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WO2007078085A1 - Methof for controlling synchrotron grazing incidence x-ray scattering apparatus - Google Patents

Methof for controlling synchrotron grazing incidence x-ray scattering apparatus Download PDF

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Publication number
WO2007078085A1
WO2007078085A1 PCT/KR2006/005768 KR2006005768W WO2007078085A1 WO 2007078085 A1 WO2007078085 A1 WO 2007078085A1 KR 2006005768 W KR2006005768 W KR 2006005768W WO 2007078085 A1 WO2007078085 A1 WO 2007078085A1
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WO
WIPO (PCT)
Prior art keywords
sample
control section
temperature
synchrotron
goniometer
Prior art date
Application number
PCT/KR2006/005768
Other languages
French (fr)
Inventor
Moon-Hor Ree
Byeong-Du Lee
Jin-Hwan Yoon
Kyeong-Sik Jin
Kyu-Young Hoe
Sang-Woo Jin
Original Assignee
Postech Academy-Industry Foundation
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Publication date
Application filed by Postech Academy-Industry Foundation filed Critical Postech Academy-Industry Foundation
Publication of WO2007078085A1 publication Critical patent/WO2007078085A1/en

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
    • G01N23/20016—Goniometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/20—Sources of radiation
    • G01N2223/203—Sources of radiation synchrotron
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/30—Accessories, mechanical or electrical features
    • G01N2223/306—Accessories, mechanical or electrical features computer control

Definitions

  • the present invention relates to a method for controlling a synchrotron grazing incidence X-ray scattering apparatus, and more particularly, to a method for controlling a synchrotron grazing incidence X-ray scattering apparatus that is capable of accurately analyzing a structure of a thin film sample.
  • Synchrotron radiation sources especially X-ray beam, provide information on microstructure that is not obtained by visible light, so that an X-ray scattering method is one of the major tools for analysis of polymer structure.
  • the previous transmission X-ray scattering method is not suitable for structural analysis. It is difficult to obtain a strong scattering intensity due to the small scattering volume of the thin film, and in addition, an X-ray having enough energy to penetrate a substrate as well as the thin film is required due to the thin film being formed on the substrate that is opaque to the X-ray.
  • the present invention in compliance with the above-mentioned requirement is to provide a method for controlling a synchrotron grazing incidence X-ray scattering apparatus in which the incidence angle of an X-ray is precisely controlled in real time.
  • the present invention further provides a method for controlling a synchrotron grazing incidence X-ray scattering apparatus in which the structural data of the temperature varying thin film sample is obtained by means of controlling the temperature of the sample in real time with ease.
  • the present invention provides a method for controlling a synchrotron grazing incidence X-ray scattering apparatus including a sample mounting section having both a sample stage where the sample is seated and a sample chamber where the sample stage is located; a sample control section having both a goniometer drive that rotates the sample mounting section and a stepping motor drive that moves the sample mounting section; a temperature control section that controls the temperature of the sample mounting section; and a main control section that conveys control commands to both the sample control section and the temperature control section, and restores and displays the control commands and result thereof, the method comprising initializing the sample control section and the temperature control section; inputting assigned values and control commands, that are imposed on the sample control section and the temperature control section; aligning the sample chamber by driving the stepping motor drive in compliance with the assigned values and the control commands; compensating for and adjusting the incident angle of synchrotron X-ray beam by driving the goniometer drive in compliance with the assigned values and the control commands; and receiving the temperature of the sample stage from
  • the inputting may include a step in which the main control section stores and displays the assigned values, the control commands, and the control result.
  • the inputting may include a step to input assigned values and control commands on the position of the sample chamber, an incident angle of the synchrotron X-ray beam, and the temperature of the sample stage.
  • the aligning may include a step to align the sample chamber such that the synchrotron X-ray beam passes along the center of the sample.
  • the compensating and adjusting may comprise controlling and operating the goniometer to a value greater than the assigned value, controlling and operating the goniometer in the reverse direction to the assigned value, and eliminating errors in the incident angle caused by backlash of the motor of the goniometer.
  • the compensating and adjusting may include setting the incident angle as zero where the sample is horizontal to the synchrotron X-ray beam, and adjusting the incident angle.
  • the compensating and adjusting may be achieved simultaneously with the aligning.
  • the temperature of the sample stage is controlled in the range of -80 0 C to 1000 ° C .
  • More accurate data may be obtained by the precise control of the incidence angle of an X-ray according to the present invention, which overcomes the limit of the structural analysis of a thin film.
  • Fig. 1 is a block diagram of an X-ray scattering apparatus according to an embodiment of the present invention.
  • Fig. 2 is a schematic diagram of a synchrotron grazing incidence X-ray scattering apparatus according to the embodiment of the present invention.
  • Fig. 3 is a perspective view showing an incident X-ray being scattered from the sample.
  • Fig. 4 is a schematic flow chart showing the control procedure of the synchrotron grazing incidence X-ray scattering apparatus according to the embodiment of the present invention.
  • Fig. 5 is a block diagram showing exemplary driving of the program for operating and controlling the goniometer.
  • Fig. 6 is a screenshot showing each mode after executing the program of Fig. 5.
  • Fig. 7 is a block diagram showing exemplary driving of the program for operating and controlling the stepping motor.
  • Fig. 8 is a screenshot showing each mode after executing the program of Fig. 7.
  • Fig. 9 is a block diagram showing exemplary driving of the program for operating and controlling the temperature controller.
  • Fig. 10 is a screenshot showing the result after executing the program of Fig. 9.
  • sample 110 sample control section 111 : goniometer 112 : goniometer drive
  • stepping motor drive 116 stepping motor controller
  • main control section 200 goniometer driving section
  • stepping motor driving section 301 incident synchrotron X-ray beam 302 : scattering signal 303 : horizontal scattering angle
  • Fig. 1 is a block diagram of an X-ray scattering apparatus according to an embodiment of the present invention
  • Fig. 2 is a schematic diagram of a synchrotron grazing incidence X-ray scattering apparatus according to the embodiment of the present invention.
