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WO2003036361A1 - Systeme optique de projection et appareil d'exposition possedant ledit systeme - Google Patents

Systeme optique de projection et appareil d'exposition possedant ledit systeme Download PDF

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Publication number
WO2003036361A1
WO2003036361A1 PCT/JP2002/010454 JP0210454W WO03036361A1 WO 2003036361 A1 WO2003036361 A1 WO 2003036361A1 JP 0210454 W JP0210454 W JP 0210454W WO 03036361 A1 WO03036361 A1 WO 03036361A1
Authority
WO
WIPO (PCT)
Prior art keywords
optical system
projection optical
transparent
crystal
transparent members
Prior art date
Application number
PCT/JP2002/010454
Other languages
English (en)
Japanese (ja)
Inventor
Yasuhiro Omura
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Priority to JP2003538800A priority Critical patent/JPWO2003036361A1/ja
Publication of WO2003036361A1 publication Critical patent/WO2003036361A1/fr

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

Système optique de projection qui présente de bonnes performances optiques sans être considérablement touché par la birégringence, bien que la matière optique utilisée possède une biréfringence intrinsèque. Ledit système forme l'image sur une première surface (R) et sur une seconde surface (W). Parmi les éléments transparents constituant ledit système, 90 % ou plus sont constitués de cristaux de système cubique. Parmi tous les éléments transparents, 70 % ou plus satisfont à la condition Pn/En<0,7. Dans cette formule, Pn est le diamètre du faisceau de lumière provenant d'un point sur la première surface et étant incident sur chaque surface de chaque élément transparent cristallin, et En est le diamètre effectif de chaque élément transparent cristallin. En outre, 70 % ou plus des éléments transparents sont disposés de manière telle que l'axe optique de chaque élément transparent correspond pratiquement à l'axe cristallin [100].
PCT/JP2002/010454 2001-10-19 2002-10-08 Systeme optique de projection et appareil d'exposition possedant ledit systeme WO2003036361A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003538800A JPWO2003036361A1 (ja) 2001-10-19 2002-10-08 投影光学系および該投影光学系を備えた露光装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001321463 2001-10-19
JP2001-321463 2001-10-19

Publications (1)

Publication Number Publication Date
WO2003036361A1 true WO2003036361A1 (fr) 2003-05-01

Family

ID=19138675

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2002/010454 WO2003036361A1 (fr) 2001-10-19 2002-10-08 Systeme optique de projection et appareil d'exposition possedant ledit systeme

Country Status (3)

Country Link
JP (1) JPWO2003036361A1 (fr)
TW (1) TW559885B (fr)
WO (1) WO2003036361A1 (fr)

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004025349A1 (fr) * 2002-09-09 2004-03-25 Carl Zeiss Smt Ag Objectif de projection catadioptrique et procede de compensation de la birefringence intrinseque dans un tel objectif
US6995930B2 (en) 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
US7006304B2 (en) 2001-05-22 2006-02-28 Carl Zeiss Smt Ag Catadioptric reduction lens
US7190527B2 (en) 2002-03-01 2007-03-13 Carl Zeiss Smt Ag Refractive projection objective
US7239450B2 (en) 2004-11-22 2007-07-03 Carl Zeiss Smt Ag Method of determining lens materials for a projection exposure apparatus
US7463422B2 (en) 2004-01-14 2008-12-09 Carl Zeiss Smt Ag Projection exposure apparatus
US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
USRE40743E1 (en) 2000-02-05 2009-06-16 Carl Zeiss Smt Ag Projection exposure system having a reflective reticle
US7697198B2 (en) 2004-10-15 2010-04-13 Carl Zeiss Smt Ag Catadioptric projection objective
EP2189848A2 (fr) 2004-07-14 2010-05-26 Carl Zeiss SMT AG Objectif de projection catadioptrique
US7738188B2 (en) 2006-03-28 2010-06-15 Carl Zeiss Smt Ag Projection objective and projection exposure apparatus including the same
US7848016B2 (en) 2006-05-05 2010-12-07 Carl Zeiss Smt Ag High-NA projection objective
US7920338B2 (en) 2006-03-28 2011-04-05 Carl Zeiss Smt Gmbh Reduction projection objective and projection exposure apparatus including the same
US8107162B2 (en) 2004-05-17 2012-01-31 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
JP2012185503A (ja) * 2009-08-13 2012-09-27 Carl Zeiss Smt Gmbh 反射屈折投影対物系
US8908269B2 (en) 2004-01-14 2014-12-09 Carl Zeiss Smt Gmbh Immersion catadioptric projection objective having two intermediate images
US9772478B2 (en) 2004-01-14 2017-09-26 Carl Zeiss Smt Gmbh Catadioptric projection objective with parallel, offset optical axes

