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WO2003032351A3 - Method and device for aligning a charged particle beam column - Google Patents

Method and device for aligning a charged particle beam column Download PDF

Info

Publication number
WO2003032351A3
WO2003032351A3 PCT/IB2002/005792 IB0205792W WO03032351A3 WO 2003032351 A3 WO2003032351 A3 WO 2003032351A3 IB 0205792 W IB0205792 W IB 0205792W WO 03032351 A3 WO03032351 A3 WO 03032351A3
Authority
WO
WIPO (PCT)
Prior art keywords
aligning
charged particle
particle beam
beam column
stigmator
Prior art date
Application number
PCT/IB2002/005792
Other languages
French (fr)
Other versions
WO2003032351A2 (en
Inventor
Asher Pearl
Original Assignee
Applied Materials Isreal Ltd
Asher Pearl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP02016839A external-priority patent/EP1302971B1/en
Application filed by Applied Materials Isreal Ltd, Asher Pearl filed Critical Applied Materials Isreal Ltd
Priority to US10/492,257 priority Critical patent/US7335893B2/en
Priority to JP2003535224A priority patent/JP3959063B2/en
Priority to AU2002358245A priority patent/AU2002358245A1/en
Publication of WO2003032351A2 publication Critical patent/WO2003032351A2/en
Publication of WO2003032351A3 publication Critical patent/WO2003032351A3/en
Priority to US11/689,870 priority patent/US7385205B2/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H01J37/263—Contrast, resolution or power of penetration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/045—Diaphragms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1501—Beam alignment means or procedures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1532—Astigmatism
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/21—Focus adjustment
    • H01J2237/216—Automatic focusing methods
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/22—Treatment of data
    • H01J2237/221—Image processing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

The invention provides a method for automatically aligning a beam of charged particles with an aperture. Thereby, a defocusing is introduced and a signal calculated based on an image shift is applied to a deflection unit. Further, a method for correction of astigmatism is provided. Thereby, the sharpness is evaluated for a set of frames generated whilst varying the signals to a stigmator.
PCT/IB2002/005792 2001-10-10 2002-10-04 Method and device for aligning a charged particle beam column WO2003032351A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
US10/492,257 US7335893B2 (en) 2001-10-10 2002-10-04 Method and device for aligning a charged particle beam column
JP2003535224A JP3959063B2 (en) 2001-10-10 2002-10-04 Alignment method and apparatus for charged particle beam column
AU2002358245A AU2002358245A1 (en) 2001-10-10 2002-10-04 Method and device for aligning a charged particle beam column
US11/689,870 US7385205B2 (en) 2001-10-10 2007-03-22 Method and device for aligning a charged particle beam column

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US32845201P 2001-10-10 2001-10-10
US60/328,452 2001-10-10
EP02016839A EP1302971B1 (en) 2001-10-10 2002-07-29 Method and device for the automatic generation of images adapted to align a charged particle beam column
EP02016839.9 2002-07-29

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US11/689,870 Division US7385205B2 (en) 2001-10-10 2007-03-22 Method and device for aligning a charged particle beam column

Publications (2)

Publication Number Publication Date
WO2003032351A2 WO2003032351A2 (en) 2003-04-17
WO2003032351A3 true WO2003032351A3 (en) 2003-10-02

Family

ID=26077582

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IB2002/005792 WO2003032351A2 (en) 2001-10-10 2002-10-04 Method and device for aligning a charged particle beam column

Country Status (4)

