TWM445688U - Up and down alignment inspection system - Google Patents
Up and down alignment inspection system Download PDFInfo
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- TWM445688U TWM445688U TW101214776U TW101214776U TWM445688U TW M445688 U TWM445688 U TW M445688U TW 101214776 U TW101214776 U TW 101214776U TW 101214776 U TW101214776 U TW 101214776U TW M445688 U TWM445688 U TW M445688U
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- 238000007689 inspection Methods 0.000 title claims description 89
- 238000007648 laser printing Methods 0.000 claims description 38
- 238000012545 processing Methods 0.000 claims description 35
- 238000012937 correction Methods 0.000 claims description 14
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 13
- 238000003860 storage Methods 0.000 claims description 6
- 238000000034 method Methods 0.000 description 26
- 239000000758 substrate Substances 0.000 description 23
- 239000000523 sample Substances 0.000 description 8
- 238000010894 electron beam technology Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 239000000945 filler Substances 0.000 description 6
- 238000001514 detection method Methods 0.000 description 5
- 230000002950 deficient Effects 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 238000007639 printing Methods 0.000 description 4
- 229910000679 solder Inorganic materials 0.000 description 4
- 238000003384 imaging method Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 230000000737 periodic effect Effects 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 238000012795 verification Methods 0.000 description 3
- 238000011179 visual inspection Methods 0.000 description 3
- 238000004364 calculation method Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 239000000839 emulsion Substances 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- 239000007790 solid phase Substances 0.000 description 2
- 230000004308 accommodation Effects 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 238000009412 basement excavation Methods 0.000 description 1
- 230000002457 bidirectional effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 238000009795 derivation Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000010330 laser marking Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000002493 microarray Methods 0.000 description 1
- 238000012543 microbiological analysis Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
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- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Description
本創作係關於一種上下對位檢查系統,尤指一種雷射打印對位檢正系統。This creation is about a top and bottom alignment check system, especially a laser print alignment check system.
在一般習知技術中,對於新產品經雷射打印後之偏移打印產品(即待檢測產品),作業人員經常發生雷射打印需補正調校,需使用圖樣檢測遮罩(Mask)以人工作業方式逐一比對其偏位差值,而人工比對補正調校對位不易且不便利,且會造成作業人員耗時耗工之問題。In the conventional art, for the offset printing product (ie, the product to be inspected) after the laser printing of the new product, the operator often needs to correct the laser printing, and the mask is used to detect the mask. The operation mode is different from the deviation of the operation mode, and the manual comparison correction is not easy and inconvenient, and the problem of time and labor for the operator is caused.
關於產品或製程之檢正,多個相關專利如下。Regarding the verification of products or processes, a number of related patents are as follows.
TW I358244揭示一種用於填料角檢查的檢查基準資料之設定方法、及使用該方法的基板外觀檢查裝置。本發明的課題為自動地設定適合實際之填料角的形狀之檢查基準資料。本發明的解決方式為對各元件種類,將在其元件種類之元件所產生的填料角形狀分類成複數種型式,並製作對各型式所登錄臨限值導出法則等之檢查基準資料的檢查基準資料庫。對此資料庫的各填料角型式,各自將填料角形成前之乳液焊膏之高度範圍賦與對應。在教導時,對和教導對象之元件對應的各接線座,設定接線座視窗,而且使用CAD資料或元件形狀資料算出塗布於接線座之乳液焊膏高度。此外,將從檢查基準資料庫讀出和所算出之焊料高度對應的填料角型式之檢查基準資料,賦與對應於接線座視窗的設定資訊,並登錄於檢查裝置的記憶體。TW I358244 discloses a method for setting inspection reference data for filler angle inspection, and a substrate appearance inspection device using the same. An object of the present invention is to automatically set inspection reference data suitable for the shape of an actual filler angle. The solution of the present invention is to classify the shape of the filler angular shape generated by the component of the component type into a plurality of types for each component type, and to prepare a test standard for the inspection reference data such as the threshold value derivation rule for each type of registration. database. For each of the filler angle patterns of the database, each of the height ranges of the emulsion solder paste before the formation of the filler angle is assigned. At the time of teaching, the terminal block window is set for each of the terminal blocks corresponding to the components of the teaching object, and the height of the emulsion solder paste applied to the terminal block is calculated using CAD data or component shape data. Further, the inspection reference data of the filler angle type corresponding to the calculated solder height is read from the inspection reference database, and the setting information corresponding to the terminal block window is given and registered in the memory of the inspection apparatus.
TW I349775揭示一種電子線裝置、基板檢查裝置及檢測器定位方法,可使SEM方式之檢查裝置的檢查速度更加快速、亦即提高處理量的方法。檢查基板表面之檢查裝置,由電子源所產生之電子作成交迭後,於試料W之方向以所希望之倍率成像並作成交迭。在通過該交迭時,於開口去除由該交迭變為雜訊之電子,將該交迭設成所希望之倍率,並進行調整使該交迭形成平行之電子線而以所希望之剖面形狀照射基板。製作電子線使此時的電子線的照度不均度低於10%。由試料W放出之電子係藉由檢測器(25.11)檢出。TW I349775 discloses an electronic wire device, a substrate inspection device and a detector positioning method, which can make the inspection speed of the SEM inspection device faster, that is, a method for increasing the throughput. The inspection device for inspecting the surface of the substrate is formed by the electrons generated by the electron source, and is imaged at the desired magnification in the direction of the sample W and is folded. When the overlap is passed, the electrons that become the noise are removed from the opening, the overlap is set to a desired magnification, and the overlap is adjusted so that the overlap forms a parallel electron line to the desired profile. The shape illuminates the substrate. The electron beam is made such that the illuminance unevenness of the electron beam at this time is less than 10%. The electrons emitted from the sample W are detected by the detector (25.11).
TW I329741揭示一種具有整合流體入口及出口的分析裝置及微陣列,該裝置由平面固相親水性基質環道構成,其中平面固相親水性基質環道包含乾燥化學試劑,該化學試劑覆蓋在一體成型的電動幫浦電極上,親水性基質環道被密封於氣體可滲透電絕緣體中,該裝置可用於微量生物分析、混合物分離及反應。TW I329741 discloses an analytical device and microarray having an integrated fluid inlet and outlet, the device consisting of a planar solid phase hydrophilic matrix loop, wherein the planar solid phase hydrophilic matrix loop contains dry chemical reagents, which are integrated in one On the shaped electric pump electrode, the hydrophilic matrix loop is sealed in a gas permeable electrical insulator, which can be used for microbiological analysis, mixture separation and reaction.
