US6670092B2 - Radiation-sensitive recording material having an electrically conductive back coating - Google Patents
Radiation-sensitive recording material having an electrically conductive back coating Download PDFInfo
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- US6670092B2 US6670092B2 US10/087,354 US8735402A US6670092B2 US 6670092 B2 US6670092 B2 US 6670092B2 US 8735402 A US8735402 A US 8735402A US 6670092 B2 US6670092 B2 US 6670092B2
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- XWQVLLBRMCLSMK-UHFFFAOYSA-N OP(O)=O.CCCCCCCCCC1=CC=CC=C1O Chemical compound OP(O)=O.CCCCCCCCCC1=CC=CC=C1O XWQVLLBRMCLSMK-UHFFFAOYSA-N 0.000 description 1
- 229920000144 PEDOT:PSS Polymers 0.000 description 1
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 1
- 229930182556 Polyacetal Natural products 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 229920002396 Polyurea Polymers 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- 229920002472 Starch Polymers 0.000 description 1
- 229920007962 Styrene Methyl Methacrylate Polymers 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- HOLVRJRSWZOAJU-UHFFFAOYSA-N [Ag].ICl Chemical compound [Ag].ICl HOLVRJRSWZOAJU-UHFFFAOYSA-N 0.000 description 1
- 229910052946 acanthite Inorganic materials 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- PEJLNXHANOHNSU-UHFFFAOYSA-N acridine-3,6-diamine;10-methylacridin-10-ium-3,6-diamine;chloride Chemical compound [Cl-].C1=CC(N)=CC2=NC3=CC(N)=CC=C3C=C21.C1=C(N)C=C2[N+](C)=C(C=C(N)C=C3)C3=CC2=C1 PEJLNXHANOHNSU-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical class C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 229920001893 acrylonitrile styrene Polymers 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 229920000615 alginic acid Polymers 0.000 description 1
- 235000010443 alginic acid Nutrition 0.000 description 1
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 1
- 125000005250 alkyl acrylate group Chemical group 0.000 description 1
- 150000008055 alkyl aryl sulfonates Chemical class 0.000 description 1
- 150000008052 alkyl sulfonates Chemical class 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 238000002048 anodisation reaction Methods 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- HRBFQSUTUDRTSV-UHFFFAOYSA-N benzene-1,2,3-triol;propan-2-one Chemical compound CC(C)=O.OC1=CC=CC(O)=C1O HRBFQSUTUDRTSV-UHFFFAOYSA-N 0.000 description 1
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical class C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 1
- 125000003354 benzotriazolyl group Chemical class N1N=NC2=C1C=CC=C2* 0.000 description 1
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- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
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- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 1
- 150000001728 carbonyl compounds Chemical class 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 229920003086 cellulose ether Polymers 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 239000007859 condensation product Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- PESYEWKSBIWTAK-UHFFFAOYSA-N cyclopenta-1,3-diene;titanium(2+) Chemical compound [Ti+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 PESYEWKSBIWTAK-UHFFFAOYSA-N 0.000 description 1
- 230000006735 deficit Effects 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- 230000004069 differentiation Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000007720 emulsion polymerization reaction Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- CCIVGXIOQKPBKL-UHFFFAOYSA-M ethanesulfonate Chemical compound CCS([O-])(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-M 0.000 description 1
- AZDCYKCDXXPQIK-UHFFFAOYSA-N ethenoxymethylbenzene Chemical compound C=COCC1=CC=CC=C1 AZDCYKCDXXPQIK-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 150000002191 fatty alcohols Chemical class 0.000 description 1
- VOOLKNUJNPZAHE-UHFFFAOYSA-N formaldehyde;2-methylphenol Chemical compound O=C.CC1=CC=CC=C1O VOOLKNUJNPZAHE-UHFFFAOYSA-N 0.000 description 1
- SLGWESQGEUXWJQ-UHFFFAOYSA-N formaldehyde;phenol Chemical compound O=C.OC1=CC=CC=C1 SLGWESQGEUXWJQ-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 229920013821 hydroxy alkyl cellulose Polymers 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- CBEQRNSPHCCXSH-UHFFFAOYSA-N iodine monobromide Chemical compound IBr CBEQRNSPHCCXSH-UHFFFAOYSA-N 0.000 description 1
- MGFYSGNNHQQTJW-UHFFFAOYSA-N iodonium Chemical compound [IH2+] MGFYSGNNHQQTJW-UHFFFAOYSA-N 0.000 description 1
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- 229920000126 latex Polymers 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 1
- ADFPJHOAARPYLP-UHFFFAOYSA-N methyl 2-methylprop-2-enoate;styrene Chemical compound COC(=O)C(C)=C.C=CC1=CC=CC=C1 ADFPJHOAARPYLP-UHFFFAOYSA-N 0.000 description 1
- RIBSIXLJGIEVSH-UHFFFAOYSA-N n-phenyl-n-phenyldiazenylaniline Chemical compound C1=CC=CC=C1N=NN(C=1C=CC=CC=1)C1=CC=CC=C1 RIBSIXLJGIEVSH-UHFFFAOYSA-N 0.000 description 1
- JTHNLKXLWOXOQK-UHFFFAOYSA-N n-propyl vinyl ketone Natural products CCCC(=O)C=C JTHNLKXLWOXOQK-UHFFFAOYSA-N 0.000 description 1
- 150000004010 onium ions Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- HVAMZGADVCBITI-UHFFFAOYSA-M pent-4-enoate Chemical compound [O-]C(=O)CCC=C HVAMZGADVCBITI-UHFFFAOYSA-M 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002006 poly(N-vinylimidazole) polymer Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
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- 229920001748 polybutylene Polymers 0.000 description 1
