US20080056861A1 - Processing apparatus and processing method - Google Patents
Processing apparatus and processing method Download PDFInfo
- Publication number
- US20080056861A1 US20080056861A1 US11/896,458 US89645807A US2008056861A1 US 20080056861 A1 US20080056861 A1 US 20080056861A1 US 89645807 A US89645807 A US 89645807A US 2008056861 A1 US2008056861 A1 US 2008056861A1
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- United States
- Prior art keywords
- container
- partition wall
- opening
- loading area
- processing apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/6773—Conveying cassettes, containers or carriers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67772—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door, cover
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67775—Docking arrangements
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/14—Wafer cassette transporting
Definitions
- the present invention relates to a processing apparatus and a processing method for taking out an object to be processed from a container covered with a lid, and subjecting the object to be processed to a predetermined process such as a heating process.
- the present invention relates to an art for pressing the container against an opening in a partition wall and holding the container tightly in place.
- the heat-processing apparatus includes a carrying-in region into which a carrier as a container containing a plurality of wafers is carried by an automatic transfer robot or an operator, and a loading area as a conveying region in which the wafers in the carrier are conveyed to a boat as a holder, and the boat is loaded into a heat furnace and unloaded therefrom.
- this heat-processing apparatus in order to make cleaner an atmosphere in the loading area than an atmosphere in the carrying-in region and to prevent generation of a natural oxide film on a wafer, it is preferable to separate the carrying-in region on an atmospheric side and the loading area from each other by a partition wall, and that an inside of the loading area is filled with an inert gas such as a nitrogen (N 2 ) gas to form an inert gas atmosphere.
- an inert gas such as a nitrogen (N 2 ) gas
- N 2 nitrogen
- FIG. 7 ( a ) shows that a hermetically-closable type carrier is in contact with the above-described partition wall.
- the reference number 6 depicts the partition wall that separates a carrying-in region Sa and a loading area Sb from each other.
- the reference number 13 depicts an opening formed in the partition wall 6 .
- the reference number 14 depicts a door for opening and closing the opening 13 .
- the lid 3 b is opened by a lid opening/closing mechanism while the door 14 is being closed, and then an atmosphere in the carrier 3 is replaced with a nitrogen gas by a nitrogen replacing unit, not shown. Thereafter, the door 14 and the lid 3 b are retracted from the opening 13 , and a wafer w in the carrier 3 is loaded into the loading area Sb.
- a lid opening/closing mechanism while the door 14 is being closed, and then an atmosphere in the carrier 3 is replaced with a nitrogen gas by a nitrogen replacing unit, not shown.
- the door 14 and the lid 3 b are retracted from the opening 13 , and a wafer w in the carrier 3 is loaded into the loading area Sb.
- JP2004-6804A A related art is described in JP2004-6804A.
- the carrier 3 is merely fixed on the conveying table 10 by means of a fixing mechanism having a locking part 40 of an inverted L-shape, which locks a bottom part of the carrier 3 on the conveying table 10 .
- Patent JP2004-6804A describes an art for stabilizing a posture of the carrier even when a feed rate of an inert gas is high so as not to break a sealing condition between the partition wall and the carrier, when an atmosphere in the carrier is replaced with an inert gas, after the carrier is brought into contact with the partition wall and a lid member is opened. That is to say, JP2004-6804A describes that a pressing member is disposed on the partition wall on a side facing the carrying-in region, the pressing member being rotatable about a horizontal axis between a position in which the pressing member stands and a position in which the pressing member lies to press an upper surface of the carrier.
- the present invention has been made in view of the above circumstances.
- the object of the present invention is to provide a processing apparatus and a processing method capable of preventing a container from being inclined by a pressure applied from a side of a carrying-in region when a door of a partition wall is opened, so as to eliminate various disadvantages resulting from the inclination of the container.
- a processing apparatus of the present invention is a processing apparatus comprising: a container that contains a plurality of objects to be processed, the container including an outlet port formed in a front surface thereof for taking out the object to be processed, and a lid for hermetically sealing the outlet port; a loading area into which the container is loaded; a conveying area whose atmosphere differs from an atmosphere in the loading area; a partition wall that separates the loading area and the conveying area from each other, and has an opening; a door for opening and closing the opening in the partition wall; and a stage for placing the container at a position near the opening in the loading area; wherein parts to be pressed are provided on opposite sides on a side of the front surface of the container, and the partition wall is provided with a pressing and holding mechanism having a pressing roller that rides on the part to be pressed of the container from a lateral side to press the container against the opening in the partition wall and hold the container tightly in place.
- the processing apparatus After the container is placed on the stage, the container is brought into contact with the opening. Then, the door and the lid are opened, and the object to be processed in the container is transferred from the loading area to the conveying area.
- the pressing and holding mechanism includes: a vertically extended rotating shaft rotatably supported on the partition wall via a bracket; a flat spring member radially extended from the rotating shaft, the flat spring member holding the pressing roller at a distal end, and forwardly pressing and urging the pressing roller; and a driving part for rotating the rotating shaft.
- At least the pair of upper and lower pressing rollers are connected with the rotating shaft through the flat spring members.
- an atmosphere in the conveying area is an inert gas, and that a pressure in the conveying area is set higher than a pressure in the loading area.
- the processing apparatus of the present invention further comprises a guiding surface disposed on a rear surface of the partition wall on a side of the loading area, the guiding surface guiding the pressing roller of the pressing and holding mechanism positioned at a standby position toward the part to be pressed of the container.
- the processing apparatus of the present invention further comprises a restricting member extended from the rotating shaft along an outer surface of the flat spring member, the restricting member supporting the flat spring member from a side of the outer surface when the pressing roller rides on the part to be pressed of the container from a lateral side.
- the processing apparatus of the present invention further comprises a sealing member disposed on a rear surface of the partition wall on a side of the loading area, the sealing member sealing a gap between the partition wall and the container, when the container is brought into contact with the opening.
- the processing apparatus of the present invention further comprises an inert gas introducing passage disposed in the partition wall, the inert gas introducing passage introducing an inert gas into the container, when the lid of the container is opened while the door is being closed.
- the parts to be pressed are formed of flange portions projecting from a front surface of the container in opposite directions.
- the parts to be pressed are formed of recesses provided in opposite sides on a side of the front surface of the container.
- the flat spring member is made of stainless, and that the pressing roller is made of a fluorocarbon resin.
- a processing method of the present invention is a processing method using a processing apparatus comprising a container that contains a plurality of objects to be processed, the container including an outlet port formed in a front surface thereof for taking out the object to be processed, and a lid for hermetically sealing the outlet port; a loading area into which the container is loaded; a conveying area whose atmosphere differs from an atmosphere in the loading area; a partition wall that separates the loading area and the conveying area from each other, and has an opening; a door for opening and closing the opening in the partition wall; and a stage for placing the container at a position near the opening in the loading area; wherein parts to be pressed are provided on opposite sides on a side of the front surface of the container, and the partition wall is provided with a pressing and holding mechanism having a pressing roller that rides on the part to be pressed of the container from a lateral side to press the container against the opening in the partition wall and hold the container tightly in place; the processing method comprising the steps of: placing the container on the stage; bringing the
- the present invention makes it possible to prevent inclination of the container which may be caused by a pressure of the conveying area when the door of the partition wall is opened, so that various disadvantages resulting from the inclination of the container can be eliminated.
- FIG. 1 is a longitudinal sectional view showing an embodiment in which the present invention is applied to a vertical-type heat processing apparatus
- FIG. 2 is a perspective view schematically showing a main part
- FIG. 3 is a side view schematically showing the main part
- FIG. 4 is a plan view schematically showing the main part
- FIG. 5 is an enlarged view of the main part
- FIG. 6 is a perspective view schematically showing a main part of another embodiment of the present invention.
- FIG. 7 is an illustrational view schematically showing a main part of a conventional processing apparatus.
- FIG. 1 is a longitudinal sectional view showing an embodiment in which the present invention is applied to a vertical-type heat processing apparatus.
- FIG. 2 is a perspective view schematically showing a main part.
- FIG. 3 is a side view schematically showing the main part.