TW I307407揭示一種工業產品的目視檢查支援裝置。本發明能夠活用來自於其他檢查裝置的各種資訊,能容易地找出電子電路零件等的不良位置,能以相同的操作進行確認作業,能確實地進行目視檢查。本發明是具有以從不同方向來分別拍攝檢查對象的至少第一攝影機與第二攝影機所構成的攝影單元的工業製品的目視檢查支援裝置,是具備有:收集其他檢查裝置的檢查結果等,來作成檢查結果資料的檢查結果收集及檢查結果資料作成手段、以及用來追蹤上述其他檢查裝置已經判 斷出的不良位置的不良位置追蹤手段,將以上述檢查結果收集及檢查結果資料作成手段所收集的檢查結果等提供到上述不良位置追蹤手段,根據以上述檢查結果收集及檢查結果資料作成手段所作成的上述檢查結果資料來驅動上述攝影單元。TW I307407 discloses a visual inspection support device for industrial products. According to the present invention, various information from other inspection apparatuses can be utilized, and it is possible to easily find a defective position of an electronic circuit component or the like, and it is possible to perform a confirmation operation by the same operation, and it is possible to perform a visual inspection reliably. The present invention is a visual inspection support device having an industrial product in which at least a first camera and a second camera of an inspection target are imaged in different directions, and includes an inspection result of collecting another inspection device, and the like. The result of the inspection result collection and the inspection result data preparation means, and the other inspection apparatus used to track the above have been judged The defective position tracking means for the defective position is provided to the above-described defective position tracking means by the inspection result collected by the above-mentioned inspection result collection and inspection result data creation means, and based on the above-mentioned inspection result collection and inspection result data creation means The above-described inspection result data is created to drive the above-described photographing unit.
TW I299083揭示一種用於檢查基板的方法及設備。當印刷焊料、安裝組件及針對一焊接製程加熱一基板時,使用檢查設備以檢查該基板。在一生產製程(例如:組件安裝製程及焊接製程)前後攝取該基板之影像及擷取該等影像之差異。在該基板上之每一組件可以藉由差分及二值化處理來識別及決定對應於已識別組件之視窗的設定條件。依據所決定之設定條件設定視窗,以便藉由使用在該等設定視窗中之影像資料及對應於組件識別資料之標準檢查資料來檢查該基板之狀態。TW I299083 discloses a method and apparatus for inspecting a substrate. When printing solder, mounting components, and heating a substrate for a soldering process, an inspection device is used to inspect the substrate. The image of the substrate is taken before and after a manufacturing process (eg, component mounting process and soldering process) and the difference between the images is taken. Each component on the substrate can identify and determine the setting conditions of the window corresponding to the identified component by differential and binarization processing. The window is set according to the determined setting conditions to check the state of the substrate by using the image data in the setting windows and the standard inspection data corresponding to the component identification data.
TW 201129795揭示一種檢查方法、檢查裝置及電子線裝置。本發明之檢查方法係檢查形成於基板上的圖案之方法,其係對於一晶粒內之圖案為以週期構造構成的部份,進行該週期構造內之圖案間的比較,對於前述圖案為非以週期構造構成的部份係進行前述晶粒與其他晶粒的比較。TW 201129795 discloses an inspection method, an inspection device and an electronic wire device. The inspection method of the present invention is a method for inspecting a pattern formed on a substrate by performing a comparison between patterns in the periodic structure for a portion of a pattern in a crystal grain having a periodic structure, and the pattern is not The portion formed by the periodic structure is compared with the other crystal grains.
TW 201130010揭示一種電子線裝置、電子線檢查裝置及曝光條件決定方法。該電子線裝置係具備有:使電子束對著試料照射之裝置;將藉由該電子束之對前述試料的照射而獲得前述試料之表面資訊的電子放大投影並使之成像於檢測器的裝置;以及將成像於前述檢測器之前述電子合成為影像的裝置,其中,前述電子束與前述電子,係藉由利用電場與磁場之偏向 器加以分離,前述電子到達前述檢測器的比率為4至40%。TW 201130010 discloses an electronic wire device, an electronic wire inspection device, and a method for determining exposure conditions. The electron beam apparatus includes: a device that irradiates an electron beam against a sample; and an apparatus that obtains an electronic magnification projection of surface information of the sample by irradiation of the electron beam with the electron beam and forms the image on the detector. And a device for synthesizing the aforementioned electrons formed on the detector into an image, wherein the electron beam and the electron are biased by an electric field and a magnetic field The device is separated, and the ratio of the aforementioned electrons to the aforementioned detector is 4 to 40%.
TW 201128182揭示一種異物檢查裝置及檢查方法,能夠將存在於透明平板基板表面背面之微細的異物利用光散射方式高感度地檢出,而且能夠確實地判別異物是存在於表面抑或背面之哪一面。本發明之解決手段係一種於透明平板基板利用投光系照射檢出光,且利用受光系接收存在於前述透明平板基板之異物所形成之散射光並檢出前述異物的存在之異物檢查裝置,具備:於前述透明平板基板之表面對著前述透明平板基板之基板法線以特定射入角照射前述檢出光之投光系;被設於前述表面側,以前述檢出光之照射點為基準,被設在與前述投光系大略對稱之位置,接收前述檢出光照射到異物時之散射光之第1受光系;與在前述表面側,被設於前述檢出光之照射點的大致頭上,接收前述散射光之第2受光系。TW 201128182 discloses a foreign matter inspection device and an inspection method, which can detect a fine foreign matter existing on the back surface of a transparent flat substrate by a light scattering method with high sensitivity, and can reliably determine which side of the surface or the back surface the foreign matter exists. The solution of the present invention is a foreign matter inspection device that illuminates the detection light by the light projecting system on the transparent flat substrate, and receives the scattered light formed by the foreign matter existing on the transparent flat substrate by the light receiving system, and detects the presence of the foreign matter. The light-emitting system is configured to irradiate the detection light with a specific incident angle on a surface of the transparent flat substrate opposite to the substrate of the transparent flat substrate, and is disposed on the surface side, and the irradiation point of the detection light is The reference is provided at a position slightly symmetrical with the light projecting system, and receives a first light receiving system that scatters light when the detected light is irradiated onto the foreign matter; and is provided at an irradiation point of the detected light on the surface side The second light receiving system that receives the scattered light is received substantially on the head.
