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WO2011052941A3 - Etching composition for texturing crystalline silicon-based wafer - Google Patents

Etching composition for texturing crystalline silicon-based wafer Download PDF

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Publication number
WO2011052941A3
WO2011052941A3 PCT/KR2010/007323 KR2010007323W WO2011052941A3 WO 2011052941 A3 WO2011052941 A3 WO 2011052941A3 KR 2010007323 W KR2010007323 W KR 2010007323W WO 2011052941 A3 WO2011052941 A3 WO 2011052941A3
Authority
WO
WIPO (PCT)
Prior art keywords
crystalline silicon
etching composition
based wafer
texturing
texturing crystalline
Prior art date
Application number
PCT/KR2010/007323
Other languages
French (fr)
Other versions
WO2011052941A2 (en
Inventor
Hyung-Pyo Hong
Jae-Youn Lee
Dae-Sung Lim
Seung-Yong Lee
Original Assignee
Dongwoo Fine-Chem Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongwoo Fine-Chem Co., Ltd. filed Critical Dongwoo Fine-Chem Co., Ltd.
Publication of WO2011052941A2 publication Critical patent/WO2011052941A2/en
Publication of WO2011052941A3 publication Critical patent/WO2011052941A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C09K13/02—Etching, surface-brightening or pickling compositions containing an alkali metal hydroxide
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/70—Surface textures, e.g. pyramid structures
    • H10F77/703—Surface textures, e.g. pyramid structures of the semiconductor bodies, e.g. textured active layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Weting (AREA)

Abstract

Disclosed is an etching composition for texturing a crystalline silicon-based wafer, including (A) 0.1 ~ 20 wt% of at least one alkaline compound, (B) 0.1 ~ 50 wt% of at least one cyclic compound having a boiling point of 100 ~ 400°C, and (C) the remainder of water, based on the total weight of the composition.
PCT/KR2010/007323 2009-10-26 2010-10-25 Etching composition for texturing crystalline silicon-based wafer WO2011052941A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2009-0101698 2009-10-26
KR20090101698 2009-10-26

Publications (2)

Publication Number Publication Date
WO2011052941A2 WO2011052941A2 (en) 2011-05-05
WO2011052941A3 true WO2011052941A3 (en) 2011-10-27

Family

ID=43922785

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2010/007323 WO2011052941A2 (en) 2009-10-26 2010-10-25 Etching composition for texturing crystalline silicon-based wafer

Country Status (2)

Country Link
TW (1) TW201118154A (en)
WO (1) WO2011052941A2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8765001B2 (en) 2012-08-28 2014-07-01 Rohm And Haas Electronic Materials Llc Texturing of monocrystalline semiconductor substrates to reduce incident light reflectance

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103890139A (en) * 2011-10-19 2014-06-25 东友精细化工有限公司 Texture etching solution composition and texture etching method of crystalline silicon wafers
TWI480264B (en) * 2013-04-12 2015-04-11 Daxin Materials Corp Liquid crystal alignment agent, liquid crystal alignment film, and liquid crystal display element and method of manufacturing the same
CN104911037A (en) * 2015-07-03 2015-09-16 高旭 Cleaning fluid for industrial products

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19980024804A (en) * 1996-09-20 1998-07-06 하라 타카시 Resin Etching Solution and Etching Method
KR20050043928A (en) * 2002-09-04 2005-05-11 메르크 파텐트 게엠베하 Etching pastes for silicon surfaces and layers
KR100718527B1 (en) * 2006-04-12 2007-05-16 테크노세미켐 주식회사 Stripping solution composition for negative photoresist

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19980024804A (en) * 1996-09-20 1998-07-06 하라 타카시 Resin Etching Solution and Etching Method
KR20050043928A (en) * 2002-09-04 2005-05-11 메르크 파텐트 게엠베하 Etching pastes for silicon surfaces and layers
KR100718527B1 (en) * 2006-04-12 2007-05-16 테크노세미켐 주식회사 Stripping solution composition for negative photoresist

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8765001B2 (en) 2012-08-28 2014-07-01 Rohm And Haas Electronic Materials Llc Texturing of monocrystalline semiconductor substrates to reduce incident light reflectance

Also Published As

Publication number Publication date
WO2011052941A2 (en) 2011-05-05
TW201118154A (en) 2011-06-01

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