- FIG. 4 is a plan view schematically showing the main part.
- FIG. 5 is an enlarged view of the main part.
- the reference number 1 depicts a vertical-type heat processing apparatus (processing apparatus) located in a clean room.
- the heat processing apparatus 1 has a housing 2 defining an outline thereof. An inside of the housing 2 is divided by a partition wall 6 into a carrying-in region Sa into which a carrier 3 is carried, and a loading area Sb as a conveying region in which a wafer w is taken out from the carrier 3 and is conveyed to a boat 4 , and the boat 4 is loaded into a heat furnace 5 and is unloaded therefrom.
- the carrier 3 is a so-called closable carrier (also referred to as FOUP), e.g., a plastic container with a lid which is capable of containing a plurality of, e.g., about 25 objects to be processed such as wafers w of a predetermined diameter, e.g., 300 mm diameter, such that the wafers w are horizontally arranged with a predetermined vertical gap therebetween.
- the carrier 3 has a detachable lid 3 b for hermetically sealing an outlet port 3 a formed in a front surface of the carrier 3 .
- the lid 3 b is provided with a latch mechanism, not shown, for holding the lid 3 b on the outlet port 3 a of the carrier 3 . By releasing the latch mechanism, the lid 3 b is detached from the outlet port 3 a of the carrier 3 .
- a loading/unloading port 7 through which the carrier 3 is loaded and unloaded.
- a table 8 on which the carrier 3 is placed during a loading/unloading operation is disposed on a side of the back surface of the housing 2 outside the loading/unloading port 7 .
- On a front part and a rear part in an upper part of the carrying-in region Sa there are opposingly disposed storage racks 9 for temporarily storing the plurality of carriers 3 .
- a conveying table 10 On a side of the partition wall 6 in a lower part of the carrying-in region Sa, there is disposed a conveying table 10 as a stage on which the carrier 3 is placed for conveying the wafer.
- the carrying-in region Sa includes a moving mechanism 11 disposed on the table 8 for taking in and out the carrier 3 through the loading/unloading port 7 , and a transfer mechanism (carrier transfer mechanism) 12 for transferring the carrier 3 between the storage racks 9 and the conveying table 10 .
- the transfer mechanism 12 is mainly composed of an elevating mechanism 12 a disposed on one side of the carrying-in region Sa, an elevating arm 12 b which is vertically moved by the elevating mechanism 12 a, and a transfer arm 12 c disposed on the elevating arm 12 b for supporting a bottom part or a top part of the carrier 3 to horizontally transfer the same.
- the carrying-in region Sa is communicated with the clean room through the loading/unloading port 7 .
- An atmosphere in the carrying-in region Sa is air whose pressure is the same as an atmospheric pressure.
- an inside of the loading area Sb is an inert gas atmosphere when the heat processing apparatus 1 is operated.
- an N 2 (nitrogen) gas is used as an inert gas.
- gases other than the N 2 gas e.g., an Ar gas, an He gas, and so on
- gases other than the N 2 gas e.g., an Ar gas, an He gas, and so on
- the loading area Sb is air-tightly sealed, and a pressure of the inert gas is maintained at a predetermined pressure which is sufficiently higher than an atmospheric pressure.
- a value of the predetermined pressure is the atmospheric pressure plus 10 to 1000 Pa.
- the heat processing apparatus 1 includes a pressure control mechanism for maintaining a pressure of the inert gas in the loading area Sb at a predetermined value.
- a value of the pressure is controlled to be adjusted within a range between the atmospheric pressure plus 10 Pa and the atmospheric pressure plus 1000 Pa. There is a possibility that the pressure temporarily exceeds 1000 Pa under the influence of heat. In this state where the pressure value deviates from the controllable range, the loading area is exhausted in a full-open state.
- An air cleaner is disposed in the loading area Sb so that an inside of the loading area Sb is sufficiently maintained cleaner than an inside of the clean room.
- the partition wall 6 is provided with an opening 13 and a door 14 capable of being opened and closed.
- the opening 13 communicates an inside of the carrier 3 with the inside of the loading area Sb.
- the door 14 closes the opening 13 from the side of the loading area Sb.
- a bore of the opening 13 is substantially identical to a bore of the outlet port 3 a of the carrier 3 , whereby the wafer w can be taken out and taken into the carrier 3 through the opening 13 .
- the door 14 has a not-shown attaching/detaching mechanism for attaching (closing) and detaching (opening) the lid 3 b of the carrier 3 , and a not-shown door opening/closing mechanism for opening and closing the door 14 from the side of the loading area Sb.
- the door 14 and the lid 3 b are opened to the side of the loading area Sb by the door opening/closing mechanism. Then, the door 14 and the lid 3 b are moved (retracted) upward or downward so as not to interfere with the wafer w to be conveyed.
- Below the conveying table 10 there is disposed a notch aligner 15 for aligning notches (cutouts) formed in circumferential parts of each of the wafers w to align a crystal direction.
- a lid member 16 capable of being vertically moved by an elevating mechanism, not shown, is disposed in an upper behind part of the loading area Sb.
- a boat 4 made of, e.g., quartz, as a holder for holding a number of, e.g., about 100 semiconductor wafers such that the wafers are arranged with a predetermined vertical gap therebetween in a tier-like manner
- the boat 4 is loaded into the heat furnace 5 or is unloaded therefrom, and a throat 5 a is opened or closed.
- a shutter 17 capable of horizontally moving to open and close the throat 5 a is disposed near the throat 5 a. The shutter 17 shields the throat 5 a when the lid member 16 is opened and the heat-processed boat 4 is unloaded.
- a conveying mechanism 18 is disposed in the loading area Sb, for conveying the wafer w between the carrier 3 on the conveying table 10 and the boat 4 .
- the conveying mechanism 18 conveys the wafer w between the carrier 3 on the conveying table 10 and the notch aligner 15 , between the notch aligner 15 and the boat 4 , and between the heat-processed boat 4 and the vacant carrier 3 on the conveying table 10 .
- the conveying mechanism 18 includes a base table 18 a which is vertically movable and horizontally rotatable, and a fork 18 b having a plurality of, e.g., five thin-plate like forks movable in a longitudinal direction (radial direction) of the base table 18 a.
- the fork 18 b includes one independently movable single fork, and four plural forks. Pitches between the plural forks can be vertically varied, with the single fork arranged on an intermediate height position taken as a criterion.
- the conveying table 10 may be configured to simply place thereon the carrier 3
- the conveying table 10 may be configured as follows. That is, as shown in FIG. 3 , for example, the conveying table 10 is formed of a frame 10 a secured on the partition wall 6 , and a seat 10 c disposed above the frame 10 a through a linear guide 10 b so as to be slidable within a small range in a direction perpendicular to the partition wall 6 .
- a plurality of, e.g., three positioning pins 19 are projectingly disposed on the seat 10 c. The positioning pins 19 can be engaged with holes, not shown, formed in the bottom part of the carrier 3 so as to position the carrier 3 .
- the frame 10 a has a fixing mechanism for fixing the carrier 3 on the seat 10 c, and a moving mechanism for moving the carrier 3 along with the seat 10 c from a remote position in which the carrier 3 is remote from the separation wall 6 to a contact position in which the front surface of the carrier 3 is in contact with the partition wall 6 , and vice versa (illustration omitted).
- Parts to be pressed 20 are disposed on opposite sides of the front surface of the carrier 3 .
- laterally projecting flange portions 3 c are formed on the front opposite sides of the carrier 3 , and rear surfaces of the flange portions 3 c provide the parts to be pressed 20 .
- recesses 21 are formed in the front opposite sides of the carrier 3 to form flange portions 3 c, and rear surfaces of the flange portions 3 c provide the parts to be pressed 20 .
- the partition wall 6 is equipped with a pressing and holding mechanism 23 having a pressing roller 22 that rides on the part to be pressed 20 from the lateral side and presses the carrier 3 against the opening 13 , i.e., a peripheral part of the opening 13 in the partition wall 6 , so as to hold the carrier 3 tightly in place.
- the pair of pressing and holding mechanisms 23 are arranged at positions corresponding to the opposite sides of the carrier 3 on the conveying table 10 .