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- 229920006267 polyester film Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920001195 polyisoprene Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920001021 polysulfide Polymers 0.000 description 1
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- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 230000037452 priming Effects 0.000 description 1
- SCUZVMOVTVSBLE-UHFFFAOYSA-N prop-2-enenitrile;styrene Chemical compound C=CC#N.C=CC1=CC=CC=C1 SCUZVMOVTVSBLE-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 150000003230 pyrimidines Chemical class 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
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- 238000000518 rheometry Methods 0.000 description 1
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- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 150000003346 selenoethers Chemical class 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 150000003378 silver Chemical class 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- FSJWWSXPIWGYKC-UHFFFAOYSA-M silver;silver;sulfanide Chemical compound [SH-].[Ag].[Ag+] FSJWWSXPIWGYKC-UHFFFAOYSA-M 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- NRUVOKMCGYWODZ-UHFFFAOYSA-N sulfanylidenepalladium Chemical compound [Pd]=S NRUVOKMCGYWODZ-UHFFFAOYSA-N 0.000 description 1
- PGWMQVQLSMAHHO-UHFFFAOYSA-N sulfanylidenesilver Chemical compound [Ag]=S PGWMQVQLSMAHHO-UHFFFAOYSA-N 0.000 description 1
- 229940124530 sulfonamide Drugs 0.000 description 1
- 125000001174 sulfone group Chemical group 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 150000003536 tetrazoles Chemical class 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/04—Printing plates or foils; Materials therefor metallic
- B41N1/08—Printing plates or foils; Materials therefor metallic for lithographic printing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
- B41N1/14—Lithographic printing foils
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N6/00—Mounting boards; Sleeves Make-ready devices, e.g. underlays, overlays; Attaching by chemical means, e.g. vulcanising
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/093—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antistatic means, e.g. for charge depletion
Definitions
- the present invention relates to a recording material for the production of offset printing plates having a web- or plate-form support, a radiation-sensitive layer on the front of the support and a continuous layer on its back.
- Recording materials for the production of offset printing plates are usually supplied in stacks of 20 units or more. Extended storage times, the action of pressure and/or elevated ambient temperatures frequently result in the plates adhering to one another. On removal of individual plates from the stack, scratches may then form on the front and/or back. The problem of undesired adhesion can be substantially eliminated with the aid of separating paper.
- the paper is particularly necessary in the case of recording materials having an aluminium support with an uncoated back.
- the separating paper results in new problems.
- the recording materials are frequently produced in in-line finishing plants, in which the plates are automatically cut to the desired size and packed.
- the separating paper is likewise inserted automatically. However, this step is relatively slow and susceptible to faults.
- the paper in some cases affects the radiation-sensitive layer and adversely changes its properties. This may result in discoloration of the layer, due to a change in the pH, a drop in its light sensitivity or rapid ageing.
- surface-sealed papers With surface-sealed papers, the interaction between paper and radiation-sensitive layer can be reduced; however, such papers are significantly more expensive.
- the plate stacks provided with separating paper are generally processed in automatic plants, with the paper usually being blown out. This operation too is again relatively slow and susceptible to faults. In addition, the paper cannot be recycled and has to be disposed of.
- the recording material described in JP-A 02/040657 manages without separating paper.
- a UV-cured layer produced from a photopolymerizable material is located on the back of its aluminium support.
- the composition used for the production of the back coating may also comprise photosensitizers, binders, fillers, inhibitors for preventing thermally induced polymerization of the monomers and other additives.
- JP-A 06/202312 discloses a recording material for the production of offset printing plates whose aluminium support is likewise coated on the back with an organic polymer, such as polyethylene, polypropylene, polybutadiene, polyester, polycarbonate, polyvinyl acetal, polyvinyl chloride, polystyrene or a methacrylate resin.
- the back coating reduces attack by the aqueous-alkaline developer on the aluminium support.
- the light-sensitive layer in this recording material comprises from 1 to 10% by weight of a compound which is insoluble in the developer.
- a recording material having an anodized aluminium support, a photopolymerizable layer on the aluminium oxide layer produced by anodization, and a back coating having a thickness of from 0.1 to 8.0 ⁇ m is disclosed in JP-A 09/265176.
- This back coating consists of a saturated copolymerized polyester resin, a phenoxy resin, a poly-vinyl acetal or a vinylidene chloride copolymer, each of which has a glass transition temperature T g of 20° C. or above. This is intended to prevent scratching of the plates during transport in the stack and delamination of the radiation-sensitive layer due to excessive adhesion to the back of the overlying plate.
