WO2016017699A1 - Azole carboxylic acid derivative - Google Patents
Azole carboxylic acid derivative Download PDFInfo
- Publication number
- WO2016017699A1 WO2016017699A1 PCT/JP2015/071516 JP2015071516W WO2016017699A1 WO 2016017699 A1 WO2016017699 A1 WO 2016017699A1 JP 2015071516 W JP2015071516 W JP 2015071516W WO 2016017699 A1 WO2016017699 A1 WO 2016017699A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- methyl
- carboxylic acid
- thiazole
- phenyl
- isobutoxy
- Prior art date
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- WRHZVMBBRYBTKZ-UHFFFAOYSA-N pyrrole-2-carboxylic acid Chemical class OC(=O)C1=CC=CN1 WRHZVMBBRYBTKZ-UHFFFAOYSA-N 0.000 title description 3
- 150000001875 compounds Chemical class 0.000 claims abstract description 323
- 150000003839 salts Chemical class 0.000 claims abstract description 97
- 201000005569 Gout Diseases 0.000 claims abstract description 12
- 201000001431 Hyperuricemia Diseases 0.000 claims abstract description 12
- 208000024172 Cardiovascular disease Diseases 0.000 claims abstract description 9
- 208000032928 Dyslipidaemia Diseases 0.000 claims abstract description 8
- 206010020772 Hypertension Diseases 0.000 claims abstract description 8
- 208000017170 Lipid metabolism disease Diseases 0.000 claims abstract description 8
- 206010012601 diabetes mellitus Diseases 0.000 claims abstract description 8
- 208000023275 Autoimmune disease Diseases 0.000 claims abstract description 7
- 208000022559 Inflammatory bowel disease Diseases 0.000 claims abstract description 7
- 206010045170 Tumour lysis syndrome Diseases 0.000 claims abstract description 7
- 208000017169 kidney disease Diseases 0.000 claims abstract description 7
- 208000023504 respiratory system disease Diseases 0.000 claims abstract description 7
- 208000010380 tumor lysis syndrome Diseases 0.000 claims abstract description 7
- 239000003814 drug Substances 0.000 claims abstract description 4
- 229940079593 drug Drugs 0.000 claims abstract description 3
- 239000008194 pharmaceutical composition Substances 0.000 claims abstract description 3
- -1 monocyclic heteroarene Chemical class 0.000 claims description 153
- 239000002253 acid Substances 0.000 claims description 118
- 125000004432 carbon atom Chemical group C* 0.000 claims description 92
- 125000005843 halogen group Chemical group 0.000 claims description 68
- 229910052757 nitrogen Inorganic materials 0.000 claims description 68
- 125000000217 alkyl group Chemical group 0.000 claims description 45
- 125000003545 alkoxy group Chemical group 0.000 claims description 39
- 125000006239 protecting group Chemical group 0.000 claims description 33
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 20
- 125000003118 aryl group Chemical group 0.000 claims description 19
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 19
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 16
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 14
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 13
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 11
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 8
- 206010007027 Calculus urinary Diseases 0.000 claims description 7
- 125000003277 amino group Chemical group 0.000 claims description 7
- 125000001072 heteroaryl group Chemical group 0.000 claims description 7
- 150000002390 heteroarenes Chemical class 0.000 claims description 6
- 208000008281 urolithiasis Diseases 0.000 claims description 6
- 239000003064 xanthine oxidase inhibitor Substances 0.000 claims description 6
- 239000004480 active ingredient Substances 0.000 claims description 5
- 229940123769 Xanthine oxidase inhibitor Drugs 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 229910052731 fluorine Inorganic materials 0.000 claims description 4
- 125000001153 fluoro group Chemical group F* 0.000 claims description 4
- 125000001887 cyclopentyloxy group Chemical group C1(CCCC1)O* 0.000 claims description 2
- 239000003937 drug carrier Substances 0.000 claims description 2
- 239000005973 Carvone Substances 0.000 claims 4
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Classifications
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- A61K31/395—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
- A61K31/41—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having five-membered rings with two or more ring hetero atoms, at least one of which being nitrogen, e.g. tetrazole
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- A61K31/395—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
- A61K31/41—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having five-membered rings with two or more ring hetero atoms, at least one of which being nitrogen, e.g. tetrazole
- A61K31/425—Thiazoles
- A61K31/427—Thiazoles not condensed and containing further heterocyclic rings
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- A61K31/395—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
- A61K31/41—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having five-membered rings with two or more ring hetero atoms, at least one of which being nitrogen, e.g. tetrazole
- A61K31/433—Thidiazoles
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- A61K31/435—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with one nitrogen as the only ring hetero atom
- A61K31/44—Non condensed pyridines; Hydrogenated derivatives thereof
- A61K31/4427—Non condensed pyridines; Hydrogenated derivatives thereof containing further heterocyclic ring systems
- A61K31/4439—Non condensed pyridines; Hydrogenated derivatives thereof containing further heterocyclic ring systems containing a five-membered ring with nitrogen as a ring hetero atom, e.g. omeprazole
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- A—HUMAN NECESSITIES
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- A61K31/495—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with two or more nitrogen atoms as the only ring heteroatoms, e.g. piperazine or tetrazines
- A61K31/4965—Non-condensed pyrazines
- A61K31/497—Non-condensed pyrazines containing further heterocyclic rings
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D277/00—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
- C07D277/02—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings
- C07D277/20—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
- C07D277/32—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D277/56—Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen
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- C—CHEMISTRY; METALLURGY
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- C07D—HETEROCYCLIC COMPOUNDS
- C07D403/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
- C07D403/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings
- C07D403/10—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings linked by a carbon chain containing aromatic rings
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- C—CHEMISTRY; METALLURGY
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- C07D—HETEROCYCLIC COMPOUNDS
- C07D413/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms
- C07D413/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing two hetero rings
- C07D413/10—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing two hetero rings linked by a carbon chain containing aromatic rings
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D413/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms
- C07D413/14—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing three or more hetero rings
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D417/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00
- C07D417/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings
- C07D417/10—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings linked by a carbon chain containing aromatic rings
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D417/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00
- C07D417/14—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing three or more hetero rings
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
Definitions
- the present invention relates to a novel compound having xanthine oxidase inhibitory activity, a method for producing the same, and a xanthine oxidase inhibitor containing the compound as an active ingredient.
- the present invention includes gout, hyperuricemia, tumor lysis syndrome, urolithiasis, hypertension, dyslipidemia, diabetes, cardiovascular diseases such as arteriosclerosis and heart failure, renal diseases such as diabetic nephropathy,
- the present invention relates to an azolecarboxylic acid derivative useful as a therapeutic or prophylactic agent for diseases involving xanthine oxidase, such as respiratory diseases such as chronic obstructive pulmonary disease, inflammatory bowel disease or autoimmune disease.
- Xanthine oxidase is an enzyme that catalyzes the conversion of hypoxanthine to xanthine and further to uric acid in nucleic acid metabolism.
- xanthine oxidase inhibitors reduce uric acid synthesis by inhibiting uric acid synthesis. That is, it is effective for treating hyperuricemia and various diseases resulting therefrom.
- pathological conditions that occur as a result of persistent hyperuricemia and deposition of urate crystals include gout arthritis called gout and gout nodules. Hyperuricemia is regarded as an important factor in lifestyle-related diseases and metabolic syndrome related to obesity, hypertension, dyslipidemia, and diabetes.
- nephropathy, urolithiasis, cardiovascular disease It is being clarified that it is a risk factor for cancer (Japan Gout / Nucleic Acid Metabolism Society Guidelines Revision Committee, edited by “Guideline for Treatment of Hyperuricemia / Gout, Second Edition”, Medical Review, 2010).
- xanthine oxidase inhibitors are expected to be useful for the treatment of diseases involving reactive oxygen species, for example, for the treatment of cardiovascular diseases through the effect of improving vascular function, due to the activity of inhibiting the generation of reactive oxygen species. (Circulation. 2006; 114: 2508-2516).
- allopurinol and febuxostat are used as therapeutic agents for hyperuricemia, but allopurinol has reported side effects such as Stevens-Johnson syndrome, toxic epidermal necrosis, liver damage, and renal dysfunction (Nippon Rinsho, 2003; 61, Suppul. 1: 197-201).
- Examples of compounds having xanthine oxidase inhibitory activity include 2-phenylthiazole derivatives (Patent Documents 1 to 3), phenylpyrazole derivatives (Patent Documents 4 to 6), and triarylcarboxylic acid derivatives (Patent Documents 7 to 10).
- 2-phenylthiazole derivatives Patent Documents 1 to 3
- phenylpyrazole derivatives Patent Documents 4 to 6
- triarylcarboxylic acid derivatives Patent Documents 7 to 10
- carboxylic acid derivatives which are central bicyclic heterocycles such as 6-indolethiazole derivatives (Patent Documents 11 and 12) and 6-indolepyrazole derivatives (Patent Document 12) have been reported.
- Patent Document 13 and Patent Document 14 report a dithiazolecarboxylic acid derivative having a benzene ring at the center.
- Patent Document 15 and Patent Document 16 report biphenylthiazolecarboxylic acid derivatives.
- the problem to be solved by the present invention is to provide a novel compound having xanthine oxidase inhibitory activity. Furthermore, the subject of this invention is providing the compound which has the outstanding uric acid reduction effect
- action. Another subject of the present invention is gout, hyperuricemia, tumor lysis syndrome, urolithiasis, hypertension, dyslipidemia, diabetes, cardiovascular diseases such as arteriosclerosis and heart failure, diabetic nephropathy, etc. It is intended to provide a compound useful as a therapeutic or prophylactic agent for diseases involving xanthine oxidase, such as renal diseases, respiratory diseases such as chronic obstructive pulmonary disease, inflammatory bowel diseases or autoimmune diseases.
- diseases involving xanthine oxidase such as renal diseases, respiratory diseases such as chronic obstructive pulmonary disease, inflammatory bowel diseases or autoimmune diseases.
- the present invention was completed by finding that it has a typical xanthine oxidase inhibitory activity.
- this azole carboxylic acid derivative is used for gout, hyperuricemia, tumor lysis syndrome, urolithiasis, hypertension, dyslipidemia, diabetes, cardiovascular diseases such as arteriosclerosis and heart failure, diabetic nephropathy, etc.
- the present invention has been completed by finding that it can be a good therapeutic or preventive drug for respiratory diseases such as kidney disease, chronic obstructive pulmonary disease, inflammatory bowel disease or autoimmune disease. That is, the present invention provides [1] a compound represented by the formula (I) or a pharmaceutically acceptable salt thereof:
- R 0 represents the following R 01 or R 02 .
- R 1 represents one or a plurality of alkyl groups having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an aryl group optionally substituted with a halogen atom, OR, or NRR ′ which may form a ring.
- R and R ′ are each independently a hydrogen atom, one or more alkoxy groups having 1 to 8 carbon atoms, a halogen atom or a hydroxyl group optionally substituted with a hydroxyl group.
- R 2 represents a hydrogen atom, an amino group, or an alkyl group having 1 to 8 carbon atoms which may be substituted with one or more halogen atoms.
- X 1 represents CR 3 or a nitrogen atom, wherein R 3 represents a hydrogen atom or a halogen atom.
- Ring A is an alkyl group having 1 to 6 carbon atoms which may be substituted with one or more alkoxy groups having 1 to 3 carbon atoms or a halogen atom, and the number of carbons which may be substituted with one or more halogen atoms. It represents a 5- or 6-membered monocyclic heteroarene which may be substituted with 1 to 6 alkoxy groups and 1 to 4 groups selected from the group consisting of halogen atoms. ]; [2] The heteroarene in ring A is
- R is an aryl group optionally substituted by one or more alkyl groups having 1 to 3 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, a halogen atom or a cyano group. Or a pharmaceutically acceptable salt thereof; [13] R 1 is 1 or more carbon atoms 1-3 alkyl group, an aryl group which may be substituted with an alkoxy group or halogen atom having 1-3 carbon atoms, of [1] to [9] Any of the compounds or pharmaceutically acceptable salts thereof; [14] Any compound selected from compound numbers (1) to (175) or a pharmaceutically acceptable salt thereof. .
- a pharmaceutical composition comprising the compound according to any one of [1] to [14] or a pharmaceutically acceptable salt thereof and a pharmaceutically acceptable carrier;
- a xanthine oxidase inhibitor comprising the compound according to any one of [1] to [14] or a pharmaceutically acceptable salt thereof as an active ingredient;
- Gout hyperuricemia, tumor lysis syndrome, urinary calculus, hypertension comprising the compound according to any one of [1] to [14] or a pharmaceutically acceptable salt thereof as an active ingredient
- R 4 represents the following R 41 or R 42 .
- R 5 represents a protecting group for a carboxyl group.
- the definitions of R 1 , R 2 , X 1 and ring A are the same as in formula (I). ] It is.
- the present invention provides a novel compound having high xanthine oxidase inhibitory activity and a method for producing the same. Furthermore, the compounds of the present invention are particularly useful for gout, hyperuricemia, tumor lysis syndrome, urolithiasis, hypertension, dyslipidemia, diabetes, cardiovascular diseases such as arteriosclerosis and heart failure, kidneys such as diabetic nephropathy, etc. It is useful as a therapeutic or prophylactic agent for diseases involving xanthine oxidase such as diseases, respiratory diseases such as chronic obstructive pulmonary disease, inflammatory bowel diseases or autoimmune diseases.
- Xanthine oxidase is generally used in the broad sense of an enzyme that catalyzes an oxidation reaction from hypoxanthine to xanthine and further to uric acid, and in the narrow sense of an oxidase-type xanthine oxidoreductase that is one of the enzymes that catalyze the reaction.
- xanthine oxidase is a general term for enzymes that catalyze an oxidation reaction from hypoxanthine to xanthine and further to uric acid, unless otherwise specified.
- xanthine oxidoreductase responsible for this reaction, an oxidase type and a dehydrogenase type, both of which are included in the xanthine oxidase of the present invention.
- xanthine oxidase inhibitory activity xanthine oxidase inhibitor
- xanthine oxidase inhibitor has the same meaning as defined above unless otherwise specified.
- halogen atom means a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
- the “alkyl group” means a monovalent saturated linear, cyclic or branched aliphatic hydrocarbon group.
- Examples of the “alkyl group having 1 to 8 carbon atoms” include methyl group, ethyl group, n-propyl group, n-butyl group, n-pentyl group, n-hexyl group, isopropyl group, isobutyl group, and s-butyl.
- t-butyl group isopentyl group, 2-methylbutyl group, neopentyl group, 1-ethylpropyl group, 4-methylpentyl group, 3-methylpentyl group, 2-methylpentyl group, 1-methylpentyl group, 3, 3-dimethylbutyl group, 2,2-dimethylbutyl group, 1,1-dimethylbutyl group, 1,2-dimethylbutyl group, 1,3-dimethylbutyl group, 2,3-dimethylbutyl group, 1-ethylbutyl group 2-ethylbutyl group, t-pentyl group, isohexyl group, cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group, B propyl methyl group, cyclobutylmethyl group, cyclopentylmethyl group, cyclohexylmethyl group, and cyclo
- alkyl group having 1 to 6 carbon atoms examples include methyl group, ethyl group, n-propyl group, n-butyl group, n-pentyl group, n-hexyl group, isopropyl group, isobutyl group, s-butyl group, t-butyl, isopentyl, 2-methylbutyl, neopentyl, 1-ethylpropyl, 4-methylpentyl, 3-methylpentyl, 2-methylpentyl, 1-methylpentyl, 3,3- Dimethylbutyl group, 2,2-dimethylbutyl group, 1,1-dimethylbutyl group, 1,2-dimethylbutyl group, 1,3-dimethylbutyl group, 2,3-dimethylbutyl group, 1-ethylbutyl group, 2 -Ethylbutyl, cyclopropyl, cyclobutyl, cyclopentyl, methyl group,
- the “alkylene group” means a divalent group derived by further removing one hydrogen atom at an arbitrary position from the “alkyl group”.
- Examples of the “C 1-6 alkylene group” include methylene group, ethylene group, n-propylene group, isopropylene group, n-butylene group, isobutylene group, n-pentylene group, n-hexylene group, cyclopropylene group , Cyclobutylene group, cyclohexylene group and the like.
- the “alkoxy group” means a monovalent saturated linear, cyclic or branched aliphatic hydrocarbon oxy group.
- Examples of the “alkoxy group having 1 to 8 carbon atoms” include methoxy group, ethoxy group, n-propoxy group, n-butoxy group, n-pentyloxy group, n-hexaoxy group, isopropoxy group, isobutoxy group, s- Butoxy group, t-butoxy group, isopentyloxy group, 2-methylbutoxy group, neopentyloxy group, cyclopropoxy group, cyclobutoxy group, cyclopentyloxy group, cyclohexyloxy group, cycloheptyloxy group, cyclopropylmethoxy group, A cyclobutyl methoxy group, a cyclopentyl methoxy group, a cyclohexyl methoxy group, etc. are mentioned. Examples of the “C 1-3 al
- the “aryl group” means a monocyclic or bicyclic monovalent aromatic hydrocarbon group having 6 to 10 carbon atoms.
- the aryl group include a phenyl group, a naphthyl group, an indenyl group, a tetrahydronaphthyl group, an indanyl group, and an azulenyl group.
- heteroene means a monocyclic or bicyclic aromatic heterocycle having 1 to 5 heteroatoms selected from an oxygen atom, a sulfur atom, and a nitrogen atom.
- the “5- or 6-membered monocyclic heteroarene” means a 5- or 6-membered monocyclic one of the above “heteroarenes”.
- heteroaryl group refers to a monocyclic or monovalent bicyclic aromatic heterocyclic group having 1 to 5 heteroatoms selected from an oxygen atom, a sulfur atom, and a nitrogen atom.
- Heteroaryl groups include pyridyl, pyrazyl, pyrimidyl, furyl, thienyl, pyrrolyl, isoxazolyl, isothiazolyl, benzofuranyl, benzothienyl, benzothiazolyl, benzoimidazolyl, benzoxazolyl, pyranyl Group, imidazolyl group, oxazolyl group, thiazolyl group, triazinyl group, triazolyl group, benzoxazolyl group, benzoisoxazolyl group and the like.
- the “optionally substituted alkyl group having 1 to 8 carbon atoms” represents an alkyl group having 1 to 8 carbon atoms which may have one or more substituents at substitutable positions. . When a plurality of substituents are present, each substituent may be the same or different.
- the “optionally substituted alkyl group having 1 to 6 carbon atoms”, the “optionally substituted alkyl group having 1 to 3 carbon atoms” and the like have the same meaning.
- optionally substituted alkoxy group having 1 to 8 carbon atoms represents an alkoxy group having 1 to 8 carbon atoms which may have one or more substituents at substitutable positions. . When a plurality of substituents are present, each substituent may be the same or different.
- the “optionally substituted alkoxy group having 1 to 6 carbon atoms”, the “optionally substituted alkoxy group having 1 to 3 carbon atoms” and the like have the same meaning.
- the alkyl group and alkoxy may be combined to form an oxygen-containing saturated ring.
- Such rings include oxirane, oxetane, tetrahydrofuran, tetrahydropyran and the like.
- the “optionally substituted aryl group” means an aryl group which may have one or more substituents at substitutable positions. When a plurality of substituents are present, each substituent may be the same or different.
- the “optionally substituted heteroarene” and the “optionally substituted heteroaryl group” refer to a heteroarene, heteroaryl optionally having one or more substituents at substitutable positions. Each represents an aryl group. When a plurality of substituents are present, each substituent may be the same or different.
- carboxyl-protecting group means, for example, PROTECTIVE GROUPS in ORGANIC SYNTHESIS, THIRD EDITION, John Wiley & Sons, Inc.
- “protective group for phenolic hydroxyl group” means, for example, PROTECTED GROUPS in ORGANIC SYNTHESIS, THIRD EDITION, John Wiley & Sons, Inc.
- R 0 represents the following R 01 or R 02 .
- R 1 forms one or more alkyl groups having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, or an aryl group optionally substituted with a halogen atom, OR, and a ring.
- NRR ′ that may be present, or SR.
- R and R ′ are independently a hydrogen atom, one or a plurality of alkoxy groups having 1 to 8 carbon atoms, a halogen atom or an alkyl group having 1 to 8 carbon atoms which may be substituted with a hydroxyl group, 1 or A plurality of alkyl groups having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an aryl group optionally substituted with a halogen atom or a cyano group, or one or more alkyl groups having 1 to 6 carbon atoms, carbon It represents a heteroaryl group which may be substituted with an alkoxy group of 1 to 6 or a halogen atom.
- R 1 is preferably OR.
- R preferably represents one or more alkoxy groups having 1 to 8 carbon atoms, an alkyl group having 1 to 8 carbon atoms which may be substituted with a halogen atom or a hydroxyl group, or 1 Alternatively, the aryl group may be substituted with a plurality of alkyl groups having 1 to 6 carbon atoms, alkoxy groups having 1 to 6 carbon atoms, halogen atoms, or cyano groups.
- it is an alkyl group having 1 to 8 carbon atoms which may be substituted with one or more alkoxy groups having 1 to 8 carbon atoms or a halogen atom.
- Particularly preferred are isopropyl group, isobutyl group and neopentyl group.
- R 1 is one or a plurality of alkyl groups having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an aryl group optionally substituted with a halogen atom or a cyano group, preferably one or more carbon atoms
- R 2 represents a hydrogen atom, an amino group, or an alkyl group having 1 to 8 carbon atoms which may be substituted with one or more halogen atoms.
- they are a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and specific examples include a methyl group, an ethyl group, an n-propyl group, and an isopropyl group. More preferably, they are a hydrogen atom and a methyl group. Particularly preferred is a methyl group.
- R 0 is R 01 or R 02
- preferred R 1 and R 2 are as described above.
- preferred R 2 can also include an amino group and an alkyl group having 1 to 3 carbon atoms which may be substituted with one or more halogen atoms.
- R 0 is R 02
- more preferable R 2 is a hydrogen atom and an amino group.
- X 1 represents CR 3 or a nitrogen atom
- R 3 represents a hydrogen atom or a halogen atom, and can be represented by the following structural formula, for example.
- Ring A is bonded to a benzene or pyridine ring containing X 1 by a carbon atom on ring A.
- Ring A is an alkyl group having 1 to 6 carbon atoms which may be substituted with one or more alkoxy groups having 1 to 3 carbon atoms or a halogen atom, and the number of carbons which may be substituted with one or more halogen atoms. It represents a 5- or 6-membered monocyclic heteroarene which may be substituted with 1 to 6 alkoxy groups and 1 to 4 groups selected from the group consisting of halogen atoms. Examples of the 5- or 6-membered monocyclic heteroarene in ring A include the following structures.
- Ring A is preferably 5 or 6 optionally substituted with 1 or 2 alkyl groups having 1 to 3 carbon atoms which may be substituted with 1 or 2 alkoxy groups having 1 to 3 carbon atoms.
- Specific examples of preferable ring A are as follows, for example.
- the compound of the present invention is a compound that exhibits excellent xanthine oxidase inhibitory activity. Further, the compound of the present invention has an excellent uric acid lowering action. Specific examples of preferred compounds include the following compounds.
- more preferable compounds are compounds 2, 3, 6, 9, 10, 12, 14, 15, 16, 18, 19, 20, 22, 23, 24, 25, 26, 27, 32, 33, 34. , 35, 36, 37, 38, 39, 41, 42, 43, 45, 46, 47, 48, 49, 51, 52, 53, 54, 55, 56, 58, 59, 62, 63, 65, 66 67, 68, 69, 70, 71, 72, 73, 74, 75, 76, 77, 78, 79, 80, 81, 82, 83, 84, 85, 86, 87, 89, 90, 91, 92 93, 94, 95, 96, 97, 99, 103, 105, 106, 108, 109, 110, 111, 112, 113, 114, 122, 123, 124, 125, 126, 127, 128, 129, 130 139, 140, 14 147, 149, 150, 151, 152, 153, 154, 155,
- R 1 , R 2 , ring A, and X 1 are the above Is the same as defined in formula (I).
- R 5 represents a protecting group for a carboxyl group.
- the definition of the protective group of a carboxyl group is as above-mentioned, Preferably they are a methyl group, an ethyl group, and a benzyl group.
- Formula (I) of the present invention can be synthesized, for example, according to any of the synthetic methods described below.
- R 1 , R 2 , X 1 and ring A are as defined in formula (I).
- R 5 is as defined in formula (II).
- the reagent or solvent as a condition described in the chemical formula is merely an example as described in the text.
- Each substituent may be protected with an appropriate protecting group as necessary, and may be deprotected at an appropriate stage.
- the protecting group of each substituent generally used in this field and a publicly known method can be adopted. . It is described in.
- Z 1 represents a leaving group.
- the leaving group represented by Z 1 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group.
- This reaction is a method of synthesizing compound (A-2) by reacting a phenolic hydroxyl group in compound (A-1) with an alkylating reagent having a leaving group in the presence of a base.
- Examples of basic substances used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium ethoxide, sodium methoxide, t-butoxy potassium, etc.
- Organic amines such as metal alkoxide, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) Used.
- This reaction is carried out by reacting compound (A-1) with an equal amount or a small excess of a base in a solvent inert to the reaction at 0 ° C. to 140 ° C., and then an equal amount or an excess amount of an alkylating reagent. And the reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the solvent is not particularly limited.
- ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, N, N—
- THF tetrahydrofuran
- 1,4-dioxane 1,2-dimethoxyethane
- 1,2-diethoxyethane N, N—
- examples thereof include dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- the bromo group in the compound (A-2) is lithiated with a strong base, then reacted with a boric acid ester, and then the boronic acid ester is hydrolyzed with an acid to a boronic acid, whereby the compound (A -3).
- compound (A-2) and boric acid ester are used in an equal amount or one in excess, and an equal amount or a small excess of strong base is added at ⁇ 78 to 0 ° C. in a solvent inert to the reaction, Usually, the reaction is carried out by adding an acid such as hydrochloric acid after reacting for 0.5 to 12 hours. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- n-butyllithium, t-butyllithium, s-butyllithium or the like is used.
- boric acid esters include trimethoxyboric acid, triethoxyboric acid, and triisopropoxyboric acid.
- the solvent is not particularly limited, but ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, or a mixture thereof A solvent etc. are mentioned.
- Z 2 represents a leaving group.
- the leaving group represented by Z 2 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group.
- This reaction is a method of synthesizing compound (A-4) by coupling reaction of boronic acid compound (A-3) and a heterocyclic compound having a leaving group.
- the compound (A-3) and the heterocyclic compound are used in an equal amount or in excess, and in a solvent inert to the reaction, in the presence of a base and a palladium catalyst, from room temperature to heating under reflux, usually 0.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- the base examples include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate and tripotassium phosphate, metal alkoxides such as sodium ethoxide and sodium methoxide, or these bases And a solution obtained by diluting with water or the like.
- the palladium catalyst tetrakis (triphenylphosphine) palladium, dichlorobis (triphenylphosphine) palladium, palladium chloride-1,1′-bis (diphenylphosphino) ferrocene and the like are preferable.
- This reaction is a conversion reaction from a cyano group to a thioamide group, and is performed by reacting an aromatic cyano group derivative represented by the above formula (A-4) with a sulfur source under acidic conditions.
- compound (A-4) and sulfur source are used in the same amount or in excess, and in an inert solvent for reaction, in the presence of an acid, at room temperature to heating under reflux, usually 0.5 hours to 2 This is done by reacting for a day.
- This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Hydrogen sulfide, thioacetamide or thioacetic acid is used as the sulfur source.
- the acidic substance organic acids such as hydrochloric acid, sulfuric acid and acetic acid, or aqueous solutions of these acids are used.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
- An acid such as acetic acid can also be used as a solvent.
- Z 3 represents a leaving group.
- the leaving group represented by Z 3 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group.
- compounds (A-5) and (A-6) are used in an equal amount or in excess, and in an inert solvent for the reaction, usually at room temperature to heating under reflux, usually 0.5 hours to 2 days. This is done by reacting. Further, an equal amount or an excess amount of a base can be added. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as
- Examples of the base used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate and cesium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, triethylamine, N- Examples include ethyl-N, N-diisopropylamine (DIPEA) and 1,8-diazabicyclo [5.4.0] -7-undecene (DBU).
- inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate and cesium carbonate
- metal alkoxides such as sodium ethoxide and sodium methoxide
- triethylamine N- Examples include ethyl-N, N-diisopropylamine (DIPEA) and 1,8-diazabicyclo [5.4.0] -7-undecene (DBU).
- This reaction is a method for synthesizing the compound (A-8) of the present invention by deprotecting the protecting group R 5 of the compound (A-7) with an acid or a base.
- compound (A-7) is usually reacted for 0.5 hour to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent.
- Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
- R 1 of the compound of the formula (I) is OR, NRR ′ which may form a ring, or SR will be shown.
- the bromo group in compound (A-9) is lithiated with a strong base and then reacted with boric acid ester, followed by hydrolysis of boronic acid ester to boronic acid with acid. -10).
- an equal amount of compound (A-9) and boric acid ester or an excess of one are used, and an equal amount or a small excess of strong base is added at ⁇ 78 ° C. to 0 ° C. in a solvent inert to the reaction.
- the reaction is usually carried out by adding an acid such as hydrochloric acid after reacting for 0.5 to 12 hours. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- n-butyllithium, t-butyllithium, s-butyllithium or the like is used.
- boric acid esters include trimethoxyboric acid, triethoxyboric acid, and triisopropoxyboric acid.
- the solvent is not particularly limited, but ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, or a mixture thereof A solvent etc. are mentioned.
- Z 2 represents a leaving group.
- the leaving group represented by Z 2 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group.
- This reaction is a method for synthesizing compound (A-11) by coupling reaction of boronic acid compound (A-10) with a heterocyclic compound having a leaving group.
- the compound (A-10) and the heterocyclic compound are used in an equal amount or in excess, and in a solvent inert to the reaction, in the presence of a base and a palladium catalyst, from room temperature to heating under reflux, usually 0.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- Bases include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, tripotassium phosphate, metal alkoxides such as sodium BR> G toxide, sodium methoxide, or Examples include solutions obtained by diluting these bases with water or the like.
- the palladium catalyst tetrakis (triphenylphosphine) palladium, dichlorobis (triphenylphosphine) palladium, palladium chloride-1,1′-bis (diphenylphosphino) ferrocene and the like are preferable.
- This reaction is a method for synthesizing compound (A-12) by lithiating, sodiumating or potassiumating alcohols, amines or thiols with a base and then reacting with compound (A-11).
- Examples of basic substances used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium ethoxide, sodium methoxide, t-butoxy potassium, etc.
- Organic amines such as metal alkoxide, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) Used.
- DIPEA N-ethyl-N
- DIPEA N-diisopropylamine
- DBU 1,8-diazabicyclo [5.4.0] -7-undecene
- This reaction is carried out at ⁇ 20 ° C. to 120 ° C. in an solvent inert to the reaction, after reacting compound (A-11) with an equal amount or a small excess of base, and then an equal amount or an excess amount of alcohols.
- Amines or thiols are added, and the reaction is usually carried out for 0.5 to 12 hours.
- This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- diethoxyethane N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
- DMF N-di
- This reaction is a conversion reaction from a cyano group to a thioamide group, and is performed by reacting an aromatic cyano group derivative represented by the above formula (A-12) with a sulfur source under acidic conditions.
- the compound (A-12) and sulfur source are used in an equal amount or one of them in excess, and in an inert solvent for the reaction, in the presence of an acid, from room temperature to heating under reflux, usually from 0.5 hour to 2 This is done by reacting for a day.
- This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Hydrogen sulfide, thioacetamide or thioacetic acid is used as the sulfur source.
- the acidic substance organic acids such as hydrochloric acid, sulfuric acid and acetic acid, or aqueous solutions of these acids are used.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
- An acid such as acetic acid can also be used as a solvent.
- Z 3 represents a leaving group.
- the leaving group represented by Z 3 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group.
- compounds (A-13) and (A-6) are used in an equal amount or in excess, and in an inert solvent for the reaction, at room temperature to heating under reflux, usually 0.5 hours to 2 days This is done by reacting. Further, an equal amount or an excess amount of a base can be added. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as
- Examples of the base used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate and cesium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, triethylamine, N- Examples include ethyl-N, N-diisopropylamine (DIPEA) and 1,8-diazabicyclo [5.4.0] -7-undecene (DBU).
- inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate and cesium carbonate
- metal alkoxides such as sodium ethoxide and sodium methoxide
- triethylamine N- Examples include ethyl-N, N-diisopropylamine (DIPEA) and 1,8-diazabicyclo [5.4.0] -7-undecene (DBU).
- This reaction is a method for synthesizing the compound (A-15) of the present invention by deprotecting the protecting group R 5 of the compound (A-14) with an acid or a base.
- compound (A-14) is usually reacted for 0.5 hours to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent.
- Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
- the compound of formula (A-8) can also be synthesized according to a synthesis method as described below.
- This reaction is a conversion reaction from a cyano group to a thioamide group, and is performed by reacting an aromatic cyano group derivative represented by the above formula (A-2) with a sulfur source under acidic conditions.
- compound (A-2) and sulfur source are used in an equal amount or in excess, and in an inert solvent for reaction, in the presence of an acid, at room temperature to heating under reflux, usually 0.5 hours to 2 This is done by reacting for a day.
- This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Hydrogen sulfide, thioacetamide or thioacetic acid is used as the sulfur source.
- the acidic substance organic acids such as hydrochloric acid, sulfuric acid and acetic acid, or aqueous solutions of these acids are used.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
- An acid such as acetic acid can also be used as a solvent.
- Z 3 represents a leaving group.
- the leaving group represented by Z 3 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group.
- compounds (B-1) and (A-6) are used in equal amounts or in excess, and the reaction is inert to the reaction at room temperature to heating under reflux, usually for 0.5 hour to 2 days. This is done by reacting. Further, an equal amount or an excess amount of a base can be added. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as
- Examples of the base used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate and cesium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, triethylamine, N- Examples include ethyl-N, N-diisopropylamine (DIPEA) and 1,8-diazabicyclo [5.4.0] -7-undecene (DBU).
- inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate and cesium carbonate
- metal alkoxides such as sodium ethoxide and sodium methoxide
- triethylamine N- Examples include ethyl-N, N-diisopropylamine (DIPEA) and 1,8-diazabicyclo [5.4.0] -7-undecene (DBU).
- the bromo group in the compound (B-2) is lithiated with a strong base, then reacted with a boric acid ester, and then the boronic acid ester is hydrolyzed with an acid to a boronic acid, whereby the compound (B -3).
- the compound (B-2) and boric acid ester are used in an equal amount or in an excess amount, and an equal amount or a small excess of a strong base is added at ⁇ 78 to 0 ° C. in a solvent inert to the reaction,
- the reaction is carried out by adding an acid such as hydrochloric acid after reacting for 0.5 to 12 hours. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- n-butyllithium, t-butyllithium, s-butyllithium or the like is used.
- boric acid esters include trimethoxyboric acid, triethoxyboric acid, and triisopropoxyboric acid.
- the solvent is not particularly limited, but ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, or a mixture thereof A solvent etc. are mentioned.
- Z 2 represents a leaving group.
- the leaving group represented by Z 2 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group.
- This reaction is a method of synthesizing compound (A-10) by coupling reaction of boronic acid compound (B-3) and a heterocyclic compound having a leaving group.
- the compound (B-3) and the heterocyclic compound are used in an equal amount or one of them in excess, and in a solvent inert to the reaction, in the presence of a base and a palladium catalyst, from room temperature to heating under reflux, usually 0.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- the base examples include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate and tripotassium phosphate, metal alkoxides such as sodium ethoxide and sodium methoxide, or these bases And a solution obtained by diluting with water or the like.
- the palladium catalyst tetrakis (triphenylphosphine) palladium, dichlorobis (triphenylphosphine) palladium, palladium chloride-1,1′-bis (diphenylphosphino) ferrocene and the like are preferable.
- This reaction is a conversion reaction from a cyano group to a thioamide group, and is performed by reacting an aromatic cyano group derivative represented by the above formula (C-1) with a sulfur source under acidic conditions.
- an equal amount of compound (C-1) and a sulfur source, or one of them in excess is used in an inert solvent for the reaction, in the presence of an acid, at room temperature to heating under reflux, usually for 0.5 hour to 2 hours. This is done by reacting for a day.
- This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Hydrogen sulfide, thioacetamide or thioacetic acid is used as the sulfur source.
- the acidic substance organic acids such as hydrochloric acid, sulfuric acid and acetic acid, or aqueous solutions of these acids are used.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
- An acid such as acetic acid can also be used as a solvent.
- Z 3 represents a leaving group.
- the leaving group represented by Z 3 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group.
- compounds (C-2) and (A-6) are used in an equal amount or in excess, and the reaction is inert to the reaction at room temperature to heating under reflux, usually for 0.5 hour to 2 days. This is done by reacting. Further, an equal amount or an excess amount of a base can be added. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as
- Examples of the base used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate and cesium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, triethylamine, N- Examples include ethyl-N, N-diisopropylamine (DIPEA) and 1,8-diazabicyclo [5.4.0] -7-undecene (DBU).
- inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate and cesium carbonate
- metal alkoxides such as sodium ethoxide and sodium methoxide
- triethylamine N- Examples include ethyl-N, N-diisopropylamine (DIPEA) and 1,8-diazabicyclo [5.4.0] -7-undecene (DBU).
- This reaction is a method in which the compound (C-3) is reacted with hexamethylenetetramine (HMT) in the presence of an acid catalyst to formylate.
- HMT hexamethylenetetramine
- the compound (C-3) and hexamethylenetetramine (HMT) are used in an equal amount or in excess, and usually in an inert solvent in the reaction in the presence of an acid catalyst at room temperature to heating under reflux, usually 0 By reacting for 5 hours to 2 days.
- This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the acid catalyst include formic acid, acetic acid, trifluoroacetic acid, polyphosphoric acid, and the like.
- An acid catalyst can also be used as a solvent.
- Z 1 represents a leaving group.
- the leaving group represented by Z 1 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group.
- This reaction is a method of synthesizing compound (C-5) by reacting a phenolic hydroxyl group in compound (C-4) with an alkylating reagent having a leaving group in the presence of a base.
- Examples of basic substances used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium ethoxide, sodium methoxide, t-butoxy potassium, etc.
- Organic amines such as metal alkoxide, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) Used.
- This reaction is carried out by reacting compound (C-4) with an equal amount or a small excess of a base in a solvent inert to the reaction at 0 ° C. to 140 ° C., followed by an equal amount or an excess amount of an alkylating reagent. And the reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the solvent is not particularly limited.
- ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, N, N—
- THF tetrahydrofuran
- 1,4-dioxane 1,2-dimethoxyethane
- 1,2-diethoxyethane N, N—
- examples thereof include dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- This reaction is a method in which a compound (C-5) is reacted with p-toluenesulfonylacetonitrile (C-6) to synthesize a 1,3-oxazole ring.
- compound (C-5) and p-toluenesulfonylacetonitrile (C-6) are used in an equal amount or in excess, and in a solvent inert to the reaction, in the presence of a base, at room temperature to under reflux.
- the reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- Examples of the base used include carbonates such as potassium carbonate, sodium carbonate and sodium hydrogen carbonate, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5. 4.0] -7-undecene (DBU) and other organic amines are used.
- carbonates such as potassium carbonate, sodium carbonate and sodium hydrogen carbonate
- triethylamine pyridine
- 4-aminopyridine N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5. 4.0] -7-undecene (DBU) and other organic amines are used.
- Solvents used in these reactions include toluene, benzene, pyridine, ethyl acetate, dichloromethane, 1,2-dichloroethane, chloroform, carbon tetrachloride, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2 -Dimethoxyethane, 1,2-diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
- solvents used in these reactions include toluene, benzene, pyridine, ethyl acetate, dichloromethane, 1,2-dichloroethane, chloroform, carbon tetrachloride, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2 -Dimethoxyethane,
- the compound of formula (C-7) can also be synthesized according to the synthesis method as described below.
- R 6 represents a protecting group for a phenolic hydroxyl group.
- This reaction is a method of synthesizing compound (C-9) by deprotecting protecting group R 6 of compound (C-8) with an acid or a base.
- compound (C-8) is usually reacted for 0.5 hour to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent.
- Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
- This reaction is a method of synthesizing compound (C-7) by reacting compound (C-9) with alcohols by Mitsunobu reaction or the like.
- This reaction is a method of synthesizing compound (C-7) by reacting alcohols with triphenylphosphine and carbodiimide and then reacting with compound (C-9).
- Examples of the carbodiimide used include diethyl carbodiimide and diisopropyl carbodiimide.
- an equivalent amount or an excess amount of alcohol, triphenylphosphine and carbodiimide is usually added to 0.5 to 12 in a solvent inert to the reaction at ⁇ 20 ° C. to 120 ° C. This is done by reacting for hours.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- diethoxyethane N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
- DMF N-di
- This reaction is a method for synthesizing the compound (C-10) of the present invention by deprotecting the protecting group R 5 of the compound (C-7) with an acid or a base.
- compound (C-7) is usually reacted for 0.5 hour to 5 days at room temperature to heating under reflux using an equal or excess amount of acid or base in a solvent inert to the reaction. Is done.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent.
- Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
- This reaction is a conversion reaction from a formyl group to a cyano group, and is performed by reacting an aromatic aldehyde derivative represented by the above formula (C-5) with hydroxylamine.
- hydroxylamine other salts such as hydrochloride thereof may be used. In that case, it is preferable to add an appropriate basic substance.
- the reaction can be accelerated by adding 1.0 to 3.0 equivalents of acetic anhydride, acetyl chloride, trichloroacetyl chloride and the like.
- the amount of hydroxylamine or a salt thereof used in these reactions is usually 1 equivalent or more, preferably 1.0 to 2.0 equivalents.
- a basic substance When a basic substance is used, 1.0 to 3.0 equivalents are used with respect to the hydroxylamine salt.
- basic substances to be used carboxylates such as sodium formate, potassium formate and sodium acetate, carbonates such as potassium carbonate, sodium carbonate and sodium hydrogen carbonate, organic amine salts such as triethylamine, pyridine and 4-aminopyridine are used. It is done.
- the reaction is carried out in an inert solvent in the presence of a base at room temperature to heating under reflux, usually for 0.5 hour to 3 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- Solvents used in these reactions include acetic acid, formic acid, toluene, benzene, pyridine, ethyl acetate, dichloromethane, dichloroethane, chloroform, carbon tetrachloride, diethyl ether, tetrahydrofuran, 1,4-dioxane, 1,2-dimethoxyethane. 1,2-diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), methanol, ethanol, 2-propanol and the like.
- This reaction is a reaction in which a tetrazole ring is cyclized from a cyano group, and is performed by reacting an aromatic cyano group derivative represented by the above formula (D-1) with an azide compound in the presence of an acid.
- compound (D-1) and an azide compound are used in an equal amount or in excess, and in an inert solvent for the reaction, in the presence of an acid, from room temperature to heating under reflux, usually from 0.5 hour to This is done by reacting for 2 days.
- This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the azide compound include sodium azide and trimethylsilyl azide.
- Examples of the acid to be used include organic acids such as formic acid and acetic acid, inorganic acids such as hydrochloric acid and sulfuric acid, and inorganic salts such as ammonium chloride and ammonium acetate.
- Solvents used in these reactions include toluene, benzene, dichloromethane, 1,2-dichloroethane, chloroform, carbon tetrachloride, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1 , 2-diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
- organic acids such as formic acid and acetic acid
- inorganic acids such as hydrochloric acid and sulfuric acid
- inorganic salts such as ammonium chloride and ammonium acetate.
- This reaction is a method for synthesizing the compound (D-3) of the present invention by deprotecting the protecting group R 5 of the compound (D-2) with an acid or a base.
- compound (D-2) is usually reacted for 0.5 hours to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent.
- Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
- Examples of the leaving group represented by Z 4 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group.
- This reaction is performed by reacting nitrogen at the 1-position and 2-position on the tetrazole ring in compound (D-2) with an alkylating reagent having a leaving group in the presence of a base. This is a method for synthesizing D-5). This reaction is carried out at 0 ° C. to 140 ° C.
- reaction in the presence of a base in the presence of a base using an equal amount of compound (D-2) and an alkylating reagent in a solvent inert to the reaction, or in a small excess. This is done by reacting for 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- basic substances used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium ethoxide, sodium methoxide, t-butoxy potassium, etc.
- Organic amine salts such as metal alkoxide, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) Is used.
- the solvent is not particularly limited.
- ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, N, N—
- THF tetrahydrofuran
- 1,4-dioxane 1,2-dimethoxyethane
- 1,2-diethoxyethane N, N—
- examples thereof include dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- the protecting groups R 5 of the compounds (D-4) and (D-5) are deprotected with an acid or a base to synthesize the compounds (D-6) and (D-7) of the present invention.
- compounds (D-4) and (D-5) are used in an equivalent amount or in excess of an acid or a base in a solvent inert to the reaction, and the reaction is usually carried out at room temperature to heating under reflux for 0.5 hours. Performed by reacting for ⁇ 5 days.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent.
- Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
- This reaction is a method of synthesizing compound (E-1) by reacting compound (D-1) with hydroxylamine.
- compound (D-1) and hydroxylamine are used in an equal amount or in excess, and in the presence of a base, in a solvent inert to the reaction, at room temperature to heating under reflux, usually 0.5 hours to 2 days This is done by reacting.
- organic bases such as triethylamine, pyridine, 4-aminopyridine are used as the base.
- the base used can also be used as a solvent.
- This reaction is a method of synthesizing compound (E-3) by reacting compound (E-1) with acid chloride (E-2).
- the compound (E-1) and acid chloride (E-2) are used in an equal amount or in excess, and in the presence of a base, in a solvent inert to the reaction, usually at room temperature to heating under reflux, usually 0.
- the reaction is performed for 5 hours to 2 days.
- organic bases such as triethylamine, pyridine, 4-aminopyridine are used as the base.
- the base used can also be used as a solvent.
- This reaction is a method for synthesizing the compound (E-4) of the present invention by deprotecting the protecting group R 5 of the compound (E-3) with an acid or a base.
- compound (E-3) is usually reacted for 0.5 hours to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent.
- Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
- R 8 represents an alkyl group having 1 to 3 carbon atoms
- This reaction is a method of synthesizing the oxadiazole ring compound (E-6) by reacting the compound (E-1) with the orthoformate ester (E-5).
- an equal amount of compound (E-1) and orthoformate ester (E-5), or an excess of either, are used in an inert solvent for the reaction in the presence of an acid at room temperature to heating under reflux.
- the reaction is performed for 0.5 hours to 2 days.
- This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- Examples of the orthoformate ester (E-5) include trimethyl orthoformate and triethyl orthoformate.
- Examples of the acid used include organic acids such as formic acid, acetic acid, hydrochloric acid, sulfuric acid and trifluoroacetic acid.
- Solvents used in these reactions include toluene, benzene, dichloromethane, 1,2-dichloroethane, chloroform, carbon tetrachloride, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1 , 2-diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
- An acid such as trifluoroacetic acid may be used as a solvent. .
- This reaction is a method for synthesizing the compound (E-7) of the present invention by deprotecting the protecting group R 5 of the compound (E-6) with an acid or a base.
- compound (E-6) is usually reacted for 0.5 hour to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent.
- Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
- This reaction is a method of synthesizing compound (F-1) by reacting compound (C-5) with hydroxylamine.
- compound (C-5) and hydroxylamine are used in an equal amount or in excess, and in the presence of a base, in a solvent inert to the reaction, at room temperature to heating under reflux, usually 0.5 hours to 2 days. This is done by reacting.
- organic bases such as triethylamine, pyridine, 4-aminopyridine are used as the base.
- the base used can also be used as a solvent.
- This reaction is a method of synthesizing compound (F-2) by reacting compound (F-1) with a chlorinating reagent.
- compound (F-1) and a chlorinating reagent are used in an equal amount or in excess, and in the presence of a base, in a solvent inert to the reaction, at room temperature to heating under reflux, usually 0.5 hours to 2 This is done by reacting for days.
- N-chlorosuccinimide or the like can be used as the chlorinating reagent.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethylsulfoxide (DMSO), or these A mixed solvent etc. are mentioned.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethan
- This reaction is a method of synthesizing compound (F-4) by reacting compound (F-2) with acetylene compound (F-3).
- the compound (F-2) and the acetylene compound (F-3) are used in an equal amount or in excess, and in the presence of a base, in a solvent inert to the reaction, usually at room temperature to under reflux with heating.
- the reaction is performed for 5 hours to 2 days.
- Examples of the base used include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate and cesium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, triethylamine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) and the like.
- inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate and cesium carbonate
- metal alkoxides such as sodium ethoxide and sodium methoxide
- DIPEA N-ethyl-N, N-diisopropylamine
- DIPEA 1,8-diazabicyclo [5.4.0] -7-undecene
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- diethoxyethane N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
- DMF N-di
- This reaction is a method for synthesizing the compound (F-5) of the present invention by deprotecting the protecting group R 5 of the compound (F-4) with an acid or a base.
- compound (F-4) is usually reacted for 0.5 hour to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent.
- Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
- Z 1 and Z 5 each represent a leaving group, and R 9 represents a protecting group for a carboxyl group.
- the leaving group represented by Z 1 and Z 5 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group.
- This reaction is a method of synthesizing compound (G-2) by reacting a phenolic hydroxyl group in compound (G-1) with an alkylating reagent having a leaving group in the presence of a base.
- Examples of basic substances used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium ethoxide, sodium methoxide, t-butoxy potassium, etc.
