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WO1992001973A3 - Outil d'emboutissage - Google Patents

Outil d'emboutissage Download PDF

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Publication number
WO1992001973A3
WO1992001973A3 PCT/US1991/005085 US9105085W WO9201973A3 WO 1992001973 A3 WO1992001973 A3 WO 1992001973A3 US 9105085 W US9105085 W US 9105085W WO 9201973 A3 WO9201973 A3 WO 9201973A3
Authority
WO
WIPO (PCT)
Prior art keywords
embossing tool
embossing
transfer layer
substrate
relief pattern
Prior art date
Application number
PCT/US1991/005085
Other languages
English (en)
Other versions
WO1992001973A2 (fr
Inventor
Stephen P Mcgrew
Original Assignee
Stephen P Mcgrew
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stephen P Mcgrew filed Critical Stephen P Mcgrew
Publication of WO1992001973A2 publication Critical patent/WO1992001973A2/fr
Publication of WO1992001973A3 publication Critical patent/WO1992001973A3/fr

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H1/0276Replicating a master hologram without interference recording
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H1/0276Replicating a master hologram without interference recording
    • G03H1/028Replicating a master hologram without interference recording by embossing
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04Processes or apparatus for producing holograms
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H1/0276Replicating a master hologram without interference recording
    • G03H2001/0292Replicating a master hologram without interference recording by masking
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H1/0276Replicating a master hologram without interference recording
    • G03H2001/0296Formation of the master hologram
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04Processes or apparatus for producing holograms
    • G03H1/0402Recording geometries or arrangements
    • G03H2001/043Non planar recording surface, e.g. curved surface
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04Processes or apparatus for producing holograms
    • G03H1/0476Holographic printer
    • G03H2001/0482Interference based printer
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2223/00Optical components
    • G03H2223/14Diffuser, e.g. lens array, random phase mask
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2224/00Writing means other than actinic light wave
    • G03H2224/04Particle beam, e.g. e-beam
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2225/00Active addressable light modulator
    • G03H2225/10Shape or geometry
    • G03H2225/111D SLM
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00Recording materials or recording processes
    • G03H2260/14Photoresist
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00Recording materials or recording processes
    • G03H2260/50Reactivity or recording processes
    • G03H2260/63Indirect etching, e.g. lithography
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2270/00Substrate bearing the hologram
    • G03H2270/10Composition
    • G03H2270/13Metallic
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03HHOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2270/00Substrate bearing the hologram
    • G03H2270/20Shape
    • G03H2270/21Curved bearing surface

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Holo Graphy (AREA)

Abstract

Procédé et appareil servant à fabriquer des outils d'emboutissage résistants. On emploie un procédé de gravure anisotrope, tel qu'un procédé de gravure ionique, pour graver un motif en relief sur un substrat dur. On forme une couche de transfert sur une zone de surface globalement lisse et sans soudure d'un substrat. On forme un motif en relief prédéterminé dans la couche de transfert en exposant un agent photorésistant, un agent d'emboutissage ou autre. Le substrat comprenant l'agent photorésistant sur sa surface est soumis à une gravure anisotrope. La gravure anisotrope se poursuit jusqu'à ce que la couche de transfert soit entièrement éliminée et jusqu'à ce que le motif en relief soit formé dans la surface supérieure de l'outil d'emboutissage. Les taux de gravure relatifs entre la couche de transfert et la zone de surface de l'outil d'emboutissage sont choisis pour permettre la variation désirée de la profondeur dans la surface de l'outil d'emboutissage. L'outil d'emboutissage fabriqué suivant le procédé de cette invention possède une surface relativement dure et on peut donc l'utiliser pour la production à grande échelle d'images holographiques sans qu'il se produise une dégradation significative du motif. Etant donné que l'on peut fabriquer l'outil d'emboutissage avec un matériau extrêmement dur comme du chrome ou de l'acier trempé, on peut à présent créer par emboutissage des hologrammes sur des matériaux tels que de l'aluminium ou de l'acier, que l'on ne pouvait utiliser jusqu'à présent de manière rentable, à l'aide de l'outil d'emboutissage fabriqué suivant le procédé de cette invention.
PCT/US1991/005085 1990-07-20 1991-07-18 Outil d'emboutissage WO1992001973A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US55616490A 1990-07-20 1990-07-20
US556,164 1990-07-20

Publications (2)

Publication Number Publication Date
WO1992001973A2 WO1992001973A2 (fr) 1992-02-06
WO1992001973A3 true WO1992001973A3 (fr) 1992-03-19

Family

ID=24220166

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1991/005085 WO1992001973A2 (fr) 1990-07-20 1991-07-18 Outil d'emboutissage