- a recording material for the production of offset printing plates which can be stacked without separating paper is also described in EP-A 528 395. It comprises a support (made of aluminium), a layer of an organic polymeric material having a glass transition temperature of not less than 20° C. with a thickness of from 0.01 to 8.0 ⁇ m on the back of the support, and a light-sensitive layer on the front of the support.
- a discontinuous matting layer consisting of particles having a mean diameter of not greater than 100 ⁇ m and a mean height of not greater than 10 ⁇ m is in turn located on the light-sensitive layer.
- matting layers in particular those comprising a material having a low glass transition temperature, tend to stick to the back of the overlying plate in the stack. This may cause relatively large areas of the radiation-sensitive layer to be delaminated, meaning that the recording material can then no longer be used further.
- a recording material having a matting layer on the radiation-sensitive layer and a further, likewise discontinuous matting layer on the back of the support material is disclosed in EP-A 883 028.
- the support material is generally an aluminium web having a length of up to several thousand meters and a thickness of about 0.2 mm which is generally rolled up again after the coating (“coil-to-coil process”).
- a higher pressure prevails in the interior of the roll than in the outer regions. This results in the matting layer located on the front being damaged to a non-uniformly great extent.
- a recording material having a greatly damaged matting layer requires longer evacuation times later in the contact copying frame. This problem is substantially solved by the additional matting layer on the back.
- EP-A 490 515 relates to a pre-sensitized printing plate which, after imagewise exposure, is developed using an aqueous alkali metal silicate solution.
- an organic polymeric coating which is insoluble in the developer.
- the coating comprises polymers such as polyethylene, polypropylene, polybutene, polybutadiene, polyamide, polyurethane, polyurea, polyimide, polysiloxane, polycarbonate epoxy resins, polyvinyl chloride, polyvinylidene chloride or polystyrene. It may also comprise a thermally or photochemically curing component.
- DE-A 199 08 529 describes a recording material having a support which has on the back a layer comprising an organic polymeric material having a glass transition temperature of 45° C. or above, and a pigmented light-sensitive layer located on the front of the support.
- DE-A 100 29 157 relates to a recording material for the production of offset printing plates which has a dimensionally stable support, a radiation-sensitive layer located on the front of the support, and a layer which comprises an organic polymeric material and is resistant to processing chemicals located on the back of the support, where the glass transition temperature of the organic polymeric material is 35° C. or above, and the layer located on the back is pigmented.
- the layer of recording materials known hitherto which is located on the back has high electrical surface resistance. It thus acts as an insulator, enabling electrostatic charges to build up. Since the back layer is advantageously applied before the image layer, it is necessary to dissipate any electrical charges present.
- the electrical charges may be residual charges (from the electrochemical treatment) and/or charges which form due to static charging during passage of the belt through the unit.
- a radiation-sensitive mixture is applied to the pre-treated front of the support in the conventional in-line belt units.
- the mixture virtually always comprises readily volatile organic solvents which are explosive together with air. Static charges, which may result in ignition of a solvent vapour/air mixture, must therefore be avoided under all circumstances.
- the object of the invention was to modify the known back coatings in such a way that they are electrically conductive.
- the back coating comes into contact with a radiation-sensitive layer, it should not adversely change the latter.
- the back coating should not stick to the radiation-sensitive layer or adhere so strongly that damage occurs on removal of the individual plates from the stack.
- a back coating which is electrically conductive.
- it generally comprises conductive, organic polymers or conductive pigments.
- amphiphilic low-molecular-weight compounds are also sufficient.
- the present invention thus relates to a recording material for the production of offset printing plates having a web- or plate-form support, a radiation-sensitive layer on the front of the support and a continuous layer on its back, which is characterized in that the layer located on the back has a glass transition temperature T g of 55° C. or above and an electrical surface resistance of 1 ⁇ 10 6 ⁇ (determined in accordance with DIN 53482 using a spring tongue electrode at 23° C. and 50% relative humidity) or less.
- the back coating may have a smooth or structured surface, depending on the nature of the electrically conductive component and the application method.
- the electrical conductivity is at least sufficiently large that the electrostatic charges which occur during electrochemical treatment of the support material can be dissipated.
- the back coating preferably comprises an electrically conductive polymer, such as polythiophene, polypyrrole, polyacetylene, polyaniline or poly(para-phenylene).
- the proportion of electrically conductive polymer(s) is generally from about 0.1 to 25% by weight, preferably from 0.5 to 10% by weight, in each case based on the total weight of the non-volatile constituents of the back coating.
- an electrically conductive pigment such as a mica pigment coated with a metal (for example nickel) or metal oxide (for example antimony oxide or tin oxide), an aluminium pigment or carbon black.
- the proportion of electrically conductive pigments is generally from 1 to 25% by weight, preferably from 3 to 20% by weight, in each case based on the total weight of the non-volatile constituents of the back coating.
- the pigments always produce a certain minimum roughness (Bekk value ⁇ 500) of the surface of the back coating.
- layers having a very smooth surface (Bekk value greater than 600) can also be produced with the electrically conductive polymers.
- the electrical surface resistance of the back coating can be reduced to from about 1 ⁇ 10 6 to 1 ⁇ 10 ⁇ 2 ⁇ , preferably from 1 ⁇ 10 4 to 1 ⁇ 10 ⁇ 2 ⁇ , by means of the electrically conductive polymer and/or the electrically conductive pigment, depending on the nature and proportion of the additives.