- the pressing and holding mechanism 23 includes a vertical rotating shaft 25 rotatably supported on the partition wall 6 via a bracket 24 , a flat spring member 26 radially extended from the rotating shaft 25 to forwardly press and urge the pressing roller 22 which is held on a distal end of the flat spring member 26 , and an air cylinder 27 serving as a driving part for rotating the rotating shaft 25 .
- the flat spring member 26 is preferably made of, e.g., stainless
- the pressing roller 22 is preferably made of, e.g., a fluorocarbon resin. As shown in FIGS.
- the bracket 24 is composed of a vertically elongated attachment board 24 b secured on the partition wall 6 by a screw 24 a, and the pair of upper and lower support arms 24 c disposed on the attachment board 24 b.
- the rotating shaft 25 vertically bridging the upper and lower support pieces 24 c is supported via bearings 24 d to be rotatable about a rotational axis thereof.
- One end of the air cylinder 27 is coupled to a lever 28 disposed on a lower end of the rotating shaft 25 , and the other end of the air cylinder 27 is coupled to the side of the frame 10 a of the conveying table 10 .
- the lever 28 is pulled by the air cylinder 27
- the rotating shaft 25 is rotated counterclockwise to roll the pressing roller 22 through the flat spring member 26 , such that the pressing roller 22 moves from a standby position I near the partition wall 6 toward the part to be pressed 20 of the carrier 3 , and rides on the part to be pressed 20 .
- At least the pair of upper and lower pressing rollers 22 are connected with the rotating shaft 25 through the flat spring members 26 , respectively.
- the flat spring members 26 and the pressing rollers 22 are symmetrically arranged in the right and left direction, and thus the flange portions 3 c of the carrier 3 are pressed against the partition wall 6 by means of spring forces (urging forces) of a total of four flat spring members 26 .
- spring forces urging forces
- each flat spring member 26 has to exert a pushing force (pressing force) of 2.8 kgf (27.4 N).
- the flat spring member 26 having such a pushing force is used.
- the flat spring member 26 In order that the flat spring member 26 can exert this pressing force, the flat spring member 26 is previously curved against the spring force at the standby position I. Since the flat spring members 26 and the pressing rollers 22 are symmetrical in the right and left direction, the right ones are explained in more detail. As shown in FIG. 5 , one end (proximal end) of the flat spring member 26 is secured on a side surface of the rotating shaft 25 by a screw 29 , and the other end (distal end or free end) of the flat spring member 26 is extended forward. The pressing roller 22 is disposed on the distal end of the flat spring member 26 via a bearing member 30 such that the pressing roller 22 can rotate about a vertical axis.
- the rotating shaft 25 is arranged on a rightward position so as not to interfere with the carrier 3 , the distal end side of the flat spring member 26 is extended forward to be obliquely curved leftward, and the pressing roller 22 rides on the part to be pressed 20 and presses the same from the lateral side of the carrier 3 .
- a tilted guiding surface 31 is preferably provided to connect the standby position I and the part to be pressed 20 of the carrier 3 to each other, to thereby smoothly move the pressing roller 22 therebetween.
- the guiding surface 31 is provided on the partition wall 6 or the attachment board 24 b.
- the rotating shaft 25 is preferably supportable by a restricting member 32 extending along an outer surface of the curved part 26 c.
- the reference number 33 is a sealing member for sealing a gap between the partition wall 6 and a front peripheral part of the carrier 3 , when the front surface of the carrier 3 is pressed against the partition wall 6 .
- the partition wall 6 includes an inert gas inlet passage 34 for introducing an inert gas (such as an N 2 gas) into the carrier 3 to replace an atmosphere therein with the gas, when the lid 3 b is opened while the door 14 is being closed.
- an inert gas such as an N 2 gas
- the carrier 3 is placed on the table 8 by an operator or a transfer robot. Then, the carrier 3 is moved by the moving mechanism 11 through the loading/unloading port 7 to reach a transit position II in the carrying-in region Sa. Subsequently, the carrier 3 is transferred by the transfer mechanism 12 from the transit position II to the conveying table 10 or the storage rack 9 (see, FIG. 1 ). In this manner, the plurality of carriers 3 to be heat-processed are sequentially brought into the carrying-in region Sa, and are stored in the storage racks 9 .
- a not-shown sensor disposed on the conveying table 10 detects that the carrier 3 has been placed on the conveying table 10 . After that, the pressing and holding mechanism 23 starts its operation.
- the carrier 3 is previously fixed on the seat 10 c and is moved along with the seat 10 c relative to the partition wall 6 .
- the rotating shaft 25 is driven by the air cylinder 27 through the lever 28 to be rotated at a predetermined angle (the right rotating shaft is rotated counterclockwise, and the left rotating shaft is rotated clockwise), so that the pressing roller 22 is rolled through the flat spring member 26 from the standby position I on the lateral side toward the part to be pressed 20 as the rear surface of the flange portion 3 c of the carrier 3 .
- the pressing roller 22 rides on the part to be pressed 20 of the carrier 3 from the lateral side thereof, so that the carrier 3 is pressed against the opening 13 (i.e., the front peripheral part of the carrier 3 is pressed against the peripheral part of the opening 13 in the partition wall 6 ), and is tightly held in place by the spring forces of a total of four flat spring members 26 each pressing the pressing roller 22 .
- the carrier 3 is prevented from being inclined due to the pressure, which eliminates various disadvantages resulting from the inclination of the carrier 3 .
- the inert gas leaks from the loading area Sb toward the carrying-in region Sa to increase an oxidation density in the loading area Sb.
- deterioration of TAT can be prevented.
- erroneous opening and closing operations of the lid 3 b of the carrier, and a wrong mapping operation of the wafers in the carrier can be prevented.
- the rotational shaft 25 is driven by the air cylinder 27 to be rotated in the reverse direction. Then, the pressing roller 22 is disengaged from the part to be pressed 20 and is returned to the standby position I.
- the tilted guide surface 31 is placed between the standby position I and the part to be pressed 20 .
- the pressing roller 22 can be smoothly, easily moved.
- the rotating shaft 25 can be supported by the restricting member 32 , the curved part 26 c of the flat spring member 26 can be prevented from being oppositely curved.
- a conveying operation of the wafers w is started. This conveying operation is performed by the conveying mechanism 18 , which takes the wafers w out of the carrier 3 and sequentially brings the wafers w into the boat 4 via the notch aligner 15 .
- the boat 4 is loaded into the heat furnace 5 where the wafers w are subjected to a predetermined heat process. Following thereto, the boat 4 is unloaded onto the loading area Sb, and the processed wafers w are returned by the conveying mechanism 18 from the boat 4 to the vacant carrier 3 on the conveying table 10 . Thereafter, the carrier 3 is unloaded onto the table 8 via the transfer mechanism 12 and moving mechanism 11 .
- the pressing rollers 22 of the pressing and holding mechanisms 23 ride on the parts to be pressed 20 provided on the opposite sides of the front surface of the carrier 3 from the lateral sides thereof, so that the carrier 3 is pressed against the opening 13 and is tightly held in place.
- the carrier 3 can be prevented from being inclined by a pressure in the loading area Sb when the door of the partition wall 6 is opened. Therefore, various disadvantages resulting from the inclination of the carrier 3 can be eliminated. Moreover, improvement in inert gas replacing property in the carrier 3 can be expected.
- the pressing and holding mechanism 23 includes the vertical rotating shaft 25 rotatably supported on the partition wall 6 via the bracket 24 , the flat spring member 26 radially extended from the rotating shaft 25 to forwardly press and urge the pressing roller 22 which is held on a distal end of the flat spring member 26 , and the air cylinder 27 serving as a driving part for rotating the rotating shaft 25 .
- the pressing and holding mechanism 23 of such a simple structure can exert a sufficient pressing and holding force, as well as reduction in size and cost can be achieved.
- At least the pair of upper and lower pressing rollers 22 are connected with the rotating shaft 25 through the flat spring members 26 , respectively.
- spring forces capable of sufficiently enduring a pressure of the inert gas in the loading area Sb can be provided by at least a total of four flat spring members 26 .