Country Link
JP (1) JP3959063B2 (en)
CN (1) CN100341106C (en)
AU (1) AU2002358245A1 (en)
WO (1) WO2003032351A2 (en)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4652830B2 (en) * 2005-01-26 2011-03-16 キヤノン株式会社 Aberration adjustment method, device manufacturing method, and charged particle beam exposure apparatus
JP4708854B2 (en) 2005-05-13 2011-06-22 株式会社日立ハイテクノロジーズ Charged particle beam equipment
EP1783811A3 (en) 2005-11-02 2008-02-27 FEI Company Corrector for the correction of chromatic aberrations in a particle-optical apparatus
JP4538472B2 (en) * 2007-03-15 2010-09-08 株式会社日立ハイテクノロジーズ Image forming method and electron microscope
EP2091062A1 (en) 2008-02-13 2009-08-19 FEI Company TEM with aberration corrector and phase plate
EP2131385A1 (en) 2008-06-05 2009-12-09 FEI Company Hybrid phase plate
EP2166557A1 (en) * 2008-09-22 2010-03-24 FEI Company Method for correcting distortions in a particle-optical apparatus
EP2197018A1 (en) 2008-12-12 2010-06-16 FEI Company Method for determining distortions in a particle-optical apparatus
EP2325862A1 (en) 2009-11-18 2011-05-25 Fei Company Corrector for axial aberrations of a particle-optical lens
EP2511936B1 (en) 2011-04-13 2013-10-02 Fei Company Distortion free stigmation of a TEM
DE102012102608B4 (en) * 2012-03-27 2016-07-21 Aixacct Systems Gmbh Method for determining beam parameters of a charged particle beam, measuring device and charged particle beam device
CN103456590B (en) * 2012-05-31 2016-08-24 睿励科学仪器（上海）有限公司 Scanning electron microscope has alignment device and the method thereof of multi-stage mechanical aligning guide
RU2627732C2 (en) * 2012-06-01 2017-08-11 Сименс Акциенгезелльшафт Tilting plate and a device for deviation of charged particles
EP3016130A1 (en) * 2014-10-28 2016-05-04 Fei Company Composite scan path in a charged particle microscope
CN108463869B (en) * 2016-01-29 2020-04-24 株式会社日立高新技术 Charged particle beam device and optical axis adjusting method thereof
US10790114B2 (en) * 2017-06-29 2020-09-29 Kla-Tencor Corporation Scanning electron microscope objective lens calibration using X-Y voltages iteratively determined from images obtained using said voltages
JP6863208B2 (en) * 2017-09-29 2021-04-21 株式会社ニューフレアテクノロジー Multi-charged particle beam drawing device and multi-charged particle beam drawing method
EP3651182A1 (en) * 2018-11-12 2020-05-13 FEI Company Charged particle microscope for examining a specimen, and method of determining an aberration of said charged particle microscope
US10923318B2 (en) * 2018-12-20 2021-02-16 Fei Company Optical alignment correction using convolutional neural network evaluation of a beam image
DE102019204575B3 (en) * 2019-04-01 2020-08-06 Carl Zeiss Smt Gmbh Method, device and computer program for determining a wavefront of a mass-laden particle beam
JP7391735B2 (en) * 2019-09-25 2023-12-05 株式会社日立ハイテクサイエンス Charged particle beam device
DE102020211900A1 (en) * 2019-09-25 2021-03-25 Hitachi High-Tech Science Corporation CARRIER JET DEVICE
JP7413105B2 (en) * 2019-09-25 2024-01-15 株式会社日立ハイテクサイエンス Charged particle beam device
US11361951B2 (en) * 2019-10-03 2022-06-14 Kla Corporation System and method for photomultiplier tube image correction
US12237142B2 (en) 2022-06-16 2025-02-25 Fei Company Methods for determining the virtual source location of a liquid metal ion source

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4162403A (en) * 1978-07-26 1979-07-24 Advanced Metals Research Corp. Method and means for compensating for charge carrier beam astigmatism
US4451737A (en) * 1981-06-24 1984-05-29 Hitachi, Ltd. Electron beam control device for electron microscopes
US5627373A (en) * 1996-06-17 1997-05-06 Hewlett-Packard Company Automatic electron beam alignment and astigmatism correction in scanning electron microscope

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4162403A (en) * 1978-07-26 1979-07-24 Advanced Metals Research Corp. Method and means for compensating for charge carrier beam astigmatism
US4451737A (en) * 1981-06-24 1984-05-29 Hitachi, Ltd. Electron beam control device for electron microscopes
US5627373A (en) * 1996-06-17 1997-05-06 Hewlett-Packard Company Automatic electron beam alignment and astigmatism correction in scanning electron microscope

Also Published As

Publication number Publication date
WO2003032351A2 (en) 2003-04-17
JP3959063B2 (en) 2007-08-15
CN1589490A (en) 2005-03-02
AU2002358245A1 (en) 2003-04-22
CN100341106C (en) 2007-10-03
JP2005505899A (en) 2005-02-24

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