- an amphiphilic, low-molecular-weight compound in the back coating is sufficient.
- This is, for example, an alkylsulfonate, an alkylarylsulfonate or -phosphonate, an ethoxylated alkylamine or a quaternary alkylamine.
- These compounds accumulate at the surface of the layer, where they result in the formation of an electrically conductive moisture film.
- these additives reduce the electrical surface resistance of the layer to only about 10 6 ⁇ . This embodiment is therefore generally less preferred. If the pre-sensitized printing plates are stored in stacks, the amphiphilic, low-molecular-weight compound may in addition diffuse out of the back layer of one plate into the image layer of the adjacent plate and impair the copying properties of the latter.
- the back coating generally comprises an organic, polymeric material which is virtually insoluble in water and aqueous-alkaline developers.
- the glass transition temperature of the back coating is set to the requisite value of 55° C. or above.
- the back coating is physically drying (i.e. not self-curing).
- Particularly suitable materials for a coating of this type are polyolefins (such as polyethylene, polypropylene, polybutylene, polybutadiene or polyisoprene), polyesters, polycarbonates, polyamides, polysiloxanes, polystyrene, homopolymers or copolymers of or with alkyl acrylate or alkyl methacrylate units (such as polymethyl methacrylate (PMMA) or styrene-methyl methacrylate copolymers), polyvinyl acetal, phenoxy resins (for example resins made from bisphenol A and epichlorohydrin), polyvinyl chloride (PVC) or polyvinylidene chloride (PVDC).
- polyolefins such as polyethylene, polypropylene, polybutylene, polybutadiene or polyisoprene
- polyesters such as polyethylene, polypropylene, polybutylene, polybutadiene or polyisoprene
- the layer may in addition comprise additives in secondary amounts. These include, for example, plasticizers, dyes, silicone compounds or surface-active agents.
- additives include, for example, plasticizers, dyes, silicone compounds or surface-active agents.
- the organic polymeric material preferably has a glass transition temperature of 55° C. or above.
- the back coating is self-curing.
- the organic polymeric materials also comprises monomeric or oligomeric compounds which polymerize, condense or crosslink on exposure to radiation, heat and/or oxidizing agents and thus effect curing of the layer.
- addition-polymerizable acrylates or methacrylates such as ethyl (meth)acrylate, propyl (meth)acrylate, butyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, trimethylolpropane mono-, di- or tri(meth)acrylate or pentaerythritol tri(meth)-acrylate.
- (meth)acrylamides such as N-methyl-, N-ethyl-, N-propyl-, N-butyl- or N-isobutyl-(meth)acrylamide; furthermore allyl esters, such as allyl acetate; vinyl ethers, such as butyl vinyl ether, octyl vinyl ether, decyl vinyl ether, 2-methoxyethyl vinyl ether, diethylene glycol vinyl ether or benzyl vinyl ether; polyfunctional urethane acrylates which cure on exposure to UV radiation, and diisocyanate/diol mixtures which cure on exposure to heat to give polyurethanes.
- allyl esters such as allyl acetate
- vinyl ethers such as butyl vinyl ether, octyl vinyl ether, decyl vinyl ether, 2-methoxyethyl vinyl ether, diethylene glycol vinyl ether or benzyl vinyl ether
- (meth)acrylate in the present application stands for “acrylate and/or methacrylate”. A corresponding meaning applies to “(meth)acrylamide” and other derivatives of acrylic or methacrylic acid.
- the curing of the back coating may also be induced by actinic radiation, i.e. the back coating is in this case light-sensitive.
- the radiation-sensitive layer on the front of the support is referred to as “image layer”, since only this is exposed imagewise and developed.
- the back coating is produced with the aid of generally known application methods and devices. Particularly suitable is firstly roller application. Use can be made here of smooth or engraved rollers which effect direct or indirect (offset) application, co-rotating or counter-rotating application. Also suitable is application with the aid of a counterpressure roller or kiss coat.
- the electrically conductive back coating can have a smooth or structured surface.
- the lacquer is initially located in a lacquer trough, from where it is applied to the support (which is preferably an aluminium web or an aluminium band having a thickness of from about 0.1 to 0.3 mm) by means of an uptake roller and an application roller. If necessary, one or more counter-rollers may also be employed here. Instead of an open lacquer trough, it is also possible to use a closed chamber doctor blade.
- the structure here depends on the surface of the coating roller, the relative speeds of the rollers to one another and of the coating roller relative to the substrates.
- the lacquer structure created on the application roller is transferred to the band with little, if any, change.
- the rheology of the lacquer in particular its viscosity.
- the flow properties of the lacquer can be adjusted as required by warming the lacquer and/or the rollers and/or the band.
- the rapid lacquer cooling on the substrate ensures an increase in viscosity and thus fixing of the structures produced.
- any structures desired can be produced both with surface-structured rollers and with smooth rollers.
- Structured rollers are known in various forms. Of these, particular mention should be made of engraved rollers. These can have recesses (pyramidal indents, hexagonal indents, etc.), line grids (hatched rollers), diagonal line grids or combinations thereof.
- a non-planar structure can also be produced after the coating, or one that is already present can be subsequently changed.