TW 201009971揭示一種針跡檢查裝置、探針裝置及針跡檢查方法以及記憶媒體。本發明之課題為:針對檢查後之基板,而能夠將電極墊片之基底層的露出等之有無的露出狀況自動地且高精確度地檢測出來之針跡檢查裝置、和具備有該當裝置之探針裝置、以及針跡檢查方法、還有被記憶有該檢查方法之實行程式的記憶媒體。本發明之解決手段為:在針跡檢查裝置中,係具備有:從藉由對電極墊片作攝像之上攝像機所得到之攝像資料來將針跡區域抽出之針跡區域抽出部;和對於針跡區域,而取得將在該當針跡區域之長度方向而延伸之中心線上的像素之位置與像素之灰階準位作了對應的灰階圖案之灰階 準位資料取得部;和根據所得到之灰階圖案、以及當基底層從針跡而露出時之基準圖案,來判定基底層是否露出之深挖掘判定部。TW 201009971 discloses a stitch inspection device, a probe device, a stitch inspection method, and a memory medium. An object of the present invention is to provide a stitch inspection device capable of automatically and highly accurately detecting an exposure state of an underlayer of an electrode pad, such as an exposed substrate, and a device having the same The probe device, the stitch inspection method, and a memory medium in which the execution program of the inspection method is stored. The solution of the present invention is that, in the stitch inspection device, the stitch region extracting portion that extracts the stitch region from the image pickup data obtained by the camera on the electrode pad; and The stitch area is obtained, and the gray scale of the gray scale pattern corresponding to the position of the pixel on the center line extending in the longitudinal direction of the stitch area and the gray scale level of the pixel is obtained. a level data acquisition unit; and a deep excavation determination unit that determines whether or not the base layer is exposed based on the obtained gray scale pattern and the reference pattern when the base layer is exposed from the stitch.
TW 201009973揭示一種針跡檢查裝置,探針裝置及針跡檢查方法以及記憶媒體。本發明之課題為:針對檢查後之基板,而能夠將電極墊片之基底層的露出等之有無的露出狀況自動地且高精確度地檢測出來之針跡檢查裝置、和具備有該當裝置之探針裝置、以及針跡檢查方法、還有被記憶有該檢查方法之實行程式的記憶媒體。本發明之解決手段:RGB成分取得部,係取得從R成分資料、G成分資料以及B成分資料中而因應於電極墊片之材質與基底層之材質間的反射率之差所選擇了的B成分資料;和B成分直方圖取得部,係對於B成分資料,而求取出為了和電極墊片作區別地來取得基底層之畫像而設定之灰階準位、和具備有此灰階準位之像素數,其兩者間的關係資料,根據所求取出之直方圖,來對於在針跡處之基底層的露出之有無作判定。TW 201009973 discloses a stitch inspection device, a probe device and a stitch inspection method, and a memory medium. An object of the present invention is to provide a stitch inspection device capable of automatically and highly accurately detecting an exposure state of an underlayer of an electrode pad, such as an exposed substrate, and a device having the same The probe device, the stitch inspection method, and a memory medium in which the execution program of the inspection method is stored. The RGB component acquisition unit obtains the B selected from the R component data, the G component data, and the B component data in accordance with the difference in reflectance between the material of the electrode pad and the material of the base layer. The component data and the B component histogram acquisition unit obtain the gray scale level set for obtaining the image of the base layer in distinction with the electrode pad for the B component data, and the gray scale level is provided. The number of pixels, the relationship between the two, is determined based on the histogram taken out, and the presence or absence of the exposure of the underlying layer at the stitching.
TW 200844647揭示一種光罩之檢查裝置、光罩之檢查方法、液晶裝置製造用光罩之製造方法以及圖案轉印方法。在本發明的光罩的檢查裝置中,由光罩保持部保持光罩,來自光源的既定波長的光束經由照明光學系照射至光罩,經由對物透鏡系,由攝影元件對光罩的像做攝影。使照明光學系、對物透鏡及攝影元件的光軸一致,對物透鏡系及攝影元件在光軸方向上相互獨立移動操作,而對光罩的像做攝影。TW 200844647 discloses an inspection apparatus for a photomask, a method of inspecting a photomask, a method of manufacturing a photomask for manufacturing a liquid crystal device, and a pattern transfer method. In the inspection apparatus for a mask according to the present invention, the mask is held by the mask holding portion, and a light beam of a predetermined wavelength from the light source is irradiated to the mask through the illumination optical system, and the image of the mask is formed by the imaging element via the objective lens system. Do photography. The optical axes of the illumination optical system, the objective lens, and the imaging element are aligned, and the objective lens system and the imaging element are independently moved in the optical axis direction, and the image of the photomask is photographed.
TW 200641340揭示一種應變矽晶圓表面檢查方法及檢查裝置。本發明之應變矽晶圓表面檢查方法包含拍攝步驟及合成影像生成步驟,而該拍攝步驟係在對旋轉之應變矽晶圓表面照射源自光源裝置之光的環境下,藉由相對於應變矽晶圓之表面而以預定位置關係加以設置之攝像裝置,以可拍攝到顯現於應變矽晶圓表面上之明線的拍攝條件,於各多數旋轉角度位置拍攝應變矽晶圓表面。又,該合成影像生成步驟係由藉攝像裝置而得之於多數旋轉角度位置上的應變矽晶圓其表面影像,生成預定旋轉角度位置上之合成影像者。TW 200641340 discloses a strain enthalpy wafer surface inspection method and inspection device. The method for inspecting the strained wafer surface of the present invention comprises a photographing step and a synthetic image generating step, wherein the photographing step is performed in an environment of irradiating the surface of the strained wafer with the light from the light source device, by relative to the strain The image pickup device provided on the surface of the wafer in a predetermined positional relationship captures the surface of the strained wafer at a plurality of rotation angle positions by photographing conditions of the bright line appearing on the surface of the strained wafer. Further, the synthetic image generating step is performed by a surface of the wafer obtained by the image pickup device at a plurality of rotation angle positions to generate a composite image at a predetermined rotation angle position.