Country Status (3)

Country Link
US (1) US5521030A (fr)
AU (1) AU8282691A (fr)
WO (1) WO1992001973A2 (fr)

Families Citing this family (57)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5672410A (en) 1992-05-11 1997-09-30 Avery Dennison Corporation Embossed metallic leafing pigments
FR2701152B1 (fr) * 1993-02-03 1995-03-10 Digipress Sa Procédé de fabrication d'un disque maître pour la réalisation d'une matrice de pressage notamment de disques optiques, matrice de pressage obtenue par ce procédé et disque optique obtenu à partir de cette matrice de pressage.
JP3268929B2 (ja) * 1993-04-19 2002-03-25 オリンパス光学工業株式会社 光学素子の製造方法
JPH08512003A (ja) * 1993-07-27 1996-12-17 フィジィカル オプティクス コーポレーション 光源の解体成形装置
GB2299726B (en) * 1995-04-07 1999-07-28 Rank Cintel Ltd Diffusers for film scanners and the like
AP9801217A0 (en) * 1995-09-29 1998-03-31 Sage Tech Incorporated Optical digital media recording and reproduction system.
JP3058062B2 (ja) * 1995-10-13 2000-07-04 日本電気株式会社 光ディスク用記録原盤の製造方
US8128856B2 (en) * 1995-11-15 2012-03-06 Regents Of The University Of Minnesota Release surfaces, particularly for use in nanoimprint lithography
US5746865A (en) * 1996-07-09 1998-05-05 Hampshire Holographic Manufacturing Corp. Process for transferring holographic images
US20030182982A1 (en) * 1997-03-25 2003-10-02 Seagate Technology Llc Ion milled punch and die for coining disc drive motor bearing surfaces
DE19721524A1 (de) * 1997-05-22 1998-11-26 Hsm Gmbh Verfahren zur Herstellung eines Prägezylinders
EP1032824A4 (fr) 1997-10-15 2003-07-23 Aclara Biosciences Inc Dispositif a microstructure stratifiee et procede de fabrication de ce dispositif
US6017657A (en) * 1997-11-26 2000-01-25 Bridgestone Graphic Technologies, Inc. Method for embossing holograms into aluminum and other hard substrates
US20040003638A1 (en) * 1997-12-12 2004-01-08 Schaefer Mark W. Transfer of holographic images into metal sporting and fitness products
US5881444A (en) * 1997-12-12 1999-03-16 Aluminum Company Of America Techniques for transferring holograms into metal surfaces
US7094502B2 (en) 1997-12-12 2006-08-22 Alcon Inc. Methods for transferring holographic images into metal surfaces
US6222157B1 (en) 1998-04-17 2001-04-24 L.A. Batchelder And Sons Consulting, Inc. Seamless holographic transfer using laser generated optical effect patterns
US6303276B1 (en) * 1998-05-08 2001-10-16 Physical Optics Corporation Method and apparatus for making optical master surface diffusers suitable for producing large format optical components
JP4458394B2 (ja) * 1998-05-08 2010-04-28 旭化成株式会社 非干渉光を用いて光学マスターを作成する作成方法
EP1003078A3 (fr) 1998-11-17 2001-11-07 Corning Incorporated Procédé pour reproduire un motif nanométrique
IT1303658B1 (it) * 1998-12-23 2001-02-21 Veneta Decalcogomme S R L Procedimento per la riproduzione di immagini o di testi su filmmetalizzato olografico in tutte le sue varianti e colori lucido,
AU5145299A (en) * 1999-08-09 2001-03-05 Alcan International Limited Process of producing diffraction gratings on the surfaces of articles
TW540046B (en) * 1999-09-01 2003-07-01 Matsushita Electric Industrial Co Ltd Optical disk stamper mastering method and apparatus
DE60118843T2 (de) * 2000-02-07 2006-11-30 Koninklijke Philips Electronics N.V. Stempel für ein lithographisches verfahren, methode zur stempelherstellung und methode zur herstellung einer gemusterten schicht auf einem substrat
GB2360971A (en) * 2000-04-03 2001-10-10 Suisse Electronique Microtech Technique for microstructuring replication moulds
US6454978B1 (en) 2000-06-16 2002-09-24 Avery Dennison Corporation Process for making fuel cell plates
US7923173B1 (en) 2000-10-19 2011-04-12 Illinois Tool Works Inc. Photo definable polyimide film used as an embossing surface
GB0104611D0 (en) * 2001-02-23 2001-04-11 Koninkl Philips Electronics Nv Printing plates
US7108819B2 (en) * 2001-08-27 2006-09-19 The Boeing Company Process for fabricating high aspect ratio embossing tool and microstructures
US20030209819A1 (en) * 2001-11-02 2003-11-13 Brown David R. Process for making micro-optical elements from a gray scale etched master mold
