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WO1998050599A3 - Composant de verre au quartz pour enveloppe de reacteur, son procede de fabrication et son utilisation - Google Patents

Composant de verre au quartz pour enveloppe de reacteur, son procede de fabrication et son utilisation Download PDF

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Publication number
WO1998050599A3
WO1998050599A3 PCT/EP1998/002685 EP9802685W WO9850599A3 WO 1998050599 A3 WO1998050599 A3 WO 1998050599A3 EP 9802685 W EP9802685 W EP 9802685W WO 9850599 A3 WO9850599 A3 WO 9850599A3
Authority
WO
WIPO (PCT)
Prior art keywords
quartz glass
glass component
reactor
wrinkle area
blank
Prior art date
Application number
PCT/EP1998/002685
Other languages
German (de)
English (en)
Other versions
WO1998050599A2 (fr
Inventor
Dietmar Hellmann
Johann Leist
Original Assignee
Heraeus Quarzglas
Dietmar Hellmann
Johann Leist
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Heraeus Quarzglas, Dietmar Hellmann, Johann Leist filed Critical Heraeus Quarzglas
Priority to EP98925552A priority Critical patent/EP0920543B1/fr
Priority to US09/202,701 priority patent/US6306489B1/en
Priority to JP54774498A priority patent/JP4157987B2/ja
Publication of WO1998050599A2 publication Critical patent/WO1998050599A2/fr
Publication of WO1998050599A3 publication Critical patent/WO1998050599A3/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C1/00—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
    • B24C1/06—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods for producing matt surfaces, e.g. on plastic materials, on glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
    • C03B19/095—Other methods of shaping glass by fusing powdered glass in a shaping mould by centrifuging, e.g. arc discharge in rotating mould
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C11/00—Multi-cellular glass ; Porous or hollow glass or glass particles
    • C03C11/007—Foam glass, e.g. obtained by incorporating a blowing agent and heating
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/003—General methods for coating; Devices therefor for hollow ware, e.g. containers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2204/00—Glasses, glazes or enamels with special properties
    • C03C2204/04—Opaque glass, glaze or enamel
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2204/00—Glasses, glazes or enamels with special properties
    • C03C2204/04—Opaque glass, glaze or enamel
    • C03C2204/06—Opaque glass, glaze or enamel opacified by gas
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/213—SiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/32—After-treatment
    • C03C2218/328—Partly or completely removing a coating
    • C03C2218/33—Partly or completely removing a coating by etching
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
    • Y10T428/24364—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.] with transparent or protective coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/249921—Web or sheet containing structurally defined element or component
    • Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
    • Y10T428/249967—Inorganic matrix in void-containing component
    • Y10T428/249969—Of silicon-containing material [e.g., glass, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/249921—Web or sheet containing structurally defined element or component
    • Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
    • Y10T428/249987—With nonvoid component of specified composition
    • Y10T428/249988—Of about the same composition as, and adjacent to, the void-containing component
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/249921—Web or sheet containing structurally defined element or component
    • Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
    • Y10T428/249987—With nonvoid component of specified composition
    • Y10T428/24999—Inorganic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Surface Treatment Of Glass (AREA)
  • Glass Compositions (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

On utilise au départ un composant de verre au quartz connu, sous forme d'une cloche, pour la chambre d'un réacteur, en particulier la chambre d'un réacteur d'un dispositif d'attaque au plasma. Le composant connu de verre au quartz comprend un corps servant de substrat en verre au quartz de première qualité, présentant une surface intérieure orientée vers l'intérieur du réacteur et ayant, au moins dans une zone rugueuse, une profondeur de rugosité moyenne Ra supérieure à 1νm. L'invention a pour but de fournir un composant de verre au quartz pour enveloppe de réacteur ne produisant, autant que possible, aucune particule dans la chambre du réacteur, et dont la surface intérieure tournée vers l'intérieur du réacteur est remarquable en ce qu'elle présente une force d'adhérence élevée pour les couches de matériaux qui y sont déposées ainsi qu'une durée de service particulièrement longue. A cet effet, l'invention est caractérisée en ce que la zone de rugosité est formée par une couche de bulles réalisée sur le substrat, en verre au quartz de deuxième qualité, à pores ouverts. Un procédé simplifié de fabrication d'un tel composant en verre au quartz permettant l'ajustement reproductible d'une rugosité superficielle prédéterminée, comprend les opérations ci-après: moulage d'une ébauche formée de grains à teneur en SiO2, vitrification partielle ou totale de l'ébauche par chauffage à température supérieure à 1000 °C, incorporation d'un composant supplémentaire réagissant avec dégagement gazeux, lors de la vitrification, dans les grains à teneur en SiO2, durant le moulage de l'ébauche dans une zone de rugosité, de manière à obtenir, par vitrification dans ladite zone de rugosité, une couche de bulles poreuse.
PCT/EP1998/002685 1997-05-07 1998-05-07 Composant de verre au quartz pour enveloppe de reacteur, son procede de fabrication et son utilisation WO1998050599A2 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP98925552A EP0920543B1 (fr) 1997-05-07 1998-05-07 Composant de verre au quartz pour enveloppe de reacteur, son procede de fabrication et son utilisation
US09/202,701 US6306489B1 (en) 1997-05-07 1998-05-07 Quartz glass component for a reactor housing a method of manufacturing same and use thereof
JP54774498A JP4157987B2 (ja) 1997-05-07 1998-05-07 反応器用石英ガラスコンポーネント、その製造方法及び使用

