WO2003010113A1 - Wear-resistant silicon nitride member and method for manufacture thereof - Google Patents
Wear-resistant silicon nitride member and method for manufacture thereof Download PDFInfo
- Publication number
- WO2003010113A1 WO2003010113A1 PCT/JP2002/007435 JP0207435W WO03010113A1 WO 2003010113 A1 WO2003010113 A1 WO 2003010113A1 JP 0207435 W JP0207435 W JP 0207435W WO 03010113 A1 WO03010113 A1 WO 03010113A1
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- WO
- WIPO (PCT)
- Prior art keywords
- silicon nitride
- wear
- nitride member
- manufacture
- resistant silicon
- Prior art date
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- 229910052581 Si3N4 Inorganic materials 0.000 title abstract 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 title abstract 4
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 title abstract 2
- 229910052596 spinel Inorganic materials 0.000 abstract 3
- 229910026161 MgAl2O4 Inorganic materials 0.000 abstract 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
- 229910052804 chromium Inorganic materials 0.000 abstract 1
- 229910052593 corundum Inorganic materials 0.000 abstract 1
- 229910052735 hafnium Inorganic materials 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 229910052750 molybdenum Inorganic materials 0.000 abstract 1
- 229910052758 niobium Inorganic materials 0.000 abstract 1
- 238000013001 point bending Methods 0.000 abstract 1
- 229910052761 rare earth metal Inorganic materials 0.000 abstract 1
- 238000005096 rolling process Methods 0.000 abstract 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 abstract 1
- 229910010271 silicon carbide Inorganic materials 0.000 abstract 1
- 238000005245 sintering Methods 0.000 abstract 1
- 239000011029 spinel Substances 0.000 abstract 1
- 229910052715 tantalum Inorganic materials 0.000 abstract 1
- 229910052719 titanium Inorganic materials 0.000 abstract 1
- 229910052721 tungsten Inorganic materials 0.000 abstract 1
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 1
- 229910052726 zirconium Inorganic materials 0.000 abstract 1
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
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- C04B2235/77—Density
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
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- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/484,717 US7056850B2 (en) | 2001-07-24 | 2002-07-23 | Wear-resistant silicon nitride member and method of manufacture thereof |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001-223534 | 2001-07-24 | ||
| JP2001223534A JP2003034581A (ja) | 2001-07-24 | 2001-07-24 | 窒化けい素製耐摩耗性部材およびその製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2003010113A1 true WO2003010113A1 (en) | 2003-02-06 |
Family
ID=19056862
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2002/007435 WO2003010113A1 (en) | 2001-07-24 | 2002-07-23 | Wear-resistant silicon nitride member and method for manufacture thereof |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US7056850B2 (ja) |
| JP (1) | JP2003034581A (ja) |
| CN (1) | CN100473627C (ja) |
| WO (1) | WO2003010113A1 (ja) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7749931B2 (en) * | 2006-02-13 | 2010-07-06 | Fujifilm Corporation | Ceramic optical parts and production methods thereof |
| CN105319222A (zh) * | 2014-06-06 | 2016-02-10 | 上海材料研究所 | 一种基于晶界相评价氮化硅滚动接触疲劳性能的方法 |
| CN109970454A (zh) * | 2019-03-20 | 2019-07-05 | 广东工业大学 | 一种过渡金属氧化物抑制氮化硅相变的方法及其制得的氮化硅陶瓷 |
| WO2024043230A1 (ja) * | 2022-08-24 | 2024-02-29 | Agc株式会社 | 窒化ケイ素焼結体及び窒化ケイ素焼結体の製造方法 |
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| JP5002155B2 (ja) * | 2003-09-25 | 2012-08-15 | 株式会社東芝 | 窒化けい素製耐摩耗性部材およびその製造方法 |
| JP4939736B2 (ja) * | 2004-07-22 | 2012-05-30 | 株式会社東芝 | 窒化けい素焼結体の製造方法 |
| JP4693374B2 (ja) * | 2004-07-22 | 2011-06-01 | 株式会社東芝 | 窒化けい素焼結体の製造方法 |
| CN100355701C (zh) * | 2006-02-24 | 2007-12-19 | 中国科学院上海硅酸盐研究所 | 一种高热导氮化硅陶瓷的制备方法 |
