WO2009047990A1 - Fragile material substrate, laser scribe method for the fragile material substrate, and laser scribe apparatus - Google Patents
Fragile material substrate, laser scribe method for the fragile material substrate, and laser scribe apparatus Download PDFInfo
- Publication number
- WO2009047990A1 WO2009047990A1 PCT/JP2008/067486 JP2008067486W WO2009047990A1 WO 2009047990 A1 WO2009047990 A1 WO 2009047990A1 JP 2008067486 W JP2008067486 W JP 2008067486W WO 2009047990 A1 WO2009047990 A1 WO 2009047990A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- scribe
- material substrate
- fragile material
- laser scribe
- scheduled line
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title abstract 4
- 238000000034 method Methods 0.000 title abstract 2
- 239000000463 material Substances 0.000 title 2
- 230000001678 irradiating effect Effects 0.000 abstract 3
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/073—Shaping the laser spot
- B23K26/0736—Shaping the laser spot into an oval shape, e.g. elliptic shape
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0005—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
- B28D5/0011—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing with preliminary treatment, e.g. weakening by scoring
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
- C03B33/0222—Scoring using a focussed radiation beam, e.g. laser
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
- C03B33/023—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
- C03B33/027—Scoring tool holders; Driving mechanisms therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B33/00—Severing cooled glass
- C03B33/09—Severing cooled glass by thermal shock
- C03B33/091—Severing cooled glass by thermal shock using at least one focussed radiation beam, e.g. laser beam
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
- B23K2103/52—Ceramics
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Plasma & Fusion (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Thermal Sciences (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Laser Beam Processing (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
Abstract
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009536970A JP5171838B2 (en) | 2007-10-11 | 2008-09-26 | Laser scribing method for brittle material substrate |
| CN2008801110707A CN101821071B (en) | 2007-10-11 | 2008-09-26 | Fragile material substrate, laser scribe method for the fragile material substrate, and laser scribe apparatus |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007-265572 | 2007-10-11 | ||
| JP2007265572 | 2007-10-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2009047990A1 true WO2009047990A1 (en) | 2009-04-16 |
Family
ID=40549135
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2008/067486 WO2009047990A1 (en) | 2007-10-11 | 2008-09-26 | Fragile material substrate, laser scribe method for the fragile material substrate, and laser scribe apparatus |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP5171838B2 (en) |
| KR (1) | KR101211021B1 (en) |
| CN (1) | CN101821071B (en) |
| TW (1) | TWI462792B (en) |
| WO (1) | WO2009047990A1 (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012031035A (en) * | 2010-08-02 | 2012-02-16 | Mitsuboshi Diamond Industrial Co Ltd | Method for dividing brittle material substrate |
| JP2014044987A (en) * | 2012-08-24 | 2014-03-13 | Fujitsu Semiconductor Ltd | Dicing method and dicing device |
| US9266192B2 (en) | 2012-05-29 | 2016-02-23 | Electro Scientific Industries, Inc. | Method and apparatus for processing workpieces |
| US9755190B2 (en) | 2013-04-16 | 2017-09-05 | Samsung Display Co., Ltd. | Laser-induced thermal imaging apparatus, method of laser-induced thermal imaging, and manufacturing method of organic light-emitting display apparatus using the method |
| JP2019169685A (en) * | 2018-03-26 | 2019-10-03 | パナソニックIpマネジメント株式会社 | Manufacturing method of element chip |