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19719133A DE19719133C2 (de) 1997-05-07 1997-05-07 Glocke aus Quarzglas und Verfahren für ihre Herstellung
DE19719133.9 1997-05-07

Publications (2)

Publication Number Publication Date
WO1998050599A2 WO1998050599A2 (fr) 1998-11-12
WO1998050599A3 true WO1998050599A3 (fr) 1999-02-04

Family

ID=7828790

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP1998/002685 WO1998050599A2 (fr) 1997-05-07 1998-05-07 Composant de verre au quartz pour enveloppe de reacteur, son procede de fabrication et son utilisation

Country Status (6)

Country Link
US (1) US6306489B1 (fr)
EP (1) EP0920543B1 (fr)
JP (1) JP4157987B2 (fr)
KR (1) KR100552568B1 (fr)
DE (1) DE19719133C2 (fr)
WO (1) WO1998050599A2 (fr)

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US7579067B2 (en) 2004-11-24 2009-08-25 Applied Materials, Inc. Process chamber component with layered coating and method
US8980045B2 (en) 2007-05-30 2015-03-17 Applied Materials, Inc. Substrate cleaning chamber and components
US9012030B2 (en) 2002-01-08 2015-04-21 Applied Materials, Inc. Process chamber component having yttrium—aluminum coating
US9481608B2 (en) 2005-07-13 2016-11-01 Applied Materials, Inc. Surface annealing of components for substrate processing chambers

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DE19917288C2 (de) * 1999-04-16 2001-06-28 Heraeus Quarzglas Quarzglas-Tiegel
US6368410B1 (en) * 1999-06-28 2002-04-09 General Electric Company Semiconductor processing article
US6932941B2 (en) * 1999-11-19 2005-08-23 Perkinelmer Instruments Llc Method and apparatus for improved gas detection
US7013707B2 (en) * 1999-11-19 2006-03-21 Perkinelmer Las, Inc Method and apparatus for enhanced detection of a specie using a gas chromatograph
US6929735B2 (en) * 1999-11-19 2005-08-16 Perkin Elmer Instruments Llc Electrochemical sensor having improved response time
US6682638B1 (en) 1999-11-19 2004-01-27 Perkin Elmer Llc Film type solid polymer ionomer sensor and sensor cell
US7404882B2 (en) * 1999-11-19 2008-07-29 Perkinelmer Las, Inc. Film-type solid polymer ionomer sensor and sensor cell
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DE19962452B4 (de) * 1999-12-22 2004-03-18 Heraeus Quarzglas Gmbh & Co. Kg Verfahren für die Herstellung von opakem Quarzglas
JP4447738B2 (ja) * 2000-05-31 2010-04-07 信越石英株式会社 多層構造の石英ガラスルツボの製造方法
JP2002047034A (ja) * 2000-07-31 2002-02-12 Shinetsu Quartz Prod Co Ltd プラズマを利用したプロセス装置用の石英ガラス治具
DE60128302T2 (de) * 2000-08-29 2008-01-24 Heraeus Quarzglas Gmbh & Co. Kg Plasmafeste Quartzglas-Haltevorrichtung
US6777045B2 (en) 2001-06-27 2004-08-17 Applied Materials Inc. Chamber components having textured surfaces and method of manufacture
DE10158521B4 (de) * 2001-11-29 2005-06-02 Wacker-Chemie Gmbh In Teilbereichen oder vollständig verglaster SiO2-Formkörper und Verfahren zu seiner Herstellung
EP1352986B8 (fr) * 2002-04-04 2009-03-04 Tosoh Corporation Pièces de verre de quartz obtenues par pulvérisation thermique et leur méthode de fabrication
JP4086283B2 (ja) * 2002-07-31 2008-05-14 信越石英株式会社 シリコン単結晶引上げ用石英ガラスルツボおよびその製造方法
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JP4346606B2 (ja) * 2003-03-03 2009-10-21 日本板硝子株式会社 凹凸のある表面を有する物品の製造方法
US20060105182A1 (en) * 2004-11-16 2006-05-18 Applied Materials, Inc. Erosion resistant textured chamber surface
US7250114B2 (en) * 2003-05-30 2007-07-31 Lam Research Corporation Methods of finishing quartz glass surfaces and components made by the methods
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US8105457B2 (en) * 2003-12-22 2012-01-31 Asml Netherlands B.V. Method for joining at least a first member and a second member, lithographic apparatus and device manufacturing method, as well as a device manufactured thereby
WO2005068080A1 (fr) * 2004-01-15 2005-07-28 Samheung Environment Co., Ltd. Procede et appareil de separation et de recyclage de beton asphaltique residuel d'articles residuels de construction
US7670436B2 (en) 2004-11-03 2010-03-02 Applied Materials, Inc. Support ring assembly
JP4666575B2 (ja) * 2004-11-08 2011-04-06 東京エレクトロン株式会社 セラミック溶射部材の製造方法、該方法を実行するためのプログラム、記憶媒体、及びセラミック溶射部材
WO2007013184A1 (fr) * 2005-07-29 2007-02-01 Tocalo Co., Ltd. Element enduit d'un film pulverise thermiquement de y2o3 et son procede de fabrication
US20090130436A1 (en) * 2005-08-22 2009-05-21 Yoshio Harada Spray coating member having excellent heat emmision property and so on and method for producing the same
KR101021459B1 (ko) * 2005-08-22 2011-03-15 도카로 가부시키가이샤 내손상성 등이 우수한 용사 피막 피복 부재 및 그 제조방법
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US9127362B2 (en) 2005-10-31 2015-09-08 Applied Materials, Inc. Process kit and target for substrate processing chamber
US20070125646A1 (en) 2005-11-25 2007-06-07 Applied Materials, Inc. Sputtering target for titanium sputtering chamber
US7648782B2 (en) * 2006-03-20 2010-01-19 Tokyo Electron Limited Ceramic coating member for semiconductor processing apparatus
US7850864B2 (en) * 2006-03-20 2010-12-14 Tokyo Electron Limited Plasma treating apparatus and plasma treating method
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US20080196661A1 (en) * 2007-02-20 2008-08-21 Brian West Plasma sprayed deposition ring isolator
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US9340448B2 (en) * 2011-07-14 2016-05-17 Dip Tech Ltd. Compositions providing frost appearance for printing on glass or ceramic substrates and methods for the use thereof
CN103247551A (zh) * 2012-02-01 2013-08-14 上海科秉电子科技有限公司 一种用于半导体制程中钟罩零件的粗糙度再生方法
DE102013208799A1 (de) 2013-05-14 2014-11-20 Heraeus Quarzglas Gmbh & Co. Kg SiO2-basierte Sperrschicht für Hochtemperatur-Diffusions- und Beschichtungsprozesse
US10247661B2 (en) * 2016-07-20 2019-04-02 Cook Medical Technologies Llc Optical technique for coating characterization

