WO1992005678A1 - Melange et procede de traitement de corps metalliques - Google Patents
Melange et procede de traitement de corps metalliques Download PDFInfo
- Publication number
- WO1992005678A1 WO1992005678A1 PCT/DE1991/000768 DE9100768W WO9205678A1 WO 1992005678 A1 WO1992005678 A1 WO 1992005678A1 DE 9100768 W DE9100768 W DE 9100768W WO 9205678 A1 WO9205678 A1 WO 9205678A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- mixture
- treatment
- copper
- metal bodies
- metal
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 17
- 239000002184 metal Substances 0.000 title claims abstract description 13
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 13
- 238000000034 method Methods 0.000 title claims description 16
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 17
- 229910052802 copper Inorganic materials 0.000 claims abstract description 15
- 239000010949 copper Substances 0.000 claims abstract description 15
- 241000416162 Astragalus gummifer Species 0.000 claims abstract description 10
- 229920001615 Tragacanth Polymers 0.000 claims abstract description 10
- 229940116362 tragacanth Drugs 0.000 claims abstract description 10
- 235000010487 tragacanth Nutrition 0.000 claims abstract description 10
- 239000000196 tragacanth Substances 0.000 claims abstract description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims abstract 6
- 239000004020 conductor Substances 0.000 claims description 8
- 239000002318 adhesion promoter Substances 0.000 claims description 6
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 claims description 4
- 238000007654 immersion Methods 0.000 claims description 2
- 229910000881 Cu alloy Inorganic materials 0.000 claims 3
- 238000000889 atomisation Methods 0.000 claims 1
- 238000005530 etching Methods 0.000 abstract description 2
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 abstract 1
- 239000003365 glass fiber Substances 0.000 abstract 1
- 239000012212 insulator Substances 0.000 description 6
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 230000032798 delamination Effects 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- IXCSERBJSXMMFS-UHFFFAOYSA-N hcl hcl Chemical compound Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/382—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
- H05K3/383—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by microetching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/18—Acidic compositions for etching copper or alloys thereof
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/12—Using specific substances
- H05K2203/125—Inorganic compounds, e.g. silver salt
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/44—Manufacturing insulated metal core circuits or other insulated electrically conductive core circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
Definitions
- the invention relates to a mixture for the treatment of metal bodies and methods using the mixture and use of tragacanth for the treatment of printed circuit boards.
- epoxy resin-glass fabric prepreg or another suitable insulator material is used as the insulating layer between the individual copper foils.
- preg epoxy resin-glass fabric
- the individual copper and insulator layers are processed in a heated laminating press to produce the finished multilayer printed circuit board.
- Acid solutions for the treatment of printed circuit boards are already known from the prior art, for example from the documents US Pat. No. 4,956,035, JP 62-158 884 A and JP 63-453 95 A. These solutions have in common that they do not contain any tragacanth .
- the object of the invention is to improve the adhesion between the metal conductors and the insulating layer, so that no delamination takes place in the area of the bore.
- the mixture according to the invention contains at least: a) water (H 2 0) from 20 to 60 vol% b) hydrochloric acid (HCl) from 20 to 60 vol% c) iron trichloride (FeCl 3 ) 40% conc. From 5 to 30 vol% d ) Fine powdered tragacanth (DAB 7) from 0.5 to 2 g / liter
- the new adhesion promoter is very easy to use. In order to ensure the best adhesion values, it should best be applied to the copper surfaces at room temperature using the immersion method. However, this can also be sprayed on or applied with another application method suitable for liquids.
- the roughened copper surface can also be examined very simply qualitatively:
- the etching removal can be measured with a beta scope or a permascope. Typical removal values are three to eight micrometers.
- the quality of the micro roughness can be determined physically using the peel strength measurement.
- the quality of the micro roughness can also be assessed optically under a scanning electron microscope.
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
Abstract
Mélange pour le traitement de corps métalliques, renfermant au moins de l'eau, de l'acide chlorhydrique, du trichlorure de fer et de la gomme adragante finement pulvérisée. Ce mélange corrosif rend la surface des couches de cuivre rugueuse. Lorsque celles-ci sont stratifiées avec des couches de tissu de verre isolantes, de manière à former des plaques de circuits imprimés, comprenant plusieurs couches, dites multicouches, on obtient une adhérence améliorée.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH3099/90A CH682616A5 (de) | 1990-09-26 | 1990-09-26 | Haftverbesserer. |
CH3099/90-1 | 1990-09-26 | ||
DE4106632 | 1991-02-28 | ||
DEP4106632.4 | 1991-02-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1992005678A1 true WO1992005678A1 (fr) | 1992-04-02 |
Family
ID=25692175
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/DE1991/000768 WO1992005678A1 (fr) | 1990-09-26 | 1991-09-26 | Melange et procede de traitement de corps metalliques |
Country Status (1)
Country | Link |
---|---|
WO (1) | WO1992005678A1 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2562292B1 (fr) * | 2011-08-26 | 2017-03-01 | United Technologies Corporation | Composition de décapage chimique et procédé |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4956035A (en) * | 1989-08-01 | 1990-09-11 | Rd Chemical Company | Composition and process for promoting adhesion on metal surfaces |
-
1991
- 1991-09-26 WO PCT/DE1991/000768 patent/WO1992005678A1/fr active Application Filing
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4956035A (en) * | 1989-08-01 | 1990-09-11 | Rd Chemical Company | Composition and process for promoting adhesion on metal surfaces |
Non-Patent Citations (2)
Title |
---|
PATENT ABSTRACTS OF JAPAN, Volume 11, No. 398, (C-466), 25 December 1987; & JP,A,62 158 884, (MITSUBISHI CHEM. IND. LTD.), 14 July 1987. * |
WORLD PATENTS INDEX, Week 7809, DERWENT PUBLICATIONS LTD, LONDON GB, AN 78-16352A; & JP,A,50 148 254, (HODOGAYA CHEM. IND. KK), 27 November 1975. * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2562292B1 (fr) * | 2011-08-26 | 2017-03-01 | United Technologies Corporation | Composition de décapage chimique et procédé |
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