在上述習知專利技術中,皆無提供一種進行自動(如E化)雷射打印檢正之系統或方法,仍然無法減少因作業人員人工作業而耗時耗工及精度誤差率高之現象產生、亦無法減少錯誤率。In the above-mentioned prior patent technology, there is no system or method for performing automatic (such as E) laser printing correction, and it is still unable to reduce the time-consuming labor and high precision error rate caused by the manual operation of the operator. Unable to reduce the error rate.
因此,有必要提供一種新穎且具有進步性之對位檢正系統,以改善上述之問題。Therefore, it is necessary to provide a novel and progressive alignment check system to improve the above problems.
因此,為解決上述問題,本創作之主要目的係在提供一種上下對位檢查系統,可進行自動雷射打印補正調校,減少耗時耗工及精度誤差,並減少錯誤率,且可將作業電子化(E化)。Therefore, in order to solve the above problems, the main purpose of the present invention is to provide an upper and lower alignment check system, which can perform automatic laser print correction correction, reduce time-consuming labor and precision errors, and reduce error rate, and can work Electronic (E).
為達到上述目的,本創作所使用的主要技術手段是採用以下技術方案實現的:一種上下對位檢查系統,供檢正具有雷射打印之待檢正產品,該雷射打印係位於該待檢正產品之其中一側,該上下對位檢查系統包含:一基座;一可透視平台,設於 該基座,供置放該待檢正產品;一第一對位單元,設於該可透視平台之下側,用以取得該待檢正產品之下側影像訊號並傳送至該處理單元;一第二對位單元,設於該可透視平台之上側,用以取得該待檢正產品之上側影像訊號並傳送至該處理單元;及一處理單元,用以依據該下側影像訊號計算對應該下側影像之下側對位位置資訊,及依據該上側影像訊號計算對應該上側影像之上側對位位置資訊,並依據該下側對位位置資訊及該上側對位位置資訊計算該待檢正產品之雷射打印偏位差值。In order to achieve the above objectives, the main technical means used in the creation is achieved by the following technical solutions: an upper and lower alignment inspection system for detecting a positive product to be inspected with laser printing, the laser printing system being located at the inspection One side of the positive product, the upper and lower alignment inspection system comprises: a base; a see-through platform, located at The pedestal for placing the product to be inspected; a first aligning unit disposed on the lower side of the fluoroscopic platform for obtaining the image signal of the underside of the product to be inspected and transmitting to the processing unit; a second alignment unit is disposed on the upper side of the fluoroscopic platform for acquiring the image signal of the upper side of the product to be inspected and transmitted to the processing unit; and a processing unit for calculating the pair according to the lower image signal The position information of the lower side of the lower image and the position information of the upper side of the upper image are calculated according to the image signal of the upper side, and the information is calculated according to the information of the lower side position and the position information of the upper side. The laser print deviation of the positive product.
本創作之新型目的及解決其技術問題還可以採用以下技術措施進一步實現。The new purpose of this creation and solving its technical problems can be further realized by the following technical measures.
依上述之一種上下對位檢查系統,其中該第一對位單元包括一第一CCD(電荷耦合元件)裝置,用以取得該下側影像訊號;該第二對位單元包括一第二CCD裝置,用以取得該上側影像訊號。According to the above-described upper and lower alignment inspection system, the first alignment unit includes a first CCD (charge coupled device) device for acquiring the lower image signal; the second alignment unit includes a second CCD device For obtaining the upper video signal.
依上述之一種上下對位檢查系統,其中該第二對位單元另包括一設於該基座之一第二移動機構,該第二CCD裝置設於該第二移動機構且可實質上沿平行該可透視平台表面之方向移動。According to the above-mentioned upper and lower alignment inspection system, the second alignment unit further includes a second moving mechanism disposed on the base, the second CCD device is disposed on the second moving mechanism and can be substantially parallel The fluoroscopic platform surface moves in the direction of the surface.
依上述之一種上下對位檢查系統,其中該第一對位單元另包括一設於該基座之第一移動機構,該第一CCD裝置設於該第一移動機構且可實質上沿平行該可透視平台表面之方向移動。According to the above-mentioned upper and lower alignment inspection system, the first alignment unit further includes a first moving mechanism disposed on the base, the first CCD device is disposed on the first moving mechanism and substantially parallel to the It can move in the direction of the surface of the platform.
依上述之一種上下對位檢查系統,其中該處理單元另包括一控制模組,用以控制該第一及第二對位單元移動。According to the above-mentioned upper and lower alignment check system, the processing unit further includes a control module for controlling the movement of the first and second alignment units.
依上述之一種上下對位檢查系統,另包括一蓋板,具有一可透視窗及一環設於該可透視窗周圍之框體,該框體以其一側可樞擺地設於該基座或該可透視平台而可選擇性地蓋合於該可透視平台。The above-mentioned upper and lower alignment inspection system further includes a cover having a see-through window and a frame disposed around the see-through window, the frame being pivotally disposed on the base Or the fluoroscopic platform can be selectively capped to the fluoroscopic platform.
依上述之一種上下對位檢查系統,其中該處理單元係為一電腦。According to the above-mentioned upper and lower alignment inspection system, the processing unit is a computer.
依上述之一種上下對位檢查系統,其中該處理單元包括一可儲該雷射打印偏位差值之存儲存模組。According to the above-mentioned upper and lower alignment inspection system, the processing unit includes a storage module capable of storing the laser print offset difference.
依上述之一種上下對位檢查系統,另包括一雷射打印裝置,其接收來自該處理單元之該雷射打印偏位差值之訊號並據以進行該待檢正產品之雷射打印補正調校。According to the above-mentioned upper and lower alignment inspection system, further comprising a laser printing device, which receives the signal of the laser printing deviation from the processing unit and performs a laser printing correction of the product to be inspected accordingly school.
相較於習知技術,本創作可利用第一對位單元及第二對位單元進行自動雷射打印檢正,大大減少因作業人員人工作業而耗時耗工及精度誤差率高之現象產生,以減少錯誤率,且可將作業電子化(E化)。Compared with the prior art, the author can use the first aligning unit and the second aligning unit to perform automatic laser printing verification, thereby greatly reducing the time-consuming labor and high precision error rate caused by the manual operation of the operator. To reduce the error rate, and to electronically work (E).