  • the synchrotron grazing incidence X-ray scattering apparatus includes a sample mounting section 100 where a thin film sample, the structure of which is to be analyzed, is located and reacts with incident synchrotron X-ray beam to be scattered so as to produce scattering signals, a sample control section 110 that controls both the incident angle of the synchrotron X-ray beam and the position of the sample mounting section 100 with respect to the synchrotron X-ray beam so as to control the scattering from the sample mounting section 100, a temperature control section 120 that controls rise and drop in temperature of the sample mounting section 100, and a main control section that conveys control commands to both the sample control section 110 and the temperature control section 120, and restores and displays the control commands and result thereof.
  • synchrotron grazing incidence is defined such that a synchrotron X-ray beam is incident on a thin film sample at the critical angle thereof in order to graze the thin film sample.
  • the sample mounting section 100 is a passage where a thin film sample, the structure of which is to be analyzed, is placed and reacts with the incident synchrotron X-ray beam that passes through the beam line for scattering and where the scattering signals are produced.
  • the sample control section 110 delivers various control commands in order to control each component of the sample mounting section 100.
  • the temperature control section 120 serves to control the temperature of the sample located in the sample mounting section 100.
  • the synchrotron X-ray beam is generated by a synchrotron, and is preferably an X-ray that provides information on the molecular structure of the sample by reacting with the sample and being scattered.
  • the sample mounting section 100 includes a sample chamber 101, a sample stage 102 placed inside the sample chamber 101 where the sample is mounted, and a vacuum pump 103 maintaining the sample chamber 101 under a vacuum condition.
  • the sample chamber 101 is a device that generates scattering from the surface of the sample by the incident synchrotron X-ray beam thereon. However, since the scattering signal of the synchrotron X-ray beam weakens in intensity due to the scattering with the air, the sample chamber 101 is kept under vacuum.
  • the window of the sample chamber 101 is preferably made of a polymer film such that the sample chamber 101 is maintained under vacuum and the synchrotron X-ray beam and the scattering signals are able to transmit to the sample chamber 101.
  • the vacuum pump 103 is connected with the sample chamber 101 and maintains the vacuum state of the sample chamber 101.
  • the sample stage 102 is a place where the sample from which the incident synchrotron X-ray beam is scattered is located, and is placed inside the sample chamber 101.
  • the sample stage 102 is preferably made of aluminum for its excellent heat transfer characteristics and non-deformability at high and low temperatures.
  • Fig. 3 is a perspective view showing the incident X-ray that is scattered from the sample.
  • the incident synchrotron X-ray beam 301 which passed through the beam line enters into the sample mounting section 100 and is scattered from the surface of the sample 104.
  • the scattering angle of the scattered synchrotron X-ray beam is divided into a horizontal scattering angle 303 and a vertical scattering angle 304.
  • Accurate scattering signals 302 may be produced because the inclination (an inclining angle to Y-Z plane of the drawing) of the sample stage 102 can be corrected by the operation of the sample control section 110 that is connected with the sample mounting section 100.
  • the sample control section 110 includes a goniometer driving section 200 that adjusts an incident angle of the incident synchrotron X-ray beam 301 by precisely rotating the sample mounting section 100 about the center axis (an axis parallel to the Y direction of the drawing) of the goniometer 111, and a stepping motor driving section 210 that moves the sample mounting section 100 up and down (in the Z direction of the drawing).
  • the goniometer driving section 200 for precisely controlling the incident angle of the incident synchrotron X-ray beam 301 on the sample 104 includes a goniometer 111 that is connected with and rotates the sample mounting section 100, a goniometer drive 112 that drives the goniometer 111, and a goniometer controller 113 that is connected with the goniometer drive 112 and imposes control commands thereon.
  • the goniometer 111 can be moved up and down (in the Z direction of the drawing) by a stepping motor 111 that is directly connected thereto.
  • the goniometer driving section 200 adjusts the incident angle of the incident synchrotron X-ray beam 301 by rotating the sample mounting section 100 about the center axis of the goniometer 111.
  • the goniometer controller 113 serves to deliver control commands to the goniometer 111 through the goniometer drive 112 and serves to display the control result.
  • the stepping motor driving section 210 includes a stepping motor 114 that is connected with the goniometer 111 and moves the sample mounting section 100 up and down, a stepping motor drive 115 that drives the stepping motor 114, and a stepping motor controller 116 that imposes control signals on the stepping motor drive 115.
  • the stepping motor controller 116 serves to deliver control commands to the stepping motor 114 through the stepping motor drive 115 and serves to display the control result.
  • the temperature control section 120 includes a temperature adjuster 121 that adjusts the temperature of the sample stage 102, a temperature controller 122 that controls the temperature adjuster 121, a heating bar 123 that supplies heat to the sample stage 102 under the control of the temperature adjuster 121, a liquid nitrogen injector 124 that supplies liquid nitrogen for cooling the sample stage 102, and a liquid nitrogen circulating tube 125 that transports the liquid nitrogen to the sample stage 102.
  • the temperature control section 120 for controlling the temperature of the sample stage 102 is provided with the programmable temperature adjuster 121 and is capable of maintaining the sample stage 102 at a constant temperature in the range of room temperature to 450 0 C, or raising the temperature of the sample stage 102 at a desired rate.
  • the heating bar 123 is a conventional device, having an electrical resistance wire and an insulator, which is electrically connected to the temperature control section 120 and is heated with the supplied electrical current.
  • the heating bar 123 is embedded in the sample stage 102.
  • the temperature adjuster 121 is connected to the temperature controller 122 via the RS232 port and receives the control command.
  • the liquid nitrogen injector 124 serves to cool the sample stage using liquid nitrogen.
  • the liquid nitrogen circulating tube extends to the inside of the sample stage 102 and circulates the liquid nitrogen through the sample stage 102, lowering the temperature of the sample stage 102 to below -80 0 C .
  • the temperature control section 120 is able to control the temperature of the sample stage 102 in the range of -80 to 1000 ° C and to provide a circumstance suitable for observing the change of the structure of a temperature-dependent sample.
  • the main control section 130 includes a computer that controls the goniometer driving section 200 and the stepping motor driving section 210, gives commands for controlling temperature to the temperature control section 120, and stores and displays the various control commands and the control result.
  • Fig. 4 is a schematic flow chart for the control procedure of the synchrotron grazing incidence X-ray scattering apparatus according to the embodiment of the present invention, and exemplifies the processes for precisely controlling the sample control section and the temperature control section via the main control section of the synchrotron grazing incidence X-ray scattering apparatus.
  • the synchrotron X-ray beam generating from a synchrotron passes the beam line and enters into the sample chamber 101.
  • the incident synchrotron X-ray beam on the sample 104 inside the sample chamber 101 is scattered from the surface of the sample 104, and a signal detector detects the scattering signals 302.
  • the main control section 130 may adjust the position of the sample 104, the incident angle of the incident synchrotron X-ray beam 301, and the temperature of the sample stage 102 by controlling the sample control section 110 and the temperature control section 120.
  • the main control section 130 initializes the sample control section 110 and the temperature control section 120.
  • the goniometer driving section 200 and the stepping motor driving section 210 of the sample control section 110, and the control value for each controller of the temperature control section 120 are initialized (SlOO).
  • the main control section 130 is provided with certain assigned values and control commands to be imposed on the sample control section 110 and the temperature control section 120 (SI lO).
  • a user inputs the certain assigned values and the control commands to the main control section 130 in order to generate the X-ray scattering by aligning the sample chamber 101 to the vicinity of the X-ray through the stepping motor driving section 210.
  • the user inputs certain assigned values and control commands to the main control section 130 in order for the sample 104 to be placed horizontally with respect to the X-ray through the goniometer driving section 200, and assigned values and control commands to the main control section 130 for setting up the temperature of the sample stage 102 through the temperature control section 120.
  • the main control section 130 aligns the sample chamber 101 by driving the stepping motor driving section 210 in compliance with the inputted values (S 120).
  • the main control section 130 causes the X-ray to be incident on the center of the sample 104 by precisely moving the sample chamber 101 up and down via the stepping motor driving section 210.
  • the user controls the stepping motor driving section 210 by inputting variables such as the moving distance and speed for the sample chamber 101 to the main control section 130.
  • the main control section 130 imposes signals on the stepping motor controller 116.
  • the stepping motor controller 116 imposes control signals on the stepping motor drive 115, and then the stepping motor drive 115 drives the stepping motor 114 so as to drive the goniometer 111 which is connected to the stepping motor 114.
  • the sample chamber 101 is fixed to the goniometer 111 such that the sample chamber 101 moves up and down and right and left with the movement of the goniometer 111, and causes the synchrotron X-ray beam to be incident on the central area of the sample 104.
  • the main control section 130 compensates for and adjusts the incident angle by driving the goniometer driving section 200 of the sample control section 110 (S 130).
  • the main control section 130 imposes control signals on the goniometer controller 113, and then the goniometer controller 113 imposes control signals on the goniometer drive 112 so as to drive the goniometer 111.
  • the goniometer 111 rotates, by an angle as precise as 0.001 degrees, the sample chamber 101 that is aligned so as to have the incident synchrotron X-ray beam 301 be incident on the central region of the sample 104 until the surface of the sample 104 becomes exactly horizontal to the direction of the incident synchrotron X-ray beam 301.
  • the goniometer controller 113 causes the goniometer 111 to rotate over the assigned value and rotate back to the assigned value so as to eliminate errors in the incident angle caused by a backlash of the goniometer 111.
  • the incident angle is controlled by inputting the variables for the incident angle until total reflection happens by the X-ray on the sample inside the sample chamber.
  • the process that compensates for the incident angle of the incident synchrotron X- ray beam 301 may be achieved at the same time as the aligning of the sample chamber 101, and repeats until the incident angle of the incident synchrotron X-ray beam 301 becomes zero.
  • the main control section 130 receives the temperature signal of the sample stage 102 from the temperature control section 120 and adjusts the temperature of the sample stage 102 to the assigned value by controlling the temperature control section 120 (S140).
  • the main control section 130 imposes control signals on the temperature controller 122, and then the temperature controller 122 controls the temperature adjuster 121 to adjust the temperature of the sample 102.
  • the main control section 130 controls the temperature adjuster 121 through a communication port, for example an RS-232 port.
  • the temperature adjuster 121 turns on the heating bar 123 in order to raise the temperature of the sample stage 102, or supplies liquid nitrogen through the liquid nitrogen injector 124 to the liquid nitrogen circulating tubes 125 for circulating the liquid nitrogen in order to lower the temperature of the sample stage 102.
  • the main control section 130 serves to store and display the position of the sample stage 102, the incident angle of the incident synchrotron X-ray beam 301, the control commands for temperature, and the control result (S 150).
  • the sample chamber 101 is aligned such that the incident synchrotron X-ray beam 301 has a certain incident angle, and the sample chamber 101 has a particular experimental condition as the temperature of the sample stage 120 is controlled. Since the commands inputted through the main control section 130 or controlled by the main control section 130 and the result thereof are displayed on the computer screen, the user is able to change the control commands in real time and even to store them.
  • users may set the sample 104 at various temperatures and cause the incident synchrotron X-ray beam 301 to be incident on the surface of the sample 104 at a grazing angle close to the critical angle. Therefore, it is possible for the user to obtain the strong scattering intensity due to a large scattering volume for the synchrotron X-ray beam, and to obtain the needed scattering information in real time on a thin film sample or a temperature sensitive sample.
  • the main control section 130 is realized by a program inputted to a computer.
  • Figs. 5 to 10 exemplify each control program for respective components, which is realized through the main control section 130.
  • An embodiment of the present program is a computer program, as stated above, that controls the computer comprising the main control section and that consists of computer readable codes or commands so as to make the computer serve as the main control section.
  • the embodiment of the control process by the aforementioned main control section is easily realized in a way that the program is read by the computer from recording media such as a ROM,
  • CD-ROM compact disc-read only memory
  • DVD-ROM digital versatile disc-read only memory
  • hard disk hard disk
  • Fig. 5 shows exemplary driving of the program (hereinafter referred to as GonioC program) for controlling and operating the goniometer drive
  • Fig. 6 is an exemplary computer screenshot showing each mode after executing the GonioC program.
  • the system initialization 300 is carried out by the execution of the GonioC program, and then a file mode 310, a script mode 320, and a window mode 330 are executed.
  • the file mode includes commands such as choosing work environment, opening new files, saving files, and terminating the whole program.
  • the script mode 320 includes commands such as opening new scripts, opening scripts, and saving scripts, the user is able to take notes of required data, control commands, and control environment, and to store them for later reference.
  • the window mode 330 includes commands such as opening the data window and data display, the user is able to observe or control the change in the incident angle of the synchrotron X-ray beam in real time.
  • Fig. 7 represents exemplary driving of the program (hereinafter referred to as MDI program) for controlling and operating the stepping motor
  • Fig. 8 is an exemplary computer screenshot showing each mode after executing the MDI program.
  • the system initialization 400 is carried out by the execution of the MDI program, and then a board mode, a termination mode, and a help mode may be executed.
  • a motor-choosing mode 420 and a variable-inputting mode 430 are carried out simultaneously, the user can choose the stepping motor and move the vacuum sample chamber to the desired position by inputting the variables.
  • Fig. 9 represents exemplary driving of the program (hereinafter referred to as EURO program) for controlling and operating the temperature control section
  • Fig. 10 is a computer screenshot resulting from the EURO program.
  • the system initialization 500 is carried out by the execution of the EURO program, and then a variable-initializing mode 510, a temperature variable-inputting mode 520, an executing mode 530, a variable- displaying mode 540, and a termination mode are executed.
  • the temperature variable-inputting mode 520 the user can vary the temperature of the sample stage 102 in real time.
  • the variable-displaying mode 540 the user can observe the change in the temperature of the sample stage 102 in real time.

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Abstract

For easy control of the temperature of a sample as well as for precise control of an incident angle of a synchrotron X-ray beam, the present invention provides a method for controlling a synchrotron grazing incidence X-ray scattering apparatus, which comprises a step initializing a sample control section and a temperature control section; a step of aligning a vacuum sample chamber by driving a stepping motor drive of the sample control section, a step of compensating the incident angle of the synchrotron X-ray beam with respect to the sample by driving the goniometer drive of the sample control section, and a step of controlling the temperature of a sample stage where the sample is seated by controlling the temperature control section.

Description

TITLE OF THE INVENTION
Method for Controlling Synchrotron Grazing Incidence X-ray Scattering Apparatus FIELD OF THE INVENTION The present invention relates to a method for controlling a synchrotron grazing incidence X-ray scattering apparatus, and more particularly, to a method for controlling a synchrotron grazing incidence X-ray scattering apparatus that is capable of accurately analyzing a structure of a thin film sample. BACKGROUND ART Synchrotron radiation sources, especially X-ray beam, provide information on microstructure that is not obtained by visible light, so that an X-ray scattering method is one of the major tools for analysis of polymer structure.
However, for a thin film sample with a thickness of less than 1 μm, the previous transmission X-ray scattering method is not suitable for structural analysis. It is difficult to obtain a strong scattering intensity due to the small scattering volume of the thin film, and in addition, an X-ray having enough energy to penetrate a substrate as well as the thin film is required due to the thin film being formed on the substrate that is opaque to the X-ray.
Therefore, it is required to develop not only a scattering apparatus that is able to obtain strong scattering intensity by impinging the X-ray into the thin film at a critical angle due to a large scattering volume compared to the transmission scattering method, but also a method for controlling the position, incidence angle, and temperature of the sample section where the X-ray is to be scattered. DETAILED DESCRIPTION OF THE INVENTION TECHNICAL OBJECTIVES
The present invention in compliance with the above-mentioned requirement is to provide a method for controlling a synchrotron grazing incidence X-ray scattering apparatus in which the incidence angle of an X-ray is precisely controlled in real time. The present invention further provides a method for controlling a synchrotron grazing incidence X-ray scattering apparatus in which the structural data of the temperature varying thin film sample is obtained by means of controlling the temperature of the sample in real time with ease. TECHNICAL SOLUTION The present invention provides a method for controlling a synchrotron grazing incidence X-ray scattering apparatus including a sample mounting section having both a sample stage where the sample is seated and a sample chamber where the sample stage is located; a sample control section having both a goniometer drive that rotates the sample mounting section and a stepping motor drive that moves the sample mounting section; a temperature control section that controls the temperature of the sample mounting section; and a main control section that conveys control commands to both the sample control section and the temperature control section, and restores and displays the control commands and result thereof, the method comprising initializing the sample control section and the temperature control section; inputting assigned values and control commands, that are imposed on the sample control section and the temperature control section; aligning the sample chamber by driving the stepping motor drive in compliance with the assigned values and the control commands; compensating for and adjusting the incident angle of synchrotron X-ray beam by driving the goniometer drive in compliance with the assigned values and the control commands; and receiving the temperature of the sample stage from the temperature control section and controlling the temperature of the sample stage in compliance with the assigned values and the control commands.
The inputting may include a step in which the main control section stores and displays the assigned values, the control commands, and the control result.
The inputting may include a step to input assigned values and control commands on the position of the sample chamber, an incident angle of the synchrotron X-ray beam, and the temperature of the sample stage.