- An atmosphere of the loading area Sb is an inert gas, and a pressure of the loading area Sb is set higher than that of the carrying-in region Sa.
- the loading area Sb is excellent in air-tightness, which prevents invasion of particles from outside and allows a time period required for replacing atmospheric air with an inert gas to be reduced. Therefore, increase in oxidation density can be restrained, then formation of a natural oxide film on a surface of a wafer can be prevented.
- the pressing and holding mechanisms 23 are arranged on the partition wall 6 at positions corresponding to the opposite sides of the carrier 3 . Thus, different from the pressing member disclosed in JP2004-6804A, an installation space for the pressing and holding mechanisms 23 can be easily secured.
- FIG. 6 is a perspective view schematically showing a main part of another embodiment of the present invention.
- a pressing and holding mechanism 23 in this embodiment is mainly composed of a horizontal movement member 36 disposed on an attachment board 24 b via a linear guide 35 to be slidable in a right and left direction, a pressing roller 22 disposed on the horizontal movement member 36 through a flat spring member 26 , and an air cylinder 27 as a driving part for horizontally moving the horizontal movement member 36 .
- the pressing roller 22 which is disposed on the horizontal movement member 36 in a forward movement direction thereof through the flat spring member 26 , comes close to a part to be pressed 20 of a flange portion 3 c of the carrier 3 from a lateral side thereof, and rides on the part to be pressed 20 , so that the part to be pressed 20 is pressed and held by a spring force of the flat spring member 26 .
- the flat spring member 26 in this embodiment is not curved but linear. Also in this embodiment, the same effects as those in the above-described embodiment can be produced.
- an inert gas or a clean dry air may be selectively supplied to a loading area corresponding to a process step of a wafer.
- the driving part may be a motor.
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
A processing apparatus according to the present invention comprises: a container 3 that contains a plurality of objects to be processed w, the container including an outlet port 3 a formed in a front surface thereof for taking out the object to be processed w, and a lid 3 b for hermetically sealing the outlet port 3 a; a loading area Sa into which the container 3 is loaded; a conveying area Sb whose atmosphere differs from an atmosphere in the loading area Sa; a partition wall 6 that separates the loading area Sa and the conveying area Sb from each other, and has an opening 13; a door 14 for opening and closing the opening 13 in the partition wall 6; and a stage 10 for placing the container 3 at a position near the opening 13 in the loading area Sa. Parts to be pressed 20 are provided on opposite sides on a side of the front surface of the container 3. The partition wall 6 is provided with a pressing and holding mechanism 23 having a pressing roller 22 that rides on the part to be pressed 20 of the container 3 from a lateral side to press the container 3 against the opening 13 in the partition wall 6 and hold the container 3 tightly in place.
Description
- This application is based upon and claims the benefit of priority from the prior Japanese Patent Application No. 2006-239045 filed on Sep. 4, 2006, the entire contents of which are incorporated herein by reference.
- 1. Field of the Invention
- The present invention relates to a processing apparatus and a processing method for taking out an object to be processed from a container covered with a lid, and subjecting the object to be processed to a predetermined process such as a heating process. In particular, the present invention relates to an art for pressing the container against an opening in a partition wall and holding the container tightly in place.
- 2. Related Art
- As one of semiconductor manufacturing apparatuses, there is a batch-type heat-processing apparatus that thermally processes a number of semiconductor wafers (hereinafter referred to as “wafer”). The heat-processing apparatus includes a carrying-in region into which a carrier as a container containing a plurality of wafers is carried by an automatic transfer robot or an operator, and a loading area as a conveying region in which the wafers in the carrier are conveyed to a boat as a holder, and the boat is loaded into a heat furnace and unloaded therefrom.
- In this heat-processing apparatus, in order to make cleaner an atmosphere in the loading area than an atmosphere in the carrying-in region and to prevent generation of a natural oxide film on a wafer, it is preferable to separate the carrying-in region on an atmospheric side and the loading area from each other by a partition wall, and that an inside of the loading area is filled with an inert gas such as a nitrogen (N2) gas to form an inert gas atmosphere. In this case, with a view to preventing particle contamination of a wafer, it is more preferable to employ a carrier (also referred to as FOUP: Front Opening Unified Pod) of a hermetically closable type, whose wafer outlet port in a front surface of a carrier body can be hermetically closed by a lid.
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FIG. 7 (a) shows that a hermetically-closable type carrier is in contact with the above-described partition wall. Thereference number 6 depicts the partition wall that separates a carrying-in region Sa and a loading area Sb from each other. Thereference number 13 depicts an opening formed in thepartition wall 6. Thereference number 14 depicts a door for opening and closing the opening 13. After thecarrier 3 is placed on a conveying table (stage) 10 disposed in the carrying-in region Sa, the conveying table 10 is moved forward so that a front peripheral part of thecarrier 3 comes into contact with an opening peripheral part of the opening 13, and thereafter a lid 3 b is opened. In this case, the following procedures are further preferred from the viewpoint of preventing increase in oxygen density in the loading area Sb. That is to say, the lid 3 b is opened by a lid opening/closing mechanism while thedoor 14 is being closed, and then an atmosphere in thecarrier 3 is replaced with a nitrogen gas by a nitrogen replacing unit, not shown. Thereafter, thedoor 14 and the lid 3 b are retracted from theopening 13, and a wafer w in thecarrier 3 is loaded into the loading area Sb. Such an art is described in JP11-264267A. - A related art is described in JP2004-6804A.
- For the purpose of preventing sucking of particles from outside into the loading area Sb, and increase in oxygen density in the loading area Sb, it is desirable that an inside of the loading area Sb is maintained at a pressure sufficiently higher than an atmospheric pressure. However, in the heat-processing apparatus, the
carrier 3 is merely fixed on the conveying table 10 by means of a fixing mechanism having alocking part 40 of an inverted L-shape, which locks a bottom part of thecarrier 3 on the conveying table 10. Thus, when thedoor 14 of thepartition wall 6 is opened (i.e., when the lid 3 b of thecarrier 3 is opened), as shown inFIG. 7 (b), because of a pressure applied from the loading area Sb to thecarrier 3, an upper part of thecarrier 3 is inclined toward the carrying-in region Sa to invite the following disadvantages. Namely, the nitrogen gas may leak from the loading area Sb toward the carrying-in region Sa to increase an oxidation density in the loading area Sb. In addition, it may be necessary to control the pressure in the loading area Sb to prevent the inclination of thecarrier 3. Further, TAT is deteriorated. Furthermore, erroneous opening and closing operations of the lid 3 b of the carrier, and a wrong mapping operation of the wafers in the carrier may take place. - Patent JP2004-6804A describes an art for stabilizing a posture of the carrier even when a feed rate of an inert gas is high so as not to break a sealing condition between the partition wall and the carrier, when an atmosphere in the carrier is replaced with an inert gas, after the carrier is brought into contact with the partition wall and a lid member is opened. That is to say, JP2004-6804A describes that a pressing member is disposed on the partition wall on a side facing the carrying-in region, the pressing member being rotatable about a horizontal axis between a position in which the pressing member stands and a position in which the pressing member lies to press an upper surface of the carrier. Thus, after the carrier is placed on the conveying table and is brought into contact with the partition wall, the pressing member is rotated to press the upper surface of the carrier. Under this state, the lid member of the carrier is opened, and an inert gas is supplied from an inert-gas supply pipe into the carrier. However, this art requires a sufficient space for installing the pressing member, above the carrier on the conveying table. When this installation space is not secured, it is impossible to employ this art.
- The present invention has been made in view of the above circumstances. The object of the present invention is to provide a processing apparatus and a processing method capable of preventing a container from being inclined by a pressure applied from a side of a carrying-in region when a door of a partition wall is opened, so as to eliminate various disadvantages resulting from the inclination of the container.