FI113717B (fi) * 2001-12-13 2004-05-31 Outokumpu Oy Menetelmä tekstuuripinnalla varustetun yhdysterminaalin valmistamiseksi ja sen käyttö
US20040009405A1 (en) * 2002-07-09 2004-01-15 Cheng-Hsiu Chen Hologram media printing wheel
DE10232148B4 (de) * 2002-07-16 2009-01-08 Fiberweb Corovin Gmbh Verfahren zum flüssigkeitsdurchlässigen Perforieren eines Vlieses
US20040221639A1 (en) * 2003-05-06 2004-11-11 Daniel Woo Coining holographic images into contoured surfaces on hard temper metal products
US20050015987A1 (en) * 2003-07-17 2005-01-27 Eastman Kodak Company Metering roller for fuser release oil applicator
US20050112472A1 (en) * 2003-11-20 2005-05-26 Kutsch Wilhelm P. Seamless holographic embossing substrate produced by laser ablation
US7833389B1 (en) 2005-01-21 2010-11-16 Microcontinuum, Inc. Replication tools and related fabrication methods and apparatus
US9307648B2 (en) * 2004-01-21 2016-04-05 Microcontinuum, Inc. Roll-to-roll patterning of transparent and metallic layers
US7674103B2 (en) * 2005-01-21 2010-03-09 Microcontinuum, Inc. Replication tools and related fabrication methods and apparatus
US20070128748A1 (en) * 2004-02-06 2007-06-07 Yit-Shun Leung Ki Microreplication of transitory-image relief pattern based optically variable devices
TW200529371A (en) * 2004-02-20 2005-09-01 Hon Hai Prec Ind Co Ltd A manufacturing method of a stamper
US7143495B2 (en) * 2004-03-05 2006-12-05 Wing Brandon M Backlight etching process
US7367759B2 (en) * 2004-12-07 2008-05-06 A.M. Precision Machining, Inc. Surface relief grating image machining process and product
WO2007001977A2 (fr) 2005-06-20 2007-01-04 Microcontinuum, Inc. Systeme et procede pour une configuration cylindre a cylindre
US7906057B2 (en) * 2005-07-14 2011-03-15 3M Innovative Properties Company Nanostructured article and method of making the same
US7651863B2 (en) * 2005-07-14 2010-01-26 3M Innovative Properties Company Surface-enhanced spectroscopic method, flexible structured substrate, and method of making the same
US20070014997A1 (en) * 2005-07-14 2007-01-18 3M Innovative Properties Company Tool and method of making and using the same
WO2007100849A2 (fr) 2006-02-27 2007-09-07 Microcontinuum, Inc. Formation d'outils de reproduction de motifs
WO2007111469A1 (fr) * 2006-03-28 2007-10-04 Lg Chem, Ltd. Procédé de formation de nanomotif et substrat sur lequel est formé un motif selon le procédé
GB0624463D0 (en) * 2006-12-07 2007-01-17 Falcontec Ltd Process for producing a die
BR122018011175B1 (pt) * 2007-05-25 2021-02-02 Toppan Printing Co., Ltd. representação e matéria impressa com informações
US20110195266A1 (en) * 2010-02-06 2011-08-11 Illinois Tool Works Seamless sleeve and seamless substrate
US8845912B2 (en) 2010-11-22 2014-09-30 Microcontinuum, Inc. Tools and methods for forming semi-transparent patterning masks
US9308726B2 (en) * 2012-02-16 2016-04-12 Xerox Corporation Printhead fluid paths formed with sacrificial material patterned using additive manufacturing processes
US9589797B2 (en) 2013-05-17 2017-03-07 Microcontinuum, Inc. Tools and methods for producing nanoantenna electronic devices
DE102014226970A1 (de) * 2014-11-28 2016-06-02 Sms Group Gmbh Oberflächentexturierung von Umformungswerkzeugen
JP6790731B2 (ja) * 2016-11-01 2020-11-25 東洋製罐グループホールディングス株式会社 ダイヤモンド膜表面に微細周期構造溝を形成する方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3944420A (en) * 1974-05-22 1976-03-16 Rca Corporation Generation of permanent phase holograms and relief patterns in durable media by chemical etching
GB1508660A (en) * 1974-05-22 1978-04-26 Rca Corp Method for producing aluminium relief masters
US4514479A (en) * 1980-07-01 1985-04-30 The United States Of America As Represented By The Secretary Of The Navy Method of making near infrared polarizers
US4629282A (en) * 1980-11-05 1986-12-16 Mcgrew Stephen P Diffractive color and texture effects for the graphic arts
WO1989012261A1 (fr) * 1988-06-03 1989-12-14 Michael Teitel Hologramme modele et procede de reproduction de micromotifs
EP0365031A2 (fr) * 1988-10-21 1990-04-25 Toppan Printing Co., Ltd. Matrice pour hologramme, sa méthode de fabrication et méthode de fabrication d'hologramme