- a structured surface can be smoothed using a distributor roller (for example a counter-rotating chrome roller).
- a longitudinally oriented line structure can be achieved using a structured roller or an attached coating bar (wire coating bar or grooved coating bar).
- lacquer structuring possibility that can be used is the viscosity dependence of the application temperature.
- quenching of a lacquer warmed to above room temperature during application on an unheated band, the application structure can be retained until curing.
- preheating the support material the lacquer flow can be improved and the surface structure levelled.
- the dimensionally stable, two-dimensional support can be produced from a multiplicity of materials. Suitable are, for example, supports made from plastic film (in particular polyester films, especially polyethylene terephthalate films), but preferably supports made from a metal or a metal alloy. Of these, preference is in turn given to supports made from aluminium or an aluminium alloy.
- the front of the aluminium support is advantageously mechanically and/or electrochemically roughened and/or anodically oxidized and, if necessary, additionally hydrophilized (for example by treatment with polyvinylphosphonic acid). However, further layers between the support and the image layer are likewise possible, for example hydrophilizing layers or priming layers.
- the support may also be provided with a layer of a ceramic material (additive graining).
- the thickness of the support is generally from 0.1 to 1.0 mm, preferably from 0.2 to 0.6 mm.
- the image layer may be sensitive to UV radiation, visible light and/or IR or heat radiation.
- the radiation-sensitive component in the image layer may, for example, be a diazonium salt, a combination of a photopolymerization initiator and a polymerizable monomer (in particular a monomer containing a polymerizable ethylenically unsaturated group), a combination of a compound which forms acid on irradiation, and a compound which can be cleaved by the photochemically generated acid.
- the image layer may additionally comprise IR dyes, carbon black and/or sensitizers.
- esters of a 1,2-naphthoquinone-2diazido-4- or -5-sulphonic acid and a compound containing at least one phenolic hydroxyl group.
- the last-mentioned compound preferably has at least 3 phenolic hydroxyl groups.
- esterification to compounds containing from 3 to 6 phenolic hydroxyl groups.
- Examples thereof are 2,3,4-trihydroxybenzophenone, 2,3,4-trihydroxy-3′-methyl-, -propyl- or -isopropylbenzophenone, 2,3,4,4′-tetra-hydroxybenzophenone, 2,3,4,2′,4′-pentahydroxybenzo-phenone, 2,3,4,2′,3′,4′-hexahydroxybenzophenone and 5,5′-diacyl-2,3,4,2′,3′,4′-hexahydroxydiphenylmethane.
- not all the phenolic hydroxyl groups therein are esterified.
- the degree of esterification, based on all hydroxyl groups, is typically from 60 to 95%.
- Amides of 1,2-naphthoquinone-2-diazido-4- or -5-sulphonic acid are likewise suitable.
- Esterification components which can be used are also products of the condensation of pyrogallol and aldehydes or ketones and products of the condensation of alkylated phenol and formaldehyde.
- the content of radiation-sensitive compounds is from about 1 to 50% by weight, based on the total weight of the non-volatile constituents of the mixture.
- Image layers comprising naphthoquinonediazidosulphonic acid esters or -sulfonamides as radiation-sensitive component are particularly sensitive to UV and visible light.
- Positive-working image layers which are insensitive to UV radiation and visible light, but can be imaged by IR or heat radiation are likewise known (EP-A 900 653).
- the layer comprises, as radiation-sensitive components, carbon black particles or a dye in disperse form which is sensitive in the IR region.
- IR radiation in particular IR laser radiation, effects imagewise differentiation in the layer, enabling the irradiated areas to be removed by a developer.
- recording materials having a positive-working image layer which comprises a combination of a compound containing at least one C—O—C bond which can be broken by acid and a compound which forms a strong acid on exposure to actinic radiation.
- Layers of this type are known to the person skilled in the art and are described in large number, for example EP-A 717 317.
- photopolymerizable image layers usually comprise a free-radical-polymerizable component (monomer) and an initiator which is capable of initiating polymerization of the monomer on exposure to actinic radiation.
- the initiator is, for example, a combination of a photoreducible dye and a metallocene, in particularly a titanocene.
- the monomers frequently contain free-radical-polymerizable acrylate or methacrylate groups.
- the light sensitivity of such layers can be increased still further by employing monomers containing at least one photooxidizable group or additionally onium compounds, in particular iodonium or sulphonium salts.
- Photopolymerizable layers are impaired by atmospheric oxygen. They are therefore often protected by a cover layer which is relatively impermeable to oxygen, but which can be removed completely again by aqueous developers.
- the image layer may also comprise silver halide as the radiation-sensitive component. It then includes a silver halide emulsion layer. Preference is given to image layers which work by the silver complex diffusion transfer reversal process (abbreviated to DTR process). It then consists of two or more part layers, as described in greater detail in EP-A 410 500, 423 399 or 883 027.
- the lowermost, i.e. closest to the support, is usually a receiving layer comprising silver nuclei.
- the nuclei initiate the development of the silver complexes that have diffused in, giving a silver image when a suitable developer acts thereon.
- the development nuclei are preferably produced by application of colloidal silver, gold, platinum, palladium or other metals.