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0772393A (ja) * 1993-09-06 1995-03-17 Nikon Corp 反射縮小投影光学系
JPH1121197A (ja) * 1997-07-02 1999-01-26 Canon Inc 結晶成長用の種結晶及びフッ化物結晶
EP0942297A2 (fr) * 1998-03-12 1999-09-15 Nikon Corporation Elément optique formé d'un monocristal de fluorure et procédé de fabrication de cet élément
JP2000128696A (ja) * 1998-10-16 2000-05-09 Nikon Corp フッ化物単結晶からなる光学素子作製用素材とその製造方法
EP1063684A1 (fr) * 1999-01-06 2000-12-27 Nikon Corporation Systeme optique de projection, procede de fabrication associe et appareil d'exposition par projection utilisant ce systeme
EP1114802A1 (fr) * 1999-04-21 2001-07-11 Nikon Corporation Element en verre de silice, procede de production et aligneur de projection l'utilisant
EP1115019A2 (fr) * 1999-12-29 2001-07-11 Carl Zeiss Objectif de projection avec des éléments asphériques

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0772393A (ja) * 1993-09-06 1995-03-17 Nikon Corp 反射縮小投影光学系
JPH1121197A (ja) * 1997-07-02 1999-01-26 Canon Inc 結晶成長用の種結晶及びフッ化物結晶
EP0942297A2 (fr) * 1998-03-12 1999-09-15 Nikon Corporation Elément optique formé d'un monocristal de fluorure et procédé de fabrication de cet élément
JP2000128696A (ja) * 1998-10-16 2000-05-09 Nikon Corp フッ化物単結晶からなる光学素子作製用素材とその製造方法
EP1063684A1 (fr) * 1999-01-06 2000-12-27 Nikon Corporation Systeme optique de projection, procede de fabrication associe et appareil d'exposition par projection utilisant ce systeme
EP1114802A1 (fr) * 1999-04-21 2001-07-11 Nikon Corporation Element en verre de silice, procede de production et aligneur de projection l'utilisant
EP1115019A2 (fr) * 1999-12-29 2001-07-11 Carl Zeiss Objectif de projection avec des éléments asphériques

Cited By (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6995930B2 (en) 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
US7426082B2 (en) 1999-12-29 2008-09-16 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
USRE40743E1 (en) 2000-02-05 2009-06-16 Carl Zeiss Smt Ag Projection exposure system having a reflective reticle
US7006304B2 (en) 2001-05-22 2006-02-28 Carl Zeiss Smt Ag Catadioptric reduction lens
US7190527B2 (en) 2002-03-01 2007-03-13 Carl Zeiss Smt Ag Refractive projection objective
US7382540B2 (en) 2002-03-01 2008-06-03 Carl Zeiss Smt Ag Refractive projection objective
WO2004025349A1 (fr) * 2002-09-09 2004-03-25 Carl Zeiss Smt Ag Objectif de projection catadioptrique et procede de compensation de la birefringence intrinseque dans un tel objectif
US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
US8908269B2 (en) 2004-01-14 2014-12-09 Carl Zeiss Smt Gmbh Immersion catadioptric projection objective having two intermediate images
US7463422B2 (en) 2004-01-14 2008-12-09 Carl Zeiss Smt Ag Projection exposure apparatus
US9772478B2 (en) 2004-01-14 2017-09-26 Carl Zeiss Smt Gmbh Catadioptric projection objective with parallel, offset optical axes
US9726979B2 (en) 2004-05-17 2017-08-08 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
US9134618B2 (en) 2004-05-17 2015-09-15 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
US8107162B2 (en) 2004-05-17 2012-01-31 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
US8913316B2 (en) 2004-05-17 2014-12-16 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
EP2189848A2 (fr) 2004-07-14 2010-05-26 Carl Zeiss SMT AG Objectif de projection catadioptrique
US7697198B2 (en) 2004-10-15 2010-04-13 Carl Zeiss Smt Ag Catadioptric projection objective
US7239450B2 (en) 2004-11-22 2007-07-03 Carl Zeiss Smt Ag Method of determining lens materials for a projection exposure apparatus
US7738188B2 (en) 2006-03-28 2010-06-15 Carl Zeiss Smt Ag Projection objective and projection exposure apparatus including the same
US7965453B2 (en) 2006-03-28 2011-06-21 Carl Zeiss Smt Gmbh Projection objective and projection exposure apparatus including the same
US7920338B2 (en) 2006-03-28 2011-04-05 Carl Zeiss Smt Gmbh Reduction projection objective and projection exposure apparatus including the same
US7848016B2 (en) 2006-05-05 2010-12-07 Carl Zeiss Smt Ag High-NA projection objective
US8873137B2 (en) 2009-08-13 2014-10-28 Carl Zeiss Smt Gmbh Catadioptric projection objective
JP2012185503A (ja) * 2009-08-13 2012-09-27 Carl Zeiss Smt Gmbh 反射屈折投影対物系
US9279969B2 (en) 2009-08-13 2016-03-08 Carl Zeiss Smt Gmbh Catadioptric projection objective
US9726870B2 (en) 2009-08-13 2017-08-08 Carl Zeiss Smt Gmbh Catadioptric projection objective
US10042146B2 (en) 2009-08-13 2018-08-07 Carl Zeiss Smt Gmbh Catadioptric projection objective

Also Published As

Publication number Publication date
JPWO2003036361A1 (ja) 2005-02-17
TW559885B (en) 2003-11-01

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