WO1998038195B1 - PHOTOACTIVATABLE NITROGEN-CONTAINING BASES BASED ON α-AMMONIUM KETONES, IMINIUM KETONES OR AMIDINIUM KETONES AND ARYL BORATES - Google Patents
PHOTOACTIVATABLE NITROGEN-CONTAINING BASES BASED ON α-AMMONIUM KETONES, IMINIUM KETONES OR AMIDINIUM KETONES AND ARYL BORATESInfo
- Publication number
- WO1998038195B1 WO1998038195B1 PCT/EP1998/000846 EP9800846W WO9838195B1 WO 1998038195 B1 WO1998038195 B1 WO 1998038195B1 EP 9800846 W EP9800846 W EP 9800846W WO 9838195 B1 WO9838195 B1 WO 9838195B1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- compound
- component system
- ketones
- component
- polyacrylate
- Prior art date
Links
Abstract
This invention relates to α-ammonium ketones, iminium ketones or amidinium ketones in the form of their tetraaryl- or triarylalkylborate salts which can be photochemically converted into amines, imines or amidines as well as to a process for their preparation. This invention also relates to base-polymerisable or cross-linkable compositions comprising these α-ammonium ketones, iminium ketones or amidinium ketones in the form of their tetra- or triarylalkylborate salts, to a process for carrying out photochemically induced, base-catalysed reactions as well as to their use as photoinitiators for base-catalysed reactions.
Claims
54
AMENDED CLAIMS
[received by the International Bureau on 19 August 1998 (19.08.98); original claim 1 amended; remaining claims unchanged (4 pages)]
X is Cj-C.oalkylene, C -C2oalkylene which is interrupted by -O-, -S- or NR8, or X is
(a) R , R3 and R4 are not simultaneously methyl; and
(b) R2, R3 and R together are no
2. A compound according to claim 1 , wherein R- is phenyl, naphthyl, pyrenyl, thioxanthyl or penothiazinyl, which radicals are unsubstituted or mono- or polysubstituted by C C18alkyl, C C18haloalkyl, NR6R7 , CN, NO2) SR8 or OR8.
3. A compound according to claim 1 , wherein R , R3 and R4 are each independently of one another hydrogen, C C18alkyl, or R2 and R3, and/or R4 and R3 form each independently of one another a C2-C12alkylene bridge; or
R2, R3, R ) together with the linking nitrogen, are a group of the structural formulae (a), (b), (c), (d), (e), (f), (g), (h) or a phosphazene base of the P P2 or P <t/4> type.
4. A compound according to claim 1 , wherein R2, R3 and R4 are each independently of one another C C18alkyl, or
R2> R3, R , together with the nitrogen atom, are a group of the structural formula (a), (b), (c),- (d) or (e).
AMENDED SHEET AfffiCL
55
5. A compound according to claim 1 , wherein R12, R13, Rι4 are phenyl, biphenyl, naphthyl, anthracyl or penanthryl, which radicals are unsubstituted or mono- or polysubstituted by C C18alkyl, CrC18haloalkyl, NO2, OH, CN, OR8, or halogen, and
R15 is CrC18alkyl or phenyl which is unsubstituted or mono- or polysubstituted by C C18alkyl, C C18haloalkyl, NO2, OH, CN, OR8 or halogen.
6. A process for the preparation of a compound of formula I, which comprises reacting in a first step a nitrogenous base of formula II
NR2R3R4 (II) with an α- halogen ketone of formula III
Halogen
CH R, (HI)
R O
to a compound of formula IV
R '33
R I + N — R,
-CH Halogen (IV)
R; ,R, m
and, in a second step, reacting the compound of formula IV with a compound of formula V
7. A composition, which comprises
A) at least one compound of formula (I), and
B) at least one organic compound which is capable of a base-catalysed addition reaction or substitution reaction.
8. A composition according to claim 7, wherein component B) is an anionically polymerisable or crosslinkable organic material.