為了讓本創作之上述目的、特徵、優點能更淺顯易懂,下文將特舉本創作較佳實例,並配合所附圖示,做詳細說明如下,其中:第1及2圖為本創作上下對位檢查系統之第一實施態樣之示意圖;第3圖為本創作對位單元可相對待檢正產品移動進行影像擷取之示意圖; 第4圖為本創作待檢正產品之背側示意圖;第5圖為本創作上下對位檢查系統之第二實施態樣之示意圖;及第6圖為本創作上下對位檢查系統之第三實施態樣之示意圖。In order to make the above-mentioned purposes, features and advantages of this creation easier to understand, the following is a detailed example of this creation, and with the accompanying drawings, the following is a detailed description, in which: Figures 1 and 2 are the top and bottom of the creation. A schematic diagram of a first implementation aspect of a registration inspection system; and FIG. 3 is a schematic diagram of image capture of a creative alignment unit that can be moved relative to a positive product to be inspected; Figure 4 is a schematic view of the back side of the product to be inspected; Figure 5 is a schematic view of the second embodiment of the creation of the upper and lower alignment check system; and Figure 6 is the third of the creation of the upper and lower alignment check system A schematic diagram of the implementation.
請配合參閱第1圖至第4圖所示,本創作之第一實施態樣為一種上下對位檢查系統(100),供檢正具有雷射打印(Laser Marking)(420)之待檢正產品(400),該雷射打印(420)係位於該待檢正產品(400)之其中一側,該待檢正產品(400)包括有複數個產品單元(cell)(410),待檢正產品(400)例如可以是半導體產業中之導線架或此類之產品,而產品單元(410)即為各導線架單元,各產品單元(410)之下側可各具有一雷射打印(420)。Please refer to FIG. 1 to FIG. 4 together. The first embodiment of the present invention is an upper and lower alignment inspection system (100) for detecting laser marking (420) to be inspected. a product (400), the laser printing (420) is located on one side of the positive product (400) to be inspected, and the positive product (400) to be inspected includes a plurality of product units (410), to be inspected The positive product (400) may be, for example, a lead frame in the semiconductor industry or a product of this type, and the product unit (410) is each lead frame unit, and each product unit (410) may have a laser print on the lower side ( 420).
該上下對位檢查系統(100)包含一基座(10)、一可透視平台(20)、一蓋板(30)、一第一對位單元(40)、一第二對位單元(50)及一處理單元(60)。The upper and lower alignment inspection system (100) includes a base (10), a see-through platform (20), a cover plate (30), a first alignment unit (40), and a second alignment unit (50). And a processing unit (60).
該基座(10)內部係作為該上下對位檢查系統(100)置放之基礎並供其他構件裝配,且其具有一容置空間。The interior of the base (10) serves as the basis for the placement of the upper and lower alignment inspection system (100) and is assembled for other components, and has an accommodation space.
該可透視平台(20)設於該基座(10)且位於該基座(10)之容置空間上方,而可供置放該待檢正產品(400),該可透視平台(20)較佳係為玻璃基板,然亦可為透明壓克力基板或類似之可透視基板該可透視平台(20)較佳為可拆組的可透視基板及外框所構成。作業人員可以手動方式將該待檢正產品 (400)置放於該可透視平台(20)上供進行後續之影像擷取作業。該待檢正產品(400)係可以其一角對應地置放於緊靠該可透視平台(20)之其中一角,如此可穩定該待檢正產品(400)之定位且利於後續座標值之計算,或可將該待檢正產品(400)置放於該可透視平台(20)之中間部位(如第2圖所示),如此可便於該第一對位單元(40)及該第二對位單元(50)擷取影像。The fluoroscopic platform (20) is disposed on the pedestal (10) and located above the accommodating space of the pedestal (10) for arranging the product to be inspected (400), the fluoroscopic platform (20) Preferably, it is a glass substrate, but it may also be a transparent acrylic substrate or a similar see-through substrate. The fluoroscopic platform (20) is preferably a detachable group of fluoroscopic substrates and an outer frame. The operator can manually check the product to be inspected (400) is placed on the fluoroscopic platform (20) for subsequent image capture operations. The product to be inspected (400) can be placed at a corner of the fluoroscopic platform (20) correspondingly at a corner thereof, so as to stabilize the positioning of the product to be inspected (400) and facilitate calculation of subsequent coordinate values. Or the product (400) to be inspected can be placed in the middle of the fluoroscopic platform (20) (as shown in FIG. 2), so that the first alignment unit (40) and the second can be facilitated. The alignment unit (50) captures an image.
該蓋板(30)具有一可透視窗(32)及一環設於該可透視窗(32)周圍之框體(34),該框體(34)以其一側可樞擺地設於該基座(10)或該可透視平台(20)而可選擇性地蓋合於該可透視平台(20),藉由該蓋板(30)蓋合於該可透視平台(20),可穩定壓掣該待檢正產品(400)於該蓋板(30)與該可透視平台(20)之間而不隨意移動,以利精確地進行檢正作業。在本實施例中,於該框體(34)之與樞設側相對之一側另設有一把件(36)(亦可設於其他左右任一側,或不設亦可),供操作而帶動蓋板(30)進行樞擺,而可令操作人員手動地將該蓋板(30)蓋合於該可透視平台(20)。The cover (30) has a see-through window (32) and a frame (34) disposed around the see-through window (32). The frame (34) is pivotally disposed on one side thereof. The pedestal (10) or the fluoroscopic platform (20) is selectively closable to the fluoroscopic platform (20), and the cover plate (30) is affixed to the fluoroscopic platform (20) for stabilization The product to be inspected (400) is compressed between the cover plate (30) and the fluoroscopic platform (20) without being arbitrarily moved, so as to accurately perform the correcting operation. In this embodiment, a piece (36) is provided on one side of the frame body (34) opposite to the pivoting side (may also be disposed on any other left or right side, or may not be provided) for operation. The cover plate (30) is pivoted, and the operator can manually cover the cover plate (30) to the see-through platform (20).
