WO1993012582A1 - Dispositif logique programmable et procedes de fabrication - Google Patents
Dispositif logique programmable et procedes de fabrication Download PDFInfo
- Publication number
- WO1993012582A1 WO1993012582A1 PCT/US1992/010010 US9210010W WO9312582A1 WO 1993012582 A1 WO1993012582 A1 WO 1993012582A1 US 9210010 W US9210010 W US 9210010W WO 9312582 A1 WO9312582 A1 WO 9312582A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- layer
- connection points
- links
- gate array
- cells
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 47
- 239000000758 substrate Substances 0.000 claims abstract description 12
- 239000004065 semiconductor Substances 0.000 claims abstract description 9
- 239000010410 layer Substances 0.000 claims description 99
- 239000011229 interlayer Substances 0.000 claims description 49
- 229910052751 metal Inorganic materials 0.000 claims description 29
- 239000002184 metal Substances 0.000 claims description 29
- 230000000873 masking effect Effects 0.000 claims description 17
- 238000000151 deposition Methods 0.000 claims description 16
- 238000005530 etching Methods 0.000 claims description 4
- 210000004027 cell Anatomy 0.000 description 87
- 238000010586 diagram Methods 0.000 description 19
- 230000008569 process Effects 0.000 description 14
- 230000006870 function Effects 0.000 description 10
- 238000003491 array Methods 0.000 description 9
- 230000004888 barrier function Effects 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 9
- 239000011295 pitch Substances 0.000 description 9
- 239000003870 refractory metal Substances 0.000 description 9
- 230000008021 deposition Effects 0.000 description 7
- 238000010276 construction Methods 0.000 description 5
- 238000005520 cutting process Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 238000003672 processing method Methods 0.000 description 5
- 210000003888 boundary cell Anatomy 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000010884 ion-beam technique Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000007737 ion beam deposition Methods 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 238000003698 laser cutting Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 229910021332 silicide Inorganic materials 0.000 description 2
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 102100040844 Dual specificity protein kinase CLK2 Human genes 0.000 description 1
- 101000749291 Homo sapiens Dual specificity protein kinase CLK2 Proteins 0.000 description 1
- 241000220010 Rhode Species 0.000 description 1
- 241001080526 Vertica Species 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 238000005234 chemical deposition Methods 0.000 description 1
- 208000012839 conversion disease Diseases 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- VKYKSIONXSXAKP-UHFFFAOYSA-N hexamethylenetetramine Chemical compound C1N(C2)CN3CN1CN2C3 VKYKSIONXSXAKP-UHFFFAOYSA-N 0.000 description 1
- 238000012905 input function Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- -1 oxide Inorganic materials 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K19/00—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
- H03K19/02—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components
- H03K19/173—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using elementary logic circuits as components
- H03K19/1733—Controllable logic circuits
- H03K19/1735—Controllable logic circuits by wiring, e.g. uncommitted logic arrays
- H03K19/1736—Controllable logic circuits by wiring, e.g. uncommitted logic arrays in which the wiring can be modified
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/525—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body with adaptable interconnections
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K19/00—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
- H03K19/02—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components
- H03K19/173—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using elementary logic circuits as components
- H03K19/1733—Controllable logic circuits
- H03K19/1737—Controllable logic circuits using multiplexers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/90—Masterslice integrated circuits
- H10D84/903—Masterslice integrated circuits comprising field effect technology
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Definitions
- EPROM programmable array logic
- PLD electrically programmable logic device
- FPGA field-programmable gate arrays
- a shorted interlayer connection point 1521 is created through energy-induced reactions between the barrier metal 1525 and the antifuse layer 1524.
- An alternative energy technique may be employed to create an opened intralayer connection point, for example, employing energy-induced cutting/removal processes.
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Computing Systems (AREA)
- General Engineering & Computer Science (AREA)
- Mathematical Physics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
Abstract
Un dispositif programmable à circuits prédiffusés comprend une multiplicité de cellules (50 et 51) dont chacune comprend au moins un dispositif à semi-conducteurs (un transistor, par exemple) (M1-M4); une première multiplicité de liaisons ou de segments d'interconnexion reliant ensemble certains dispositifs choisis parmi les dispositifs à semi-conducteurs (C, D, E, F, G, H); une seconde multiplicité de liaisons ou de segments d'interconnexion (53, U, V, W, X, Y, Z), et une multiplicité de points de connexion reliant certaines liaisons choisies de la première multiplicité de liaisons, à certaines liaisons choisies de la seconde multiplicité de laiisons (L1-L26).