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Publication number Priority date Publication date Assignee Title
EP0319031A2 (fr) * 1987-12-03 1989-06-07 Shin-Etsu Handotai Company Limited Procédé pour la fabrication d'un récipient en verre de quartz pour la croissance de monocristal semi-conducteur
EP0763504A1 (fr) * 1995-09-14 1997-03-19 Heraeus Quarzglas GmbH Elément en verre de silice et méthode de sa production

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US3776809A (en) * 1968-02-22 1973-12-04 Heraeus Schott Quarzschmelze Quartz glass elements
DE2206493C3 (de) * 1972-02-11 1975-01-30 Heraeus-Schott Quarzschmelze Gmbh, 6450 Hanau Mehrschichtiger Quarzglaskörper für die Verwendung in der Festkörpertechnologie
JP3011866B2 (ja) * 1994-11-30 2000-02-21 信越石英株式会社 枚葉式ウエーハ熱処理装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0319031A2 (fr) * 1987-12-03 1989-06-07 Shin-Etsu Handotai Company Limited Procédé pour la fabrication d'un récipient en verre de quartz pour la croissance de monocristal semi-conducteur
EP0763504A1 (fr) * 1995-09-14 1997-03-19 Heraeus Quarzglas GmbH Elément en verre de silice et méthode de sa production

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9012030B2 (en) 2002-01-08 2015-04-21 Applied Materials, Inc. Process chamber component having yttrium—aluminum coating
US7579067B2 (en) 2004-11-24 2009-08-25 Applied Materials, Inc. Process chamber component with layered coating and method
US9481608B2 (en) 2005-07-13 2016-11-01 Applied Materials, Inc. Surface annealing of components for substrate processing chambers
US8980045B2 (en) 2007-05-30 2015-03-17 Applied Materials, Inc. Substrate cleaning chamber and components

Also Published As

Publication number Publication date
EP0920543A2 (fr) 1999-06-09
JP2001516327A (ja) 2001-09-25
KR20000023608A (ko) 2000-04-25
KR100552568B1 (ko) 2006-02-20
US6306489B1 (en) 2001-10-23
DE19719133C2 (de) 1999-09-02
EP0920543B1 (fr) 2001-10-31
DE19719133A1 (de) 1998-11-12
WO1998050599A2 (fr) 1998-11-12
JP4157987B2 (ja) 2008-10-01

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