- In order to achieve the above object, a processing apparatus of the present invention is a processing apparatus comprising: a container that contains a plurality of objects to be processed, the container including an outlet port formed in a front surface thereof for taking out the object to be processed, and a lid for hermetically sealing the outlet port; a loading area into which the container is loaded; a conveying area whose atmosphere differs from an atmosphere in the loading area; a partition wall that separates the loading area and the conveying area from each other, and has an opening; a door for opening and closing the opening in the partition wall; and a stage for placing the container at a position near the opening in the loading area; wherein parts to be pressed are provided on opposite sides on a side of the front surface of the container, and the partition wall is provided with a pressing and holding mechanism having a pressing roller that rides on the part to be pressed of the container from a lateral side to press the container against the opening in the partition wall and hold the container tightly in place.
- In the processing apparatus, after the container is placed on the stage, the container is brought into contact with the opening. Then, the door and the lid are opened, and the object to be processed in the container is transferred from the loading area to the conveying area.
- In the processing apparatus of the present invention, it is preferable that the pressing and holding mechanism includes: a vertically extended rotating shaft rotatably supported on the partition wall via a bracket; a flat spring member radially extended from the rotating shaft, the flat spring member holding the pressing roller at a distal end, and forwardly pressing and urging the pressing roller; and a driving part for rotating the rotating shaft.
- In the processing apparatus of the present invention, it is preferable that at least the pair of upper and lower pressing rollers are connected with the rotating shaft through the flat spring members.
- In the processing apparatus of the present invention, it is preferable that an atmosphere in the conveying area is an inert gas, and that a pressure in the conveying area is set higher than a pressure in the loading area.
- The processing apparatus of the present invention further comprises a guiding surface disposed on a rear surface of the partition wall on a side of the loading area, the guiding surface guiding the pressing roller of the pressing and holding mechanism positioned at a standby position toward the part to be pressed of the container.
- The processing apparatus of the present invention further comprises a restricting member extended from the rotating shaft along an outer surface of the flat spring member, the restricting member supporting the flat spring member from a side of the outer surface when the pressing roller rides on the part to be pressed of the container from a lateral side.
- The processing apparatus of the present invention further comprises a sealing member disposed on a rear surface of the partition wall on a side of the loading area, the sealing member sealing a gap between the partition wall and the container, when the container is brought into contact with the opening.
- The processing apparatus of the present invention further comprises an inert gas introducing passage disposed in the partition wall, the inert gas introducing passage introducing an inert gas into the container, when the lid of the container is opened while the door is being closed.
- In the processing apparatus of the present invention, it is preferable that the parts to be pressed are formed of flange portions projecting from a front surface of the container in opposite directions.
- In the processing apparatus of the present invention, it is preferable that the parts to be pressed are formed of recesses provided in opposite sides on a side of the front surface of the container.
- In the processing apparatus of the present invention, it is preferable that the flat spring member is made of stainless, and that the pressing roller is made of a fluorocarbon resin.
- A processing method of the present invention is a processing method using a processing apparatus comprising a container that contains a plurality of objects to be processed, the container including an outlet port formed in a front surface thereof for taking out the object to be processed, and a lid for hermetically sealing the outlet port; a loading area into which the container is loaded; a conveying area whose atmosphere differs from an atmosphere in the loading area; a partition wall that separates the loading area and the conveying area from each other, and has an opening; a door for opening and closing the opening in the partition wall; and a stage for placing the container at a position near the opening in the loading area; wherein parts to be pressed are provided on opposite sides on a side of the front surface of the container, and the partition wall is provided with a pressing and holding mechanism having a pressing roller that rides on the part to be pressed of the container from a lateral side to press the container against the opening in the partition wall and hold the container tightly in place; the processing method comprising the steps of: placing the container on the stage; bringing the container placed on the stage into contact with the opening; causing the pressing roller of the pressing and holding mechanism disposed on the partition wall to ride on the parts to be pressed disposed on opposite side on a side of the front surface of the container from a lateral side, to press the container against the opening in the partition wall and hold the container tightly in place; and opening the door and the lid, and transferring an object to be processed in the container from the loading area to the conveying area.
- The present invention makes it possible to prevent inclination of the container which may be caused by a pressure of the conveying area when the door of the partition wall is opened, so that various disadvantages resulting from the inclination of the container can be eliminated.
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FIG. 1 is a longitudinal sectional view showing an embodiment in which the present invention is applied to a vertical-type heat processing apparatus; -
FIG. 2 is a perspective view schematically showing a main part; -
FIG. 3 is a side view schematically showing the main part; -
FIG. 4 is a plan view schematically showing the main part; -
FIG. 5 is an enlarged view of the main part; -
FIG. 6 is a perspective view schematically showing a main part of another embodiment of the present invention; and -
FIG. 7 is an illustrational view schematically showing a main part of a conventional processing apparatus. - The mode for carrying our the present invention is described in detail below with reference to the accompanying drawings.
FIG. 1 is a longitudinal sectional view showing an embodiment in which the present invention is applied to a vertical-type heat processing apparatus.FIG. 2 is a perspective view schematically showing a main part.FIG. 3 is a side view schematically showing the main part.FIG. 4 is a plan view schematically showing the main part.FIG. 5 is an enlarged view of the main part. - In
FIG. 1 , thereference number 1 depicts a vertical-type heat processing apparatus (processing apparatus) located in a clean room. Theheat processing apparatus 1 has ahousing 2 defining an outline thereof. An inside of thehousing 2 is divided by apartition wall 6 into a carrying-in region Sa into which acarrier 3 is carried, and a loading area Sb as a conveying region in which a wafer w is taken out from thecarrier 3 and is conveyed to aboat 4, and theboat 4 is loaded into aheat furnace 5 and is unloaded therefrom. - The
carrier 3 is a so-called closable carrier (also referred to as FOUP), e.g., a plastic container with a lid which is capable of containing a plurality of, e.g., about 25 objects to be processed such as wafers w of a predetermined diameter, e.g., 300 mm diameter, such that the wafers w are horizontally arranged with a predetermined vertical gap therebetween. Thecarrier 3 has a detachable lid 3 b for hermetically sealing an outlet port 3 a formed in a front surface of thecarrier 3. The lid 3 b is provided with a latch mechanism, not shown, for holding the lid 3 b on the outlet port 3 a of thecarrier 3. By releasing the latch mechanism, the lid 3 b is detached from the outlet port 3 a of thecarrier 3. - In a back surface of the
housing 2, there is formed a loading/unloading port 7 through which thecarrier 3 is loaded and unloaded. A table 8 on which thecarrier 3 is placed during a loading/unloading operation is disposed on a side of the back surface of thehousing 2 outside the loading/unloading port 7. On a front part and a rear part in an upper part of the carrying-in region Sa, there are opposingly disposed storage racks 9 for temporarily storing the plurality ofcarriers 3. On a side of thepartition wall 6 in a lower part of the carrying-in region Sa, there is disposed a conveying table 10 as a stage on which thecarrier 3 is placed for conveying the wafer. - The carrying-in region Sa includes a moving
mechanism 11 disposed on the table 8 for taking in and out thecarrier 3 through the loading/unloading port 7, and a transfer mechanism (carrier transfer mechanism) 12 for transferring thecarrier 3 between the storage racks 9 and the conveying table 10. Thetransfer mechanism 12 is mainly composed of an elevating mechanism 12 a disposed on one side of the carrying-in region Sa, an elevating arm 12 b which is vertically moved by the elevating mechanism 12 a, and a transfer arm 12 c disposed on the elevating arm 12 b for supporting a bottom part or a top part of thecarrier 3 to horizontally transfer the same. - The carrying-in region Sa is communicated with the clean room through the loading/unloading port 7. An atmosphere in the carrying-in region Sa is air whose pressure is the same as an atmospheric pressure. In order to suppress or prevent formation of a natural oxidation film on a surface of the wafer w, an inside of the loading area Sb is an inert gas atmosphere when the