| CN115709338A (en) * | 2021-08-23 | 2023-02-24 | 广东聚华印刷显示技术有限公司 | Laser scanning platform and method for laser stripping substrate |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2781296B1 (en) | 2013-03-21 | 2020-10-21 | Corning Laser Technologies GmbH | Device and method for cutting out contours from flat substrates using a laser |
| EP2980033B1 (en) | 2013-03-26 | 2021-01-20 | AGC Inc. | Glass sheet processing method and glass sheet processing apparatus |
| CN107922237B (en) | 2015-03-24 | 2022-04-01 | 康宁股份有限公司 | Laser cutting and processing of display glass compositions |
| KR102427574B1 (en) * | 2016-01-22 | 2022-07-29 | 주식회사 포스코 | Method and apparatus for refining magnetic domains grain-oriented electrical steel |
| WO2018064409A1 (en) * | 2016-09-30 | 2018-04-05 | Corning Incorporated | Apparatuses and methods for laser processing transparent workpieces using non-axisymmetric beam spots |
| CN107132659B (en) * | 2017-06-29 | 2020-02-21 | 联想(北京)有限公司 | Laser beam layer generation method and device |
| TWI681241B (en) * | 2018-12-04 | 2020-01-01 | 友達光電股份有限公司 | Manufacturing method for display device and display device utilized thereof |
| TW202035321A (en) * | 2019-01-29 | 2020-10-01 | 美商康寧公司 | Methods and apparatus for free-form cutting of flexible thin glass |
| CN112008232A (en) * | 2020-08-11 | 2020-12-01 | 华东师范大学 | Method and device for preparing periodic stripe structure on surface of glass coated with ITO film |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003117921A (en) * | 2001-09-29 | 2003-04-23 | Samsung Electronics Co Ltd | Non-metal substrate cutting method |
| JP2005186100A (en) * | 2003-12-25 | 2005-07-14 | V Technology Co Ltd | Laser processing equipment |
| JP2006143506A (en) * | 2004-11-18 | 2006-06-08 | Sanyo Electric Co Ltd | Method for cutting glass substrate |
| JP2008031021A (en) * | 2006-07-31 | 2008-02-14 | Optrex Corp | Method of cutting substrate |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3437760B2 (en) | 1998-03-31 | 2003-08-18 | 大崎電気工業株式会社 | Optical fiber device holding apparatus and method of manufacturing the same |
| US6327875B1 (en) * | 1999-03-09 | 2001-12-11 | Corning Incorporated | Control of median crack depth in laser scoring |
| JPWO2006038565A1 (en) * | 2004-10-01 | 2008-05-15 | 三星ダイヤモンド工業株式会社 | Method and apparatus for scribing brittle materials |
| JP2008044823A (en) * | 2006-08-18 | 2008-02-28 | Seiko Epson Corp | Substrate cutting method, electro-optical device manufacturing method, and laser scribing device |
| JP2008168328A (en) * | 2007-01-15 | 2008-07-24 | Seiko Epson Corp | Laser scribing apparatus, substrate cutting method, and electro-optical device manufacturing method |
-
2008
- 2008-09-26 KR KR1020107007475A patent/KR101211021B1/en not_active Expired - Fee Related
- 2008-09-26 WO PCT/JP2008/067486 patent/WO2009047990A1/en active Application Filing
- 2008-09-26 CN CN2008801110707A patent/CN101821071B/en not_active Expired - Fee Related
- 2008-09-26 JP JP2009536970A patent/JP5171838B2/en not_active Expired - Fee Related
- 2008-10-06 TW TW097138368A patent/TWI462792B/en not_active IP Right Cessation
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003117921A (en) * | 2001-09-29 | 2003-04-23 | Samsung Electronics Co Ltd | Non-metal substrate cutting method |
| JP2005186100A (en) * | 2003-12-25 | 2005-07-14 | V Technology Co Ltd | Laser processing equipment |
| JP2006143506A (en) * | 2004-11-18 | 2006-06-08 | Sanyo Electric Co Ltd | Method for cutting glass substrate |
| JP2008031021A (en) * | 2006-07-31 | 2008-02-14 | Optrex Corp | Method of cutting substrate |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012031035A (en) * | 2010-08-02 | 2012-02-16 | Mitsuboshi Diamond Industrial Co Ltd | Method for dividing brittle material substrate |
| US9266192B2 (en) | 2012-05-29 | 2016-02-23 | Electro Scientific Industries, Inc. | Method and apparatus for processing workpieces |
| JP2014044987A (en) * | 2012-08-24 | 2014-03-13 | Fujitsu Semiconductor Ltd | Dicing method and dicing device |