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3048512A (en) * 1957-06-27 1962-08-07 Modern Engraving And Machine C Method of making matched embossing rolls
US3244094A (en) * 1962-07-16 1966-04-05 Kimberly Clark Co Metal embossing roller for paper
US3647289A (en) * 1969-03-28 1972-03-07 Holotron Corp Apparatus and method for hologram copying with reference beam intensity control
US3656827A (en) * 1969-04-03 1972-04-18 Ibm Holographic read/write storage system
US3610143A (en) * 1969-07-25 1971-10-05 Hallmark Cards Method of preparing rotary screen printing cylinder
US3733258A (en) * 1971-02-03 1973-05-15 Rca Corp Sputter-etching technique for recording holograms or other fine-detail relief patterns in hard durable materials
JPS5738897B2 (fr) * 1974-11-19 1982-08-18
US4206965A (en) * 1976-08-23 1980-06-10 Mcgrew Stephen P System for synthesizing strip-multiplexed holograms
JPS58144880A (ja) * 1982-02-23 1983-08-29 Fujitsu Ltd ホログラム作成方法
US4446197A (en) * 1982-07-23 1984-05-01 The Goodyear Tire & Rubber Company Ion beam deposition or etching re rubber-metal adhesion
JPS60124827A (ja) * 1983-12-09 1985-07-03 Nec Corp エッチング方法
JPS61243174A (ja) * 1985-04-19 1986-10-29 Hitachi Koki Co Ltd イオンビーム装置
JPS62222282A (ja) * 1986-03-24 1987-09-30 Toppan Printing Co Ltd ホログラム転写箔の製造方法
US4731155A (en) * 1987-04-15 1988-03-15 General Electric Company Process for forming a lithographic mask
US5004673A (en) * 1987-04-20 1991-04-02 Environmental Research Institute Of Michigan Method of manufacturing surface relief patterns of variable cross-sectional geometry
US4878995A (en) * 1987-07-02 1989-11-07 Kabushiki Kaisha Toshiba Method of dry etching and apparatus for use in such method
US4888260A (en) * 1987-08-10 1989-12-19 Polaroid Corporation Volume phase reflection holograms and methods for fabricating them
US4913858A (en) * 1987-10-26 1990-04-03 Dennison Manufacturing Company Method of embossing a coated sheet with a diffraction or holographic pattern
JPH01161302A (ja) * 1987-12-18 1989-06-26 Shimadzu Corp ホログラフィックグレーティング製作方法
JPH01202821A (ja) * 1988-02-08 1989-08-15 Nec Corp 反応性イオンエッチング装置
JPH0262039A (ja) * 1988-08-29 1990-03-01 Hitachi Ltd 多層素子の微細加工方法およびその装置
US4923572A (en) * 1988-09-29 1990-05-08 Hallmark Cards, Incorporated Image transfer tool
US5147763A (en) * 1988-10-19 1992-09-15 Canon Kabushiki Kaisha Process for producing molding stamper for data recording medium substrate
US4913585A (en) * 1988-12-21 1990-04-03 Tricor Envirobonds, Ltd. Method of treating solids containing waste fluid

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3944420A (en) * 1974-05-22 1976-03-16 Rca Corporation Generation of permanent phase holograms and relief patterns in durable media by chemical etching
GB1508660A (en) * 1974-05-22 1978-04-26 Rca Corp Method for producing aluminium relief masters
US4514479A (en) * 1980-07-01 1985-04-30 The United States Of America As Represented By The Secretary Of The Navy Method of making near infrared polarizers
US4629282A (en) * 1980-11-05 1986-12-16 Mcgrew Stephen P Diffractive color and texture effects for the graphic arts
WO1989012261A1 (fr) * 1988-06-03 1989-12-14 Michael Teitel Hologramme modele et procede de reproduction de micromotifs
EP0365031A2 (fr) * 1988-10-21 1990-04-25 Toppan Printing Co., Ltd. Matrice pour hologramme, sa méthode de fabrication et méthode de fabrication d'hologramme

Also Published As

Publication number Publication date
AU8282691A (en) 1992-02-18
WO1992001973A2 (fr) 1992-02-06
US5521030A (en) 1996-05-28

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