heat processing apparatus 1 is operated. For example, an N2 (nitrogen) gas is used as an inert gas. However, gases other than the N2 gas (e.g., an Ar gas, an He gas, and so on) may be used as an inert gas. The loading area Sb is air-tightly sealed, and a pressure of the inert gas is maintained at a predetermined pressure which is sufficiently higher than an atmospheric pressure. For example, a value of the predetermined pressure is the atmospheric pressure plus 10 to 1000 Pa. Theheat processing apparatus 1 includes a pressure control mechanism for maintaining a pressure of the inert gas in the loading area Sb at a predetermined value. Depending on a model of the existing apparatus, a value of the pressure is controlled to be adjusted within a range between the atmospheric pressure plus 10 Pa and the atmospheric pressure plus 1000 Pa. There is a possibility that the pressure temporarily exceeds 1000 Pa under the influence of heat. In this state where the pressure value deviates from the controllable range, the loading area is exhausted in a full-open state. An air cleaner is disposed in the loading area Sb so that an inside of the loading area Sb is sufficiently maintained cleaner than an inside of the clean room. - The
partition wall 6 is provided with anopening 13 and adoor 14 capable of being opened and closed. When thecarrier 3 placed on the conveying table 10 is brought into contact with the opening 13 from the side of the carrying-in region Sa, theopening 13 communicates an inside of thecarrier 3 with the inside of the loading area Sb. Thedoor 14 closes theopening 13 from the side of the loading area Sb. A bore of theopening 13 is substantially identical to a bore of the outlet port 3 a of thecarrier 3, whereby the wafer w can be taken out and taken into thecarrier 3 through theopening 13. - The
door 14 has a not-shown attaching/detaching mechanism for attaching (closing) and detaching (opening) the lid 3 b of thecarrier 3, and a not-shown door opening/closing mechanism for opening and closing thedoor 14 from the side of the loading area Sb. Thedoor 14 and the lid 3 b are opened to the side of the loading area Sb by the door opening/closing mechanism. Then, thedoor 14 and the lid 3 b are moved (retracted) upward or downward so as not to interfere with the wafer w to be conveyed. Below the conveying table 10, there is disposed anotch aligner 15 for aligning notches (cutouts) formed in circumferential parts of each of the wafers w to align a crystal direction. - A
lid member 16 capable of being vertically moved by an elevating mechanism, not shown, is disposed in an upper behind part of the loading area Sb. By vertically moving thelid member 16 placing thereon aboat 4 made of, e.g., quartz, as a holder for holding a number of, e.g., about 100 semiconductor wafers such that the wafers are arranged with a predetermined vertical gap therebetween in a tier-like manner, theboat 4 is loaded into theheat furnace 5 or is unloaded therefrom, and a throat 5 a is opened or closed. Ashutter 17 capable of horizontally moving to open and close the throat 5 a is disposed near thethroat 5 a.Theshutter 17 shields the throat 5 a when thelid member 16 is opened and the heat-processedboat 4 is unloaded. - A conveying
mechanism 18 is disposed in the loading area Sb, for conveying the wafer w between thecarrier 3 on the conveying table 10 and theboat 4. To be specific, the conveyingmechanism 18 conveys the wafer w between thecarrier 3 on the conveying table 10 and thenotch aligner 15, between thenotch aligner 15 and theboat 4, and between the heat-processedboat 4 and thevacant carrier 3 on the conveying table 10. The conveyingmechanism 18 includes a base table 18 a which is vertically movable and horizontally rotatable, and a fork 18 b having a plurality of, e.g., five thin-plate like forks movable in a longitudinal direction (radial direction) of the base table 18 a. For example, the fork 18 b includes one independently movable single fork, and four plural forks. Pitches between the plural forks can be vertically varied, with the single fork arranged on an intermediate height position taken as a criterion. - Although the conveying table 10 may be configured to simply place thereon the
carrier 3, the conveying table 10 may be configured as follows. That is, as shown inFIG. 3 , for example, the conveying table 10 is formed of a frame 10 a secured on thepartition wall 6, and a seat 10 c disposed above the frame 10 a through a linear guide 10 b so as to be slidable within a small range in a direction perpendicular to thepartition wall 6. A plurality of, e.g., threepositioning pins 19 are projectingly disposed on the seat 10 c. The positioning pins 19 can be engaged with holes, not shown, formed in the bottom part of thecarrier 3 so as to position thecarrier 3. The frame 10 a has a fixing mechanism for fixing thecarrier 3 on the seat 10 c, and a moving mechanism for moving thecarrier 3 along with the seat 10 c from a remote position in which thecarrier 3 is remote from theseparation wall 6 to a contact position in which the front surface of thecarrier 3 is in contact with thepartition wall 6, and vice versa (illustration omitted). - Parts to be pressed 20 are disposed on opposite sides of the front surface of the
carrier 3. In an example shown inFIG. 2 , laterally projectingflange portions 3 c are formed on the front opposite sides of thecarrier 3, and rear surfaces of theflange portions 3 c provide the parts to be pressed 20. In an example shown inFIGS. 4 and 5 , recesses 21 are formed in the front opposite sides of thecarrier 3 to formflange portions 3 c, and rear surfaces of theflange portions 3 c provide the parts to be pressed 20. Thepartition wall 6 is equipped with a pressing and holdingmechanism 23 having apressing roller 22 that rides on the part to be pressed 20 from the lateral side and presses thecarrier 3 against theopening 13, i.e., a peripheral part of theopening 13 in thepartition wall 6, so as to hold thecarrier 3 tightly in place. The pair of pressing and holdingmechanisms 23 are arranged at positions corresponding to the opposite sides of thecarrier 3 on the conveying table 10. - The pressing and holding
mechanism 23 includes a verticalrotating shaft 25 rotatably supported on thepartition wall 6 via abracket 24, aflat spring member 26 radially extended from the rotatingshaft 25 to forwardly press and urge thepressing roller 22 which is held on a distal end of theflat spring member 26, and anair cylinder 27 serving as a driving part for rotating therotating shaft 25. Theflat spring member 26 is preferably made of, e.g., stainless, and thepressing roller 22 is preferably made of, e.g., a fluorocarbon resin. As shown inFIGS. 2 and 3 , thebracket 24 is composed of a vertically elongatedattachment board 24 b secured on thepartition wall 6 by a screw 24 a, and the pair of upper and lower support arms 24 c disposed on theattachment board 24 b. The rotatingshaft 25 vertically bridging the upper and lower support pieces 24 c is supported via bearings 24 d to be rotatable about a rotational axis thereof. - One end of the
air cylinder 27 is coupled to alever 28 disposed on a lower end of therotating shaft 25, and the other end of theair cylinder 27 is coupled to the side of the frame 10 a of the conveying table 10. When thelever 28 is pulled by theair cylinder 27, the rotatingshaft 25 is rotated counterclockwise to roll thepressing roller 22 through theflat spring member 26, such that thepressing roller 22 moves from a standby position I near thepartition wall 6 toward the part to be pressed 20 of thecarrier 3, and rides on the part to be pressed 20. On the other hand, when thelever 28 is pushed by theair cylinder 27, the rotatingshaft 25 is rotated clockwise to roll thepressing roller 22 through theflat spring member 26, such that thepressing roller 22 returns from the part to be pressed 20 of thecarrier 3 to the standby position I near thepartition wall 6. - At least the pair of upper and lower
pressing rollers 22 are connected with the rotatingshaft 25 through theflat spring members 26, respectively. Theflat spring members 26 and thepressing rollers 22 are symmetrically arranged in the right and left direction, and thus theflange portions 3 c of thecarrier 3 are pressed against thepartition wall 6 by means of spring forces (urging forces) of a total of fourflat spring members 26. When the pressure in the loading area Sb is 1000 Pa, since a pressure of 11.2 kgf (109.8N) is applied to thecarrier 3, eachflat spring member 26 has to exert a pushing force (pressing force) of 2.8 kgf (27.4 N). Thus, theflat spring member 26 having such a pushing force is used. - In order that the
flat spring member 26 can exert this pressing force, theflat spring member 26 is previously curved against the spring force at the standby position I. Since theflat spring members 26 and thepressing rollers 22 are symmetrical in the right and left direction, the right ones are explained in more detail. As shown inFIG. 5 , one end (proximal end) of theflat spring member 26 is secured on a side surface of therotating shaft 25 by ascrew 29, and the other end (distal end or free end) of theflat spring member 26 is extended forward. Thepressing roller 22 is disposed on the distal end of theflat spring member 26 via a bearingmember 30 such that thepressing roller 22 can rotate about a vertical axis. In this case, since the rotatingshaft 25 is arranged on a rightward position so as not to interfere with thecarrier 3, the distal end side of theflat spring member 26 is extended forward to be obliquely curved leftward, and thepressing roller 22 rides on the part to be pressed 20 and presses the same from the lateral side of thecarrier 3. - Since there is a step between the standby position I and the part to be pressed 20 of the