- They may furthermore consist of heavy-metal sulphides or selenides, for example sulphides of antimony, bismuth, cadmium, cobalt, lead, nickel, palladium, platinum, silver or zinc. Palladium sulphide and the nickel/silver sulphide NiS.Ag 2 S described in U.S. Pat. No. 4,563,410 are particularly suitable. Also suitable are polyselenides or polysulphides of heavy metals.
- dyes or pigments may be present as antihalo agents, either as a constituent of the nucleus layer or in a separate layer. The type of dye or pigment depends on the region of the spectrum in which the silver halide emulsion layer is sensitive.
- the nucleus layer is very thin (generally less than 0.5 ⁇ m); it normally contains no binder. As already described, the nucleus layer is not absolutely necessary. If no such layer is present, constituents of the metallic support take on the role of the development nuclei. Finally, it is also possible to arrange the image receiving layer or nucleus layer on a separate support. DTR materials of this type consisting of two elements are known in principle.
- a thin, silver-free interlayer for example a layer of pigment and a hydrophilic, film-forming polymer, for example polyvinyl alcohol or pullulane, is located above the receiving layer.
- the next is a silver halide emulsion layer.
- the silver halide is, for example, silver chloride, bromide, bromoiodide, chlorobromoiodide or a mixture thereof.
- the silver halide advantageously comprises more than 90% by weight, based on the total weight of the silver halides, of silver chloride. In addition, small amounts of silver chloroiodide and/or silver bromide are frequently also present.
- the silver halide particles in the emulsion layer normally have a mean size of from 0.05 to 1.0 ⁇ m, preferably from 0.25 to 0.45 ⁇ m. They can also be produced by the core of the particles having a different composition than the shell. Silver bromide is frequently located exclusively in the core.
- the binders used for this layer are generally hydrophilic colloids, preferably gelatine. The gelatine is advantageously not hardened.
- the emulsion layer may also comprise dyes in order to adjust the spectral sensitivity of the silver halide layer and/or in order to prevent undesired light scattering. These are, for example, methine, cyanine or hemicyanine dyes.
- the silver halide layer may comprise conventional emulsion stabilizers, for example azaindenes, especially tetra- or pentaazaindenes.
- the azaindenes are preferably substituted by amino or hydroxyl groups.
- An example of a substituted azaindene of this type is 4-hydroxy-6-methyl-1,3,3a,7-tetraazaindene.
- Other suitable stabilizers are quaternized benzothiazoles, benzotriazoles and heterocyclic mercapto compounds, for example mercapto-substituted tetrazoles and pyrimidines.
- An example of a tetrazole of this type is 1-[3-(2-sulphobenzoylamino)phenyl]-5-mercaptotetrazole.
- a protective layer may also be located on the silver halide emulsion layer. It generally has a weight of from 0.50 to 1.75 g/m 2 preferably from 0.60 to 1.20 g/m 2 and advantageously consists of unhardened gelatine (a 10% strength by weight aqueous solution of the gelatine has a viscosity of preferably less than 20 mPa ⁇ s at 40° C. and at pH 6).
- the cover layer may in turn comprise dyes and/or coloured pigments and/or matting agents.
- the matting agent here generally consists of particles having a mean diameter of from 0.2 to 10 ⁇ m, preferably from 0.5 to 6.0 ⁇ m.
- the image layer may also be imaged by an electrophotographic principle.
- it usually comprises a photoconductive layer comprising an organic photo-conductor on an electrically conductive support.
- the image layer usually also comprises a polymeric, organic binder.
- phenolformaldehyde condensates where the term “phenol” here is also taken to mean substituted phenols, such as resorcinol, cresol, xylenol, and the like.
- formaldehyde it is also possible to employ other aldehydes or also ketones as condensation partner.
- products of the reaction of diisocyanates with diols or diamines, in particular those containing acid groups are also suitable.
- the Bekk smoothness of the surface on this side is generally less than 600 s, preferably from 100 to 150 s.
- the further processing (imagewise exposure or irradiation, development, etc.) for the recording materials according to the invention is carried out virtually in the same way as for recording materials without back coatings. Since the back coating is resistant to processing chemicals, it also prevents attack by the developer on the support. This is particularly important in the case of aluminium supports. These are attacked by alkaline developers, in particular by strongly alkaline developers, which increases the developer load and thus reduces its service life.
- R1 80 pbw of a multifunctional acrylate monomer (®Laromer LR8986 from BASF AG)
- TPGDA tripropylene glycol diacrylate
- R2 80 pbw of a multifunctional acrylate monomer (®Laromer LR8986 from BASF AG)
- R5 10 pbw of acrylonitrile-styrene copolymer having an acrylonitrile content of 45%
- R6 80 pbw of a multifunctional acrylate monomer (®Laromer LR8986 from BASF AG),
- TPGDA tripropylene glycol diacrylate
- R7 15 pbw of polyurethane (®Desmodur 2170 from Bayer AG) and
- P2 7.8 pbw of a cresol-formaldehyde novolak having a hydroxyl number of 420 in accordance with DIN 53783/53240 and a mean molecular weight by GPC of 6000 (polystyrene standard),
- MMA-ethyl acrylate-acrylic acid copolymer (weight ratio 65:20:15) which had been partially neutralized (sodium, potassium or ammonium salt) was dissolved in water to give a 12% strength solution.