9. A composition according to claim 7, wherein component B) is one of the following systems: a) an acrylate copolymer having alkoxysilane or alkoxysiloxane side groups, b) a two-component system comprising a hydroxyl group-containing polyacrylate and/or polyester and an aliphatic or aromatic polyisocyanate, c) a two-component system comprising a functional polyacrylate and a polyepoxide, where the polyacrylate contains carboxyl or anhydride groups, d) a two-component system comprising a fluorine-modified or silicone-modified hydroxyl group-containing polyacrylate or polyester and an aliphatic or aromatic polyisocyanate, e) a two-component system comprising a (poly)ketimine and an aliphatic or aromatic polyisocyanate, f) a two-component system comprising a (poly)ketimine and an unsaturated acrylate resin or an acetoacetate resin or methyl α-acrylamidomethylglycolate, h) a two-component system comprising a (poly)oxazolidine and a polyacrylate containing anhydride groups, or an unsaturated acrylate resin or a polyisocyanate, i) a two-component system comprising an epoxy group-containing polyacrylate and a carboxyl group-containing polyacrylate,
I) a polymer based on allyl glycidyl ether, m) a two-component system comprising a (poly)alcohol and a (poly)isocyanate, n) a two-component system comprising an α,β-ethylenically unsaturated carbonyl compound and a compound which contains activated CH2 groups.
10. A composition according to claim 7, wherein component B) is one of the following systems: b) a two-component system comprising a hydroxyl group-containing polyacrylate and/or polyester and an aliphatic or aromatic polyisocyanate, c) a two-component system comprising a functional polyacrylate and a polyepoxide, where" the polyacrylate contains carboxyl or anhydride groups,
57
i) a two-component system comprising an epoxy group-containing polyacrylate and a carboxyl group-containing polyacrylate, m) a two-component system comprising a (poly)alcohol and a (poly)isocyanate, and n) a two-component system comprising an ,β-ethylenically unsaturated carbonyl compound and a compound which contains activated CH2 groups.
11. A composition according to claim 7, wherein component B is an epoxy resin or a mixture of different epoxy resins.
12. A composition according to claim 7, wherein component A) is present in an amount of 0.01 to 10 % by weight, based on component B).
13. A composition according to claim 7, which additionally comprises a sensitiser selected from the group consisting of thioxanthones, oxazines, acridines, phenazines and rhodamines.
14. A process for carrying out base-catalysed reactions, which comprises exposing a composition according to claim 7 with light having a wavelength in the range from 200 nm to
650 nm.
15. A process according to claim 14, which comprises heating the composition before or after the exposure to light.
16. Use of an organic compound according to claim 1 as photoinitiator for photochemically induced base-catalysed addition reactions or substitution reactions.
17. Use of an organic compound according to claim 1 for the preparation of coatings, moulding compositions or photostructured layers.
18. A coated substrate, which is coated on at least one surface with a composition as claimed in claim 7.
19. A polymerised or crosslinked composition according to claim 7.
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU64972/98A AU726375B2 (en) | 1997-02-26 | 1998-02-14 | Photoactivatable nitrogen-containing bases based on alpha-ammonium ketones, iminium ketones or amidinium ketones and aryl borates |
CA002281860A CA2281860C (en) | 1997-02-26 | 1998-02-14 | Photoactivatable nitrogen-containing bases based on .alpha.-ammonium ketones, iminium ketones or amidinium ketones and aryl borates |
JP53724898A JP4155603B2 (en) | 1997-02-26 | 1998-02-14 | Nitrogen-containing bases that can be activated by light, based on α-ammonium ketones, iminium ketones or amidinium ketones and aryl borates |
DE69839020T DE69839020T2 (en) | 1997-02-26 | 1998-02-14 | Photoactivatable nitrogenous bases based on ALPHA ammonium, iminium or amidinium ketones and arylborates |
EP98910669A EP1032576B1 (en) | 1997-02-26 | 1998-02-14 | Photoactivatable nitrogen-containing bases based on alpha-ammonium ketones, iminium ketones or amidinium ketones and aryl borates |
BRPI9807790-2A BR9807790B1 (en) | 1997-02-26 | 1998-02-14 | nitrogen-containing photoactivated bases based on alpha-ammonium ketones, imine ketones or amidium ketones and aryl borates, their composition and process for performing base catalyzed reactions. |
KR1019997007769A KR100542419B1 (en) | 1997-02-26 | 1998-02-14 | Photo-activated nitrogen-containing bases of α-ammonium ketones, iminium ketones or amidinium ketones and aryl borates, preparation methods thereof and compositions comprising the same |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH44497 | 1997-02-26 | ||
CH444/97 | 1997-02-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO1998038195A1 WO1998038195A1 (en) | 1998-09-03 |
WO1998038195B1 true WO1998038195B1 (en) | 1998-10-22 |
Family
ID=4187172
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP1998/000846 WO1998038195A1 (en) | 1997-02-26 | 1998-02-14 | PHOTOACTIVATABLE NITROGEN-CONTAINING BASES BASED ON α-AMMONIUM KETONES, IMINIUM KETONES OR AMIDINIUM KETONES AND ARYL BORATES |
Country Status (10)
Country | Link |
---|---|
EP (1) | EP1032576B1 (en) |
JP (1) | JP4155603B2 (en) |
KR (1) | KR100542419B1 (en) |
AU (1) | AU726375B2 (en) |
BR (1) | BR9807790B1 (en) |
CA (1) | CA2281860C (en) |
DE (1) | DE69839020T2 (en) |
TW (1) | TW425399B (en) |
WO (1) | WO1998038195A1 (en) |
ZA (1) | ZA981556B (en) |
Families Citing this family (23)
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JP4454309B2 (en) | 2001-10-17 | 2010-04-21 | チバ ホールディング インコーポレーテッド | Photoactivated nitrogen base |
WO2005014696A1 (en) * | 2003-08-06 | 2005-02-17 | Mitsubishi Gas Chemical Company, Inc. | Photocurable composition and coating composition |
KR101166746B1 (en) * | 2004-07-21 | 2012-07-27 | 시바 홀딩 인크 | Process for the photoactivation and use of a catalyst by an inverted two-stage procedure |
KR101514093B1 (en) | 2007-04-03 | 2015-04-21 | 바스프 에스이 | Photoactivable nitrogen bases |
WO2009122664A1 (en) | 2008-03-31 | 2009-10-08 | サンアプロ株式会社 | Photobase generator |
TW201106101A (en) * | 2009-06-01 | 2011-02-16 | Fujifilm Electronic Materials | Chemically amplified positive photoresist composition |
US8968868B2 (en) * | 2010-06-30 | 2015-03-03 | 3M Innovative Properties Company | Curable-on-demand composition comprising dual reactive silane functionality |
JP6336398B2 (en) * | 2011-12-29 | 2018-06-06 | スリーエム イノベイティブ プロパティズ カンパニー | On-demand curable polysiloxane coating composition |
JP5912946B2 (en) * | 2012-01-11 | 2016-04-27 | 株式会社Adeka | Photosensitive resin composition |
JP6208119B2 (en) | 2012-03-22 | 2017-10-04 | 株式会社Adeka | Novel compound and photosensitive resin composition |
JP5997041B2 (en) * | 2012-12-26 | 2016-09-21 | 東京応化工業株式会社 | Photosensitive resin composition |
JP5978138B2 (en) * | 2013-01-22 | 2016-08-24 | 株式会社Adeka | Novel compound and photosensitive resin composition |
WO2015008709A1 (en) | 2013-07-18 | 2015-01-22 | セメダイン株式会社 | Photocurable composition |
WO2015088021A1 (en) | 2013-12-13 | 2015-06-18 | セメダイン株式会社 | Photocurable composition having adhesive properties |
JP6167089B2 (en) * | 2014-03-27 | 2017-07-19 | 富士フイルム株式会社 | Photosensitive resin composition, cured film, method for producing cured film, and semiconductor device |
CA2984033C (en) | 2015-04-29 | 2023-08-15 | Bsn Medical Gmbh | Medical bathing equipment |
AU2016256186B2 (en) | 2015-04-29 | 2020-01-16 | Bsn Medical Gmbh | Multi-step process for no production |
EP3395800B1 (en) | 2017-04-26 | 2021-11-03 | Henkel AG & Co. KGaA | Heterocyclic quaternary nitrogen compounds comprising a polymeric substituent and their use as a photolatent catalyst in curable compositions |
KR20210003869A (en) | 2018-04-26 | 2021-01-12 | 헨켈 아게 운트 코. 카게아아 | Quaternary nitrogen compounds for use as latent catalysts in curable compositions |
EP3845577B1 (en) | 2018-08-28 | 2023-05-10 | Tokyo University of Science Foundation | Curable composition, cured product, and method of producing cured product |
JP7731353B2 (en) * | 2020-06-26 | 2025-08-29 | 株式会社Adeka | Compound, initiator, composition, cured product, and method for producing the cured product |
JPWO2021261498A1 (en) * | 2020-06-26 | 2021-12-30 | ||
WO2025131912A1 (en) | 2023-12-22 | 2025-06-26 | Essilor International | Latent borate-ammonium or iminium salts as photo-activatable catalysts for polythiourethane based substrates |
Family Cites Families (10)
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JP2571113B2 (en) * | 1988-12-29 | 1997-01-16 | 富士写真フイルム株式会社 | Photopolymerizable composition |
JP3412199B2 (en) * | 1993-09-01 | 2003-06-03 | 東洋インキ製造株式会社 | Method for producing polymerizable composition and cured product thereof |
JP3293258B2 (en) * | 1993-09-01 | 2002-06-17 | 東洋インキ製造株式会社 | Pyridinium complexes and their uses |
JPH09263063A (en) * | 1996-01-22 | 1997-10-07 | Toyo Ink Mfg Co Ltd | Energy-sensitive ray image forming composition, image forming medium using the same, and image forming method |
JPH09227854A (en) * | 1996-02-26 | 1997-09-02 | Toyo Ink Mfg Co Ltd | Energy-sensitive ray acid generator, energy-sensitive ray acid generator composition, curable composition and cured product thereof |
JPH09241614A (en) * | 1996-03-04 | 1997-09-16 | Toyo Ink Mfg Co Ltd | Energy-sensitive ray acid generator, energy-sensitive ray acid generator composition, curable composition and cured product thereof |
JPH09316117A (en) * | 1996-06-03 | 1997-12-09 | Toyo Ink Mfg Co Ltd | Polymerizable composition and cured product thereof |
JPH09328507A (en) * | 1996-06-10 | 1997-12-22 | Toyo Ink Mfg Co Ltd | Polymerization initiator, polymerizable composition and cured product thereof |
JPH101508A (en) * | 1996-06-17 | 1998-01-06 | Toyo Ink Mfg Co Ltd | Active ray-sensitive acid generator composition, sensitive composition and image recording composition |
JPH107709A (en) * | 1996-06-24 | 1998-01-13 | Toyo Ink Mfg Co Ltd | Energy-sensitive activator composition, sensitive composition using the same, and image-forming composition |
-
1998
- 1998-02-14 CA CA002281860A patent/CA2281860C/en not_active Expired - Fee Related
- 1998-02-14 EP EP98910669A patent/EP1032576B1/en not_active Expired - Lifetime
- 1998-02-14 AU AU64972/98A patent/AU726375B2/en not_active Ceased
- 1998-02-14 JP JP53724898A patent/JP4155603B2/en not_active Expired - Fee Related
- 1998-02-14 DE DE69839020T patent/DE69839020T2/en not_active Expired - Lifetime
- 1998-02-14 BR BRPI9807790-2A patent/BR9807790B1/en not_active IP Right Cessation
- 1998-02-14 KR KR1019997007769A patent/KR100542419B1/en not_active Expired - Fee Related
- 1998-02-14 WO PCT/EP1998/000846 patent/WO1998038195A1/en active IP Right Grant
- 1998-02-25 ZA ZA981556A patent/ZA981556B/en unknown
- 1998-03-10 TW TW087103457A patent/TW425399B/en not_active IP Right Cessation
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