carrier 3, a tilted guidingsurface 31 is preferably provided to connect the standby position I and the part to be pressed 20 of thecarrier 3 to each other, to thereby smoothly move thepressing roller 22 therebetween. The guidingsurface 31 is provided on thepartition wall 6 or theattachment board 24 b. In order that a curved part 26 c of theflat spring member 26 is not oppositely curved by a resistance force against the pressingroller 22 during a climbing movement thereof on the guidingsurface 31, the rotatingshaft 25 is preferably supportable by a restrictingmember 32 extending along an outer surface of the curved part 26 c. InFIG. 5 , thereference number 33 is a sealing member for sealing a gap between thepartition wall 6 and a front peripheral part of thecarrier 3, when the front surface of thecarrier 3 is pressed against thepartition wall 6. Thepartition wall 6 includes an inertgas inlet passage 34 for introducing an inert gas (such as an N2 gas) into thecarrier 3 to replace an atmosphere therein with the gas, when the lid 3 b is opened while thedoor 14 is being closed. - Effects produced by the vertical-type heat processing apparatus (processing apparatus) as structured above, and a processing method thereof are described below. At first, the
carrier 3 is placed on the table 8 by an operator or a transfer robot. Then, thecarrier 3 is moved by the movingmechanism 11 through the loading/unloading port 7 to reach a transit position II in the carrying-in region Sa. Subsequently, thecarrier 3 is transferred by thetransfer mechanism 12 from the transit position II to the conveying table 10 or the storage rack 9 (see,FIG. 1 ). In this manner, the plurality ofcarriers 3 to be heat-processed are sequentially brought into the carrying-in region Sa, and are stored in the storage racks 9. - After the
carrier 3 is transferred to the conveying table 10 and placed thereon, a not-shown sensor disposed on the conveying table 10, for example, detects that thecarrier 3 has been placed on the conveying table 10. After that, the pressing and holdingmechanism 23 starts its operation. When the above-described fixing mechanism and the moving mechanism are provided, thecarrier 3 is previously fixed on the seat 10 c and is moved along with the seat 10 c relative to thepartition wall 6. - Next, an operation of the pressing and holding
mechanism 23 is described. The rotatingshaft 25 is driven by theair cylinder 27 through thelever 28 to be rotated at a predetermined angle (the right rotating shaft is rotated counterclockwise, and the left rotating shaft is rotated clockwise), so that thepressing roller 22 is rolled through theflat spring member 26 from the standby position I on the lateral side toward the part to be pressed 20 as the rear surface of theflange portion 3 c of thecarrier 3. Then, the pressingroller 22 rides on the part to be pressed 20 of thecarrier 3 from the lateral side thereof, so that thecarrier 3 is pressed against the opening 13 (i.e., the front peripheral part of thecarrier 3 is pressed against the peripheral part of theopening 13 in the partition wall 6), and is tightly held in place by the spring forces of a total of fourflat spring members 26 each pressing thepressing roller 22. Thus, when the door of thepartition wall 6 is opened so that a pressure of the inert gas in the loading area is applied to thecarrier 3, thecarrier 3 is prevented from being inclined due to the pressure, which eliminates various disadvantages resulting from the inclination of thecarrier 3. That is to say, there is no possibility that the inert gas leaks from the loading area Sb toward the carrying-in region Sa to increase an oxidation density in the loading area Sb. In addition, it is not necessary to control the pressure in the loading area Sb to prevent the inclination of thecarrier 3. Further, deterioration of TAT can be prevented. Furthermore, erroneous opening and closing operations of the lid 3 b of the carrier, and a wrong mapping operation of the wafers in the carrier can be prevented. In order to release the pressing and holding force, therotational shaft 25 is driven by theair cylinder 27 to be rotated in the reverse direction. Then, the pressingroller 22 is disengaged from the part to be pressed 20 and is returned to the standby position I. - The tilted
guide surface 31 is placed between the standby position I and the part to be pressed 20. Thus, even when there is a step between the standby position I and the part to be pressed 20, the pressingroller 22 can be smoothly, easily moved. In addition, since the rotatingshaft 25 can be supported by the restrictingmember 32, the curved part 26 c of theflat spring member 26 can be prevented from being oppositely curved. - After the lid 3 b of the
carrier 3 and thedoor 14 are opened, a conveying operation of the wafers w is started. This conveying operation is performed by the conveyingmechanism 18, which takes the wafers w out of thecarrier 3 and sequentially brings the wafers w into theboat 4 via thenotch aligner 15. Upon completion of the conveying operation, theboat 4 is loaded into theheat furnace 5 where the wafers w are subjected to a predetermined heat process. Following thereto, theboat 4 is unloaded onto the loading area Sb, and the processed wafers w are returned by the conveyingmechanism 18 from theboat 4 to thevacant carrier 3 on the conveying table 10. Thereafter, thecarrier 3 is unloaded onto the table 8 via thetransfer mechanism 12 and movingmechanism 11. - As described above, according to the present processing apparatus and the processing method, the
pressing rollers 22 of the pressing and holdingmechanisms 23 ride on the parts to be pressed 20 provided on the opposite sides of the front surface of thecarrier 3 from the lateral sides thereof, so that thecarrier 3 is pressed against theopening 13 and is tightly held in place. Thus, thecarrier 3 can be prevented from being inclined by a pressure in the loading area Sb when the door of thepartition wall 6 is opened. Therefore, various disadvantages resulting from the inclination of thecarrier 3 can be eliminated. Moreover, improvement in inert gas replacing property in thecarrier 3 can be expected. - The pressing and holding
mechanism 23 includes the verticalrotating shaft 25 rotatably supported on thepartition wall 6 via thebracket 24, theflat spring member 26 radially extended from the rotatingshaft 25 to forwardly press and urge thepressing roller 22 which is held on a distal end of theflat spring member 26, and theair cylinder 27 serving as a driving part for rotating therotating shaft 25. Thus, the pressing and holdingmechanism 23 of such a simple structure can exert a sufficient pressing and holding force, as well as reduction in size and cost can be achieved. - At least the pair of upper and lower
pressing rollers 22 are connected with the rotatingshaft 25 through theflat spring members 26, respectively. Thus, spring forces capable of sufficiently enduring a pressure of the inert gas in the loading area Sb can be provided by at least a total of fourflat spring members 26. An atmosphere of the loading area Sb is an inert gas, and a pressure of the loading area Sb is set higher than that of the carrying-in region Sa. Thus, the loading area Sb is excellent in air-tightness, which prevents invasion of particles from outside and allows a time period required for replacing atmospheric air with an inert gas to be reduced. Therefore, increase in oxidation density can be restrained, then formation of a natural oxide film on a surface of a wafer can be prevented. The pressing and holdingmechanisms 23 are arranged on thepartition wall 6 at positions corresponding to the opposite sides of thecarrier 3. Thus, different from the pressing member disclosed in JP2004-6804A, an installation space for the pressing and holdingmechanisms 23 can be easily secured. -
FIG. 6 is a perspective view schematically showing a main part of another embodiment of the present invention. In this embodiment, the same parts as those in the above-described embodiment are shown by the same reference numbers, and their description is omitted. A pressing and holdingmechanism 23 in this embodiment is mainly composed of ahorizontal movement member 36 disposed on anattachment board 24 b via alinear guide 35 to be slidable in a right and left direction, apressing roller 22 disposed on thehorizontal movement member 36 through aflat spring member 26, and anair cylinder 27 as a driving part for horizontally moving thehorizontal movement member 36. There are disposed the pair of upper and lowerhorizontal movement members 36 with a distance therebetween, and the upper and lowerhorizontal movement members 36 are connected to each other through a connectingmember 37. - When each of the
horizontal movement members 36 is driven by theair cylinder 27 to be slid toward a carrier, the pressingroller 22, which is disposed on thehorizontal movement member 36 in a forward movement direction thereof through theflat spring member 26, comes close to a part to be pressed 20 of aflange portion 3 c of thecarrier 3 from a lateral side thereof, and rides on the part to be pressed 20, so that the part to be pressed 20 is pressed and held by a spring force of theflat spring member 26. Theflat spring member 26 in this embodiment is not curved but linear. Also in this embodiment, the same effects as those in the above-described embodiment can be produced. - Although the embodiments of the present invention have been described in detail with reference to the drawings, the present invention is not limited thereto, and various design changes are possible without departing from the scope of the present invention. For example, an inert gas or a clean dry air may be selectively supplied to a loading area corresponding to a process step of a wafer. In addition, the driving part may be a motor.