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US80753491A | 1991-12-13 | 1991-12-13 | |
| US07/807,534 | 1991-12-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO1993012582A1 true WO1993012582A1 (fr) | 1993-06-24 |
Family
ID=25196597
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/US1992/010010 WO1993012582A1 (fr) | 1991-12-13 | 1992-11-19 | Dispositif logique programmable et procedes de fabrication |
Country Status (1)
| Country | Link |
|---|---|
| WO (1) | WO1993012582A1 (fr) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0681329A3 (fr) * | 1994-05-01 | 1996-11-13 | Quick Tech Ltd | Réseau logique personnalisable. |
| DE102014202116B4 (de) * | 2013-03-15 | 2017-03-09 | Globalfoundries Inc. | Verfahren zum Bilden eines Standardtransistorlayouts unter Verwendung von DSA-Vorstrukturen und einer Standardmetallschicht und Vorrichtung mit einem Standardtransistorlayout |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3987287A (en) * | 1974-12-30 | 1976-10-19 | International Business Machines Corporation | High density logic array |
| US4536949A (en) * | 1983-05-16 | 1985-08-27 | Fujitsu Limited | Method for fabricating an integrated circuit with multi-layer wiring having opening for fuse |
| US4646266A (en) * | 1984-09-28 | 1987-02-24 | Energy Conversion Devices, Inc. | Programmable semiconductor structures and methods for using the same |
| US4847810A (en) * | 1986-04-22 | 1989-07-11 | Sharp Kabushiki Kaisha | Memory having redundancy circuit |
| US4968643A (en) * | 1986-08-12 | 1990-11-06 | Fujitsu Limited | Method for fabricating an activatable conducting link for metallic conductive wiring in a semiconductor device |
| US5081059A (en) * | 1988-06-16 | 1992-01-14 | Fujitsu Limited | Method of forming semiconductor integrated circuit using master slice approach |
| US5083181A (en) * | 1987-11-27 | 1992-01-21 | Hitachi, Ltd. | Semiconductor integrated circuit device and wiring method thereof |
| US5136356A (en) * | 1989-04-19 | 1992-08-04 | Seiko Epson Corporation | Semiconductor device |
-
1992
- 1992-11-19 WO PCT/US1992/010010 patent/WO1993012582A1/fr active Application Filing
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3987287A (en) * | 1974-12-30 | 1976-10-19 | International Business Machines Corporation | High density logic array |
| US4536949A (en) * | 1983-05-16 | 1985-08-27 | Fujitsu Limited | Method for fabricating an integrated circuit with multi-layer wiring having opening for fuse |
| US4646266A (en) * | 1984-09-28 | 1987-02-24 | Energy Conversion Devices, Inc. | Programmable semiconductor structures and methods for using the same |
| US4847810A (en) * | 1986-04-22 | 1989-07-11 | Sharp Kabushiki Kaisha | Memory having redundancy circuit |
| US4968643A (en) * | 1986-08-12 | 1990-11-06 | Fujitsu Limited | Method for fabricating an activatable conducting link for metallic conductive wiring in a semiconductor device |
| US5083181A (en) * | 1987-11-27 | 1992-01-21 | Hitachi, Ltd. | Semiconductor integrated circuit device and wiring method thereof |
| US5081059A (en) * | 1988-06-16 | 1992-01-14 | Fujitsu Limited | Method of forming semiconductor integrated circuit using master slice approach |
| US5136356A (en) * | 1989-04-19 | 1992-08-04 | Seiko Epson Corporation | Semiconductor device |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0681329A3 (fr) * | 1994-05-01 | 1996-11-13 | Quick Tech Ltd | Réseau logique personnalisable. |
| US5861641A (en) * | 1994-05-01 | 1999-01-19 | Quick Technologies Ltd. | Customizable logic array device |
| DE102014202116B4 (de) * | 2013-03-15 | 2017-03-09 | Globalfoundries Inc. | Verfahren zum Bilden eines Standardtransistorlayouts unter Verwendung von DSA-Vorstrukturen und einer Standardmetallschicht und Vorrichtung mit einem Standardtransistorlayout |
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