- This solution was applied using a rotating electrostatic spray device (speed of the spray head 25,000 rpm). 40 ml/min were sprayed with the voltage at the spray head being ⁇ 90 kV. The spray process was carried out at 25° C. and 50% atmospheric humidity. 2.5 seconds after spraying with the copolymer solution, the copy layer was sprayed with steam and then dried for 5 seconds using hot air (60° C., 10% relative atmospheric humidity). Elevations were formed on the matting layer with an average height of 6 ⁇ m and an extension of 30 ⁇ m. The mean thickness of the matting layer was 0.15 g/m 2 .
- a matting layer was applied as follows:
- An electrostatic spray device with a capillary was charged with a solution comprising 35% of a cresol-formaldehyde resin and 65% of ethylene glycol ethyl ether acetate (2-ethoxyethanol acetate).
- the conductivity of the solution was 1.2 ⁇ 10 7 pS m ⁇ 1 .
- a voltage of ⁇ 30 kV was applied.
- the coating was then carried out at a temperature of 30° C. from a distance of 300 mm from the coated plate at a spray rate of 0.70 cm 3 . In this way, a discontinuous layer was obtained whose particles had a diameter of from about 30 to 40 ⁇ m and did not penetrate through the copy layer.
- the layer produced from the mixture had a weight of 1.9 g/m 2
- N2 as N1, but where the mixture additionally contained 0.10 pbw of a silica gel filler having a mean particle size of 3 ⁇ m,
- N3 as N1, but with an additional matting layer applied as follows:
- MMA methyl methacrylate-ethyl acrylate-acrylic acid copolymer
- weight ratio 65:20:15 which had been partially neutralized (sodium, potassium or ammonium salt) is dissolved in water (12% strength by weight).
- This solution was applied using a rotating electrostatic spray device (speed of the spray head 25,000 rpm). 40 ml/min were sprayed, with the voltage at the spray head being ⁇ 90 kV.
- the spray process was carried out at 25° C. and 50% atmospheric humidity. 2.5 seconds after spraying with the copolymer solution, the copy layer was sprayed with steam and then dried for 5 seconds using hot air (60° C., 10% relative atmospheric humidity). Elevations were formed on the matting layer with an average height of 6 ⁇ m and an extension of 30 ⁇ m.
- the mean thickness of the matting layer is 0.15 g/m 2 .
- the layer weight of the dried layers N1 to N3 was in each case 0.9 g/m 2 (in the case of layer N3 before application of the matting layer).
- the layer weight was 1.0 g/m 2 .
- a water-soluble cover layer was applied to this radiation-sensitive layer. To this end, the following coating solution was used:
- the weight of the cover layer after drying was 2.0 g/m 2 .
- T1 9.70 pbw of a cresol-formaldehyde novolak having a hydroxyl number of 420 in accordance with DIN 53783/53240 and a mean molecular weight by GPC of 6000 (polystyrene standard),
- poly(4-hydroxystyrene) having an M w of from 4000 to 6000 and an M n of from 2100 to 3100 (®Maruka Lyncur M, grade S2 from Maruzen Petrochemical Co., Ltd.),
- T2 9.00 pbw of polystyrene latex having a mean particle size of 2 ⁇ m (25% strength in water), prepared by emulsion polymerization
- fluorosurfactant (®MegaFac F-177 from Dainippon Ink & Chemicals)
- A1 Firstly, a nucleus layer comprising 2.3 mg of silver nuclei (prepared from colloidal silver) was produced. An interlayer comprising a mixture of binder (pullulan) and coloured pigment (®Levanyl Red dispersion) was applied to this nucleus layer. The interlayer comprised 0.1 g/m 2 of pullulan and 0.2 g/m 2 of Levanyl Red dispersion.
- An unhardened, negative-working, cadmium-free gelatine/silver chloroiodide emulsion (weight ratio 99.75:0.25) was then applied to the interlayer.
- This layer furthermore comprised 1 mmol of 4-hydroxy-6-methyl-1,3,3a,7-tetraazaindene and 2.2 mmol of 1-[3-(2-sulfobenzoylamino)phenyl]-5-mercaptotetrazole per mole of AgX.
- the silver halide was applied in an amount which corresponded to 2.4 g/m 2 of silver nitrate.
- the gelatine was applied in an amount of 1.6 g/m 2 .
- the gelatine comprised two different types, one of which had a viscosity of 21 mPa ⁇ s (0.7 g/m 2 ) and the other had a viscosity of 14 mPa ⁇ s (0.9 g/m 2 ).
- a cover layer comprising 0.7 g/m 2 of gelatine having a viscosity of between 10 and 12 mPa ⁇ s, 0.1 g/m 2 of Levanyl Red dispersion and 0.12 g/m 2 of a matting agent having a particle diameter of 7.5 ⁇ m was applied to the silver halide emulsion layer.