| WO2008032427A1 (fr) | 2006-09-13 | 2008-03-20 | Kabushiki Kaisha Toshiba | Élément coulissant et palier utilisant celui-ci |
| EP2522644B1 (en) | 2010-01-07 | 2019-01-09 | Nikkato Corporation | Sintered silicon nitride ceramic |
| JP5945382B2 (ja) * | 2010-01-07 | 2016-07-05 | 株式会社ニッカトー | 窒化珪素質焼結体および耐摩耗部材 |
| EP2537819B1 (en) * | 2010-02-16 | 2018-05-23 | Kabushiki Kaisha Toshiba | Wear-resistant member and method for producing same |
| EP2760807B1 (en) * | 2011-09-30 | 2019-08-21 | Saint-Gobain Ceramics & Plastics Inc. | Composite silicon nitride body |
| DE102012207803A1 (de) * | 2012-05-10 | 2013-11-28 | Schaeffler Technologies AG & Co. KG | Siliziumnitridkeramik und Verfahren zu deren Herstellung |
| WO2014069268A1 (ja) | 2012-10-30 | 2014-05-08 | 株式会社東芝 | 窒化珪素焼結体およびそれを用いた耐磨耗性部材 |
| JP6416088B2 (ja) | 2013-06-13 | 2018-10-31 | 株式会社東芝 | 窒化珪素製耐摩耗性部材および窒化珪素焼結体の製造方法 |
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| CN105801128A (zh) * | 2016-06-02 | 2016-07-27 | 吴依妮 | 一种氮化硅陶瓷及其制备方法 |
| CN109562485B (zh) * | 2016-08-09 | 2022-04-15 | 国立大学法人大阪大学 | 搅拌摩擦焊用工具构件和使用该工具构件的搅拌摩擦焊装置以及搅拌摩擦焊方法 |
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| CN110105072A (zh) * | 2019-06-04 | 2019-08-09 | 宁波市大工新材料科技有限公司 | 一种高硬度氮化硅材料的制备方法 |
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| CN111362704A (zh) * | 2020-03-19 | 2020-07-03 | 西安澳秦新材料有限公司 | 一种高热导率氮化硅陶瓷及其制备方法 |
| CN112645714B (zh) * | 2020-12-28 | 2022-04-15 | 中材高新氮化物陶瓷有限公司 | 一种氮化硅陶瓷脱水元件及其制备方法和应用 |
| WO2024185613A1 (ja) * | 2023-03-03 | 2024-09-12 | 株式会社 東芝 | 窒化珪素焼結体、耐摩耗性部材、ベアリングボールおよびベアリング |
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| JPH02221160A (ja) * | 1989-02-23 | 1990-09-04 | Japan Metals & Chem Co Ltd | 高密度窒化けい素質焼結体の製造方法 |
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| US5187127A (en) * | 1987-09-18 | 1993-02-16 | Kabushiki Kaisha Toshiba | Fiber-reinforced silicon nitride ceramic |
| JPH0920563A (ja) * | 1995-06-30 | 1997-01-21 | Toshiba Corp | 窒化けい素焼結体 |
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| EP1201623B1 (en) | 2000-10-27 | 2016-08-31 | Kabushiki Kaisha Toshiba | Silicon nitride ceramic substrate and silicon nitride ceramic circuit board using the substrate |
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2001
- 2001-07-24 JP JP2001223534A patent/JP2003034581A/ja active Pending
-
2002
- 2002-07-23 US US10/484,717 patent/US7056850B2/en not_active Expired - Lifetime
- 2002-07-23 CN CNB028149858A patent/CN100473627C/zh not_active Expired - Lifetime
- 2002-07-23 WO PCT/JP2002/007435 patent/WO2003010113A1/ja active Search and Examination
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| JPS6335454A (ja) * | 1986-07-30 | 1988-02-16 | 株式会社東芝 | 窒化ケイ素系セラミツクス及びその製造方法 |
| JPS63134567A (ja) * | 1986-11-21 | 1988-06-07 | 株式会社豊田中央研究所 | セラミツクス複合体 |
| US5187127A (en) * | 1987-09-18 | 1993-02-16 | Kabushiki Kaisha Toshiba | Fiber-reinforced silicon nitride ceramic |
| JPH02221160A (ja) * | 1989-02-23 | 1990-09-04 | Japan Metals & Chem Co Ltd | 高密度窒化けい素質焼結体の製造方法 |
| JPH04260669A (ja) * | 1991-02-15 | 1992-09-16 | Toyota Motor Corp | 炭化珪素含有窒化珪素複合体の製造方法 |
| JPH0920563A (ja) * | 1995-06-30 | 1997-01-21 | Toshiba Corp | 窒化けい素焼結体 |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7749931B2 (en) * | 2006-02-13 | 2010-07-06 | Fujifilm Corporation | Ceramic optical parts and production methods thereof |
| CN105319222A (zh) * | 2014-06-06 | 2016-02-10 | 上海材料研究所 | 一种基于晶界相评价氮化硅滚动接触疲劳性能的方法 |
| CN109970454A (zh) * | 2019-03-20 | 2019-07-05 | 广东工业大学 | 一种过渡金属氧化物抑制氮化硅相变的方法及其制得的氮化硅陶瓷 |
| WO2024043230A1 (ja) * | 2022-08-24 | 2024-02-29 | Agc株式会社 | 窒化ケイ素焼結体及び窒化ケイ素焼結体の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20040191535A1 (en) | 2004-09-30 |
| CN100473627C (zh) | 2009-04-01 |
| JP2003034581A (ja) | 2003-02-07 |
| CN1537086A (zh) | 2004-10-13 |
| US7056850B2 (en) | 2006-06-06 |
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