The aligning may include a step to align the sample chamber such that the synchrotron X-ray beam passes along the center of the sample.
The compensating and adjusting may comprise controlling and operating the goniometer to a value greater than the assigned value, controlling and operating the goniometer in the reverse direction to the assigned value, and eliminating errors in the incident angle caused by backlash of the motor of the goniometer. The compensating and adjusting may include setting the incident angle as zero where the sample is horizontal to the synchrotron X-ray beam, and adjusting the incident angle.
The compensating and adjusting may be achieved simultaneously with the aligning.
The temperature of the sample stage is controlled in the range of -80 0C to 1000 °C . EFFECT OF THE INVENTION
More accurate data may be obtained by the precise control of the incidence angle of an X-ray according to the present invention, which overcomes the limit of the structural analysis of a thin film.
Also, since the temperature of the thin film is easily controlled, sufficient data may be obtained through real time observation of the structural changes of the thin film sample with respect to temperature.
Furthermore, ease and quickness of control is obtained by simultaneously controlling the multiple controllers in real time, and also precision in control is enhanced by visually confirming the result of the control. BRIEF DESCRIPTION OF THE DRAWINGS
Fig. 1 is a block diagram of an X-ray scattering apparatus according to an embodiment of the present invention.
Fig. 2 is a schematic diagram of a synchrotron grazing incidence X-ray scattering apparatus according to the embodiment of the present invention.
Fig. 3 is a perspective view showing an incident X-ray being scattered from the sample.
Fig. 4 is a schematic flow chart showing the control procedure of the synchrotron grazing incidence X-ray scattering apparatus according to the embodiment of the present invention.
Fig. 5 is a block diagram showing exemplary driving of the program for operating and controlling the goniometer.
Fig. 6 is a screenshot showing each mode after executing the program of Fig. 5.
Fig. 7 is a block diagram showing exemplary driving of the program for operating and controlling the stepping motor.
Fig. 8 is a screenshot showing each mode after executing the program of Fig. 7.
Fig. 9 is a block diagram showing exemplary driving of the program for operating and controlling the temperature controller.
Fig. 10 is a screenshot showing the result after executing the program of Fig. 9. <Reference numerals for main components in the drawings > 100 : sample mounting section 101 : sample chamber
102 : sample stage 103 : vacuum pump
104 : sample 110 : sample control section 111 : goniometer 112 : goniometer drive
113 : goniometer controller 114 : stepping motor
115 : stepping motor drive 116 : stepping motor controller
120 : temperature control section 121 : temperature adjuster 122 : temperature controller 123 : heating bar 124 : liquid nitrogen injector 125 : liquid nitrogen circulating tube
130 : main control section 200 : goniometer driving section
210 : stepping motor driving section 301 : incident synchrotron X-ray beam 302 : scattering signal 303 : horizontal scattering angle
304 : vertical scattering angle DESCRIPTION QF THE EMBODIMENTS
Hereinafter, with reference to appended drawings, the embodiments of the present invention will be described in detail for enabling those skilled in the art. However, the present invention may have different forms and is not limited to these embodiments. Fig. 1 is a block diagram of an X-ray scattering apparatus according to an embodiment of the present invention, and Fig. 2 is a schematic diagram of a synchrotron grazing incidence X-ray scattering apparatus according to the embodiment of the present invention.
Referring to the above drawings, a detailed description will be given to the synchrotron grazing incidence X-ray scattering apparatus.
The synchrotron grazing incidence X-ray scattering apparatus includes a sample mounting section 100 where a thin film sample, the structure of which is to be analyzed, is located and reacts with incident synchrotron X-ray beam to be scattered so as to produce scattering signals, a sample control section 110 that controls both the incident angle of the synchrotron X-ray beam and the position of the sample mounting section 100 with respect to the synchrotron X-ray beam so as to control the scattering from the sample mounting section 100, a temperature control section 120 that controls rise and drop in temperature of the sample mounting section 100, and a main control section that conveys control commands to both the sample control section 110 and the temperature control section 120, and restores and displays the control commands and result thereof.
Hereinafter, the term "synchrotron grazing incidence" is defined such that a synchrotron X-ray beam is incident on a thin film sample at the critical angle thereof in order to graze the thin film sample.
The sample mounting section 100 is a passage where a thin film sample, the structure of which is to be analyzed, is placed and reacts with the incident synchrotron X-ray beam that passes through the beam line for scattering and where the scattering signals are produced. The sample control section 110 delivers various control commands in order to control each component of the sample mounting section 100.
The temperature control section 120 serves to control the temperature of the sample located in the sample mounting section 100.
Here, the synchrotron X-ray beam is generated by a synchrotron, and is preferably an X-ray that provides information on the molecular structure of the sample by reacting with the sample and being scattered.
The sample mounting section 100 includes a sample chamber 101, a sample stage 102 placed inside the sample chamber 101 where the sample is mounted, and a vacuum pump 103 maintaining the sample chamber 101 under a vacuum condition.
The sample chamber 101 is a device that generates scattering from the surface of the sample by the incident synchrotron X-ray beam thereon. However, since the scattering signal of the synchrotron X-ray beam weakens in intensity due to the scattering with the air, the sample chamber 101 is kept under vacuum. In addition, the window of the sample chamber 101 is preferably made of a polymer film such that the sample chamber 101 is maintained under vacuum and the synchrotron X-ray beam and the scattering signals are able to transmit to the sample chamber 101.
The vacuum pump 103 is connected with the sample chamber 101 and maintains the vacuum state of the sample chamber 101.
The sample stage 102 is a place where the sample from which the incident synchrotron X-ray beam is scattered is located, and is placed inside the sample chamber 101. The sample stage 102 is preferably made of aluminum for its excellent heat transfer characteristics and non-deformability at high and low temperatures.
Fig. 3 is a perspective view showing the incident X-ray that is scattered from the sample.
Referring to Fig. 3, the incident synchrotron X-ray beam 301 which passed through the beam line enters into the sample mounting section 100 and is scattered from the surface of the sample 104. The scattering angle of the scattered synchrotron X-ray beam is divided into a horizontal scattering angle 303 and a vertical scattering angle 304.
Accurate scattering signals 302 may be produced because the inclination (an inclining angle to Y-Z plane of the drawing) of the sample stage 102 can be corrected by the operation of the sample control section 110 that is connected with the sample mounting section 100.
The sample control section 110 includes a goniometer driving section 200 that adjusts an incident angle of the incident synchrotron X-ray beam 301 by precisely rotating the sample mounting section 100 about the center axis (an axis parallel to the Y direction of the drawing) of the goniometer 111, and a stepping motor driving section 210 that moves the sample mounting section 100 up and down (in the Z direction of the drawing).
The goniometer driving section 200 for precisely controlling the incident angle of the incident synchrotron X-ray beam 301 on the sample 104 includes a goniometer 111 that is connected with and rotates the sample mounting section 100, a goniometer drive 112 that drives the goniometer 111, and a goniometer controller 113 that is connected with the goniometer drive 112 and imposes control commands thereon. The goniometer 111 can be moved up and down (in the Z direction of the drawing) by a stepping motor 111 that is directly connected thereto.
Fulfilling the control command of the angle adjustment on a scale as small as 0.001 degrees, the goniometer driving section 200 adjusts the incident angle of the incident synchrotron X-ray beam 301 by rotating the sample mounting section 100 about the center axis of the goniometer 111.
The goniometer controller 113 serves to deliver control commands to the goniometer 111 through the goniometer drive 112 and serves to display the control result. The stepping motor driving section 210 includes a stepping motor 114 that is connected with the goniometer 111 and moves the sample mounting section 100 up and down, a stepping motor drive 115 that drives the stepping motor 114, and a stepping motor controller 116 that imposes control signals on the stepping motor drive 115. The stepping motor controller 116 serves to deliver control commands to the stepping motor 114 through the stepping motor drive 115 and serves to display the control result.
The temperature control section 120 includes a temperature adjuster 121 that adjusts the temperature of the sample stage 102, a temperature controller 122 that controls the temperature adjuster 121, a heating bar 123 that supplies heat to the sample stage 102 under the control of the temperature adjuster 121, a liquid nitrogen injector 124 that supplies liquid nitrogen for cooling the sample stage 102, and a liquid nitrogen circulating tube 125 that transports the liquid nitrogen to the sample stage 102. The temperature control section 120 for controlling the temperature of the sample stage 102 is provided with the programmable temperature adjuster 121 and is capable of maintaining the sample stage 102 at a constant temperature in the range of room temperature to 450 0C, or raising the temperature of the sample stage 102 at a desired rate. The heating bar 123 is a conventional device, having an electrical resistance wire and an insulator, which is electrically connected to the temperature control section 120 and is heated with the supplied electrical current.
The heating bar 123 is embedded in the sample stage 102. The temperature adjuster 121 is connected to the temperature controller 122 via the RS232 port and receives the control command.
The liquid nitrogen injector 124 serves to cool the sample stage using liquid nitrogen. The liquid nitrogen circulating tube extends to the inside of the sample stage 102 and circulates the liquid nitrogen through the sample stage 102, lowering the temperature of the sample stage 102 to below -80 0C . Thus, the temperature control section 120 is able to control the temperature of the sample stage 102 in the range of -80 to 1000 °C and to provide a circumstance suitable for observing the change of the structure of a temperature-dependent sample.
The main control section 130 includes a computer that controls the goniometer driving section 200 and the stepping motor driving section 210, gives commands for controlling temperature to the temperature control section 120, and stores and displays the various control commands and the control result.
Fig. 4 is a schematic flow chart for the control procedure of the synchrotron grazing incidence X-ray scattering apparatus according to the embodiment of the present invention, and exemplifies the processes for precisely controlling the sample control section and the temperature control section via the main control section of the synchrotron grazing incidence X-ray scattering apparatus.
Referring to Fig. 4, a description is given to the process for controlling the synchrotron grazing incidence X-ray scattering apparatus via the control section and is as follows.
The synchrotron X-ray beam generating from a synchrotron passes the beam line and enters into the sample chamber 101. The incident synchrotron X-ray beam on the sample 104 inside the sample chamber 101 is scattered from the surface of the sample 104, and a signal detector detects the scattering signals 302.
In the above process, the main control section 130 may adjust the position of the sample 104, the incident angle of the incident synchrotron X-ray beam 301, and the temperature of the sample stage 102 by controlling the sample control section 110 and the temperature control section 120. The main control section 130 initializes the sample control section 110 and the temperature control section 120. By the signal from the main control section 130, the goniometer driving section 200 and the stepping motor driving section 210 of the sample control section 110, and the control value for each controller of the temperature control section 120, are initialized (SlOO). The main control section 130 is provided with certain assigned values and control commands to be imposed on the sample control section 110 and the temperature control section 120 (SI lO).
In other words, a user inputs the certain assigned values and the control commands to the main control section 130 in order to generate the X-ray scattering by aligning the sample chamber 101 to the vicinity of the X-ray through the stepping motor driving section 210.
Also, the user inputs certain assigned values and control commands to the main control section 130 in order for the sample 104 to be placed horizontally with respect to the X-ray through the goniometer driving section 200, and assigned values and control commands to the main control section 130 for setting up the temperature of the sample stage 102 through the temperature control section 120.
Once the assigned values and control commands for each driving section are inputted to the main control section 130, the main control section 130 aligns the sample chamber 101 by driving the stepping motor driving section 210 in compliance with the inputted values (S 120).
The main control section 130 causes the X-ray to be incident on the center of the sample 104 by precisely moving the sample chamber 101 up and down via the stepping motor driving section 210. The user controls the stepping motor driving section 210 by inputting variables such as the moving distance and speed for the sample chamber 101 to the main control section 130.
In other words, according to the assigned values and control commands inputted to the main control section 130, the main control section 130 imposes signals on the stepping motor controller 116. The stepping motor controller 116 imposes control signals on the stepping motor drive 115, and then the stepping motor drive 115 drives the stepping motor 114 so as to drive the goniometer 111 which is connected to the stepping motor 114.
Here, the sample chamber 101 is fixed to the goniometer 111 such that the sample chamber 101 moves up and down and right and left with the movement of the goniometer 111, and causes the synchrotron X-ray beam to be incident on the central area of the sample 104.
As above, after positioning the sample chamber 101 at the exact location, the main control section 130 compensates for and adjusts the incident angle by driving the goniometer driving section 200 of the sample control section 110 (S 130). In other words, according to the assigned values and control commands, the main control section 130 imposes control signals on the goniometer controller 113, and then the goniometer controller 113 imposes control signals on the goniometer drive 112 so as to drive the goniometer 111. Therefore, the goniometer 111 rotates, by an angle as precise as 0.001 degrees, the sample chamber 101 that is aligned so as to have the incident synchrotron X-ray beam 301 be incident on the central region of the sample 104 until the surface of the sample 104 becomes exactly horizontal to the direction of the incident synchrotron X-ray beam 301. Here, the goniometer controller 113 causes the goniometer 111 to rotate over the assigned value and rotate back to the assigned value so as to eliminate errors in the incident angle caused by a backlash of the goniometer 111.
This is because errors in the incident angle may occur due to clearance between mated gear teeth causing a small amount of idle rotation when reversing the gear. After setting the compensated incident angle as 0 degrees where the surface of the sample 104 becomes exactly horizontal to the direction of the incident synchrotron X-ray beam, the incident angle is controlled by inputting the variables for the incident angle until total reflection happens by the X-ray on the sample inside the sample chamber. The process that compensates for the incident angle of the incident synchrotron X- ray beam 301 may be achieved at the same time as the aligning of the sample chamber 101, and repeats until the incident angle of the incident synchrotron X-ray beam 301 becomes zero.
The main control section 130 receives the temperature signal of the sample stage 102 from the temperature control section 120 and adjusts the temperature of the sample stage 102 to the assigned value by controlling the temperature control section 120 (S140).
According to the assigned values and control commands, the main control section 130 imposes control signals on the temperature controller 122, and then the temperature controller 122 controls the temperature adjuster 121 to adjust the temperature of the sample 102.
When the user inputs to the main control section 130 the variables such as initial and final temperatures of the sample stage 102, the rate of rise or drop in temperature, and a period for maintaining the temperature, the main control section 130 controls the temperature adjuster 121 through a communication port, for example an RS-232 port. The temperature adjuster 121 turns on the heating bar 123 in order to raise the temperature of the sample stage 102, or supplies liquid nitrogen through the liquid nitrogen injector 124 to the liquid nitrogen circulating tubes 125 for circulating the liquid nitrogen in order to lower the temperature of the sample stage 102.
The main control section 130 serves to store and display the position of the sample stage 102, the incident angle of the incident synchrotron X-ray beam 301, the control commands for temperature, and the control result (S 150).
Through the above procedures, the sample chamber 101 is aligned such that the incident synchrotron X-ray beam 301 has a certain incident angle, and the sample chamber 101 has a particular experimental condition as the temperature of the sample stage 120 is controlled. Since the commands inputted through the main control section 130 or controlled by the main control section 130 and the result thereof are displayed on the computer screen, the user is able to change the control commands in real time and even to store them.
According to the embodiment of the present invention, by operating the main control section 130, users may set the sample 104 at various temperatures and cause the incident synchrotron X-ray beam 301 to be incident on the surface of the sample 104 at a grazing angle close to the critical angle. Therefore, it is possible for the user to obtain the strong scattering intensity due to a large scattering volume for the synchrotron X-ray beam, and to obtain the needed scattering information in real time on a thin film sample or a temperature sensitive sample.
In the present embodiment, the main control section 130 is realized by a program inputted to a computer. Figs. 5 to 10 exemplify each control program for respective components, which is realized through the main control section 130.
An embodiment of the present program is a computer program, as stated above, that controls the computer comprising the main control section and that consists of computer readable codes or commands so as to make the computer serve as the main control section.
According to the embodiment of the present program, the embodiment of the control process by the aforementioned main control section is easily realized in a way that the program is read by the computer from recording media such as a ROM,
CD-ROM, DVD-ROM, and hard disk, and is executed thereby, or that the program is executed after being down-loaded to the computer through communicating means.
Fig. 5 shows exemplary driving of the program (hereinafter referred to as GonioC program) for controlling and operating the goniometer drive, and Fig. 6 is an exemplary computer screenshot showing each mode after executing the GonioC program. Referring to Figs. 5 and 6, the system initialization 300 is carried out by the execution of the GonioC program, and then a file mode 310, a script mode 320, and a window mode 330 are executed.
The file mode includes commands such as choosing work environment, opening new files, saving files, and terminating the whole program.
Since the script mode 320 includes commands such as opening new scripts, opening scripts, and saving scripts, the user is able to take notes of required data, control commands, and control environment, and to store them for later reference.
Since the window mode 330 includes commands such as opening the data window and data display, the user is able to observe or control the change in the incident angle of the synchrotron X-ray beam in real time.
Fig. 7 represents exemplary driving of the program (hereinafter referred to as MDI program) for controlling and operating the stepping motor, and Fig. 8 is an exemplary computer screenshot showing each mode after executing the MDI program.
Referring to Figs. 7 and 8, the system initialization 400 is carried out by the execution of the MDI program, and then a board mode, a termination mode, and a help mode may be executed. In addition, since a motor-choosing mode 420 and a variable-inputting mode 430 are carried out simultaneously, the user can choose the stepping motor and move the vacuum sample chamber to the desired position by inputting the variables.
Fig. 9 represents exemplary driving of the program (hereinafter referred to as EURO program) for controlling and operating the temperature control section, and Fig. 10 is a computer screenshot resulting from the EURO program. Referring to Figs. 9 and 10, the system initialization 500 is carried out by the execution of the EURO program, and then a variable-initializing mode 510, a temperature variable-inputting mode 520, an executing mode 530, a variable- displaying mode 540, and a termination mode are executed. After carrying out the temperature variable-inputting mode 520, the user can vary the temperature of the sample stage 102 in real time. Also, after carrying out the variable-displaying mode 540, the user can observe the change in the temperature of the sample stage 102 in real time.
Although an embodiment of the present invention have been described in detail hereinabove, it should be clearly understood that many variations and/or modifications of the basic inventive concepts herein taught which may appear to those skilled in the present art will still fall within the spirit and scope of the present invention, as defined in the appended claims.

Claims

[CLAIMS]
1. A method for controlling a synchrotron grazing incidence X-ray scattering apparatus including a sample mounting section having both a sample stage where the sample is seated and a sample chamber where the sample stage is located, a sample control section having both a goniometer drive that rotates the sample mounting section and a stepping motor drive that moves the sample mounting section, a temperature control section that controls the temperature of the sample mounting section, and a main control section that conveys control commands to both the sample control section and the temperature control section and restores and displays the control commands and result thereof, the method comprising: initializing the sample control section and the temperature control section; inputting assigned values and control commands that are imposed on the sample control section and the temperature control section; aligning the sample chamber by driving the stepping motor drive in compliance with the assigned values and the control commands; compensating for and adjusting the incident angle of a synchrotron X-ray beam by driving the goniometer drive in compliance with the assigned values and the control commands; and receiving the temperature of the sample stage from the temperature control section and controlling the temperature of the sample stage in compliance with the assigned values and the control commands.
2. The method of claim 1, wherein the inputting includes a step in which the main control section stores and displays the assigned values, the control commands, and the control result.
3. The method of claim 1, wherein the inputting includes a step to input assigned values and control commands on the position of the sample chamber, an incident angle of the synchrotron X-ray beam, and the temperature of the sample stage.
4. The method of claim 1, wherein the aligning includes a step to align the sample chamber such that the synchrotron X-ray beam passes through the center of the sample.
5. The method of claim 1, wherein the compensating and adjusting comprises: controlling and operating the goniometer to a value greater than the assigned value; controlling and operating the goniometer in the reverse direction to the assigned value; and eliminating errors in the incident angle caused by backlash of the motor of the goniometer.
6. The method of claim 1, wherein the compensating and adjusting includes: setting the incident angle as zero such that the sample is horizontal to the synchrotron X-ray beam; and adjusting the incident angle.
7. The method of claim 1, wherein the compensating and adjusting is carried out simultaneously with the aligning.
8. The method of claim 1, wherein the temperature of the sample stage is controlled in the range of -80 0C to 1000 0C .
PCT/KR2006/005768 2005-12-30 2006-12-27 Methof for controlling synchrotron grazing incidence x-ray scattering apparatus WO2007078085A1 (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009057590A1 (en) * 2009-12-09 2011-06-16 Siltronic Ag Method for thermal treatment of silicon wafer, involves regulating parameter of treatment of workpiece such that determined value approximates to threshold value to obtain desired characteristic of workpiece
CN106841254A (en) * 2017-01-06 2017-06-13 中国工程物理研究院核物理与化学研究所 A kind of temperature loading device for neutron scattering experiment

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100995877B1 (en) 2008-07-23 2010-11-22 한국기계연구원 Apparatus for measuring crystallographic orientation of neighboring grains using goniometer of transmission electron microscope and method for characterizing grain boundary
KR101252820B1 (en) * 2011-09-29 2013-04-09 포항공과대학교 산학협력단 Sample holder assembly and deposit apparatus having the same

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6751287B1 (en) * 1998-05-15 2004-06-15 The Trustees Of The Stevens Institute Of Technology Method and apparatus for x-ray analysis of particle size (XAPS)
US6891615B2 (en) * 2001-07-10 2005-05-10 Japan Atomic Energy Research Institute Conical diffraction grazing incidence spectrometer and diffraction grating for use in the spectrometer
US6937695B2 (en) * 2002-10-02 2005-08-30 Rigaku Corporation Analyzing apparatus and analyzing method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1115737B (en) 1977-10-19 1986-02-03 Cise Spa SHARING INCIDENCE SPECTROGRAPH-MONOCHROME
JPH05296946A (en) * 1992-04-21 1993-11-12 Fujitsu Ltd X-ray diffractometer
JP2005001130A (en) * 2003-06-09 2005-01-06 Seiko Epson Corp Printing device, recording head used in printing device, and cap head used in printing device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6751287B1 (en) * 1998-05-15 2004-06-15 The Trustees Of The Stevens Institute Of Technology Method and apparatus for x-ray analysis of particle size (XAPS)
US6891615B2 (en) * 2001-07-10 2005-05-10 Japan Atomic Energy Research Institute Conical diffraction grazing incidence spectrometer and diffraction grating for use in the spectrometer
US6937695B2 (en) * 2002-10-02 2005-08-30 Rigaku Corporation Analyzing apparatus and analyzing method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009057590A1 (en) * 2009-12-09 2011-06-16 Siltronic Ag Method for thermal treatment of silicon wafer, involves regulating parameter of treatment of workpiece such that determined value approximates to threshold value to obtain desired characteristic of workpiece
DE102009057590B4 (en) * 2009-12-09 2013-08-29 Siltronic Ag Method for the thermal treatment of a workpiece
CN106841254A (en) * 2017-01-06 2017-06-13 中国工程物理研究院核物理与化学研究所 A kind of temperature loading device for neutron scattering experiment

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