- Rhodamine FB 0.02 pbw of Rhodamine FB (C.I. 45170)
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Abstract
Description
| The test results are summarized in the following table: |
| Backs |
| Front | Test | R1 | R2 | R3 | R4 | R5 | R6 | R7 | R8V* |
| P1 | 1 | + | + | + | + | + | 0 | − | + |
| 2 | + | + | + | + | + | + | + | + | |
| P2 | 1 | + | + | + | + | + | 0 | − | + |
| 2 | + | + | + | + | + | + | + | + | |
| P3 | 1 | + | + | + | + | + | 0 | − | + |
| 2 | + | + | + | + | + | + | + | + | |
| P4 | 1 | + | + | + | + | + | 0 | − | + |
| 2 | + | + | + | + | |||||
| P5 | 1 | + | + | + | + | + | 0 | − | + |
| 2 | + | + | + | + | + | + | + | ||
| N1 | 1 | + | + | + | + | + | 0 | − | + |
| 2 | + | + | + | + | + | + | + | + | |
| N2 | 1 | + | + | + | + | + | 0 | − | + |
| 2 | + | + | + | + | + | + | + | + | |
| N3 | 1 | + | + | + | + | + | 0 | − | + |
| 2 | + | + | + | + | + | + | + | ||
| N4 | 1 | + | + | + | + | + | + | − | + |
| 2 | + | + | + | + | + | 0 | + | + | |
| T1 | 1 | + | + | + | + | + | 0 | − | + |
| 2 | + | + | + | + | + | 0 | + | + | |
| T2 | 1 | + | + | + | + | + | 0 | − | + |
| 2 | + | + | + | + | + | 0 | + | + | |
| A1 | 1 | + | + | + | + | + | 0 | − | + |
| 2 | + | + | + | + | + | − | + | + | |
| E1 | 1 | + | + | + | + | + | 0 | − | + |
| 2 | + | + | + | + | + | + | + | + | |
Claims (19)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10110728A DE10110728A1 (en) | 2001-03-06 | 2001-03-06 | Radiation-sensitive recording material with an electrically conductive back coating |
| DE10110728.5 | 2001-03-06 | ||
| DE10110728 | 2001-03-06 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| US20020182533A1 US20020182533A1 (en) | 2002-12-05 |
| US6670092B2 true US6670092B2 (en) | 2003-12-30 |
Family
ID=7676462
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US10/087,354 Expired - Lifetime US6670092B2 (en) | 2001-03-06 | 2002-03-01 | Radiation-sensitive recording material having an electrically conductive back coating |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6670092B2 (en) |
| EP (1) | EP1239328B1 (en) |
| JP (1) | JP2002333704A (en) |
| DE (2) | DE10110728A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020127489A1 (en) * | 2000-12-20 | 2002-09-12 | Steffen Denzinger | Radiation-sensitive recording material having a structured back |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004354827A (en) * | 2003-05-30 | 2004-12-16 | Konica Minolta Medical & Graphic Inc | Planographic printing plate material, printing plate obtained by using the same and printing method |
| JP2005219366A (en) * | 2004-02-06 | 2005-08-18 | Konica Minolta Medical & Graphic Inc | Planographic printing plate material, printing plate, and printing method |
| JP2006056184A (en) * | 2004-08-23 | 2006-03-02 | Konica Minolta Medical & Graphic Inc | Printing plate material and printing plate |
| DE602006012764D1 (en) * | 2005-07-28 | 2010-04-22 | Fujifilm Corp | Infrared-sensitive planographic printing plate precursor |
| JP2007065387A (en) * | 2005-08-31 | 2007-03-15 | Fujifilm Holdings Corp | Infrared sensitive lithographic printing original plate |
| US7306891B2 (en) | 2005-09-27 | 2007-12-11 | Fujifilm Corporation | Infrared-sensitive planographic printing plate precursor |
| JP4611185B2 (en) * | 2005-11-28 | 2011-01-12 | 富士フイルム株式会社 | Infrared photosensitive lithographic printing plate precursor |
| EP1859954B2 (en) † | 2006-05-25 | 2017-11-08 | FUJIFILM Corporation | Planographic printing plate precursor and stack thereof |
| EP2543517A1 (en) * | 2011-07-07 | 2013-01-09 | Folex Coating GmbH | Conductive underlay for offset printing |
| WO2014202519A1 (en) | 2013-06-18 | 2014-12-24 | Agfa Graphics Nv | Method for manufacturing a lithographic printing plate precursor having a patterned back layer |
| EP3677435B1 (en) * | 2017-08-31 | 2023-09-06 | FUJIFILM Corporation | Printing plate precursor and printing plate precursor laminate |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20020127489A1 (en) * | 2000-12-20 | 2002-09-12 | Steffen Denzinger | Radiation-sensitive recording material having a structured back |
| US6936404B2 (en) * | 2000-12-20 | 2005-08-30 | Agfa-Gevaert | Radiation-sensitive recording material having a structured back |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1239328B1 (en) | 2006-06-21 |
| DE60212472T2 (en) | 2006-12-21 |
| JP2002333704A (en) | 2002-11-22 |
| EP1239328A3 (en) | 2003-04-23 |
| DE60212472D1 (en) | 2006-08-03 |
| US20020182533A1 (en) | 2002-12-05 |
| DE10110728A1 (en) | 2002-10-02 |
| EP1239328A2 (en) | 2002-09-11 |
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