Claims (12)
1. A processing apparatus comprising:
a container that contains a plurality of objects to be processed, the container including an outlet port formed in a front surface thereof for taking out the object to be processed, and a lid for hermetically sealing the outlet port;
a loading area into which the container is loaded;
a conveying area whose atmosphere differs from an atmosphere in the loading area;
a partition wall that separates the loading area and the conveying area from each other, and has an opening;
a door for opening and closing the opening in the partition wall; and
a stage for placing the container at a position near the opening in the loading area;
wherein parts to be pressed are provided on opposite sides on a side of the front surface of the container, and
the partition wall is provided with a pressing and holding mechanism having a pressing roller that rides on the part to be pressed of the container from a lateral side to press the container against the opening in the partition wall and hold the container tightly in place.
2. The processing apparatus according to claim 1 ,
wherein the pressing and holding mechanism includes: a vertically extended rotating shaft rotatably supported on the partition wall via a bracket; a flat spring member radially extended from the rotating shaft, the flat spring member holding the pressing roller at a distal end, and forwardly pressing and urging the pressing roller; and a driving part for rotating the rotating shaft.
3. The processing apparatus according to claim 2 ,
wherein at least the pair of upper and lower pressing rollers are connected with the rotating shaft through the flat spring members.
4. The processing apparatus according to claim 1 ,
wherein an atmosphere in the conveying area is an inert gas, and
a pressure in the conveying area is set higher than a pressure in the loading area.
5. The processing apparatus according to claim 1 , further comprising a guiding surface disposed on a rear surface of the partition wall on a side of the loading area, the guiding surface guiding the pressing roller of the pressing and holding mechanism positioned at a standby position toward the part to be pressed of the container.
6. The processing apparatus according to claim 2 , further comprising a restricting member extended from the rotating shaft along an outer surface of the flat spring member, the restricting member supporting the flat spring member from a side of the outer surface when the pressing roller rides on the part to be pressed of the container from a lateral side.
7. The processing apparatus according to claim 1 , further comprising a sealing member disposed on a rear surface of the partition wall on a side of the loading area, the sealing member sealing a gap between the partition wall and the container, when the container is brought into contact with the opening.
8. The processing apparatus according to claim 1 , further comprising an inert gas introducing passage disposed in the partition wall, the inert gas introducing passage introducing an inert gas into the container, when the lid of the container is opened while the door is being closed.
9. The processing apparatus according to claim 1 ,
wherein the parts to be pressed are formed of flange portions projecting from a front surface of the container in opposite directions.
10. The processing apparatus according to claim 1 ,
wherein the parts to be pressed are formed of recesses provided in opposite sides on a side of the front surface of the container.
11. The processing apparatus according to claim 1 ,
wherein the flat spring member is made of stainless, and
the pressing roller is made of a fluorocarbon resin.
12. A processing method using a processing apparatus comprising a container that contains a plurality of objects to be processed, the container including an outlet port formed in a front surface thereof for taking out the object to be processed, and a lid for hermetically sealing the outlet port; a loading area into which the container is loaded; a conveying area whose atmosphere differs from an atmosphere in the loading area; a partition wall that separates the loading area and the conveying area from each other, and has an opening; a door for opening and closing the opening in the partition wall; and a stage for placing the container at a position near the opening in the loading area; wherein parts to be pressed are provided on opposite sides on a side of the front surface of the container, and the partition wall is provided with a pressing and holding mechanism having a pressing roller that rides on the part to be pressed of the container from a lateral side to press the container against the opening in the partition wall and hold the container tightly in place; the processing method comprising the steps of:
placing the container on the stage;
bringing the container placed on the stage into contact with the opening;
causing the pressing roller of the pressing and holding mechanism disposed on the partition wall to ride on the parts to be pressed disposed on opposite side on a side of the front surface of the container from a lateral side, to press the container against the opening in the partition wall and hold the container tightly in place; and
opening the door and the lid, and transferring an object to be processed in the container from the loading area to the conveying area.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006239045A JP2008060513A (en) | 2006-09-04 | 2006-09-04 | Treating device and treating method |
| JP2006-239045 | 2006-09-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US20080056861A1 true US20080056861A1 (en) | 2008-03-06 |
Family
ID=39151772
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US11/896,458 Abandoned US20080056861A1 (en) | 2006-09-04 | 2007-08-31 | Processing apparatus and processing method |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20080056861A1 (en) |
| JP (1) | JP2008060513A (en) |
| KR (1) | KR20080021563A (en) |
| CN (1) | CN101140893A (en) |
| TW (1) | TW200830456A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100098517A1 (en) * | 2008-10-16 | 2010-04-22 | Tokyo Electron Limited | Processing apparatus and processing method |
| EP2522028A4 (en) * | 2010-01-08 | 2016-12-07 | Kla Tencor Corp | DOUBLE TRAY SUPPORT UNIT |
| US10665488B2 (en) | 2017-09-27 | 2020-05-26 | Tdk Corporation | Load port apparatus and method of driving the same |
| JP2023083553A (en) * | 2022-02-08 | 2023-06-15 | シンフォニアテクノロジー株式会社 | Load port and drive method of the same |
| US12033879B2 (en) | 2021-08-05 | 2024-07-09 | Samsung Electronics Co., Ltd. | Transfer apparatus having link arms and stockers having the same |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101007711B1 (en) * | 2008-05-19 | 2011-01-13 | 주식회사 에스에프에이 | Plasma processing equipment |
| JP6204226B2 (en) * | 2014-02-24 | 2017-09-27 | 東京エレクトロン株式会社 | Substrate processing apparatus and substrate processing method |
| TWI681915B (en) * | 2015-08-04 | 2020-01-11 | 日商昕芙旎雅股份有限公司 | Loading port |
| JP7428959B2 (en) * | 2019-10-07 | 2024-02-07 | Tdk株式会社 | Load port device and method of driving the load port device |
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- 2007-09-03 KR KR1020070088872A patent/KR20080021563A/en not_active Withdrawn
- 2007-09-04 TW TW096132923A patent/TW200830456A/en unknown
- 2007-09-04 CN CNA2007101491392A patent/CN101140893A/en active Pending
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| US6273664B1 (en) * | 1996-04-03 | 2001-08-14 | Commissariat A L'energie Atomique | Coupling system for the transfer of a confined planar object from a containment pod to an object processing unit |
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| US20100098517A1 (en) * | 2008-10-16 | 2010-04-22 | Tokyo Electron Limited | Processing apparatus and processing method |
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| US10665488B2 (en) | 2017-09-27 | 2020-05-26 | Tdk Corporation | Load port apparatus and method of driving the same |
| US12033879B2 (en) | 2021-08-05 | 2024-07-09 | Samsung Electronics Co., Ltd. | Transfer apparatus having link arms and stockers having the same |
| JP2023083553A (en) * | 2022-02-08 | 2023-06-15 | シンフォニアテクノロジー株式会社 | Load port and drive method of the same |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20080021563A (en) | 2008-03-07 |
| JP2008060513A (en) | 2008-03-13 |
| CN101140893A (en) | 2008-03-12 |
| TW200830456A (en) | 2008-07-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AS | Assignment |
Owner name: TOKYO ELECTRON LIMITED, JAPAN Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:TAKAHASHI, KIICHI;OYAMA, KATSUHIKO;REEL/FRAME:020082/0233;SIGNING DATES FROM 20070809 TO 20070904 |
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| STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |