WO2002071457A1

WO2002071457A1 - Lens-barrel, exposure device, and method of manufacturing device

Info

Publication number: WO2002071457A1
Application number: PCT/JP2002/002156
Authority: WO
Inventors: Yuichi Shibazaki
Original assignee: Nikon Corporation
Priority date: 2001-03-07
Filing date: 2002-03-07
Publication date: 2002-09-12
Also published as: JPWO2002071457A1; JP4333138B2

Abstract

A lens-barrel and an exposure device allowing the inspection and adjustment of each portion of a cabinet stored therein with a simple structure, wherein a cover (42) is supported on the flange (FLG) of the lens-barrel body (41) of the exposure device through support rollers (82) rotatably relative to the outer peripheral surface of the lens-barrel (40), a plurality of opening parts (65) are provided in the cover in peripheral directions and closed so as to be removed by a cover body (66), a plurality of recessed parts (84) allowing the support rollers to drop therein are provided, at specified intervals, in a guide rail (83) for guiding the rotation of the cover, the cover is positioned by allowing the support rollers to drop in the recessed parts, and the recessed parts are formed at the positions where the cover is held in the state of a piezo element (49) installed on the lens-barrel body and the opening part allowed to correspond to each other.

Description

Specification

Lens barrel, exposure apparatus, and method for producing depiice

[Technical field]

The present invention relates to, for example, a lens barrel and an exposure apparatus used in one lithography step in a process of manufacturing a device such as a semiconductor device, a liquid crystal display device, an imaging device, and a thin film magnetic head, and a method of manufacturing the device. Things.

[Background technology]

A conventional exposure apparatus illuminates a pattern formed on a mask such as a reticule with a predetermined exposure light, and projects an image of the pattern on a wafer or the like coated with a photosensitive material such as a photoresist through a projection optical system. Transfer onto a substrate.

Particularly, in an exposure apparatus for manufacturing a semiconductor element, a high degree of integration of the element is remarkable, and further improvement in resolution is required. In order to respond to such demands, the exposure light has shifted to shorter wavelengths in recent years. For example, an ArF excimer laser (ぇ =

Exposure apparatuses using 193 nm) and F2 laser (λ = 157 ηπι) have also been developed. In such an exposure apparatus, if oxygen is present in the optical path of the exposure light, the exposure light is greatly absorbed, and the device manufacturing efficiency is greatly reduced. The exposure apparatus is generally installed in a clean room. However, even in the clean room, a very small amount of ionic substances including, for example, ammonium ions, nitrate ions, and sulfate ions are floating in the atmosphere. Many coated wires are also used inside exposure equipment to send power and signals to various drive components. From the covering material of such a covered wire, organic substances are volatilized in a very small amount. Further, the droplets of the photosensitive material applied on the substrate may float in the exposure apparatus. These ionic substances, volatile substances from the coating material, and splashes of the photosensitive material adhere to the lenses of the projection optical system and become pollutants that reduce the transmittance of exposure light. As a result, the amount of exposure light reaching the substrate decreases, and the device manufacturing efficiency decreases.

To eliminate such oxygen and contaminants out of the optical path of the exposure light, an exposure apparatus that replaces the inside of the lens barrel that constitutes the projection optical system with an inert gas such as nitrogen, which is chemically clean, has also been developed. Has been issued.

In an exposure apparatus, it is necessary to project a pattern image on a mask onto a substrate as faithfully as possible. A projection optical system for projecting an image of a pattern onto a substrate is configured by combining a number of lenses, optical elements such as a parallel plate, and the like. By finely adjusting the relative positions of those optical elements, residual aberration of the projection optical system can be corrected. For this reason, the lens barrel constituting the projection optical system is provided with a large number of drive elements such as piezo elements and adjustment screws for adjusting the relative positions of the optical elements.

In the projection optical system configured as described above, a configuration in which a cover is attached to the lens barrel in order to prevent the inert gas from leaking inside the lens barrel to the outside can be considered. However, if an abnormality occurs in the drive element provided inside the force par or the position of the optical element needs to be adjusted by the adjustment screw, the cover is removed and the drive element is inspected and adjusted. You need to make adjustments. The projection optical system is composed of many optical elements and is often large. For this reason, the cover is inevitably large in size, and the work of removing the cover becomes extremely troublesome.

Therefore, as a configuration for simplifying the work of removing the cover, for example, a configuration in which the entire circumference of the projection optical system is covered with a bellows-like cover is considered. By using a metal bellows with less volatile material as the material of the bellows-like cover, it is possible to reduce the generation of contaminants from the cover itself. However, when a metal bellows is used, the rigidity of the bellows increases, and it becomes difficult to secure a sufficient amount of expansion and contraction in the optical axis direction of the projection optical system, which may result in poor workability. On the other hand, when a bellows made of a resin such as rubber is used, generation of volatile matter from the material constituting the bellows is inevitable.

In addition, the cover is divided into a plurality of parts, the divided power pars are arranged in a multi-stage bamboo shoot shape, and a part of the divided power pars is slid along the optical axis of the projection optical system to adjust the adjustment points. A configuration for exposing is also conceivable. However, in this configuration, there is a problem that a gap is easily formed between the divided covers and the sealing performance against the outside air inside the cover is easily deteriorated, and the structure of the cover is complicated and design restrictions are increased. [Disclosure of the Invention]

The present invention has been made in view of the problems existing in such conventional techniques. SUMMARY OF THE INVENTION An object of the present invention is to provide a lens barrel and an exposure apparatus which have a simple configuration and can inspect and adjust each part of a housing housed therein. Another object of the present invention is to provide a device manufacturing method for manufacturing a device using such an exposure apparatus.

In order to achieve the above object, an invention according to claim 1 is a lens barrel comprising: a housing accommodating a plurality of optical elements; and a force par covering at least a part of an outer peripheral surface of the housing. , Wherein the cover includes at least one opening and an opening / closing member that opens and closes the at least one opening.

According to the first aspect of the present invention, the opening / closing member for opening / closing the opening corresponding to the location where the inspection of the housing inside the cover needs to be adjusted, etc. is opened, so that a simple configuration can be easily achieved. Areas requiring the above inspection and adjustment are exposed.

The invention of claim 2 is the invention of claim 1, characterized in that it has a support mechanism for supporting the cover relatively rotatably with respect to the housing.

According to the invention of claim 2, in addition to the effect of the invention of claim 1, the force par is rotated so that the opening is formed at a location where inspection, adjustment, etc. of the housing inside the cover are required. Respond. In this state, by opening the opening / closing member, it is possible to easily expose portions requiring the inspection, adjustment, and the like without removing the entire cover. The lens barrel has a simple configuration in that the lens barrel is additionally provided with a support mechanism for supporting the cover in a relatively rotatable manner and an opening / closing member for opening and closing the opening. The invention according to claim 3 is the invention according to claim 2, wherein the support mechanism has a positioning mechanism for positioning the cover with respect to a predetermined position in a circumferential direction of the housing. It is characterized by the following. '

According to the third aspect of the invention, in addition to the operation of the second aspect of the invention, careless rotation of the cover during internal inspection and adjustment is suppressed, and the work is facilitated. . The invention according to claim 4 is the invention according to claim 3, wherein the predetermined position includes a position where the opening corresponds to an arrangement of a component mounted on the housing. .

According to the invention of claim 4, in addition to the effect of the invention of claim 3, the force par is held in a state where the opening corresponds to the component that needs to be inspected and adjusted. Can be. Therefore, the inspection and adjustment of the inside can be more easily performed. The invention according to claim 5 is the invention according to claim 4, wherein the constituent element is an adjustment mechanism for adjusting a posture of the optical element. It is characterized by having. According to the invention of claim 5, in addition to the effect of the invention of claim 4, it is possible to easily adjust the attitude of the optical element.

The invention according to claim 6 is the invention according to claim 5, wherein the adjusting mechanism has a driving mechanism for driving the optical element.

According to the invention set forth in claim 6, in addition to the effect of the invention set forth in claim 5, it is possible to easily perform inspection and adjustment of the drive mechanism, which is relatively likely to require inspection and adjustment. You.

The invention according to claim 7 is the invention according to claim 6, wherein one end of a wire for supplying at least one of power and a signal from a power source is connected to the drive mechanism, and a connector is provided at another end of the wire. And the connector is disposed on a portion of the housing that is different from the portion covered by the force bar, and the drive mechanism and the supply source are connected via the connector. Things.

According to the invention of claim 7, in addition to the effect of the invention of claim 6, the wiring of the drive mechanism is not rotated due to the rotation of the force par, and the occurrence of troubles such as disconnection is suppressed. You. In addition, the connection between the drive mechanism in the lens barrel and a power source, a signal source, or the like disposed outside the lens barrel can be easily performed.

The invention according to claim 8 is the invention according to any one of claims 2 to 7, wherein the cover is provided with a plurality of the openings at predetermined intervals in a circumferential direction thereof. is there.

According to the invention of claim 8, the invention according to any one of claims 2 to 7 In addition to the operation, when a plurality of components that need to be inspected and adjusted in the lens barrel are provided at positions having different phases, it is easy to inspect and adjust those components at the same time.

The invention according to claim 9 is the seal member according to any one of claims 2 to 8, wherein the sealing member partitions the inside of the force member from the outside air tightly between the housing and the cover. And the support mechanism is disposed outside the see-through member with respect to the housing.

According to the invention of claim 9, in addition to the effect of any one of claims 2 to 8, the inside of the cover is more reliably partitioned by the seal member from the outside air. Then, in order to ensure a smooth rotation function of the cover in the support mechanism, even if, for example, a slidability improver is used in a sliding portion in the support mechanism, the slide improver is used inside the cover. As a result, the influence on the atmosphere in the housing is suppressed.

A tenth aspect of the present invention is the invention according to any one of the second to eighth aspects, wherein the inside of the power member is airtightly defined with respect to outside air between the housing and the cover.有し In the state where the cover is disposed at a predetermined position, the canopy and the housing are joined via the seal member, and the cover is rotatable. In some cases, the seal member is separated from at least one of the cover and the housing.

According to the tenth aspect of the present invention, in addition to the effect of any one of the second to eighth aspects of the invention, when the power member is rotated, the cover and the sealing member slide. Hardly ever moved. For this reason, the durability of the sealing member is improved, and the generation of foreign matter is suppressed. .

The invention according to claim 11 is the invention according to any one of claims 1 to 10, wherein the opening and closing operation of the opening and closing member is permitted when the inside of the cover reaches a predetermined atmosphere. An open / close lock mechanism is provided. '' According to the invention of claim 11, in addition to the effect of any one of claims 1 to 10 of the invention, for example, the inside of the force par is replaced with an inert gas. In this case, when the oxygen concentration reaches a predetermined value, the opening / closing operation of the opening / closing member is allowed. . For this reason, internal inspection and adjustment work can be performed in an easy-to-work atmosphere.

An invention according to claim 12 is an exposure apparatus that jumps an image of a pattern formed on a mask onto a substrate, comprising the lens barrel according to any one of claims 1 to 11. It is characterized by the following.

According to the invention of claim 12, in addition to the effect of the invention of any one of claims 1 to 11, inspection and adjustment of the inside of the lens barrel can be performed easily and quickly. This leads to a reduction in the stop time of the exposure apparatus.

The invention according to claim 13 is the invention according to claim 12, further comprising: a projection optical system that projects the image of the pattern onto a substrate, wherein the projection optical system is defined by any one of claims 1 to L1. And a lens barrel according to any one of the above.

The projection optical system plays a more important role in improving the exposure performance of the exposure apparatus, and it is necessary to finely adjust the attitude and relative position of the optical elements included therein. Therefore, according to the invention of claim 13, the effect of the invention of claim 12 is particularly remarkably exhibited.

The invention according to claim 14 is a method for manufacturing a device including a) lithographic process, wherein the lithographic process is performed by using the exposure apparatus according to claim 12 or 13. Is what you do.

According to the invention of claim 14, in addition to the effect of the invention of claim 12, the inspection and adjustment of the inside of the lens barrel in the exposure apparatus can be easily and quickly performed. The manufacturing efficiency of the device is improved.

Next, technical ideas further included in the inventions of the respective claims are described below together with their effects.

(1) The positioning mechanism comprises a recess formed in either direction of the housing and the cover, and the other of the guest and the cover has at least a position in a state where the cover is positioned. The lens barrel according to any one of claims 3 to 7, wherein a housing part of which is housed in the recess is formed.

According to the configuration described in the technical concept (1), the cover can be held at a predetermined position with a simple configuration. (2) The lens barrel according to (1), wherein the positioning mechanism includes a detachment mechanism that detaches the container from the recess substantially in synchronization with rotation of the cover.

According to the configuration described in the technical idea (2), the cover can be smoothly rotated.

(3) The technical concept (1) or (1), wherein the housing is provided with a guide mechanism that rotatably guides the cover in a state where the housing is separated from the recess. The lens barrel according to (2).

According to the configuration described in the technical concept (3), the cover can be rotated stably.

(4) An opening seal member disposed between the opening / closing member and the periphery of the opening, and comprising an opening sealing member for partitioning an inner portion of the force par with an outside air tightly. The lens barrel according to any one of 1 to 8.

According to the configuration described in the technical idea (4), when the inside of the cover is replaced with, for example, an inert gas, the airtightness of the inside of the cover can be improved, and contaminants from the outside can be prevented from entering. It can be suppressed effectively.

(5) The opening / closing member has at least one window and a window opening / closing member that covers the window so that the window can be opened and closed. -8, Technical concept (4) The lens barrel described in (1) or (2).

According to the configuration described in the technical concept (5), when detecting the state inside the cover, for example, various sensors such as an oxygen sensor are inserted into the cover using the window. Can be. .

(6) a window sealing member disposed between the window opening / closing member and the periphery of the window, and a window sealing member for partitioning the inside of the cover in an airtight manner with respect to outside air; The lens barrel according to 5).

According to the configuration described in the technical idea (6), almost the same effect as that of the technical idea (4) can be obtained.

[Brief description of drawings] The features which are believed to be novel of the present invention will become apparent in particular from the appended claims. BRIEF DESCRIPTION OF THE DRAWINGS The present invention, together with objects and advantages, will be understood by reference to the following drawings which describe the presently preferred embodiments.

FIG. 1 is a schematic diagram showing an overall configuration of an exposure apparatus according to a first embodiment of the present invention. FIG. 2 is an enlarged view of a lens barrel of the exposure apparatus of FIG.

Fig. 3 is a partial side view of the upper part of the barrel of Fig. 1.

FIG. 4 is a partially enlarged sectional view of the lens barrel of FIG.

FIG. 5 is a partially enlarged sectional view of the lens barrel of FIG.

FIG. 6 is an explanatory diagram relating to the operation of a support roller and a separation prevention mechanism of the lens barrel in FIG. FIG. 7 is a partially enlarged sectional view of a lens barrel of an exposure apparatus according to a second embodiment of the present invention. Figure 8 is a flowchart showing the device manufacturing method.

FIG. 9 is a flowchart showing a method for manufacturing a semiconductor device.

[Best Mode for Carrying Out the Invention]

(First Embodiment)

Hereinafter, a first embodiment in which the present invention is embodied in a scanning exposure type exposure apparatus for manufacturing a semiconductor element, a lens barrel accommodating a projection optical system thereof, and a method for manufacturing a semiconductor element will be described with reference to FIGS. It will be described based on.

First, a schematic configuration of the exposure apparatus will be described.

FIG. 1 shows a schematic configuration of the entire exposure apparatus. As shown in FIG. 1, the exposure light source 11 emits pulsed light such as KrF excimer laser light, ArF excimer laser light, and F2 laser light as the exposure light E. The exposure light EL, as an optical integrator, enters a fly-eye lens 12 composed of, for example, a large number of lens elements. A next light source image is formed. Note that a rod lens may be used as the opticanolein tegreta. Exposure light EL emitted from the fly-eye lens 12 is transmitted to a circuit such as a semiconductor element via optical elements such as a relay lens 13a, 13b, a reticle blind 14, a mirror 15 and a condenser lens 16. A pattern etc. is drawn, and a mask is placed on the reticle stage RST. Light is incident on Rechikunore R.

Here, the combined system of the fly-eye lens 12, the relay lenses 13a and 13b, the mirror 15 and the condenser lens 16 superimposes the secondary light source image on the reticle R and makes the reticle R uniform. The illumination optical system 17 illuminates with illuminance. The illumination optical system 17 is housed in a lens barrel 18.

Reticle blind 14 is arranged such that its light-shielding surface has a substantially common relationship with the pattern area of reticle R. The reticle blind 14 is composed of a plurality of movable light shields (for example, two L-shaped movable light shields) that can be opened and closed by a reticle blind drive unit 19. By adjusting the size (slit width, etc.) of the opening formed by the movable light-shielding portions, the illumination area for illuminating the reticle R can be arbitrarily set.

The reticle stage R ST holds the reticle R in a plane perpendicular to the optical path of the exposure light EL so as to be finely movable in a two-dimensional direction. The reticle stage R ST can be moved in a predetermined direction (scanning direction (Y direction)) by a reticle stage driving section 20 composed of a linear motor or the like. The reticle stage R ST has a movement stroke such that the entire surface of the reticle R can cross at least the optical axis AX of the projection optical system PL. In FIG. 1, the direction along the optical axis AX of the projection optical system PL, which will be described later, is the Z direction, the optical axis AX of the projection optical system PL and the X direction is the direction orthogonal to the plane of the drawing, and the optical axis AX of the projection optical system PL. The direction perpendicular to and along the paper surface is the Y direction.

A movable mirror 22 that reflects the laser beam from the interferometer 21 is fixed to an end of the reticle stage RST. The position of the reticle stage R ST in the scanning direction is constantly detected by the interferometer 21, and the position information is sent to the reticle stage controller 23. Reticle stage control section 23 controls reticle stage drive section 20 based on the position information of reticle stage RST, and moves reticle stage RST.

The exposure light EL that has passed through the reticle R enters, for example, a double-sided telecentric projection optical system PL. The projection optical system PL senses a projection image obtained by reducing the circuit pattern on the reticle R to, for example, 1Z5 or 1Z4 on the surface with respect to the exposure light EL. It is formed on a wafer W as a substrate coated with a photoresist having optical properties. Wafer W is held on wafer stage WST via wafer holder 30. The wafer holder 30 can be tilted in an arbitrary direction with respect to the optimum imaging plane of the projection optical system PL by a driving unit (not shown), and can be finely moved in the optical axis AX direction (Z direction) of the projection optical system PL. It has become. In addition, the wafer stage WST is not only moved in the scanning direction (Y direction) by a wafer stage driving unit 31 such as a motor, but is also scanned so that it can arbitrarily move a plurality of shot areas partitioned on the wafer. It is configured to be movable in the direction perpendicular to the direction (X direction). As a result, a step 'and' scan operation for controlling the scanning exposure for each shot area on the wafer W is possible.

A movable mirror 33 for reflecting the laser beam from the interferometer 32 is fixed to the end of the wafer stage WST, and the position of the wafer stage WST in the X direction and the Y direction is fixed by the interferometer 32. Always detected. The position information (or speed information) of the wafer stage WST is sent to the wafer stage control unit 34, and the wafer stage control unit 34 controls the wafer stage drive unit 31 based on the position information (or speed information). I do.

Here, when the circuit pattern on the reticle R is scanned and exposed to the shot area on the wafer W by the step-and-scan method, the illumination area on the reticle R becomes rectangular (slit) with the reticle blind 14. Be shaped. The illumination area has a longitudinal direction perpendicular to the scanning direction (+ Y direction) on the reticle R side. The circuit pattern on the reticle R is sequentially illuminated from one end to the other end in the slit-shaped illumination area by scanning the reticle R at a predetermined speed Vr during exposure. Thereby, the circuit pattern on the reticle R in the illumination area is projected onto the wafer W via the projection optical system PL, and a projection area is formed.

Here, since the wafer W has an inverted image relationship with the reticle R, the wafer W runs at a predetermined speed V w in a direction opposite to the scanning direction of the reticle R (one Y direction) in synchronization with the scanning of the reticle R.查As a result, the entire surface of the shot area of the wafer W can be exposed. The running speed ratio V w / V r is accurately determined according to the reduction ratio of the projection optical system PL. The circuit pattern on the reticle R is accurately reduced and transferred onto each shot area on the wafer W.

Next, the configuration of the projection optical system PL and the lens barrel 40 that houses the projection optical system PL will be described.

FIG. 4 is an enlarged view showing a structure for holding the movable lens element 43 in the lens barrel main body 41 and a structure around the cap 42. As shown in FIG. 1, the projection optical system PL is an optical system that is disposed between a reticle R and a wafer W and includes a plurality of optical elements including lens elements 43 and 45. The lens barrel 40 that houses the projection optical system PL includes a lens barrel body 41 as a housing that holds the lens elements 43 and 45, and a predetermined distance from the outer peripheral surface of the lens barrel body 41. A cover 42 is provided to cover the outer peripheral surface from the upper portion to the flange FLG provided in the middle. The lens barrel 40 is supported by a frame (not shown) of the exposure apparatus by a flange FLG. As shown in FIG. 2, the lens barrel main body 41 is configured such that a plurality of partial lens barrels are fixed to each other. That is, in order from the reticle R side, the first part barrel 41a, the second part barrel 41b, the third part barrel 4lc, the fourth part, the fifth part, the sixth part, the seventh part, the eighth part, and the ninth part The lens barrel is divided into 41d, 41e, 41f, 41g, 41h, and 41i. A flange FLG is provided between the fifth lens barrel 41e and the sixth partial lens barrel 41f. In the present embodiment, the lens barrel 40 is divided into nine partial lens barrels 41a to 41i, but the number of divisions is not limited to this.

As shown in FIG. 1, at least one lens element 43, 45 is provided on each of the partial barrels by a lens holding member (not shown) in the partial barrel provided with the barrel and the flange FLG. Each is held. A power bar glass 46 is provided at an end of the first partial barrel 41a on the reticle R side and at an end of the ninth partial barrel 41i on the wafer W side. '' As shown in FIGS. 1 and 2, the partial barrel provided with the flange FLG and the sixth to ninth partial barrels 41 ί to 41 i arranged below the flange FLG, that is, on the wafer W side, The stationary lens element 45 is held by a holding member (not shown). In addition, each of the first to fifth parts 41a to 41e arranged above the flange FLG, that is, on the reticle R side, has at least one D movable lens element. 4 (only one is shown in FIG. 2). As shown in FIG. 1, the first to fifth partial lens barrels 41 a to 41 e include a support member 47 for supporting the movable lens element 43 and a piezo element 4 included in the drive mechanism. 9 is provided. Since the lens elements 43 and 45 are held by the holding member at three places on the outer periphery thereof, for example, at three places, the lens elements 43 and 45 are disposed on the inner walls of the partial lens barrels 41a to 41i. , 45 and a gap is formed between the holding members. As a result, each of the spaces 55 to 57 defined by the cover glass 46, the lens elements 43, 45, and the lens barrel body 41 is connected to the passage 47a formed in the support member 47 (see FIG. 4) and are communicated with each other through the gap and the like. Each of the spaces 55 to 57 communicates with a space 58 between the outer surface of the lens barrel body 41 and the inner surface of the cover 42 by a gap between the respective barrels.

Also, of the plurality of partial barrels, the side walls of the partial barrel having the movable lens element 43 accommodate the piezo element 49 such that the expansion and contraction direction of the piezo element 49 is tangential to the barrel. A link mechanism for transmitting the driving force of the piezo element 49 to the movable lens element 43 is formed. The link mechanism is formed in consideration of the displacement range of the piezo element 49 and the like. Since the accommodation space and the link mechanism are formed on the side wall of the partial lens barrel by electric discharge machining, the side wall of the partial lens barrel has a plurality of notches. Therefore, each of the air gaps 55 to 57 communicates with a space 58 between the outer surface of the lens barrel body 41 and the inner surface of the cover 42 through a plurality of notches.

Each support member 47 is connected to the lens barrel main body 41 via a piezo element 49. A plurality of, for example, three piezo elements 49 are provided at equal angular intervals in the circumferential direction in each of the partial barrels 41 a to 41 e. As each piezo element 49 expands and contracts, each support member 47 is slightly moved in the optical axis AX direction with respect to the lens barrel body 41 via a link mechanism formed on the side wall of the barrel. .

Further, each holding member 47 is connected to the lens barrel main body 41 via a piezo element 49 as an actuator constituting an adjusting mechanism and a driving mechanism. A plurality of, for example, three of these piezo elements 49 are provided at equal angular intervals in the circumferential direction of the lens barrel main body 41, for example, three are provided on the outer peripheral side portion of the lens barrel main body 41. Then, as each piezo element 49 expands and contracts, it passes through a link mechanism formed on the side wall of the partial lens barrel. Each holding member 47 is configured to be finely movable in the optical axis AX direction with respect to the lens barrel main body 41. Further, by finely adjusting the amount of expansion and contraction of each piezo element 49, each holding member 47 can be inclined with respect to the lens barrel body 41. Thus, the posture of the movable lens element 43 can be adjusted. As shown in FIGS. 1 and 4, an internal wiring 51 a for supplying power and a signal for driving each piezo element 49 has one end connected to each piezo element 49 and a cover 42. The other end is connected to a connector 52 provided in the flange FLG on which the lower end of the flange is supported. Here, the internal wiring 51 a is accommodated in a space 58 between the lens barrel body 41 and the cover 42. The connector 52 is further connected to an imaging characteristic controller 53 as a power and signal supply source via an external wiring 51 b. ′ The internal wiring 51 a is covered with a material in which the generation of impurities (such as organic substances that absorb the exposure light EL) is suppressed. The coating material may be, for example, polytetrafluoroethylene, tetrafluoroethylene-terfluoro (alkynolebininoleatenore) copolymer, or tetrafluoroethylene-hexafluorene proben copolymer. It may be made of polymer resin. Further, the coating material may be coated with fluorine. Preferably, the external wiring 51b is similarly configured.

Here, as shown in FIG. 1, an exposure light source 11, a reticle blind drive unit 19, a reticle stage control unit 23, and a wafer stage control unit 34, including an imaging characteristic control unit 53, Connected to control system 54. Each component is operated under the control of the main control system 54, and the main control system 54 controls the entire series of exposure steps for transferring the image of the pattern formed on the reticle R onto the wafer W. are doing. Now, the barrel 40 is provided with a purge gas inlet 60 for introducing a purge gas into the inside thereof, and a gas outlet 61 for discharging gas in the barrel 40. In addition, inert gas such as nitrogen, helium, argon, neon, and krypton is used as the purge gas.

The purge gas inlets 60 are formed at two positions on the reticle side and the wafer side end of the lens barrel body 41. It is supplied inside. On the other hand, the gas outlet 61 is a mirror It is formed on a cover 42 that covers the space between the flange FLG and the upper part of the cylinder body 41. In particular, it is desirable that the gas outlet 61 is formed at the center of the force par 42. The purge gas introduced from the purge gas inlet 60 on the reticle side of the lens barrel body 41 is discharged into the space 58 through the gap between the partial lens barrels, the space for accommodating the piezo element 49, and the plurality of cutout holes. Is done. Note that a communication hole 59 may be provided in the lens barrel main body 41 in order to promote gas discharge in the lens barrel main body 41. Here, when assembling the exposure apparatus, the gas discharged from each of the spaces 55 to 57 contains air and pollutants, and after the exposure apparatus is assembled (for example, when the exposure apparatus is operated). If possible, the gas discharged from 55 to 57 between each S is a purge gas. The purge gas discharged may contain a small amount of pollutants. Further, the purge gas introduced from the purge gas inlet 60 on the wafer side of the lens barrel body 41 is supplied to the empty space 57 through a passage formed in a holding member for holding the stationary lens element 45. Are combined. The purge gas supplied to the space 57 from the purge gas supply port 60 reaches the space 57 in the fifth partial barrel 41e via the passage.

Then, from the gap between the fourth partial lens barrel 41d and the fifth part ^ 41e, or from the notch hole formed in the fourth partial lens barrel 41d or the fifth partial lens barrel 41e. Exhausted into space 58. Part of the purge gas supplied from the purge gas supply port 60 of the ninth tube 41 i is leaked from the gap between the sixth to ninth partial tubes 41 f to 41 i. The leakage amount is smaller than the purge gas leakage amount leaking from the gap between the first to fifth partial lens barrels 41a to 41e, and is assumed to be negligible in the present embodiment. If the amount of gas leaking from the gap between the sixth to ninth partial barrels 41 f to 41 i cannot be ignored, a predetermined distance is set outside the sixth to ninth partial barrels 41 f to 41 i. It is only necessary to set a force par apart from. When the cover is provided, one end of the cover may be attached to the flange FLG, and the other end may be attached to the side wall of the ninth partial lens barrel 41i. However, when the same cover is provided outside the sixth to ninth partial lens barrels 41 f to 41 i, a purge gas outlet may be provided in the cover.

Next, the configuration of the cover 42 will be described in detail.

FIG. 3 shows a side surface of the lens barrel 18 above the flange FLG. As shown in FIG. 3, the cover 42 covers the outer peripheral surface above the flange FLG of the lens barrel body 41. It is provided to cover. Then, as shown in FIG. 4, the cover 42 is provided between the flange FLG of the lens barrel body 41 and the support member 64 disposed at the end on the reticule side of the lens barrel body 41. The entire body is supported so as to be relatively rotatable with respect to the lens barrel body 41. As shown in FIG. 1, on the outer surface of the cover 42, an opening is formed between the end on the reticle side and the flange FLG in the optical axis direction of the projection optical system PL, and a plurality of upper and lower parts ( In the present embodiment, three openings 65 are formed at equal angular intervals. The plurality of openings 65 are arranged at equal intervals in the circumferential direction of the cover 42. In the present embodiment, it is assumed that three openings 65 are formed in the circumferential direction. Each opening 65 is closed by a lid 66 serving as an opening / closing member forming a pair at the top and bottom.

As shown in FIG. 3, the lid 66 is fixedly fastened to the cover 42 with a plurality of bolts 67, or the opening 65 is removed by removing each lid 66 from the cover 42. Can be opened and closed. Note that FIG. 3 shows only one pair of lids 66 that close the opening 65 at one of the three locations. In addition, between the inner peripheral portion of the lid 66 and the peripheral portion of the opening 65 in the cover 42, an opening seamless member for hermetically sealing the inside of the cover 42 against the outside air is provided. An O-ring 68 is interposed (see Fig. 4).

In addition, a plurality of (three in this embodiment) windows 69 are formed in each lid 66. In the present embodiment, the window 69 is formed at the lower end of the lid 66. The position of the window 69 is not particularly limited to the lower end, and may be formed at the center or the upper end of the lid 66. The window 69 is closed by a window cover 70 as a window opening / closing member. The window cover 70 is fastened and fixed to the cover 66 by bolts 71. The inside of the cover 42 is hermetically sealed from the outside air between the inner peripheral portion of the window cover 70 and the peripheral portion of the window 69 formed in the cover 66. An O-ring 72 is interposed as a window seal member to be used (see FIG. 4). Next, the support structure of the cover 42 will be described.

As shown in FIG. 4, the cover 42 includes a V-ring as a sealing member with respect to the stepped portion 76 of the support member 64 having the bent portion 75 at the upper end attached to the lens barrel body 41. It is designed to engage through 7 7. The V-ring 77 fits tightly on the outer peripheral surface of the stepped part 76 Is attached by However, the V-ring 77 is formed integrally with the base portion 77a attached to the step portion 76 of the support member 64 so as to be displaceable with respect to the base portion 77a, and is connected to the cover 42. And a displacement portion 7 7 b that bows. The displacement portion 77b is elastically deformed with respect to the base portion 77a.

The lower end 78 of the force par 42 is housed in a housing recess 79 formed on the upper surface of the flange FLG of the lens barrel body 41. Further, a V-ring 81 as a seal member is interposed between the support projection 80 protruding near the inner peripheral edge of the lower end 78 and the bottom of the accommodation recess 9. The V-ring 81 is also mounted on the bottom of the accommodation recess 79 by an interference fit. However, the V-ring 81 includes a base portion 81a attached to the flange FLG and a displacement portion 81b formed integrally with the base portion 81a so as to be displaceable and contacting the cover 42. Prepare. The displacement part 81b is elastically deformed with respect to the base part 81a.

As shown in FIGS. 3, 4, and 6, on the outer surface of the lower end 78 of the cover 42, a plurality of ( ^{three in} this embodiment) rotatable supports forming a support mechanism and a housing are provided. The rollers 82 are provided at equal angular intervals in the circumferential direction of the cover 42. FIG. 6 shows an outline of the support structure on the lower end side of the cover 42 when the lens barrel main body 41 and the cover 42 are expanded. Here, FIG. 3 shows only one support roller 82 and FIG. 6 shows only two support rollers 82.

On the upper surface of the outer wall forming the housing recess 79, a guide renole 83 serving as a flat annular guide mechanism is formed so as to correspond to the rotation locus of the support roller 82. The guide rail 83 is provided with a plurality of (for example, 12) concave portions 84 that form a positioning mechanism corresponding to the support rollers 82 at predetermined intervals. As shown by the solid line in FIG. 6, when the cover 42 is located at a predetermined position, the support roller 82 falls into the recess 84.

When the support roller 82 is lowered into the concave portion 84, each opening 65 of the cover 42 is opposed to each piezo element 49 attached to the lens barrel main body 41. It is arranged also in the phase between them. In this state, the lower end portion 78 of the cover 42 is joined to the flange FLG of the lens barrel body 41 via the V-ring 81, and the bent portion 75 at the upper end of the cover 42 is formed as described above. V-ring 7 7 It is to be joined to the holding member 64. Thereby, airtightness with respect to the outside air inside the cover 42 is maintained.

The flange FLG is provided with a detachable Uh mechanism 87 composed of an angled fastener 85 and a bolt 86 so as to correspond to one of the plurality of recesses 84. The detachment preventing mechanism 87 is for preventing the fastener 85 from contacting the support roller 82 and inadvertently detaching the support roller 82 from the inside of the concave portion 84. That is, with the support roller 82 dropped into the concave portion 84, the tip bent piece 85 a of the fastener 85 is brought into contact with the support roller 82, and the slide groove on the base end side of the fastener 85 is provided. Tighten the bonolet 8 6 through 8 5 b. As a result, the upward movement of the support roller 82 is restricted, and the separation of the support roller 82 from the concave portion 84 is prevented.

On the other hand, when rotating the force par 42, the bolt 86 of the detachment ISJh mechanism 87 is loosened, and the fastener 85 is moved upward as a whole by a dashed line in FIG. . Thereby, the tip bent piece 85a of the fastener 85 is separated from the support roller 82, and the cover 42 is moved in the circumferential direction of the lens barrel body 41.

Then, the support roller 82 rolls on the guide rail 83 so as to float along the slope of the concave portion 84 forming the detachment mechanism, and eventually the concave portion 84 shown in FIG. 6 by a two-dot chain line. And rolls on the top surface of the guide rail 83. As described above, the slope of the concave portion 84 forms a detachment mechanism that detaches the support roller 82 from the concave portion 84 almost in synchronization with the rotation of the force roller 42.

Then, when the support roller 82 reaches the next concave portion 84, the support roller 82 falls into the concave portion 84 along the slope of the concave portion 84. In this manner, the support roller 82 rolls on the guide rails 83 while repeating dropping and detachment (lifting) with respect to the concave portion 84 until the opening 65 of the cover 42 reaches the desired position. It will be.

Here, in a state in which the support roller 82 is detached from the concave portion 84, that is, in a state in which the support roller 82 is rolling on the top surface of the guide liner 83, as shown by a two-dot chain line in FIG. Reference numeral 42 denotes a state where the reference numeral 42 is slightly moved upward with respect to the lens barrel body 41. In this state, the bent portion 75 of the cover 42 and the support projection 80 are respectively 7 7, 8 1 As a result, when the cover 42 is rotated, the bent portions 75 and the support protrusions 80 of the force pars 42 and the V-rings 77, 81 are not slid. . Further, even when the support roller 82 is rolling on the top surface of the guide rail 83, the lower end portion 78 of the cover 42 is not separated from the accommodation recess 79.

In the lens barrel 40 configured as described above, the procedure for inspecting and maintaining the inside of the lens barrel 40 will be described by taking as an example the case where the piezo element 49 mounted on the lens barrel body 41 is adjusted. Will be explained.

First, the supply of the purge gas into the lens barrel 40 is stopped so that at least the space 58 inside the cover 42 has an atmosphere substantially equal to that in the clean room. Eventually, the purge gas in the space 58 is replaced with air in the clean room, and when the space 58 and the clean room become almost the same space, the bolts 86 of the separation prevention mechanism 87 are loosened. The force par 42 is rotated so that one of the openings 65 corresponds to the piezo element 49 that needs to be adjusted. Then, the bolts 67 are loosened, the lid 66 is removed, and the opening 65 is opened. Thereby, the piezo element 49 is exposed and adjusted.

Then, when the adjustment of the piezo element 49 is completed, the opening 65 is covered with the cover 66 in a procedure reverse to the above procedure, and the cover 66 is fastened to the cover 42. And fix it. Then, the cover 42 is rotated until the support roller 82 is disengaged and falls into the concave portion 84 provided with the three-way mechanism 87, and the fastener 85 of the separation prevention mechanism 87 is brought into contact with the support roller 82. Then fix the cover 42. Then, the supply of the purge gas into the lens barrel 40 is resumed, and the spaces 55 to 58 in the lens barrel 40 are replaced with purge gas. At this time, for example, one of the window lids 70 attached to the lid 66 of the cover 42 is removed, and an oxygen sensor is inserted into the opened window 69, so that the space 58 is opened. It is desirable to confirm that the purge gas has been replaced.

Therefore, according to the first embodiment, the following effects can be obtained.

(A) In the lens barrel 40 of the projection optical system PL, a force par 4 2 force S covering a part of the outer peripheral surface of the lens barrel body 41, and a support rotatably supporting the lens barrel body 41 relative to the lens barrel body 41. Rollers 82 are provided. The cover 42 has a plurality of openings 65, and the openings 65 are opened. And a cover 66 that covers the cover in a closeable manner. For this reason, if it becomes necessary to adjust the position of the lens barrel body 41 inside the cover 42 of the lens barrel 40, that is, the optical element and check the piezo element 49, etc., rotate the force par 42. The openings 65 correspond to locations where inspection, adjustment, etc. are required. In this state, by removing the lid 66, it is possible to easily expose a portion requiring maintenance such as the inspection and adjustment without removing the entire cover 42. As for the force, ^ f 40 has only a supporting roller 82, an opening 65, and a lid 66 in order to make the cover 42 relatively rotatable. Configuration. Therefore, the inspection, adjustment, etc. of the inside of the cover 42 can be performed easily and quickly with a simple configuration.

(B) In the lens barrel 40 of the projection optical system PL, the support rollers 82 fall into the concave portions 84, so that the openings 65 are arranged at predetermined positions in the circumferential direction of the lens barrel body 41. The cover 42 is held by the cover. For this reason, during the work such as the inspection and adjustment of the inside of the cover 42, careless rotation of the force par 42 is suppressed, and the work can be easily performed. ,

(C) In the lens barrel 40 of the projection optical system PL, the cover 42 is positioned at the position corresponding to the piezo element 49 mounted on the lens barrel body 41, with the concave part 8 4 It is provided at the position where it is held. Therefore, the cover 42 can be held with the opening 65 corresponding to the piezo element 49 that needs to be inspected and adjusted. Therefore, inspection and adjustment of the piezo element 49 can be performed more easily and quickly. In particular, the piezo element 49 is a component that is relatively easily required to be inspected and adjusted among the components provided in the lens barrel body 41. Therefore, the effect that the inspection and adjustment of the inside of the force par 42 can be performed easily and quickly is particularly preferably exhibited, and the stop time of the exposure apparatus can be effectively reduced.

(D) In the lens barrel 40 of the projection optical system PL, the internal wiring 51 1 a for supplying power and power to the piezo element 49 driving the movable lens element 43 is a lens barrel body 41. It is connected to the imaging characteristic control unit 53 via a connector 52 provided on the flange FLG of the internal wiring 51. Therefore, the internal wiring 51a is not rotated by the rotation of the cover 42. In addition, it is possible to suppress a problem such as disconnection of the internal wiring 51a, and to prevent the cover 42 from becoming difficult to rotate. The connection work between the piezo element 49 inside the camera and the imaging characteristic control section 53 disposed outside the lens barrel 40 can be easily performed.

(E) In the lens barrel 40 of the projection optical system PL, a plurality of openings 65 are provided at predetermined intervals in the circumferential direction of the cover 42. Therefore, when a plurality of components such as the piezo element 49 that need to be inspected and adjusted in the lens barrel 40 are provided at positions having different phases, the components are inspected and adjusted at the same time. It will be easier.

(F) In the lens barrel 40 of the projection optical system PL, the V-rings 77, 8 between the lens barrel body 41 and the force par 42 to partition the inside of the cover 42 from the outside air tightly 1 is provided. The support roller 82 supporting the cover 42 is disposed outside the cover 42 with respect to the lens barrel main body 41. For this reason, the inside of the cover 42 is more reliably partitioned from the outside air by the V rings 77, .81. Therefore, even if, for example, a slidability improving agent is used in the sliding portion of the support roller 82, the slidability improving agent does not affect the atmosphere inside the cover 42 and, consequently, the inside of the lens barrel body 41. Can be suppressed. As a result, the lens elements 43 and 45 can be made less likely to be contaminated.

(G) In the lens barrel 40 of the projection optical system PL, when the cover 42 is arranged at a predetermined position, the cover 42 and the lens barrel body 41 are joined via the V-rings 77 and 81. When the force bar 42 is in a rotatable state, the V-rings 77 and 81 are separated from the cover 42. For this reason, when the cover 42 is rotated, the cover 42 and the V-rings 77 and 81 are hardly slid. Therefore, the durability of the V 'rings 77, 81 can be improved, and the generation of foreign substances can be suppressed. '

(H) In the lens barrel 40 of the projection optical system PL, a concave portion 84 formed in the flange FLG of the lens barrel body 41 and a support port formed in the cover 42 and housed in the concave portion 84 are provided. The positioning of the cover 42 is performed by the rollers 82. With such a simple configuration, the cover 42 can be held at a predetermined position, and the manufacturing cost of the lens barrel 40 can be reduced.

(I) In the lens barrel 40 of the projection optical system PL, the cover 42 is held at a predetermined position. A slope is formed in the portion 84, and the support roller 82 is detached from the concave portion 84 along the slope substantially in synchronization with the rotation of the cover "42. When rotating, the rotation can be performed smoothly.

(J) In the lens barrel 40 of the projection optical system PL, a guide rail for guiding the rotation of the cover 42 with the support roller 82 detached from the recess 84 on the flange FLG of the lens barrel body 41 8 3 are provided. Therefore, the cover 42 can be rotated stably.

(K) In the lens barrel 40 of the projection optical system PL, an O-ring between the periphery of the lid 66 and the periphery of the opening 65 to partition the inside of the cover 42 from the outside air tightly. 6 8 are provided. Therefore, when the inside of the cover 42 is replaced with, for example, an inert gas, the airtightness of the inside of the cover 42 can be increased, and intrusion of contaminants from the outside can be effectively suppressed. .

(L) In the lens barrel 40 of the projection optical system PL, the cover 66 of the cover 42 includes a plurality of windows 69, and a window cover 70 that covers the window 69 so that it can be opened and closed. Is provided. For this reason, when detecting the state of the space 58 inside the cover 42, for example, it is necessary to insert various sensors such as an oxygen sensor into the inside of the force par 42 using the window 69. It is convenient.

(M) In the lens barrel 40 of the projection optical system PL, the inside of the cover 42 is airtightly sealed from the outside air between the periphery of the window lid 70 of the cover 42 and the periphery of the window 69. There are O-rings 72 for partitioning. Therefore, substantially the same effects as described in the above (K) can be obtained.

(N) The projection optical system PL of the exposure apparatus plays an important role in enhancing the exposure performance of the exposure apparatus, and the posture and relative position of each of the lens elements 43, 45 constituting the projection optical system PL are determined. It needs to be adjusted slightly. On the other hand, in this exposure apparatus, the projection optical system PL is housed in the lens barrel 40 having the effects described in (A) to (M). For this reason, it is possible to easily and quickly perform inspection and adjustment of the projection optical system which requires delicate adjustment; the PL and the lens elements 43, 45 constituting the same. It leads to shortening. Therefore, the throughput is improved, and the efficiency of device manufacturing can be improved. (Second embodiment)

Next, a second embodiment relating to the exposure apparatus of the present invention and a cylinder accommodating the projection optical system thereof will be described with reference to FIG. 7, focusing on parts different from the first embodiment.

That is, in the lens barrel 91 of the second embodiment, the oxygen sensor 92 is provided on a part of the plurality of window lids 70 provided on the lid 66 of the cover 42. The distal end is disposed in a space 58 between the cover 42 and the lens barrel body 41. The oxygen sensor 92 is connected to a main control system 54 that controls the entire exposure apparatus. Also, an electromagnetic opening / closing mechanism 93 connected to the main control system 54 is attached to the lid 66.

In the lens barrel 91 of the second embodiment, when the purge gas made of the inert gas is supplied into the lens barrel 91, the lid 66 is held so as not to be opened. I have. Then, when the supply of the purge gas into the lens barrel 91 is stopped in order to remove the lid 66 and open the opening 65, the oxygen sensor 92 becomes one representative of the atmosphere of the space 58. The oxygen concentration is detected as a target index. The detected value of the oxygen sensor 92 is input to the main control system 54, and the main control system 54 causes the opening / closing mechanism 93 to unlock the lid 66 when the detected value exceeds a predetermined value. Command.

Thus, in the lens barrel 91, when the oxygen concentration of the atmosphere in the space 58 between the cover 42 and the lens barrel body 41 exceeds a predetermined value, the lid 6 by the opening / closing lock mechanism 93 The lock of 6 is released, and the opening of the opening 65 is allowed. Therefore, the inspection and adjustment work of the inside of the force par 42 can be performed in an easy-to-work atmosphere.

(Modified example)

Note that the embodiment of the present invention may be modified as follows.

• In each embodiment, the cover 42 may be fixed to the lens barrel body 41. As described above, when the cover 42 is fixed to the lens barrel main body 41, the opening portion 65 is formed in the cover 42 at a position corresponding to the inspection or adjustment portion of the lens barrel main body 41. It should be good. If the lens barrel main body 41 has a plurality of inspection or adjustment locations, an opening 65 may be formed in the cover 42 according to the number of inspection or adjustment locations. Also, if multiple inspection or adjustment points are located close to each other, the correspondingly sized openings 6 5 may be formed. Note that the opening 69 described in each embodiment may be formed in the opening 65 in the modified example. Further, the opening 66 and the window 69 can also be applied with the body 66 or the window body 70 in each embodiment, respectively. In this modification, the configuration is further simplified because the support roller 82 and its peripheral configuration become unnecessary.

• In each embodiment, when the force par 42 moves slightly upward with respect to the lens barrel main body 41, the V-rings 77, 81 are not separated from the V-rings 77, 81. The displacement parts 7 7 b and 8 1 b may always be in contact with each other. In this case, the V-rings 77 and 81 desirably have an elastic force that allows the cover 42 to follow the movement with respect to the lens barrel body 41. Then, a sliding material, for example, Teflon or the like is coated so that at least one of the bent portions 75 of the V-rings 77 and 81 or the bent portion 75 of the cover 42 and the support protrusion 80 can slide easily with each other. It is desirable to keep.

In each embodiment, the holding member 47 is connected, for example, by connecting the holding member 47 and the lens barrel body 41 via a plurality of adjusting screws, and by changing the tightening amount of each adjusting screw. Alternatively, the posture of the movable lens element 43 may be adjusted. Further, for example, an intervening member such as a washer is interposed between the holding member 47 and the lens barrel main body 41, and the number, thickness, and the like of these intervening members are adjusted so that the movable lens element can be moved. 43 The posture of 3 may be adjusted.

As described above, even when the posture of the movable lens element 43 is adjusted by a mechanical adjustment mechanism, the cover 65 is positioned at a position where the opening 65 of the cover 142 corresponds to the adjustment mechanism. It is preferable to provide a concave portion 84 at a position for holding the. By doing so, the cover 42 can be held with the opening 65 corresponding to the adjustment mechanism that requires inspection and adjustment, and the posture of the movable lens element 43 can be easily adjusted. And can be done quickly. '

In each embodiment, for example, the movable lens element 43 may be driven by a motor or the like instead of the piezo element 49. In addition, a fluid pressure actuator and a magnetostrictive actuator may be used.

• In each embodiment, the cover 42 may be provided below the flange FLG (on the wafer side). In each embodiment, in a series of exposure steps, the stationary lens element 45 is placed in the lens barrel main body 41 in a stationary state in a predetermined posture in a series of exposure steps, for example, via a mechanical adjustment mechanism. It may be held at 1 and provided so that its posture can be changed as necessary. -

In each embodiment, the concave portion 84 provided in the flange FLG of the lens barrel body 41 may be omitted, and the cover 42 may be held at an arbitrary position on the outer circumference of the lens barrel body 41. . In this case, it is desirable to provide a rotation restricting member that restricts the rotation of the cover 42, for example, by pressing the support roller 82 against the flange FLG at an arbitrary position. Further, the number of the concave portions 84 may be different from that of each embodiment, that is, 2 to 11 or 13 or more.

• In each embodiment, the separation preventing mechanism 87 may be provided around the entire circumference of the flange FLG.

In each of the above embodiments, the number of the openings 65 and the number of the lids 66 may be different from those of the above embodiments, that is, 1, 2, or 4 or more. One opening 65 may be opened and closed by one or three or more lids 66. Further, a configuration may be adopted in which one opening 65 is opened by, for example, a shirt-like opening / closing member that can be wound up.

• In each embodiment, the window 69 and the window cover 70 may be omitted or the number thereof may be different from that of the above embodiment, that is, 1, 2, or 4 or more.

In each embodiment, for example, gas exhaust ports 61 are provided at both ends of the lens barrel main body 41 on the reticle side and wafer side, and the purge gas inlets 60 are provided between both ends of the lens barrel body 41. A configuration may be provided. Also, for example, the purge gas inlet 60 may be provided only at the end of the lens barrel body 41 on the wafer side or the reticle side.

In each embodiment, the cover 42 can be provided also on the lens barrel 18 that houses the illumination optical system 17.

• The exposure apparatus of the present invention is not limited to a reduction exposure type exposure apparatus, and may be, for example, a 1 × exposure type or an enlargement type exposure apparatus. Further, the projection optical system PL applied to the exposure apparatus of the present invention is not limited to a refraction type projection optical system. For example, a projection optical system such as a catadioptric type or a refraction type may be used.

In addition to manufacturing devices such as semiconductor devices, reticle or mask used in optical exposure equipment, EUV exposure equipment, X-ray exposure equipment, electron beam exposure equipment, etc. The present invention is also applicable to an exposure apparatus for transferring a circuit pattern onto a silicon wafer or the like. Here, a transmissive reticle is generally used in an exposure apparatus using DUV (deep ultraviolet) or VUV (vacuum ultraviolet) light, and a reticle substrate is made of quartz glass, fluorine-doped quartz glass, fluorite, Magnesium fluoride or quartz is used. In a proximity type X-ray exposure apparatus or an electron beam exposure apparatus, a transmission type mask (a stencil mask, a member mask) is used, and a silicon wafer is used as a mask substrate.

Of course, not only the exposure equipment used for manufacturing semiconductor devices, but also the exposure equipment used to manufacture displays including liquid crystal display elements (LCDs) 1 / The present invention can be applied to an exposure apparatus used for manufacturing a head or the like and transferring a device pattern to a ceramic wafer or the like, an exposure apparatus used for manufacturing an imaging device such as a CCD, or the like.

Further, the present invention can be applied to a step-and-repeat type batch exposure type exposure apparatus in which a pattern of a mask is transferred to a substrate while the mask and the substrate are stationary, and the substrate is sequentially moved in steps. it can.

• As the light source of the exposure apparatus, for example, g-line (L = 436nm), i-line (λ = 365nm), Kr2 laser (λ = 146nm), Ar2 laser (e = 126nm), etc. You can use it. In addition, a single-wavelength laser beam in the infrared, visible or oscillating range emitted from a DFB semiconductor laser or fiber laser is amplified by, for example, a erbium (or both erbium and ytterbium) -doped fiber amplifier, and the nonlinear optics is amplified. Harmonics obtained by converting the wavelength of a crystal into ultraviolet light may be used.

The exposure apparatus of each embodiment is manufactured, for example, as follows.

That is, first, a plurality of lens elements 43 and 45, a cover glass 46, and the like constituting the projection optical system PL are housed in the lens barrels 40 and 91 of the present embodiment. In addition, illumination composed of optical elements such as a plurality of lenses 12, 13a, 13b, 16 and a mirror 15 The optical system 17 is housed in the lens barrel 18. Then, the illumination optical system 17 and the projection optical system PL are incorporated into the exposure apparatus main body to perform optical adjustment.

Next, a wafer stage WST (including a reticle stage RST in the case of a scan type exposure apparatus) including a number of mechanical parts is attached to the exposure apparatus main body, and wiring is connected. Then, after connecting the piping of the purge gas supply system that supplies the purge gas into the optical path of the exposure light EL, general adjustments (electrical adjustment, operation check, etc.) are performed.

Here, the components constituting the lens barrel 40 are assembled after removing impurities such as processing oil and metal substances by ultrasonic cleaning or the like. It is desirable that the exposure apparatus be manufactured in a clean room in which the temperature, humidity and pressure are controlled and the degree of cleanness is adjusted.

Next, an embodiment of a device manufacturing method using the above-described exposure apparatus in a lithography process will be described.

FIG. 8 is a view showing a flowchart of a manufacturing example of a device (a semiconductor element such as IC or LSI, a liquid crystal display element, an image pickup element (CCD or the like), a thin-film magnetic head, a micromachine, or the like).

As shown in FIG. 8, first, in step S101 (design step), a device (microdevice) function * performance design (for example, a circuit configuration of a semiconductor device) is performed to realize the function. A pattern for the design. Subsequently, in step S102 (mask manufacturing step), a mask (such as a reticle R) on which the designed circuit pattern is formed is manufactured. On the other hand, in step S103 (substrate manufacturing step), a substrate (e.g., Ueno or W when a silicon material is used) is manufactured using a material such as silicon or a glass plate.

Next, in step S104 (substrate processing step), using the mask and substrate prepared in steps S101 to S103, as described later, actual Is formed. Next, in step S105 (device assembling step), device assembly is performed using the substrate processed in step S104. Step S105 includes processes such as a dicing process, a bonding process, and a packaging process (such as chip encapsulation) as necessary. Finally, in step S106 (inspection step), inspections such as an operation confirmation test and a durability test of the depises produced in step S105 are performed. After these steps, the device is completed and shipped.

FIG. 9 is a diagram showing an example of a detailed opening of step S104 in FIG. 8 in the case of a semiconductor device. In FIG. 9, in step S111 (oxidation step), the surface of the wafer W is oxidized. In step S112 (CVD step), an insulating film is formed on the surface of the wafer W. In step S113 (electrode formation step), an electrode is formed on the wafer W by vapor deposition. In step S114 (ion implantation step), ions are implanted in Ueno and W. Each of the above steps S111 to S114 constitutes a pre-processing step of each stage of wafer processing, and is selected and executed according to necessary processing in each stage.

In each stage of the wafer process, when the above-mentioned pre-processing step is completed, the post-processing step is executed as follows. In the post-processing process, first, in step SI15 (resist formation step), a photosensitive agent is applied to the wafer W. Subsequently, in step S116 (exposure step), the circuit pattern of the mask (reticle R) is transferred onto the wafer W by the lithography system (exposure apparatus) described above. '

Next, in Step S117 (development step), the exposed wafer W is developed, and in Step S118 (etching step), the exposed members other than the portion where the resist remains are etched. Remove it. Then, step S 1 1

In 9 (resist removing step), the unnecessary resist after etching is removed.

By repeatedly performing these pre-processing steps and post-processing steps, multiple circuit patterns are formed on the wafer W.

According to the device manufacturing method of the present embodiment described above, in the exposure step (step S116), the above-described exposure apparatus having the effect (N) is used, and the inside of the lens barrels 40 and 91 is used. Inspection and adjustment can be performed easily and quickly, and the downtime of the exposure apparatus can be shortened, and the efficiency of device manufacturing can be improved. Moreover, by adjusting the components such as the movable lens element 43 in the lens barrels 40 and 91, the exposure Light quantity control can be performed with high accuracy. Therefore, the exposure accuracy can be improved, and a highly integrated device having a minimum line width of about 0.1 m can be manufactured at a high yield.

It will be apparent to one skilled in the art that the present invention may be embodied in other alternatives without departing from the spirit and scope of the invention.

Claims

The scope of the claims

1. A lens barrel including a housing for accommodating a plurality of optical elements, and a force par covering at least a part of an outer peripheral surface of the housing.

The lens barrel, wherein the force par includes at least one opening and an opening / closing member that opens and closes the at least one opening.

2. The lens barrel according to claim 1, further comprising a support mechanism for supporting the cover relatively rotatably with respect to the linear body.

3. The lens barrel according to claim 2, wherein the support mechanism includes a positioning mechanism in which the opening positions the cover at a predetermined position in a circumferential direction of the housing. ■

4. The lens barrel according to claim 3, wherein the predetermined position includes a position where the opening corresponds to an arrangement of a component mounted on the housing.

5. The lens barrel according to claim 4, wherein the component includes an adjustment mechanism that adjusts a posture of the optical element.

6. The lens barrel according to claim 5, wherein the adjustment mechanism includes a drive mechanism that drives the optical element.

7Connect one end of a wire that supplies at least one of power and a signal from a supply source to the drive mechanism, connect a connector to the other end of the wire, and connect the connector with the cover in the housing. 7. The lens barrel according to claim 6, wherein the lens barrel is provided at a portion different from a portion to be covered, and the drive mechanism and the supply source are connected via the connector.

8. The lens barrel according to any one of claims 2 to 7, wherein the cover is provided with a plurality of the openings at predetermined intervals in a circumferential direction thereof.

9. A seal member is provided between the housing and the cover to partition the inside of the power airtight from the outside air, and the support mechanism is provided outside the seal member with respect to the housing. The lens barrel according to any one of claims 2 to 8, wherein the lens barrel is arranged.

10. A seal member is provided between the housing and the cover to partition the inside of the cover airtight from outside air, and the cover and the housing are arranged when the cover is arranged at a predetermined position. Are joined via the seal member, and the seal member is separated from at least one of the cover and the housing when the force par becomes rotatable. The lens barrel according to any one of claims 2 to 8, wherein

11. An opening / closing mechanism for allowing the opening / closing operation of the opening / closing member when the inside of the cover reaches a predetermined atmosphere, any one of claims 1 to 10 characterized by the above-mentioned. The lens barrel according to one.

1 2. In an exposure apparatus that transfers the image of the pattern formed on the mask onto the substrate,

Claims :! An exposure apparatus comprising the lens barrel according to any one of (1) to (11).

13. A projection optical system for projecting an image of the pattern on a substrate, wherein the projection optical system is constituted by the lens barrel according to any one of claims 1 to L1. 13. The exposure apparatus according to claim 12, wherein

1 4. In a method of manufacturing a device including a lithographic process, 15. A method for manufacturing a device, comprising performing exposure using the exposure apparatus according to claim 12 or 13 in the lithographic process.