =申乙氧基伸乙基、聚伸丙氧基伸丙基、2,2伸丙基伸苯基 等)。/亥些基亦可具有取代基。其中,較佳為伸烷基伸芳 基及該等多㈣接成的二價基,更佳為未取代的伸烧基、 未取代 1的伸2芳基以及該等多個串接成的二價基。 x、x及X3較佳為伸烷基或伸烷氧基羰基伸烷基, 及該等的組合。 通f(P)、(P-1)〜(p_3)中不含聚合性基的取代基可例舉 烧基 ' 方基’切料組合而成的基等。較佳為烧基。 烷基的碳數較佳為1〜12,更佳為 1〜9,又更佳為1〜6。 烧基的具體例可例舉甲基、乙基、丙基、丁基、戊基、己 14 201235213t 基。烧基為直鏈狀、分支狀、環狀均可,較佳為直鏈烧基。 炫•基亦可經烧氧基、芳基、芳氧基等取代。 芳基的碳數較佳為6〜14,更佳為6〜10。芳基的具體 例可例舉苯基、1-萘基、2-萘基。芳基亦可經烷基、烷氧 基、芳氧基等取代。 於本發明中,通式(P)表示的單體可僅使用一種,亦可 組合使用兩種以上。另外,組合使用時,亦可將通式(ρ-1) 表示的單官能單體、通式(Ρ_2)表示的2官能單體及通式 (Ρ-3)表示的3官能單體中的兩種以上組合使用。 本發明中含磷酸酯基的聚合性單體類可直接使用日本 化藥公司製造的KAYAMER系列、Uni_Chemical公司製造 的Phosmer系列等市售化合物,亦可使用新合成的化合物。 酸性單體較佳是相對於聚合性組成物的固體成分而含 有0.5〜10 wt% ’更佳是含有卜7 wt%。 另外,本發明中亦可含有兩種以上的酸性單體,此情 形下該等的合計量在上述範圍内。 以下揭示本發明中較佳使用的酸性單體的具體例,但 本發明不限於該等。The definitions of Ac, Ac2, Ac3, X!, X2 and X3 are the same as in the formula (p). In the general formulae (P-1) and (P_2), R1 represents a substituent or a hydrogen atom which does not contain a polymerizable group. R2 represents a substituent or a hydrogen atom which does not contain a polymerizable group. In the general formulae (P), (Ρ-1) to (Ρ-3), X1, X2 and χ3 represent a divalent linking group', and examples thereof include: a stretching base (such as an extended ethyl group, a 1,2_ stretching) Propyl, 2 2 extended propyl (also known as 2,2-propylene, 1,1-dimethyl fluorenylene), 13-propyl, 2,2-diindenyl-U·propyl, 2_butyl-2-ethyl-u-propyl, 1,6-extension, ι,9-extension, ι, ΐ2-extension, hexadecyl, etc. An extended aryl group (such as phenylene, anthranyl), an ether group, an imido group, a carbonyl group, a fluorenyl group, and a plurality of divalent residues in which the divalent groups are connected in series (eg, poly = Shen B Oxy-ethyl, poly-propoxy-propyl, 2,2-propyl phenyl, etc.). /Han base may also have a substituent. Wherein, it is preferably an alkyl extended aryl group and the poly(tetra)-bonded divalent group, more preferably an unsubstituted extended alkyl group, an unsubstituted 1 extended 2 aryl group, and the plurality of tandemly formed two Price base. X, x and X3 are preferably an alkylene or an alkyloxycarbonylalkylene group, and combinations thereof. The substituent which does not contain a polymerizable group in the case of (f) and (P-1) to (p_3) may, for example, be a group in which a calcining 'square group' is prepared. It is preferably an alkyl group. The carbon number of the alkyl group is preferably from 1 to 12, more preferably from 1 to 9, still more preferably from 1 to 6. Specific examples of the alkyl group include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group and a hexyl group 2012251313t. The alkyl group may be linear, branched or cyclic, and is preferably a linear alkyl group. The Hyun group can also be substituted by an alkoxy group, an aryl group, an aryloxy group or the like. The carbon number of the aryl group is preferably from 6 to 14, more preferably from 6 to 10. Specific examples of the aryl group include a phenyl group, a 1-naphthyl group and a 2-naphthyl group. The aryl group may also be substituted with an alkyl group, an alkoxy group, an aryloxy group or the like. In the present invention, the monomers represented by the formula (P) may be used alone or in combination of two or more. Further, when used in combination, a monofunctional monomer represented by the formula (ρ-1), a bifunctional monomer represented by the formula (Ρ_2), and a trifunctional monomer represented by the formula (Ρ-3) may also be used. Two or more combinations are used. In the present invention, a commercially available compound such as a KAYAMER series manufactured by Nippon Kayaku Co., Ltd. or a Phosmer series manufactured by Uni-Chemical Co., Ltd. can be used as it is, and a newly synthesized compound can also be used. The acidic monomer is preferably contained in an amount of 0.5 to 10% by weight based on the solid content of the polymerizable composition, and more preferably contains 7% by weight. Further, in the present invention, two or more kinds of acidic monomers may be contained, and in this case, the total amount of these is within the above range. Specific examples of the acidic monomer preferably used in the present invention are disclosed below, but the present invention is not limited to these.