該第一對位單元(40)設於該可透視平台(20)之下側,用以取得該待檢正產品(400)之下側影像訊號並傳送至該處理單元(60)。在本實施例中,該第一對位單元(40)包括一第一CCD(電荷耦合元件)裝置(42),用以取得該下側影像訊號。要說明的是,該第一對位單元(40)可另包括一設於該基座(10)之第一移動機構(44),該第一CCD裝置(42)設 於該第一移動機構(44)且可實質上沿平行該可透視平台(20)表面作X-Y方向之移動,如此可依需要將該第一CCD裝置(42)移動至預定影像擷取位置,亦即,可將該第一CCD裝置(42)移動至該待檢正產品(400)之各產品單元(410)上方相對位置進行影像擷取。The first alignment unit (40) is disposed on the lower side of the fluoroscopic platform (20) for acquiring the image signal under the side of the product (400) to be inspected and transmitted to the processing unit (60). In this embodiment, the first alignment unit (40) includes a first CCD (charge coupled device) device (42) for acquiring the lower image signal. It should be noted that the first alignment unit (40) may further include a first moving mechanism (44) disposed on the base (10), and the first CCD device (42) is provided. The first moving mechanism (44) can be moved substantially in the XY direction along the surface of the fluoroscopic platform (20), so that the first CCD device (42) can be moved to a predetermined image capturing position as needed. That is, the first CCD device (42) can be moved to a relative position above each product unit (410) of the product under test (400) for image capture.
該第二對位單元(50)設於該可透視平台(20)之上側,用以取得該待檢正產品(400)之上側影像訊號並傳送至該處理單元(60)。在本實施例中,該第二對位單元(50)包括一第二CCD裝置(52),用以取得該上側影像訊號。較佳地,該第二對位單元(50)另包括一設於該基座(10)之一第二移動機構(54),該第二CCD裝置(52)設於該第二移動機構(54)且可實質上沿平行該可透視平台(20)表面作X-Y方向之移動,以依需要將該第二CCD裝置(52)移動至預定影像擷取位置,亦即,可將該第二CCD裝置(52)移動至該待檢正產品(400)之各產品單元(410)上方相對位置進行影像擷取。The second alignment unit (50) is disposed on the upper side of the fluoroscopic platform (20) for acquiring the image signal of the upper side of the product (400) to be detected and transmitted to the processing unit (60). In this embodiment, the second alignment unit (50) includes a second CCD device (52) for acquiring the upper video signal. Preferably, the second alignment unit (50) further includes a second moving mechanism (54) disposed on the base (10), and the second CCD device (52) is disposed on the second moving mechanism ( 54) and moving substantially parallel to the surface of the fluoroscopic platform (20) in the XY direction to move the second CCD device (52) to a predetermined image capturing position as needed, that is, the second The CCD device (52) moves to a relative position above each product unit (410) of the product under test (400) for image capture.
由於該第二對位單元(50)與該第一對位單元(40)之結構及作動方式概為相同,因此圖式中僅繪示出顯示該第一對位單元(40)結構及作動方式之第3圖,合先敘明。Since the structure and the operation mode of the second alignment unit (50) and the first alignment unit (40) are substantially the same, only the structure and operation of the first alignment unit (40) are shown in the drawing. The third picture of the method is described first.
該處理單元(60)(例如一電腦)係與該第一對位單元(40)及該第二對位單元(50)電性連接(當然亦可以無線方式通訊連接),以與該第一對位單元(40)及該第二對位單元(50)進行訊號及資料之雙向傳輸,該處理單元(60)中可包括一控制模組,用以控制該第一及第二對位單元(40)、(50)移動。 該處理單元(60)用以依據該下側影像訊號計算對應該下側影像之下側對位位置資訊,及依據該上側影像訊號計算對應該上側影像之對位位置資訊,並依據該下側對位位置資訊及該上側對位位置資訊計算該待檢正產品(400)之雷射打印偏位差值。其中,該處理單元(60)可包括有一雷射打印檢正模型(例如包含可計算雷射打印偏位差值之軟體),該處理單元(60)用以依據該下側影像訊號計算對應該下側影像各產品單元(410)區域之對位位置資訊,及依據該上側影像訊號計算對應該上側影像各產品單元(410)區域之位置資料,並基於一對位基準以該雷射打印檢正模型與對應該上側影像各產品單元(410)區域之位置資料進行比對,以計算該待檢正產品(400)之雷射打印偏位差值。該處理單元(60)可經由設於其中之一存儲模組存儲該雷射打印偏位差值,存儲之該雷射打印偏位差值可經由一儲存媒體儲存後再轉存至一雷射打印裝置(70)(如第6圖所示),該雷射打印裝置(70)則可依據該雷射打印偏位差值進行該待檢正產品(400)之雷射打印補正調校。The processing unit (60) (eg, a computer) is electrically connected to the first aligning unit (40) and the second aligning unit (50) (of course, can also be wirelessly connected), and the first The recording unit (60) and the second aligning unit (50) perform bidirectional transmission of signals and data. The processing unit (60) may include a control module for controlling the first and second aligning units. (40), (50) move. The processing unit (60) is configured to calculate, according to the lower side image signal, information corresponding to the lower side position of the lower image, and calculate the position information of the corresponding upper image according to the upper image signal, and according to the lower side The positional position information and the upper positional position information are used to calculate a laser print offset difference of the product to be inspected (400). The processing unit (60) may include a laser print detection model (for example, a software including a programmable laser print offset difference), and the processing unit (60) is configured to calculate the corresponding image according to the lower image signal. The position information of the product unit (410) area of the lower image, and the position data of each product unit (410) area corresponding to the upper image according to the upper image signal, and the laser print inspection based on the one-bit reference The positive model is compared with the location data corresponding to each product unit (410) region of the upper image to calculate the laser printing offset difference of the positive product (400) to be inspected. The processing unit (60) can store the laser printing offset difference value via one of the storage modules, and the stored laser printing offset difference value can be stored in a storage medium and then transferred to a laser. The printing device (70) (as shown in FIG. 6), the laser printing device (70) can perform the laser printing correction correction of the product (400) to be inspected according to the laser printing deviation value.
在以下所舉之實際操作實施例中,假設雷射打印(420)係設於該待檢正產品(400)之下側,亦即所取得之下側影像中包含有雷射打印(420)之圖像,且定義面對該上下對位檢查系統(100)左下方之位置作為供計算該待檢正產品(400)之雷射打印偏位差值之座標基準。In the following practical embodiment, it is assumed that the laser printing (420) is disposed on the lower side of the product (400) to be inspected, that is, the obtained lower side image contains the laser printing (420). An image, and a position facing the lower left of the upper and lower alignment inspection system (100) is defined as a coordinate reference for calculating a laser printing offset value of the product to be inspected (400).