| US9755190B2 (en) | 2013-04-16 | 2017-09-05 | Samsung Display Co., Ltd. | Laser-induced thermal imaging apparatus, method of laser-induced thermal imaging, and manufacturing method of organic light-emitting display apparatus using the method |
| JP2019169685A (en) * | 2018-03-26 | 2019-10-03 | パナソニックIpマネジメント株式会社 | Manufacturing method of element chip |
| JP7138297B2 (en) | 2018-03-26 | 2022-09-16 | パナソニックIpマネジメント株式会社 | Element chip manufacturing method |
| CN115709338A (en) * | 2021-08-23 | 2023-02-24 | 广东聚华印刷显示技术有限公司 | Laser scanning platform and method for laser stripping substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101821071A (en) | 2010-09-01 |
| JPWO2009047990A1 (en) | 2011-02-17 |
| TWI462792B (en) | 2014-12-01 |
| TW200936289A (en) | 2009-09-01 |
| JP5171838B2 (en) | 2013-03-27 |
| KR101211021B1 (en) | 2012-12-11 |
| KR20100065362A (en) | 2010-06-16 |
| CN101821071B (en) | 2012-10-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| WO2009047990A1 (en) | Fragile material substrate, laser scribe method for the fragile material substrate, and laser scribe apparatus | |
| TW200721285A (en) | Laser processing method for wafer | |
| TWI653115B (en) | Method for performing laser filamentation within transparent materials | |
| JP6034269B2 (en) | Transparent material processing with ultrashort pulse laser | |
| WO2009126907A3 (en) | Laser-scribing platform and hybrid writing strategy | |
| CN111065485A (en) | Apparatus and method for laser machining transparent workpieces using an afocal beam adjustment assembly | |
| KR20160101068A (en) | Laser cutting of display glass compositions | |
| WO2010138897A3 (en) | Acousto-optic deflector applications in laser processing of dielectric or other materials | |
| EP4372107A3 (en) | Laser ablation and processing methods and systems | |
| KR20160098467A (en) | Method of Laser Cutting a Sapphire Substrate by Lasers and an Article Comprising Sapphire with Edge Having a Series of Deffects | |
| JP2015519722A (en) | Laser scribing with high depth action in the workpiece | |
| GB0622232D0 (en) | Method and apparatus for laser beam alignment for solar panel scribing | |
| WO2008014332A3 (en) | Methods and apparatuses for directing an ion beam source | |
| TW200711775A (en) | Method for cutting plate-shaped body, and laser beam machining device | |
| WO2007073482A3 (en) | Method and apparatus for processing multiphoton curable photoreactive compositions | |
| AU2003276569A1 (en) | Liquid removal in a method and device for irradiating spots on a layer | |
| TW200607772A (en) | Vertical crack forming method and vertical crack forming device in substrate | |
| WO2011066989A8 (en) | Optical irradiation unit for a plant for producing workpieces by irradiation of powder layers with laser radiation | |
| WO2009078324A1 (en) | Method for chamfering/machining brittle material substrate and chamfering/machining apparatus | |
| WO2006114594A3 (en) | Printing system | |
| WO2011154461A3 (en) | Method and device for laser material processing a workpiece | |
| WO2009046468A3 (en) | Method and device for positioning and aligning an object relatively to or with a substrate and use thereof | |
| ATE552066T1 (en) | LASER PROCESSING DEVICE AND LASER PROCESSING METHOD WITH DOUBLE OR MULTIPLE SPOT USING A GALVANOSCANNER | |
| JP2010274328A5 (en) | ||
| DE502007004829D1 (en) | Apparatus and method for welding a workpiece |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| WWE | Wipo information: entry into national phase |
Ref document number: 200880111070.7 Country of ref document: CN |
|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 08837029 Country of ref document: EP Kind code of ref document: A1 |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 2009536970 Country of ref document: JP |
|
| ENP | Entry into the national phase |
Ref document number: 20107007475 Country of ref document: KR Kind code of ref document: A |
|
| NENP | Non-entry into the national phase |
Ref country code: DE |
|
| 122 | Ep: pct application non-entry in european phase |
Ref document number: 08837029 Country of ref document: EP Kind code of ref document: A1 |