15 20123521315 201235213
c〇(r"\^〇co(chy3〇 ΡΜ-21C〇(r"\^〇co(chy3〇 ΡΜ-21
μ 本毛明的聚合性組成物所含的聚合性化合物較佳是並 90 wt%以上為(曱基)丙稀酸醋、魏偶合劑以及酸性單體 的任-種’更佳的是聚合性成分實f上全部為(甲 酸酯、矽烧偶合劑以及酸性單體的任—種。 土 (溶劑) 本發明的聚合性組成物通常含有溶劑,例如綱、醋系 溶劑,較佳為2-丁酮、丙二醇單乙醚乙酸酯、環己酮。 /谷劑的含莖較佳為聚合性組成物的6〇〜97 wt%,更佳 為 70〜95 wt%。 (聚合起始劑) 本發明所用的聚合性組成物亦可含聚合起始劑。使用 光聚合起始劑時其含量較佳為聚合性化合物合計量的〇 i mol%以上’更佳為0.5〜2 mol% ’藉此適當控制經由活性 成分生成反應的聚合反應。光聚合起始劑的例子可例舉: 汽巴精化公司所銷售的Irgacure系列(例如jrgacure 651、μ The polymerizable compound contained in the polymerizable composition of the present invention is preferably at least 90% by weight of (mercapto)acrylic acid vinegar, a Wei coupling agent, and any one of acidic monomers. More preferably, polymerization is carried out. All of the functional components are (formic acid ester, sulphur-burning coupling agent, and any of acidic monomers. Soil (solvent) The polymerizable composition of the present invention usually contains a solvent, for example, a vinegar-based solvent, preferably 2-butanone, propylene glycol monoethyl ether acetate, cyclohexanone. The stem of the granule is preferably from 6 to 97 wt%, more preferably from 70 to 95 wt%, of the polymerizable composition. The polymerizable composition used in the present invention may further contain a polymerization initiator. When the photopolymerization initiator is used, the content thereof is preferably 〇i mol% or more of the total amount of the polymerizable compound, more preferably 0.5 to 2 mol%. 'The polymerization reaction via the active ingredient formation reaction is appropriately controlled by this. An example of the photopolymerization initiator can be exemplified by the Irgacure series sold by Ciba Specialty Chemicals Co., Ltd. (for example, jrgacure 651,
201235213t Λ. * ^ *L201235213t Λ. * ^ *L
Irgacure 754、Irgacure 184、Irgacure 2959、Irgacure 907、 Irgacure 369、Irgacure 379、Irgacure 819 等)、Darocure 系 列(例如 Darocure TPO、Darocure 1173 等)、Quantacure PDO、日本Siber Hegner公司銷售的Ezacure系列(例如 Ezacure TZM、Ezacure TZT、Ezacure KT046 等)等。 (有機層的形成方法) 有機層的形成方法只要利用溶液塗布即可,無特別限 制,例如可利用浸泡塗布法、氣刀塗布法、簾幕式塗布法、 輥塗布法、線棒塗布法、凹版塗布法、坡流塗布法(Slide c〇at mettiod)、或美國專利第2681294號說明書記載的使用料斗 (h〇PPer)的擠壓塗布(extrusion coat)法來塗布。 本發明通常對含聚合性化合物的組成物照光而使其硬 化’所照的光通常為高壓水銀燈或低壓水銀燈的紫外線。 紫外線波長365 nm的照度較佳為12〇〇 mw/sec以下,1〇〇〇 mw/sec以下更佳。下限值無特別限制,通常50 mw/sec以 上較佳。設定在此範圍内即可更有效地抑制有機層發泡。 曰另外,本發明使聚合性組成物硬化時的此外線的累計 光里較佳為1500 mj/sec以下,1200 mj/sec以下更佳。下 —值…、特別限制,通常較佳為1 〇〇㈣/祀。以上。設定在此 範圍内即可更有效地抑制有機層發泡。 θ於本發明中,又因空氣中的氧會妨礙聚合,因此較佳 時的氧濃度魏雜。當顧氮氣置換法使聚 :時的$濃度下降時,氧濃度較佳為2%以下,更佳為0.5% 以下备利用減壓法使聚合時的氧分壓下降時,其總壓較 17 201235213 佳為1000 Pa以下,1〇〇Pa以下更佳。 本發明中的有機層触是平滑且膜硬度高。 更二=的聚合性單體的聚合率較佳為眺以上, 更佳马88/。以上,又更佳為9()%以上,特 是指聚合性組成物中的所有聚合性基(例 丙烯醯基及甲基丙烯酿基)中發生 比例。聚合率可紅外線吸收法來定量4 ^基的 有機制轉無__,若過_難轉得膜厚 勻性,若過相易因外力發生性下降。依該 點’有機層的厚度較佳為5〇〜2〇〇〇 nm,〜15〇〇 nm更佳。 另如上所述,有機層較佳是平滑的,其平滑性較佳是 以1叫見方的平均粗縫度(Ra值)計而小於inm,更佳 是小於0.5 nm。會要求有機層的表面沒有微粒等異物、突 起。因此,有機層的成膜較佳於潔淨室内進行。潔淨度較 佳為10000級(class)以下,1〇〇〇級以下更佳。 有機層的硬度愈向愈好。若有機層的硬度高,則無機 層可平滑地成膜,使阻障能力提高。有機層的硬度可表示 為基於奈米壓印法的微小硬度。有機層的微小硬度較佳為 100N/mm以上,更佳為i5〇N/mm以上。 (無機層) 無機層通常為包含金屬化合物的薄膜的層。無機層的 形成方法只要能形成目標薄膜,則可使用任意方法。例如 蒸鍍法、濺鍍法、離子電鍍法等物理氣相沈積法,各種化 學氣相沈積法、鍍敷或溶膠凝膠法等液相成長法,較佳為 18 201235213, 電漿化學氣相沈積法。無機層所含成分只要滿足上述性能 則無特別限制’例如金屬氧化物、金屬氮化物、金屬碳二 物、金屬氧氮化物或金屬氧碳化物,可較佳使用含有選自 石夕、銘、銦、錫、鋅、鈦、銅、飾及紐中的一種以上的金 屬的氧化物、氮化物、碳化物、氧氣化物或氧碳化物 該等中’較佳為選自石夕、紹、銦、錫、辞及欽中的金屬的 氧化物、氮化物或氧氮化物,特佳為石夕或 或氮化物。該等亦可含有作為副成分的其他元素 本發明形朗錢相平·難為以 平均粗糖度(Ra值)計而小於1 mn,更佳為〇 5 M以下 無機層的成膜較佳於潔淨室内進行 級以下,更佳為聰級以下β π邊佳為10000 無機層的厚度無特別限制,每i 圍内’較佳為1〇〜200 nm。無機層亦9可為 積層構造。該情形下各子層 ”叮 子曰的 (有機層與無機層的積層) 、'、成亦可為不同組成。 有機層與無機層的積層 層與無機層料重複構成,將有機 層、有機層及無機層料鄰 ”至彡具有無機 機層及無機層。 、冓成,亦可進一步積層有 (功能層) 於本發明的器件中, 置具有功能層。功能層於曰層體上或其他位 報軸_8段中有詳 =瞻號公 ^ 4專以外的功能層的例 19 201235213 子可例舉褪光劑層、保護層、耐溶劑層、抗靜電層、平滑 層、密合改良層 '遮光層、抗反射層、硬塗層、應力緩^ 層、防霧層、防污層、被印刷層、易黏接層等。 (阻障性積層體的用途) 本發明的阻障性積層體通常設於支持體上,選擇支持 體即可用於各觀途。支持财除了基_以外,包含各 種器件、光學構件等。具體而言,本發明的阻障性積層體 可用,氣體阻障膜的阻障層。另外,本發明的阻障性^層 體及氣體阻障膜亦可用於要求阻障性的器件的密封。本^ 明的阻P早性積層體及氣體阻障膜亦可應用於光學構件。以 下詳細說明該等事項。 <氣體阻障膜> 氣體阻障膜具有基材膜及形成於基材膜上的阻障性積 層體。於氣體阻障膜中,本發明的阻障性積層體可僅設置 於基材膜的單面,亦可設置於兩面。 另外,本發明中的氣體阻障膜為具有阻障層的膜基 板,此阻障層具有阻斷大氣中的氧、水分、氮氧化物、硫 氧化物、臭氧等的功能。 構成氣體阻障膜的層數無特別限制,典型而言較佳為 2〜30層’更佳為3〜20層。 <基材膜> 本發明的氣體阻障膜通常使用塑膠膜作為基材膜。 尤其,本發明較佳使用玻璃轉移溫度(Tg) 1〇(rcu 上的基材膜。如使用此種耐熱性高的基材膜,則有即使於 20 201235213 組入元件後以高熱處理亦不易受損的優點。此種熱塑性樹 脂可例舉:聚萘二曱酸乙二酯(PEN : 120°c )、聚碳酸酯 (PC : 140°C)、脂環式聚烯烴(如日本Zeon公司製造的Irgacure 754, Irgacure 184, Irgacure 2959, Irgacure 907, Irgacure 369, Irgacure 379, Irgacure 819, etc.), Darocure series (eg Darocure TPO, Darocure 1173, etc.), Quantacure PDO, Ezacure series sold by Siber Hegner, Japan (eg Ezacure TZM) , Ezacure TZT, Ezacure KT046, etc.). (Method of Forming Organic Layer) The method for forming the organic layer is not particularly limited as long as it is applied by a solution, and for example, a dip coating method, an air knife coating method, a curtain coating method, a roll coating method, a wire bar coating method, or the like can be used. It is applied by a gravure coating method, a slide coating method (Slide c〇at mettiod), or an extrusion coating method using a hopper (h〇PPer) described in the specification of US Pat. No. 2,681,294. In the present invention, the composition containing the polymerizable compound is usually hardened by irradiation. The light to be irradiated is usually ultraviolet light of a high pressure mercury lamp or a low pressure mercury lamp. The illuminance at an ultraviolet wavelength of 365 nm is preferably 12 〇〇 mw/sec or less, more preferably 1 〇〇〇 mw/sec or less. The lower limit value is not particularly limited, and is usually preferably 50 mw/sec or more. When it is set within this range, the organic layer foaming can be more effectively suppressed. Further, in the present invention, it is preferable that the integrated light of the additional line when the polymerizable composition is cured is 1500 mj/sec or less, more preferably 1200 mj/sec or less. The lower-value..., special limit, is usually preferably 1 〇〇 (four) / 祀. the above. Setting within this range is more effective in suppressing organic layer foaming. In the present invention, since oxygen in the air interferes with polymerization, the oxygen concentration is preferably high. When the concentration of the poly: is lowered by the nitrogen substitution method, the oxygen concentration is preferably 2% or less, more preferably 0.5% or less. When the oxygen partial pressure at the time of polymerization is decreased by the pressure reduction method, the total pressure is 17 201235213 Good for 1000 Pa or less, preferably 1 〇〇Pa or less. The organic layer in the present invention is smooth and has a high film hardness. Further, the polymerization rate of the polymerizable monomer is preferably 眺 or more, more preferably 88%. The above is more preferably 9 (%) or more, and particularly refers to a ratio occurring in all of the polymerizable groups (for example, an acrylonitrile group and a methacrylic acid group) in the polymerizable composition. The polymerization rate can be quantified by the infrared absorption method to quantify 4 ^ base. There is no mechanism to change the film thickness. If the film is too versatile, the film thickness is apt to decrease. Depending on the point, the thickness of the organic layer is preferably 5 〇 2 〇〇〇 nm, and more preferably 〜 15 〇〇 nm. Further, as described above, the organic layer is preferably smooth, and the smoothness thereof is preferably less than inm, more preferably less than 0.5 nm, in terms of an average roughness (Ra value) of 1 square. It is required that the surface of the organic layer is free of foreign matter such as particles and protrudes. Therefore, film formation of the organic layer is preferably carried out in a clean room. The cleanliness is preferably below 10,000 (class), and preferably below 1 。. The hardness of the organic layer is getting better and better. When the hardness of the organic layer is high, the inorganic layer can be smoothly formed into a film, and the barrier property can be improved. The hardness of the organic layer can be expressed as a minute hardness based on the nanoimprint method. The minute hardness of the organic layer is preferably 100 N/mm or more, more preferably i5 〇 N/mm or more. (Inorganic Layer) The inorganic layer is usually a layer of a film containing a metal compound. As the method of forming the inorganic layer, any method can be used as long as the target film can be formed. For example, a physical vapor deposition method such as a vapor deposition method, a sputtering method, or an ion plating method, or a liquid phase growth method such as a chemical vapor deposition method, a plating method, or a sol-gel method is preferably 18 201235213, a plasma chemical vapor phase. Deposition method. The component contained in the inorganic layer is not particularly limited as long as it satisfies the above properties, for example, a metal oxide, a metal nitride, a metal carbon compound, a metal oxynitride or a metal oxycarbide, and preferably used in a group selected from Shi Xi, Ming, An oxide, a nitride, a carbide, an oxygenated oxide or an oxycarbide of one or more metals of indium, tin, zinc, titanium, copper, and lanthanum is preferably selected from the group consisting of Shi Xi, Shao, and Indium. Oxides, nitrides or oxynitrides of metals in tin, rhetoric and chin, particularly preferably as stellite or nitride. These may also contain other elements as an accessory component. The present invention is similar in terms of average coarse sugar (Ra value) and less than 1 mn, more preferably 〇 5 M or less. Below the indoor level, it is better that the thickness of the β π side is less than 10,000. The thickness of the inorganic layer is not particularly limited, and it is preferably from 1 〇 to 200 nm per i. The inorganic layer 9 can also be a laminated structure. In this case, each sub-layer "the layer of the organic layer and the inorganic layer", ', and the composition may be different compositions. The organic layer and the inorganic layer are repeatedly formed with the inorganic layer, and the organic layer and the organic layer are organic. The layer and the inorganic layer are adjacent to each other and have an inorganic layer and an inorganic layer. Further, it may be further laminated (functional layer) in the device of the present invention, and has a functional layer. The functional layer is on the 曰 layer or in other bits of the _8 segment. Example 19 of the functional layer other than the gong*4. The 201235213 can be exemplified by a matting agent layer, a protective layer, a solvent resistant layer, and an anti-resistance layer. Electrostatic layer, smoothing layer, adhesion improving layer 'light shielding layer, antireflection layer, hard coat layer, stress relief layer, antifogging layer, antifouling layer, printed layer, easy adhesion layer, and the like. (Use of barrier laminate) The barrier laminate of the present invention is usually provided on a support, and the support can be selected for each viewpoint. In addition to the base, the support includes various devices, optical components, and the like. Specifically, the barrier laminate of the present invention can be used as a barrier layer of a gas barrier film. Further, the barrier layer and the gas barrier film of the present invention can also be used for sealing of a device requiring barrier properties. The resistive P early laminated body and the gas barrier film of the present invention can also be applied to an optical member. These matters are detailed below. <Gas Barrier Film> The gas barrier film has a substrate film and a barrier laminate formed on the substrate film. In the gas barrier film, the barrier laminate of the present invention may be provided only on one side of the base film or on both sides. Further, the gas barrier film of the present invention is a film substrate having a barrier layer having a function of blocking oxygen, moisture, nitrogen oxides, sulfur oxides, ozone, and the like in the atmosphere. The number of layers constituting the gas barrier film is not particularly limited, and is typically preferably from 2 to 30 layers, more preferably from 3 to 20 layers. <Substrate film> The gas barrier film of the present invention generally uses a plastic film as a substrate film. In particular, in the present invention, it is preferred to use a glass transition temperature (Tg) of 1 Å (a substrate film on rcu. If such a substrate film having high heat resistance is used, it is difficult to heat-treat even after the component is incorporated into 2012 20123213. Advantages of damage. Such a thermoplastic resin can be exemplified by polyethylene naphthalate (PEN: 120 ° C), polycarbonate (PC: 140 ° C), and alicyclic polyolefin (such as Zeon Corporation of Japan). made
Zeonor 1600: 160°C )、聚芳酯(PAr:210°C )、聚醚颯(PES : 220°C )、聚颯(PSF : 190°C )、環烯烴共聚物(COC :曰 本專利特開2001-150584號的化合物:162。(:)、聚醯亞胺 (如三菱瓦斯化學公司的Neoprim : 260°C )、芴環改質聚 碳酸醋(BCF-PC:曰本專利特開2000-227603號的化合 物:225。(:)、脂環改質聚碳酸醋(IP_PC :日本專利特開 2000-227603號的化合物:205〇丙烯醯基化合物(日 本專利特開2002-80616號的化合物:30(TC以上)(括弧内 為Tg)。特別於需要透明性時,較佳使用脂環式聚烯烴等。 β本發明的基板可較佳用於因水或氧等而即使於常溫常 使用亦可能經年劣化的元件的密封。可例舉有機電致 發光兀件、液晶顯示元件、太陽電池、觸控面板等。 一本發明的阻障性積層體另可用於器件的膜密封,亦即 件本身為支持體,於其表面設置本發明的阻障性積層 的方法。亦可於設置阻障性積層體前以保護層覆蓋器件。 ^發明的氣體阻障膜亦可用作器件的基板,或固體 保護層膜;Γ固體密封法是指於器, 著劑益心丨重㈣層、氣體阻障麵硬化的方法。接 _醋樹脂^,可例示熱硬化性環_旨、光硬化性兩 <器件> 201235213 空氣口層Γϊ體Γ障膜可較佳用於會因 等)導致性食1劣^的=氮氧化物 '硫氧化物、臭氧 元件、液晶顯干元株° 1°上述讀的例子可例舉有機EL ,日頊不兀件、薄膜電晶體、觸控面板、電子铋 =)等電子器件,可較佳用於二元件 器件==性:=用於器件的膜密封,即以 盤的本^的轉性積層 本發爾崎γ器件。 著:r體密封法,是指於器件上形 接著劑If氣體阻障膜並硬化的方法。 丙稀酸酉旨樹脂等\ 熱硬化性環氧樹脂、光硬化性 <有機EL元件> 利氣體轉膜的有機電致發光元件的例子於日本專 利特開2007-30387號公報有詳細記載。 <液晶顯示元件> 液日日顯7F兀件可參考日本專利特〇〇 報0044段的記載。 览“ <其他> 其他應用例可例舉:日本專利特表平1〇_5121〇4號公 報冗載的薄膜電晶體,日本專利特開平5_127822號公報、 =本專利特開2〇〇2•侧3號公報等記載的觸控面板,日本 專利特開2_-98326號公報記載的電子紙,日本專利特願 22 201235213t • Μ. » ^ ^ 平7-160334號公報記載的太陽電池等。 <光學構件> 使用本發明的氣體阻障膜的光學構件的例子可例舉圓偏光 板等。(圓偏光板) 可將本發明的村阻障膜作為基板,積層W板及偏 光板以製作圓偏光板。此時是以板的慢軸與偏光板的 吸收軸成45。的方式積層。此種偏光板較佳為制相對於 長度方向(MD)而於45。方向上延伸的偏光板,例如可適 當使用日本專利特開歷—祕54號公報記載的偏光板。 另外,先前的阻障性積層體於組入有機EL元件等中 時’若進行力口熱則有機層會產生缺陷而對其本身或鄰接的 無機層造成損傷,但本發明亦可避免此種問題,於此方面 更有意義。例如,即使於150。(:以上進行!小時以上的加 熱處理,較佳是於170〜20(TC進行丨〜3小時的加熱處理, 亦可使氣體阻障膜維持阻障性。 先刖絲毫未知高溫處理會產生發泡缺陷這種情況,故 本發明依該觀點亦有意義。具體而言,本發明的阻障性積 層體及氣體阻障膜即使於20(TC下加熱2小時以上亦維持 阻障性’可使15 cmx25 cm的尺寸的發泡缺陷為1〇個以下。 實例 以下舉實例對本發明作更具體的說明,其實例所示的 材料、使用量、比例、處理内容、處理順序等只要不偏離 本發明的主旨,則可適當變更。因此,本發明的範圍不限 於以下所示的具體例。 23 201235213r 氣體阻障膜的製作 將PEN膜(帝人杜邦製Te〇nex q65FA,厚度1〇〇㈣, Tg=113 C )裁斷成A4尺寸,於其表面按以下順序依序形 成無機層、有機層、無機層並進行評價。 (無機層的製作) 於PEN膜的表面,以電漿CVD法製作氮化矽膜。 (聚合性組成物的製備) 製備具有下表所示組成的包含丙烯酸酯化合物7 2g、 紫外線聚合起始劑(日本Siber Hegner公司製造的KT046) 0.6 g及2-丁酮11〇 g的聚合性組成物。另外,於添加添加 劑時’亦更調配酸性單體(日本化藥公司製造的pM_21) 0.5 g及/或3-丙烯醯氧基丙基三曱氧基矽烷(信越化學公 司製造的 KBM5103) 1.6g。 <溶劑塗布> 於PEN膜上用旋塗機塗布以上所製備的聚合性組成 物,利用氮氣置換法使氧濃度為〇 1%以下,使用高壓水銀 燈以下表所示的累計光量及照度來照射紫外線,而使有機 層硬化,形成獏厚約5〇〇 nm的有機層。 <氣相成膜> 於PEN膜上於真空下閃蒸鍍以上製備的聚合性組成 物,直接於真空下用高壓水銀燈以下表所示累計光量及照 度照紫外線使有機層硬化,形成膜厚約5〇〇nm的有機層。 (無機層的製作) 於上述有機層的表面以電漿CVD法製作氮化矽膜。 24 201235213 對所得的氣體阻障膜進行以下的評價。 (利用鈣法的阻障性能評價) 使用 G. Nisato、P. C. P. Bouten、P. J· Slikkerveer 等人 的國際資訊顯示學會(SID)國際顯示研究會議的會議記 錄1435〜1438頁所述方法測定水蒸氣透過率(g/m2/day )。 此時的溫度設定為40°C,相對濕度設定為90%。 (二次堆疊物的製作) 於上述氣體阻障膜的無機層的表面進一步依序積層有 機層及無機層。 (加熱評價) 對如上製作的二次堆疊物於20(TC烘箱中烘烤2小時 後’對中央15 cmx25 cm的部分的鼓起的個數進行計數。 下表中的化合物如下。 PE 4A .共榮社化學公司製造的Ught Acrylate PE-4A,官 能基數量為4 Μ 4〇8東亞合成公司製Aronix M-408 ,官能基數量為3 A_BPE_4 :新中村化學公司製造的NK Ester A-BPE-4,官 能基數量為2 M 350東亞合成公司製ΑΓ〇ηιχΜ·35〇,官能基數量為3 NK Ester A-BPE-10 A-BPE-10 :新中村化學公司製造的 官能基數量為2 7〇1A ·新中村化學公司製NK Ester 701Λ,官能基數量為2 A-600 :新中村化學製ΝΚΕ^Α__,官能基數量為2 下表中’固體或液體的狀態為25°C、-大氣壓下的狀 25 201235213τ 態。黏度為25°C、一大氣壓下用ε型黏度計測的黏度,單 位為mPa.s。添加劑為〇時表示含有上述酸性單體及3-丙烯 醯氧基丙基二甲氧基石夕烧兩者。UV照度單位為「mw/sec」。Zeonor 1600: 160 ° C), polyarylate (PAr: 210 ° C), polyether oxime (PES: 220 ° C), polyfluorene (PSF: 190 ° C), cyclic olefin copolymer (COC: 曰 patent Compound No. 2001-150584: 162. (:), polyimine (such as Mitsubishi Gas Chemical Company's Neoprim: 260 ° C), 芴 ring modified polycarbonate (BCF-PC: 曰本专利专Compound No. 2000-227603: 225. (:), alicyclic modified polycarbonate (IP_PC: compound of Japanese Patent Laid-Open No. 2000-227603: 205 〇 propylene fluorenyl compound (Japanese Patent Laid-Open No. 2002-80616) Compound: 30 (TC or more) (Tg in parentheses). Particularly, when transparency is required, an alicyclic polyolefin or the like is preferably used. β The substrate of the present invention can be preferably used for water or oxygen, etc., even at room temperature. A sealing of an element which may deteriorate over the years is often used, and an organic electroluminescent element, a liquid crystal display element, a solar cell, a touch panel, etc. may be exemplified. A barrier laminated body of the present invention may be used for film sealing of a device. , that is, the method in which the member itself is a support, and the barrier layer of the present invention is provided on the surface thereof. The device is covered with a protective layer before the barrier layer is placed. The gas barrier film of the invention may also be used as a substrate of the device or a solid protective layer film; the solid sealing method refers to the device, and the agent is beneficial to the heart (4) A method for hardening a layer or a gas barrier surface. The vinegar resin can be exemplified as a thermosetting ring, and the photocurable two <devices> 201235213 air vent layer ruthenium barrier film can be preferably used for the cause Etc.) Causes Sexual Food 1 Inferior = Nitrogen Oxide 'Sulfur Oxide, Ozone Element, Liquid Crystalline Dry Element Plant 1° The above-mentioned examples of reading can be exemplified by organic EL, niobium, thin film transistor, touch Electronic devices such as control panel and electronic 铋=) can be preferably used for two-element devices == Sex: = Membrane seal for the device, that is, the transmissive layer of the disk is the FET device. The r-body sealing method refers to a method in which an adhesive film is formed on a device and a film is cured. Acrylic acid resin, etc., thermosetting epoxy resin, photocurability <organic EL device> An example of a film-transferred organic electroluminescence device is described in detail in Japanese Patent Laid-Open Publication No. 2007-30387. The display component> can be referred to the Japanese Patent Special Report No. 0044. "Others" Other applications can be exemplified: Japanese Patent Special Table 1〇_5121〇4 Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. Japanese Patent Application No. 22 201235213t • Μ. » ^ ^ A solar cell or the like described in Japanese Patent No. 7-160334. <Optical member> An example of the optical member using the gas barrier film of the present invention may, for example, be a circularly polarizing plate or the like. (Circular polarizing plate) The village barrier film of the present invention can be used as a substrate, and a W plate and a polarizing plate can be laminated to form a circularly polarizing plate. At this time, the slow axis of the plate is 45 with the absorption axis of the polarizing plate. Way to layer. Such a polarizing plate is preferably formed at 45 with respect to the length direction (MD). For the polarizing plate extending in the direction, for example, a polarizing plate described in Japanese Laid-Open Patent Publication No. 54 can be suitably used. In addition, when the conventional barrier laminate is incorporated into an organic EL device or the like, the organic layer may be defective to cause damage to itself or an adjacent inorganic layer if the heat is applied, but the present invention can also avoid such a problem. The problem is more meaningful in this regard. For example, even at 150. (: The above is carried out for more than one hour. It is preferably 170 to 20 (the TC is subjected to heat treatment for 丨 to 3 hours, and the gas barrier film can also maintain the barrier property. In the case of a bubble defect, the present invention is also significant in view of this point. Specifically, the barrier layered product and the gas barrier film of the present invention can maintain a barrier property even when heated at 20 (TC for 2 hours or more). The foaming defect of a size of 15 cm x 25 cm is 1 or less. EXAMPLES Hereinafter, the present invention will be more specifically described by way of examples, and the materials, the amounts, the ratios, the treatment contents, the treatment order, and the like shown in the examples are not deviated from the present invention. The scope of the present invention is not limited to the specific examples shown below. 23 201235213r Production of gas barrier film PEN film (Te 〇nex q65FA manufactured by Teijin DuPont, thickness 1 〇〇 (4), Tg =113 C ) The A4 size was cut and the inorganic layer, the organic layer, and the inorganic layer were sequentially formed on the surface in the following order and evaluated. (Production of Inorganic Layer) Nitridation by plasma CVD on the surface of the PEN film Film (Preparation of polymerizable composition) 72 g of an acrylate compound having a composition shown in the following table, an ultraviolet polymerization initiator (KT046 manufactured by Siber Hegner Co., Ltd.), 0.6 g, and 2-butanone 11 g were prepared. Polymeric composition. In addition, when adding an additive, an acidic monomer (pM_21 manufactured by Nippon Kayaku Co., Ltd.) 0.5 g and/or 3-propenyloxypropyltrimethoxy decane (manufactured by Shin-Etsu Chemical Co., Ltd.) was further blended. KBM5103) 1.6g. <Solvent Coating> The polymerizable composition prepared above was applied onto a PEN film by a spin coater, and the oxygen concentration was 〇1% or less by a nitrogen gas displacement method, and a high pressure mercury lamp was used as shown in the following table. The integrated light amount and illuminance are irradiated with ultraviolet rays to harden the organic layer to form an organic layer having a thickness of about 5 〇〇 nm. <Vapor Phase Film Formation> Polymerization prepared by flash evaporation on a PEN film under vacuum The composition is directly dried under vacuum using a high-pressure mercury lamp as shown in the following table to illuminate the organic layer by ultraviolet light to form an organic layer having a film thickness of about 5 Å. (Production of the inorganic layer) On the surface of the above organic layer The ruthenium nitride film was produced by a plasma CVD method. 24 201235213 The gas barrier film obtained was evaluated as follows. (Evaluation of barrier properties by calcium method) Using G. Nisato, PCP Bouten, P. J. Slikkerveer, etc. The method of measuring the water vapor transmission rate (g/m2/day) by the method described in the International Society for the Display of Information (SID) International Display Research Conference, pages 1435 to 1438. The temperature is set to 40 ° C and the relative humidity is set to 90%. . (Preparation of Secondary Stack) An organic layer and an inorganic layer are further laminated on the surface of the inorganic layer of the gas barrier film. (Heating evaluation) The number of bulging portions of the central 15 cm x 25 cm portion was counted in 20 (baked in a TC oven for 2 hours) in the secondary stack prepared as above. The compounds in the following table are as follows. Ught Acrylate PE-4A manufactured by Kyoeisha Chemical Co., Ltd. has a functional group of 4 Μ 4〇8 Aronix M-408 manufactured by Toagosei Co., Ltd., and the number of functional groups is 3 A_BPE_4: NK Ester A-BPE manufactured by Shin-Nakamura Chemical Co., Ltd. 4, the number of functional groups is 2 M 350 East Asia Synthesis Co., Ltd. ΑΓ〇ηιχΜ·35〇, the number of functional groups is 3 NK Ester A-BPE-10 A-BPE-10: The number of functional groups manufactured by Shin-Nakamura Chemical Co., Ltd. is 2 7 〇1A ·Naka Nakamura Chemical Co., Ltd. NK Ester 701Λ, the number of functional groups is 2 A-600: Xinzhongcun Chemical ΝΚΕ^Α__, the number of functional groups is 2 The following table shows the state of solid or liquid is 25 ° C, - atmospheric pressure The shape of the lower 25 201235213 τ. The viscosity is 25 ° C, the viscosity measured by the ε-type viscosity meter at one atmosphere, the unit is mPa.s. When the additive is 〇, it means the above acidic monomer and 3-acryloxypropyl propyl group Both of the methoxylates are burned. The UV illuminance unit is "mw/sec".
由上表可知,使用本發明所用的聚合性組成物時,即 使以塗布將有機層形成層狀並使其硬化,亦可將鼓起個數 減少至與以氣相蒸鍍形成有機層時相同的水準(實例8與 比較例1)。進而可知,鼓起個數的減少於添加含院氧石夕^ 基的丙烯酸酯時更明顯(實例1與3、實例4與8 )。亦^ 知,即使以塗布使有機層形成層狀並使其硬化,於聚入2 組成物中所含的(甲基)丙烯酸酯的黏度低(比較例2、6、^ 時’鼓起個數亦變多。特別由比較例2與4的比較明 知,即使同樣是以丙烯酸酯為主成分的聚合性組成物,可 於 26 201235213 < Λ. < ^/ ^/ 使用本發明範圍外的聚合性組 層製膜時鼓起個數非常少。即可* ^ ’以氣相蒸鍍將有機 組成物的組成於以塗布形成有機二本 別是比較例2’其儘管添加了含,大貝獻°特 鼓起個數方神明_差。㈣魏基的㈣酸醋, 容可知,將含有以固體成分計5〇wt%以上的 喊^作騎合如成物㈣為層狀而 Γ" θ g卩可獲得與氣體騎同等的優良的阻障性積 層體’所述(甲基)丙烯酸醋為於25。0、一大氣壓下硬化前 黏度彻秦以上的液體或固體,且(甲基)丙稀酸當量為 260^以下。而且可知,該效果於聚合性組成物含有含(甲基) 丙細醯氧基的石夕烧偶合劑時更為明顯。 進而可知,如將使有機層硬化時的紫外線照度設定為 1000 mw/s以下,則鼓起個數進一步減少。 有機電致發光元件的製作 對具氧化銦錫膜的導電性玻璃基板(表面阻值1〇Ω/口) 以2-丙醇清洗後,進行1〇分鐘的紫外線_臭氧處理。於該 基板(陽極)上以真空蒸鍍法依序蒸鍍以下的化合物層。 (第1電洞傳輸層) 銅酞菁:膜厚10 nm (第2電洞傳輸層) N,N'-二苯基-N,N’-二萘基聯苯胺:膜厚4〇nm (發光層兼電子傳輸層) 三(8-羥基喹啉)鋁:膜厚60 nm 27 201235213 (電子注入層) 鼠化鐘.膜厚1 nm 於其上蒸鍍100 nm的金屬鋁作為陰極,於其上以平 行平板^:VD法形成厚3㈣的氮化石夕膜製作有機虹元件。 接著使用熱硬化型黏接劑(Daizo-Nichimoly公司製的 Epotek 310) ’於製得的有機el元件上將實例丨所得氣體 阻J1 羊膜於180 C處理2小時,再以阻障性積層體位於有機 EL元件側的方式貼合,於65°C加熱3小時使接著劑硬化。 用電源測量單元(Keithley公司製SMU2400型Source Measure Unit)對剛製作後的有機EL元件施加7 V電壓使 其發光。使用顯微鏡觀察發光面狀,結果確認到提供了無 暗點(dark spot)的均勻發光。 另一方面,將氣體阻障膜換成比較例2中製作的氣體 阻障膜,其他條件相同而進行製作,該情形下可見暗點不 均勻,而無法獲得均勻的發光。 【圖式簡單說明】 益〇 【主要元件符號說明】 益〇 28As is apparent from the above table, when the polymerizable composition used in the present invention is used, even if the organic layer is layered and cured by coating, the number of bulging can be reduced to be the same as when the organic layer is formed by vapor phase vapor deposition. Level (Example 8 and Comparative Example 1). Further, it can be seen that the reduction in the number of bulges is more pronounced when the acrylate containing the oxynose group is added (Examples 1 and 3, Examples 4 and 8). It is also known that even if the organic layer is layered and hardened by coating, the viscosity of the (meth) acrylate contained in the composition of the poly 2 is low (Comparative Examples 2, 6, and ^) In particular, it is known from the comparison of Comparative Examples 2 and 4 that even a polymerizable composition mainly composed of an acrylate can be used outside the scope of the present invention at 26 201235213 < Λ. < ^/ ^/ The number of bulges in the polymerizable group film formation is very small. That is, * ^ 'The composition of the organic composition is formed by vapor phase evaporation to form an organic compound, which is Comparative Example 2', although it is added, Dabei offers a special number of gods _ poor. (4) Weiji's (four) sour vinegar, Rong knows that it will contain more than 5〇wt% of the solid content of the call for the ride as a thing (four) as a layer and Γ" ; θ g卩 can obtain the same excellent barrier layered body as the gas rider'. The (meth)acrylic acid vinegar is a liquid or solid which has a viscosity before the hardening at 2,500 atmospheres, and The base acid equivalent is 260 Å or less. It is also known that the effect is that the polymerizable composition contains (meth) propyl group. Further, it is more obvious that the oxime coupling agent of the fine oxime is more effective. When the ultraviolet illuminance when the organic layer is cured is set to 1000 mw/s or less, the number of bulging is further reduced. A conductive glass substrate (surface resistance of 1 〇 Ω / port) having an indium tin oxide film was prepared and washed with 2-propanol, and then subjected to ultraviolet ray treatment for 1 minute. Vacuum evaporation was performed on the substrate (anode). The following compound layer was vapor-deposited by plating (first hole transport layer) copper phthalocyanine: film thickness 10 nm (second hole transport layer) N, N'-diphenyl-N, N'-two Naphthylbenzidine: film thickness 4〇nm (light-emitting layer and electron transport layer) tris(8-hydroxyquinoline)aluminum: film thickness 60 nm 27 201235213 (electron injection layer) ratification clock. film thickness 1 nm on it A 100 nm metal aluminum was vapor-deposited as a cathode, and an organic rainbow element was formed by forming a 3 (4) thick nitride film by a parallel plate: VD method. Next, a thermosetting adhesive (Epotek 310 manufactured by Daizo-Nichimoly Co., Ltd.) was used. 'On the prepared organic EL element, the gas obtained by the example 阻J1 amniotic membrane was treated at 180 C for 2 hours, and then The barrier laminate was placed on the side of the organic EL element, and the adhesive was cured by heating at 65 ° C for 3 hours. The power measurement unit (SMU 2400 Source Measure Unit manufactured by Keithley Co., Ltd.) was applied to the organic EL element immediately after fabrication. The light was irradiated at a voltage of 7 V. The light-emitting surface was observed using a microscope, and it was confirmed that uniform light emission without a dark spot was provided. On the other hand, the gas barrier film was replaced with the gas barrier produced in Comparative Example 2. The film was produced under the same conditions, and in this case, dark spots were uneven, and uniform light emission could not be obtained. [Simple description of the diagram] Benefits [Description of main components] Yishun 28
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| Application Number | Priority Date | Filing Date | Title |
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| JP2011039979A JP5620852B2 (en) | 2011-02-25 | 2011-02-25 | Barrier laminate and method for producing barrier laminate |
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| TW201235213A true TW201235213A (en) | 2012-09-01 |
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| TW101106050A TW201235213A (en) | 2011-02-25 | 2012-02-23 | Barrier laminate and method for producing barrier laminate |
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| JP (1) | JP5620852B2 (en) |
| TW (1) | TW201235213A (en) |
| WO (1) | WO2012115175A1 (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105102216A (en) * | 2013-03-29 | 2015-11-25 | 琳得科株式会社 | Laminated body, manufacturing method thereof, component for electronic equipment, and electronic equipment |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20170129216A1 (en) * | 2014-07-02 | 2017-05-11 | Kuraray Co., Ltd. | Multilayer structure, method for producing same, packaging material and product including same, and electronic device |
| WO2016133038A1 (en) * | 2015-02-20 | 2016-08-25 | 東洋紡株式会社 | Transparent barrier film |
| WO2016133039A1 (en) * | 2015-02-20 | 2016-08-25 | 東洋紡株式会社 | Transparent barrier film and method for producing same |
| JP6614134B2 (en) * | 2015-02-20 | 2019-12-04 | 東洋紡株式会社 | Production method of transparent barrier film |
| JP7222976B2 (en) * | 2018-03-23 | 2023-02-15 | リンテック株式会社 | Gas barrier laminate |
| CN116096563B (en) * | 2020-08-19 | 2025-02-28 | 柯尼卡美能达株式会社 | Composition for electronic device encapsulation, method for forming electronic device encapsulation film, and electronic device encapsulation film |
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| JP4677692B2 (en) * | 2000-11-10 | 2011-04-27 | 凸版印刷株式会社 | Transparent gas barrier material and method for producing the same |
| JP2006119772A (en) * | 2004-10-19 | 2006-05-11 | Nof Corp | Surface material for pen input device |
| JP4918767B2 (en) * | 2005-09-16 | 2012-04-18 | 凸版印刷株式会社 | Gas barrier laminated film |
| JP2008023928A (en) * | 2006-07-25 | 2008-02-07 | Toppan Printing Co Ltd | LAMINATE, ITS MANUFACTURING METHOD, AND LAMINATE MANUFACTURING DEVICE |
| JP2009095989A (en) * | 2007-10-12 | 2009-05-07 | Fujifilm Corp | Gas barrier film and environmentally sensitive device |
| JP5281964B2 (en) * | 2008-06-26 | 2013-09-04 | 富士フイルム株式会社 | Barrier laminate, gas barrier film, device and laminate production method |
-
2011
- 2011-02-25 JP JP2011039979A patent/JP5620852B2/en not_active Expired - Fee Related
-
2012
- 2012-02-23 WO PCT/JP2012/054341 patent/WO2012115175A1/en active Application Filing
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105102216A (en) * | 2013-03-29 | 2015-11-25 | 琳得科株式会社 | Laminated body, manufacturing method thereof, component for electronic equipment, and electronic equipment |
| TWI624363B (en) * | 2013-03-29 | 2018-05-21 | Lintec Corp | Laminated body, manufacturing method thereof, member for electronic device, and electronic device |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2012115175A1 (en) | 2012-08-30 |
| JP2012176519A (en) | 2012-09-13 |
| JP5620852B2 (en) | 2014-11-05 |
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