在影像擷取方面,該處理單元(60)可透過該控制模組控制該第一對位單元(40)及該第二對位單元(50)移動,用以 取得該待檢正產品(400)各產品單元(410)之下側及上側影像訊號並傳送至該處理單元(60)。更清楚地說,該處理單元(60)之控制模組根據該待檢正產品(400)之產品單元(410)尺寸作為移動的間距(可依不同預設條件而改變),分別自動控制該第一移動機構(44)與該第二移動機構(54)將該第一對位單元(40)之第一CCD裝置(42)及該第二對位單元(50)之第二CCD裝置(52)以每次移動一產品單元(410)寬度或長度的間距方式做各產品單元(410)之影像的擷取,重複地執行以上動作,直至擷取所有產品單元(410)之影像為止。要說明的是,該第一對位單元(40)之第一CCD裝置(42)及該第二對位單元(50)之第二CCD裝置(52)可同時移動至同一個產品單元(410)擷取影像,亦可在同一時間移動至不同產品單元(410)擷取影像。The image processing unit (60) can control the movement of the first alignment unit (40) and the second alignment unit (50) through the control module. The lower side and upper side image signals of each product unit (410) of the product to be inspected (400) are obtained and transmitted to the processing unit (60). More specifically, the control module of the processing unit (60) automatically controls the size of the product unit (410) of the product to be inspected (400) as the moving pitch (which can be changed according to different preset conditions). The first moving mechanism (44) and the second moving mechanism (54) the first CCD device (42) of the first aligning unit (40) and the second CCD device of the second aligning unit (50) ( 52) The image capture of each product unit (410) is performed by moving the width of each product unit (410) or the length of each length, and the above actions are repeatedly performed until the images of all product units (410) are captured. It should be noted that the first CCD device (42) of the first alignment unit (40) and the second CCD device (52) of the second alignment unit (50) can simultaneously move to the same product unit (410). Capture images, or move to different product units (410) at the same time to capture images.
在本實施例中,係以所擷取之各包含雷射打印(420)之下側產品單元(410)影像之中心位置為計算基準,在上述設定座標基準之基礎下,該處理單元(60)將欲量測之各下側產品單元(410)影像各位置的點座標轉換成直角座標單位;並且以擷取之各上側產品單元(410)影像之中心位置為計算基準,在上述設定座標基準之基礎下,該處理單元(60)將欲量測之各下側產品單元(410)影像各位置的點座標轉換成直角座標單位;該處理單元(60)再將相對應之各下側產品單元(410)影像及各上側產品單元(410)影像轉換後的直角座標相減而得各產品單元(410)之雷射打印偏位差值。In this embodiment, the processing unit (60) is calculated based on the center position of each of the captured product units (410) on the lower side of the laser printing (420). Converting the point coordinate of each position of each lower product unit (410) image to be a rectangular coordinate unit; and taking the center position of each upper product unit (410) image as a calculation reference, at the above setting coordinates Based on the reference, the processing unit (60) converts the point coordinates of each position of each of the lower product units (410) to be measured into a rectangular coordinate unit; the processing unit (60) then corresponds to each lower side The product unit (410) image and the right angle coordinates of each upper product unit (410) after image conversion are subtracted to obtain the laser printing offset difference of each product unit (410).
該處理單元(60)可經由設於其中之一存儲模組存儲該雷射打印偏位差值,存儲之該雷射打印偏位差值可經由一儲存媒體儲存後再轉存至一雷射打印裝置(70)(如第6圖所示),可理解的是,亦可透過有線或無線方式由該處理單元(60)將該雷射打印偏位差值傳輸至該雷射打印裝置(70),該雷射打印裝置(70)則可依據該雷射打印偏位差值進行該待檢正產品(400)之雷射打印補正調校。The processing unit (60) can store the laser printing offset difference value via one of the storage modules, and the stored laser printing offset difference value can be stored in a storage medium and then transferred to a laser. The printing device (70) (as shown in FIG. 6), it can be understood that the laser printing offset difference can also be transmitted to the laser printing device by the processing unit (60) by wire or wirelessly ( 70) The laser printing device (70) can perform laser printing correction correction of the product (400) to be inspected according to the laser printing deviation value.
請參照第5圖,乃本創作之第二種實施態樣,為一種上下對位檢查系統(400),在第一種實施態樣及第1圖中已說明的一種上下對位檢查系統(100)之相似部件,於第5圖中以相同的符號標示或省略不再敘述。Please refer to FIG. 5, which is a second embodiment of the present invention, which is an upper and lower alignment inspection system (400), and an upper and lower alignment inspection system which has been described in the first embodiment and the first embodiment ( 100) similar components are denoted by the same reference numerals in FIG. 5 or omitted.
在第二實施態樣中,該上下對位檢查系統(200)另包括一驅動單元,連接該蓋板(30)之框體(34)一側之樞軸並可驅動該蓋板(30)進行樞擺。該驅動單元(80)可包含但不限於馬達-傳動機構組件、油壓缸或氣壓缸,任何可驅動該蓋板(30)進行樞擺之裝置或機構皆可適用。馬達-傳動機構組件可為但不限於馬達-齒輪組件、馬達-皮帶組件、馬達-鍊條組件。In the second embodiment, the upper and lower alignment inspection system (200) further includes a driving unit that connects the pivot of one side of the frame (34) of the cover (30) and can drive the cover (30). Pivot. The drive unit (80) may include, but is not limited to, a motor-transmission mechanism assembly, a hydraulic cylinder or a pneumatic cylinder, and any device or mechanism that can drive the cover (30) for pivoting is applicable. The motor-gear assembly can be, but is not limited to, a motor-gear assembly, a motor-belt assembly, a motor-chain assembly.
請參照第6圖,乃本創作之第三種實施態樣,為一種上下對位檢查系統(300),在第一種實施態樣及第1圖中已說明的一種上下對位檢查系統(100)之相似部件,於第6圖中以相同的符號標示或省略不再敘述。Please refer to Fig. 6, which is a third embodiment of the present invention, which is an upper and lower alignment inspection system (300), and an upper and lower alignment inspection system which has been described in the first embodiment and the first embodiment ( 100) Similar components are denoted by the same reference numerals in FIG. 6 or omitted.
在第三實施態樣中,該上下對位檢查系統(300)另包括一雷射打印裝置(70),其接收來自該處理單元(60)之該雷 射打印偏位差值之訊號並據以進行該待檢正產品(400)之雷射打印補正調校。In a third embodiment, the upper and lower alignment inspection system (300) further includes a laser printing device (70) that receives the lightning from the processing unit (60) The signal of the offset difference is printed and the laser print correction correction of the product (400) to be inspected is performed.
綜上所述,本創作提供一種上下對位檢查系統,功能為改善「習知對於新產品經雷射打印後之偏移打印產品(即待檢測產品),作業人員經常發生雷射打印需補正調校,需使用圖樣檢測遮罩(Mask)以人工作業方式逐一比對其偏位差值,而人工比對補正調校對位不易且不便利」以及「造成作業人員耗時耗工」之問題。進一步說,本創作可利用第一對位單元及第二對位單元進行自動雷射打印檢正,大大減少因作業人員人工作業而耗時耗工及精度誤差率高之現象產生,以減少錯誤率,且可將作業電子化(E化)。In summary, this creation provides a top-to-bottom alignment check system, which is designed to improve the "preferred printing products for laser-printed products (ie, products to be tested) for new products. Operators often need to correct laser printing. To adjust the mask, it is necessary to use the pattern detection mask (Mask) to manually offset the deviation value by manual operation, and the manual comparison correction is not easy and inconvenient to adjust the alignment and "causing the operator to spend time and labor" problem. Furthermore, the creation can use the first alignment unit and the second alignment unit to perform automatic laser printing verification, thereby greatly reducing the time-consuming and high-precision error rate caused by the manual operation of the operator, so as to reduce errors. Rate, and the job can be electronicized (E).
此於同類產品當中實屬首創,符合新型專利要件,爰依法俱文提出申請。惟,以上所述者僅為本創作之較佳實施態樣,舉凡應用本創作說明書、申請專利範圍或圖式所為之等效結構變化,理應包含在本創作之專利範圍內。This is the first of its kind in the same category, in line with the new patent requirements, and apply for it according to law. However, the above description is only the preferred embodiment of the present invention, and the equivalent structural changes that are applied to the present specification, the scope of the patent application or the drawings are included in the scope of the patent of the present invention.
100‧‧‧上下對位檢查系統100‧‧‧Up and down alignment inspection system
200‧‧‧上下對位檢查系統200‧‧‧Up and down alignment inspection system
300‧‧‧上下對位檢查系統300‧‧‧Up and down alignment inspection system
10‧‧‧基座10‧‧‧ Pedestal
20‧‧‧可透視平台20‧‧‧Perspective platform
30‧‧‧蓋板30‧‧‧ Cover
32‧‧‧可透視窗32‧‧‧Perspective window
34‧‧‧框體34‧‧‧ frame
36‧‧‧把件36‧‧‧ pieces
40‧‧‧第一對位單元40‧‧‧First alignment unit
42‧‧‧第一CCD裝置42‧‧‧First CCD device
44‧‧‧第一移動機構44‧‧‧First mobile agency
50‧‧‧第二對位單元50‧‧‧second alignment unit
52‧‧‧第二CCD裝置52‧‧‧Second CCD device
54‧‧‧第二移動機構54‧‧‧Second mobile agency
60‧‧‧處理單元60‧‧‧Processing unit
70‧‧‧雷射打印裝置70‧‧‧Laser printing device
80‧‧‧驅動單元80‧‧‧ drive unit
400‧‧‧待檢正產品400‧‧‧Check positive products
410‧‧‧產品單元410‧‧‧Product unit
420‧‧‧雷射打印420‧‧‧ laser printing
第1及2圖為本創作上下對位檢查系統之第一實施態樣之示意圖;第3圖為本創作對位單元可相對待檢正產品移動進行影像擷取之示意圖;第4圖為本創作待檢正產品之背側示意圖;第5圖為本創作上下對位檢查系統之第二實施態樣之示意圖;及 第6圖為本創作上下對位檢查系統之第三實施態樣之示意圖。The first and second figures are schematic diagrams of the first embodiment of the upper and lower alignment check system of the creation; the third figure is a schematic diagram of the image capture of the creation of the alignment unit relative to the product to be inspected; A schematic diagram of the back side of the product to be inspected; FIG. 5 is a schematic view of the second embodiment of the creation of the upper and lower alignment check system; Fig. 6 is a schematic view showing a third embodiment of the upper and lower alignment check system of the creation.
100‧‧‧上下對位檢查系統100‧‧‧Up and down alignment inspection system
10‧‧‧基座10‧‧‧ Pedestal
20‧‧‧可透視平台20‧‧‧Perspective platform
30‧‧‧蓋板30‧‧‧ Cover
32‧‧‧可透視窗32‧‧‧Perspective window
34‧‧‧框體34‧‧‧ frame
36‧‧‧把件36‧‧‧ pieces
40‧‧‧第一對位單元40‧‧‧First alignment unit
42‧‧‧第一CCD裝置42‧‧‧First CCD device
44‧‧‧第一移動機構44‧‧‧First mobile agency
50‧‧‧第二對位單元50‧‧‧second alignment unit
52‧‧‧第二CCD裝置52‧‧‧Second CCD device
54‧‧‧第二移動機構54‧‧‧Second mobile agency
60‧‧‧處理單元60‧‧‧Processing unit
400‧‧‧待檢正產品400‧‧‧Check positive products
410‧‧‧產品單元410‧‧‧Product unit
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI497058B (en) * | 2013-11-27 | 2015-08-21 | Viewmove Technologies Inc | Detecting system for chip-acquisition procedure and method thereof |
| TWI553308B (en) * | 2014-12-25 | 2016-10-11 | 由田新技股份有限公司 | An optical detecting apparatus, method, computer readable medium, and computer program product |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI497058B (en) * | 2013-11-27 | 2015-08-21 | Viewmove Technologies Inc | Detecting system for chip-acquisition procedure and method thereof |
| TWI553308B (en) * | 2014-12-25 | 2016-10-11 | 由田新技股份有限公司 | An optical detecting apparatus, method, computer readable medium, and computer program product |
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| Date | Code | Title | Description |
|---|---|---|---|
| MM4K | Annulment or lapse of a utility model due to non-payment of fees |