- Organic amines such as metal alkoxide, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) Used.
- This reaction is carried out by reacting compound (G-1) with an equal amount or a small excess of a base in a solvent inert to the reaction at 0 ° C. to 140 ° C., and then an equal amount or an excess amount of an alkylating reagent. And the reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the solvent is not particularly limited.
- ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, N, N—
- THF tetrahydrofuran
- 1,4-dioxane 1,2-dimethoxyethane
- 1,2-diethoxyethane N, N—
- examples thereof include dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- Z 5 represents a leaving group
- R 9 represents a protecting group for a carboxyl group.
- This reaction is a method of synthesizing compound (G-3) by deprotecting protecting group R 9 of compound (G-2) with an acid or a base.
- compound (G-2) is usually reacted for 0.5 hour to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent.
- Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
- This reaction is a method of synthesizing compound (G-4) which is acid chloride from compound (G-3).
- compound (G-3) is usually reacted for 0.5 hour to 2 days at room temperature to heating under reflux using an equal or excessive amount of a chlorinating reagent in a solvent inert to the reaction. Is done.
- the chlorinating reagent used include thionyl chloride, oxalyl chloride, and phosphoryl chloride.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane and chloroform, N, N-dimethylformamide ( DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene
- halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane and chloroform, N, N-dimethylformamide ( DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
- This reaction is a method of synthesizing the compound (G-6) which is an oxadiazole ring from the compound (G-4) which is an acid chloride and the compound (G-5).
- compound (G-4) is used in an equivalent amount or in excess of compound (G-5) in the presence of a base in a solvent inert to the reaction, and the reaction is usually carried out at room temperature to heating under reflux. The reaction is performed for a time to 2 days.
- Examples of the base used include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate and cesium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, triethylamine, N-ethyl-N, Examples include organic amines such as N-diisopropylamine (DIPEA) and 1,8-diazabicyclo [5.4.0] -7-undecene (DBU). An organic amine can also be used as a solvent.
- inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate and cesium carbonate
- metal alkoxides such as sodium ethoxide and sodium methoxide
- triethylamine triethylamine
- N-ethyl-N examples include organic amines such as N-diisopropylamine (DIPEA) and 1,8-diaza
- This reaction is a method of synthesizing compound (G-8) by coupling compounds (G-6) and (G-7).
- Examples of the leaving group represented by Z 5 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, a trifluoromethanesulfonyloxy group, and the like.
- compounds (G-6) and (G-7) are used in equal amounts or in excess, and in a solvent inert to the reaction, in the presence of a base and a transition metal catalyst, optionally a ligand, a carboxyl It is carried out by adding an acid and a copper (I or II) salt and reacting at room temperature to heating under reflux, usually for 0.5 hour to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- Bases include lithium hydride, sodium hydride, potassium hydride, sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, potassium fluoride, cesium fluoride, tripotassium phosphate, sodium acetate, acetic acid Metal salts of alkoxides having 1 to 6 carbon atoms such as potassium (lithium salts, sodium salts, potassium salts, magnesium salts), metal salts of alkyl anions having 1 to 6 carbon atoms (lithium salts, sodium salts, potassium salts, magnesium salts) ), Tetra (alkyl having 1 to 4 carbon atoms) ammonium (fluoride, chloride, bromide), diisopropylethylamine, tributylamine, N-methylmorpholine, diazabicycloundecene, diazabicyclooctane, or Examples include imidazole.
- alkoxides having 1 to 6 carbon atoms such as potassium (lithium salts,
- transition metal catalyst examples include copper, palladium, cobalt, iron, rhodium, ruthenium, and iridium.
- ligand examples include tri (t-butyl) phosphine, tri (cyclohexyl) phosphine, t-butyldicyclohexylphosphine, di (t-butyl) cyclohexylphosphine, and di (t-butyl) methylphosphine.
- Copper (I or II) salts include copper (I) chloride, copper (I) bromide, copper (I) iodide, copper (I) acetate, copper (II) fluoride, copper (II) chloride , Copper bromide (II), copper (II) iodide, copper (II) acetate and hydrates thereof, and mixtures thereof.
- the carboxylic acid include formic acid, acetic acid, propionic acid, n-butyric acid, isobutyric acid, pentanoic acid, isopentanoic acid, pivalic acid, and trifluoroacetic acid.
- This reaction is a method for synthesizing the compound (G-9) of the present invention by deprotecting the protecting group R 5 of the compound (G-8) with an acid or a base.
- compound (G-8) is usually reacted for 0.5 hour to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent.
- Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
- Z 1 and Z 6 represent a leaving group.
- the leaving group represented by Z 1 and Z 6 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group.
- This reaction is a method of synthesizing compound (H-2) by reacting a phenolic hydroxyl group in compound (H-1) with an alkylating reagent having a leaving group in the presence of a base.
- Examples of basic substances used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium ethoxide, sodium methoxide, t-butoxy potassium, etc.
- Organic amines such as metal alkoxide, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) Used.
- This reaction is carried out by reacting compound (H-1) with an equal amount or a small excess of a base in a solvent inert to the reaction at 0 ° C. to 140 ° C., followed by an equal amount or an excess amount of an alkylating reagent. And the reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the solvent is not particularly limited.
- ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, N, N—
- THF tetrahydrofuran
- 1,4-dioxane 1,2-dimethoxyethane
- 1,2-diethoxyethane N, N—
- examples thereof include dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- This reaction is a method of synthesizing compound (H-4) by coupling compounds (H-2) and (H-3).
- Examples of the leaving group represented by Z 6 include an iodine atom, a bromine atom, and a chlorine atom.
- compounds (H-2) and (H-3) are used in an equal amount or in excess, and the reaction is carried out in a solvent inert to the reaction in the presence of a base, a copper catalyst and a ligand at room temperature to heating.
- the reaction is usually carried out under reflux for usually 0.5 hours to 3 days.
- This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, ethyl acetate, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), Or these mixed solvents etc. are mentioned.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 Ethers such as diethoxyethane, halogenated hydrocarbons such as dich
- Bases include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, metal alkoxides such as sodium ethoxide, sodium methoxide, triethylamine, N-ethyl -N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) and the like.
- the copper catalyst include copper chloride, copper bromide, copper iodide, and copper oxide.
- the ligand include proline, trans-N, N′-dimethylcyclohexane-1,2-diamine, N, N-dimethylaminoacetic acid, 1,10-phenanthroline and the like.
- This reaction is a method of synthesizing compound (H-5) by brominating the ortho position of the alkoxy group of compound (H-4).
- compound (H-4) and a bromine source are used in an equal amount or in excess, and in an inert solvent for the reaction, in the presence of an acid, from room temperature to heating under reflux, usually from 0.5 hours to This is done by reacting for 2 days.
- This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the bromine source include bromine.
- the acid used include organic acids such as formic acid, acetic acid, hydrochloric acid, sulfuric acid and trifluoroacetic acid.
- the solvent used in these reactions include dichloromethane, 1,2-dichloroethane, chloroform, carbon tetrachloride, or a mixed solvent thereof, and an acid such as acetic acid may be used as the solvent.
- This reaction is a method of synthesizing compound (H-7) which is a borate ester by coupling compound (H-5) and pinacol diborane (H-6).
- compounds (H-5) and (H-6) are used in equal amounts or in excess, and usually in a solvent inert to the reaction in the presence of a base and a palladium catalyst at room temperature to heating under reflux.
- the reaction is performed for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- the base examples include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, potassium acetate, cesium carbonate, and tripotassium phosphate, or solutions obtained by diluting these bases with water.
- inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, potassium acetate, cesium carbonate, and tripotassium phosphate, or solutions obtained by diluting these bases with water.
- the palladium catalyst tetrakis (triphenylphosphine) palladium, dichlorobis (triphenylphosphine) palladium, palladium chloride-1,1'-bis (diphenylphosphino) ferrocene and the like are preferable.
- Z 2 represents a leaving group.
- the leaving group represented by Z 2 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group.
- This reaction is a method of synthesizing compound (H-8) by coupling reaction of borate ester compound (H-7) and a heterocyclic compound having a leaving group.
- the compound (H-7) and the heterocyclic compound are used in an equal amount or in excess, and in an inert solvent for reaction, in the presence of a base and a palladium catalyst, the reaction temperature is usually from 0 to 0 at reflux.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- the base examples include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate and tripotassium phosphate, metal alkoxides such as sodium ethoxide and sodium methoxide, or these bases And a solution obtained by diluting with water or the like.
- the palladium catalyst tetrakis (triphenylphosphine) palladium, dichlorobis (triphenylphosphine) palladium, palladium chloride-1,1′-bis (diphenylphosphino) ferrocene and the like are preferable.
- This reaction is a method for synthesizing the compound (H-9) of the present invention by deprotecting the protecting group R 5 of the compound (H-8) with an acid or a base.
- compound (H-8) is usually reacted for 0.5 hour to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent.
- Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
- Z 1 and Z 7 represent a leaving group.
- the leaving group represented by Z 1 and Z 7 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group.
- This reaction is a method of synthesizing compound (I-2) by reacting a phenolic hydroxyl group in compound (I-1) with an alkylating reagent having a leaving group in the presence of a base.
- Examples of basic substances used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium ethoxide, sodium methoxide, t-butoxy potassium, etc.
- Organic amines such as metal alkoxide, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) Used.
- This reaction is carried out by reacting compound (I-1) with an equal amount or a small excess of a base in a solvent inert to the reaction at 0 ° C. to 140 ° C., and then an equal amount or an excess amount of an alkylating reagent. And the reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the solvent is not particularly limited.
- ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, N, N—
- THF tetrahydrofuran
- 1,4-dioxane 1,2-dimethoxyethane
- 1,2-diethoxyethane N, N—
- examples thereof include dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- This reaction is a method of synthesizing compound (I-3) which is a 1,3-oxazole ring by reacting compound (I-2) with p-toluenesulfonylacetonitrile (C-6).
- compound (I-2) and p-toluenesulfonylacetonitrile (C-6) are used in an equal amount or in excess, and in a solvent inert to the reaction, in the presence of a base, at room temperature to under reflux.
- the reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- Examples of the base used include carbonates such as potassium carbonate, sodium carbonate and sodium hydrogen carbonate, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5. 4.0] -7-undecene (DBU) and other organic amines are used.
- carbonates such as potassium carbonate, sodium carbonate and sodium hydrogen carbonate
- triethylamine pyridine
- 4-aminopyridine N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5. 4.0] -7-undecene (DBU) and other organic amines are used.
- Solvents used in these reactions include toluene, benzene, pyridine, ethyl acetate, dichloromethane, 1,2-dichloroethane, chloroform, carbon tetrachloride, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2 -Dimethoxyethane, 1,2-diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
- solvents used in these reactions include toluene, benzene, pyridine, ethyl acetate, dichloromethane, 1,2-dichloroethane, chloroform, carbon tetrachloride, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2 -Dimethoxyethane,
- This reaction is a method of synthesizing compound (I-4) by coupling compounds (I-3) and (H-3).
- Examples of the leaving group represented by Z 7 include an iodine atom, a bromine atom, and a chlorine atom.
- compounds (I-3) and (H-3) are used in an equal amount or in excess, and the reaction is carried out in a solvent inert to the reaction in the presence of a base, a copper catalyst and a ligand at room temperature to heating.
- the reaction is usually carried out under reflux for usually 0.5 hours to 3 days.
- This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, ethyl acetate, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), Or these mixed solvents etc. are mentioned.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 Ethers such as diethoxyethane, halogenated hydrocarbons such as dich
- Bases include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, metal alkoxides such as sodium ethoxide, sodium methoxide, triethylamine, N-ethyl -N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) and the like.
- the copper catalyst include copper chloride, copper bromide, copper iodide, and copper oxide.
- the ligand include proline, trans-N, N′-dimethylcyclohexane-1,2-diamine, N, N-dimethylaminoacetic acid, 1,10-phenanthroline and the like.
- This reaction is a method for synthesizing the compound (I-5) of the present invention by deprotecting the protecting group R 5 of the compound (I-4) with an acid or a base.
- compound (I-4) is usually reacted for 0.5 hours to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent.
- Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
- Z 8 and Z 9 represent a leaving group.
- the leaving group represented by Z 8 and Z 9 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group.
- This reaction is a method of synthesizing compound (J-2) by lithiating or sodiumating the 4-position of pyridine in compound (J-1) with a base and then formylating with a formylating agent.
- the base include lithium diisopropylamine (LDA) prepared from diisopropylamine and n-butyllithium.
- LDA lithium diisopropylamine
- Examples of the formylating agent include N, N-dimethylformamide (DMF) and N-formylmorpholine.
- DMF N, N-dimethylformamide
- N-formylmorpholine N, N-dimethylformamide (DMF) and N-formylmorpholine.
- This reaction is carried out at ⁇ 78 ° C. to 0 ° C. in a solvent inert to the reaction by subjecting compound (J-1) to an equal amount or a small excess of the base, followed by an equal amount or an excess amount of formylation.
- the reaction is usually performed by adding an agent and reacting for 0.5 to 5 hours. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the solvent is not particularly limited, but ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, or a mixture thereof A solvent etc. are mentioned.
- Z 8 and Z 9 represent a leaving group
- Z 10 represents —B (OH) 2 or —B (OR 10 ) OR 11 , where R 10 and R 11 independently represent 1 carbon atom.
- An alkyl group of ⁇ 6, or R 10 and R 11 together represent an alkylene group of 1 to 6 carbon atoms.
- compound (J-4) is synthesized by coupling J-3).
- Examples of the leaving group represented by Z 8 and Z 9 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group.
- compounds (J-2) and (J-3) are used in equal amounts or in excess, and usually in a solvent inert to the reaction in the presence of a base and a palladium catalyst at room temperature to heating under reflux.
- the reaction is performed for 0.5 hours to 2 days.
- This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- the base examples include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate and tripotassium phosphate, metal alkoxides such as sodium ethoxide and sodium methoxide, or these bases And a solution obtained by diluting with water or the like.
- the palladium catalyst tetrakis (triphenylphosphine) palladium, dichlorobis (triphenylphosphine) palladium, palladium chloride-1,1′-bis (diphenylphosphino) ferrocene and the like are preferable.
- Z 8 represents a leaving group.
- the leaving group represented by Z 8 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group.
- This reaction is a conversion reaction from a formyl group to a cyano group, and is performed by reacting an aromatic aldehyde derivative represented by the above formula (J-4) with hydroxylamine.
- hydroxylamine other salts such as hydrochloride thereof may be used. In that case, it is preferable to add an appropriate basic substance.
- the reaction can be accelerated by adding 1.0 to 3.0 equivalents of acetic anhydride, acetyl chloride, trichloroacetyl chloride and the like.
- the amount of hydroxylamine or a salt thereof used in these reactions is usually 1 equivalent or more, preferably 1.0 to 2.0 equivalents.
- 1.0 to 3.0 equivalents are used with respect to the hydroxylamine salt.
- basic substances to be used carboxylates such as sodium formate, potassium formate and sodium acetate, carbonates such as potassium carbonate, sodium carbonate and sodium hydrogen carbonate, organic amines such as triethylamine, pyridine and 4-aminopyridine are used. .
- the reaction is carried out in an inert solvent in the presence of a base at room temperature to heating under reflux, usually for 0.5 hour to 3 days.
- This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- Solvents used in these reactions include acetic acid, formic acid, toluene, benzene, pyridine, ethyl acetate, dichloromethane, 1,2-dichloroethane, chloroform, carbon tetrachloride, diethyl ether, tetrahydrofuran, 1,4-dioxane, 1, Examples include 2-dimethoxyethane, 1,2-diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), methanol, ethanol, 2-propanol and the like.
- This reaction is a method of synthesizing compound (J-6) by coupling compound (J-5) and (G-7).
- Examples of the leaving group represented by Z 8 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group.
- compounds (J-5) and (G-7) are used in equal amounts or in excess, and in a solvent inert to the reaction, in the presence of a base and a transition metal catalyst, optionally a ligand, a carboxyl It is carried out by adding an acid and a copper (I or II) salt and reacting at room temperature to heating under reflux, usually for 0.5 hour to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- Bases include lithium hydride, sodium hydride, potassium hydride, sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, potassium fluoride, cesium fluoride, tripotassium phosphate, sodium acetate, acetic acid Metal salts of alkoxides having 1 to 6 carbon atoms such as potassium (lithium salts, sodium salts, potassium salts, magnesium salts), metal salts of alkyl anions having 1 to 6 carbon atoms (lithium salts, sodium salts, potassium salts, magnesium salts) ), Tetra (alkyl having 1 to 4 carbon atoms) ammonium (fluoride, chloride, bromide), diisopropylethylamine, tributylamine, N-methylmorpholine, diazabicycloundecene, diazabicyclooctane, or Examples include imidazole.
- alkoxides having 1 to 6 carbon atoms such as potassium (lithium salts,
- transition metal catalyst examples include copper, palladium, cobalt, iron, rhodium, ruthenium, and iridium.
- ligand examples include tri (t-butyl) phosphine, tri (cyclohexyl) phosphine, t-butyldicyclohexylphosphine, di (t-butyl) cyclohexylphosphine, and di (t-butyl) methylphosphine.
- Copper (I or II) salts include copper (I) chloride, copper (I) bromide, copper (I) iodide, copper (I) acetate, copper (II) fluoride, copper (II) chloride , Copper bromide (II), copper (II) iodide, copper (II) acetate and hydrates thereof, and mixtures thereof.
- the carboxylic acid include formic acid, acetic acid, propionic acid, n-butyric acid, isobutyric acid, pentanoic acid, isopentanoic acid, pivalic acid, and trifluoroacetic acid.
- This reaction is a reaction in which a tetrazole ring is cyclized from a cyano group, and is performed by reacting an aromatic cyano group derivative represented by the above formula (J-6) with an azide compound in the presence of an acid.
- compound (J-6) and an azide compound are used in an equal amount or in excess, and in an inert solvent for the reaction, in the presence of an acid, from room temperature to heating under reflux, usually from 0.5 hour to This is done by reacting for 2 days.
- This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the azide compound include sodium azide and trimethylsilyl azide.
- Examples of the acid to be used include organic acids such as formic acid and acetic acid, inorganic acids such as hydrochloric acid and sulfuric acid, and inorganic salts such as ammonium chloride and ammonium acetate.
- Solvents used in these reactions include toluene, benzene, dichloromethane, 1,2-dichloroethane, chloroform, carbon tetrachloride, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1 , 2-diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
- organic acids such as formic acid and acetic acid
- inorganic acids such as hydrochloric acid and sulfuric acid
- inorganic salts such as ammonium chloride and ammonium acetate.
- This reaction is a method for synthesizing the compound (J-8) of the present invention by deprotecting the protecting group R 5 of the compound (J-7) with an acid or a base.
- compound (J-7) is usually reacted for 0.5 hour to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent.
- Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
- This reaction is a method of synthesizing compound (K-1) by coupling compound (J-4) and (G-7).
- Examples of the leaving group represented by Z 8 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group.
- compounds (J-4) and (G-7) are used in equal amounts or in excess, and in a solvent inert to the reaction, in the presence of a base and a transition metal catalyst, optionally a ligand, a carboxyl It is carried out by adding an acid and a copper (I or II) salt and reacting at room temperature to heating under reflux, usually for 0.5 hour to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- Bases include lithium hydride, sodium hydride, potassium hydride, sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, potassium fluoride, cesium fluoride, tripotassium phosphate, sodium acetate, acetic acid Metal salts of alkoxides having 1 to 6 carbon atoms such as potassium (lithium salts, sodium salts, potassium salts, magnesium salts), metal salts of alkyl anions having 1 to 6 carbon atoms (lithium salts, sodium salts, potassium salts, magnesium salts) ), Tetra (alkyl having 1 to 4 carbon atoms) ammonium (fluoride, chloride, bromide), diisopropylethylamine, tributylamine, N-methylmorpholine, diazabicycloundecene, diazabicyclooctane, or Examples include imidazole.
- alkoxides having 1 to 6 carbon atoms such as potassium (lithium salts,
- transition metal catalyst examples include copper, palladium, cobalt, iron, rhodium, ruthenium, and iridium.
- ligand examples include tri (t-butyl) phosphine, tri (cyclohexyl) phosphine, t-butyldicyclohexylphosphine, di (t-butyl) cyclohexylphosphine, and di (t-butyl) methylphosphine.
- Copper (I or II) salts include copper (I) chloride, copper (I) bromide, copper (I) iodide, copper (I) acetate, copper (II) fluoride, copper (II) chloride , Copper bromide (II), copper (II) iodide, copper (II) acetate and hydrates thereof, and mixtures thereof.
- the carboxylic acid include formic acid, acetic acid, propionic acid, n-butyric acid, isobutyric acid, pentanoic acid, isopentanoic acid, pivalic acid, and trifluoroacetic acid.
- This reaction is a method of synthesizing a 1,3-oxazole ring by reacting compound (K-1) with p-toluenesulfonylacetonitrile (C-6).
- compound (K-1) and p-toluenesulfonylacetonitrile (C-6) are used in an equal amount or in excess, and in a solvent inert to the reaction in the presence of a base, from room temperature to heating under reflux.
- the reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- Examples of the base used include carbonates such as potassium carbonate, sodium carbonate and sodium hydrogen carbonate, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5. 4.0] -7-undecene (DBU) and other organic amines are used.
- carbonates such as potassium carbonate, sodium carbonate and sodium hydrogen carbonate
- triethylamine pyridine
- 4-aminopyridine N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5. 4.0] -7-undecene (DBU) and other organic amines are used.
- Solvents used in these reactions include toluene, benzene, pyridine, ethyl acetate, dichloromethane, 1,2-dichloroethane, chloroform, carbon tetrachloride, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2 -Dimethoxyethane, 1,2-diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
- solvents used in these reactions include toluene, benzene, pyridine, ethyl acetate, dichloromethane, 1,2-dichloroethane, chloroform, carbon tetrachloride, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2 -Dimethoxyethane,
- This reaction is a method for synthesizing the compound (K-3) of the present invention by deprotecting the protecting group R 5 of the compound (K-2) with an acid or a base.
- compound (K-2) is usually reacted for 0.5 hour to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent.
- Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
- R 1 is an alkyl group having 1 or 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, or an aryl group optionally substituted with a halogen atom. It is common.
- R 6 represents a protecting group for a phenolic hydroxyl group
- Z 11 represents a leaving group.
- the leaving group represented by Z 11 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group.
- This reaction is a method of synthesizing compound (L-2) by reacting a phenolic hydroxyl group in compound (L-1) with an alkylating reagent having a leaving group in the presence of a base.
- Examples of basic substances used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium ethoxide, sodium methoxide, t-butoxy potassium, etc.
- Organic amines such as metal alkoxide, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) Used.
- This reaction is carried out by reacting the compound (L-1) with an equal amount or a small excess of a base in a solvent inert to the reaction at 0 ° C. to 140 ° C., followed by an equal amount or an excess amount of an alkylating reagent. And the reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the solvent is not particularly limited.
- ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, N, N—
- THF tetrahydrofuran
- 1,4-dioxane 1,2-dimethoxyethane
- 1,2-diethoxyethane N, N—
- examples thereof include dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- R 6 represents a protecting group for a phenolic hydroxyl group.
- This reaction is a method of synthesizing compound (L-3) by lithiating the 4-position of pyridine in compound (L-2) with a strong base and then brominating.
- an equal amount or a small excess of strong base was added to compound (L-2) in a solvent inert to the reaction at ⁇ 78 ° C. to 0 ° C., and the reaction was usually performed for 0.5 to 12 hours. Later, by adding a bromine source.
- This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the strong base to be used, n-butyllithium, t-butyllithium, s-butyllithium or the like is used.
- bromination reagent examples include carbon tetrabromide.
- the solvent is not particularly limited, and examples thereof include ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane.
- R 6 represents a protecting group for a phenolic hydroxyl group.
- This reaction is a method for synthesizing compound (L-4) by deprotecting protecting group R 6 of compound (L-3) with an acid or a base.
- compound (L-3) is usually reacted for 0.5 hour to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent.
- Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
- Z 1 represents a leaving group.
- the leaving group represented by Z 1 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group.
- This reaction is a method of synthesizing compound (L-5) by reacting a phenolic hydroxyl group in compound (L-4) with an alkylating reagent having a leaving group in the presence of a base.
- Examples of basic substances used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium ethoxide, sodium methoxide, t-butoxy potassium, etc.
- Organic amines such as metal alkoxide, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) Used.
- This reaction is carried out by reacting the compound (L-4) with an equal amount or a small excess of a base in a solvent inert to the reaction at 0 ° C. to 140 ° C., and then an equal amount or an excess amount of an alkylating reagent. And the reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the solvent is not particularly limited.
- ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, N, N—
- THF tetrahydrofuran
- 1,4-dioxane 1,2-dimethoxyethane
- 1,2-diethoxyethane N, N—
- examples thereof include dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- This reaction is a method of synthesizing compound (L-6) by oxidizing the methyl group at the 2-position of pyridine in compound (L-5) with an oxidizing agent.
- an oxidizing agent to be used, a manganese salt such as potassium permanganate is used.
- an equal amount or a small excess of an oxidizing agent is added to compound (L-5) in a solvent inert to the reaction at 0 ° C. to 120 ° C., and the reaction is usually performed for 0.5 hour to 2 days. Is done by.
- This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the solvent is not particularly limited.
- ethers such as 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, N, N-dimethylformamide (DMF), water or These mixed solvents are exemplified.
- This reaction is a method of synthesizing the amide compound (L-7) by reacting the carboxyl group of the compound (L-6) with ammonia.
- This reaction is performed according to literature methods (for example, peptide synthesis basics and experiment, Nobuo Izumiya et al., Maruzen, 1983, Comprehensive Organic Synthesis, Vol. 6, Pergamon Press, 1991, etc.)
- the conventional amide formation reaction may be carried out by a method according to the above or a combination thereof with a conventional method, that is, by using a condensing agent well known to those skilled in the art, or an ester available to those skilled in the art.
- amide-forming reagents include thionyl chloride, oxalyl chloride, N, N-dicyclohexylcarbodiimide, 1-methyl-2-bromopyridinium iodide, N, N′-carbonyldiimidazole, diphenylphosphoryl chloride, diphenyl.
- thionyl chloride, oxalyl chloride, 1-ethyl-3- (3-dimethylaminopropyl) carbodiimide hydrochloride or 2- (7-aza-1H-benzotriazol-1-yl) -1,1,3,3 -Tetramethyluronium, hexafluorophosphate, etc. are preferred.
- a base and a condensation aid may be used together with the amide forming reagent. Examples of the condensation aid used include N-hydroxybenzotriazole hydrate and N-hydroxysuccinimide.
- compound (L-6) and ammonia are used in an equal amount or in excess, and in a solvent inert to the reaction, in the presence of a condensing agent and a base, usually at room temperature to heating under reflux, usually 0.5 It is carried out by reacting for a time to 3 days.
- This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, ethyl acetate, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), Examples thereof include pyridine or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 Ethers such as diethoxyethane, halogenated hydrocarbons
- Examples of the base used include trimethylamine, triethylamine, N, N-diisopropylethylamine, N-methylmorpholine, N-methylpyrrolidine, N-methylpiperidine, N, N-dimethylaniline, and 1,8-diazabicyclo [5.
- tertiary aliphatic amines such as undec-7-ene, 1,5-azabicyclo [4.3.0] non-5-ene; pyridine, 4-dimethylaminopyridine, picoline, lutidine, quinoline or Examples include aromatic amines such as isoquinoline, among which tertiary aliphatic amines are preferable, and triethylamine or N, N-diisopropylethylamine is particularly preferable.
- This reaction is a method of synthesizing compound (L-8) by dehydrating the amide group of compound (L-7) with an acid.
- This reaction is carried out by reacting compound (L-7) with an acid in an equivalent amount or in excess in a solvent inert to the reaction, usually at room temperature to heating under reflux, usually for 0.5 hour to 5 days. Done.
- the solvent is not particularly limited, and examples thereof include aromatic hydrocarbons such as benzene, toluene and xylene, and halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane and chloroform.
- the acid include thionyl chloride, oxalyl chloride, phosphoryl chloride, and phenylphosphonyl dichloride.
- Z 2 represents —B (OH) 2 or —B (OR 10 ) OR 11 , wherein R 10 and R 11 are independently an alkyl group having 1 to 6 carbon atoms, or R 10 and R 11 together represents an alkylene group having 1 to 6 carbon atoms.
- Examples of the leaving group represented by Z 2 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group.
- This reaction is a method of synthesizing compound (L-9) by coupling reaction of compound (L-8) and a heterocyclic compound having boric acid or boric acid ester.
- the compound (L-8) and the heterocyclic compound are used in an equal amount or in excess, and in a solvent inert to the reaction, in the presence of a base and a palladium catalyst, from room temperature to heating under reflux, usually 0. It is carried out by reacting for 5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- the base examples include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate and tripotassium phosphate, metal alkoxides such as sodium ethoxide and sodium methoxide, or these bases And a solution obtained by diluting with water or the like.
- the palladium catalyst tetrakis (triphenylphosphine) palladium, dichlorobis (triphenylphosphine) palladium, palladium chloride-1,1′-bis (diphenylphosphino) ferrocene and the like are preferable.
- This reaction is a conversion reaction from a cyano group to a thioamide group, and is performed by reacting an aromatic cyano group derivative represented by the above formula (L-9) with a sulfur source under acidic conditions.
- compound (L-9) and a sulfur source are used in an equal amount or in excess, and in an inert solvent for the reaction, in the presence of an acid, at room temperature to heating under reflux, usually 0.5 hours to 2 This is done by reacting for a day.
- This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Hydrogen sulfide, thioacetamide or thioacetic acid is used as the sulfur source.
- the acidic substance organic acids such as hydrochloric acid, sulfuric acid and acetic acid, or aqueous solutions of these acids are used.
- the solvent is not particularly limited.
- aromatic hydrocarbons such as benzene, toluene and xylene, alcohols such as methanol and ethanol, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1, Examples thereof include ethers such as 2-dimethoxyethane and 1,2-diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
- An acid such as acetic acid can also be used as a solvent.
- Z 3 represents a leaving group.
- the leaving group represented by Z 3 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group.
- compounds (L-10) and (A-6) are used in an equal amount or in excess, and the reaction is inert to the reaction at room temperature to heating under reflux, usually for 0.5 hour to 2 days. This is done by reacting. Further, an equal amount or an excess amount of a base can be added. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as
- Examples of the base used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate and cesium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, triethylamine, N- Examples include ethyl-N, N-diisopropylamine (DIPEA) and 1,8-diazabicyclo [5.4.0] -7-undecene (DBU).
- inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate and cesium carbonate
- metal alkoxides such as sodium ethoxide and sodium methoxide
- triethylamine N- Examples include ethyl-N, N-diisopropylamine (DIPEA) and 1,8-diazabicyclo [5.4.0] -7-undecene (DBU).
- This reaction is a method for synthesizing the compound (L-12) of the present invention by deprotecting the protecting group R 5 of the compound (L-11) with an acid or a base.
- compound (L-11) is usually reacted for 0.5 hour to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent.
- Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
- Z 1 and Z 12 each represent a leaving group.
- the leaving group represented by Z 1 and Z 12 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group.
- This reaction is a method of synthesizing compound (M-2) by reacting a phenolic hydroxyl group in compound (M-1) with an alkylating reagent having a leaving group in the presence of a base.
- Examples of basic substances used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium ethoxide, sodium methoxide, t-butoxy potassium, etc.
- Organic amines such as metal alkoxide, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) Used.
- This reaction is carried out by reacting compound (M-1) with an equal amount or a small excess of a base in a solvent inert to the reaction at 0 ° C. to 140 ° C., followed by an equal amount or an excess amount of an alkylating reagent. And the reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the solvent is not particularly limited.
- ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, N, N—
- THF tetrahydrofuran
- 1,4-dioxane 1,2-dimethoxyethane
- 1,2-diethoxyethane N, N—
- examples thereof include dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- Z 12 represents a leaving group.
- Examples of the leaving group represented by Z 12 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group.
- This reaction is a method of synthesizing compound (M-3) by lithiating the 4-position of pyridine in compound (M-2) with a strong base and then formylating. In this reaction, an equal amount or a small excess of strong base was added to compound (M-2) at ⁇ 78 ° C. to 0 ° C. in a solvent inert to the reaction, and the reaction was usually carried out for 0.5 to 12 hours.
- a formylating agent is added.
- This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- an inert gas atmosphere such as nitrogen.
- the strong base to be used n-butyllithium, t-butyllithium, s-butyllithium or the like is used.
- the formylation reagent include methyl formate, hexamethylenetetramine, N, N-dimethylformamide and the like.
- the solvent is not particularly limited, and examples thereof include ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane.
- Z 12 represents a leaving group.
- the leaving group represented by Z 12 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group.
- This reaction is a method of synthesizing a 1,3-oxazole ring by reacting compound (M-3) with p-toluenesulfonylacetonitrile (C-6).
- compound (M-3) and p-toluenesulfonylacetonitrile (C-6) are used in an equal amount or in excess, and in a solvent inert to the reaction, in the presence of a base, at room temperature to heating under reflux.
- the reaction is usually carried out for 0.5 hours to 2 days.
- This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the base used include carbonates such as potassium carbonate, sodium carbonate and sodium hydrogen carbonate, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.
- DBU dimethyl sulfoxide
- Solvents used in these reactions include toluene, benzene, pyridine, ethyl acetate, dichloromethane, 1,2-dichloroethane, chloroform, carbon tetrachloride, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2 -Dimethoxyethane, 1,2-diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
- solvents used in these reactions include toluene, benzene, pyridine, ethyl acetate, dichloromethane, 1,2-dichloroethane, chloroform, carbon tetrachloride, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,
- This reaction is a method of synthesizing compound (M-5) by coupling compound (M-4) and (H-3).
- Examples of the leaving group represented by Z 12 include an iodine atom, a bromine atom, and a chlorine atom.
- compounds (M-4) and (H-3) are used in an equal amount or in excess, and in a solvent inert to the reaction, in the presence of a base, a copper catalyst and a ligand, from room temperature to heating
- the reaction is usually carried out under reflux for usually 0.5 hours to 3 days.
- This reaction is preferably carried out in an inert gas atmosphere such as nitrogen.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, ethyl acetate, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), Or these mixed solvents etc. are mentioned.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 Ethers such as diethoxyethane, halogenated hydrocarbons such as dich
- Bases include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, metal alkoxides such as sodium ethoxide, sodium methoxide, triethylamine, N-ethyl -N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) and the like.
- the copper catalyst include copper chloride, copper bromide, copper iodide, and copper oxide.
- the ligand include proline, trans-N, N′-dimethylcyclohexane-1,2-diamine, N, N-dimethylaminoacetic acid, 1,10-phenanthroline and the like.
- This reaction is a method for synthesizing the compound (M-6) of the present invention by deprotecting the protecting group R 5 of the compound (M-5) with an acid or a base.
- compound (M-5) is usually reacted for 0.5 hour to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done.
- the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
- aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers
- Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent.
- Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
- the pharmaceutically acceptable salt of the compound represented by the formula (I) is not particularly limited as long as it is a pharmaceutically acceptable salt.
- a salt include hydrogen chloride, Salts with inorganic acids such as hydrogen bromide, sulfuric acid, nitric acid, phosphoric acid, carbonic acid; maleic acid, fumaric acid, citric acid, malic acid, tartaric acid, lactic acid, succinic acid, benzoic acid, oxalic acid, methanesulfonic acid, benzene Salts with organic acids such as sulfonic acid, p-toluenesulfonic acid, acetic acid, trifluoroacetic acid, formic acid; salts with amino acids such as glycine, lysine, arginine, histidine, ornithine, glutamic acid, aspartic acid; sodium, potassium, lithium Salts with alkali metals such as calcium; Salts with alkaline earth metals such as calcium and magnesium; Salt
- present invention (I) and salts thereof include various hydrates and solvates.
- the compounds of the present invention also include stereoisomers, racemates, and all possible optically active forms of the compounds represented by formula (I).
- the compound represented by the formula (I) of the present invention and a pharmaceutically acceptable salt thereof have particularly excellent xanthine oxidase inhibitory activity. Due to its excellent xanthine oxidase inhibitory activity, the compounds represented by the formula (I) of the present invention and pharmaceutically acceptable salts thereof are useful as xanthine oxidase inhibitors.
- the compound represented by the formula (I) of the present invention and a pharmaceutically acceptable salt thereof are clinically applicable as a xanthine oxidase inhibitor, gout, hyperuricemia, oncolysis syndrome, urolithiasis , Hypertension, dyslipidemia, diabetes, cardiovascular diseases such as arteriosclerosis and heart failure, kidney diseases such as diabetic nephropathy, respiratory diseases such as chronic obstructive pulmonary disease, inflammatory bowel disease or autoimmune disease It can be used as a therapeutic or prophylactic agent for diseases involving xanthine oxidase.
- prevention means prevention of morbidity or onset in an individual who has not yet been affected or developed
- treatment refers to disease or It means healing, suppressing or ameliorating symptoms.
- the compound represented by the formula (I) and a pharmaceutically acceptable salt thereof can be made into a pharmaceutical composition together with a pharmaceutically acceptable carrier and / or diluent.
- This pharmaceutical composition can be formed into various dosage forms and administered orally or parenterally.
- Parenteral administration includes, for example, intravenous, subcutaneous, intramuscular, transdermal, or rectal administration.
- Formulations containing one or more of the compounds represented by the formula (I) of the present invention or salts thereof as active ingredients are prepared using carriers, excipients and other additives that are usually used for formulation.
- the carrier or excipient for the preparation may be either solid or liquid, such as lactose, magnesium stearate, starch, talc, gelatin, agar, pectin, gum arabic, olive oil, sesame oil, cocoa butter, ethylene glycol, etc.
- Administration may be in any form of oral administration such as tablets, pills, capsules, granules, powders, liquids, or parenteral administration such as injections such as intravenous injection and intramuscular injection, suppositories, and transdermal. Good.
- the compound represented by the formula (I) of the present invention or a pharmaceutically acceptable salt thereof varies depending on the type of disease, administration route, patient symptom, age, sex, body weight, etc. It can be administered in the range of 0.01 to 1000 mg per dose or divided into several doses. However, since the dose varies depending on various conditions, a dose smaller than the above dose may be sufficient, or a dose exceeding the above range may be required.
- Mass that is, actual measurement in which proton (H + ) was added to the molecular mass (M) of the compound, which was observed by the apparatus and analysis conditions described below. value), the calculated value of "M + + H” (pred. Mass), actually measured "M + + H” value calculated from the composition formula of (formula) are also shown.
- the resulting crude product is purified by a conventional method to obtain 67.0 mg of 4-isobutoxy-3- (pyridin-2-yl) benzonitrile. It was. ESI / MS m / e: 253.1 (M + + H, C 16 H 17 N 2 O) (4) 67.0 mg of 4-isobutoxy-3- (pyridin-2-yl) benzonitrile was suspended in 0.3 mL of acetic acid and 0.5 mL of thioacetic acid, and heated at 50 ° C. for 14 hours under a nitrogen atmosphere. Thereafter, concentration under reduced pressure was performed to obtain a crude product of 4-isobutoxy-3- (pyridin-2-yl) benzene-1-carbothioamide.
- Example 2-6 In the same manner as in Example 1, Compound Nos. 2 to 6 were synthesized.
- Example 8-17 In the same manner as in Example 7, compound numbers 8 to 17 were synthesized.
- reaction mixture was concentrated and purified by a conventional method, and 37.2 mg of 4-methyl-2- [4-isobutoxy-3-isothiazol-4-yl-phenyl] -1,3-thiazole-5-carboxylic acid was obtained. Obtained.
- Example 55-66 In the same manner as in Example 18, compound numbers 55 to 66 were synthesized.
- Example 68 Compound No. 68 was synthesized in the same manner as Example 67.
- Ethyl 2- (4-hydroxy-3-oxazol-5-yl-phenyl) -4-methyl-1,3-thiazole-5-carboxylate (33.0 mg) was added to the reaction mixture, and the mixture was stirred at room temperature for 12 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure to give ethyl 2- [4- (cyclobutylmethoxy) -3-oxazol-5-yl) phenyl] -4-methyl-1,3-thiazole- A crude product of 5-carboxylate was obtained.
- Example 70-83 Compound Nos. 70 to 83 were synthesized in the same manner as Example 69.
- Example 85 Compound No. 85 was synthesized in the same manner as Example 84.
- Example 88-105 Compound Nos. 88 to 105 were synthesized in the same manner as in Examples 86 and 87.
- Example 108-141 In the same manner as in Example 107, Compound No. 108 - was synthesized 141.
- Example 146 Compound No. 146 was synthesized in the same manner as Example 145.
- Examples 150-162 In the same manner as in Example 149, Compound No. 150 - was synthesized 162.
- Example 164 to 166 In the same manner as in Example 163, compound numbers 164 to 166 were synthesized.
- Example 168 Compound No. 168 was synthesized in the same manner as Example 167.
- Example 169 Synthesis of 2- (4-oxazol-5-yl-5-phenyl-2-pyridyl) -1,3-thiazole-5-carboxylic acid (Compound No. 169 ) (Synthesis Method K) (1) To 312 mg of 2-chloro-5-phenylpyridine-4-carbaldehyde obtained in Example 167, 306 mg of potassium bicarbonate, 12.9 mg of palladium (II) chloride, and 59.8 mg of copper (I) bromide were added. In addition, it was suspended in 4.0 mL of toluene.
- Example 170 Compound No. 170 was synthesized in the same manner as Example 169.
- the reaction mixture was acidified with 2M hydrochloric acid, 2M aqueous sodium hydroxide solution and methylene chloride were added and separated, and the aqueous layer was acidified again with 2M hydrochloric acid to give 4-bromo-5-isobutoxypyridine- 1.3 g of 2-carboxylic acid was obtained.
- (6) Suspend 1.3 g of 4-bromo-5-isobutoxypyridine-2-carboxylic acid in 10 mL of N, N-dimethylformamide, add 722 mg of oxalyl chloride, and stir at room temperature for 2 hours in a nitrogen atmosphere. After that, 20 mL of methylene chloride was added, and aqueous ammonia was added dropwise at 0 ° C.
- the mixture was made turbid, 45 mg of tetrakis (triphenylphosphine) palladium was added, and the mixture was heated at 100 ° C. for 12 hours under a nitrogen atmosphere. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried, concentrated under reduced pressure, and purified by a conventional method to obtain 85 mg of 5-isobutoxy-4- (pyrimidin-5-yl) pyridine-2-carbonitrile.
- Example 173 and 174 In the same manner as in Example 172, compound numbers 173 and 174 were synthesized.
- Example 175 Synthesis of 1- (5-isobutoxy-4-oxazol-5-yl-2-pyridyl) -1H-pyrazole-4-carboxylic acid (Compound No. 175 ) (Synthesis Method M)
- 2-Bromo-5-isobutoxypyridine-4-carbaldehyde was obtained from 2-bromo-5-hydroxypyridine in the same manner as in Example 171.
- Example 176 About the compound synthesize
- Preparation of test compound A test compound was dissolved in DMSO (manufactured by Sigma) so as to have a concentration of 20 mM, and then adjusted to a target concentration at the time of use.
- Measurement method The xanthine oxidase inhibitory activity of the compounds of the present invention was evaluated by partially modifying the method described in the literature (Method Enzymatic Analysis, 1,521-522, 1974). This evaluation is based on the evaluation of oxidase type xanthine oxidase inhibitory activity.
- a xanthine (manufactured by Sigma) solution prepared to 10 mM in a 20 mM sodium hydroxide solution in advance was prepared to 30 ⁇ M using a 100 mM phosphate buffer, and 75 ⁇ L / well was added to a 96-well plate.
- Each test compound diluted with DMSO to a final concentration of 100 times was added at 1.5 ⁇ L / well, and after mixing, the absorbance at 290 nm was measured with a microplate reader SPECTRA max Plus 384 (manufactured by Molecular Devices).
- oxidase-type xanthine oxidase (derived from buttermilk, Calbiochem) was prepared to 30.6 mU / mL using 100 mM phosphate buffer, and 73.5 ⁇ L / well was added. Immediately after mixing, the change in absorbance at 290 nm was measured for 5 minutes. The inhibition rate of the test compound was calculated by setting the enzyme activity when DMSO was added instead of the test compound solution as 100%, and a 50% inhibitory concentration against the oxidase type xanthine oxidase was calculated by fitting to a dose response curve. The results are shown in the following table. However, the symbols (+, ++, ++) in the table represent the inhibitory activity values as follows. 10.0 nM ⁇ IC 50 : + 5.0 nM ⁇ IC 50 ⁇ 10.0 nM: ++ 1.0 nM ⁇ IC 50 ⁇ 5.0 nM: +++
- Example 177 Blood uric acid lowering effect (normal rat) The compounds Nos. 6 , 67 and 86 were confirmed to have a blood uric acid lowering effect. Test compounds suspended in 0.5% methylcellulose solution were forcibly administered to male Sprague-Dawley rats (Charles River Japan Co., Ltd.) 8-9 weeks old using an oral sonde. Two hours after administration, blood was collected from the tail vein, and plasma was separated. The blood uric acid level was measured using a uric acid measurement kit (L type Wako UA • F: Wako Pure Chemical Industries) with an absorptiometer by the uricase method, and the uric acid reduction rate was determined by the following equation.
- a uric acid measurement kit L type Wako UA • F: Wako Pure Chemical Industries
- Uric acid reduction rate (%) (Uric acid level of control animals ⁇ Uric acid level of animals receiving test compound) ⁇ 100 / Uric acid level of control animals
- Compound Nos. 6 , 67 and 86 were administered at a dose of 10 mg / kg at 2 hours after administration.
- the uric acid reduction rate was 50% or more. As described above, the strong uric acid lowering action of the compound of the present invention was shown.
- the compound represented by the above formula (I) of the present invention and a pharmaceutically acceptable salt thereof have xanthine oxidase inhibitory activity and are clinically applicable as xanthine oxidase inhibitors.
- Respiratory organs such as uricemia, tumor lysis syndrome, urolithiasis, hypertension, dyslipidemia, diabetes, cardiovascular diseases such as arteriosclerosis and heart failure, renal diseases such as diabetic nephropathy, chronic obstructive pulmonary disease It can be used as a therapeutic or prophylactic agent for diseases involving xanthine oxidase such as diseases, inflammatory bowel diseases or autoimmune diseases.
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Abstract
Provided are a compound indicated by formula (I), a pharmaceutically acceptable salt thereof, or a drug or pharmaceutical composition containing these as an effective component thereof, said compound having excellent xanthine oxidase inhibitory activity and effective as a treatment agent or prophylactic agent for diseases related to xanthine oxidase, such as gout, hyperuricemia, tumor lysis syndrome, urinary tract stones, hypertension, dyslipidemia, diabetes, cardiovascular diseases such as arterial sclerosis and heart failure, renal diseases such as diabetic nephropathy etc., respiratory diseases such as chronic obstructive pulmonary disease etc., and autoimmune diseases such as inflammatory bowel disease, etc.
Description
本発明は、キサンチンオキシダーゼ阻害活性を有する新規化合物、およびその製造方法、ならびに該化合物を有効成分して含有するキサンチンオキシダーゼ阻害剤に関する。
特に、本発明は、痛風、高尿酸血症、腫瘍崩壊症候群、尿路結石、高血圧症、脂質異常症、糖尿病、動脈硬化症や心不全等の心血管疾患、糖尿病性腎症等の腎疾患、慢性閉塞性肺疾患等の呼吸器疾患、炎症性腸疾患または自己免疫性疾患等、キサンチンオキシダーゼの関与する疾患の治療薬または予防薬として有益なアゾールカルボン酸誘導体に関する。 The present invention relates to a novel compound having xanthine oxidase inhibitory activity, a method for producing the same, and a xanthine oxidase inhibitor containing the compound as an active ingredient.
In particular, the present invention includes gout, hyperuricemia, tumor lysis syndrome, urolithiasis, hypertension, dyslipidemia, diabetes, cardiovascular diseases such as arteriosclerosis and heart failure, renal diseases such as diabetic nephropathy, The present invention relates to an azolecarboxylic acid derivative useful as a therapeutic or prophylactic agent for diseases involving xanthine oxidase, such as respiratory diseases such as chronic obstructive pulmonary disease, inflammatory bowel disease or autoimmune disease.
特に、本発明は、痛風、高尿酸血症、腫瘍崩壊症候群、尿路結石、高血圧症、脂質異常症、糖尿病、動脈硬化症や心不全等の心血管疾患、糖尿病性腎症等の腎疾患、慢性閉塞性肺疾患等の呼吸器疾患、炎症性腸疾患または自己免疫性疾患等、キサンチンオキシダーゼの関与する疾患の治療薬または予防薬として有益なアゾールカルボン酸誘導体に関する。 The present invention relates to a novel compound having xanthine oxidase inhibitory activity, a method for producing the same, and a xanthine oxidase inhibitor containing the compound as an active ingredient.
In particular, the present invention includes gout, hyperuricemia, tumor lysis syndrome, urolithiasis, hypertension, dyslipidemia, diabetes, cardiovascular diseases such as arteriosclerosis and heart failure, renal diseases such as diabetic nephropathy, The present invention relates to an azolecarboxylic acid derivative useful as a therapeutic or prophylactic agent for diseases involving xanthine oxidase, such as respiratory diseases such as chronic obstructive pulmonary disease, inflammatory bowel disease or autoimmune disease.
キサンチンオキシダーゼは核酸代謝においてヒポキサンチンからキサンチン、さらに尿酸への変換を触媒する酵素である。
キサンチンオキシダーゼの作用に対して、キサンチンオキシダーゼ阻害剤は尿酸合成を阻害することで血中尿酸値を低下させる。すなわち、高尿酸血症およびこれに起因する各種疾患の治療に有効である。一方、高尿酸血症が持続して尿酸塩結晶が沈着した結果として起こる病態として、痛風と呼ばれる痛風関節炎、痛風結節がある。また、高尿酸血症は肥満、高血圧、脂質異常症および糖尿病などに関連した生活習慣病やメタボリックシンドロームの因子として重要視されており、最近では疫学調査により腎障害、尿路結石、心血管疾患の危険因子であることかが明らかにされつつある(日本痛風・核酸代謝学会ガイドライン改訂委員会編,「高尿酸血症・痛風の治療ガイドライン第2版」,メディカルレビュー社,2010)。また、キサンチンオキシダーゼ阻害剤は、その活性酸素種発生阻害活性により、活性酸素種が関与する疾患の治療への有用性、例えば、血管機能改善作用を通じた心血管疾患の治療への有用性が期待されている(Circulation.2006;114:2508-2516)。 Xanthine oxidase is an enzyme that catalyzes the conversion of hypoxanthine to xanthine and further to uric acid in nucleic acid metabolism.
In contrast to the action of xanthine oxidase, xanthine oxidase inhibitors reduce uric acid synthesis by inhibiting uric acid synthesis. That is, it is effective for treating hyperuricemia and various diseases resulting therefrom. On the other hand, pathological conditions that occur as a result of persistent hyperuricemia and deposition of urate crystals include gout arthritis called gout and gout nodules. Hyperuricemia is regarded as an important factor in lifestyle-related diseases and metabolic syndrome related to obesity, hypertension, dyslipidemia, and diabetes. Recently, epidemiological studies have shown that nephropathy, urolithiasis, cardiovascular disease It is being clarified that it is a risk factor for cancer (Japan Gout / Nucleic Acid Metabolism Society Guidelines Revision Committee, edited by “Guideline for Treatment of Hyperuricemia / Gout, Second Edition”, Medical Review, 2010). In addition, xanthine oxidase inhibitors are expected to be useful for the treatment of diseases involving reactive oxygen species, for example, for the treatment of cardiovascular diseases through the effect of improving vascular function, due to the activity of inhibiting the generation of reactive oxygen species. (Circulation. 2006; 114: 2508-2516).
キサンチンオキシダーゼの作用に対して、キサンチンオキシダーゼ阻害剤は尿酸合成を阻害することで血中尿酸値を低下させる。すなわち、高尿酸血症およびこれに起因する各種疾患の治療に有効である。一方、高尿酸血症が持続して尿酸塩結晶が沈着した結果として起こる病態として、痛風と呼ばれる痛風関節炎、痛風結節がある。また、高尿酸血症は肥満、高血圧、脂質異常症および糖尿病などに関連した生活習慣病やメタボリックシンドロームの因子として重要視されており、最近では疫学調査により腎障害、尿路結石、心血管疾患の危険因子であることかが明らかにされつつある(日本痛風・核酸代謝学会ガイドライン改訂委員会編,「高尿酸血症・痛風の治療ガイドライン第2版」,メディカルレビュー社,2010)。また、キサンチンオキシダーゼ阻害剤は、その活性酸素種発生阻害活性により、活性酸素種が関与する疾患の治療への有用性、例えば、血管機能改善作用を通じた心血管疾患の治療への有用性が期待されている(Circulation.2006;114:2508-2516)。 Xanthine oxidase is an enzyme that catalyzes the conversion of hypoxanthine to xanthine and further to uric acid in nucleic acid metabolism.
In contrast to the action of xanthine oxidase, xanthine oxidase inhibitors reduce uric acid synthesis by inhibiting uric acid synthesis. That is, it is effective for treating hyperuricemia and various diseases resulting therefrom. On the other hand, pathological conditions that occur as a result of persistent hyperuricemia and deposition of urate crystals include gout arthritis called gout and gout nodules. Hyperuricemia is regarded as an important factor in lifestyle-related diseases and metabolic syndrome related to obesity, hypertension, dyslipidemia, and diabetes. Recently, epidemiological studies have shown that nephropathy, urolithiasis, cardiovascular disease It is being clarified that it is a risk factor for cancer (Japan Gout / Nucleic Acid Metabolism Society Guidelines Revision Committee, edited by “Guideline for Treatment of Hyperuricemia / Gout, Second Edition”, Medical Review, 2010). In addition, xanthine oxidase inhibitors are expected to be useful for the treatment of diseases involving reactive oxygen species, for example, for the treatment of cardiovascular diseases through the effect of improving vascular function, due to the activity of inhibiting the generation of reactive oxygen species. (Circulation. 2006; 114: 2508-2516).
臨床では、高尿酸血症の治療薬としてアロプリノール、フェブキソスタットが使用されているが、アロプリノールには、スティーブンス・ジョンソン症候群、中毒性表皮壊死症、肝障害、腎機能障害等の副作用が報告されている(Nippon Rinsho,2003;61,Suppul.1:197-201)。
Clinically, allopurinol and febuxostat are used as therapeutic agents for hyperuricemia, but allopurinol has reported side effects such as Stevens-Johnson syndrome, toxic epidermal necrosis, liver damage, and renal dysfunction (Nippon Rinsho, 2003; 61, Suppul. 1: 197-201).
キサンチンオキシダーゼ阻害活性を有する化合物としては、例えば、2-フェニルチアゾール誘導体(特許文献1~3)、フェニルピラゾール誘導体(特許文献4~6)、トリアリールカルボン酸誘導体(特許文献7~10)が報告されている。また、6-インドールチアゾール誘導体(特許文献11および12)、6-インドールピラゾール誘導体(特許文献12)等、中央2環性の複素環であるカルボン酸誘導体が報告されている。
Examples of compounds having xanthine oxidase inhibitory activity include 2-phenylthiazole derivatives (Patent Documents 1 to 3), phenylpyrazole derivatives (Patent Documents 4 to 6), and triarylcarboxylic acid derivatives (Patent Documents 7 to 10). Has been. Further, carboxylic acid derivatives which are central bicyclic heterocycles such as 6-indolethiazole derivatives (Patent Documents 11 and 12) and 6-indolepyrazole derivatives (Patent Document 12) have been reported.
一方、特許文献13および特許文献14には、中央にベンゼン環を有するジチアゾールカルボン酸誘導体が報告されている。また、特許文献15および特許文献16には、ビフェニルチアゾールカルボン酸誘導体が報告されている。
On the other hand, Patent Document 13 and Patent Document 14 report a dithiazolecarboxylic acid derivative having a benzene ring at the center. Patent Document 15 and Patent Document 16 report biphenylthiazolecarboxylic acid derivatives.
本発明が解決しようとする課題は、新規のキサンチンオキシダーゼ阻害活性を有する化合物を提供することである。更に、本発明の課題は、優れた尿酸低下作用を有する化合物を提供することである。また、本発明の別の課題は、痛風、高尿酸血症、腫瘍崩壊症候群、尿路結石、高血圧症、脂質異常症、糖尿病、動脈硬化症や心不全等の心血管疾患、糖尿病性腎症等の腎疾患、慢性閉塞性肺疾患等の呼吸器疾患、炎症性腸疾患または自己免疫性疾患等、キサンチンオキシダーゼの関与する疾患の治療薬または予防薬として有用な化合物を提供することである。
The problem to be solved by the present invention is to provide a novel compound having xanthine oxidase inhibitory activity. Furthermore, the subject of this invention is providing the compound which has the outstanding uric acid reduction effect | action. Another subject of the present invention is gout, hyperuricemia, tumor lysis syndrome, urolithiasis, hypertension, dyslipidemia, diabetes, cardiovascular diseases such as arteriosclerosis and heart failure, diabetic nephropathy, etc. It is intended to provide a compound useful as a therapeutic or prophylactic agent for diseases involving xanthine oxidase, such as renal diseases, respiratory diseases such as chronic obstructive pulmonary disease, inflammatory bowel diseases or autoimmune diseases.
発明者らはキサンチンオキシダーゼ阻害活性を有する化合物について鋭意研究を行った結果、下記式(I)
As a result of intensive studies on compounds having xanthine oxidase inhibitory activity, the inventors have found that the following formula (I)
で表される化合物が、キサンチンオキシダーゼ阻害活性を有すること、更には、優れた尿酸低下作用を伴うキサンチンオキシダーゼ阻害活性を有すること、更には、特に優れた長時間にわたる尿酸低下作用を可能とする持続的なキサンチンオキシダーゼ阻害活性を有することを見出して本発明を完成した。更に、このアゾールカルボン酸誘導体は、痛風、高尿酸血症、腫瘍崩壊症候群、尿路結石、高血圧症、脂質異常症、糖尿病、動脈硬化症や心不全等の心血管疾患、糖尿病性腎症等の腎疾患、慢性閉塞性肺疾患等の呼吸器疾患、炎症性腸疾患または自己免疫性疾患等の良好な治療薬または予防薬になりうることを見出して本発明を完成した。
すなわち、本発明は
[1] 式(I)で表される化合物またはその製薬学的に許容される塩: A compound having a xanthine oxidase inhibitory activity, a xanthine oxidase inhibitory activity with an excellent uric acid lowering action, and a particularly excellent sustained uric acid lowering action over a long period of time. The present invention was completed by finding that it has a typical xanthine oxidase inhibitory activity. Furthermore, this azole carboxylic acid derivative is used for gout, hyperuricemia, tumor lysis syndrome, urolithiasis, hypertension, dyslipidemia, diabetes, cardiovascular diseases such as arteriosclerosis and heart failure, diabetic nephropathy, etc. The present invention has been completed by finding that it can be a good therapeutic or preventive drug for respiratory diseases such as kidney disease, chronic obstructive pulmonary disease, inflammatory bowel disease or autoimmune disease.
That is, the present invention provides [1] a compound represented by the formula (I) or a pharmaceutically acceptable salt thereof:
すなわち、本発明は
[1] 式(I)で表される化合物またはその製薬学的に許容される塩: A compound having a xanthine oxidase inhibitory activity, a xanthine oxidase inhibitory activity with an excellent uric acid lowering action, and a particularly excellent sustained uric acid lowering action over a long period of time. The present invention was completed by finding that it has a typical xanthine oxidase inhibitory activity. Furthermore, this azole carboxylic acid derivative is used for gout, hyperuricemia, tumor lysis syndrome, urolithiasis, hypertension, dyslipidemia, diabetes, cardiovascular diseases such as arteriosclerosis and heart failure, diabetic nephropathy, etc. The present invention has been completed by finding that it can be a good therapeutic or preventive drug for respiratory diseases such as kidney disease, chronic obstructive pulmonary disease, inflammatory bowel disease or autoimmune disease.
That is, the present invention provides [1] a compound represented by the formula (I) or a pharmaceutically acceptable salt thereof:
[式中、
R0は、次のR01またはR02を表す。 [Where:
R 0 represents the following R 01 or R 02 .
R0は、次のR01またはR02を表す。 [Where:
R 0 represents the following R 01 or R 02 .
R1は、1もしくは複数の炭素数1~6のアルキル基、炭素数1~6のアルコキシ基もしくはハロゲン原子で置換されていてもよいアリール基、OR、環を形成していてもよいNRR’、またはSRを表し、ここで、RおよびR’は独立して、水素原子、1もしくは複数の炭素数1~8のアルコキシ基、ハロゲン原子もしくは水酸基で置換されていてもよい炭素数1~8のアルキル基、1もしくは複数の炭素数1~6のアルキル基、炭素数1~6のアルコキシ基、ハロゲン原子もしくはシアノ基で置換されていてもよいアリール基、または1もしくは複数の炭素数1~6のアルキル基、炭素数1~6のアルコキシ基もしくはハロゲン原子で置換されていてもよいヘテロアリール基を表す。
R2は、水素原子、アミノ基、または1もしくは複数のハロゲン原子で置換されていてもよい炭素数1~8のアルキル基を表す。
X1は、CR3または窒素原子を表し、ここで、R3は水素原子、またはハロゲン原子を表す。
環Aは、1もしくは複数の炭素数1~3のアルコキシ基もしくはハロゲン原子で置換されていてもよい炭素数1~6のアルキル基、1もしくは複数のハロゲン原子で置換されていてもよい炭素数1~6のアルコキシ基、およびハロゲン原子からなる群より選択される1~4個の基で置換されていてもよい5または6員の単環性のヘテロアレーンを表す。];
[2] 環Aにおけるヘテロアレーンが、 R 1 represents one or a plurality of alkyl groups having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an aryl group optionally substituted with a halogen atom, OR, or NRR ′ which may form a ring. Or SR, wherein R and R ′ are each independently a hydrogen atom, one or more alkoxy groups having 1 to 8 carbon atoms, a halogen atom or a hydroxyl group optionally substituted with a hydroxyl group. 1 or a plurality of alkyl groups having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an aryl group optionally substituted with a halogen atom or a cyano group, or one or more carbon atoms having 1 to 6 carbon atoms 6 represents an alkyl group having 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, or a heteroaryl group optionally substituted with a halogen atom.
R 2 represents a hydrogen atom, an amino group, or an alkyl group having 1 to 8 carbon atoms which may be substituted with one or more halogen atoms.
X 1 represents CR 3 or a nitrogen atom, wherein R 3 represents a hydrogen atom or a halogen atom.
Ring A is an alkyl group having 1 to 6 carbon atoms which may be substituted with one or more alkoxy groups having 1 to 3 carbon atoms or a halogen atom, and the number of carbons which may be substituted with one or more halogen atoms. It represents a 5- or 6-membered monocyclic heteroarene which may be substituted with 1 to 6 alkoxy groups and 1 to 4 groups selected from the group consisting of halogen atoms. ];
[2] The heteroarene in ring A is
R2は、水素原子、アミノ基、または1もしくは複数のハロゲン原子で置換されていてもよい炭素数1~8のアルキル基を表す。
X1は、CR3または窒素原子を表し、ここで、R3は水素原子、またはハロゲン原子を表す。
環Aは、1もしくは複数の炭素数1~3のアルコキシ基もしくはハロゲン原子で置換されていてもよい炭素数1~6のアルキル基、1もしくは複数のハロゲン原子で置換されていてもよい炭素数1~6のアルコキシ基、およびハロゲン原子からなる群より選択される1~4個の基で置換されていてもよい5または6員の単環性のヘテロアレーンを表す。];
[2] 環Aにおけるヘテロアレーンが、 R 1 represents one or a plurality of alkyl groups having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an aryl group optionally substituted with a halogen atom, OR, or NRR ′ which may form a ring. Or SR, wherein R and R ′ are each independently a hydrogen atom, one or more alkoxy groups having 1 to 8 carbon atoms, a halogen atom or a hydroxyl group optionally substituted with a hydroxyl group. 1 or a plurality of alkyl groups having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an aryl group optionally substituted with a halogen atom or a cyano group, or one or more carbon atoms having 1 to 6 carbon atoms 6 represents an alkyl group having 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, or a heteroaryl group optionally substituted with a halogen atom.
R 2 represents a hydrogen atom, an amino group, or an alkyl group having 1 to 8 carbon atoms which may be substituted with one or more halogen atoms.
X 1 represents CR 3 or a nitrogen atom, wherein R 3 represents a hydrogen atom or a halogen atom.
Ring A is an alkyl group having 1 to 6 carbon atoms which may be substituted with one or more alkoxy groups having 1 to 3 carbon atoms or a halogen atom, and the number of carbons which may be substituted with one or more halogen atoms. It represents a 5- or 6-membered monocyclic heteroarene which may be substituted with 1 to 6 alkoxy groups and 1 to 4 groups selected from the group consisting of halogen atoms. ];
[2] The heteroarene in ring A is
である、[1]記載の化合物またはその製薬学的に許容される塩;
[3] X1がCR3であり、R3が水素原子またはフッ素原子である、[1]または[2]記載の化合物またはその製薬学的に許容される塩;
[4] X1が窒素原子である、[1]または[2]記載の化合物またはその製薬学的に許容される塩;
[5] R0がR01である、[1]~[4]のいずれかに記載の化合物またはその製薬学的に許容される塩;
[6] R2がメチル基である、[1]~[5]のいずれかに記載の化合物またはその製薬学的に許容される塩;
[7] R2が水素原子である、[1]~[5]のいずれかに記載の化合物またはその製薬学的に許容される塩;
[8] R0がR02である、[1]~[4]のいずれかに記載の化合物またはその製薬学的に許容される塩;
[9] R2が水素原子またはアミノ基である、[8]記載の化合物またはその製薬学的に許容される塩;
[10] R1がORである、[1]~[9]のいずれかに記載の化合物またはその製薬学的に許容される塩;
[11] Rが1もしくは複数の炭素数1~8のアルコキシ基またはハロゲン原子で置換されていてもよい炭素数1~8のアルキル基である、[10]記載の化合物またはその製薬学的に許容される塩;
[12] Rが1もしくは複数の炭素数1~3のアルキル基、炭素数1~3のアルコキシ基、ハロゲン原子もしくはシアノ基で置換されていてもよいアリール基である、[10]記載の化合物またはその製薬学的に許容される塩;
[13] R1が1もしくは複数の炭素数1~3のアルキル基、炭素数1~3のアルコキシ基もしくはハロゲン原子で置換されていてもよいアリール基である、[1]~[9]のいずれかに記載の化合物またはその製薬学的に許容される塩;
[14] 化合物番号(1)~(175)より選択されるいずれかの化合物またはその製薬学的に許容される塩。。[15] [1]~[14]のいずれかに記載の化合物またはその製薬学的に許容される塩と、製薬学的に許容される担体を含有する、医薬組成物;
[16] [1]~[14]のいずれかに記載の化合物またはその製薬学的に許容される塩を有効成分として含有する、キサンチンオキシダーゼ阻害剤;
[17] [1]~[14]のいずれかに記載の化合物またはその製薬学的に許容される塩を有効成分として含有する、痛風、高尿酸血症、腫瘍崩壊症候群、尿路結石、高血圧症、脂質異常症、糖尿病、心血管疾患、腎疾患、呼吸器疾患、炎症性腸疾患または自己免疫性疾患の治療薬または予防薬;および
[18] 式(II)で表される化合物。 Or a pharmaceutically acceptable salt thereof according to [1];
[3] The compound or a pharmaceutically acceptable salt thereof according to [1] or [2], wherein X 1 is CR 3 and R 3 is a hydrogen atom or a fluorine atom;
[4] The compound according to [1] or [2] or a pharmaceutically acceptable salt thereof, wherein X 1 is a nitrogen atom;
[5] The compound or a pharmaceutically acceptable salt thereof according to any one of [1] to [4], wherein R 0 is R 01 ;
[6] The compound or a pharmaceutically acceptable salt thereof according to any one of [1] to [5], wherein R 2 is a methyl group;
[7] The compound or a pharmaceutically acceptable salt thereof according to any one of [1] to [5], wherein R 2 is a hydrogen atom;
[8] The compound or a pharmaceutically acceptable salt thereof according to any one of [1] to [4], wherein R 0 is R 02 ;
[9] The compound according to [8] or a pharmaceutically acceptable salt thereof, wherein R 2 is a hydrogen atom or an amino group;
[10] The compound or a pharmaceutically acceptable salt thereof according to any one of [1] to [9], wherein R 1 is OR;
[11] The compound according to [10] or a pharmaceutically acceptable salt thereof, wherein R is one or more alkoxy groups having 1 to 8 carbon atoms or an alkyl group having 1 to 8 carbon atoms which may be substituted with a halogen atom. Acceptable salts;
[12] The compound according to [10], wherein R is an aryl group optionally substituted by one or more alkyl groups having 1 to 3 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, a halogen atom or a cyano group. Or a pharmaceutically acceptable salt thereof;
[13] R 1 is 1 or more carbon atoms 1-3 alkyl group, an aryl group which may be substituted with an alkoxy group or halogen atom having 1-3 carbon atoms, of [1] to [9] Any of the compounds or pharmaceutically acceptable salts thereof;
[14] Any compound selected from compound numbers (1) to (175) or a pharmaceutically acceptable salt thereof. . [15] A pharmaceutical composition comprising the compound according to any one of [1] to [14] or a pharmaceutically acceptable salt thereof and a pharmaceutically acceptable carrier;
[16] A xanthine oxidase inhibitor comprising the compound according to any one of [1] to [14] or a pharmaceutically acceptable salt thereof as an active ingredient;
[17] Gout, hyperuricemia, tumor lysis syndrome, urinary calculus, hypertension comprising the compound according to any one of [1] to [14] or a pharmaceutically acceptable salt thereof as an active ingredient Dyslipidemia, diabetes, cardiovascular disease, kidney disease, respiratory disease, inflammatory bowel disease or autoimmune disease therapeutic or prophylactic agent; and [18] A compound represented by formula (II).
[3] X1がCR3であり、R3が水素原子またはフッ素原子である、[1]または[2]記載の化合物またはその製薬学的に許容される塩;
[4] X1が窒素原子である、[1]または[2]記載の化合物またはその製薬学的に許容される塩;
[5] R0がR01である、[1]~[4]のいずれかに記載の化合物またはその製薬学的に許容される塩;
[6] R2がメチル基である、[1]~[5]のいずれかに記載の化合物またはその製薬学的に許容される塩;
[7] R2が水素原子である、[1]~[5]のいずれかに記載の化合物またはその製薬学的に許容される塩;
[8] R0がR02である、[1]~[4]のいずれかに記載の化合物またはその製薬学的に許容される塩;
[9] R2が水素原子またはアミノ基である、[8]記載の化合物またはその製薬学的に許容される塩;
[10] R1がORである、[1]~[9]のいずれかに記載の化合物またはその製薬学的に許容される塩;
[11] Rが1もしくは複数の炭素数1~8のアルコキシ基またはハロゲン原子で置換されていてもよい炭素数1~8のアルキル基である、[10]記載の化合物またはその製薬学的に許容される塩;
[12] Rが1もしくは複数の炭素数1~3のアルキル基、炭素数1~3のアルコキシ基、ハロゲン原子もしくはシアノ基で置換されていてもよいアリール基である、[10]記載の化合物またはその製薬学的に許容される塩;
[13] R1が1もしくは複数の炭素数1~3のアルキル基、炭素数1~3のアルコキシ基もしくはハロゲン原子で置換されていてもよいアリール基である、[1]~[9]のいずれかに記載の化合物またはその製薬学的に許容される塩;
[14] 化合物番号(1)~(175)より選択されるいずれかの化合物またはその製薬学的に許容される塩。。[15] [1]~[14]のいずれかに記載の化合物またはその製薬学的に許容される塩と、製薬学的に許容される担体を含有する、医薬組成物;
[16] [1]~[14]のいずれかに記載の化合物またはその製薬学的に許容される塩を有効成分として含有する、キサンチンオキシダーゼ阻害剤;
[17] [1]~[14]のいずれかに記載の化合物またはその製薬学的に許容される塩を有効成分として含有する、痛風、高尿酸血症、腫瘍崩壊症候群、尿路結石、高血圧症、脂質異常症、糖尿病、心血管疾患、腎疾患、呼吸器疾患、炎症性腸疾患または自己免疫性疾患の治療薬または予防薬;および
[18] 式(II)で表される化合物。 Or a pharmaceutically acceptable salt thereof according to [1];
[3] The compound or a pharmaceutically acceptable salt thereof according to [1] or [2], wherein X 1 is CR 3 and R 3 is a hydrogen atom or a fluorine atom;
[4] The compound according to [1] or [2] or a pharmaceutically acceptable salt thereof, wherein X 1 is a nitrogen atom;
[5] The compound or a pharmaceutically acceptable salt thereof according to any one of [1] to [4], wherein R 0 is R 01 ;
[6] The compound or a pharmaceutically acceptable salt thereof according to any one of [1] to [5], wherein R 2 is a methyl group;
[7] The compound or a pharmaceutically acceptable salt thereof according to any one of [1] to [5], wherein R 2 is a hydrogen atom;
[8] The compound or a pharmaceutically acceptable salt thereof according to any one of [1] to [4], wherein R 0 is R 02 ;
[9] The compound according to [8] or a pharmaceutically acceptable salt thereof, wherein R 2 is a hydrogen atom or an amino group;
[10] The compound or a pharmaceutically acceptable salt thereof according to any one of [1] to [9], wherein R 1 is OR;
[11] The compound according to [10] or a pharmaceutically acceptable salt thereof, wherein R is one or more alkoxy groups having 1 to 8 carbon atoms or an alkyl group having 1 to 8 carbon atoms which may be substituted with a halogen atom. Acceptable salts;
[12] The compound according to [10], wherein R is an aryl group optionally substituted by one or more alkyl groups having 1 to 3 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, a halogen atom or a cyano group. Or a pharmaceutically acceptable salt thereof;
[13] R 1 is 1 or more carbon atoms 1-3 alkyl group, an aryl group which may be substituted with an alkoxy group or halogen atom having 1-3 carbon atoms, of [1] to [9] Any of the compounds or pharmaceutically acceptable salts thereof;
[14] Any compound selected from compound numbers (1) to (175) or a pharmaceutically acceptable salt thereof. . [15] A pharmaceutical composition comprising the compound according to any one of [1] to [14] or a pharmaceutically acceptable salt thereof and a pharmaceutically acceptable carrier;
[16] A xanthine oxidase inhibitor comprising the compound according to any one of [1] to [14] or a pharmaceutically acceptable salt thereof as an active ingredient;
[17] Gout, hyperuricemia, tumor lysis syndrome, urinary calculus, hypertension comprising the compound according to any one of [1] to [14] or a pharmaceutically acceptable salt thereof as an active ingredient Dyslipidemia, diabetes, cardiovascular disease, kidney disease, respiratory disease, inflammatory bowel disease or autoimmune disease therapeutic or prophylactic agent; and [18] A compound represented by formula (II).
[式中、
R4は、次のR41またはR42を表す。 [Where:
R 4 represents the following R 41 or R 42 .
R4は、次のR41またはR42を表す。 [Where:
R 4 represents the following R 41 or R 42 .
R5は、カルボキシル基の保護基を表す。
R1、R2、X1、環Aの定義は式(I)と同じである。]
である。 R 5 represents a protecting group for a carboxyl group.
The definitions of R 1 , R 2 , X 1 and ring A are the same as in formula (I). ]
It is.
R1、R2、X1、環Aの定義は式(I)と同じである。]
である。 R 5 represents a protecting group for a carboxyl group.
The definitions of R 1 , R 2 , X 1 and ring A are the same as in formula (I). ]
It is.
本発明は、高いキサンチンオキシダーゼ阻害活性を有する新規化合物、およびその製造方法を提供する。さらに本発明化合物は、特に、痛風、高尿酸血症、腫瘍崩壊症候群、尿路結石、高血圧症、脂質異常症、糖尿病、動脈硬化症や心不全等の心血管疾患、糖尿病性腎症等の腎疾患、慢性閉塞性肺疾患等の呼吸器疾患、炎症性腸疾患または自己免疫性疾患等、キサンチンオキシダーゼの関与する疾患の治療薬または予防薬として有用である。
The present invention provides a novel compound having high xanthine oxidase inhibitory activity and a method for producing the same. Furthermore, the compounds of the present invention are particularly useful for gout, hyperuricemia, tumor lysis syndrome, urolithiasis, hypertension, dyslipidemia, diabetes, cardiovascular diseases such as arteriosclerosis and heart failure, kidneys such as diabetic nephropathy, etc. It is useful as a therapeutic or prophylactic agent for diseases involving xanthine oxidase such as diseases, respiratory diseases such as chronic obstructive pulmonary disease, inflammatory bowel diseases or autoimmune diseases.
本明細書で単独または組み合わせて用いられる用語を以下に説明する。特段の記載がない限り、各置換基の説明は、各部位において共通するものとする。なお、いずれかの変数が、任意の構成要素においてそれぞれ存在するとき、その定義はそれぞれの構成要素において独立している。また、置換基および変数の組み合わせは、そのような組み合わせが化学的に安定な化合物をもたらす限り許される。置換基における結合を横切る波線は結合点を表す。
The terms used alone or in combination in this specification are explained below. Unless otherwise specified, the description of each substituent is common to each site. When any variable is present in any constituent element, its definition is independent in each constituent element. Also, combinations of substituents and variables are permissible as long as such combinations result in chemically stable compounds. The wavy line across the bond in the substituent represents the point of attachment.
「キサンチンオキシダーゼ」は、一般に、ヒポキサンチンからキサンチン、さらに尿酸への酸化反応を触媒する酵素という広義と、同反応を触媒する酵素の1つであるオキシダーゼ型のキサンチンオキシドレダクターゼという狭義で用いられるが、本発明において、「キサンチンオキシダーゼ」とは、特に断りのない限り、ヒポキサンチンからキサンチン、さらに尿酸への酸化反応を触媒する酵素を総称する。この反応を担うキサンチンオキシドレダクターゼには、オキシダーゼ型とデヒドロゲナーゼ型の2つの型が存在するが、いずれの型も本発明のキサンチンオキシダーゼに含まれる。「キサンチンオキシダーゼ阻害活性」、「キサンチンオキシダーゼ阻害剤」等においても、特に断りのない限り、「キサンチンオキシダーゼ」は上記定義と同じ意味を有する。
“Xanthine oxidase” is generally used in the broad sense of an enzyme that catalyzes an oxidation reaction from hypoxanthine to xanthine and further to uric acid, and in the narrow sense of an oxidase-type xanthine oxidoreductase that is one of the enzymes that catalyze the reaction. In the present invention, “xanthine oxidase” is a general term for enzymes that catalyze an oxidation reaction from hypoxanthine to xanthine and further to uric acid, unless otherwise specified. There are two types of xanthine oxidoreductase responsible for this reaction, an oxidase type and a dehydrogenase type, both of which are included in the xanthine oxidase of the present invention. In “xanthine oxidase inhibitory activity”, “xanthine oxidase inhibitor” and the like, “xanthine oxidase” has the same meaning as defined above unless otherwise specified.
本発明において「ハロゲン原子」とは、フッ素原子、塩素原子、臭素原子、およびヨウ素原子を意味する。
In the present invention, “halogen atom” means a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
本発明において「アルキル基」とは、1価の飽和の直鎖、環状または分岐状脂肪族炭化水素基を意味する。「炭素数1~8のアルキル基」としては、例えば、メチル基、エチル基、n-プロピル基、n-ブチル基、n-ペンチル基、n-ヘキシル基、イソプロピル基、イソブチル基、s-ブチル基、t-ブチル基、イソペンチル基、2-メチルブチル基、ネオペンチル基、1-エチルプロピル基、4-メチルペンチル基、3-メチルペンチル基、2-メチルペンチル基、1-メチルペンチル基、3,3-ジメチルブチル基、2,2-ジメチルブチル基、1,1-ジメチルブチル基、1,2-ジメチルブチル基、1,3-ジメチルブチル基、2,3-ジメチルブチル基、1-エチルブチル基、2-エチルブチル基、t-ペンチル基、イソヘキシル基、シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基、シクロヘプチル基、シクロプロピルメチル基、シクロブチルメチル基、シクロペンチルメチル基、シクロヘキシルメチル基、およびシクロヘプチルメチル基等が挙げられる。「炭素数1~6のアルキル基」としては、メチル基、エチル基、n-プロピル基、n-ブチル基、n-ペンチル基、n-ヘキシル基、イソプロピル基、イソブチル基、s-ブチル基、t-ブチル基、イソペンチル基、2-メチルブチル基、ネオペンチル基、1-エチルプロピル基、4-メチルペンチル基、3-メチルペンチル基、2-メチルペンチル基、1-メチルペンチル基、3,3-ジメチルブチル基、2,2-ジメチルブチル基、1,1-ジメチルブチル基、1,2-ジメチルブチル基、1,3-ジメチルブチル基、2,3-ジメチルブチル基、1-エチルブチル基、2-エチルブチル基、シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基、シクロプロピルメチル基、シクロブチルメチル基、シクロペンチルメチル基等が挙げられる。「炭素数1~3のアルキル基」としては、メチル基、エチル基、n-プロピル基、イソプロピル基等が挙げられる。
In the present invention, the “alkyl group” means a monovalent saturated linear, cyclic or branched aliphatic hydrocarbon group. Examples of the “alkyl group having 1 to 8 carbon atoms” include methyl group, ethyl group, n-propyl group, n-butyl group, n-pentyl group, n-hexyl group, isopropyl group, isobutyl group, and s-butyl. Group, t-butyl group, isopentyl group, 2-methylbutyl group, neopentyl group, 1-ethylpropyl group, 4-methylpentyl group, 3-methylpentyl group, 2-methylpentyl group, 1-methylpentyl group, 3, 3-dimethylbutyl group, 2,2-dimethylbutyl group, 1,1-dimethylbutyl group, 1,2-dimethylbutyl group, 1,3-dimethylbutyl group, 2,3-dimethylbutyl group, 1-ethylbutyl group 2-ethylbutyl group, t-pentyl group, isohexyl group, cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, cycloheptyl group, B propyl methyl group, cyclobutylmethyl group, cyclopentylmethyl group, cyclohexylmethyl group, and cycloheptylmethyl group and the like. Examples of the “alkyl group having 1 to 6 carbon atoms” include methyl group, ethyl group, n-propyl group, n-butyl group, n-pentyl group, n-hexyl group, isopropyl group, isobutyl group, s-butyl group, t-butyl, isopentyl, 2-methylbutyl, neopentyl, 1-ethylpropyl, 4-methylpentyl, 3-methylpentyl, 2-methylpentyl, 1-methylpentyl, 3,3- Dimethylbutyl group, 2,2-dimethylbutyl group, 1,1-dimethylbutyl group, 1,2-dimethylbutyl group, 1,3-dimethylbutyl group, 2,3-dimethylbutyl group, 1-ethylbutyl group, 2 -Ethylbutyl, cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cyclopropylmethyl, cyclobutylmethyl, cyclopentyl Chill group, and the like. Examples of the “C 1-3 alkyl group” include methyl group, ethyl group, n-propyl group, isopropyl group and the like.
本発明において「アルキレン基」とは、前記「アルキル基」から任意の位置の水素原子をさらに1個除いて誘導される二価の基を意味する。「炭素数1~6のアルキレン基」としては、、メチレン基、エチレン基、n-プロピレン基、イソプロピレン基、n-ブチレン基、イソブチレン基、n-ペンチレン基、n-ヘキシレン基、シクロプロピレン基、シクロブチレン基、シクロヘキシレン基等が挙げられる。
In the present invention, the “alkylene group” means a divalent group derived by further removing one hydrogen atom at an arbitrary position from the “alkyl group”. Examples of the “C 1-6 alkylene group” include methylene group, ethylene group, n-propylene group, isopropylene group, n-butylene group, isobutylene group, n-pentylene group, n-hexylene group, cyclopropylene group , Cyclobutylene group, cyclohexylene group and the like.
本発明において「アルコキシ基」とは、1価の飽和の直鎖、環状または分岐状脂肪族炭化水素オキシ基を意味する。「炭素数1~8のアルコキシ基」としては、例えば、メトキシ基、エトキシ基、n-プロポキシ基、n-ブトキシ基、n-ペンチロキシ基、n-ヘキサオキシ基、イソプロポキシ基、イソブトキシ基、s-ブトキシ基、t-ブトキシ基、イソペンチルオキシ基、2-メチルブトキシ基、ネオペンチルオシキ基、シクロプロポキシ基、シクロブトキシ基、シクロペンチルオキシ基、シクロヘキシルオキシ基、シクロヘプチルオキシ基、シクロプロピルメトキシ基、シクロブチルメトシキ基、シクロペンチルメトキシ基、およびシクロヘキシルメトキシ基等が挙げられる。「炭素数1~3のアルコキシ基」としては、例えば、メトキシ基、エトキシ基、n-プロポキシ基、イソプロポキシ基等が挙げられる。
In the present invention, the “alkoxy group” means a monovalent saturated linear, cyclic or branched aliphatic hydrocarbon oxy group. Examples of the “alkoxy group having 1 to 8 carbon atoms” include methoxy group, ethoxy group, n-propoxy group, n-butoxy group, n-pentyloxy group, n-hexaoxy group, isopropoxy group, isobutoxy group, s- Butoxy group, t-butoxy group, isopentyloxy group, 2-methylbutoxy group, neopentyloxy group, cyclopropoxy group, cyclobutoxy group, cyclopentyloxy group, cyclohexyloxy group, cycloheptyloxy group, cyclopropylmethoxy group, A cyclobutyl methoxy group, a cyclopentyl methoxy group, a cyclohexyl methoxy group, etc. are mentioned. Examples of the “C 1-3 alkoxy group” include methoxy group, ethoxy group, n-propoxy group, isopropoxy group and the like.
本発明において「アリール基」とは、炭素数が6~10個の単環性または二環性の1価の芳香族炭化水素基を意味する。アリール基としては、フェニル基、ナフチル基、インデニル基、テトラヒドロナフチル基、インダニル基、およびアズレニル基等が挙げられる。
In the present invention, the “aryl group” means a monocyclic or bicyclic monovalent aromatic hydrocarbon group having 6 to 10 carbon atoms. Examples of the aryl group include a phenyl group, a naphthyl group, an indenyl group, a tetrahydronaphthyl group, an indanyl group, and an azulenyl group.
本発明において「ヘテロアレーン」とは、酸素原子、硫黄原子、および窒素原子より選択される1~5個のヘテロ原子を有する単環性または二環性の芳香族複素環を意味する。ピリジン、ピラジン、ピリミジン、フラン、チオフェン、ピロール、イソオキサゾール、イソチアゾール、ピラン、イミダゾール、オキサゾール、チアゾール、オキサジアゾール、チアジアゾール、ピラゾール、トリアジン、トリアゾール、テトラゾール、ベンゾフラン、ベンゾチオフェン、ベンゾチアゾール、ベンゾイミダゾール、ベンゾオキサゾール、ベンゾイソオキサゾール等が挙げられる。「5または6員の単環性のヘテロアレーン」とは、上記「ヘテロアレーン」のうち、5または6員の単環性のものを意味する。
In the present invention, “heteroarene” means a monocyclic or bicyclic aromatic heterocycle having 1 to 5 heteroatoms selected from an oxygen atom, a sulfur atom, and a nitrogen atom. Pyridine, pyrazine, pyrimidine, furan, thiophene, pyrrole, isoxazole, isothiazole, pyran, imidazole, oxazole, thiazole, oxadiazole, thiadiazole, pyrazole, triazine, triazole, tetrazole, benzofuran, benzothiophene, benzothiazole, benzimidazole , Benzoxazole, benzisoxazole, and the like. The “5- or 6-membered monocyclic heteroarene” means a 5- or 6-membered monocyclic one of the above “heteroarenes”.
本発明において「ヘテロアリール基」とは、酸素原子、硫黄原子、および窒素原子より選択される1~5個のヘテロ原子を有する単環性または1価の二環性の芳香族複素環基を意味する。ヘテロアリール基としては、ピリジル基、ピラジル基、ピリミジル基、フリル基、チエニル基、ピロリル基、イソオキサゾリル基、イソチアゾリル基、ベンゾフラニル基、ベンゾチエニル基、ベンゾチアゾリル基、ベンゾイミダゾリル基、ベンゾオキサゾリル基、ピラニル基、イミダゾリル基、オキサゾリル基、チアゾリル基、トリアジニル基、トリアゾリル基、ベンゾオキサゾリル基、ベンゾイソオキサゾリル基等が挙げられる。
In the present invention, the “heteroaryl group” refers to a monocyclic or monovalent bicyclic aromatic heterocyclic group having 1 to 5 heteroatoms selected from an oxygen atom, a sulfur atom, and a nitrogen atom. means. Heteroaryl groups include pyridyl, pyrazyl, pyrimidyl, furyl, thienyl, pyrrolyl, isoxazolyl, isothiazolyl, benzofuranyl, benzothienyl, benzothiazolyl, benzoimidazolyl, benzoxazolyl, pyranyl Group, imidazolyl group, oxazolyl group, thiazolyl group, triazinyl group, triazolyl group, benzoxazolyl group, benzoisoxazolyl group and the like.
本発明において「置換されていてもよい炭素数1~8のアルキル基」とは、置換可能な位置に1または複数の置換基を有していてもよい炭素数1~8のアルキル基を表す。置換基が複数存在する場合、各置換基は、同一でも異なっていてもよい。「置換されていてもよい炭素数1~6のアルキル基」、「置換されていてもよい炭素数1~3のアルキル基」等も同様の意味を表す。
In the present invention, the “optionally substituted alkyl group having 1 to 8 carbon atoms” represents an alkyl group having 1 to 8 carbon atoms which may have one or more substituents at substitutable positions. . When a plurality of substituents are present, each substituent may be the same or different. The “optionally substituted alkyl group having 1 to 6 carbon atoms”, the “optionally substituted alkyl group having 1 to 3 carbon atoms” and the like have the same meaning.
本発明において「置換されていてもよい炭素数1~8のアルコキシ基」とは、置換可能な位置に1または複数の置換基を有していてもよい炭素数1~8のアルコキシ基を表す。置換基が複数存在する場合、各置換基は、同一でも異なっていてもよい。「置換されていてもよい炭素数1~6のアルコキシ基」、「置換されていてもよい炭素数1~3のアルコキシ基」等も同様の意味を表す。
In the present invention, “optionally substituted alkoxy group having 1 to 8 carbon atoms” represents an alkoxy group having 1 to 8 carbon atoms which may have one or more substituents at substitutable positions. . When a plurality of substituents are present, each substituent may be the same or different. The “optionally substituted alkoxy group having 1 to 6 carbon atoms”, the “optionally substituted alkoxy group having 1 to 3 carbon atoms” and the like have the same meaning.
本発明において、アルキル基がアルコキシ基で置換されている場合、アルキル基とアルコキシが一緒になって含酸素飽和環を形成していてもよい。かかる環としては、オキシラン、オキセタン、テトラヒドロフラン、テトラヒドロピラン等が挙げられる。
In the present invention, when the alkyl group is substituted with an alkoxy group, the alkyl group and alkoxy may be combined to form an oxygen-containing saturated ring. Such rings include oxirane, oxetane, tetrahydrofuran, tetrahydropyran and the like.
本発明において「置換されていてもよいアリール基」とは、置換可能な位置に1または複数の置換基を有していてもよいアリール基を意味する。置換基が複数存在する場合、各置換基は、同一でも異なっていてもよい。
In the present invention, the “optionally substituted aryl group” means an aryl group which may have one or more substituents at substitutable positions. When a plurality of substituents are present, each substituent may be the same or different.
本発明において「置換されていてもよいヘテロアレーン」、「置換されていてもよいヘテロアリール基」とは、置換可能な位置に1または複数の置換基を有していてもよいヘテロアレーン、ヘテロアリール基をそれぞれ意味する。置換基が複数存在する場合、各置換基は、同一でも異なっていてもよい。
In the present invention, the “optionally substituted heteroarene” and the “optionally substituted heteroaryl group” refer to a heteroarene, heteroaryl optionally having one or more substituents at substitutable positions. Each represents an aryl group. When a plurality of substituents are present, each substituent may be the same or different.
本発明において「カルボキシル基の保護基」とは、例えば、PROTECTIVE GROUPS in ORGANIC SYNTHESIS,THIRD EDITION、John Wiley&Sons,Inc.に記載の一般的なカルボキシル基の保護基であり、例えば、メチル基、エチル基、イソプロピル基、ヘプチル基、t-ブチル基、メトキシメチル基、メチルチオメチル基、メトキシエトキシメチル基、メトキシエチル基、ベンジル基、t-ブチルジメチルシリル基等を挙げることができる。
In the present invention, “carboxyl-protecting group” means, for example, PROTECTIVE GROUPS in ORGANIC SYNTHESIS, THIRD EDITION, John Wiley & Sons, Inc. General carboxyl group protecting groups described in, for example, methyl group, ethyl group, isopropyl group, heptyl group, t-butyl group, methoxymethyl group, methylthiomethyl group, methoxyethoxymethyl group, methoxyethyl group, Examples thereof include a benzyl group and a t-butyldimethylsilyl group.
本発明において「フェノール性水酸基の保護基」とは、例えば、PROTECTIVE GROUPS in ORGANIC SYNTHESIS,THIRD EDITION、John Wiley&Sons,Inc.に記載の一般的なフェノール性水酸基の保護基であり、例えば、メチル基、イソプロピル基、アリル基、t-ブチル基、メトキシメチル基、メチルチオメチル基、メトキシエトキシメチル基、1-エトキシエチル基、ベンジル基、4-メトキシベンジル基、アセチル基、トリメチルシリル基、t-ブチルジメチルシリル基等を挙げることができる。
In the present invention, “protective group for phenolic hydroxyl group” means, for example, PROTECTED GROUPS in ORGANIC SYNTHESIS, THIRD EDITION, John Wiley & Sons, Inc. A protecting group for a general phenolic hydroxyl group described in, for example, methyl group, isopropyl group, allyl group, t-butyl group, methoxymethyl group, methylthiomethyl group, methoxyethoxymethyl group, 1-ethoxyethyl group, Examples include benzyl group, 4-methoxybenzyl group, acetyl group, trimethylsilyl group, t-butyldimethylsilyl group and the like.
R0は、次のR01またはR02を表す。
R 0 represents the following R 01 or R 02 .
式(I)中、R1は、1もしくは複数の炭素数1~6のアルキル基、炭素数1~6のアルコキシ基もしくはハロゲン原子で置換されていてもよいアリール基、OR、環を形成していてもよいNRR’、またはSRを表す。ここで、R及びR’は独立して、水素原子、1もしくは複数の炭素数1~8のアルコキシ基、ハロゲン原子もしくは水酸基で置換されていてもよい炭素数1~8のアルキル基、1もしくは複数の炭素数1~6のアルキル基、炭素数1~6のアルコキシ基、ハロゲン原子もしくはシアノ基で置換されていてもよいアリール基、または1もしくは複数の炭素数1~6のアルキル基、炭素数1~6のアルコキシ基もしくはハロゲン原子で置換されていてもよいヘテロアリール基を表す。「環を形成していてもよいNRR’」において、「NRR’が環を形成する」とは、RおよびR’が、それらが結合する窒素原子と一緒になって含窒素飽和環を形成することをいう。R1は、好ましくは、ORである。R1がORまたはSRのとき、Rは、好ましくは、1もしくは複数の炭素数1~8のアルコキシ基、ハロゲン原子もしくは水酸基で置換されていてもよい炭素数1~8のアルキル基、または1もしくは複数の炭素数1~6のアルキル基、炭素数1~6のアルコキシ基、ハロゲン原子もしくはシアノ基で置換されていてもよいアリール基である。より好ましくは、1もしくは複数の炭素数1~8のアルコキシ基またはハロゲン原子で置換されていてもよい炭素数1~8のアルキル基である。特に好ましくは、イソプロピル基、イソブチル基、ネオペンチル基である。
In the formula (I), R 1 forms one or more alkyl groups having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, or an aryl group optionally substituted with a halogen atom, OR, and a ring. NRR ′ that may be present, or SR. Here, R and R ′ are independently a hydrogen atom, one or a plurality of alkoxy groups having 1 to 8 carbon atoms, a halogen atom or an alkyl group having 1 to 8 carbon atoms which may be substituted with a hydroxyl group, 1 or A plurality of alkyl groups having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an aryl group optionally substituted with a halogen atom or a cyano group, or one or more alkyl groups having 1 to 6 carbon atoms, carbon It represents a heteroaryl group which may be substituted with an alkoxy group of 1 to 6 or a halogen atom. In “NRR ′ which may form a ring”, “NRR ′ forms a ring” means that R and R ′ together with the nitrogen atom to which they are bonded form a nitrogen-containing saturated ring. That means. R 1 is preferably OR. When R 1 is OR or SR, R preferably represents one or more alkoxy groups having 1 to 8 carbon atoms, an alkyl group having 1 to 8 carbon atoms which may be substituted with a halogen atom or a hydroxyl group, or 1 Alternatively, the aryl group may be substituted with a plurality of alkyl groups having 1 to 6 carbon atoms, alkoxy groups having 1 to 6 carbon atoms, halogen atoms, or cyano groups. More preferably, it is an alkyl group having 1 to 8 carbon atoms which may be substituted with one or more alkoxy groups having 1 to 8 carbon atoms or a halogen atom. Particularly preferred are isopropyl group, isobutyl group and neopentyl group.
R1が1もしくは複数の炭素数1~6のアルキル基、炭素数1~6のアルコキシ基、ハロゲン原子もしくはシアノ基で置換されていてもよいアリール基のとき、好ましくは、1もしくは複数の炭素数1~3のアルキル基、炭素数1~3のアルコキシ基もしくはハロゲン原子で置換されていてもよいアリール基であり、より好ましくは、フッ素原子で置換されていてもよいフェニル基である。
When R 1 is one or a plurality of alkyl groups having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an aryl group optionally substituted with a halogen atom or a cyano group, preferably one or more carbon atoms An alkyl group having 1 to 3 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, or an aryl group optionally substituted with a halogen atom, more preferably a phenyl group optionally substituted with a fluorine atom.
式(I)中、R2は、水素原子、アミノ基、または1もしくは複数のハロゲン原子で置換されていてもよい炭素数1~8のアルキル基を表す。好ましくは、水素原子または炭素数1~3のアルキル基であり、具体的には、メチル基、エチル基、n-プロピル基、イソプロピル基が挙げられる。より好ましくは、水素原子およびメチル基である。特に好ましくは、メチル基である。
In the formula (I), R 2 represents a hydrogen atom, an amino group, or an alkyl group having 1 to 8 carbon atoms which may be substituted with one or more halogen atoms. Preferably, they are a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and specific examples include a methyl group, an ethyl group, an n-propyl group, and an isopropyl group. More preferably, they are a hydrogen atom and a methyl group. Particularly preferred is a methyl group.
R0がR01、R02いずれの場合も、好ましいR1およびR2は上記のとおりである。さらに、R0がR02の場合、好ましいR2として、、アミノ基および1もしくは複数のハロゲン原子で置換されていてもよい炭素数1~3のアルキル基も挙げることができる。R0がR02のとき、より好ましいR2は水素原子およびアミノ基である。
In the case where R 0 is R 01 or R 02 , preferred R 1 and R 2 are as described above. Further, when R 0 is R 02 , preferred R 2 can also include an amino group and an alkyl group having 1 to 3 carbon atoms which may be substituted with one or more halogen atoms. When R 0 is R 02 , more preferable R 2 is a hydrogen atom and an amino group.
式(I)中、X1はCR3または窒素原子を表し、R3は水素原子またはハロゲン原子を表し、例えば、以下の構造式で表すことができる。
In the formula (I), X 1 represents CR 3 or a nitrogen atom, R 3 represents a hydrogen atom or a halogen atom, and can be represented by the following structural formula, for example.
式(I)中、環Aは、環A上の炭素原子により、X1を含むベンゼンまたはピリジン環と結合する。環Aは、1もしくは複数の炭素数1~3のアルコキシ基もしくはハロゲン原子で置換されていてもよい炭素数1~6のアルキル基、1もしくは複数のハロゲン原子で置換されていてもよい炭素数1~6のアルコキシ基、およびハロゲン原子からなる群より選択される1~4個の基で置換されていてもよい5または6員の単環性のヘテロアレーンを表す。環Aにおける5または6員の単環性のヘテロアレーンとしては、次のような構造を挙げることができる。
In formula (I), ring A is bonded to a benzene or pyridine ring containing X 1 by a carbon atom on ring A. Ring A is an alkyl group having 1 to 6 carbon atoms which may be substituted with one or more alkoxy groups having 1 to 3 carbon atoms or a halogen atom, and the number of carbons which may be substituted with one or more halogen atoms. It represents a 5- or 6-membered monocyclic heteroarene which may be substituted with 1 to 6 alkoxy groups and 1 to 4 groups selected from the group consisting of halogen atoms. Examples of the 5- or 6-membered monocyclic heteroarene in ring A include the following structures.
環Aは、好ましくは、1または2個の炭素数1~3のアルコキシ基で置換されていてもよい1または2個の炭素数1~3のアルキル基で置換されていてもよい5または6員の単環性のヘテロアレーンを表す。より好ましくは、1または2個のメチル基で置換されていてもよい5または6員の単環性のヘテロアレーンを表す。好ましい環Aの具体例は、例えば、以下のとおりである。
Ring A is preferably 5 or 6 optionally substituted with 1 or 2 alkyl groups having 1 to 3 carbon atoms which may be substituted with 1 or 2 alkoxy groups having 1 to 3 carbon atoms. Represents a membered monocyclic heteroarene. More preferably, it represents a 5- or 6-membered monocyclic heteroarene which may be substituted with 1 or 2 methyl groups. Specific examples of preferable ring A are as follows, for example.
本発明の化合物は優れたキサンチンオキシダーゼ阻害活性を示す化合物である。また、本発明の化合物は、優れた尿酸低下作用を有する。
好ましい化合物の具体例としては、以下の化合物を挙げることができる。 The compound of the present invention is a compound that exhibits excellent xanthine oxidase inhibitory activity. Further, the compound of the present invention has an excellent uric acid lowering action.
Specific examples of preferred compounds include the following compounds.
好ましい化合物の具体例としては、以下の化合物を挙げることができる。 The compound of the present invention is a compound that exhibits excellent xanthine oxidase inhibitory activity. Further, the compound of the present invention has an excellent uric acid lowering action.
Specific examples of preferred compounds include the following compounds.
このうち、より好ましい化合物は、化合物2、3、6、9、10、12、14、15、16、18、19、20、22、23、24、25、26、27、32、33、34、35、36、37、38、39、41、42、43、45、46、47、48、49、51、52、53、54、55、56、58、59、62、63、65、66、67、68、69、70、71、72、73、74、75、76、77、78、79、80、81、82、83、84、85、86、87、89、90、91、92、93、94、95、96、97、99、103、105、106、108、109、110、111、112、113、114、122、123、124、125、126、127、128、129、130、139、140、145、147、149、150、151、152、153、154、155、156、157、158、159、160、161、162、163、165、167、168、169、170、172、173、174および175である。
Among these, more preferable compounds are compounds 2, 3, 6, 9, 10, 12, 14, 15, 16, 18, 19, 20, 22, 23, 24, 25, 26, 27, 32, 33, 34. , 35, 36, 37, 38, 39, 41, 42, 43, 45, 46, 47, 48, 49, 51, 52, 53, 54, 55, 56, 58, 59, 62, 63, 65, 66 67, 68, 69, 70, 71, 72, 73, 74, 75, 76, 77, 78, 79, 80, 81, 82, 83, 84, 85, 86, 87, 89, 90, 91, 92 93, 94, 95, 96, 97, 99, 103, 105, 106, 108, 109, 110, 111, 112, 113, 114, 122, 123, 124, 125, 126, 127, 128, 129, 130 139, 140, 14 147, 149, 150, 151, 152, 153, 154, 155, 156, 157, 158, 159, 160, 161, 162, 163, 165, 167, 168, 169, 170, 172, 173, 174 and 175 It is.
本発明の前記の式(I)で表される化合物の製造中間体として用いることができる、前記の式(II)で表される化合物において、R1、R2、環A、X1は前記の式(I)における定義と同じである。R5は、カルボキシル基の保護基を表す。カルボキシル基の保護基の定義は上述の通りであり、好ましくは、メチル基、エチル基、ベンジル基である。
In the compound represented by the above formula (II) that can be used as an intermediate for producing the compound represented by the above formula (I) of the present invention, R 1 , R 2 , ring A, and X 1 are the above Is the same as defined in formula (I). R 5 represents a protecting group for a carboxyl group. The definition of the protective group of a carboxyl group is as above-mentioned, Preferably they are a methyl group, an ethyl group, and a benzyl group.
<一般的合成法>
本発明の式(I)は、例えば、以下に記載されるような合成法のいずれかに従って合成することができる。なお、各式中、R1、R2、X1、環Aは、式(I)の定義のとおりである。各式中、R5は、式(II)の定義のとおりである。また、化学式中に記載の、条件としての試薬または溶媒などは、本文にも記載のとおり例示にすぎない。各置換基は、必要に応じて、適切な保護基で保護されていてもよく、適切な段階において脱保護を行ってもよい。なお、適切な保護基およびその除去方法は、この分野で汎用される各置換基の保護基および公知の方法を採用することができ、例えば、PROTECTIVE GROUPS in ORGANIC SYNTHESIS,THIRD EDITION、John Wiley&Sons,Inc.に記載されている。 <General synthesis method>
Formula (I) of the present invention can be synthesized, for example, according to any of the synthetic methods described below. In each formula, R 1 , R 2 , X 1 and ring A are as defined in formula (I). In each formula, R 5 is as defined in formula (II). Moreover, the reagent or solvent as a condition described in the chemical formula is merely an example as described in the text. Each substituent may be protected with an appropriate protecting group as necessary, and may be deprotected at an appropriate stage. In addition, as a suitable protecting group and its removal method, the protecting group of each substituent generally used in this field and a publicly known method can be adopted. . It is described in.
本発明の式(I)は、例えば、以下に記載されるような合成法のいずれかに従って合成することができる。なお、各式中、R1、R2、X1、環Aは、式(I)の定義のとおりである。各式中、R5は、式(II)の定義のとおりである。また、化学式中に記載の、条件としての試薬または溶媒などは、本文にも記載のとおり例示にすぎない。各置換基は、必要に応じて、適切な保護基で保護されていてもよく、適切な段階において脱保護を行ってもよい。なお、適切な保護基およびその除去方法は、この分野で汎用される各置換基の保護基および公知の方法を採用することができ、例えば、PROTECTIVE GROUPS in ORGANIC SYNTHESIS,THIRD EDITION、John Wiley&Sons,Inc.に記載されている。 <General synthesis method>
Formula (I) of the present invention can be synthesized, for example, according to any of the synthetic methods described below. In each formula, R 1 , R 2 , X 1 and ring A are as defined in formula (I). In each formula, R 5 is as defined in formula (II). Moreover, the reagent or solvent as a condition described in the chemical formula is merely an example as described in the text. Each substituent may be protected with an appropriate protecting group as necessary, and may be deprotected at an appropriate stage. In addition, as a suitable protecting group and its removal method, the protecting group of each substituent generally used in this field and a publicly known method can be adopted. . It is described in.
合成法(A)
化合物(A-2)の合成 Synthesis method (A)
Synthesis of compound (A-2)
化合物(A-2)の合成 Synthesis method (A)
Synthesis of compound (A-2)
(式中、Z1は脱離基を表す。)
Z1で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(A-1)におけるフェノール性水酸基を塩基存在下で、脱離基を持ったアルキル化試薬を反応させることにより化合物(A-2)を合成する方法である。用いる塩基性物質としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド、t-ブトキシカリウム等の金属アルコキシド、トリエチルアミン、ピリジン、4-アミノピリジン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)等の有機アミンが用いられる。本反応は、0℃~140℃下で、反応に不活性な溶媒中、化合物(A-1)に等量、あるいは小過剰に塩基を反応させた後に、等量あるいは過剰量のアルキル化試薬を加え、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。 (In the formula, Z 1 represents a leaving group.)
Examples of the leaving group represented by Z 1 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method of synthesizing compound (A-2) by reacting a phenolic hydroxyl group in compound (A-1) with an alkylating reagent having a leaving group in the presence of a base. Examples of basic substances used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium ethoxide, sodium methoxide, t-butoxy potassium, etc. Organic amines such as metal alkoxide, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) Used. This reaction is carried out by reacting compound (A-1) with an equal amount or a small excess of a base in a solvent inert to the reaction at 0 ° C. to 140 ° C., and then an equal amount or an excess amount of an alkylating reagent. And the reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited. For example, ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, N, N— Examples thereof include dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
Z1で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(A-1)におけるフェノール性水酸基を塩基存在下で、脱離基を持ったアルキル化試薬を反応させることにより化合物(A-2)を合成する方法である。用いる塩基性物質としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド、t-ブトキシカリウム等の金属アルコキシド、トリエチルアミン、ピリジン、4-アミノピリジン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)等の有機アミンが用いられる。本反応は、0℃~140℃下で、反応に不活性な溶媒中、化合物(A-1)に等量、あるいは小過剰に塩基を反応させた後に、等量あるいは過剰量のアルキル化試薬を加え、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。 (In the formula, Z 1 represents a leaving group.)
Examples of the leaving group represented by Z 1 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method of synthesizing compound (A-2) by reacting a phenolic hydroxyl group in compound (A-1) with an alkylating reagent having a leaving group in the presence of a base. Examples of basic substances used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium ethoxide, sodium methoxide, t-butoxy potassium, etc. Organic amines such as metal alkoxide, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) Used. This reaction is carried out by reacting compound (A-1) with an equal amount or a small excess of a base in a solvent inert to the reaction at 0 ° C. to 140 ° C., and then an equal amount or an excess amount of an alkylating reagent. And the reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited. For example, ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, N, N— Examples thereof include dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
化合物(A-3)の合成
Synthesis of compound (A-3)
本反応は、化合物(A-2)におけるブロモ基を強塩基によりリチウム化させた後に、ホウ酸エステルを反応させた後に、酸によりボロン酸エステルをボロン酸へと加水分解することにより化合物(A-3)を合成する方法である。本反応は、化合物(A-2)とホウ酸エステルを等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、-78~0℃において等量あるいは小過剰の強塩基を加え、通常0.5~12時間反応させた後に、塩酸等の酸を加えることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。用いる強塩基としては、n-ブチルリチウム、t-ブチルリチウムまたはs-ブチルリチウム等が用いられる。また、ホウ酸エステルとしては、トリメトキシホウ酸、トリエトキシホウ酸、トリイソプロポキシホウ酸等が挙げられる。ここに、溶媒としては特に限定はされないが、例えばジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、またはこれらの混合溶媒等が挙げられる。
In this reaction, the bromo group in the compound (A-2) is lithiated with a strong base, then reacted with a boric acid ester, and then the boronic acid ester is hydrolyzed with an acid to a boronic acid, whereby the compound (A -3). In this reaction, compound (A-2) and boric acid ester are used in an equal amount or one in excess, and an equal amount or a small excess of strong base is added at −78 to 0 ° C. in a solvent inert to the reaction, Usually, the reaction is carried out by adding an acid such as hydrochloric acid after reacting for 0.5 to 12 hours. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. As the strong base to be used, n-butyllithium, t-butyllithium, s-butyllithium or the like is used. Examples of boric acid esters include trimethoxyboric acid, triethoxyboric acid, and triisopropoxyboric acid. Here, the solvent is not particularly limited, but ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, or a mixture thereof A solvent etc. are mentioned.
化合物(A-4)の合成
Synthesis of compound (A-4)
(式中、Z2は脱離基を表す。)
Z2で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、ボロン酸化合物(A-3)と脱離基を有する複素環化合物とをカップリング反応させることにより化合物(A-4)を合成する方法である。本反応は、化合物(A-3)と複素環化合物を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、塩基およびパラジウム触媒存在下、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、リン酸三カリウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、あるいはこれらの塩基を水等で希釈した溶液等が挙げられる。パラジウム触媒としては、テトラキス(トリフェニルホスフィン)パラジウム、ジクロロビス(トリフェニルホスフィン)パラジウム、塩化パラジウム-1,1’-ビス(ジフェニルホスフィノ)フェロセン等が好ましい。 (In the formula, Z 2 represents a leaving group.)
Examples of the leaving group represented by Z 2 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method of synthesizing compound (A-4) by coupling reaction of boronic acid compound (A-3) and a heterocyclic compound having a leaving group. In this reaction, the compound (A-3) and the heterocyclic compound are used in an equal amount or in excess, and in a solvent inert to the reaction, in the presence of a base and a palladium catalyst, from room temperature to heating under reflux, usually 0. It is carried out by reacting for 5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate and tripotassium phosphate, metal alkoxides such as sodium ethoxide and sodium methoxide, or these bases And a solution obtained by diluting with water or the like. As the palladium catalyst, tetrakis (triphenylphosphine) palladium, dichlorobis (triphenylphosphine) palladium, palladium chloride-1,1′-bis (diphenylphosphino) ferrocene and the like are preferable.
Z2で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、ボロン酸化合物(A-3)と脱離基を有する複素環化合物とをカップリング反応させることにより化合物(A-4)を合成する方法である。本反応は、化合物(A-3)と複素環化合物を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、塩基およびパラジウム触媒存在下、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、リン酸三カリウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、あるいはこれらの塩基を水等で希釈した溶液等が挙げられる。パラジウム触媒としては、テトラキス(トリフェニルホスフィン)パラジウム、ジクロロビス(トリフェニルホスフィン)パラジウム、塩化パラジウム-1,1’-ビス(ジフェニルホスフィノ)フェロセン等が好ましい。 (In the formula, Z 2 represents a leaving group.)
Examples of the leaving group represented by Z 2 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method of synthesizing compound (A-4) by coupling reaction of boronic acid compound (A-3) and a heterocyclic compound having a leaving group. In this reaction, the compound (A-3) and the heterocyclic compound are used in an equal amount or in excess, and in a solvent inert to the reaction, in the presence of a base and a palladium catalyst, from room temperature to heating under reflux, usually 0. It is carried out by reacting for 5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate and tripotassium phosphate, metal alkoxides such as sodium ethoxide and sodium methoxide, or these bases And a solution obtained by diluting with water or the like. As the palladium catalyst, tetrakis (triphenylphosphine) palladium, dichlorobis (triphenylphosphine) palladium, palladium chloride-1,1′-bis (diphenylphosphino) ferrocene and the like are preferable.
化合物(A-5)の合成
Synthesis of compound (A-5)
本反応は、シアノ基からチオアミド基への変換反応であり、上記式(A-4)で表される芳香族シアノ基誘導体と硫黄源を酸性条件下で反応させることにより行われる。本反応は、化合物(A-4)と硫黄源を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、酸存在下、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。硫黄源としては、硫化水素、チオアセトアミドまたはチオ酢酸を用いる。酸性物質としては、塩酸、硫酸、酢酸等の有機酸、またはこれらの酸の水溶液が用いられる。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、またはこれらの混合溶媒等が挙げられる。また、酢酸等の酸を溶媒として用いることもできる。
This reaction is a conversion reaction from a cyano group to a thioamide group, and is performed by reacting an aromatic cyano group derivative represented by the above formula (A-4) with a sulfur source under acidic conditions. In this reaction, compound (A-4) and sulfur source are used in the same amount or in excess, and in an inert solvent for reaction, in the presence of an acid, at room temperature to heating under reflux, usually 0.5 hours to 2 This is done by reacting for a day. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Hydrogen sulfide, thioacetamide or thioacetic acid is used as the sulfur source. As the acidic substance, organic acids such as hydrochloric acid, sulfuric acid and acetic acid, or aqueous solutions of these acids are used. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof. An acid such as acetic acid can also be used as a solvent.
化合物(A-7)の合成
Synthesis of compound (A-7)
(式中、Z3は脱離基を表す。)
Z3で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(A-5)と(A-6)を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行なわれる。また、等量あるいは過剰量の塩基を加えることもできる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここで、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、またはこれらの混合溶媒等が挙げられる。用いる塩基としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、トリエチルアミン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)などが挙げられる。 (In the formula, Z 3 represents a leaving group.)
Examples of the leaving group represented by Z 3 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. In this reaction, compounds (A-5) and (A-6) are used in an equal amount or in excess, and in an inert solvent for the reaction, usually at room temperature to heating under reflux, usually 0.5 hours to 2 days. This is done by reacting. Further, an equal amount or an excess amount of a base can be added. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof. Examples of the base used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate and cesium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, triethylamine, N- Examples include ethyl-N, N-diisopropylamine (DIPEA) and 1,8-diazabicyclo [5.4.0] -7-undecene (DBU).
Z3で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(A-5)と(A-6)を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行なわれる。また、等量あるいは過剰量の塩基を加えることもできる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここで、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、またはこれらの混合溶媒等が挙げられる。用いる塩基としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、トリエチルアミン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)などが挙げられる。 (In the formula, Z 3 represents a leaving group.)
Examples of the leaving group represented by Z 3 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. In this reaction, compounds (A-5) and (A-6) are used in an equal amount or in excess, and in an inert solvent for the reaction, usually at room temperature to heating under reflux, usually 0.5 hours to 2 days. This is done by reacting. Further, an equal amount or an excess amount of a base can be added. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof. Examples of the base used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate and cesium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, triethylamine, N- Examples include ethyl-N, N-diisopropylamine (DIPEA) and 1,8-diazabicyclo [5.4.0] -7-undecene (DBU).
化合物(A-8)の合成
Synthesis of compound (A-8)
本反応は、化合物(A-7)の保護基R5を酸または塩基等により脱保護させることにより、本発明化合物(A-8)を合成する方法である。本反応は、化合物(A-7)に、反応に不活性な溶媒中、酸または塩基を等量、あるいは過剰に用い、室温~加熱還流下で、通常0.5時間~5日間反応されることによって行なわれる。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。酸としては、塩化水素、臭化水素、硫酸、硝酸、リン酸等の無機酸、あるいはこれらの酸を水または有機溶媒で希釈した溶液等が挙げられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、あるいはこれらの塩基を水等で希釈した溶液等が挙げられる。
This reaction is a method for synthesizing the compound (A-8) of the present invention by deprotecting the protecting group R 5 of the compound (A-7) with an acid or a base. In this reaction, compound (A-7) is usually reacted for 0.5 hour to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent. Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
以下、式(I)の化合物のR1がOR、環を形成していてもよいNRR’またはSRである場合の合成法を示す。
Hereinafter, the synthesis method in the case where R 1 of the compound of the formula (I) is OR, NRR ′ which may form a ring, or SR will be shown.
化合物(A-10)の合成
Synthesis of compound (A-10)
本反応は、化合物(A-9)におけるブロモ基を強塩基によりリチウム化させた後に、ホウ酸エステルを反応させた後に、酸によりボロン酸エステルをボロン酸へと加水分解することにより化合物(A-10)を合成する方法である。本反応は、化合物(A-9)とホウ酸エステルを等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、-78℃~0℃において等量あるいは小過剰の強塩基を加え、通常0.5~12時間反応させた後に、塩酸等の酸を加えることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。用いる強塩基としては、n-ブチルリチウム、t-ブチルリチウムまたはs-ブチルリチウム等が用いられる。また、ホウ酸エステルとしては、トリメトキシホウ酸、トリエトキシホウ酸、トリイソプロポキシホウ酸等が挙げられる。ここに、溶媒としては特に限定はされないが、例えばジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、またはこれらの混合溶媒等が挙げられる。
In this reaction, the bromo group in compound (A-9) is lithiated with a strong base and then reacted with boric acid ester, followed by hydrolysis of boronic acid ester to boronic acid with acid. -10). In this reaction, an equal amount of compound (A-9) and boric acid ester or an excess of one are used, and an equal amount or a small excess of strong base is added at −78 ° C. to 0 ° C. in a solvent inert to the reaction. The reaction is usually carried out by adding an acid such as hydrochloric acid after reacting for 0.5 to 12 hours. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. As the strong base to be used, n-butyllithium, t-butyllithium, s-butyllithium or the like is used. Examples of boric acid esters include trimethoxyboric acid, triethoxyboric acid, and triisopropoxyboric acid. Here, the solvent is not particularly limited, but ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, or a mixture thereof A solvent etc. are mentioned.
化合物(A-11)の合成
Synthesis of Compound (A-11)
(式中、Z2は脱離基を表す。)
Z2で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、ボロン酸化合物(A-10)と脱離基を有する複素環化合物とをカップリング反応させることにより化合物(A-11)を合成する方法である。本反応は、化合物(A-10)と複素環化合物を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、塩基およびパラジウム触媒存在下、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、リン酸三カリウム等の無機塩、ナトリウム・BR>Gトキシド、ナトリウムメトキシド等の金属アルコキシド、あるいはこれらの塩基を水等で希釈した溶液等が挙げられる。パラジウム触媒としては、テトラキス(トリフェニルホスフィン)パラジウム、ジクロロビス(トリフェニルホスフィン)パラジウム、塩化パラジウム-1,1’-ビス(ジフェニルホスフィノ)フェロセン等が好ましい。 (In the formula, Z 2 represents a leaving group.)
Examples of the leaving group represented by Z 2 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method for synthesizing compound (A-11) by coupling reaction of boronic acid compound (A-10) with a heterocyclic compound having a leaving group. In this reaction, the compound (A-10) and the heterocyclic compound are used in an equal amount or in excess, and in a solvent inert to the reaction, in the presence of a base and a palladium catalyst, from room temperature to heating under reflux, usually 0. It is carried out by reacting for 5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Bases include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, tripotassium phosphate, metal alkoxides such as sodium BR> G toxide, sodium methoxide, or Examples include solutions obtained by diluting these bases with water or the like. As the palladium catalyst, tetrakis (triphenylphosphine) palladium, dichlorobis (triphenylphosphine) palladium, palladium chloride-1,1′-bis (diphenylphosphino) ferrocene and the like are preferable.
Z2で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、ボロン酸化合物(A-10)と脱離基を有する複素環化合物とをカップリング反応させることにより化合物(A-11)を合成する方法である。本反応は、化合物(A-10)と複素環化合物を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、塩基およびパラジウム触媒存在下、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、リン酸三カリウム等の無機塩、ナトリウム・BR>Gトキシド、ナトリウムメトキシド等の金属アルコキシド、あるいはこれらの塩基を水等で希釈した溶液等が挙げられる。パラジウム触媒としては、テトラキス(トリフェニルホスフィン)パラジウム、ジクロロビス(トリフェニルホスフィン)パラジウム、塩化パラジウム-1,1’-ビス(ジフェニルホスフィノ)フェロセン等が好ましい。 (In the formula, Z 2 represents a leaving group.)
Examples of the leaving group represented by Z 2 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method for synthesizing compound (A-11) by coupling reaction of boronic acid compound (A-10) with a heterocyclic compound having a leaving group. In this reaction, the compound (A-10) and the heterocyclic compound are used in an equal amount or in excess, and in a solvent inert to the reaction, in the presence of a base and a palladium catalyst, from room temperature to heating under reflux, usually 0. It is carried out by reacting for 5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Bases include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, tripotassium phosphate, metal alkoxides such as sodium BR> G toxide, sodium methoxide, or Examples include solutions obtained by diluting these bases with water or the like. As the palladium catalyst, tetrakis (triphenylphosphine) palladium, dichlorobis (triphenylphosphine) palladium, palladium chloride-1,1′-bis (diphenylphosphino) ferrocene and the like are preferable.
化合物(A-12)の合成
Synthesis of compound (A-12)
本反応は、アルコール類、アミン類またはチオール類を塩基によりリチウム化、ナトリウム化あるいはカリウム化させた後に、化合物(A-11)と反応させることにより化合物(A-12)を合成する方法である。用いる塩基性物質としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド、t-ブトキシカリウム等の金属アルコキシド、トリエチルアミン、ピリジン、4-アミノピリジン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)等の有機アミンが用いられる。本反応は、-20℃~120℃下で、反応に不活性な溶媒中、化合物(A-11)に等量、あるいは小過剰に塩基を反応させた後に、等量あるいは過剰量のアルコール類、アミン類またはチオール類を加え、通常0.5~12時間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、またはこれらの混合溶媒等が挙げられる。
This reaction is a method for synthesizing compound (A-12) by lithiating, sodiumating or potassiumating alcohols, amines or thiols with a base and then reacting with compound (A-11). . Examples of basic substances used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium ethoxide, sodium methoxide, t-butoxy potassium, etc. Organic amines such as metal alkoxide, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) Used. This reaction is carried out at −20 ° C. to 120 ° C. in an solvent inert to the reaction, after reacting compound (A-11) with an equal amount or a small excess of base, and then an equal amount or an excess amount of alcohols. , Amines or thiols are added, and the reaction is usually carried out for 0.5 to 12 hours. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
化合物(A-13)の合成
Synthesis of compound (A-13)
本反応は、シアノ基からチオアミド基への変換反応であり、上記式(A-12)で表される芳香族シアノ基誘導体と硫黄源を酸性条件下で反応させることにより行われる。本反応は、化合物(A-12)と硫黄源を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、酸存在下、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。硫黄源としては、硫化水素、チオアセトアミドまたはチオ酢酸を用いる。酸性物質としては、塩酸、硫酸、酢酸等の有機酸、またはこれらの酸の水溶液が用いられる。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、またはこれらの混合溶媒等が挙げられる。また、酢酸等の酸を溶媒として用いることもできる。
This reaction is a conversion reaction from a cyano group to a thioamide group, and is performed by reacting an aromatic cyano group derivative represented by the above formula (A-12) with a sulfur source under acidic conditions. In this reaction, the compound (A-12) and sulfur source are used in an equal amount or one of them in excess, and in an inert solvent for the reaction, in the presence of an acid, from room temperature to heating under reflux, usually from 0.5 hour to 2 This is done by reacting for a day. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Hydrogen sulfide, thioacetamide or thioacetic acid is used as the sulfur source. As the acidic substance, organic acids such as hydrochloric acid, sulfuric acid and acetic acid, or aqueous solutions of these acids are used. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof. An acid such as acetic acid can also be used as a solvent.
化合物(A-14)の合成
Synthesis of compound (A-14)
(式中、Z3は脱離基を表す。)
Z3で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(A-13)と(A-6)を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行なわれる。また、等量あるいは過剰量の塩基を加えることもできる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここで、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、またはこれらの混合溶媒等が挙げられる。用いる塩基としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、トリエチルアミン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)などが挙げられる。 (In the formula, Z 3 represents a leaving group.)
Examples of the leaving group represented by Z 3 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. In this reaction, compounds (A-13) and (A-6) are used in an equal amount or in excess, and in an inert solvent for the reaction, at room temperature to heating under reflux, usually 0.5 hours to 2 days This is done by reacting. Further, an equal amount or an excess amount of a base can be added. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof. Examples of the base used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate and cesium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, triethylamine, N- Examples include ethyl-N, N-diisopropylamine (DIPEA) and 1,8-diazabicyclo [5.4.0] -7-undecene (DBU).
Z3で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(A-13)と(A-6)を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行なわれる。また、等量あるいは過剰量の塩基を加えることもできる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここで、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、またはこれらの混合溶媒等が挙げられる。用いる塩基としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、トリエチルアミン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)などが挙げられる。 (In the formula, Z 3 represents a leaving group.)
Examples of the leaving group represented by Z 3 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. In this reaction, compounds (A-13) and (A-6) are used in an equal amount or in excess, and in an inert solvent for the reaction, at room temperature to heating under reflux, usually 0.5 hours to 2 days This is done by reacting. Further, an equal amount or an excess amount of a base can be added. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof. Examples of the base used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate and cesium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, triethylamine, N- Examples include ethyl-N, N-diisopropylamine (DIPEA) and 1,8-diazabicyclo [5.4.0] -7-undecene (DBU).
化合物(A-15)の合成
Synthesis of compound (A-15)
本反応は、化合物(A-14)の保護基R5を酸または塩基等により脱保護させることにより、本発明化合物(A-15)を合成する方法である。本反応は、化合物(A-14)に、反応に不活性な溶媒中、酸または塩基を等量、あるいは過剰に用い、室温~加熱還流下で、通常0.5時間~5日間反応されることによって行なわれる。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。酸としては、塩化水素、臭化水素、硫酸、硝酸、リン酸等の無機酸、あるいはこれらの酸を水または有機溶媒で希釈した溶液等が挙げられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、あるいはこれらの塩基を水等で希釈した溶液等が挙げられる。
This reaction is a method for synthesizing the compound (A-15) of the present invention by deprotecting the protecting group R 5 of the compound (A-14) with an acid or a base. In this reaction, compound (A-14) is usually reacted for 0.5 hours to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent. Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
また、式(A-8)の化合物は、以下に記載されるような合成法に従っても合成することができる。
The compound of formula (A-8) can also be synthesized according to a synthesis method as described below.
(合成法B)
化合物(B-1)の合成 (Synthesis method B)
Synthesis of compound (B-1)
化合物(B-1)の合成 (Synthesis method B)
Synthesis of compound (B-1)
本反応は、シアノ基からチオアミド基への変換反応であり、上記式(A-2)で表される芳香族シアノ基誘導体と硫黄源を酸性条件下で反応させることにより行われる。本反応は、化合物(A-2)と硫黄源を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、酸存在下、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。硫黄源としては、硫化水素、チオアセトアミドまたはチオ酢酸を用いる。酸性物質としては、塩酸、硫酸、酢酸等の有機酸、またはこれらの酸の水溶液が用いられる。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、またはこれらの混合溶媒等が挙げられる。また、酢酸等の酸を溶媒として用いることもできる。
This reaction is a conversion reaction from a cyano group to a thioamide group, and is performed by reacting an aromatic cyano group derivative represented by the above formula (A-2) with a sulfur source under acidic conditions. In this reaction, compound (A-2) and sulfur source are used in an equal amount or in excess, and in an inert solvent for reaction, in the presence of an acid, at room temperature to heating under reflux, usually 0.5 hours to 2 This is done by reacting for a day. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Hydrogen sulfide, thioacetamide or thioacetic acid is used as the sulfur source. As the acidic substance, organic acids such as hydrochloric acid, sulfuric acid and acetic acid, or aqueous solutions of these acids are used. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof. An acid such as acetic acid can also be used as a solvent.
化合物(B-2)の合成
Synthesis of compound (B-2)
(式中、Z3は脱離基を表す。)
Z3で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(B-1)と(A-6)を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行なわれる。また、等量あるいは過剰量の塩基を加えることもできる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここで、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、またはこれらの混合溶媒等が挙げられる。用いる塩基としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、トリエチルアミン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)などが挙げられる。 (In the formula, Z 3 represents a leaving group.)
Examples of the leaving group represented by Z 3 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. In this reaction, compounds (B-1) and (A-6) are used in equal amounts or in excess, and the reaction is inert to the reaction at room temperature to heating under reflux, usually for 0.5 hour to 2 days. This is done by reacting. Further, an equal amount or an excess amount of a base can be added. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof. Examples of the base used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate and cesium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, triethylamine, N- Examples include ethyl-N, N-diisopropylamine (DIPEA) and 1,8-diazabicyclo [5.4.0] -7-undecene (DBU).
Z3で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(B-1)と(A-6)を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行なわれる。また、等量あるいは過剰量の塩基を加えることもできる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここで、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、またはこれらの混合溶媒等が挙げられる。用いる塩基としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、トリエチルアミン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)などが挙げられる。 (In the formula, Z 3 represents a leaving group.)
Examples of the leaving group represented by Z 3 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. In this reaction, compounds (B-1) and (A-6) are used in equal amounts or in excess, and the reaction is inert to the reaction at room temperature to heating under reflux, usually for 0.5 hour to 2 days. This is done by reacting. Further, an equal amount or an excess amount of a base can be added. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof. Examples of the base used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate and cesium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, triethylamine, N- Examples include ethyl-N, N-diisopropylamine (DIPEA) and 1,8-diazabicyclo [5.4.0] -7-undecene (DBU).
化合物(B-3)の合成
Synthesis of compound (B-3)
本反応は、化合物(B-2)におけるブロモ基を強塩基によりリチウム化させた後に、ホウ酸エステルを反応させた後に、酸によりボロン酸エステルをボロン酸へと加水分解することにより化合物(B-3)を合成する方法である。本反応は、化合物(B-2)とホウ酸エステルを等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、-78~0℃において等量あるいは小過剰の強塩基を加え、通常0.5~12時間反応させた後に、塩酸等の酸を加えることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。用いる強塩基としては、n-ブチルリチウム、t-ブチルリチウムまたはs-ブチルリチウム等が用いられる。また、ホウ酸エステルとしては、トリメトキシホウ酸、トリエトキシホウ酸、トリイソプロポキシホウ酸等が挙げられる。ここに、溶媒としては特に限定はされないが、例えばジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、またはこれらの混合溶媒等が挙げられる。
In this reaction, the bromo group in the compound (B-2) is lithiated with a strong base, then reacted with a boric acid ester, and then the boronic acid ester is hydrolyzed with an acid to a boronic acid, whereby the compound (B -3). In this reaction, the compound (B-2) and boric acid ester are used in an equal amount or in an excess amount, and an equal amount or a small excess of a strong base is added at −78 to 0 ° C. in a solvent inert to the reaction, Usually, the reaction is carried out by adding an acid such as hydrochloric acid after reacting for 0.5 to 12 hours. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. As the strong base to be used, n-butyllithium, t-butyllithium, s-butyllithium or the like is used. Examples of boric acid esters include trimethoxyboric acid, triethoxyboric acid, and triisopropoxyboric acid. Here, the solvent is not particularly limited, but ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, or a mixture thereof A solvent etc. are mentioned.
化合物(A-8)の合成
Synthesis of compound (A-8)
(式中、Z2は脱離基を表す。)
Z2で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、ボロン酸化合物(B-3)と脱離基を有する複素環化合物とをカップリング反応させることにより化合物(A-10)を合成する方法である。本反応は、化合物(B-3)と複素環化合物を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、塩基およびパラジウム触媒存在下、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、リン酸三カリウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、あるいはこれらの塩基を水等で希釈した溶液等が挙げられる。パラジウム触媒としては、テトラキス(トリフェニルホスフィン)パラジウム、ジクロロビス(トリフェニルホスフィン)パラジウム、塩化パラジウム-1,1’-ビス(ジフェニルホスフィノ)フェロセン等が好ましい。 (In the formula, Z 2 represents a leaving group.)
Examples of the leaving group represented by Z 2 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method of synthesizing compound (A-10) by coupling reaction of boronic acid compound (B-3) and a heterocyclic compound having a leaving group. In this reaction, the compound (B-3) and the heterocyclic compound are used in an equal amount or one of them in excess, and in a solvent inert to the reaction, in the presence of a base and a palladium catalyst, from room temperature to heating under reflux, usually 0. It is carried out by reacting for 5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate and tripotassium phosphate, metal alkoxides such as sodium ethoxide and sodium methoxide, or these bases And a solution obtained by diluting with water or the like. As the palladium catalyst, tetrakis (triphenylphosphine) palladium, dichlorobis (triphenylphosphine) palladium, palladium chloride-1,1′-bis (diphenylphosphino) ferrocene and the like are preferable.
Z2で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、ボロン酸化合物(B-3)と脱離基を有する複素環化合物とをカップリング反応させることにより化合物(A-10)を合成する方法である。本反応は、化合物(B-3)と複素環化合物を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、塩基およびパラジウム触媒存在下、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、リン酸三カリウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、あるいはこれらの塩基を水等で希釈した溶液等が挙げられる。パラジウム触媒としては、テトラキス(トリフェニルホスフィン)パラジウム、ジクロロビス(トリフェニルホスフィン)パラジウム、塩化パラジウム-1,1’-ビス(ジフェニルホスフィノ)フェロセン等が好ましい。 (In the formula, Z 2 represents a leaving group.)
Examples of the leaving group represented by Z 2 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method of synthesizing compound (A-10) by coupling reaction of boronic acid compound (B-3) and a heterocyclic compound having a leaving group. In this reaction, the compound (B-3) and the heterocyclic compound are used in an equal amount or one of them in excess, and in a solvent inert to the reaction, in the presence of a base and a palladium catalyst, from room temperature to heating under reflux, usually 0. It is carried out by reacting for 5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate and tripotassium phosphate, metal alkoxides such as sodium ethoxide and sodium methoxide, or these bases And a solution obtained by diluting with water or the like. As the palladium catalyst, tetrakis (triphenylphosphine) palladium, dichlorobis (triphenylphosphine) palladium, palladium chloride-1,1′-bis (diphenylphosphino) ferrocene and the like are preferable.
(合成法C)
化合物(C-2)の合成 (Synthesis Method C)
Synthesis of compound (C-2)
化合物(C-2)の合成 (Synthesis Method C)
Synthesis of compound (C-2)
本反応は、シアノ基からチオアミド基への変換反応であり、上記式(C-1)で表される芳香族シアノ基誘導体と硫黄源とを酸性条件下で反応させることにより行われる。本反応は、化合物(C-1)と硫黄源を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、酸存在下、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。硫黄源としては、硫化水素、チオアセトアミドまたはチオ酢酸を用いる。酸性物質としては、塩酸、硫酸、酢酸等の有機酸、またはこれらの酸の水溶液が用いられる。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、またはこれらの混合溶媒等が挙げられる。また、酢酸等の酸を溶媒として用いることもできる。
This reaction is a conversion reaction from a cyano group to a thioamide group, and is performed by reacting an aromatic cyano group derivative represented by the above formula (C-1) with a sulfur source under acidic conditions. In this reaction, an equal amount of compound (C-1) and a sulfur source, or one of them in excess, is used in an inert solvent for the reaction, in the presence of an acid, at room temperature to heating under reflux, usually for 0.5 hour to 2 hours. This is done by reacting for a day. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Hydrogen sulfide, thioacetamide or thioacetic acid is used as the sulfur source. As the acidic substance, organic acids such as hydrochloric acid, sulfuric acid and acetic acid, or aqueous solutions of these acids are used. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof. An acid such as acetic acid can also be used as a solvent.
化合物(C-3)の合成
Synthesis of compound (C-3)
(式中、Z3は脱離基を表す。)
Z3で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(C-2)と(A-6)を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行なわれる。また、等量あるいは過剰量の塩基を加えることもできる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここで、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、またはこれらの混合溶媒等が挙げられる。用いる塩基としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、トリエチルアミン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)などが挙げられる。 (In the formula, Z 3 represents a leaving group.)
Examples of the leaving group represented by Z 3 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. In this reaction, compounds (C-2) and (A-6) are used in an equal amount or in excess, and the reaction is inert to the reaction at room temperature to heating under reflux, usually for 0.5 hour to 2 days. This is done by reacting. Further, an equal amount or an excess amount of a base can be added. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof. Examples of the base used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate and cesium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, triethylamine, N- Examples include ethyl-N, N-diisopropylamine (DIPEA) and 1,8-diazabicyclo [5.4.0] -7-undecene (DBU).
Z3で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(C-2)と(A-6)を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行なわれる。また、等量あるいは過剰量の塩基を加えることもできる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここで、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、またはこれらの混合溶媒等が挙げられる。用いる塩基としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、トリエチルアミン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)などが挙げられる。 (In the formula, Z 3 represents a leaving group.)
Examples of the leaving group represented by Z 3 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. In this reaction, compounds (C-2) and (A-6) are used in an equal amount or in excess, and the reaction is inert to the reaction at room temperature to heating under reflux, usually for 0.5 hour to 2 days. This is done by reacting. Further, an equal amount or an excess amount of a base can be added. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof. Examples of the base used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate and cesium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, triethylamine, N- Examples include ethyl-N, N-diisopropylamine (DIPEA) and 1,8-diazabicyclo [5.4.0] -7-undecene (DBU).
化合物(C-4)の合成
Synthesis of compound (C-4)
本反応は、化合物(C-3)を酸触媒存在下で、ヘキサメチレンテトラミン(HMT)と反応させてホルミル化する方法である。本反応は、化合物(C-3)とヘキサメチレンテトラミン(HMT)を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、酸触媒存在下、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。酸触媒としては、ギ酸、酢酸、トリフルオロ酢酸、ポリリン酸等が挙げられる。また、酸触媒を溶媒として用いることもできる。
This reaction is a method in which the compound (C-3) is reacted with hexamethylenetetramine (HMT) in the presence of an acid catalyst to formylate. In this reaction, the compound (C-3) and hexamethylenetetramine (HMT) are used in an equal amount or in excess, and usually in an inert solvent in the reaction in the presence of an acid catalyst at room temperature to heating under reflux, usually 0 By reacting for 5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Examples of the acid catalyst include formic acid, acetic acid, trifluoroacetic acid, polyphosphoric acid, and the like. An acid catalyst can also be used as a solvent.
化合物(C-5)の合成
Synthesis of compound (C-5)
(式中、Z1は脱離基を表す。)
Z1で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(C-4)におけるフェノール性水酸基を塩基存在下で、脱離基を持ったアルキル化試薬を反応させることにより化合物(C-5)を合成する方法である。用いる塩基性物質としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド、t-ブトキシカリウム等の金属アルコキシド、トリエチルアミン、ピリジン、4-アミノピリジン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)等の有機アミンが用いられる。本反応は、0℃~140℃下で、反応に不活性な溶媒中、化合物(C-4)に等量、あるいは小過剰に塩基を反応させた後に、等量あるいは過剰量のアルキル化試薬を加え、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。 (In the formula, Z 1 represents a leaving group.)
Examples of the leaving group represented by Z 1 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method of synthesizing compound (C-5) by reacting a phenolic hydroxyl group in compound (C-4) with an alkylating reagent having a leaving group in the presence of a base. Examples of basic substances used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium ethoxide, sodium methoxide, t-butoxy potassium, etc. Organic amines such as metal alkoxide, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) Used. This reaction is carried out by reacting compound (C-4) with an equal amount or a small excess of a base in a solvent inert to the reaction at 0 ° C. to 140 ° C., followed by an equal amount or an excess amount of an alkylating reagent. And the reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited. For example, ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, N, N— Examples thereof include dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
Z1で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(C-4)におけるフェノール性水酸基を塩基存在下で、脱離基を持ったアルキル化試薬を反応させることにより化合物(C-5)を合成する方法である。用いる塩基性物質としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド、t-ブトキシカリウム等の金属アルコキシド、トリエチルアミン、ピリジン、4-アミノピリジン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)等の有機アミンが用いられる。本反応は、0℃~140℃下で、反応に不活性な溶媒中、化合物(C-4)に等量、あるいは小過剰に塩基を反応させた後に、等量あるいは過剰量のアルキル化試薬を加え、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。 (In the formula, Z 1 represents a leaving group.)
Examples of the leaving group represented by Z 1 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method of synthesizing compound (C-5) by reacting a phenolic hydroxyl group in compound (C-4) with an alkylating reagent having a leaving group in the presence of a base. Examples of basic substances used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium ethoxide, sodium methoxide, t-butoxy potassium, etc. Organic amines such as metal alkoxide, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) Used. This reaction is carried out by reacting compound (C-4) with an equal amount or a small excess of a base in a solvent inert to the reaction at 0 ° C. to 140 ° C., followed by an equal amount or an excess amount of an alkylating reagent. And the reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited. For example, ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, N, N— Examples thereof include dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
化合物(C-7)の合成
Synthesis of compound (C-7)
本反応は、化合物(C-5)とp-トルエンスルホニルアセトニトリル(C-6)を反応させて1,3-オキサゾール環を合成する方法である。本反応は、化合物(C-5)とp-トルエンスルホニルアセトニトリル(C-6)を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、塩基存在下、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。用いる塩基としては、炭酸カリウム、炭酸ナトリウム、炭酸水素ナトリウム等の炭酸塩、トリエチルアミン、ピリジン、4-アミノピリジン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)等の有機アミンが用いられる。これらの反応に用いられる溶媒としては、トルエン、ベンゼン、ピリジン、酢酸エチル、ジクロロメタン、1,2-ジクロロエタン、クロロホルム、四塩化炭素、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)またはこれらの混合溶媒等が挙げられる。
This reaction is a method in which a compound (C-5) is reacted with p-toluenesulfonylacetonitrile (C-6) to synthesize a 1,3-oxazole ring. In this reaction, compound (C-5) and p-toluenesulfonylacetonitrile (C-6) are used in an equal amount or in excess, and in a solvent inert to the reaction, in the presence of a base, at room temperature to under reflux. The reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Examples of the base used include carbonates such as potassium carbonate, sodium carbonate and sodium hydrogen carbonate, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5. 4.0] -7-undecene (DBU) and other organic amines are used. Solvents used in these reactions include toluene, benzene, pyridine, ethyl acetate, dichloromethane, 1,2-dichloroethane, chloroform, carbon tetrachloride, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2 -Dimethoxyethane, 1,2-diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
また、式(C-7)の化合物は、以下に記載されるような合成法に従っても合成するこ
とができる。 The compound of formula (C-7) can also be synthesized according to the synthesis method as described below.
とができる。 The compound of formula (C-7) can also be synthesized according to the synthesis method as described below.
化合物(C-9)の合成
Synthesis of compound (C-9)
(式中、R6はフェノール性水酸基の保護基を表す。)
(In the formula, R 6 represents a protecting group for a phenolic hydroxyl group.)
本反応は、化合物(C-8)の保護基R6を酸または塩基等により脱保護させることにより、化合物(C-9)を合成する方法である。本反応は、化合物(C-8)に、反応に不活性な溶媒中、酸または塩基を等量、あるいは過剰に用い、室温~加熱還流下で、通常0.5時間~5日間反応されることによって行なわれる。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。酸としては、塩化水素、臭化水素、硫酸、硝酸、リン酸等の無機酸、あるいはこれらの酸を水または有機溶媒で希釈した溶液等が挙げられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、あるいはこれらの塩基を水等で希釈した溶液等が挙げられる。
This reaction is a method of synthesizing compound (C-9) by deprotecting protecting group R 6 of compound (C-8) with an acid or a base. In this reaction, compound (C-8) is usually reacted for 0.5 hour to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent. Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
化合物(C-7)の合成
Synthesis of compound (C-7)
本反応は、化合物(C-9)とアルコール類を光延反応等により反応させることにより、化合物(C-7)を合成する方法である。本反応は、アルコール類をトリフェニルホスフィン、カルボジイミドと反応させた後に、化合物(C-9)と反応させることにより化合物(C-7)を合成する方法である。用いるカルボジイミドとしては、ジエチルカルボジイミド、ジイソプロピルカルボジイミド等が挙げられる。本反応は、-20℃~120℃下で、反応に不活性な溶媒中、化合物(C-9)に等量、あるいは過剰量のアルコール類、トリフェニルホスフィン及びカルボジイミドを通常0.5~12時間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、またはこれらの混合溶媒等が挙げられる。
This reaction is a method of synthesizing compound (C-7) by reacting compound (C-9) with alcohols by Mitsunobu reaction or the like. This reaction is a method of synthesizing compound (C-7) by reacting alcohols with triphenylphosphine and carbodiimide and then reacting with compound (C-9). Examples of the carbodiimide used include diethyl carbodiimide and diisopropyl carbodiimide. In this reaction, an equivalent amount or an excess amount of alcohol, triphenylphosphine and carbodiimide is usually added to 0.5 to 12 in a solvent inert to the reaction at −20 ° C. to 120 ° C. This is done by reacting for hours. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
化合物(C-10)の合成
Synthesis of compound (C-10)
本反応は、化合物(C-7)の保護基R5を酸または塩基等により脱保護させることにより、本発明化合物(C-10)を合成する方法である。本反応は、化合物(C-7)に、反応に不活性な溶媒中、酸または塩基を等量、あるいは過剰に用い、室温~加熱還流下で、通常0.5時間~5日間反応されることによって行なわれる。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。酸としては、塩化水素、臭化水素、硫酸、硝酸、リン酸等の無機酸、あるいはこれらの酸を水または有機溶媒で希釈した溶液等が挙げられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、あるいはこれらの塩基を水等で希釈した溶液等が挙げられる。
This reaction is a method for synthesizing the compound (C-10) of the present invention by deprotecting the protecting group R 5 of the compound (C-7) with an acid or a base. In this reaction, compound (C-7) is usually reacted for 0.5 hour to 5 days at room temperature to heating under reflux using an equal or excess amount of acid or base in a solvent inert to the reaction. Is done. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent. Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
(合成法D)
化合物(D-1)の合成 (Synthesis Method D)
Synthesis of compound (D-1)
化合物(D-1)の合成 (Synthesis Method D)
Synthesis of compound (D-1)
本反応は、ホルミル基からシアノ基への変換反応であり、上記式(C-5)で表される芳香族アルデヒド誘導体をヒドロキシルアミンと反応させることにより行われる。ヒドロキシルアミンとしては、その塩酸塩等のその他の塩を用いてもよいが、その場合には適切な塩基性物質を加えることが好ましい。また、無水酢酸、アセチルクロリド及びトリクロロアセチルクロリド等を1.0~3.0当量加えて、反応を加速させることもできる。これらの反応に用いるヒドロキシルアミンまたはその塩の量は、通常1当量以上を用い、好ましくは1.0~2.0当量である。塩基性物質を用いる場合には、ヒドロキシルアミンの塩に対して1.0~3.0当量を用いる。用いる塩基性物質としては、ギ酸ナトリウム、ギ酸カリウム、酢酸ナトリウム等のカルボン酸塩、炭酸カリウム、炭酸ナトリウム、炭酸水素ナトリウム等の炭酸塩、トリエチルアミン、ピリジン、4-アミノピリジン等の有機アミン塩が用いられる。反応は不活性な溶媒中、塩基の存在下、室温~加熱還流下で、通常0.5時間~3日間反応させることによって行なわれる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。これらの反応に用いられる溶媒としては、酢酸、ギ酸、トルエン、ベンゼン、ピリジン、酢酸エチル、ジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素、ジエチルエーテル、テトラヒドロフラン、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、メタノール、エタノール、2-プロパノール等の溶媒が挙げられる。
This reaction is a conversion reaction from a formyl group to a cyano group, and is performed by reacting an aromatic aldehyde derivative represented by the above formula (C-5) with hydroxylamine. As hydroxylamine, other salts such as hydrochloride thereof may be used. In that case, it is preferable to add an appropriate basic substance. In addition, the reaction can be accelerated by adding 1.0 to 3.0 equivalents of acetic anhydride, acetyl chloride, trichloroacetyl chloride and the like. The amount of hydroxylamine or a salt thereof used in these reactions is usually 1 equivalent or more, preferably 1.0 to 2.0 equivalents. When a basic substance is used, 1.0 to 3.0 equivalents are used with respect to the hydroxylamine salt. As basic substances to be used, carboxylates such as sodium formate, potassium formate and sodium acetate, carbonates such as potassium carbonate, sodium carbonate and sodium hydrogen carbonate, organic amine salts such as triethylamine, pyridine and 4-aminopyridine are used. It is done. The reaction is carried out in an inert solvent in the presence of a base at room temperature to heating under reflux, usually for 0.5 hour to 3 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Solvents used in these reactions include acetic acid, formic acid, toluene, benzene, pyridine, ethyl acetate, dichloromethane, dichloroethane, chloroform, carbon tetrachloride, diethyl ether, tetrahydrofuran, 1,4-dioxane, 1,2-dimethoxyethane. 1,2-diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), methanol, ethanol, 2-propanol and the like.
化合物(D-2)の合成
Synthesis of compound (D-2)
本反応は、シアノ基からテトラゾール環を環化させる反応であり、上記式(D-1)で表される芳香族シアノ基誘導体を酸存在下でアジド化合物と反応させることにより行われる。本反応は、化合物(D-1)とアジド化合物を等量、あるいはいずれかを過剰に用い、反応に不活性な溶媒中、酸存在下、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。また、アジド化合物としては、ナトリウムアジド、トリメチルシリルアジド等が挙げられる。用いる酸としてはギ酸、酢酸等の有機酸、塩酸、硫酸等の無機酸、塩化アンモニウム、酢酸アンモニウム等の無機塩が挙げられる。これらの反応に用いられる溶媒としては、トルエン、ベンゼン、ジクロロメタン、1,2-ジクロロエタン、クロロホルム、四塩化炭素、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)またはこれらの混合溶媒等が挙げられる。
This reaction is a reaction in which a tetrazole ring is cyclized from a cyano group, and is performed by reacting an aromatic cyano group derivative represented by the above formula (D-1) with an azide compound in the presence of an acid. In this reaction, compound (D-1) and an azide compound are used in an equal amount or in excess, and in an inert solvent for the reaction, in the presence of an acid, from room temperature to heating under reflux, usually from 0.5 hour to This is done by reacting for 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Examples of the azide compound include sodium azide and trimethylsilyl azide. Examples of the acid to be used include organic acids such as formic acid and acetic acid, inorganic acids such as hydrochloric acid and sulfuric acid, and inorganic salts such as ammonium chloride and ammonium acetate. Solvents used in these reactions include toluene, benzene, dichloromethane, 1,2-dichloroethane, chloroform, carbon tetrachloride, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1 , 2-diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
化合物(D-3)の合成
Synthesis of compound (D-3)
本反応は、化合物(D-2)の保護基R5を酸または塩基等により脱保護させることにより、本発明化合物(D-3)を合成する方法である。本反応は、化合物(D-2)に、反応に不活性な溶媒中、酸または塩基を等量、あるいは過剰に用い、室温~加熱還流下で、通常0.5時間~5日間反応されることによって行なわれる。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。酸としては、塩化水素、臭化水素、硫酸、硝酸、リン酸等の無機酸、あるいはこれらの酸を水または有機溶媒で希釈した溶液等が挙げられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、あるいはこれらの塩基を水等で希釈した溶液等が挙げられる。
This reaction is a method for synthesizing the compound (D-3) of the present invention by deprotecting the protecting group R 5 of the compound (D-2) with an acid or a base. In this reaction, compound (D-2) is usually reacted for 0.5 hours to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent. Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
化合物(D-4)および(D-5)の合成
Synthesis of compounds (D-4) and (D-5)
(式中、Z4は脱離基を表し、R7は環A上の置換基の定義に従う。)
(In the formula, Z 4 represents a leaving group, and R 7 follows the definition of the substituent on ring A.)
Z4で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(D-2)におけるテトラゾール環上の1位および2位の窒素を塩基存在下で、脱離基を持ったアルキル化試薬と反応させることにより化合物(D-4)および(D-5)を合成する方法である。本反応は、0℃~140℃下で、反応に不活性な溶媒中、化合物(D-2)とアルキル化試薬を等量、あるいは小過剰用いて、塩基存在下、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。用いる塩基性物質としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド、t-ブトキシカリウム等の金属アルコキシド、トリエチルアミン、ピリジン、4-アミノピリジン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)等の有機アミン塩が用いられる。ここに、溶媒としては特に限定はされないが、例えばジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。
Examples of the leaving group represented by Z 4 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is performed by reacting nitrogen at the 1-position and 2-position on the tetrazole ring in compound (D-2) with an alkylating reagent having a leaving group in the presence of a base. This is a method for synthesizing D-5). This reaction is carried out at 0 ° C. to 140 ° C. in the presence of a base in the presence of a base using an equal amount of compound (D-2) and an alkylating reagent in a solvent inert to the reaction, or in a small excess. This is done by reacting for 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Examples of basic substances used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium ethoxide, sodium methoxide, t-butoxy potassium, etc. Organic amine salts such as metal alkoxide, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) Is used. Here, the solvent is not particularly limited. For example, ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, N, N— Examples thereof include dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
化合物(D-6)および(D-7)の合成
Synthesis of compounds (D-6) and (D-7)
(式中、R7は環A上の置換基の定義に従う。)
(Wherein R 7 follows the definition of substituents on ring A.)
本反応は、化合物(D-4)および(D-5)の保護基R5を酸または塩基等により脱保護させることにより、本発明化合物(D-6)および(D-7)を合成する方法である。本反応は、化合物(D-4)および(D-5)に、反応に不活性な溶媒中、酸または塩基を等量、あるいは過剰に用い、室温~加熱還流下で、通常0.5時間~5日間反応されることによって行なわれる。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。酸としては、塩化水素、臭化水素、硫酸、硝酸、リン酸等の無機酸、あるいはこれらの酸を水または有機溶媒で希釈した溶液等が挙げられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、あるいはこれらの塩基を水等で希釈した溶液等が挙げられる。
In this reaction, the protecting groups R 5 of the compounds (D-4) and (D-5) are deprotected with an acid or a base to synthesize the compounds (D-6) and (D-7) of the present invention. Is the method. In this reaction, compounds (D-4) and (D-5) are used in an equivalent amount or in excess of an acid or a base in a solvent inert to the reaction, and the reaction is usually carried out at room temperature to heating under reflux for 0.5 hours. Performed by reacting for ~ 5 days. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent. Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
(合成法E)
化合物(E-1)の合成 (Synthesis method E)
Synthesis of compound (E-1)
化合物(E-1)の合成 (Synthesis method E)
Synthesis of compound (E-1)
本反応は、化合物(D-1)とヒドロキシルアミンを反応させて化合物(E-1)を合成する方法である。本反応は、化合物(D-1)およびヒドロキシルアミンを等量、あるいは過剰に用い、塩基存在下で、反応に不活性な溶媒中、室温~加熱還流下で、通常0.5時間~2日間反応されることによって行なわれる。ここに、塩基としては、トリエチルアミン、ピリジン、4-アミノピリジン等の有機アミンが用いられる。また、用いる塩基を溶媒として用いることもできる。
This reaction is a method of synthesizing compound (E-1) by reacting compound (D-1) with hydroxylamine. In this reaction, compound (D-1) and hydroxylamine are used in an equal amount or in excess, and in the presence of a base, in a solvent inert to the reaction, at room temperature to heating under reflux, usually 0.5 hours to 2 days This is done by reacting. Here, organic bases such as triethylamine, pyridine, 4-aminopyridine are used as the base. Moreover, the base used can also be used as a solvent.
化合物(E-3)の合成
Synthesis of compound (E-3)
(式中、R7は環A上の置換基の定義に従う。)
(Wherein R 7 follows the definition of substituents on ring A.)
本反応は、化合物(E-1)と酸クロライド(E-2)を反応させて化合物(E-3)を合成する方法である。本反応は、化合物(E-1)および酸クロライド(E-2)を等量、あるいは過剰に用い、塩基存在下で、反応に不活性な溶媒中、室温~加熱還流下で、通常0.5時間~2日間反応されることによって行なわれる。ここに、塩基としては、トリエチルアミン、ピリジン、4-アミノピリジン等の有機アミンが用いられる。また、用いる塩基を溶媒として用いることもできる。
This reaction is a method of synthesizing compound (E-3) by reacting compound (E-1) with acid chloride (E-2). In this reaction, the compound (E-1) and acid chloride (E-2) are used in an equal amount or in excess, and in the presence of a base, in a solvent inert to the reaction, usually at room temperature to heating under reflux, usually 0. The reaction is performed for 5 hours to 2 days. Here, organic bases such as triethylamine, pyridine, 4-aminopyridine are used as the base. Moreover, the base used can also be used as a solvent.
化合物(E-4)の合成
Synthesis of compound (E-4)
(式中、R7は環A上の置換基の定義に従う。)
(Wherein R 7 follows the definition of substituents on ring A.)
本反応は、化合物(E-3)の保護基R5を酸または塩基等により脱保護させることにより、本発明化合物(E-4)を合成する方法である。本反応は、化合物(E-3)に、反応に不活性な溶媒中、酸または塩基を等量、あるいは過剰に用い、室温~加熱還流下で、通常0.5時間~5日間反応されることによって行なわれる。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。酸としては、塩化水素、臭化水素、硫酸、硝酸、リン酸等の無機酸、あるいはこれらの酸を水または有機溶媒で希釈した溶液等が挙げられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、あるいはこれらの塩基を水等で希釈した溶液等が挙げられる。
This reaction is a method for synthesizing the compound (E-4) of the present invention by deprotecting the protecting group R 5 of the compound (E-3) with an acid or a base. In this reaction, compound (E-3) is usually reacted for 0.5 hours to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent. Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
化合物(E-6)の合成
Synthesis of compound (E-6)
(式中、R8は炭素数1~3のアルキル基を表す)
(Wherein R 8 represents an alkyl group having 1 to 3 carbon atoms)
本反応は、化合物(E-1)とオルトギ酸エステル(E-5)を反応させてオキサジアゾール環の化合物(E-6)を合成する方法である。本反応は、化合物(E-1)とオルトギ酸エステル(E-5)を等量、あるいはいずれかを過剰に用い、反応に不活性な溶媒中、酸存在下、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。オルトギ酸エステル(E-5)としては、オルトギ酸トリメチル及びオルトギ酸トリエチル等が挙げられる。用いる酸としてはギ酸、酢酸、塩酸、硫酸、トリフルオロ酢酸等の有機酸が挙げられる。これらの反応に用いられる溶媒としては、トルエン、ベンゼン、ジクロロメタン、1,2-ジクロロエタン、クロロホルム、四塩化炭素、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)またはこれらの混合溶媒等が挙げられ、トリフルオロ酢酸等の酸を溶媒として用いてもよい。
This reaction is a method of synthesizing the oxadiazole ring compound (E-6) by reacting the compound (E-1) with the orthoformate ester (E-5). In this reaction, an equal amount of compound (E-1) and orthoformate ester (E-5), or an excess of either, are used in an inert solvent for the reaction in the presence of an acid at room temperature to heating under reflux. Usually, the reaction is performed for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Examples of the orthoformate ester (E-5) include trimethyl orthoformate and triethyl orthoformate. Examples of the acid used include organic acids such as formic acid, acetic acid, hydrochloric acid, sulfuric acid and trifluoroacetic acid. Solvents used in these reactions include toluene, benzene, dichloromethane, 1,2-dichloroethane, chloroform, carbon tetrachloride, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1 , 2-diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof. An acid such as trifluoroacetic acid may be used as a solvent. .
化合物(E-7)の合成
Synthesis of compound (E-7)
本反応は、化合物(E-6)の保護基R5を酸または塩基等により脱保護させることにより、本発明化合物(E-7)を合成する方法である。本反応は、化合物(E-6)に、反応に不活性な溶媒中、酸または塩基を等量、あるいは過剰に用い、室温~加熱還流下で、通常0.5時間~5日間反応されることによって行なわれる。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。酸としては、塩化水素、臭化水素、硫酸、硝酸、リン酸等の無機酸、あるいはこれらの酸を水または有機溶媒で希釈した溶液等が挙げられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、あるいはこれらの塩基を水等で希釈した溶液等が挙げられる。
This reaction is a method for synthesizing the compound (E-7) of the present invention by deprotecting the protecting group R 5 of the compound (E-6) with an acid or a base. In this reaction, compound (E-6) is usually reacted for 0.5 hour to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent. Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
(合成法F)
化合物(F-1)の合成 (Synthesis Method F)
Synthesis of compound (F-1)
化合物(F-1)の合成 (Synthesis Method F)
Synthesis of compound (F-1)
本反応は、化合物(C-5)とヒドロキシルアミンを反応させて化合物(F-1)を合成する方法である。本反応は、化合物(C-5)およびヒドロキシルアミンを等量、あるいは過剰に用い、塩基存在下で、反応に不活性な溶媒中、室温~加熱還流下で、通常0.5時間~2日間反応されることによって行なわれる。ここに、塩基としては、トリエチルアミン、ピリジン、4-アミノピリジン等の有機アミンが用いられる。また、用いる塩基を溶媒として用いることもできる。
This reaction is a method of synthesizing compound (F-1) by reacting compound (C-5) with hydroxylamine. In this reaction, compound (C-5) and hydroxylamine are used in an equal amount or in excess, and in the presence of a base, in a solvent inert to the reaction, at room temperature to heating under reflux, usually 0.5 hours to 2 days. This is done by reacting. Here, organic bases such as triethylamine, pyridine, 4-aminopyridine are used as the base. Moreover, the base used can also be used as a solvent.
化合物(F-2)の合成
Synthesis of compound (F-2)
本反応は、化合物(F-1)と塩素化試薬を反応させて化合物(F-2)を合成する方法である。本反応は、化合物(F-1)および塩素化試薬を等量、あるいは過剰に用い、塩基存在下で、反応に不活性な溶媒中、室温~加熱還流下で、通常0.5時間~2日間反応されることによって行なわれる。ここに、塩素化試薬としては、N-クロロスクシンイミド等を用いることができる。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、またはこれらの混合溶媒等が挙げられる。
This reaction is a method of synthesizing compound (F-2) by reacting compound (F-1) with a chlorinating reagent. In this reaction, compound (F-1) and a chlorinating reagent are used in an equal amount or in excess, and in the presence of a base, in a solvent inert to the reaction, at room temperature to heating under reflux, usually 0.5 hours to 2 This is done by reacting for days. Here, N-chlorosuccinimide or the like can be used as the chlorinating reagent. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethylsulfoxide (DMSO), or these A mixed solvent etc. are mentioned.
化合物(F-4)の合成
Synthesis of compound (F-4)
(式中、R7は環A上の置換基の定義に従う。)
(Wherein R 7 follows the definition of substituents on ring A.)
本反応は、化合物(F-2)とアセチレン化合物(F-3)を反応させて化合物(F-4)を合成する方法である。本反応は、化合物(F-2)およびアセチレン化合物(F-3)を等量、あるいは過剰に用い、塩基存在下で、反応に不活性な溶媒中、室温~加熱還流下で、通常0.5時間~2日間反応されることによって行なわれる。用いる塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、トリエチルアミン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)などが挙げられる。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、またはこれらの混合溶媒等が挙げられる。
This reaction is a method of synthesizing compound (F-4) by reacting compound (F-2) with acetylene compound (F-3). In this reaction, the compound (F-2) and the acetylene compound (F-3) are used in an equal amount or in excess, and in the presence of a base, in a solvent inert to the reaction, usually at room temperature to under reflux with heating. The reaction is performed for 5 hours to 2 days. Examples of the base used include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate and cesium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, triethylamine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) and the like. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
化合物(F-5)の合成
Synthesis of compound (F-5)
本反応は、化合物(F-4)の保護基R5を酸または塩基等により脱保護させることにより、本発明化合物(F-5)を合成する方法である。本反応は、化合物(F-4)に、反応に不活性な溶媒中、酸または塩基を等量、あるいは過剰に用い、室温~加熱還流下で、通常0.5時間~5日間反応されることによって行なわれる。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。酸としては、塩化水素、臭化水素、硫酸、硝酸、リン酸等の無機酸、あるいはこれらの酸を水または有機溶媒で希釈した溶液等が挙げられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、あるいはこれらの塩基を水等で希釈した溶液等が挙げられる。
This reaction is a method for synthesizing the compound (F-5) of the present invention by deprotecting the protecting group R 5 of the compound (F-4) with an acid or a base. In this reaction, compound (F-4) is usually reacted for 0.5 hour to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent. Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
(合成法G)
化合物(G-2)の合成 (Synthesis method G)
Synthesis of compound (G-2)
化合物(G-2)の合成 (Synthesis method G)
Synthesis of compound (G-2)
(式中、Z1およびZ5はそれぞれ脱離基を表し、R9はカルボキシル基の保護基を表す。)
Z1およびZ5で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(G-1)におけるフェノール性水酸基を塩基存在下で、脱離基を持ったアルキル化試薬を反応させることにより化合物(G-2)を合成する方法である。用いる塩基性物質としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド、t-ブトキシカリウム等の金属アルコキシド、トリエチルアミン、ピリジン、4-アミノピリジン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)等の有機アミンが用いられる。本反応は、0℃~140℃下で、反応に不活性な溶媒中、化合物(G-1)に等量、あるいは小過剰に塩基を反応させた後に、等量あるいは過剰量のアルキル化試薬を加え、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。 (In the formula, Z 1 and Z 5 each represent a leaving group, and R 9 represents a protecting group for a carboxyl group.)
Examples of the leaving group represented by Z 1 and Z 5 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method of synthesizing compound (G-2) by reacting a phenolic hydroxyl group in compound (G-1) with an alkylating reagent having a leaving group in the presence of a base. Examples of basic substances used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium ethoxide, sodium methoxide, t-butoxy potassium, etc. Organic amines such as metal alkoxide, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) Used. This reaction is carried out by reacting compound (G-1) with an equal amount or a small excess of a base in a solvent inert to the reaction at 0 ° C. to 140 ° C., and then an equal amount or an excess amount of an alkylating reagent. And the reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited. For example, ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, N, N— Examples thereof include dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
Z1およびZ5で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(G-1)におけるフェノール性水酸基を塩基存在下で、脱離基を持ったアルキル化試薬を反応させることにより化合物(G-2)を合成する方法である。用いる塩基性物質としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド、t-ブトキシカリウム等の金属アルコキシド、トリエチルアミン、ピリジン、4-アミノピリジン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)等の有機アミンが用いられる。本反応は、0℃~140℃下で、反応に不活性な溶媒中、化合物(G-1)に等量、あるいは小過剰に塩基を反応させた後に、等量あるいは過剰量のアルキル化試薬を加え、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。 (In the formula, Z 1 and Z 5 each represent a leaving group, and R 9 represents a protecting group for a carboxyl group.)
Examples of the leaving group represented by Z 1 and Z 5 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method of synthesizing compound (G-2) by reacting a phenolic hydroxyl group in compound (G-1) with an alkylating reagent having a leaving group in the presence of a base. Examples of basic substances used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium ethoxide, sodium methoxide, t-butoxy potassium, etc. Organic amines such as metal alkoxide, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) Used. This reaction is carried out by reacting compound (G-1) with an equal amount or a small excess of a base in a solvent inert to the reaction at 0 ° C. to 140 ° C., and then an equal amount or an excess amount of an alkylating reagent. And the reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited. For example, ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, N, N— Examples thereof include dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
化合物(G-3)の合成
Synthesis of compound (G-3)
(式中、Z5は脱離基を表し、R9はカルボキシル基の保護基を表す。)
(In the formula, Z 5 represents a leaving group, and R 9 represents a protecting group for a carboxyl group.)
本反応は、化合物(G-2)の保護基R9を酸または塩基等により脱保護させることにより、化合物(G-3)を合成する方法である。本反応は、化合物(G-2)に、反応に不活性な溶媒中、酸または塩基を等量、あるいは過剰に用い、室温~加熱還流下で、通常0.5時間~5日間反応されることによって行なわれる。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。酸としては、塩化水素、臭化水素、硫酸、硝酸、リン酸等の無機酸、あるいはこれらの酸を水または有機溶媒で希釈した溶液等が挙げられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、あるいはこれらの塩基を水等で希釈した溶液等が挙げられる。
This reaction is a method of synthesizing compound (G-3) by deprotecting protecting group R 9 of compound (G-2) with an acid or a base. In this reaction, compound (G-2) is usually reacted for 0.5 hour to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent. Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
化合物(G-4)の合成
Synthesis of compound (G-4)
(式中、Z5は脱離基を表す。)
(In the formula, Z 5 represents a leaving group.)
本反応は、化合物(G-3)から酸クロリドである化合物(G-4)を合成する方法である。本反応は、化合物(G-3)に、反応に不活性な溶媒中、塩素化試薬を等量、あるいは過剰に用い、室温~加熱還流下で、通常0.5時間~2日間反応されることによって行なわれる。用いる塩素化試薬としては、塩化チオニル、オキザリルクロリド、塩化ホスホリル等が挙げられる。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、またはこれらの混合溶媒等が挙げられる。
This reaction is a method of synthesizing compound (G-4) which is acid chloride from compound (G-3). In this reaction, compound (G-3) is usually reacted for 0.5 hour to 2 days at room temperature to heating under reflux using an equal or excessive amount of a chlorinating reagent in a solvent inert to the reaction. Is done. Examples of the chlorinating reagent used include thionyl chloride, oxalyl chloride, and phosphoryl chloride. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane and chloroform, N, N-dimethylformamide ( DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
化合物(G-6)の合成
Synthesis of compound (G-6)
(式中、Z5は脱離基を表す。また、R7は環A上の置換基の定義に従う。)
(In the formula, Z 5 represents a leaving group, and R 7 follows the definition of the substituent on ring A.)
本反応は、酸クロリドである化合物(G-4)と化合物(G-5)からオキサジアゾール環である化合物(G-6)を合成する方法である。本反応は、化合物(G-4)に、反応に不活性な溶媒中、塩基存在下、化合物(G-5)を等量、あるいは過剰に用い、室温~加熱還流下で、通常0.5時間~2日間反応されることによって行なわれる。用いる塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、トリエチルアミン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)等の有機アミンが挙げられる。また、溶媒として有機アミンを用いることもできる。
This reaction is a method of synthesizing the compound (G-6) which is an oxadiazole ring from the compound (G-4) which is an acid chloride and the compound (G-5). In this reaction, compound (G-4) is used in an equivalent amount or in excess of compound (G-5) in the presence of a base in a solvent inert to the reaction, and the reaction is usually carried out at room temperature to heating under reflux. The reaction is performed for a time to 2 days. Examples of the base used include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate and cesium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, triethylamine, N-ethyl-N, Examples include organic amines such as N-diisopropylamine (DIPEA) and 1,8-diazabicyclo [5.4.0] -7-undecene (DBU). An organic amine can also be used as a solvent.
化合物(G-8)の合成
Synthesis of compound (G-8)
(式中、Z5は脱離基を表す。また、R7は環A上の置換基の定義に従う。)
(In the formula, Z 5 represents a leaving group, and R 7 follows the definition of the substituent on ring A.)
本反応は、化合物(G-6)と(G-7)をカップリングさせることにより、化合物(G-8)を合成する方法である。Z5で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(G-6)と(G-7)を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、塩基および遷移金属触媒存在下、場合により配位子、カルボン酸及び銅(I価またはII価)塩を加えて、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。塩基としては、水素化リチウム、水素化ナトリウム、水素化カリウム、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、フッ化カリウム、フッ化セシウム、リン酸三カリウム、酢酸ナトリウム、酢酸カリウム等、炭素数1~6のアルコキシドの金属塩(リチウム塩、ナトリウム塩、カリウム塩、マグネシウム塩)、炭素数1~6のアルキルアニオンの金属塩(リチウム塩、ナトリウム塩、カリウム塩、マグネシウム塩)、テトラ(炭素数1~4のアルキル)アンモニウム塩(フッ化塩、塩化塩、臭化塩)、ジイソプロピルエチルアミン、トリブチルアミン、N-メチルモルホリン、ジアザビシクロウンデセン、ジアザビシクロオクタン、又はイミダゾール等が挙げられる。遷移金属触媒としては、銅、パラジウム、コバルト、鉄、ロジウム、ルテニウム、及びイリジウム等が挙げられる。配位子としては、トリ(t-ブチル)ホスフィン、トリ(シクロヘキシル)ホスフィン、t-ブチルジシクロヘキシルホスフィン、ジ(t-ブチル)シクロヘキシルホスフィン、又はジ(t-ブチル)メチルホスフィン等が挙げられる。銅(I価またはII価)塩としては、塩化銅(I)、臭化銅(I)、ヨウ化銅(I)、酢酸銅(I)、フッ化銅(II)、塩化銅(II)、臭化銅(II),ヨウ化銅(II)、酢酸銅(II)及びこれらの水和物、ならびにこれらの混合物等が挙げられる。カルボン酸としては、ギ酸、酢酸、プロピオン酸、n-ブチル酸、イソブチル酸、ペンタン酸、イソペンタン酸、ピバル酸、及びトリフルオロ酢酸等が挙げられる。
This reaction is a method of synthesizing compound (G-8) by coupling compounds (G-6) and (G-7). Examples of the leaving group represented by Z 5 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, a trifluoromethanesulfonyloxy group, and the like. In this reaction, compounds (G-6) and (G-7) are used in equal amounts or in excess, and in a solvent inert to the reaction, in the presence of a base and a transition metal catalyst, optionally a ligand, a carboxyl It is carried out by adding an acid and a copper (I or II) salt and reacting at room temperature to heating under reflux, usually for 0.5 hour to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Bases include lithium hydride, sodium hydride, potassium hydride, sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, potassium fluoride, cesium fluoride, tripotassium phosphate, sodium acetate, acetic acid Metal salts of alkoxides having 1 to 6 carbon atoms such as potassium (lithium salts, sodium salts, potassium salts, magnesium salts), metal salts of alkyl anions having 1 to 6 carbon atoms (lithium salts, sodium salts, potassium salts, magnesium salts) ), Tetra (alkyl having 1 to 4 carbon atoms) ammonium (fluoride, chloride, bromide), diisopropylethylamine, tributylamine, N-methylmorpholine, diazabicycloundecene, diazabicyclooctane, or Examples include imidazole. Examples of the transition metal catalyst include copper, palladium, cobalt, iron, rhodium, ruthenium, and iridium. Examples of the ligand include tri (t-butyl) phosphine, tri (cyclohexyl) phosphine, t-butyldicyclohexylphosphine, di (t-butyl) cyclohexylphosphine, and di (t-butyl) methylphosphine. Copper (I or II) salts include copper (I) chloride, copper (I) bromide, copper (I) iodide, copper (I) acetate, copper (II) fluoride, copper (II) chloride , Copper bromide (II), copper (II) iodide, copper (II) acetate and hydrates thereof, and mixtures thereof. Examples of the carboxylic acid include formic acid, acetic acid, propionic acid, n-butyric acid, isobutyric acid, pentanoic acid, isopentanoic acid, pivalic acid, and trifluoroacetic acid.
化合物(G-9)の合成
Synthesis of compound (G-9)
(R7は環A上の置換基の定義に従う。)
(R 7 follows the definition of substituents on ring A.)
本反応は、化合物(G-8)の保護基R5を酸または塩基等により脱保護させることにより、本発明化合物(G-9)を合成する方法である。本反応は、化合物(G-8)に、反応に不活性な溶媒中、酸または塩基を等量、あるいは過剰に用い、室温~加熱還流下で、通常0.5時間~5日間反応されることによって行なわれる。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。酸としては、塩化水素、臭化水素、硫酸、硝酸、リン酸等の無機酸、あるいはこれらの酸を水または有機溶媒で希釈した溶液等が挙げられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、あるいはこれらの塩基を水等で希釈した溶液等が挙げられる。
This reaction is a method for synthesizing the compound (G-9) of the present invention by deprotecting the protecting group R 5 of the compound (G-8) with an acid or a base. In this reaction, compound (G-8) is usually reacted for 0.5 hour to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent. Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
(合成法H)
化合物(H-2)の合成 (Synthesis method H)
Synthesis of compound (H-2)
化合物(H-2)の合成 (Synthesis method H)
Synthesis of compound (H-2)
(式中、Z1およびZ6は脱離基を表す。)
Z1およびZ6で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(H-1)におけるフェノール性水酸基を塩基存在下で、脱離基を持ったアルキル化試薬を反応させることにより化合物(H-2)を合成する方法である。用いる塩基性物質としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド、t-ブトキシカリウム等の金属アルコキシド、トリエチルアミン、ピリジン、4-アミノピリジン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)等の有機アミンが用いられる。本反応は、0℃~140℃下で、反応に不活性な溶媒中、化合物(H-1)に等量、あるいは小過剰に塩基を反応させた後に、等量あるいは過剰量のアルキル化試薬を加え、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。 (In the formula, Z 1 and Z 6 represent a leaving group.)
Examples of the leaving group represented by Z 1 and Z 6 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method of synthesizing compound (H-2) by reacting a phenolic hydroxyl group in compound (H-1) with an alkylating reagent having a leaving group in the presence of a base. Examples of basic substances used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium ethoxide, sodium methoxide, t-butoxy potassium, etc. Organic amines such as metal alkoxide, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) Used. This reaction is carried out by reacting compound (H-1) with an equal amount or a small excess of a base in a solvent inert to the reaction at 0 ° C. to 140 ° C., followed by an equal amount or an excess amount of an alkylating reagent. And the reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited. For example, ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, N, N— Examples thereof include dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
Z1およびZ6で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(H-1)におけるフェノール性水酸基を塩基存在下で、脱離基を持ったアルキル化試薬を反応させることにより化合物(H-2)を合成する方法である。用いる塩基性物質としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド、t-ブトキシカリウム等の金属アルコキシド、トリエチルアミン、ピリジン、4-アミノピリジン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)等の有機アミンが用いられる。本反応は、0℃~140℃下で、反応に不活性な溶媒中、化合物(H-1)に等量、あるいは小過剰に塩基を反応させた後に、等量あるいは過剰量のアルキル化試薬を加え、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。 (In the formula, Z 1 and Z 6 represent a leaving group.)
Examples of the leaving group represented by Z 1 and Z 6 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method of synthesizing compound (H-2) by reacting a phenolic hydroxyl group in compound (H-1) with an alkylating reagent having a leaving group in the presence of a base. Examples of basic substances used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium ethoxide, sodium methoxide, t-butoxy potassium, etc. Organic amines such as metal alkoxide, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) Used. This reaction is carried out by reacting compound (H-1) with an equal amount or a small excess of a base in a solvent inert to the reaction at 0 ° C. to 140 ° C., followed by an equal amount or an excess amount of an alkylating reagent. And the reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited. For example, ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, N, N— Examples thereof include dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
化合物(H-4)の合成
Synthesis of compound (H-4)
(式中、Z6は脱離基を表す。)
(In the formula, Z 6 represents a leaving group.)
本反応は、化合物(H-2)と(H-3)をカップリングさせることにより、化合物(H-4)を合成する方法である。Z6で示される脱離基としてはヨウ素原子、臭素原子、塩素原子が挙げられる。本反応は、化合物(H-2)と(H-3)を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、塩基、銅触媒および配位子の存在下、室温~加熱還流下で、通常0.5時間~3日間反応させることによって行なわれる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、酢酸エチル、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、またはこれらの混合溶媒等が挙げられる。塩基としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、トリエチルアミン、N‐エチル‐N,N‐ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)などが挙げられる。銅触媒としては塩化銅、臭化銅、ヨウ化銅、酸化銅等が挙げられる。配位子としてはプロリン、トランス-N,N’-ジメチルシクロヘキサン-1,2-ジアミン、N,N-ジメチルアミノ酢酸、1,10-フェナントロリン等が挙げられる。
This reaction is a method of synthesizing compound (H-4) by coupling compounds (H-2) and (H-3). Examples of the leaving group represented by Z 6 include an iodine atom, a bromine atom, and a chlorine atom. In this reaction, compounds (H-2) and (H-3) are used in an equal amount or in excess, and the reaction is carried out in a solvent inert to the reaction in the presence of a base, a copper catalyst and a ligand at room temperature to heating. The reaction is usually carried out under reflux for usually 0.5 hours to 3 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, ethyl acetate, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), Or these mixed solvents etc. are mentioned. Bases include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, metal alkoxides such as sodium ethoxide, sodium methoxide, triethylamine, N-ethyl -N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) and the like. Examples of the copper catalyst include copper chloride, copper bromide, copper iodide, and copper oxide. Examples of the ligand include proline, trans-N, N′-dimethylcyclohexane-1,2-diamine, N, N-dimethylaminoacetic acid, 1,10-phenanthroline and the like.
化合物(H-5)の合成
Synthesis of compound (H-5)
本反応は、化合物(H-4)のアルコキシ基のオルト位を臭素化して化合物(H-5)を合成する方法である。本反応は、化合物(H-4)と臭素源を等量、あるいはいずれかを過剰に用い、反応に不活性な溶媒中、酸存在下、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。臭素源としては、臭素等が挙げられる。用いる酸としてはギ酸、酢酸、塩酸、硫酸、トリフルオロ酢酸等の有機酸が挙げられる。これらの反応に用いられる溶媒としては、ジクロロメタン、1,2-ジクロロエタン、クロロホルム、四塩化炭素、またはこれらの混合溶媒等が挙げられ、酢酸等の酸を溶媒として用いてもよい。
This reaction is a method of synthesizing compound (H-5) by brominating the ortho position of the alkoxy group of compound (H-4). In this reaction, compound (H-4) and a bromine source are used in an equal amount or in excess, and in an inert solvent for the reaction, in the presence of an acid, from room temperature to heating under reflux, usually from 0.5 hours to This is done by reacting for 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Examples of the bromine source include bromine. Examples of the acid used include organic acids such as formic acid, acetic acid, hydrochloric acid, sulfuric acid and trifluoroacetic acid. Examples of the solvent used in these reactions include dichloromethane, 1,2-dichloroethane, chloroform, carbon tetrachloride, or a mixed solvent thereof, and an acid such as acetic acid may be used as the solvent.
化合物(H-7)の合成
Synthesis of compound (H-7)
本反応は、化合物(H-5)とピナコールジボラン(H-6)をカップリングさせることにより、ホウ酸エステルである化合物(H-7)を合成する方法である。本反応は、化合物(H-5)と(H-6)を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、塩基およびパラジウム触媒存在下、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、酢酸カリウム、炭酸セシウム、リン酸三カリウム等の無機塩、あるいはこれらの塩基を水等で希釈した溶液等が挙げられる。パラジウム触媒としては、テトラキス(トリフェニルホスフィン)パラジウム、ジクロロビス(トリフェニルホスフィン)パラジウム、塩化パラジウム-1,1’-ビス(ジフェニルホスフィノ)フェロセン等が好ましい。
This reaction is a method of synthesizing compound (H-7) which is a borate ester by coupling compound (H-5) and pinacol diborane (H-6). In this reaction, compounds (H-5) and (H-6) are used in equal amounts or in excess, and usually in a solvent inert to the reaction in the presence of a base and a palladium catalyst at room temperature to heating under reflux. The reaction is performed for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, potassium acetate, cesium carbonate, and tripotassium phosphate, or solutions obtained by diluting these bases with water. Can be mentioned. As the palladium catalyst, tetrakis (triphenylphosphine) palladium, dichlorobis (triphenylphosphine) palladium, palladium chloride-1,1'-bis (diphenylphosphino) ferrocene and the like are preferable.
化合物(H-8)の合成
Synthesis of compound (H-8)
(式中、Z2は脱離基を表す。)
Z2で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、ホウ酸エステル化合物(H-7)と脱離基を有する複素環化合物をカップリング反応させることにより化合物(H-8)を合成する方法である。本反応は、化合物(H-7)と複素環化合物を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、塩基およびパラジウム触媒存在下、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、リン酸三カリウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、あるいはこれらの塩基を水等で希釈した溶液等が挙げられる。パラジウム触媒としては、テトラキス(トリフェニルホスフィン)パラジウム、ジクロロビス(トリフェニルホスフィン)パラジウム、塩化パラジウム-1,1’-ビス(ジフェニルホスフィノ)フェロセン等が好ましい。 (In the formula, Z 2 represents a leaving group.)
Examples of the leaving group represented by Z 2 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method of synthesizing compound (H-8) by coupling reaction of borate ester compound (H-7) and a heterocyclic compound having a leaving group. In this reaction, the compound (H-7) and the heterocyclic compound are used in an equal amount or in excess, and in an inert solvent for reaction, in the presence of a base and a palladium catalyst, the reaction temperature is usually from 0 to 0 at reflux. It is carried out by reacting for 5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate and tripotassium phosphate, metal alkoxides such as sodium ethoxide and sodium methoxide, or these bases And a solution obtained by diluting with water or the like. As the palladium catalyst, tetrakis (triphenylphosphine) palladium, dichlorobis (triphenylphosphine) palladium, palladium chloride-1,1′-bis (diphenylphosphino) ferrocene and the like are preferable.
Z2で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、ホウ酸エステル化合物(H-7)と脱離基を有する複素環化合物をカップリング反応させることにより化合物(H-8)を合成する方法である。本反応は、化合物(H-7)と複素環化合物を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、塩基およびパラジウム触媒存在下、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、リン酸三カリウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、あるいはこれらの塩基を水等で希釈した溶液等が挙げられる。パラジウム触媒としては、テトラキス(トリフェニルホスフィン)パラジウム、ジクロロビス(トリフェニルホスフィン)パラジウム、塩化パラジウム-1,1’-ビス(ジフェニルホスフィノ)フェロセン等が好ましい。 (In the formula, Z 2 represents a leaving group.)
Examples of the leaving group represented by Z 2 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method of synthesizing compound (H-8) by coupling reaction of borate ester compound (H-7) and a heterocyclic compound having a leaving group. In this reaction, the compound (H-7) and the heterocyclic compound are used in an equal amount or in excess, and in an inert solvent for reaction, in the presence of a base and a palladium catalyst, the reaction temperature is usually from 0 to 0 at reflux. It is carried out by reacting for 5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate and tripotassium phosphate, metal alkoxides such as sodium ethoxide and sodium methoxide, or these bases And a solution obtained by diluting with water or the like. As the palladium catalyst, tetrakis (triphenylphosphine) palladium, dichlorobis (triphenylphosphine) palladium, palladium chloride-1,1′-bis (diphenylphosphino) ferrocene and the like are preferable.
化合物(H-9)の合成
Synthesis of compound (H-9)
本反応は、化合物(H-8)の保護基R5を酸または塩基等により脱保護させることにより、本発明化合物(H-9)を合成する方法である。本反応は、化合物(H-8)に、反応に不活性な溶媒中、酸または塩基を等量、あるいは過剰に用い、室温~加熱還流下で、通常0.5時間~5日間反応されることによって行なわれる。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。酸としては、塩化水素、臭化水素、硫酸、硝酸、リン酸等の無機酸、あるいはこれらの酸を水または有機溶媒で希釈した溶液等が挙げられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、あるいはこれらの塩基を水等で希釈した溶液等が挙げられる。
This reaction is a method for synthesizing the compound (H-9) of the present invention by deprotecting the protecting group R 5 of the compound (H-8) with an acid or a base. In this reaction, compound (H-8) is usually reacted for 0.5 hour to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent. Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
(合成法I)
化合物(I-2)の合成 (Synthesis Method I)
Synthesis of compound (I-2)
化合物(I-2)の合成 (Synthesis Method I)
Synthesis of compound (I-2)
(式中、Z1およびZ7は脱離基を表す。)
Z1およびZ7で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(I-1)におけるフェノール性水酸基を塩基存在下で、脱離基を持ったアルキル化試薬を反応させることにより化合物(I-2)を合成する方法である。用いる塩基性物質としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド、t-ブトキシカリウム等の金属アルコキシド、トリエチルアミン、ピリジン、4-アミノピリジン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)等の有機アミンが用いられる。本反応は、0℃~140℃下で、反応に不活性な溶媒中、化合物(I-1)に等量、あるいは小過剰に塩基を反応させた後に、等量あるいは過剰量のアルキル化試薬を加え、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。 (In the formula, Z 1 and Z 7 represent a leaving group.)
Examples of the leaving group represented by Z 1 and Z 7 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method of synthesizing compound (I-2) by reacting a phenolic hydroxyl group in compound (I-1) with an alkylating reagent having a leaving group in the presence of a base. Examples of basic substances used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium ethoxide, sodium methoxide, t-butoxy potassium, etc. Organic amines such as metal alkoxide, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) Used. This reaction is carried out by reacting compound (I-1) with an equal amount or a small excess of a base in a solvent inert to the reaction at 0 ° C. to 140 ° C., and then an equal amount or an excess amount of an alkylating reagent. And the reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited. For example, ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, N, N— Examples thereof include dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
Z1およびZ7で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(I-1)におけるフェノール性水酸基を塩基存在下で、脱離基を持ったアルキル化試薬を反応させることにより化合物(I-2)を合成する方法である。用いる塩基性物質としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド、t-ブトキシカリウム等の金属アルコキシド、トリエチルアミン、ピリジン、4-アミノピリジン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)等の有機アミンが用いられる。本反応は、0℃~140℃下で、反応に不活性な溶媒中、化合物(I-1)に等量、あるいは小過剰に塩基を反応させた後に、等量あるいは過剰量のアルキル化試薬を加え、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。 (In the formula, Z 1 and Z 7 represent a leaving group.)
Examples of the leaving group represented by Z 1 and Z 7 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method of synthesizing compound (I-2) by reacting a phenolic hydroxyl group in compound (I-1) with an alkylating reagent having a leaving group in the presence of a base. Examples of basic substances used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium ethoxide, sodium methoxide, t-butoxy potassium, etc. Organic amines such as metal alkoxide, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) Used. This reaction is carried out by reacting compound (I-1) with an equal amount or a small excess of a base in a solvent inert to the reaction at 0 ° C. to 140 ° C., and then an equal amount or an excess amount of an alkylating reagent. And the reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited. For example, ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, N, N— Examples thereof include dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
化合物(I-3)の合成
Synthesis of compound (I-3)
(式中、Z7は脱離基を表す。)
(In the formula, Z 7 represents a leaving group.)
本反応は、化合物(I-2)とp-トルエンスルホニルアセトニトリル(C-6)を反応させて1,3-オキサゾール環である化合物(I-3)を合成する方法である。本反応は、化合物(I-2)とp-トルエンスルホニルアセトニトリル(C-6)を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、塩基存在下、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。用いる塩基としては、炭酸カリウム、炭酸ナトリウム、炭酸水素ナトリウム等の炭酸塩、トリエチルアミン、ピリジン、4-アミノピリジン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)等の有機アミンが用いられる。これらの反応に用いられる溶媒としては、トルエン、ベンゼン、ピリジン、酢酸エチル、ジクロロメタン、1,2-ジクロロエタン、クロロホルム、四塩化炭素、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)またはこれらの混合溶媒等が挙げられる。
This reaction is a method of synthesizing compound (I-3) which is a 1,3-oxazole ring by reacting compound (I-2) with p-toluenesulfonylacetonitrile (C-6). In this reaction, compound (I-2) and p-toluenesulfonylacetonitrile (C-6) are used in an equal amount or in excess, and in a solvent inert to the reaction, in the presence of a base, at room temperature to under reflux. The reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Examples of the base used include carbonates such as potassium carbonate, sodium carbonate and sodium hydrogen carbonate, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5. 4.0] -7-undecene (DBU) and other organic amines are used. Solvents used in these reactions include toluene, benzene, pyridine, ethyl acetate, dichloromethane, 1,2-dichloroethane, chloroform, carbon tetrachloride, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2 -Dimethoxyethane, 1,2-diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
化合物(I-4)の合成
Synthesis of compound (I-4)
(式中、Z7は脱離基を表す。)
(In the formula, Z 7 represents a leaving group.)
本反応は、化合物(I-3)と(H-3)をカップリングさせることにより、化合物(I-4)を合成する方法である。Z7で示される脱離基としてはヨウ素原子、臭素原子、塩素原子が挙げられる。本反応は、化合物(I-3)と(H-3)を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、塩基、銅触媒および配位子の存在下、室温~加熱還流下で、通常0.5時間~3日間反応させることによって行なわれる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、酢酸エチル、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、またはこれらの混合溶媒等が挙げられる。塩基としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、トリエチルアミン、N‐エチル‐N,N‐ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)などが挙げられる。銅触媒としては塩化銅、臭化銅、ヨウ化銅、酸化銅等が挙げられる。配位子としてはプロリン、トランス-N,N’-ジメチルシクロヘキサン-1,2-ジアミン、N,N-ジメチルアミノ酢酸、1,10-フェナントロリン等が挙げられる。
This reaction is a method of synthesizing compound (I-4) by coupling compounds (I-3) and (H-3). Examples of the leaving group represented by Z 7 include an iodine atom, a bromine atom, and a chlorine atom. In this reaction, compounds (I-3) and (H-3) are used in an equal amount or in excess, and the reaction is carried out in a solvent inert to the reaction in the presence of a base, a copper catalyst and a ligand at room temperature to heating. The reaction is usually carried out under reflux for usually 0.5 hours to 3 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, ethyl acetate, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), Or these mixed solvents etc. are mentioned. Bases include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, metal alkoxides such as sodium ethoxide, sodium methoxide, triethylamine, N-ethyl -N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) and the like. Examples of the copper catalyst include copper chloride, copper bromide, copper iodide, and copper oxide. Examples of the ligand include proline, trans-N, N′-dimethylcyclohexane-1,2-diamine, N, N-dimethylaminoacetic acid, 1,10-phenanthroline and the like.
化合物(I-5)の合成
Synthesis of Compound (I-5)
本反応は、化合物(I-4)の保護基R5を酸または塩基等により脱保護させることにより、本発明化合物(I-5)を合成する方法である。本反応は、化合物(I-4)に、反応に不活性な溶媒中、酸または塩基を等量、あるいは過剰に用い、室温~加熱還流下で、通常0.5時間~5日間反応されることによって行なわれる。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。酸としては、塩化水素、臭化水素、硫酸、硝酸、リン酸等の無機酸、あるいはこれらの酸を水または有機溶媒で希釈した溶液等が挙げられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、あるいはこれらの塩基を水等で希釈した溶液等が挙げられる。
This reaction is a method for synthesizing the compound (I-5) of the present invention by deprotecting the protecting group R 5 of the compound (I-4) with an acid or a base. In this reaction, compound (I-4) is usually reacted for 0.5 hours to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent. Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
合成法(J)
化合物(J-2)の合成 Synthesis method (J)
Synthesis of compound (J-2)
化合物(J-2)の合成 Synthesis method (J)
Synthesis of compound (J-2)
(式中、Z8およびZ9は脱離基を表す。)
Z8およびZ9で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(J-1)におけるピリジンの4位を塩基によりリチウム化あるいはナトリウム化させた後に、ホルミル化剤によりホルミル化させることにより、化合物(J-2)を合成する方法である。塩基としては、ジイソプロピルアミンとn-ブチルリチウムから調整されるリチウムジイソプロピルアミン(LDA)等が挙げられる。また、ホルミル化剤としては、N,N-ジメチルホルムアミド(DMF)、N-ホルミルモルホリン等が挙げられる。本反応は、-78℃~0℃下で、反応に不活性な溶媒中、化合物(J-1)に等量、あるいは小過剰に塩基を反応させた後に、等量あるいは過剰量のホルミル化剤を加え、通常0.5~5時間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、またはこれらの混合溶媒等が挙げられる。 (In the formula, Z 8 and Z 9 represent a leaving group.)
Examples of the leaving group represented by Z 8 and Z 9 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method of synthesizing compound (J-2) by lithiating or sodiumating the 4-position of pyridine in compound (J-1) with a base and then formylating with a formylating agent. Examples of the base include lithium diisopropylamine (LDA) prepared from diisopropylamine and n-butyllithium. Examples of the formylating agent include N, N-dimethylformamide (DMF) and N-formylmorpholine. This reaction is carried out at −78 ° C. to 0 ° C. in a solvent inert to the reaction by subjecting compound (J-1) to an equal amount or a small excess of the base, followed by an equal amount or an excess amount of formylation. The reaction is usually performed by adding an agent and reacting for 0.5 to 5 hours. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, or a mixture thereof A solvent etc. are mentioned.
Z8およびZ9で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(J-1)におけるピリジンの4位を塩基によりリチウム化あるいはナトリウム化させた後に、ホルミル化剤によりホルミル化させることにより、化合物(J-2)を合成する方法である。塩基としては、ジイソプロピルアミンとn-ブチルリチウムから調整されるリチウムジイソプロピルアミン(LDA)等が挙げられる。また、ホルミル化剤としては、N,N-ジメチルホルムアミド(DMF)、N-ホルミルモルホリン等が挙げられる。本反応は、-78℃~0℃下で、反応に不活性な溶媒中、化合物(J-1)に等量、あるいは小過剰に塩基を反応させた後に、等量あるいは過剰量のホルミル化剤を加え、通常0.5~5時間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、またはこれらの混合溶媒等が挙げられる。 (In the formula, Z 8 and Z 9 represent a leaving group.)
Examples of the leaving group represented by Z 8 and Z 9 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method of synthesizing compound (J-2) by lithiating or sodiumating the 4-position of pyridine in compound (J-1) with a base and then formylating with a formylating agent. Examples of the base include lithium diisopropylamine (LDA) prepared from diisopropylamine and n-butyllithium. Examples of the formylating agent include N, N-dimethylformamide (DMF) and N-formylmorpholine. This reaction is carried out at −78 ° C. to 0 ° C. in a solvent inert to the reaction by subjecting compound (J-1) to an equal amount or a small excess of the base, followed by an equal amount or an excess amount of formylation. The reaction is usually performed by adding an agent and reacting for 0.5 to 5 hours. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, or a mixture thereof A solvent etc. are mentioned.
化合物(J-4)の合成
Synthesis of compound (J-4)
(式中、Z8およびZ9は脱離基、Z10は-B(OH)2または-B(OR10)OR11を表す。ここで、R10およびR11は独立して炭素数1~6のアルキル基、またはR10およびR11が一体となって炭素数1~6のアルキレン基を表す。)本反応は、化合物(J-2)とボロン酸またはボロン酸エステルである化合物(J-3)をカップリングさせることにより、化合物(J-4)を合成する方法である。Z8およびZ9で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(J-2)と(J-3)を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、塩基およびパラジウム触媒存在下、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、リン酸三カリウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、あるいはこれらの塩基を水等で希釈した溶液等が挙げられる。パラジウム触媒としては、テトラキス(トリフェニルホスフィン)パラジウム、ジクロロビス(トリフェニルホスフィン)パラジウム、塩化パラジウム-1,1’-ビス(ジフェニルホスフィノ)フェロセン等が好ましい。
(Wherein Z 8 and Z 9 represent a leaving group, Z 10 represents —B (OH) 2 or —B (OR 10 ) OR 11 , where R 10 and R 11 independently represent 1 carbon atom. An alkyl group of ˜6, or R 10 and R 11 together represent an alkylene group of 1 to 6 carbon atoms.) In this method, compound (J-4) is synthesized by coupling J-3). Examples of the leaving group represented by Z 8 and Z 9 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. In this reaction, compounds (J-2) and (J-3) are used in equal amounts or in excess, and usually in a solvent inert to the reaction in the presence of a base and a palladium catalyst at room temperature to heating under reflux. The reaction is performed for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate and tripotassium phosphate, metal alkoxides such as sodium ethoxide and sodium methoxide, or these bases And a solution obtained by diluting with water or the like. As the palladium catalyst, tetrakis (triphenylphosphine) palladium, dichlorobis (triphenylphosphine) palladium, palladium chloride-1,1′-bis (diphenylphosphino) ferrocene and the like are preferable.
化合物(J-5)の合成
Synthesis of compound (J-5)
(式中、Z8は脱離基を表す。)
Z8で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、ホルミル基からシアノ基への変換反応であり、上記式(J-4)で表される芳香族アルデヒド誘導体をヒドロキシルアミンと反応させることにより行われる。ヒドロキシルアミンとしては、その塩酸塩等のその他の塩を用いてもよいが、その場合には適切な塩基性物質を加えることが好ましい。また、無水酢酸、アセチルクロリド及びトリクロロアセチルクロリド等を1.0~3.0当量加えて、反応を加速させることもできる。これらの反応に用いるヒドロキシルアミンまたはその塩の量は、通常1当量以上を用い、好ましくは1.0~2.0当量である。塩基性物質を用いる場合には、ヒドロキシルアミンの塩に対して1.0~3.0当量を用いる。用いる塩基性物質としては、ギ酸ナトリウム、ギ酸カリウム、酢酸ナトリウム等のカルボン酸塩、炭酸カリウム、炭酸ナトリウム、炭酸水素ナトリウム等の炭酸塩、トリエチルアミン、ピリジン、4-アミノピリジン等の有機アミンが用いられる。反応は不活性な溶媒中、塩基の存在下、室温~加熱還流下で、通常0.5時間~3日間反応させることによって行なわれる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。これらの反応に用いられる溶媒としては、酢酸、ギ酸、トルエン、ベンゼン、ピリジン、酢酸エチル、ジクロロメタン、1,2-ジクロロエタン、クロロホルム、四塩化炭素、ジエチルエーテル、テトラヒドロフラン、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、メタノール、エタノール、2-プロパノール等の溶媒が挙げられる。 (In the formula, Z 8 represents a leaving group.)
Examples of the leaving group represented by Z 8 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a conversion reaction from a formyl group to a cyano group, and is performed by reacting an aromatic aldehyde derivative represented by the above formula (J-4) with hydroxylamine. As hydroxylamine, other salts such as hydrochloride thereof may be used. In that case, it is preferable to add an appropriate basic substance. In addition, the reaction can be accelerated by adding 1.0 to 3.0 equivalents of acetic anhydride, acetyl chloride, trichloroacetyl chloride and the like. The amount of hydroxylamine or a salt thereof used in these reactions is usually 1 equivalent or more, preferably 1.0 to 2.0 equivalents. When a basic substance is used, 1.0 to 3.0 equivalents are used with respect to the hydroxylamine salt. As basic substances to be used, carboxylates such as sodium formate, potassium formate and sodium acetate, carbonates such as potassium carbonate, sodium carbonate and sodium hydrogen carbonate, organic amines such as triethylamine, pyridine and 4-aminopyridine are used. . The reaction is carried out in an inert solvent in the presence of a base at room temperature to heating under reflux, usually for 0.5 hour to 3 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Solvents used in these reactions include acetic acid, formic acid, toluene, benzene, pyridine, ethyl acetate, dichloromethane, 1,2-dichloroethane, chloroform, carbon tetrachloride, diethyl ether, tetrahydrofuran, 1,4-dioxane, 1, Examples include 2-dimethoxyethane, 1,2-diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), methanol, ethanol, 2-propanol and the like.
Z8で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、ホルミル基からシアノ基への変換反応であり、上記式(J-4)で表される芳香族アルデヒド誘導体をヒドロキシルアミンと反応させることにより行われる。ヒドロキシルアミンとしては、その塩酸塩等のその他の塩を用いてもよいが、その場合には適切な塩基性物質を加えることが好ましい。また、無水酢酸、アセチルクロリド及びトリクロロアセチルクロリド等を1.0~3.0当量加えて、反応を加速させることもできる。これらの反応に用いるヒドロキシルアミンまたはその塩の量は、通常1当量以上を用い、好ましくは1.0~2.0当量である。塩基性物質を用いる場合には、ヒドロキシルアミンの塩に対して1.0~3.0当量を用いる。用いる塩基性物質としては、ギ酸ナトリウム、ギ酸カリウム、酢酸ナトリウム等のカルボン酸塩、炭酸カリウム、炭酸ナトリウム、炭酸水素ナトリウム等の炭酸塩、トリエチルアミン、ピリジン、4-アミノピリジン等の有機アミンが用いられる。反応は不活性な溶媒中、塩基の存在下、室温~加熱還流下で、通常0.5時間~3日間反応させることによって行なわれる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。これらの反応に用いられる溶媒としては、酢酸、ギ酸、トルエン、ベンゼン、ピリジン、酢酸エチル、ジクロロメタン、1,2-ジクロロエタン、クロロホルム、四塩化炭素、ジエチルエーテル、テトラヒドロフラン、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、メタノール、エタノール、2-プロパノール等の溶媒が挙げられる。 (In the formula, Z 8 represents a leaving group.)
Examples of the leaving group represented by Z 8 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a conversion reaction from a formyl group to a cyano group, and is performed by reacting an aromatic aldehyde derivative represented by the above formula (J-4) with hydroxylamine. As hydroxylamine, other salts such as hydrochloride thereof may be used. In that case, it is preferable to add an appropriate basic substance. In addition, the reaction can be accelerated by adding 1.0 to 3.0 equivalents of acetic anhydride, acetyl chloride, trichloroacetyl chloride and the like. The amount of hydroxylamine or a salt thereof used in these reactions is usually 1 equivalent or more, preferably 1.0 to 2.0 equivalents. When a basic substance is used, 1.0 to 3.0 equivalents are used with respect to the hydroxylamine salt. As basic substances to be used, carboxylates such as sodium formate, potassium formate and sodium acetate, carbonates such as potassium carbonate, sodium carbonate and sodium hydrogen carbonate, organic amines such as triethylamine, pyridine and 4-aminopyridine are used. . The reaction is carried out in an inert solvent in the presence of a base at room temperature to heating under reflux, usually for 0.5 hour to 3 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Solvents used in these reactions include acetic acid, formic acid, toluene, benzene, pyridine, ethyl acetate, dichloromethane, 1,2-dichloroethane, chloroform, carbon tetrachloride, diethyl ether, tetrahydrofuran, 1,4-dioxane, 1, Examples include 2-dimethoxyethane, 1,2-diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), methanol, ethanol, 2-propanol and the like.
化合物(J-6)の合成
Synthesis of compound (J-6)
(式中、Z8は脱離基を表す。)
(In the formula, Z 8 represents a leaving group.)
本反応は、化合物(J-5)と(G-7)をカップリングさせることにより、化合物(J-6)を合成する方法である。Z8で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(J-5)と(G-7)を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、塩基および遷移金属触媒存在下、場合により配位子、カルボン酸および銅(I価またはII価)塩を加えて、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。塩基としては、水素化リチウム、水素化ナトリウム、水素化カリウム、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、フッ化カリウム、フッ化セシウム、リン酸三カリウム、酢酸ナトリウム、酢酸カリウム等、炭素数1~6のアルコキシドの金属塩(リチウム塩、ナトリウム塩、カリウム塩、マグネシウム塩)、炭素数1~6のアルキルアニオンの金属塩(リチウム塩、ナトリウム塩、カリウム塩、マグネシウム塩)、テトラ(炭素数1~4のアルキル)アンモニウム塩(フッ化塩、塩化塩、臭化塩)、ジイソプロピルエチルアミン、トリブチルアミン、N-メチルモルホリン、ジアザビシクロウンデセン、ジアザビシクロオクタン、又はイミダゾール等が挙げられる。遷移金属触媒としては、銅、パラジウム、コバルト、鉄、ロジウム、ルテニウム、及びイリジウム等が挙げられる。配位子としては、トリ(t-ブチル)ホスフィン、トリ(シクロヘキシル)ホスフィン、t-ブチルジシクロヘキシルホスフィン、ジ(t-ブチル)シクロヘキシルホスフィン、又はジ(t-ブチル)メチルホスフィン等が挙げられる。銅(I価またはII価)塩としては、塩化銅(I)、臭化銅(I)、ヨウ化銅(I)、酢酸銅(I)、フッ化銅(II)、塩化銅(II)、臭化銅(II),ヨウ化銅(II)、酢酸銅(II)及びこれらの水和物、ならびにこれらの混合物等が挙げられる。カルボン酸としては、ギ酸、酢酸、プロピオン酸、n-ブチル酸、イソブチル酸、ペンタン酸、イソペンタン酸、ピバル酸、及びトリフルオロ酢酸等が挙げられる。
This reaction is a method of synthesizing compound (J-6) by coupling compound (J-5) and (G-7). Examples of the leaving group represented by Z 8 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. In this reaction, compounds (J-5) and (G-7) are used in equal amounts or in excess, and in a solvent inert to the reaction, in the presence of a base and a transition metal catalyst, optionally a ligand, a carboxyl It is carried out by adding an acid and a copper (I or II) salt and reacting at room temperature to heating under reflux, usually for 0.5 hour to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Bases include lithium hydride, sodium hydride, potassium hydride, sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, potassium fluoride, cesium fluoride, tripotassium phosphate, sodium acetate, acetic acid Metal salts of alkoxides having 1 to 6 carbon atoms such as potassium (lithium salts, sodium salts, potassium salts, magnesium salts), metal salts of alkyl anions having 1 to 6 carbon atoms (lithium salts, sodium salts, potassium salts, magnesium salts) ), Tetra (alkyl having 1 to 4 carbon atoms) ammonium (fluoride, chloride, bromide), diisopropylethylamine, tributylamine, N-methylmorpholine, diazabicycloundecene, diazabicyclooctane, or Examples include imidazole. Examples of the transition metal catalyst include copper, palladium, cobalt, iron, rhodium, ruthenium, and iridium. Examples of the ligand include tri (t-butyl) phosphine, tri (cyclohexyl) phosphine, t-butyldicyclohexylphosphine, di (t-butyl) cyclohexylphosphine, and di (t-butyl) methylphosphine. Copper (I or II) salts include copper (I) chloride, copper (I) bromide, copper (I) iodide, copper (I) acetate, copper (II) fluoride, copper (II) chloride , Copper bromide (II), copper (II) iodide, copper (II) acetate and hydrates thereof, and mixtures thereof. Examples of the carboxylic acid include formic acid, acetic acid, propionic acid, n-butyric acid, isobutyric acid, pentanoic acid, isopentanoic acid, pivalic acid, and trifluoroacetic acid.
化合物(J-7)の合成
Synthesis of compound (J-7)
本反応は、シアノ基からテトラゾール環を環化させる反応であり、上記式(J-6)で表される芳香族シアノ基誘導体を酸存在下でアジド化合物と反応させることにより行われる。本反応は、化合物(J-6)とアジド化合物を等量、あるいはいずれかを過剰に用い、反応に不活性な溶媒中、酸存在下、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。また、アジド化合物としては、ナトリウムアジド、トリメチルシリルアジド等が挙げられる。用いる酸としてはギ酸、酢酸等の有機酸、塩酸、硫酸等の無機酸、塩化アンモニウム、酢酸アンモニウム等の無機塩が挙げられる。これらの反応に用いられる溶媒としては、トルエン、ベンゼン、ジクロロメタン、1,2-ジクロロエタン、クロロホルム、四塩化炭素、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)またはこれらの混合溶媒等が挙げられる。
This reaction is a reaction in which a tetrazole ring is cyclized from a cyano group, and is performed by reacting an aromatic cyano group derivative represented by the above formula (J-6) with an azide compound in the presence of an acid. In this reaction, compound (J-6) and an azide compound are used in an equal amount or in excess, and in an inert solvent for the reaction, in the presence of an acid, from room temperature to heating under reflux, usually from 0.5 hour to This is done by reacting for 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Examples of the azide compound include sodium azide and trimethylsilyl azide. Examples of the acid to be used include organic acids such as formic acid and acetic acid, inorganic acids such as hydrochloric acid and sulfuric acid, and inorganic salts such as ammonium chloride and ammonium acetate. Solvents used in these reactions include toluene, benzene, dichloromethane, 1,2-dichloroethane, chloroform, carbon tetrachloride, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1 , 2-diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
化合物(J-8)の合成
Synthesis of compound (J-8)
本反応は、化合物(J-7)の保護基R5を酸または塩基等により脱保護させることにより、本発明化合物(J-8)を合成する方法である。本反応は、化合物(J-7)に、反応に不活性な溶媒中、酸または塩基を等量、あるいは過剰に用い、室温~加熱還流下で、通常0.5時間~5日間反応されることによって行なわれる。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。酸としては、塩化水素、臭化水素、硫酸、硝酸、リン酸等の無機酸、あるいはこれらの酸を水または有機溶媒で希釈した溶液等が挙げられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、あるいはこれらの塩基を水等で希釈した溶液等が挙げられる。なお、上記合成法( J)は、R1が1もしくは複数の炭素数1~6のアルキル基、炭素数1~6のアルコキシ基もしくはハロゲン原子で置換されていてもよいアリール基である化合物に共通である。
This reaction is a method for synthesizing the compound (J-8) of the present invention by deprotecting the protecting group R 5 of the compound (J-7) with an acid or a base. In this reaction, compound (J-7) is usually reacted for 0.5 hour to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent. Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned. Note that the synthesis method (J) described above is performed on a compound in which R 1 is an alkyl group having 1 or 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, or an aryl group optionally substituted with a halogen atom. It is common.
(合成法K)
化合物(K-1)の合成 (Synthesis Method K)
Synthesis of compound (K-1)
化合物(K-1)の合成 (Synthesis Method K)
Synthesis of compound (K-1)
(式中、Z8は脱離基を表す。)
(In the formula, Z 8 represents a leaving group.)
本反応は、化合物(J-4)と(G-7)をカップリングさせることにより、化合物(K-1)を合成する方法である。Z8で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(J-4)と(G-7)を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、塩基および遷移金属触媒存在下、場合により配位子、カルボン酸および銅(I価またはII価)塩を加えて、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。塩基としては、水素化リチウム、水素化ナトリウム、水素化カリウム、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、フッ化カリウム、フッ化セシウム、リン酸三カリウム、酢酸ナトリウム、酢酸カリウム等、炭素数1~6のアルコキシドの金属塩(リチウム塩、ナトリウム塩、カリウム塩、マグネシウム塩)、炭素数1~6のアルキルアニオンの金属塩(リチウム塩、ナトリウム塩、カリウム塩、マグネシウム塩)、テトラ(炭素数1~4のアルキル)アンモニウム塩(フッ化塩、塩化塩、臭化塩)、ジイソプロピルエチルアミン、トリブチルアミン、N-メチルモルホリン、ジアザビシクロウンデセン、ジアザビシクロオクタン、又はイミダゾール等が挙げられる。遷移金属触媒としては、銅、パラジウム、コバルト、鉄、ロジウム、ルテニウム、及びイリジウム等が挙げられる。配位子としては、トリ(t-ブチル)ホスフィン、トリ(シクロヘキシル)ホスフィン、t-ブチルジシクロヘキシルホスフィン、ジ(t-ブチル)シクロヘキシルホスフィン、又はジ(t-ブチル)メチルホスフィン等が挙げられる。銅(I価またはII価)塩としては、塩化銅(I)、臭化銅(I)、ヨウ化銅(I)、酢酸銅(I)、フッ化銅(II)、塩化銅(II)、臭化銅(II),ヨウ化銅(II)、酢酸銅(II)及びこれらの水和物、ならびにこれらの混合物等が挙げられる。カルボン酸としては、ギ酸、酢酸、プロピオン酸、n-ブチル酸、イソブチル酸、ペンタン酸、イソペンタン酸、ピバル酸、及びトリフルオロ酢酸等が挙げられる。
This reaction is a method of synthesizing compound (K-1) by coupling compound (J-4) and (G-7). Examples of the leaving group represented by Z 8 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. In this reaction, compounds (J-4) and (G-7) are used in equal amounts or in excess, and in a solvent inert to the reaction, in the presence of a base and a transition metal catalyst, optionally a ligand, a carboxyl It is carried out by adding an acid and a copper (I or II) salt and reacting at room temperature to heating under reflux, usually for 0.5 hour to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Bases include lithium hydride, sodium hydride, potassium hydride, sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, potassium fluoride, cesium fluoride, tripotassium phosphate, sodium acetate, acetic acid Metal salts of alkoxides having 1 to 6 carbon atoms such as potassium (lithium salts, sodium salts, potassium salts, magnesium salts), metal salts of alkyl anions having 1 to 6 carbon atoms (lithium salts, sodium salts, potassium salts, magnesium salts) ), Tetra (alkyl having 1 to 4 carbon atoms) ammonium (fluoride, chloride, bromide), diisopropylethylamine, tributylamine, N-methylmorpholine, diazabicycloundecene, diazabicyclooctane, or Examples include imidazole. Examples of the transition metal catalyst include copper, palladium, cobalt, iron, rhodium, ruthenium, and iridium. Examples of the ligand include tri (t-butyl) phosphine, tri (cyclohexyl) phosphine, t-butyldicyclohexylphosphine, di (t-butyl) cyclohexylphosphine, and di (t-butyl) methylphosphine. Copper (I or II) salts include copper (I) chloride, copper (I) bromide, copper (I) iodide, copper (I) acetate, copper (II) fluoride, copper (II) chloride , Copper bromide (II), copper (II) iodide, copper (II) acetate and hydrates thereof, and mixtures thereof. Examples of the carboxylic acid include formic acid, acetic acid, propionic acid, n-butyric acid, isobutyric acid, pentanoic acid, isopentanoic acid, pivalic acid, and trifluoroacetic acid.
化合物(K-2)の合成
Synthesis of compound (K-2)
本反応は、化合物(K-1)とp-トルエンスルホニルアセトニトリル(C-6)を反応させて1,3-オキサゾール環を合成する方法である。本反応は、化合物(K-1)とp-トルエンスルホニルアセトニトリル(C-6)を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、塩基存在下、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。用いる塩基としては、炭酸カリウム、炭酸ナトリウム、炭酸水素ナトリウム等の炭酸塩、トリエチルアミン、ピリジン、4-アミノピリジン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)等の有機アミンが用いられる。これらの反応に用いられる溶媒としては、トルエン、ベンゼン、ピリジン、酢酸エチル、ジクロロメタン、1,2-ジクロロエタン、クロロホルム、四塩化炭素、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)またはこれらの混合溶媒等が挙げられる。
This reaction is a method of synthesizing a 1,3-oxazole ring by reacting compound (K-1) with p-toluenesulfonylacetonitrile (C-6). In this reaction, compound (K-1) and p-toluenesulfonylacetonitrile (C-6) are used in an equal amount or in excess, and in a solvent inert to the reaction in the presence of a base, from room temperature to heating under reflux. The reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Examples of the base used include carbonates such as potassium carbonate, sodium carbonate and sodium hydrogen carbonate, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5. 4.0] -7-undecene (DBU) and other organic amines are used. Solvents used in these reactions include toluene, benzene, pyridine, ethyl acetate, dichloromethane, 1,2-dichloroethane, chloroform, carbon tetrachloride, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2 -Dimethoxyethane, 1,2-diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
化合物(K-3)の合成
Synthesis of compound (K-3)
本反応は、化合物(K-2)の保護基R5を酸または塩基等により脱保護させることにより、本発明化合物(K-3)を合成する方法である。本反応は、化合物(K-2)に、反応に不活性な溶媒中、酸または塩基を等量、あるいは過剰に用い、室温~加熱還流下で、通常0.5時間~5日間反応されることによって行なわれる。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。酸としては、塩化水素、臭化水素、硫酸、硝酸、リン酸等の無機酸、あるいはこれらの酸を水または有機溶媒で希釈した溶液等が挙げられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、あるいはこれらの塩基を水等で希釈した溶液等が挙げられる。なお、上記合成法(K)は、R1が1もしくは複数の炭素数1~6のアルキル基、炭素数1~6のアルコキシ基もしくはハロゲン原子で置換されていてもよいアリール基である化合物に共通である。
This reaction is a method for synthesizing the compound (K-3) of the present invention by deprotecting the protecting group R 5 of the compound (K-2) with an acid or a base. In this reaction, compound (K-2) is usually reacted for 0.5 hour to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent. Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned. Note that the synthesis method (K) described above is performed on a compound in which R 1 is an alkyl group having 1 or 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, or an aryl group optionally substituted with a halogen atom. It is common.
合成法(L)
化合物(L-2)の合成 Synthesis method (L)
Synthesis of compound (L-2)
化合物(L-2)の合成 Synthesis method (L)
Synthesis of compound (L-2)
(式中、R6はフェノール性水酸基の保護基を表し、Z11は脱離基を表す。)
Z11で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(L-1)におけるフェノール性水酸基を塩基存在下で、脱離基を持ったアルキル化試薬を反応させることにより化合物(L-2)を合成する方法である。用いる塩基性物質としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド、t-ブトキシカリウム等の金属アルコキシド、トリエチルアミン、ピリジン、4-アミノピリジン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)等の有機アミンが用いられる。本反応は、0℃~140℃下で、反応に不活性な溶媒中、化合物(L-1)に等量、あるいは小過剰に塩基を反応させた後に、等量あるいは過剰量のアルキル化試薬を加え、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。 (Wherein R 6 represents a protecting group for a phenolic hydroxyl group, and Z 11 represents a leaving group.)
Examples of the leaving group represented by Z 11 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method of synthesizing compound (L-2) by reacting a phenolic hydroxyl group in compound (L-1) with an alkylating reagent having a leaving group in the presence of a base. Examples of basic substances used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium ethoxide, sodium methoxide, t-butoxy potassium, etc. Organic amines such as metal alkoxide, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) Used. This reaction is carried out by reacting the compound (L-1) with an equal amount or a small excess of a base in a solvent inert to the reaction at 0 ° C. to 140 ° C., followed by an equal amount or an excess amount of an alkylating reagent. And the reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited. For example, ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, N, N— Examples thereof include dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
Z11で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(L-1)におけるフェノール性水酸基を塩基存在下で、脱離基を持ったアルキル化試薬を反応させることにより化合物(L-2)を合成する方法である。用いる塩基性物質としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド、t-ブトキシカリウム等の金属アルコキシド、トリエチルアミン、ピリジン、4-アミノピリジン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)等の有機アミンが用いられる。本反応は、0℃~140℃下で、反応に不活性な溶媒中、化合物(L-1)に等量、あるいは小過剰に塩基を反応させた後に、等量あるいは過剰量のアルキル化試薬を加え、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。 (Wherein R 6 represents a protecting group for a phenolic hydroxyl group, and Z 11 represents a leaving group.)
Examples of the leaving group represented by Z 11 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method of synthesizing compound (L-2) by reacting a phenolic hydroxyl group in compound (L-1) with an alkylating reagent having a leaving group in the presence of a base. Examples of basic substances used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium ethoxide, sodium methoxide, t-butoxy potassium, etc. Organic amines such as metal alkoxide, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) Used. This reaction is carried out by reacting the compound (L-1) with an equal amount or a small excess of a base in a solvent inert to the reaction at 0 ° C. to 140 ° C., followed by an equal amount or an excess amount of an alkylating reagent. And the reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited. For example, ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, N, N— Examples thereof include dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
化合物(L-3)の合成
Synthesis of compound (L-3)
(式中、R6はフェノール性水酸基の保護基を表す。)
(In the formula, R 6 represents a protecting group for a phenolic hydroxyl group.)
本反応は、化合物(L-2)におけるピリジンの4位を強塩基によりリチウム化させた後に、ブロモ化させることにより化合物(L-3)を合成する方法である。本反応は、化合物(L-2)に対して、反応に不活性な溶媒中、-78℃~0℃において等量あるいは小過剰の強塩基を加え、通常0.5~12時間反応させた後に、臭素源を加えることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。用いる強塩基としては、n-ブチルリチウム、t-ブチルリチウムまたはs-ブチルリチウム等が用いられる。また、臭素化試薬としては、四臭化炭素等が挙げられる。ここに、溶媒としては特に限定はされないが、例えばジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類が挙げられる。
This reaction is a method of synthesizing compound (L-3) by lithiating the 4-position of pyridine in compound (L-2) with a strong base and then brominating. In this reaction, an equal amount or a small excess of strong base was added to compound (L-2) in a solvent inert to the reaction at −78 ° C. to 0 ° C., and the reaction was usually performed for 0.5 to 12 hours. Later, by adding a bromine source. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. As the strong base to be used, n-butyllithium, t-butyllithium, s-butyllithium or the like is used. Examples of the bromination reagent include carbon tetrabromide. The solvent is not particularly limited, and examples thereof include ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane.
化合物(L-4)の合成
Synthesis of compound (L-4)
(式中、R6はフェノール性水酸基の保護基を表す。)
(In the formula, R 6 represents a protecting group for a phenolic hydroxyl group.)
本反応は、化合物(L-3)の保護基R6を酸または塩基等により脱保護させることにより、化合物(L-4)を合成する方法である。本反応は、化合物(L-3)に、反応に不活性な溶媒中、酸または塩基を等量、あるいは過剰に用い、室温~加熱還流下で、通常0.5時間~5日間反応されることによって行なわれる。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。酸としては、塩化水素、臭化水素、硫酸、硝酸、リン酸等の無機酸、あるいはこれらの酸を水または有機溶媒で希釈した溶液等が挙げられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、あるいはこれらの塩基を水等で希釈した溶液等が挙げられる。
This reaction is a method for synthesizing compound (L-4) by deprotecting protecting group R 6 of compound (L-3) with an acid or a base. In this reaction, compound (L-3) is usually reacted for 0.5 hour to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent. Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
化合物(L-5)の合成
Synthesis of compound (L-5)
(式中、Z1は脱離基を表す。)
Z1で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(L-4)におけるフェノール性水酸基を塩基存在下で、脱離基を持ったアルキル化試薬を反応させることにより化合物(L-5)を合成する方法である。用いる塩基性物質としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド、t-ブトキシカリウム等の金属アルコキシド、トリエチルアミン、ピリジン、4-アミノピリジン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)等の有機アミンが用いられる。本反応は、0℃~140℃下で、反応に不活性な溶媒中、化合物(L-4)に等量、あるいは小過剰に塩基を反応させた後に、等量あるいは過剰量のアルキル化試薬を加え、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。 (In the formula, Z 1 represents a leaving group.)
Examples of the leaving group represented by Z 1 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method of synthesizing compound (L-5) by reacting a phenolic hydroxyl group in compound (L-4) with an alkylating reagent having a leaving group in the presence of a base. Examples of basic substances used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium ethoxide, sodium methoxide, t-butoxy potassium, etc. Organic amines such as metal alkoxide, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) Used. This reaction is carried out by reacting the compound (L-4) with an equal amount or a small excess of a base in a solvent inert to the reaction at 0 ° C. to 140 ° C., and then an equal amount or an excess amount of an alkylating reagent. And the reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited. For example, ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, N, N— Examples thereof include dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
Z1で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(L-4)におけるフェノール性水酸基を塩基存在下で、脱離基を持ったアルキル化試薬を反応させることにより化合物(L-5)を合成する方法である。用いる塩基性物質としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド、t-ブトキシカリウム等の金属アルコキシド、トリエチルアミン、ピリジン、4-アミノピリジン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)等の有機アミンが用いられる。本反応は、0℃~140℃下で、反応に不活性な溶媒中、化合物(L-4)に等量、あるいは小過剰に塩基を反応させた後に、等量あるいは過剰量のアルキル化試薬を加え、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。 (In the formula, Z 1 represents a leaving group.)
Examples of the leaving group represented by Z 1 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method of synthesizing compound (L-5) by reacting a phenolic hydroxyl group in compound (L-4) with an alkylating reagent having a leaving group in the presence of a base. Examples of basic substances used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium ethoxide, sodium methoxide, t-butoxy potassium, etc. Organic amines such as metal alkoxide, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) Used. This reaction is carried out by reacting the compound (L-4) with an equal amount or a small excess of a base in a solvent inert to the reaction at 0 ° C. to 140 ° C., and then an equal amount or an excess amount of an alkylating reagent. And the reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited. For example, ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, N, N— Examples thereof include dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
化合物(L-6)の合成
Synthesis of compound (L-6)
本反応は、化合物(L-5)におけるピリジン2位のメチル基を酸化剤により酸化させることにより化合物(L-6)を合成する方法である。用いる酸化剤としては、過マンガン酸カリウム等のマンガン塩が用いられる。本反応は、0℃~120℃下で、反応に不活性な溶媒中、化合物(L-5)に等量、あるいは小過剰の酸化剤を加え、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えば1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、N,N-ジメチルホルムアミド(DMF)、水またはこれらの混合溶媒等が挙げられる。
This reaction is a method of synthesizing compound (L-6) by oxidizing the methyl group at the 2-position of pyridine in compound (L-5) with an oxidizing agent. As the oxidizing agent to be used, a manganese salt such as potassium permanganate is used. In this reaction, an equal amount or a small excess of an oxidizing agent is added to compound (L-5) in a solvent inert to the reaction at 0 ° C. to 120 ° C., and the reaction is usually performed for 0.5 hour to 2 days. Is done by. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited. For example, ethers such as 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, N, N-dimethylformamide (DMF), water or These mixed solvents are exemplified.
化合物(L-7)の合成
Synthesis of compound (L-7)
本反応は、化合物(L-6)のカルボキシル基とアンモニアを反応させることにより、アミド化合物(L-7)を合成する方法である。本反応は、文献記載の方法(例えばペプチド合成の基礎と実験、泉屋信夫他、丸善、1983年、コンプリヘンシブ オーガニック シンセシス(Comprehensive Organic Synthesis)、第6巻、Pergamon Press社、1991年、等)、それに準じた方法又はこれらと常法とを組み合わせることにより、通常のアミド形成反応を行えばよく、即ち、当業者に周知の縮合剤を用いて行うか、あるいは、当業者に利用可能なエステル活性化方法、混合酸無水物法、酸クロリド法、カルボジイミド法等により行うことができる。このようなアミド形成試薬としては、例えば塩化チオニル、塩化オキザリル、N,N-ジシクロヘキシルカルボジイミド、1-メチル-2-ブロモピリジニウムアイオダイド、N,N’-カルボニルジイミダゾール、ジフェニルフォスフォリルクロリド、ジフェニルフォスフォリルアジド、N,N’-ジスクシニミジルカルボネート、N,N’-ジスクシニミジルオキザレート、1-エチル-3-(3-ジメチルアミノプロピル)カルボジイミド塩酸塩、ベンゾトリアゾール-1-イルオキシトリス(ピロリジノ)ホスホニウム ヘキサフルオロフォスフェート、2-(1H-ベンゾトリアゾール-1-イル)-1,1,3,3-テトラメチルウロニウム ヘキサフルオロフォスフェート、2-(5-ノルボルネン-2,3-ジカルボキシイミド)-1,1,3,3-テトラメチルウロニウム テトラフルオロボレート、O-(N-サクシニミジル)-1,1,3,3-テトラメチルウロニウム テトラフルオロボレート、ブロモトリス(ピロリジノ)ホスホニウム ヘキサフルオロフォスフェート、クロロギ酸エチル、クロロギ酸イソブチル又は2-(7-アザ-1H-ベンゾトリアゾ-ル-1-イル)-1,1,3,3-テトラメチルウロニウム ヘキサフルオロフォスフェート等が挙げられ、中でも例えば塩化チオニル、塩化オキサリル、1-エチル-3-(3-ジメチルアミノプロピル)カルボジイミド塩酸塩又は2-(7-アザ-1H-ベンゾトリアゾ-ル-1-イル)-1,1,3,3-テトラメチルウロニウム ヘキサフルオロフォスフェート等が好適である。またアミド形成反応においては、上記アミド形成試薬と共に塩基、縮合補助剤を用いてもよい。用いられる縮合補助剤としては、例えばN-ヒドロキシベンゾトリアゾール水和物、N-ヒドロキシスクシンイミド等が挙げられる。
This reaction is a method of synthesizing the amide compound (L-7) by reacting the carboxyl group of the compound (L-6) with ammonia. This reaction is performed according to literature methods (for example, peptide synthesis basics and experiment, Nobuo Izumiya et al., Maruzen, 1983, Comprehensive Organic Synthesis, Vol. 6, Pergamon Press, 1991, etc.) The conventional amide formation reaction may be carried out by a method according to the above or a combination thereof with a conventional method, that is, by using a condensing agent well known to those skilled in the art, or an ester available to those skilled in the art. It can be performed by an activation method, a mixed acid anhydride method, an acid chloride method, a carbodiimide method, or the like. Examples of such amide-forming reagents include thionyl chloride, oxalyl chloride, N, N-dicyclohexylcarbodiimide, 1-methyl-2-bromopyridinium iodide, N, N′-carbonyldiimidazole, diphenylphosphoryl chloride, diphenyl. Phosphoryl azide, N, N′-disuccinimidyl carbonate, N, N′-disuccinimidyl oxalate, 1-ethyl-3- (3-dimethylaminopropyl) carbodiimide hydrochloride, benzotriazole- 1-yloxytris (pyrrolidino) phosphonium hexafluorophosphate, 2- (1H-benzotriazol-1-yl) -1,1,3,3-tetramethyluronium hexafluorophosphate, 2- (5-norbornene -2,3-dicarboxyl D) -1,1,3,3-tetramethyluronium tetrafluoroborate, O- (N-succinimidyl) -1,1,3,3-tetramethyluronium tetrafluoroborate, bromotris (pyrrolidino) phosphonium hexafluoro Phosphate, ethyl chloroformate, isobutyl chloroformate or 2- (7-aza-1H-benzotriazol-1-yl) -1,1,3,3-tetramethyluronium hexafluorophosphate, etc. Among them, for example, thionyl chloride, oxalyl chloride, 1-ethyl-3- (3-dimethylaminopropyl) carbodiimide hydrochloride or 2- (7-aza-1H-benzotriazol-1-yl) -1,1,3,3 -Tetramethyluronium, hexafluorophosphate, etc. are preferred. In the amide forming reaction, a base and a condensation aid may be used together with the amide forming reagent. Examples of the condensation aid used include N-hydroxybenzotriazole hydrate and N-hydroxysuccinimide.
本反応は、化合物(L-6)とアンモニアを等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、縮合剤および塩基の存在下、室温~加熱還流下で、通常0.5時間~3日間反応させることによって行なわれる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、酢酸エチル、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、ピリジンまたはこれらの混合溶媒等が挙げられる。また、用いられる塩基としては、例えばトリメチルアミン、トリエチルアミン、N,N-ジイソプロピルエチルアミン、N-メチルモルホリン、N-メチルピロリジン、N-メチルピペリジン、N,N-ジメチルアニリン、1,8-ジアザビシクロ[5.4.0]ウンデカ-7-エン、1,5-アザビシクロ[4.3.0]ノナ-5-エン等の第3級脂肪族アミン;ピリジン、4-ジメチルアミノピリジン、ピコリン、ルチジン、キノリン又はイソキノリン等の芳香族アミン等が挙げられ、中でも例えば第3級脂肪族アミン等が好ましく、特にトリエチルアミン又はN,N-ジイソプロピルエチルアミン等が特に好ましい。
In this reaction, compound (L-6) and ammonia are used in an equal amount or in excess, and in a solvent inert to the reaction, in the presence of a condensing agent and a base, usually at room temperature to heating under reflux, usually 0.5 It is carried out by reacting for a time to 3 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, ethyl acetate, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), Examples thereof include pyridine or a mixed solvent thereof. Examples of the base used include trimethylamine, triethylamine, N, N-diisopropylethylamine, N-methylmorpholine, N-methylpyrrolidine, N-methylpiperidine, N, N-dimethylaniline, and 1,8-diazabicyclo [5. 4.0] tertiary aliphatic amines such as undec-7-ene, 1,5-azabicyclo [4.3.0] non-5-ene; pyridine, 4-dimethylaminopyridine, picoline, lutidine, quinoline or Examples include aromatic amines such as isoquinoline, among which tertiary aliphatic amines are preferable, and triethylamine or N, N-diisopropylethylamine is particularly preferable.
化合物(L-8)の合成
Synthesis of compound (L-8)
本反応は、化合物(L-7)のアミド基を酸により脱水させることにより、化合物(L-8)を合成する方法である。本反応は、化合物(L-7)に、反応に不活性な溶媒中、酸を等量、あるいは過剰に用い、室温~加熱還流下で、通常0.5時間~5日間反応されることによって行なわれる。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類等が挙げられる。酸としては、塩化チオニル、オキザリルクロリド、塩化ホスホリルあるいはフェニルホスホニルジクロリド等が挙げられる。
This reaction is a method of synthesizing compound (L-8) by dehydrating the amide group of compound (L-7) with an acid. This reaction is carried out by reacting compound (L-7) with an acid in an equivalent amount or in excess in a solvent inert to the reaction, usually at room temperature to heating under reflux, usually for 0.5 hour to 5 days. Done. Here, the solvent is not particularly limited, and examples thereof include aromatic hydrocarbons such as benzene, toluene and xylene, and halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane and chloroform. Examples of the acid include thionyl chloride, oxalyl chloride, phosphoryl chloride, and phenylphosphonyl dichloride.
化合物(L-9)の合成
Synthesis of compound (L-9)
(式中、Z2は-B(OH)2または-B(OR10)OR11を表す。ここで、R10およびR11は独立して炭素数1~6のアルキル基、またはR10およびR11が一体となって炭素数1~6のアルキレン基を表す。)
Z2で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(L-8)とホウ酸あるいはホウ酸エステルを有する複素環化合物をカップリング反応させることにより化合物(L-9)を合成する方法である。本反応は、化合物(L-8)と複素環化合物を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、塩基およびパラジウム触媒存在下、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、リン酸三カリウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、あるいはこれらの塩基を水等で希釈した溶液等が挙げられる。パラジウム触媒としては、テトラキス(トリフェニルホスフィン)パラジウム、ジクロロビス(トリフェニルホスフィン)パラジウム、塩化パラジウム-1,1’-ビス(ジフェニルホスフィノ)フェロセン等が好ましい。 (Wherein Z 2 represents —B (OH) 2 or —B (OR 10 ) OR 11 , wherein R 10 and R 11 are independently an alkyl group having 1 to 6 carbon atoms, or R 10 and R 11 together represents an alkylene group having 1 to 6 carbon atoms.)
Examples of the leaving group represented by Z 2 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method of synthesizing compound (L-9) by coupling reaction of compound (L-8) and a heterocyclic compound having boric acid or boric acid ester. In this reaction, the compound (L-8) and the heterocyclic compound are used in an equal amount or in excess, and in a solvent inert to the reaction, in the presence of a base and a palladium catalyst, from room temperature to heating under reflux, usually 0. It is carried out by reacting for 5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate and tripotassium phosphate, metal alkoxides such as sodium ethoxide and sodium methoxide, or these bases And a solution obtained by diluting with water or the like. As the palladium catalyst, tetrakis (triphenylphosphine) palladium, dichlorobis (triphenylphosphine) palladium, palladium chloride-1,1′-bis (diphenylphosphino) ferrocene and the like are preferable.
Z2で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(L-8)とホウ酸あるいはホウ酸エステルを有する複素環化合物をカップリング反応させることにより化合物(L-9)を合成する方法である。本反応は、化合物(L-8)と複素環化合物を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、塩基およびパラジウム触媒存在下、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム、リン酸三カリウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、あるいはこれらの塩基を水等で希釈した溶液等が挙げられる。パラジウム触媒としては、テトラキス(トリフェニルホスフィン)パラジウム、ジクロロビス(トリフェニルホスフィン)パラジウム、塩化パラジウム-1,1’-ビス(ジフェニルホスフィノ)フェロセン等が好ましい。 (Wherein Z 2 represents —B (OH) 2 or —B (OR 10 ) OR 11 , wherein R 10 and R 11 are independently an alkyl group having 1 to 6 carbon atoms, or R 10 and R 11 together represents an alkylene group having 1 to 6 carbon atoms.)
Examples of the leaving group represented by Z 2 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method of synthesizing compound (L-9) by coupling reaction of compound (L-8) and a heterocyclic compound having boric acid or boric acid ester. In this reaction, the compound (L-8) and the heterocyclic compound are used in an equal amount or in excess, and in a solvent inert to the reaction, in the presence of a base and a palladium catalyst, from room temperature to heating under reflux, usually 0. It is carried out by reacting for 5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate and tripotassium phosphate, metal alkoxides such as sodium ethoxide and sodium methoxide, or these bases And a solution obtained by diluting with water or the like. As the palladium catalyst, tetrakis (triphenylphosphine) palladium, dichlorobis (triphenylphosphine) palladium, palladium chloride-1,1′-bis (diphenylphosphino) ferrocene and the like are preferable.
化合物(L-10)の合成
Synthesis of compound (L-10)
本反応は、シアノ基からチオアミド基への変換反応であり、上記式(L-9)で表される芳香族シアノ基誘導体と硫黄源を酸性条件下で反応させることにより行われる。本反応は、化合物(L-9)と硫黄源を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、酸存在下、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。硫黄源としては、硫化水素、チオアセトアミドまたはチオ酢酸を用いる。酸性物質としては、塩酸、硫酸、酢酸等の有機酸、またはこれらの酸の水溶液が用いられる。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、メタノール、エタノール等のアルコール類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、またはこれらの混合溶媒等が挙げられる。また、酢酸等の酸を溶媒として用いることもできる。
This reaction is a conversion reaction from a cyano group to a thioamide group, and is performed by reacting an aromatic cyano group derivative represented by the above formula (L-9) with a sulfur source under acidic conditions. In this reaction, compound (L-9) and a sulfur source are used in an equal amount or in excess, and in an inert solvent for the reaction, in the presence of an acid, at room temperature to heating under reflux, usually 0.5 hours to 2 This is done by reacting for a day. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Hydrogen sulfide, thioacetamide or thioacetic acid is used as the sulfur source. As the acidic substance, organic acids such as hydrochloric acid, sulfuric acid and acetic acid, or aqueous solutions of these acids are used. Here, the solvent is not particularly limited. For example, aromatic hydrocarbons such as benzene, toluene and xylene, alcohols such as methanol and ethanol, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1, Examples thereof include ethers such as 2-dimethoxyethane and 1,2-diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof. An acid such as acetic acid can also be used as a solvent.
化合物(L-11)の合成
Synthesis of compound (L-11)
(式中、Z3は脱離基を表す。)
Z3で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(L-10)と(A-6)を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行なわれる。また、等量あるいは過剰量の塩基を加えることもできる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここで、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、またはこれらの混合溶媒等が挙げられる。用いる塩基としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、トリエチルアミン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)などが挙げられる。 (In the formula, Z 3 represents a leaving group.)
Examples of the leaving group represented by Z 3 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. In this reaction, compounds (L-10) and (A-6) are used in an equal amount or in excess, and the reaction is inert to the reaction at room temperature to heating under reflux, usually for 0.5 hour to 2 days. This is done by reacting. Further, an equal amount or an excess amount of a base can be added. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof. Examples of the base used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate and cesium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, triethylamine, N- Examples include ethyl-N, N-diisopropylamine (DIPEA) and 1,8-diazabicyclo [5.4.0] -7-undecene (DBU).
Z3で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(L-10)と(A-6)を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行なわれる。また、等量あるいは過剰量の塩基を加えることもできる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここで、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、またはこれらの混合溶媒等が挙げられる。用いる塩基としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、トリエチルアミン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)などが挙げられる。 (In the formula, Z 3 represents a leaving group.)
Examples of the leaving group represented by Z 3 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. In this reaction, compounds (L-10) and (A-6) are used in an equal amount or in excess, and the reaction is inert to the reaction at room temperature to heating under reflux, usually for 0.5 hour to 2 days. This is done by reacting. Further, an equal amount or an excess amount of a base can be added. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof. Examples of the base used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate and cesium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, triethylamine, N- Examples include ethyl-N, N-diisopropylamine (DIPEA) and 1,8-diazabicyclo [5.4.0] -7-undecene (DBU).
化合物(L-12)の合成
Synthesis of compound (L-12)
本反応は、化合物(L-11)の保護基R5を酸または塩基等により脱保護させることにより、本発明化合物(L-12)を合成する方法である。本反応は、化合物(L-11)に、反応に不活性な溶媒中、酸または塩基を等量、あるいは過剰に用い、室温~加熱還流下で、通常0.5時間~5日間反応されることによって行なわれる。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。酸としては、塩化水素、臭化水素、硫酸、硝酸、リン酸等の無機酸、あるいはこれらの酸を水または有機溶媒で希釈した溶液等が挙げられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、あるいはこれらの塩基を水等で希釈した溶液等が挙げられる。
This reaction is a method for synthesizing the compound (L-12) of the present invention by deprotecting the protecting group R 5 of the compound (L-11) with an acid or a base. In this reaction, compound (L-11) is usually reacted for 0.5 hour to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent. Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
(合成法M)
化合物(M-2)の合成 (Synthesis method M)
Synthesis of compound (M-2)
化合物(M-2)の合成 (Synthesis method M)
Synthesis of compound (M-2)
(式中、Z1およびZ12はそれぞれ脱離基を表す。)
Z1およびZ12で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(M-1)におけるフェノール性水酸基を塩基存在下で、脱離基を持ったアルキル化試薬を反応させることにより化合物(M-2)を合成する方法である。用いる塩基性物質としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド、t-ブトキシカリウム等の金属アルコキシド、トリエチルアミン、ピリジン、4-アミノピリジン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)等の有機アミンが用いられる。本反応は、0℃~140℃下で、反応に不活性な溶媒中、化合物(M-1)に等量、あるいは小過剰に塩基を反応させた後に、等量あるいは過剰量のアルキル化試薬を加え、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。 (In the formula, Z 1 and Z 12 each represent a leaving group.)
Examples of the leaving group represented by Z 1 and Z 12 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method of synthesizing compound (M-2) by reacting a phenolic hydroxyl group in compound (M-1) with an alkylating reagent having a leaving group in the presence of a base. Examples of basic substances used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium ethoxide, sodium methoxide, t-butoxy potassium, etc. Organic amines such as metal alkoxide, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) Used. This reaction is carried out by reacting compound (M-1) with an equal amount or a small excess of a base in a solvent inert to the reaction at 0 ° C. to 140 ° C., followed by an equal amount or an excess amount of an alkylating reagent. And the reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited. For example, ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, N, N— Examples thereof include dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
Z1およびZ12で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(M-1)におけるフェノール性水酸基を塩基存在下で、脱離基を持ったアルキル化試薬を反応させることにより化合物(M-2)を合成する方法である。用いる塩基性物質としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド、t-ブトキシカリウム等の金属アルコキシド、トリエチルアミン、ピリジン、4-アミノピリジン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)等の有機アミンが用いられる。本反応は、0℃~140℃下で、反応に不活性な溶媒中、化合物(M-1)に等量、あるいは小過剰に塩基を反応させた後に、等量あるいは過剰量のアルキル化試薬を加え、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。 (In the formula, Z 1 and Z 12 each represent a leaving group.)
Examples of the leaving group represented by Z 1 and Z 12 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method of synthesizing compound (M-2) by reacting a phenolic hydroxyl group in compound (M-1) with an alkylating reagent having a leaving group in the presence of a base. Examples of basic substances used include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, sodium ethoxide, sodium methoxide, t-butoxy potassium, etc. Organic amines such as metal alkoxide, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) Used. This reaction is carried out by reacting compound (M-1) with an equal amount or a small excess of a base in a solvent inert to the reaction at 0 ° C. to 140 ° C., followed by an equal amount or an excess amount of an alkylating reagent. And the reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited. For example, ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane, N, N— Examples thereof include dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof.
化合物(M-3)の合成
Synthesis of compound (M-3)
(式中、Z12は脱離基を表す。)
Z12で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(M-2)におけるピリジンの4位を強塩基によりリチウム化させた後に、ホルミル化させることにより化合物(M-3)を合成する方法である。本反応は、化合物(M-2)に対して、反応に不活性な溶媒中、-78℃~0℃において等量あるいは小過剰の強塩基を加え、通常0.5~12時間反応させた後に、ホルミル化剤を加えることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。用いる強塩基としては、n-ブチルリチウム、t-ブチルリチウムまたはs-ブチルリチウム等が用いられる。また、ホルミル化試薬としては、メチルホルメート、ヘキサメチレンテトラミン、N,N-ジメチルホルムアミド等が挙げられる。ここに、溶媒としては特に限定はされないが、例えばジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類が挙げられる。 (In the formula, Z 12 represents a leaving group.)
Examples of the leaving group represented by Z 12 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method of synthesizing compound (M-3) by lithiating the 4-position of pyridine in compound (M-2) with a strong base and then formylating. In this reaction, an equal amount or a small excess of strong base was added to compound (M-2) at −78 ° C. to 0 ° C. in a solvent inert to the reaction, and the reaction was usually carried out for 0.5 to 12 hours. Later it is done by adding a formylating agent. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. As the strong base to be used, n-butyllithium, t-butyllithium, s-butyllithium or the like is used. Examples of the formylation reagent include methyl formate, hexamethylenetetramine, N, N-dimethylformamide and the like. The solvent is not particularly limited, and examples thereof include ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane.
Z12で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(M-2)におけるピリジンの4位を強塩基によりリチウム化させた後に、ホルミル化させることにより化合物(M-3)を合成する方法である。本反応は、化合物(M-2)に対して、反応に不活性な溶媒中、-78℃~0℃において等量あるいは小過剰の強塩基を加え、通常0.5~12時間反応させた後に、ホルミル化剤を加えることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。用いる強塩基としては、n-ブチルリチウム、t-ブチルリチウムまたはs-ブチルリチウム等が用いられる。また、ホルミル化試薬としては、メチルホルメート、ヘキサメチレンテトラミン、N,N-ジメチルホルムアミド等が挙げられる。ここに、溶媒としては特に限定はされないが、例えばジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類が挙げられる。 (In the formula, Z 12 represents a leaving group.)
Examples of the leaving group represented by Z 12 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method of synthesizing compound (M-3) by lithiating the 4-position of pyridine in compound (M-2) with a strong base and then formylating. In this reaction, an equal amount or a small excess of strong base was added to compound (M-2) at −78 ° C. to 0 ° C. in a solvent inert to the reaction, and the reaction was usually carried out for 0.5 to 12 hours. Later it is done by adding a formylating agent. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. As the strong base to be used, n-butyllithium, t-butyllithium, s-butyllithium or the like is used. Examples of the formylation reagent include methyl formate, hexamethylenetetramine, N, N-dimethylformamide and the like. The solvent is not particularly limited, and examples thereof include ethers such as diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2-diethoxyethane.
化合物(M-4)の合成
Synthesis of compound (M-4)
(式中、Z12は脱離基を表す。)
Z12で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(M-3)とp-トルエンスルホニルアセトニトリル(C-6)を反応させて1,3-オキサゾール環を合成する方法である。本反応は、化合物(M-3)とp-トルエンスルホニルアセトニトリル(C-6)を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、塩基存在下、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。用いる塩基としては、炭酸カリウム、炭酸ナトリウム、炭酸水素ナトリウム等の炭酸塩、トリエチルアミン、ピリジン、4-アミノピリジン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)等の有機アミンが用いられる。これらの反応に用いられる溶媒としては、トルエン、ベンゼン、ピリジン、酢酸エチル、ジクロロメタン、1,2-ジクロロエタン、クロロホルム、四塩化炭素、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)またはこれらの混合溶媒等が挙げられる。 (In the formula, Z 12 represents a leaving group.)
Examples of the leaving group represented by Z 12 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method of synthesizing a 1,3-oxazole ring by reacting compound (M-3) with p-toluenesulfonylacetonitrile (C-6). In this reaction, compound (M-3) and p-toluenesulfonylacetonitrile (C-6) are used in an equal amount or in excess, and in a solvent inert to the reaction, in the presence of a base, at room temperature to heating under reflux. The reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Examples of the base used include carbonates such as potassium carbonate, sodium carbonate and sodium hydrogen carbonate, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5. 4.0] -7-undecene (DBU) and other organic amines are used. Solvents used in these reactions include toluene, benzene, pyridine, ethyl acetate, dichloromethane, 1,2-dichloroethane, chloroform, carbon tetrachloride, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2 -Dimethoxyethane, 1,2-diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
Z12で示される脱離基としてはハロゲン原子、メタンスルホニルオキシ基、p-トルエンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基等が挙げられる。本反応は、化合物(M-3)とp-トルエンスルホニルアセトニトリル(C-6)を反応させて1,3-オキサゾール環を合成する方法である。本反応は、化合物(M-3)とp-トルエンスルホニルアセトニトリル(C-6)を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、塩基存在下、室温~加熱還流下で、通常0.5時間~2日間反応させることによって行われる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。用いる塩基としては、炭酸カリウム、炭酸ナトリウム、炭酸水素ナトリウム等の炭酸塩、トリエチルアミン、ピリジン、4-アミノピリジン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)等の有機アミンが用いられる。これらの反応に用いられる溶媒としては、トルエン、ベンゼン、ピリジン、酢酸エチル、ジクロロメタン、1,2-ジクロロエタン、クロロホルム、四塩化炭素、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)またはこれらの混合溶媒等が挙げられる。 (In the formula, Z 12 represents a leaving group.)
Examples of the leaving group represented by Z 12 include a halogen atom, a methanesulfonyloxy group, a p-toluenesulfonyloxy group, and a trifluoromethanesulfonyloxy group. This reaction is a method of synthesizing a 1,3-oxazole ring by reacting compound (M-3) with p-toluenesulfonylacetonitrile (C-6). In this reaction, compound (M-3) and p-toluenesulfonylacetonitrile (C-6) are used in an equal amount or in excess, and in a solvent inert to the reaction, in the presence of a base, at room temperature to heating under reflux. The reaction is usually carried out for 0.5 hours to 2 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Examples of the base used include carbonates such as potassium carbonate, sodium carbonate and sodium hydrogen carbonate, triethylamine, pyridine, 4-aminopyridine, N-ethyl-N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5. 4.0] -7-undecene (DBU) and other organic amines are used. Solvents used in these reactions include toluene, benzene, pyridine, ethyl acetate, dichloromethane, 1,2-dichloroethane, chloroform, carbon tetrachloride, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2 -Dimethoxyethane, 1,2-diethoxyethane, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), or a mixed solvent thereof.
化合物(M-5)の合成
Synthesis of compound (M-5)
(式中、Z12は脱離基を表す。)
(In the formula, Z 12 represents a leaving group.)
本反応は、化合物(M-4)と(H-3)をカップリングさせることにより、化合物(M-5)を合成する方法である。Z12で示される脱離基としてはヨウ素原子、臭素原子、塩素原子が挙げられる。本反応は、化合物(M-4)と(H-3)を等量、あるいは一方を過剰に用い、反応に不活性な溶媒中、塩基、銅触媒および配位子の存在下、室温~加熱還流下で、通常0.5時間~3日間反応させることによって行なわれる。本反応は窒素等の不活性ガス雰囲気下で行うことが好ましい。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、酢酸エチル、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、またはこれらの混合溶媒等が挙げられる。塩基としては、水素化ナトリウム、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸セシウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、トリエチルアミン、N-エチル-N,N-ジイソプロピルアミン(DIPEA)、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン(DBU)などが挙げられる。銅触媒としては塩化銅、臭化銅、ヨウ化銅、酸化銅等が挙げられる。配位子としてはプロリン、トランス-N,N’-ジメチルシクロヘキサン-1,2-ジアミン、N,N-ジメチルアミノ酢酸、1,10-フェナントロリン等が挙げられる。
This reaction is a method of synthesizing compound (M-5) by coupling compound (M-4) and (H-3). Examples of the leaving group represented by Z 12 include an iodine atom, a bromine atom, and a chlorine atom. In this reaction, compounds (M-4) and (H-3) are used in an equal amount or in excess, and in a solvent inert to the reaction, in the presence of a base, a copper catalyst and a ligand, from room temperature to heating The reaction is usually carried out under reflux for usually 0.5 hours to 3 days. This reaction is preferably carried out in an inert gas atmosphere such as nitrogen. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, ethyl acetate, N, N-dimethylformamide (DMF), N-methylpyrrolidone, dimethyl sulfoxide (DMSO), Or these mixed solvents etc. are mentioned. Bases include inorganic salts such as sodium hydride, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, cesium carbonate, metal alkoxides such as sodium ethoxide, sodium methoxide, triethylamine, N-ethyl -N, N-diisopropylamine (DIPEA), 1,8-diazabicyclo [5.4.0] -7-undecene (DBU) and the like. Examples of the copper catalyst include copper chloride, copper bromide, copper iodide, and copper oxide. Examples of the ligand include proline, trans-N, N′-dimethylcyclohexane-1,2-diamine, N, N-dimethylaminoacetic acid, 1,10-phenanthroline and the like.
化合物(M-6)の合成
Synthesis of compound (M-6)
本反応は、化合物(M-5)の保護基R5を酸または塩基等により脱保護させることにより、本発明化合物(M-6)を合成する方法である。本反応は、化合物(M-5)に、反応に不活性な溶媒中、酸または塩基を等量、あるいは過剰に用い、室温~加熱還流下で、通常0.5時間~5日間反応されることによって行なわれる。ここに、溶媒としては特に限定はされないが、例えばベンゼン、トルエン、キシレン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフラン(THF)、1,4-ジオキサン、1,2-ジメトキシエタン、1,2-ジエトキシエタン等のエーテル類、ジクロロメタン、1,2-ジクロロエタン、クロロホルム等のハロゲン化炭化水素類、メタノール、エタノール、2-プロパノール、ブタノール等のアルコール類、N,N-ジメチルホルムアミド(DMF)、N-メチルピロリドン、ジメチルスルホキシド(DMSO)、水またはこれらの混合溶媒等が挙げられる。酸としては、塩化水素、臭化水素、硫酸、硝酸、リン酸等の無機酸、あるいはこれらの酸を水または有機溶媒で希釈した溶液等が挙げられる。塩基としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム等の無機塩、ナトリウムエトキシド、ナトリウムメトキシド等の金属アルコキシド、あるいはこれらの塩基を水等で希釈した溶液等が挙げられる。
This reaction is a method for synthesizing the compound (M-6) of the present invention by deprotecting the protecting group R 5 of the compound (M-5) with an acid or a base. In this reaction, compound (M-5) is usually reacted for 0.5 hour to 5 days at room temperature to heating under reflux using an equal amount or excess of acid or base in a solvent inert to the reaction. Is done. Here, the solvent is not particularly limited, but for example, aromatic hydrocarbons such as benzene, toluene and xylene, diethyl ether, tetrahydrofuran (THF), 1,4-dioxane, 1,2-dimethoxyethane, 1,2 -Ethers such as diethoxyethane, halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, chloroform, alcohols such as methanol, ethanol, 2-propanol, butanol, N, N-dimethylformamide (DMF), Examples thereof include N-methylpyrrolidone, dimethyl sulfoxide (DMSO), water, or a mixed solvent thereof. Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, or solutions obtained by diluting these acids with water or an organic solvent. Examples of the base include inorganic salts such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate and potassium carbonate, metal alkoxides such as sodium ethoxide and sodium methoxide, or solutions obtained by diluting these bases with water, etc. Is mentioned.
以下、前記式(I)で表される化合物のの製薬学的に許容される塩は、製薬学的に許容される塩であれば特に限定されないが、かかる塩としては、例えば、塩化水素、臭化水素、硫酸、硝酸、リン酸、炭酸などの無機酸との塩;マレイン酸、フマル酸、クエン酸、リンゴ酸、酒石酸、乳酸、コハク酸、安息香酸、シュウ酸、メタンスルホン酸、ベンゼンスルホン酸、p‐トルエンスルホン酸、酢酸、トリフルオロ酢酸、ギ酸などの有機酸との塩;グリシン、リジン、アルギニン、ヒスチジン、オルニチン、グルタミン酸、アスパラギン酸などのアミノ酸との塩;ナトリウム、カリウム、リチウムなどのアルカリ金属との塩;カルシウム、マグネシウムなどのアルカリ土類金属との塩;アルミニウム、亜鉛、鉄などの金属との塩;テトラメチルアンモニウム、コリンなどのような有機オニウムとの塩;アンモニア、プロパンジアミン、ピロリジン、ピペリジン、ピリジン、エタノールアミン、N,N‐ジメチルエタノールアミン、4-ヒドロキシピペリジン、t‐オクチルアミン、ジベンジルアミン、モルホリン、グルコサミン、フェニルグリシルアルキルエステル、エチレンジアミン、N-メチルグルカミン、グアニジン、ジエチルアミン、トリエチルアミン、ジシクロヘキシルアミン、N,N’-ジベンジルエチレンジアミン、クロロプロカイン、プロカイン、ジエタノールアミン、N-ベンジルフェニルアミン、ピペラジン、トリス(ヒドロキシメチル)アミノメタンなどの有機塩基との塩が挙げられる。
Hereinafter, the pharmaceutically acceptable salt of the compound represented by the formula (I) is not particularly limited as long as it is a pharmaceutically acceptable salt. Examples of such a salt include hydrogen chloride, Salts with inorganic acids such as hydrogen bromide, sulfuric acid, nitric acid, phosphoric acid, carbonic acid; maleic acid, fumaric acid, citric acid, malic acid, tartaric acid, lactic acid, succinic acid, benzoic acid, oxalic acid, methanesulfonic acid, benzene Salts with organic acids such as sulfonic acid, p-toluenesulfonic acid, acetic acid, trifluoroacetic acid, formic acid; salts with amino acids such as glycine, lysine, arginine, histidine, ornithine, glutamic acid, aspartic acid; sodium, potassium, lithium Salts with alkali metals such as calcium; Salts with alkaline earth metals such as calcium and magnesium; Salts with metals such as aluminum, zinc and iron; Tetramethy Salts with organic oniums such as ammonium and choline; ammonia, propanediamine, pyrrolidine, piperidine, pyridine, ethanolamine, N, N-dimethylethanolamine, 4-hydroxypiperidine, t-octylamine, dibenzylamine, morpholine , Glucosamine, phenylglycylalkyl ester, ethylenediamine, N-methylglucamine, guanidine, diethylamine, triethylamine, dicyclohexylamine, N, N'-dibenzylethylenediamine, chloroprocaine, procaine, diethanolamine, N-benzylphenylamine, piperazine, And salts with organic bases such as tris (hydroxymethyl) aminomethane.
さらに、本発明(I)およびその塩には、各種の水和物や溶媒和物が包含される。
Furthermore, the present invention (I) and salts thereof include various hydrates and solvates.
式(I)で表される化合物の製薬学的に許容される前記各種の塩は、当技術分野の通常の知識に基づいて適宜製造することができる。
The various pharmaceutically acceptable salts of the compound represented by the formula (I) can be appropriately produced based on ordinary knowledge in this technical field.
本発明の化合物には、式(I)で表される化合物の立体異性体、ラセミ体、および可能なすべての光学活性体も含まれる。
The compounds of the present invention also include stereoisomers, racemates, and all possible optically active forms of the compounds represented by formula (I).
本発明の式(I)で表される化合物、およびその製薬学的に許容される塩は、特に優れたキサンチンオキシダーゼ阻害活性を有する。その優れたキサンチンオキシダーゼ阻害活性から、本発明の式(I)で表される化合物、およびその製薬学的に許容される塩は、キサンチンオキシダーゼ阻害剤として有用である。
The compound represented by the formula (I) of the present invention and a pharmaceutically acceptable salt thereof have particularly excellent xanthine oxidase inhibitory activity. Due to its excellent xanthine oxidase inhibitory activity, the compounds represented by the formula (I) of the present invention and pharmaceutically acceptable salts thereof are useful as xanthine oxidase inhibitors.
本発明の式(I)で表される化合物、およびその製薬学的に許容される塩は、キサンチンオキシダーゼ阻害剤として臨床で応用可能な、痛風、高尿酸血症、腫瘍崩壊症候群、尿路結石、高血圧症、脂質異常症、糖尿病、動脈硬化症や心不全等の心血管疾患、糖尿病性腎症等の腎疾患、慢性閉塞性肺疾患等の呼吸器疾患、炎症性腸疾患または自己免疫性疾患等、キサンチンオキシダーゼの関与する疾患の治療薬または予防薬として使用することができる。ここで、本発明において、「予防」とは、未だ罹患または発症をしていない個体において、罹患または発症を未然に防ぐことであり、「治療」とは既に罹患または発症した個体において、疾患や症状を治癒、抑制または改善させることをいう。
The compound represented by the formula (I) of the present invention and a pharmaceutically acceptable salt thereof are clinically applicable as a xanthine oxidase inhibitor, gout, hyperuricemia, oncolysis syndrome, urolithiasis , Hypertension, dyslipidemia, diabetes, cardiovascular diseases such as arteriosclerosis and heart failure, kidney diseases such as diabetic nephropathy, respiratory diseases such as chronic obstructive pulmonary disease, inflammatory bowel disease or autoimmune disease It can be used as a therapeutic or prophylactic agent for diseases involving xanthine oxidase. Here, in the present invention, “prevention” means prevention of morbidity or onset in an individual who has not yet been affected or developed, and “treatment” refers to disease or It means healing, suppressing or ameliorating symptoms.
前記式(I)で表される化合物、その製薬学的に許容される塩は、製薬学的に許容される担体および/または希釈剤とともに、医薬組成物とすることができる。この医薬組成物は種々の剤形に成形して、経口的または非経口的に投与することができる。非経口投与としては、例えば、静脈、皮下、筋肉、経皮、または直腸内への投与が挙げられる。
The compound represented by the formula (I) and a pharmaceutically acceptable salt thereof can be made into a pharmaceutical composition together with a pharmaceutically acceptable carrier and / or diluent. This pharmaceutical composition can be formed into various dosage forms and administered orally or parenterally. Parenteral administration includes, for example, intravenous, subcutaneous, intramuscular, transdermal, or rectal administration.
本発明の式(I)で表される化合物またはその塩の1種または2種以上を有効成分として含有する製剤は、通常製剤化に用いられる担体や賦形剤、その他の添加剤を用いて調製される。製剤用の担体や賦形剤としては、固体または液体いずれでも良く、例えば乳糖、ステアリン酸マグネシウム、スターチ、タルク、ゼラチン、寒天、ペクチン、アラビアゴム、オリーブ油、ゴマ油、カカオバター、エチレングリコール等やその他常用のものが挙げられる。投与は錠剤、丸剤、カプセル剤、顆粒剤、散剤、液剤等による経口投与、あるいは静注、筋注等の注射剤、坐剤、経皮等による非経口投与のいずれの形態であってもよい。
Formulations containing one or more of the compounds represented by the formula (I) of the present invention or salts thereof as active ingredients are prepared using carriers, excipients and other additives that are usually used for formulation. Prepared. The carrier or excipient for the preparation may be either solid or liquid, such as lactose, magnesium stearate, starch, talc, gelatin, agar, pectin, gum arabic, olive oil, sesame oil, cocoa butter, ethylene glycol, etc. The usual thing is mentioned. Administration may be in any form of oral administration such as tablets, pills, capsules, granules, powders, liquids, or parenteral administration such as injections such as intravenous injection and intramuscular injection, suppositories, and transdermal. Good.
本発明の式(I)で表される化合物、またはその製薬学的に許容される塩は、疾患の種類、投与経路、患者の症状、年齢、性別、体重等により異なるが、通常成人1日あたり、0.01~1000mgの範囲で、1回または数回に分けて、投与することができる。しかし、投与量は種々の条件により変動するため、上記投与量よりも少ない量で十分な場合もあり、また上記の範囲を超える投与量が必要な場合もある。
The compound represented by the formula (I) of the present invention or a pharmaceutically acceptable salt thereof varies depending on the type of disease, administration route, patient symptom, age, sex, body weight, etc. It can be administered in the range of 0.01 to 1000 mg per dose or divided into several doses. However, since the dose varies depending on various conditions, a dose smaller than the above dose may be sufficient, or a dose exceeding the above range may be required.
本発明を以下、具体的な実施例に基づいて説明する。しかしながら、本発明はこれらの実施例に限定されるものではない。
The present invention will be described below based on specific examples. However, the present invention is not limited to these examples.
単離された新規化合物の構造は、1H NMRおよび/または電子スプレイ源を備えた単一四重極装置(single quadrupole instrumentation)を用いる質量分析、その他適切な分析法により確認した。
1H NMRスペクトル(400MHz、DMSO‐d6、CDCl3またはCD3OD)を測定したものについては、その化学シフト(δ:ppm)およびカプリング定数(J:Hz)を示す。質量分析の結果については、M++H、すなわち化合物分子質量(M)にプロトン(H+)が付加した値として観測された測定値を示す。なお、以下の略号はそれぞれ次のものを表す。
装置:JEOL製JMTC-400/54/SS
s=singlet、d=doublet、t=triplet、q=quartet、brs=broad singlet、m=multiplet。
以下の実施例の方法に従って合成された化合物について、さらに高速液体クロマトグラフィー(HPLC)分析、および電子スプレーイオン源を備えた飛行時間型質量分析計(TOF‐MS:Time Of Flight‐Mass Spectroscopy)を用いる質量分析法によっても分析を行った。
下記分析条件でのHPLC分析における化合物の保持時間(単位:分)を、HPLC保持時間として示す。
HPLC測定条件
測定装置:Hewlett‐Packard 1100HPLC
カラム:Imtakt Cadenza CD‐Cl8 100mm×4.6mm 3μm
UV:PDA検出(254nm)
カラム温度:40度
グラジエント条件:
溶媒:A:H2O/アセトニトリル=95/5
0.05%TFA(トリフルオロ酢酸)
B:H2O/アセトニトリル=5/95
0.05%TFA(トリフルオロ酢酸)
流速:1.0mL/分
勾配:0~1分、溶媒B:2% 溶媒A:98%
1~14分、溶媒B:2%→100% 溶媒A:98%→0%
14~17分、溶媒B:100% 溶媒A:0%
17~19分、溶媒B:100%→2% 溶媒A:0%→98%
また、質量分析の結果については、以下に示す装置および分析条件により観測された「M++H」の値(obs. Mass:すなわち化合物の分子質量(M)にプロトン(H+)が付加した実測値)、「M++H」の計算値(pred. Mass)と共に、実測された「M++H」の値から算出された組成式(Formula)も示す。
TOF‐MS測定条件
質量分析装置:島津製作所 LCMS‐IT‐TOF
LC:Prominence
カラム:Phenomenex Synergi Hydro‐RP 4.0mm×20mm 2.5μm
UV:PDA検出(254nm)
流量:0.6mL/分
カラム温度:40度
検出電圧:1.63kV
グラジェント条件:
溶媒:A:H2O/アセトニトリル=95/5
0.1%HCOOH
B:H2O/アセトニトリル=5/95
0.1%HCOOH
流速:0.5mL/分
勾配:0~0.2分、溶媒B:2% 溶媒A:98%
0.2~2.5分、溶媒B:2%→100% 溶媒A:98%→0%
2.5~3.8分、溶媒B:100% 溶媒A:0%
3.8~4.0分、溶媒B:100%→2% 溶媒A:0%→98%
4.0~5.0分、溶媒B:2% 溶媒A:98% The structure of the isolated novel compound was confirmed by 1 H NMR and / or mass spectrometry using a single quadrupole instrument equipped with an electron spray source, and other appropriate analytical methods.
For those measured for 1 H NMR spectrum (400 MHz, DMSO-d 6 , CDCl 3 or CD 3 OD), the chemical shift (δ: ppm) and the coupling constant (J: Hz) are shown. About the result of mass spectrometry, the measured value observed as a value which added proton (H <+> ) to M < + > + H, ie, a compound molecular mass (M), is shown. The following abbreviations represent the following:
Equipment: JEOL JMTC-400 / 54 / SS
s = singlet, d = doublet, t = triplet, q = quartet, brs = broad singlet, m = multiplet.
For compounds synthesized according to the methods of the following examples, a high-performance liquid chromatography (HPLC) analysis and a time-of-flight mass spectrometer (TOF-MS) equipped with an electrospray ion source were further analyzed. Analysis was also performed by the mass spectrometry used.
The retention time (unit: minute) of a compound in HPLC analysis under the following analysis conditions is shown as HPLC retention time.
HPLC measurement condition measuring apparatus: Hewlett-Packard 1100 HPLC
Column: Imtakt Cadenza CD-Cl8 100 mm × 4.6 mm 3 μm
UV: PDA detection (254 nm)
Column temperature: 40 degree Gradient condition:
Solvent: A: H 2 O / acetonitrile = 95/5
0.05% TFA (trifluoroacetic acid)
B: H 2 O / acetonitrile = 5/95
0.05% TFA (trifluoroacetic acid)
Flow rate: 1.0 mL / min Gradient: 0 to 1 minute, Solvent B: 2% Solvent A: 98%
1-14 minutes, solvent B: 2% → 100% solvent A: 98% → 0%
14-17 minutes, solvent B: 100% solvent A: 0%
17-19 minutes, solvent B: 100% → 2% solvent A: 0% → 98%
As for the results of mass spectrometry, the value of “M + + H” (obs. Mass: that is, actual measurement in which proton (H + ) was added to the molecular mass (M) of the compound, which was observed by the apparatus and analysis conditions described below. value), the calculated value of "M + + H" (pred. Mass), actually measured "M + + H" value calculated from the composition formula of (formula) are also shown.
TOF-MS measurement condition mass spectrometer: Shimadzu LCMS-IT-TOF
LC: Prominence
Column: Phenomenex Synergy Hydro-RP 4.0 mm × 20 mm 2.5 μm
UV: PDA detection (254 nm)
Flow rate: 0.6 mL / min Column temperature: 40 degrees Detection voltage: 1.63 kV
Gradient conditions:
Solvent: A: H 2 O / acetonitrile = 95/5
0.1% HCOOH
B: H 2 O / acetonitrile = 5/95
0.1% HCOOH
Flow rate: 0.5 mL / min Gradient: 0 to 0.2 minutes, Solvent B: 2% Solvent A: 98%
0.2-2.5 minutes, solvent B: 2% → 100% solvent A: 98% → 0%
2.5-3.8 minutes, solvent B: 100% solvent A: 0%
3.8 to 4.0 minutes, solvent B: 100% → 2% solvent A: 0% → 98%
4.0-5.0 min, Solvent B: 2% Solvent A: 98%
1H NMRスペクトル(400MHz、DMSO‐d6、CDCl3またはCD3OD)を測定したものについては、その化学シフト(δ:ppm)およびカプリング定数(J:Hz)を示す。質量分析の結果については、M++H、すなわち化合物分子質量(M)にプロトン(H+)が付加した値として観測された測定値を示す。なお、以下の略号はそれぞれ次のものを表す。
装置:JEOL製JMTC-400/54/SS
s=singlet、d=doublet、t=triplet、q=quartet、brs=broad singlet、m=multiplet。
以下の実施例の方法に従って合成された化合物について、さらに高速液体クロマトグラフィー(HPLC)分析、および電子スプレーイオン源を備えた飛行時間型質量分析計(TOF‐MS:Time Of Flight‐Mass Spectroscopy)を用いる質量分析法によっても分析を行った。
下記分析条件でのHPLC分析における化合物の保持時間(単位:分)を、HPLC保持時間として示す。
HPLC測定条件
測定装置:Hewlett‐Packard 1100HPLC
カラム:Imtakt Cadenza CD‐Cl8 100mm×4.6mm 3μm
UV:PDA検出(254nm)
カラム温度:40度
グラジエント条件:
溶媒:A:H2O/アセトニトリル=95/5
0.05%TFA(トリフルオロ酢酸)
B:H2O/アセトニトリル=5/95
0.05%TFA(トリフルオロ酢酸)
流速:1.0mL/分
勾配:0~1分、溶媒B:2% 溶媒A:98%
1~14分、溶媒B:2%→100% 溶媒A:98%→0%
14~17分、溶媒B:100% 溶媒A:0%
17~19分、溶媒B:100%→2% 溶媒A:0%→98%
また、質量分析の結果については、以下に示す装置および分析条件により観測された「M++H」の値(obs. Mass:すなわち化合物の分子質量(M)にプロトン(H+)が付加した実測値)、「M++H」の計算値(pred. Mass)と共に、実測された「M++H」の値から算出された組成式(Formula)も示す。
TOF‐MS測定条件
質量分析装置:島津製作所 LCMS‐IT‐TOF
LC:Prominence
カラム:Phenomenex Synergi Hydro‐RP 4.0mm×20mm 2.5μm
UV:PDA検出(254nm)
流量:0.6mL/分
カラム温度:40度
検出電圧:1.63kV
グラジェント条件:
溶媒:A:H2O/アセトニトリル=95/5
0.1%HCOOH
B:H2O/アセトニトリル=5/95
0.1%HCOOH
流速:0.5mL/分
勾配:0~0.2分、溶媒B:2% 溶媒A:98%
0.2~2.5分、溶媒B:2%→100% 溶媒A:98%→0%
2.5~3.8分、溶媒B:100% 溶媒A:0%
3.8~4.0分、溶媒B:100%→2% 溶媒A:0%→98%
4.0~5.0分、溶媒B:2% 溶媒A:98% The structure of the isolated novel compound was confirmed by 1 H NMR and / or mass spectrometry using a single quadrupole instrument equipped with an electron spray source, and other appropriate analytical methods.
For those measured for 1 H NMR spectrum (400 MHz, DMSO-d 6 , CDCl 3 or CD 3 OD), the chemical shift (δ: ppm) and the coupling constant (J: Hz) are shown. About the result of mass spectrometry, the measured value observed as a value which added proton (H <+> ) to M < + > + H, ie, a compound molecular mass (M), is shown. The following abbreviations represent the following:
Equipment: JEOL JMTC-400 / 54 / SS
s = singlet, d = doublet, t = triplet, q = quartet, brs = broad singlet, m = multiplet.
For compounds synthesized according to the methods of the following examples, a high-performance liquid chromatography (HPLC) analysis and a time-of-flight mass spectrometer (TOF-MS) equipped with an electrospray ion source were further analyzed. Analysis was also performed by the mass spectrometry used.
The retention time (unit: minute) of a compound in HPLC analysis under the following analysis conditions is shown as HPLC retention time.
HPLC measurement condition measuring apparatus: Hewlett-Packard 1100 HPLC
Column: Imtakt Cadenza CD-Cl8 100 mm × 4.6 mm 3 μm
UV: PDA detection (254 nm)
Column temperature: 40 degree Gradient condition:
Solvent: A: H 2 O / acetonitrile = 95/5
0.05% TFA (trifluoroacetic acid)
B: H 2 O / acetonitrile = 5/95
0.05% TFA (trifluoroacetic acid)
Flow rate: 1.0 mL / min Gradient: 0 to 1 minute, Solvent B: 2% Solvent A: 98%
1-14 minutes, solvent B: 2% → 100% solvent A: 98% → 0%
14-17 minutes, solvent B: 100% solvent A: 0%
17-19 minutes, solvent B: 100% → 2% solvent A: 0% → 98%
As for the results of mass spectrometry, the value of “M + + H” (obs. Mass: that is, actual measurement in which proton (H + ) was added to the molecular mass (M) of the compound, which was observed by the apparatus and analysis conditions described below. value), the calculated value of "M + + H" (pred. Mass), actually measured "M + + H" value calculated from the composition formula of (formula) are also shown.
TOF-MS measurement condition mass spectrometer: Shimadzu LCMS-IT-TOF
LC: Prominence
Column: Phenomenex Synergy Hydro-RP 4.0 mm × 20 mm 2.5 μm
UV: PDA detection (254 nm)
Flow rate: 0.6 mL / min Column temperature: 40 degrees Detection voltage: 1.63 kV
Gradient conditions:
Solvent: A: H 2 O / acetonitrile = 95/5
0.1% HCOOH
B: H 2 O / acetonitrile = 5/95
0.1% HCOOH
Flow rate: 0.5 mL / min Gradient: 0 to 0.2 minutes, Solvent B: 2% Solvent A: 98%
0.2-2.5 minutes, solvent B: 2% → 100% solvent A: 98% → 0%
2.5-3.8 minutes, solvent B: 100% solvent A: 0%
3.8 to 4.0 minutes, solvent B: 100% → 2% solvent A: 0% → 98%
4.0-5.0 min, Solvent B: 2% Solvent A: 98%
[参考例]エチル 2-[3-ホルミル-4-(2-メチルプロポキシ)フェニル]-4-メチル-1,3-チアゾール-5-カルボキシレート(参考例化合物)の合成
4-ヒドロキシベンゾニトリルから特開平10-45733を参考にエチル 2-[3-ホルミル-4-(2-メチルプロポキシ)フェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートを得た。 [Reference Example] Synthesis of ethyl 2- [3-formyl-4- (2-methylpropoxy) phenyl] -4-methyl-1,3-thiazole-5-carboxylate (reference example compound) from 4-hydroxybenzonitrile With reference to JP-A-10-45733, ethyl 2- [3-formyl-4- (2-methylpropoxy) phenyl] -4-methyl-1,3-thiazole-5-carboxylate was obtained.
4-ヒドロキシベンゾニトリルから特開平10-45733を参考にエチル 2-[3-ホルミル-4-(2-メチルプロポキシ)フェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートを得た。 [Reference Example] Synthesis of ethyl 2- [3-formyl-4- (2-methylpropoxy) phenyl] -4-methyl-1,3-thiazole-5-carboxylate (reference example compound) from 4-hydroxybenzonitrile With reference to JP-A-10-45733, ethyl 2- [3-formyl-4- (2-methylpropoxy) phenyl] -4-methyl-1,3-thiazole-5-carboxylate was obtained.
[実施例1]4-メチル-2-[4-イソブトキシ-3-(ピリジン-2-イル)フェニル]-1,3-チアゾール-5-カルボン酸(化合物番号1)の合成(合成法A)
(1)3-ブロモ-4-フルオロベンゾニトリル3.0g、2-メチルプロパノール1.50gおよび炭酸カリウム2.76gをジメチルスルホキシド50mLに懸濁させ、窒素雰囲気下、100℃で14時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、3-ブロモ-4-イソブトキシベンゾニトリル2.58gを得た。
(2)上記で得られた3-ブロモ-4-イソブトキシベンゾニトリル2.58gをテトラヒドロフラン20mLに懸濁させ、トリイソプロポキシホウ酸1.88gを加え、窒素雰囲気下、-78℃まで冷却した。反応混合液に2.6Mのn-ブチルリチウム2.30mLを滴下させながらゆっくりと加え、-78℃にて1時間撹拌させた。その後、0℃まで昇温し、2.0M塩酸10mLを加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、3-(ジヒドロキシボラニル)-4-イソブトキシベンゾニトリルの粗体1.21gを得た。
(3)3-(ジヒドロキシボラニル)-4-イソブトキシベンゾニトリルの粗体109.5mgに2-ブロモピリジン118.5mg、炭酸カリウム138mg、塩化パラジウム-1,1’-ビス(ジフェニルホスフィノ)フェロセン40.8mgを加え、1,4-ジオキサン1.6mLと水0.4mLに懸濁させ、窒素雰囲気下、100℃で14時間加熱した。その後、反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体を常法により精製することで、4-イソブトキシ-3-(ピリジン-2-イル)ベンゾニトリル67.0mgを得た。
ESI/MS m/e:253.1(M++H,C16H17N2O)
(4)4-イソブトキシ-3-(ピリジン-2-イル)ベンゾニトリル67.0mgを酢酸0.3mL、チオ酢酸0.5mLに懸濁させ、窒素雰囲気下、50℃で14時間加熱した。その後、減圧濃縮を行い、4-イソブトキシ-3-(ピリジン-2-イル)ベンゼン-1-カルボチオアミドの粗体を得た。
ESI/MS m/e:287.1(M++H,C16H19N2OS)
(5)上記で得られた4-イソブトキシ-3-(ピリジン-2-イル)ベンゼン-1-カルボチオアミドの粗体にエチル-2-クロロアセトアセテート65.6mgを加え、エタノール2mLに懸濁させ、窒素雰囲気下、70℃で5時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、エチル 4-メチル-2-[4-イソブトキシ-3-(ピリジン-2-イル)フェニル]-1,3-チアゾール-5-カルボキシレート37.7mgを得た。
(6)上記で得られたエチル 4-メチル-2-[4-イソブトキシ-3-(ピリジン-2-イル)フェニル]-1,3-チアゾール-5-カルボキシレート37.7mgをテトラヒドロフラン/メタノール=1/1の混合溶液1mLに溶解し、2M水酸化ナトリウム水溶液0.2mLを加えて、室温で4時間撹拌した。反応混合液に2M塩酸0.2mLを加え、水3mL、酢酸エチル4mLを加えて撹拌し、有機相を濃縮した後に常法により精製し、4-メチル-2-[4-イソブトキシ-3-(ピリジン-2-イル)フェニル]-1,3-チアゾール-5-カルボン酸21.8mgを得た。
1H-NMR(400MHz,DMSO d6)δ(ppm):0.95(6H,d,J=6.4Hz),2.00-2.06(1H,m),2.66(3H,s),3.93(2H,d,J=6.0Hz),7.30(1H,d,J=8.8Hz),7.54(1H,t,J=5.2Hz),8.02-8.09(3H,m),8.36(1H,d,J=2.4Hz),8.78(1H,d,J=4.4Hz)
HPLC保持時間:8.75分
Obs Mass(M++H):369.1247
Pred Mass(M++H):369.1267
Formula(M):C20H20N2O3S [Example 1] Synthesis of 4-methyl-2- [4-isobutoxy-3- (pyridin-2-yl) phenyl] -1,3-thiazole-5-carboxylic acid (Compound No. 1 ) (Synthesis Method A)
(1) 3.0 g of 3-bromo-4-fluorobenzonitrile, 1.50 g of 2-methylpropanol and 2.76 g of potassium carbonate were suspended in 50 mL of dimethyl sulfoxide and heated at 100 ° C. for 14 hours in a nitrogen atmosphere. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried and concentrated under reduced pressure, and the resulting crude product was separated and purified by silica gel column chromatography to obtain 2.58 g of 3-bromo-4-isobutoxybenzonitrile.
(2) 2.58 g of 3-bromo-4-isobutoxybenzonitrile obtained above was suspended in 20 mL of tetrahydrofuran, added 1.88 g of triisopropoxyboric acid, and cooled to −78 ° C. in a nitrogen atmosphere. . To the reaction mixture, 2.30 mL of 2.6 M n-butyllithium was slowly added dropwise, and the mixture was stirred at −78 ° C. for 1 hour. Thereafter, the temperature was raised to 0 ° C., 10 mL of 2.0 M hydrochloric acid was added, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried and concentrated under reduced pressure to obtain 1.21 g of a crude 3- (dihydroxyboranyl) -4-isobutoxybenzonitrile.
(3) 109.5 mg of crude 3- (dihydroxyboranyl) -4-isobutoxybenzonitrile, 118.5 mg of 2-bromopyridine, 138 mg of potassium carbonate, palladium chloride-1,1′-bis (diphenylphosphino) 40.8 mg of ferrocene was added, suspended in 1.6 mL of 1,4-dioxane and 0.4 mL of water, and heated at 100 ° C. for 14 hours under a nitrogen atmosphere. Thereafter, water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure. The resulting crude product is purified by a conventional method to obtain 67.0 mg of 4-isobutoxy-3- (pyridin-2-yl) benzonitrile. It was.
ESI / MS m / e: 253.1 (M + + H, C 16 H 17 N 2 O)
(4) 67.0 mg of 4-isobutoxy-3- (pyridin-2-yl) benzonitrile was suspended in 0.3 mL of acetic acid and 0.5 mL of thioacetic acid, and heated at 50 ° C. for 14 hours under a nitrogen atmosphere. Thereafter, concentration under reduced pressure was performed to obtain a crude product of 4-isobutoxy-3- (pyridin-2-yl) benzene-1-carbothioamide.
ESI / MS m / e: 287.1 (M + + H, C 16 H 19 N 2 OS)
(5) Add 65.6 mg of ethyl-2-chloroacetoacetate to the crude 4-isobutoxy-3- (pyridin-2-yl) benzene-1-carbothioamide obtained above and suspend in 2 mL of ethanol. The mixture was heated at 70 ° C. for 5 hours in a nitrogen atmosphere. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure, and the resulting crude product is separated and purified by silica gel column chromatography to obtain ethyl 4-methyl-2- [4-isobutoxy-3- (pyridine- There were obtained 37.7 mg of 2-yl) phenyl] -1,3-thiazole-5-carboxylate.
(6) 37.7 mg of ethyl 4-methyl-2- [4-isobutoxy-3- (pyridin-2-yl) phenyl] -1,3-thiazole-5-carboxylate obtained above was added to tetrahydrofuran / methanol = It melt | dissolved in 1 mL of 1/1 mixed solution, 0.2 mL of 2M sodium hydroxide aqueous solution was added, and it stirred at room temperature for 4 hours. To the reaction mixture was added 0.2 mL of 2M hydrochloric acid, and 3 mL of water and 4 mL of ethyl acetate were added and stirred. The organic phase was concentrated and purified by a conventional method, and 4-methyl-2- [4-isobutoxy-3- ( Pyridin-2-yl) phenyl] -1,3-thiazole-5-carboxylic acid 21.8 mg was obtained.
1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 0.95 (6H, d, J = 6.4 Hz), 2.00-2.06 (1H, m), 2.66 (3H, s), 3.93 (2H, d, J = 6.0 Hz), 7.30 (1H, d, J = 8.8 Hz), 7.54 (1H, t, J = 5.2 Hz), 8. 02-8.09 (3H, m), 8.36 (1H, d, J = 2.4Hz), 8.78 (1H, d, J = 4.4Hz)
HPLC retention time: 8.75 minutes Obs Mass (M + + H): 369.1247
Pred Mass (M + + H): 369.1267
Formula (M): C 20 H 20 N 2 O 3 S
(1)3-ブロモ-4-フルオロベンゾニトリル3.0g、2-メチルプロパノール1.50gおよび炭酸カリウム2.76gをジメチルスルホキシド50mLに懸濁させ、窒素雰囲気下、100℃で14時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、3-ブロモ-4-イソブトキシベンゾニトリル2.58gを得た。
(2)上記で得られた3-ブロモ-4-イソブトキシベンゾニトリル2.58gをテトラヒドロフラン20mLに懸濁させ、トリイソプロポキシホウ酸1.88gを加え、窒素雰囲気下、-78℃まで冷却した。反応混合液に2.6Mのn-ブチルリチウム2.30mLを滴下させながらゆっくりと加え、-78℃にて1時間撹拌させた。その後、0℃まで昇温し、2.0M塩酸10mLを加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、3-(ジヒドロキシボラニル)-4-イソブトキシベンゾニトリルの粗体1.21gを得た。
(3)3-(ジヒドロキシボラニル)-4-イソブトキシベンゾニトリルの粗体109.5mgに2-ブロモピリジン118.5mg、炭酸カリウム138mg、塩化パラジウム-1,1’-ビス(ジフェニルホスフィノ)フェロセン40.8mgを加え、1,4-ジオキサン1.6mLと水0.4mLに懸濁させ、窒素雰囲気下、100℃で14時間加熱した。その後、反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体を常法により精製することで、4-イソブトキシ-3-(ピリジン-2-イル)ベンゾニトリル67.0mgを得た。
ESI/MS m/e:253.1(M++H,C16H17N2O)
(4)4-イソブトキシ-3-(ピリジン-2-イル)ベンゾニトリル67.0mgを酢酸0.3mL、チオ酢酸0.5mLに懸濁させ、窒素雰囲気下、50℃で14時間加熱した。その後、減圧濃縮を行い、4-イソブトキシ-3-(ピリジン-2-イル)ベンゼン-1-カルボチオアミドの粗体を得た。
ESI/MS m/e:287.1(M++H,C16H19N2OS)
(5)上記で得られた4-イソブトキシ-3-(ピリジン-2-イル)ベンゼン-1-カルボチオアミドの粗体にエチル-2-クロロアセトアセテート65.6mgを加え、エタノール2mLに懸濁させ、窒素雰囲気下、70℃で5時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、エチル 4-メチル-2-[4-イソブトキシ-3-(ピリジン-2-イル)フェニル]-1,3-チアゾール-5-カルボキシレート37.7mgを得た。
(6)上記で得られたエチル 4-メチル-2-[4-イソブトキシ-3-(ピリジン-2-イル)フェニル]-1,3-チアゾール-5-カルボキシレート37.7mgをテトラヒドロフラン/メタノール=1/1の混合溶液1mLに溶解し、2M水酸化ナトリウム水溶液0.2mLを加えて、室温で4時間撹拌した。反応混合液に2M塩酸0.2mLを加え、水3mL、酢酸エチル4mLを加えて撹拌し、有機相を濃縮した後に常法により精製し、4-メチル-2-[4-イソブトキシ-3-(ピリジン-2-イル)フェニル]-1,3-チアゾール-5-カルボン酸21.8mgを得た。
1H-NMR(400MHz,DMSO d6)δ(ppm):0.95(6H,d,J=6.4Hz),2.00-2.06(1H,m),2.66(3H,s),3.93(2H,d,J=6.0Hz),7.30(1H,d,J=8.8Hz),7.54(1H,t,J=5.2Hz),8.02-8.09(3H,m),8.36(1H,d,J=2.4Hz),8.78(1H,d,J=4.4Hz)
HPLC保持時間:8.75分
Obs Mass(M++H):369.1247
Pred Mass(M++H):369.1267
Formula(M):C20H20N2O3S [Example 1] Synthesis of 4-methyl-2- [4-isobutoxy-3- (pyridin-2-yl) phenyl] -1,3-thiazole-5-carboxylic acid (Compound No. 1 ) (Synthesis Method A)
(1) 3.0 g of 3-bromo-4-fluorobenzonitrile, 1.50 g of 2-methylpropanol and 2.76 g of potassium carbonate were suspended in 50 mL of dimethyl sulfoxide and heated at 100 ° C. for 14 hours in a nitrogen atmosphere. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried and concentrated under reduced pressure, and the resulting crude product was separated and purified by silica gel column chromatography to obtain 2.58 g of 3-bromo-4-isobutoxybenzonitrile.
(2) 2.58 g of 3-bromo-4-isobutoxybenzonitrile obtained above was suspended in 20 mL of tetrahydrofuran, added 1.88 g of triisopropoxyboric acid, and cooled to −78 ° C. in a nitrogen atmosphere. . To the reaction mixture, 2.30 mL of 2.6 M n-butyllithium was slowly added dropwise, and the mixture was stirred at −78 ° C. for 1 hour. Thereafter, the temperature was raised to 0 ° C., 10 mL of 2.0 M hydrochloric acid was added, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried and concentrated under reduced pressure to obtain 1.21 g of a crude 3- (dihydroxyboranyl) -4-isobutoxybenzonitrile.
(3) 109.5 mg of crude 3- (dihydroxyboranyl) -4-isobutoxybenzonitrile, 118.5 mg of 2-bromopyridine, 138 mg of potassium carbonate, palladium chloride-1,1′-bis (diphenylphosphino) 40.8 mg of ferrocene was added, suspended in 1.6 mL of 1,4-dioxane and 0.4 mL of water, and heated at 100 ° C. for 14 hours under a nitrogen atmosphere. Thereafter, water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure. The resulting crude product is purified by a conventional method to obtain 67.0 mg of 4-isobutoxy-3- (pyridin-2-yl) benzonitrile. It was.
ESI / MS m / e: 253.1 (M + + H, C 16 H 17 N 2 O)
(4) 67.0 mg of 4-isobutoxy-3- (pyridin-2-yl) benzonitrile was suspended in 0.3 mL of acetic acid and 0.5 mL of thioacetic acid, and heated at 50 ° C. for 14 hours under a nitrogen atmosphere. Thereafter, concentration under reduced pressure was performed to obtain a crude product of 4-isobutoxy-3- (pyridin-2-yl) benzene-1-carbothioamide.
ESI / MS m / e: 287.1 (M + + H, C 16 H 19 N 2 OS)
(5) Add 65.6 mg of ethyl-2-chloroacetoacetate to the crude 4-isobutoxy-3- (pyridin-2-yl) benzene-1-carbothioamide obtained above and suspend in 2 mL of ethanol. The mixture was heated at 70 ° C. for 5 hours in a nitrogen atmosphere. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure, and the resulting crude product is separated and purified by silica gel column chromatography to obtain ethyl 4-methyl-2- [4-isobutoxy-3- (pyridine- There were obtained 37.7 mg of 2-yl) phenyl] -1,3-thiazole-5-carboxylate.
(6) 37.7 mg of ethyl 4-methyl-2- [4-isobutoxy-3- (pyridin-2-yl) phenyl] -1,3-thiazole-5-carboxylate obtained above was added to tetrahydrofuran / methanol = It melt | dissolved in 1 mL of 1/1 mixed solution, 0.2 mL of 2M sodium hydroxide aqueous solution was added, and it stirred at room temperature for 4 hours. To the reaction mixture was added 0.2 mL of 2M hydrochloric acid, and 3 mL of water and 4 mL of ethyl acetate were added and stirred. The organic phase was concentrated and purified by a conventional method, and 4-methyl-2- [4-isobutoxy-3- ( Pyridin-2-yl) phenyl] -1,3-thiazole-5-carboxylic acid 21.8 mg was obtained.
1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 0.95 (6H, d, J = 6.4 Hz), 2.00-2.06 (1H, m), 2.66 (3H, s), 3.93 (2H, d, J = 6.0 Hz), 7.30 (1H, d, J = 8.8 Hz), 7.54 (1H, t, J = 5.2 Hz), 8. 02-8.09 (3H, m), 8.36 (1H, d, J = 2.4Hz), 8.78 (1H, d, J = 4.4Hz)
HPLC retention time: 8.75 minutes Obs Mass (M + + H): 369.1247
Pred Mass (M + + H): 369.1267
Formula (M): C 20 H 20 N 2 O 3 S
[実施例2-6]
実施例1と同様にして、化合物番号2~6を合成した。 [Example 2-6]
In the same manner as in Example 1, Compound Nos. 2 to 6 were synthesized.
実施例1と同様にして、化合物番号2~6を合成した。 [Example 2-6]
In the same manner as in Example 1, Compound Nos. 2 to 6 were synthesized.
[実施例7]4-メチル-2-[4-イソブトキシ-3-(ピラジン-2-イル)フェニル]-1,3-チアゾール-5-カルボン酸(化合物番号7)の合成
(1)3-ブロモ-4-フルオロベンゾニトリル5.32gをテトラヒドロフラン100mLに懸濁させ、トリイソプロポキシホウ酸10.0gを加え、窒素雰囲気下、-78℃まで冷却した。反応混合液に1.6Mのn-ブチルリチウム20.0mLを滴下させながらゆっくりと加え、-78℃にて1時間撹拌させた。その後、0℃まで昇温し、2.0M塩酸30mLを加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、3-(ジヒドロキシボラニル)-4-フルオロベンゾニトリルの粗体を得た。その後、ヘキサン50mL中でスラリー状態により1時間撹拌した後に、ろ過し、減圧乾燥することで、3-(ジヒドロキシボラニル)-4-フルオロベンゾニトリル3.98gを得た。
(2)3-(ジヒドロキシボラニル)-4-フルオロベンゾニトリル33.0mgに2-クロロピラジン34.4mg、炭酸カリウム55.3mg、塩化パラジウム-1,1’-ビス(ジフェニルホスフィノ)フェロセン8.2mgを加え、1,4-ジオキサン1.0mLと水0.2mLに懸濁させ、窒素雰囲気下、100℃で14時間加熱した。その後、反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、4-フルオロ-3-(ピラジン-2-イル)ベンゾニトリルの粗体を得た。
ESI/MS m/e:200.0(M++H,C11H7FN3)
(3)上記で得られた4-フルオロ-3-(ピラジン-2-イル)ベンゾニトリルに2-メチルプロパノール22.2mgおよびt-ブトキシカリウム33.7mgをジメチルホルムアミド1.0mLに懸濁させ、窒素雰囲気下、100℃で6時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、4-イソブトキシ-3-(ピラジン-2-イル)ベンゾニトリルの粗体を得た。
ESI/MS m/e:254.1(M++H,C15H16N3O)
(4)上記で得られた4-イソブトキシ-3-(ピラジン-2-イル)ベンゾニトリルを酢酸0.2mL、チオ酢酸0.5mLに懸濁させ、窒素雰囲気下、60℃で14時間加熱した。その後、減圧濃縮を行い、4-イソブトキシ-3-(ピラジン-2-イル)ベンゼン-1-カルボチオアミドの粗体を得た。
ESI/MS m/e:288.1(M++H,C15H18N3OS)
(5)上記で得られた4-イソブトキシ-3-(ピラジン-2-イル)ベンゼン-1-カルボチオアミドの粗体にエチル-2-クロロアセトアセテート74.0mgを加え、エタノール2mLに懸濁させ、窒素雰囲気下、70℃で5時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、エチル 4-メチル-2-[4-イソブトキシ-3-(ピラジン-2-イル)フェニル]-1,3-チアゾール-5-カルボキシレート20.2mgを得た。
ESI/MS m/e:298.1(M++H,C21H24N3O3S)
(6)上記で得られたエチル 4-メチル-2-[4-イソブトキシ-3-(ピラジン-2-イル)フェニル]-1,3-チアゾール-5-カルボキシレート20.2mgをテトラヒドロフラン/メタノール=1/1の混合溶液1mLに溶解し、2M水酸化ナトリウム水溶液0.2mLを加えて、50℃で4時間撹拌した。反応混合液に2M塩酸0.2mLを加え、水3mL、酢酸エチル4mLを加えて撹拌し、有機相を濃縮した後に常法により精製し、4-メチル-2-[4-イソブトキシ-3-(ピラジン-2-イル)フェニル]-1,3-チアゾール-5-カルボン酸6.4mgを得た。
1H-NMR(400MHz,DMSO d6)δ(ppm):0.96(6H,d,J=6.8Hz),2.03-2.10(1H,m),2.66(3H,s),3.97(2H,d,J=6.4Hz),7.32(1H,d,J=8.8Hz),8.03(1H,dd,J=2.4,8.4Hz),8.61(1H,d,J=2.4Hz),8.79(1H,t,J=2.4Hz),9.18(1H,d,J=1.6Hz)
HPLC保持時間:11.97分
Obs Mass(M++H):370.1218
Pred Mass(M++H):370.1220
Formula(M):C19H19N3O3S [Example 7] Synthesis of 4-methyl-2- [4-isobutoxy-3- (pyrazin-2-yl) phenyl] -1,3-thiazole-5-carboxylic acid (Compound No. 7 ) (1) 3- Bromo-4-fluorobenzonitrile (5.32 g) was suspended in tetrahydrofuran (100 mL), triisopropoxyboric acid (10.0 g) was added, and the mixture was cooled to -78 ° C under a nitrogen atmosphere. To the reaction mixture, 20.0 mL of 1.6 M n-butyllithium was slowly added dropwise and allowed to stir at -78 ° C. for 1 hour. Thereafter, the temperature was raised to 0 ° C., 30 mL of 2.0 M hydrochloric acid was added, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried and concentrated under reduced pressure to obtain a crude 3- (dihydroxyboranyl) -4-fluorobenzonitrile. Thereafter, the mixture was stirred in a slurry state in 50 mL of hexane for 1 hour, filtered, and dried under reduced pressure to obtain 3.98 g of 3- (dihydroxyboranyl) -4-fluorobenzonitrile.
(2) 3-3.0 mg of 3- (dihydroxyboranyl) -4-fluorobenzonitrile, 34.4 mg of 2-chloropyrazine, 55.3 mg of potassium carbonate, palladium chloride-1,1′-bis (diphenylphosphino) ferrocene 8 .2 mg was added, suspended in 1.0 mL of 1,4-dioxane and 0.2 mL of water, and heated at 100 ° C. for 14 hours under a nitrogen atmosphere. Thereafter, water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried and concentrated under reduced pressure to obtain a crude 4-fluoro-3- (pyrazin-2-yl) benzonitrile.
ESI / MS m / e: 200.0 (M + + H, C 11 H 7 FN 3 )
(3) In 2-fluoro-3- (pyrazin-2-yl) benzonitrile obtained above, 22.2 mg of 2-methylpropanol and 33.7 mg of potassium t-butoxy were suspended in 1.0 mL of dimethylformamide. The mixture was heated at 100 ° C. for 6 hours under a nitrogen atmosphere. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried and concentrated under reduced pressure to obtain a crude product of 4-isobutoxy-3- (pyrazin-2-yl) benzonitrile.
ESI / MS m / e: 254.1 (M + + H, C 15 H 16 N 3 O)
(4) The 4-isobutoxy-3- (pyrazin-2-yl) benzonitrile obtained above was suspended in 0.2 mL of acetic acid and 0.5 mL of thioacetic acid and heated at 60 ° C. for 14 hours under a nitrogen atmosphere. . Thereafter, concentration under reduced pressure was performed to obtain a crude product of 4-isobutoxy-3- (pyrazin-2-yl) benzene-1-carbothioamide.
ESI / MS m / e: 288.1 (M + + H, C 15 H 18 N 3 OS)
(5) Add 74.0 mg of ethyl-2-chloroacetoacetate to the crude 4-isobutoxy-3- (pyrazin-2-yl) benzene-1-carbothioamide obtained above and suspend in 2 mL of ethanol. The mixture was heated at 70 ° C. for 5 hours in a nitrogen atmosphere. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure, and the resulting crude product is separated and purified by silica gel column chromatography to obtain ethyl 4-methyl-2- [4-isobutoxy-3- (pyrazine- There was obtained 20.2 mg of 2-yl) phenyl] -1,3-thiazole-5-carboxylate.
ESI / MS m / e: 298.1 (M + + H, C 21 H 24 N 3 O 3 S)
(6) 20.2 mg of ethyl 4-methyl-2- [4-isobutoxy-3- (pyrazin-2-yl) phenyl] -1,3-thiazole-5-carboxylate obtained above was added to tetrahydrofuran / methanol = It melt | dissolved in 1 mL of 1/1 mixed solution, 0.2 mL of 2M sodium hydroxide aqueous solution was added, and it stirred at 50 degreeC for 4 hours. To the reaction mixture was added 0.2 mL of 2M hydrochloric acid, and 3 mL of water and 4 mL of ethyl acetate were added and stirred. The organic phase was concentrated and purified by a conventional method, and 4-methyl-2- [4-isobutoxy-3- ( 6.4 mg of pyrazin-2-yl) phenyl] -1,3-thiazole-5-carboxylic acid was obtained.
1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 0.96 (6H, d, J = 6.8 Hz), 2.03-2.10 (1H, m), 2.66 (3H, s), 3.97 (2H, d, J = 6.4 Hz), 7.32 (1H, d, J = 8.8 Hz), 8.03 (1H, dd, J = 2.4, 8.4 Hz) ), 8.61 (1H, d, J = 2.4 Hz), 8.79 (1H, t, J = 2.4 Hz), 9.18 (1H, d, J = 1.6 Hz)
HPLC retention time: 11.97 minutes Obs Mass (M + + H) : 370.1218
Pred Mass (M + + H): 370.1220
Formula (M): C 19 H 19 N 3 O 3 S
(1)3-ブロモ-4-フルオロベンゾニトリル5.32gをテトラヒドロフラン100mLに懸濁させ、トリイソプロポキシホウ酸10.0gを加え、窒素雰囲気下、-78℃まで冷却した。反応混合液に1.6Mのn-ブチルリチウム20.0mLを滴下させながらゆっくりと加え、-78℃にて1時間撹拌させた。その後、0℃まで昇温し、2.0M塩酸30mLを加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、3-(ジヒドロキシボラニル)-4-フルオロベンゾニトリルの粗体を得た。その後、ヘキサン50mL中でスラリー状態により1時間撹拌した後に、ろ過し、減圧乾燥することで、3-(ジヒドロキシボラニル)-4-フルオロベンゾニトリル3.98gを得た。
(2)3-(ジヒドロキシボラニル)-4-フルオロベンゾニトリル33.0mgに2-クロロピラジン34.4mg、炭酸カリウム55.3mg、塩化パラジウム-1,1’-ビス(ジフェニルホスフィノ)フェロセン8.2mgを加え、1,4-ジオキサン1.0mLと水0.2mLに懸濁させ、窒素雰囲気下、100℃で14時間加熱した。その後、反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、4-フルオロ-3-(ピラジン-2-イル)ベンゾニトリルの粗体を得た。
ESI/MS m/e:200.0(M++H,C11H7FN3)
(3)上記で得られた4-フルオロ-3-(ピラジン-2-イル)ベンゾニトリルに2-メチルプロパノール22.2mgおよびt-ブトキシカリウム33.7mgをジメチルホルムアミド1.0mLに懸濁させ、窒素雰囲気下、100℃で6時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、4-イソブトキシ-3-(ピラジン-2-イル)ベンゾニトリルの粗体を得た。
ESI/MS m/e:254.1(M++H,C15H16N3O)
(4)上記で得られた4-イソブトキシ-3-(ピラジン-2-イル)ベンゾニトリルを酢酸0.2mL、チオ酢酸0.5mLに懸濁させ、窒素雰囲気下、60℃で14時間加熱した。その後、減圧濃縮を行い、4-イソブトキシ-3-(ピラジン-2-イル)ベンゼン-1-カルボチオアミドの粗体を得た。
ESI/MS m/e:288.1(M++H,C15H18N3OS)
(5)上記で得られた4-イソブトキシ-3-(ピラジン-2-イル)ベンゼン-1-カルボチオアミドの粗体にエチル-2-クロロアセトアセテート74.0mgを加え、エタノール2mLに懸濁させ、窒素雰囲気下、70℃で5時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、エチル 4-メチル-2-[4-イソブトキシ-3-(ピラジン-2-イル)フェニル]-1,3-チアゾール-5-カルボキシレート20.2mgを得た。
ESI/MS m/e:298.1(M++H,C21H24N3O3S)
(6)上記で得られたエチル 4-メチル-2-[4-イソブトキシ-3-(ピラジン-2-イル)フェニル]-1,3-チアゾール-5-カルボキシレート20.2mgをテトラヒドロフラン/メタノール=1/1の混合溶液1mLに溶解し、2M水酸化ナトリウム水溶液0.2mLを加えて、50℃で4時間撹拌した。反応混合液に2M塩酸0.2mLを加え、水3mL、酢酸エチル4mLを加えて撹拌し、有機相を濃縮した後に常法により精製し、4-メチル-2-[4-イソブトキシ-3-(ピラジン-2-イル)フェニル]-1,3-チアゾール-5-カルボン酸6.4mgを得た。
1H-NMR(400MHz,DMSO d6)δ(ppm):0.96(6H,d,J=6.8Hz),2.03-2.10(1H,m),2.66(3H,s),3.97(2H,d,J=6.4Hz),7.32(1H,d,J=8.8Hz),8.03(1H,dd,J=2.4,8.4Hz),8.61(1H,d,J=2.4Hz),8.79(1H,t,J=2.4Hz),9.18(1H,d,J=1.6Hz)
HPLC保持時間:11.97分
Obs Mass(M++H):370.1218
Pred Mass(M++H):370.1220
Formula(M):C19H19N3O3S [Example 7] Synthesis of 4-methyl-2- [4-isobutoxy-3- (pyrazin-2-yl) phenyl] -1,3-thiazole-5-carboxylic acid (Compound No. 7 ) (1) 3- Bromo-4-fluorobenzonitrile (5.32 g) was suspended in tetrahydrofuran (100 mL), triisopropoxyboric acid (10.0 g) was added, and the mixture was cooled to -78 ° C under a nitrogen atmosphere. To the reaction mixture, 20.0 mL of 1.6 M n-butyllithium was slowly added dropwise and allowed to stir at -78 ° C. for 1 hour. Thereafter, the temperature was raised to 0 ° C., 30 mL of 2.0 M hydrochloric acid was added, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried and concentrated under reduced pressure to obtain a crude 3- (dihydroxyboranyl) -4-fluorobenzonitrile. Thereafter, the mixture was stirred in a slurry state in 50 mL of hexane for 1 hour, filtered, and dried under reduced pressure to obtain 3.98 g of 3- (dihydroxyboranyl) -4-fluorobenzonitrile.
(2) 3-3.0 mg of 3- (dihydroxyboranyl) -4-fluorobenzonitrile, 34.4 mg of 2-chloropyrazine, 55.3 mg of potassium carbonate, palladium chloride-1,1′-bis (diphenylphosphino) ferrocene 8 .2 mg was added, suspended in 1.0 mL of 1,4-dioxane and 0.2 mL of water, and heated at 100 ° C. for 14 hours under a nitrogen atmosphere. Thereafter, water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried and concentrated under reduced pressure to obtain a crude 4-fluoro-3- (pyrazin-2-yl) benzonitrile.
ESI / MS m / e: 200.0 (M + + H, C 11 H 7 FN 3 )
(3) In 2-fluoro-3- (pyrazin-2-yl) benzonitrile obtained above, 22.2 mg of 2-methylpropanol and 33.7 mg of potassium t-butoxy were suspended in 1.0 mL of dimethylformamide. The mixture was heated at 100 ° C. for 6 hours under a nitrogen atmosphere. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried and concentrated under reduced pressure to obtain a crude product of 4-isobutoxy-3- (pyrazin-2-yl) benzonitrile.
ESI / MS m / e: 254.1 (M + + H, C 15 H 16 N 3 O)
(4) The 4-isobutoxy-3- (pyrazin-2-yl) benzonitrile obtained above was suspended in 0.2 mL of acetic acid and 0.5 mL of thioacetic acid and heated at 60 ° C. for 14 hours under a nitrogen atmosphere. . Thereafter, concentration under reduced pressure was performed to obtain a crude product of 4-isobutoxy-3- (pyrazin-2-yl) benzene-1-carbothioamide.
ESI / MS m / e: 288.1 (M + + H, C 15 H 18 N 3 OS)
(5) Add 74.0 mg of ethyl-2-chloroacetoacetate to the crude 4-isobutoxy-3- (pyrazin-2-yl) benzene-1-carbothioamide obtained above and suspend in 2 mL of ethanol. The mixture was heated at 70 ° C. for 5 hours in a nitrogen atmosphere. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure, and the resulting crude product is separated and purified by silica gel column chromatography to obtain ethyl 4-methyl-2- [4-isobutoxy-3- (pyrazine- There was obtained 20.2 mg of 2-yl) phenyl] -1,3-thiazole-5-carboxylate.
ESI / MS m / e: 298.1 (M + + H, C 21 H 24 N 3 O 3 S)
(6) 20.2 mg of ethyl 4-methyl-2- [4-isobutoxy-3- (pyrazin-2-yl) phenyl] -1,3-thiazole-5-carboxylate obtained above was added to tetrahydrofuran / methanol = It melt | dissolved in 1 mL of 1/1 mixed solution, 0.2 mL of 2M sodium hydroxide aqueous solution was added, and it stirred at 50 degreeC for 4 hours. To the reaction mixture was added 0.2 mL of 2M hydrochloric acid, and 3 mL of water and 4 mL of ethyl acetate were added and stirred. The organic phase was concentrated and purified by a conventional method, and 4-methyl-2- [4-isobutoxy-3- ( 6.4 mg of pyrazin-2-yl) phenyl] -1,3-thiazole-5-carboxylic acid was obtained.
1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 0.96 (6H, d, J = 6.8 Hz), 2.03-2.10 (1H, m), 2.66 (3H, s), 3.97 (2H, d, J = 6.4 Hz), 7.32 (1H, d, J = 8.8 Hz), 8.03 (1H, dd, J = 2.4, 8.4 Hz) ), 8.61 (1H, d, J = 2.4 Hz), 8.79 (1H, t, J = 2.4 Hz), 9.18 (1H, d, J = 1.6 Hz)
HPLC retention time: 11.97 minutes Obs Mass (M + + H) : 370.1218
Pred Mass (M + + H): 370.1220
Formula (M): C 19 H 19 N 3 O 3 S
[実施例8-17]
実施例7と同様にして、化合物番号8~17を合成した。 [Example 8-17]
In the same manner as in Example 7, compound numbers 8 to 17 were synthesized.
実施例7と同様にして、化合物番号8~17を合成した。 [Example 8-17]
In the same manner as in Example 7, compound numbers 8 to 17 were synthesized.
[実施例18]4-メチル-2-[4-イソブトキシ-3-イソチアゾール-4-イルーフェニル]-1,3-チアゾール-5-カルボン酸(化合物番号18)の合成(合成法B)
(1)2-メチルプロパノール2.8mLをトルエン25mLに懸濁させ、0℃に冷却させた後に窒素雰囲気下、t-ブトキシカリウム3.63gを加え、0℃で30分間撹拌させた。その後に3-ブロモ-4-フルオロベンゾニトリル5.0gを加えて、0℃で2時間撹拌した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、3-ブロモ-4-イソブトキシベンゾニトリルの粗体を得た。
(2)上記で得られた3-ブロモ-4-イソブトキシベンゾニトリルの粗体を酢酸5.0mL、チオ酢酸10.0mLに懸濁させ、窒素雰囲気下、80℃で14時間加熱した。その後、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、3-ブロモ-4-イソブトキシベンゼン-1-カルボチオアミド6.21gを得た。
(3)上記で得られた3-ブロモ-4-イソブトキシベンゼン-1-カルボチオアミド6.21gをエタノール42mLに懸濁させ、t-ブチル-2-クロロアセトアセテート4.27gを加え、窒素雰囲気下、80℃で5時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、t-ブチル 2-[3-ブロモ-4-イソブトキシフェニル]4-メチル-1,3-チアゾール-5-カルボキシレート7.73gを得た。
(4)t-ブチル 2-[3-ブロモ-4-イソブトキシフェニル]4-メチル-1,3-チアゾール-5-カルボキシレート843mgをテトラヒドロフラン10mLに懸濁させ、トリイソプロポキシホウ酸745mgを加え、窒素雰囲気下、-78℃まで冷却した。反応混合液に1.59Mのn-ブチルリチウム1.50mLを滴下させながらゆっくりと加え、-78℃にて1時間撹拌させた。その後、0℃まで昇温し、2.0M塩酸1.5mLを加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、t-ブチル 2-[3-(ジヒドロキシボラニル)-4-イソブトキシフェニル]4-メチル-1,3-チアゾール-5-カルボキシレートを得た。
(5)t-ブチル 2-[3-(ジヒドロキシボラニル)-4-イソブトキシフェニル]4-メチル-1,3-チアゾール-5-カルボキシレート80.0mgに4-ブロモ-イソチアゾール37mg、リン酸カリウム86mg、塩化パラジウム-1,1’-ビス(ジフェニルホスフィノ)フェロセン15mgを加え、1,4-ジオキサン1.0mLと水0.2mLに懸濁させ、窒素雰囲気下、100℃で14時間加熱した。その後、反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、t-ブチル 4-メチル-2-[4-イソブトキシ-3-イソチアゾール-4-イル-フェニル]-1,3-チアゾール-5-カルボキシレートの粗体を得た。
(6)上記で得られたt-ブチル 4-メチル-2-[4-イソブトキシ-3-イソチアゾール-4-イル-フェニル]-1,3-チアゾール-5-カルボキシレートの粗体を塩化メチレン1mLに溶解し、トリフルオロ酢酸1.0mLを加えて、室温で16時間撹拌した。反応混合液を濃縮した後に常法により精製し、4-メチル-2-[4-イソブトキシ-3-イソチアゾール-4-イル-フェニル]-1,3-チアゾール-5-カルボン酸37.2mgを得た。
1H-NMR(400MHz,DMSO d6)δ(ppm):0.93(6H,d,J=6.4Hz),2.01-2.08(1H,m),2.62(3H,s),3.89(2H,d,J=6.4Hz),7.23(1H,d,J=8.8Hz),7.91(1H,dd,J=2.4,8.8Hz),8.07(1H,d,J=2.8Hz),8.94(1H,s),9.30(1H,s)
HPLC保持時間:13.07分
Obs Mass(M++H):375.0823
Pred Mass(M++H):375.0832
Formula(M):C18H18N2O3S2 [Example 18] Synthesis of 4-methyl-2- [4-isobutoxy-3-isothiazol-4-yl-phenyl] -1,3-thiazole-5-carboxylic acid (Compound No. 18 ) (Synthesis Method B)
(1) 2.8 mL of 2-methylpropanol was suspended in 25 mL of toluene, cooled to 0 ° C., added with 3.63 g of potassium t-butoxy under a nitrogen atmosphere, and stirred at 0 ° C. for 30 minutes. Thereafter, 5.0 g of 3-bromo-4-fluorobenzonitrile was added, and the mixture was stirred at 0 ° C. for 2 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried and concentrated under reduced pressure to obtain a crude product of 3-bromo-4-isobutoxybenzonitrile.
(2) The crude 3-bromo-4-isobutoxybenzonitrile obtained above was suspended in 5.0 mL of acetic acid and 10.0 mL of thioacetic acid, and heated at 80 ° C. for 14 hours in a nitrogen atmosphere. Thereafter, concentration under reduced pressure was performed, and the resulting crude product was separated and purified by silica gel column chromatography to obtain 6.21 g of 3-bromo-4-isobutoxybenzene-1-carbothioamide.
(3) Suspend 6.21 g of 3-bromo-4-isobutoxybenzene-1-carbothioamide obtained above in 42 mL of ethanol, add 4.27 g of t-butyl-2-chloroacetoacetate, and add nitrogen atmosphere. Under heating at 80 ° C. for 5 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure, and the resulting crude product is separated and purified by silica gel column chromatography to give t-butyl 2- [3-bromo-4-isobutoxyphenyl] 4. There was obtained 7.73 g of methyl-1,3-thiazole-5-carboxylate.
(4) 843 mg of t-butyl 2- [3-bromo-4-isobutoxyphenyl] 4-methyl-1,3-thiazole-5-carboxylate is suspended in 10 mL of tetrahydrofuran, and 745 mg of triisopropoxyboric acid is added. And cooled to −78 ° C. under a nitrogen atmosphere. To the reaction mixture, 1.50 mL of 1.59 M n-butyllithium was slowly added dropwise, and the mixture was stirred at −78 ° C. for 1 hour. Thereafter, the temperature was raised to 0 ° C., 1.5 mL of 2.0 M hydrochloric acid was added, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure, and the resulting crude product is separated and purified by silica gel column chromatography to obtain t-butyl 2- [3- (dihydroxyboranyl) -4-iso Butoxyphenyl] 4-methyl-1,3-thiazole-5-carboxylate was obtained.
(5) t-butyl 2- [3- (dihydroxyboranyl) -4-isobutoxyphenyl] 4-methyl-1,3-thiazole-5-carboxylate 80.0 mg to 4-bromo-isothiazole 37 mg, phosphorus 86 mg of potassium acid and 15 mg of palladium chloride-1,1′-bis (diphenylphosphino) ferrocene were added and suspended in 1.0 mL of 1,4-dioxane and 0.2 mL of water, and at 100 ° C. for 14 hours under nitrogen atmosphere Heated. Thereafter, water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure to give t-butyl 4-methyl-2- [4-isobutoxy-3-isothiazol-4-yl-phenyl] -1,3-thiazole-5 A crude carboxylate was obtained.
(6) The crude product of t-butyl 4-methyl-2- [4-isobutoxy-3-isothiazol-4-yl-phenyl] -1,3-thiazole-5-carboxylate obtained above is converted into methylene chloride. It melt | dissolved in 1 mL, 1.0 mL of trifluoroacetic acid was added, and it stirred at room temperature for 16 hours. The reaction mixture was concentrated and purified by a conventional method, and 37.2 mg of 4-methyl-2- [4-isobutoxy-3-isothiazol-4-yl-phenyl] -1,3-thiazole-5-carboxylic acid was obtained. Obtained.
1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 0.93 (6H, d, J = 6.4 Hz), 2.01 to 2.08 (1H, m), 2.62 (3H, s), 3.89 (2H, d, J = 6.4 Hz), 7.23 (1H, d, J = 8.8 Hz), 7.91 (1H, dd, J = 2.4, 8.8 Hz) ), 8.07 (1H, d, J = 2.8 Hz), 8.94 (1H, s), 9.30 (1H, s)
HPLC retention time: 13.07 minutes Obs Mass (M + + H) : 375.0823
Pred Mass (M + + H): 375.0832
Formula (M): C 18 H 18 N 2 O 3 S 2
(1)2-メチルプロパノール2.8mLをトルエン25mLに懸濁させ、0℃に冷却させた後に窒素雰囲気下、t-ブトキシカリウム3.63gを加え、0℃で30分間撹拌させた。その後に3-ブロモ-4-フルオロベンゾニトリル5.0gを加えて、0℃で2時間撹拌した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、3-ブロモ-4-イソブトキシベンゾニトリルの粗体を得た。
(2)上記で得られた3-ブロモ-4-イソブトキシベンゾニトリルの粗体を酢酸5.0mL、チオ酢酸10.0mLに懸濁させ、窒素雰囲気下、80℃で14時間加熱した。その後、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、3-ブロモ-4-イソブトキシベンゼン-1-カルボチオアミド6.21gを得た。
(3)上記で得られた3-ブロモ-4-イソブトキシベンゼン-1-カルボチオアミド6.21gをエタノール42mLに懸濁させ、t-ブチル-2-クロロアセトアセテート4.27gを加え、窒素雰囲気下、80℃で5時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、t-ブチル 2-[3-ブロモ-4-イソブトキシフェニル]4-メチル-1,3-チアゾール-5-カルボキシレート7.73gを得た。
(4)t-ブチル 2-[3-ブロモ-4-イソブトキシフェニル]4-メチル-1,3-チアゾール-5-カルボキシレート843mgをテトラヒドロフラン10mLに懸濁させ、トリイソプロポキシホウ酸745mgを加え、窒素雰囲気下、-78℃まで冷却した。反応混合液に1.59Mのn-ブチルリチウム1.50mLを滴下させながらゆっくりと加え、-78℃にて1時間撹拌させた。その後、0℃まで昇温し、2.0M塩酸1.5mLを加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、t-ブチル 2-[3-(ジヒドロキシボラニル)-4-イソブトキシフェニル]4-メチル-1,3-チアゾール-5-カルボキシレートを得た。
(5)t-ブチル 2-[3-(ジヒドロキシボラニル)-4-イソブトキシフェニル]4-メチル-1,3-チアゾール-5-カルボキシレート80.0mgに4-ブロモ-イソチアゾール37mg、リン酸カリウム86mg、塩化パラジウム-1,1’-ビス(ジフェニルホスフィノ)フェロセン15mgを加え、1,4-ジオキサン1.0mLと水0.2mLに懸濁させ、窒素雰囲気下、100℃で14時間加熱した。その後、反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、t-ブチル 4-メチル-2-[4-イソブトキシ-3-イソチアゾール-4-イル-フェニル]-1,3-チアゾール-5-カルボキシレートの粗体を得た。
(6)上記で得られたt-ブチル 4-メチル-2-[4-イソブトキシ-3-イソチアゾール-4-イル-フェニル]-1,3-チアゾール-5-カルボキシレートの粗体を塩化メチレン1mLに溶解し、トリフルオロ酢酸1.0mLを加えて、室温で16時間撹拌した。反応混合液を濃縮した後に常法により精製し、4-メチル-2-[4-イソブトキシ-3-イソチアゾール-4-イル-フェニル]-1,3-チアゾール-5-カルボン酸37.2mgを得た。
1H-NMR(400MHz,DMSO d6)δ(ppm):0.93(6H,d,J=6.4Hz),2.01-2.08(1H,m),2.62(3H,s),3.89(2H,d,J=6.4Hz),7.23(1H,d,J=8.8Hz),7.91(1H,dd,J=2.4,8.8Hz),8.07(1H,d,J=2.8Hz),8.94(1H,s),9.30(1H,s)
HPLC保持時間:13.07分
Obs Mass(M++H):375.0823
Pred Mass(M++H):375.0832
Formula(M):C18H18N2O3S2 [Example 18] Synthesis of 4-methyl-2- [4-isobutoxy-3-isothiazol-4-yl-phenyl] -1,3-thiazole-5-carboxylic acid (Compound No. 18 ) (Synthesis Method B)
(1) 2.8 mL of 2-methylpropanol was suspended in 25 mL of toluene, cooled to 0 ° C., added with 3.63 g of potassium t-butoxy under a nitrogen atmosphere, and stirred at 0 ° C. for 30 minutes. Thereafter, 5.0 g of 3-bromo-4-fluorobenzonitrile was added, and the mixture was stirred at 0 ° C. for 2 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried and concentrated under reduced pressure to obtain a crude product of 3-bromo-4-isobutoxybenzonitrile.
(2) The crude 3-bromo-4-isobutoxybenzonitrile obtained above was suspended in 5.0 mL of acetic acid and 10.0 mL of thioacetic acid, and heated at 80 ° C. for 14 hours in a nitrogen atmosphere. Thereafter, concentration under reduced pressure was performed, and the resulting crude product was separated and purified by silica gel column chromatography to obtain 6.21 g of 3-bromo-4-isobutoxybenzene-1-carbothioamide.
(3) Suspend 6.21 g of 3-bromo-4-isobutoxybenzene-1-carbothioamide obtained above in 42 mL of ethanol, add 4.27 g of t-butyl-2-chloroacetoacetate, and add nitrogen atmosphere. Under heating at 80 ° C. for 5 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure, and the resulting crude product is separated and purified by silica gel column chromatography to give t-butyl 2- [3-bromo-4-isobutoxyphenyl] 4. There was obtained 7.73 g of methyl-1,3-thiazole-5-carboxylate.
(4) 843 mg of t-butyl 2- [3-bromo-4-isobutoxyphenyl] 4-methyl-1,3-thiazole-5-carboxylate is suspended in 10 mL of tetrahydrofuran, and 745 mg of triisopropoxyboric acid is added. And cooled to −78 ° C. under a nitrogen atmosphere. To the reaction mixture, 1.50 mL of 1.59 M n-butyllithium was slowly added dropwise, and the mixture was stirred at −78 ° C. for 1 hour. Thereafter, the temperature was raised to 0 ° C., 1.5 mL of 2.0 M hydrochloric acid was added, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure, and the resulting crude product is separated and purified by silica gel column chromatography to obtain t-butyl 2- [3- (dihydroxyboranyl) -4-iso Butoxyphenyl] 4-methyl-1,3-thiazole-5-carboxylate was obtained.
(5) t-butyl 2- [3- (dihydroxyboranyl) -4-isobutoxyphenyl] 4-methyl-1,3-thiazole-5-carboxylate 80.0 mg to 4-bromo-isothiazole 37 mg, phosphorus 86 mg of potassium acid and 15 mg of palladium chloride-1,1′-bis (diphenylphosphino) ferrocene were added and suspended in 1.0 mL of 1,4-dioxane and 0.2 mL of water, and at 100 ° C. for 14 hours under nitrogen atmosphere Heated. Thereafter, water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure to give t-butyl 4-methyl-2- [4-isobutoxy-3-isothiazol-4-yl-phenyl] -1,3-thiazole-5 A crude carboxylate was obtained.
(6) The crude product of t-butyl 4-methyl-2- [4-isobutoxy-3-isothiazol-4-yl-phenyl] -1,3-thiazole-5-carboxylate obtained above is converted into methylene chloride. It melt | dissolved in 1 mL, 1.0 mL of trifluoroacetic acid was added, and it stirred at room temperature for 16 hours. The reaction mixture was concentrated and purified by a conventional method, and 37.2 mg of 4-methyl-2- [4-isobutoxy-3-isothiazol-4-yl-phenyl] -1,3-thiazole-5-carboxylic acid was obtained. Obtained.
1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 0.93 (6H, d, J = 6.4 Hz), 2.01 to 2.08 (1H, m), 2.62 (3H, s), 3.89 (2H, d, J = 6.4 Hz), 7.23 (1H, d, J = 8.8 Hz), 7.91 (1H, dd, J = 2.4, 8.8 Hz) ), 8.07 (1H, d, J = 2.8 Hz), 8.94 (1H, s), 9.30 (1H, s)
HPLC retention time: 13.07 minutes Obs Mass (M + + H) : 375.0823
Pred Mass (M + + H): 375.0832
Formula (M): C 18 H 18 N 2 O 3 S 2
[実施例19-29]
実施例18と同様にして、化合物番号19-29を合成した。 [Examples 19-29]
Compound Nos. 19 to 29 were synthesized in the same manner as Example 18.
実施例18と同様にして、化合物番号19-29を合成した。 [Examples 19-29]
Compound Nos. 19 to 29 were synthesized in the same manner as Example 18.
[実施例30-54]
実施例7と同様にして、化合物番号30-54を合成した。 [Examples 30-54]
Compound Nos. 30 to 54 were synthesized in the same manner as Example 7.
実施例7と同様にして、化合物番号30-54を合成した。 [Examples 30-54]
Compound Nos. 30 to 54 were synthesized in the same manner as Example 7.
[実施例55-66]
実施例18と同様にして、化合物番号55-66を合成した。 [Examples 55-66]
In the same manner as in Example 18, compound numbers 55 to 66 were synthesized.
実施例18と同様にして、化合物番号55-66を合成した。 [Examples 55-66]
In the same manner as in Example 18, compound numbers 55 to 66 were synthesized.
[実施例67]4-メチル-2-(4-イソブトキシ-3-オキサゾール-5-イル-フェニル)-1,3-チアゾール-5-カルボン酸(化合物番号67)の合成(合成法C)
(1)エチル 2-[3-ホルミル-4-イソブトキシフェニル]-4-メチル-1,3-チアゾール-5-カルボキシレート319.6mg、p-トルエンスルホニルメチルイソシアニド233.5mgおよび炭酸カリウム165.3mgをエタノール3.0mLに懸濁させ、窒素雰囲気下、80℃で4時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、エチル 2-[4-イソブトキシ-3-オキサゾール-5-イル-フェニル]-4-メチル-1,3-チアゾール-5-カルボキシレート98.7mgを得た。
(2)上記で得られたエチル 2-[4-イソブトキシ-3-オキサゾール-5-イル-フェニル]-4-メチル-1,3-チアゾール-5-カルボキシレート98.7mgをテトラヒドロフラン/メタノール=1/1の混合溶液3.0mLに溶解し、2M水酸化ナトリウム水溶液0.5mLを加えて、室温で6時間撹拌した。反応混合液に2M塩酸0.5mLを加え、減圧濃縮した後に常法により精製した。水50mLおよびヘキサン/酢酸エチル=1/2混合溶媒50mLで洗浄後、減圧下乾燥させることで4-メチル-2-(4-イソブトキシ-3-オキサゾール-5-イル-フェニル)-1,3-チアゾール-5-カルボン酸35.2mgを得た。
1H-NMR(400MHz,DMSO d6)δ(ppm):1.05(6H,d,J=6.8Hz),2.20(1H,septet,J=8.0Hz),2.67(3H,s),4.02(2H,d,J=6.0Hz),7.30(1H,d,J=8.8Hz),7.58(1H,s),7.93(1H,dd,J=8.8,2.2Hz),8.31(1H,d,J=2.2Hz),8.52(1H,s)
HPLC保持時間:12.23分
Obs Mass(M++H):359.1075
Pred Mass(M++H):359.1060
Formula(M):C18H18N2O4S Example 67 Synthesis of 4-methyl-2- (4-isobutoxy-3-oxazol-5-yl-phenyl) -1,3-thiazole-5-carboxylic acid (Compound No. 67 ) (Synthesis Method C)
(1) Ethyl 2- [3-formyl-4-isobutoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylate 319.6 mg, p-toluenesulfonylmethyl isocyanide 233.5 mg and potassium carbonate 165. 3 mg was suspended in 3.0 mL of ethanol and heated at 80 ° C. for 4 hours under a nitrogen atmosphere. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure, and the resulting crude product is separated and purified by silica gel column chromatography to give ethyl 2- [4-isobutoxy-3-oxazol-5-yl-phenyl]. ] 98.7 mg of 4-methyl-1,3-thiazole-5-carboxylate was obtained.
(2) 98.7 mg of ethyl 2- [4-isobutoxy-3-oxazol-5-yl-phenyl] -4-methyl-1,3-thiazole-5-carboxylate obtained above was added to tetrahydrofuran / methanol = 1. 1 was dissolved in 3.0 mL of a mixed solution, 0.5 mL of 2M aqueous sodium hydroxide solution was added, and the mixture was stirred at room temperature for 6 hours. To the reaction mixture was added 0.5 mL of 2M hydrochloric acid, and the mixture was concentrated under reduced pressure and purified by a conventional method. After washing with 50 mL of water and 50 mL of hexane / ethyl acetate = 1/2 mixed solvent, it was dried under reduced pressure to give 4-methyl-2- (4-isobutoxy-3-oxazol-5-yl-phenyl) -1,3- 35.2 mg of thiazole-5-carboxylic acid was obtained.
1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 1.05 (6H, d, J = 6.8 Hz), 2.20 (1H, septet, J = 8.0 Hz), 2.67 ( 3H, s), 4.02 (2H, d, J = 6.0 Hz), 7.30 (1H, d, J = 8.8 Hz), 7.58 (1H, s), 7.93 (1H, dd, J = 8.8, 2.2 Hz), 8.31 (1H, d, J = 2.2 Hz), 8.52 (1H, s)
HPLC retention time: 12.23 minutes Obs Mass (M + + H) : 359.1075
Pred Mass (M + + H): 359.1060
Formula (M): C 18 H 18 N 2 O 4 S
(1)エチル 2-[3-ホルミル-4-イソブトキシフェニル]-4-メチル-1,3-チアゾール-5-カルボキシレート319.6mg、p-トルエンスルホニルメチルイソシアニド233.5mgおよび炭酸カリウム165.3mgをエタノール3.0mLに懸濁させ、窒素雰囲気下、80℃で4時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、エチル 2-[4-イソブトキシ-3-オキサゾール-5-イル-フェニル]-4-メチル-1,3-チアゾール-5-カルボキシレート98.7mgを得た。
(2)上記で得られたエチル 2-[4-イソブトキシ-3-オキサゾール-5-イル-フェニル]-4-メチル-1,3-チアゾール-5-カルボキシレート98.7mgをテトラヒドロフラン/メタノール=1/1の混合溶液3.0mLに溶解し、2M水酸化ナトリウム水溶液0.5mLを加えて、室温で6時間撹拌した。反応混合液に2M塩酸0.5mLを加え、減圧濃縮した後に常法により精製した。水50mLおよびヘキサン/酢酸エチル=1/2混合溶媒50mLで洗浄後、減圧下乾燥させることで4-メチル-2-(4-イソブトキシ-3-オキサゾール-5-イル-フェニル)-1,3-チアゾール-5-カルボン酸35.2mgを得た。
1H-NMR(400MHz,DMSO d6)δ(ppm):1.05(6H,d,J=6.8Hz),2.20(1H,septet,J=8.0Hz),2.67(3H,s),4.02(2H,d,J=6.0Hz),7.30(1H,d,J=8.8Hz),7.58(1H,s),7.93(1H,dd,J=8.8,2.2Hz),8.31(1H,d,J=2.2Hz),8.52(1H,s)
HPLC保持時間:12.23分
Obs Mass(M++H):359.1075
Pred Mass(M++H):359.1060
Formula(M):C18H18N2O4S Example 67 Synthesis of 4-methyl-2- (4-isobutoxy-3-oxazol-5-yl-phenyl) -1,3-thiazole-5-carboxylic acid (Compound No. 67 ) (Synthesis Method C)
(1) Ethyl 2- [3-formyl-4-isobutoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylate 319.6 mg, p-toluenesulfonylmethyl isocyanide 233.5 mg and potassium carbonate 165. 3 mg was suspended in 3.0 mL of ethanol and heated at 80 ° C. for 4 hours under a nitrogen atmosphere. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure, and the resulting crude product is separated and purified by silica gel column chromatography to give ethyl 2- [4-isobutoxy-3-oxazol-5-yl-phenyl]. ] 98.7 mg of 4-methyl-1,3-thiazole-5-carboxylate was obtained.
(2) 98.7 mg of ethyl 2- [4-isobutoxy-3-oxazol-5-yl-phenyl] -4-methyl-1,3-thiazole-5-carboxylate obtained above was added to tetrahydrofuran / methanol = 1. 1 was dissolved in 3.0 mL of a mixed solution, 0.5 mL of 2M aqueous sodium hydroxide solution was added, and the mixture was stirred at room temperature for 6 hours. To the reaction mixture was added 0.5 mL of 2M hydrochloric acid, and the mixture was concentrated under reduced pressure and purified by a conventional method. After washing with 50 mL of water and 50 mL of hexane / ethyl acetate = 1/2 mixed solvent, it was dried under reduced pressure to give 4-methyl-2- (4-isobutoxy-3-oxazol-5-yl-phenyl) -1,3- 35.2 mg of thiazole-5-carboxylic acid was obtained.
1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 1.05 (6H, d, J = 6.8 Hz), 2.20 (1H, septet, J = 8.0 Hz), 2.67 ( 3H, s), 4.02 (2H, d, J = 6.0 Hz), 7.30 (1H, d, J = 8.8 Hz), 7.58 (1H, s), 7.93 (1H, dd, J = 8.8, 2.2 Hz), 8.31 (1H, d, J = 2.2 Hz), 8.52 (1H, s)
HPLC retention time: 12.23 minutes Obs Mass (M + + H) : 359.1075
Pred Mass (M + + H): 359.1060
Formula (M): C 18 H 18 N 2 O 4 S
[実施例68]
実施例67と同様にして、化合物番号68を合成した。 [Example 68]
Compound No. 68 was synthesized in the same manner as Example 67.
実施例67と同様にして、化合物番号68を合成した。 [Example 68]
Compound No. 68 was synthesized in the same manner as Example 67.
[実施例69]2-[4-(シクロブチルメトキシ)-3-オキサゾール-5-イル-フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸(化合物番号69)の合成(合成法C)
(1)5-ブロモサリシルアルデヒド10.5gと炭酸カリウム9.0gをジメチルホルムアミド100.0mLに懸濁させ、窒素雰囲気下、0℃で30分撹拌した。反応混合液にメトキシメチルクロリド5.6gをゆっくりと加え、室温で24時間撹拌した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行うことで5-ブロモ-2-(メトキシメトキシ)ベンズアルデヒドの粗体を得た。
(2)上記で得られた5-ブロモ-2-(メトキシメトキシ)ベンズアルデヒドに炭酸水素化カリウム1.05g、酢酸パラジウム(II)561mg、臭化銅(I)4.1gを加え、トルエン100mLに懸濁させた。その後にエチル 4-メチル-1,3-チアゾール-5-カルボキシレート9.4g、イソ酪酸881mg及びジ-t-ブチルシクロヘキシルホスフィン1.4gを加えて、窒素雰囲気下、130℃で15時間加熱した。反応混合液をセライトろ過して不溶物を取り除き、ろ液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮した後に常法により精製し、エチル 2-[3-ホルミル-4-(メトキシメトキシ)フェニル]-1,3-チアゾール-5-カルボキシレート1.34gを得た。
(3)上記で得たエチル 2-[3-ホルミル-4-(メトキシメトキシ)フェニル]-1,3-チアゾール-5-カルボキシレート1.24gにp-トルエンスルホニルメチルイソシアニド10.8g、炭酸カリウム7.7gを加え、エタノール100.0mLに懸濁させ、窒素雰囲気下、80℃で15時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、エチル 2-[4-(メトキシメトキシ)-3-オキサゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボキシレート6.2gを得た。
(4)上記で得られたエチル 2-[4-(メトキシメトキシ)-3-オキサゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボキシレート6.2gをテトラヒドロフラン/メタノール=1/1の混合溶液80.0mLに溶解し、6M塩酸22mLをゆっくりと加え、50℃で15時間撹拌した。減圧濃縮して溶媒を除去し、ヘキサン/酢酸エチル=2/1の混合溶液100mLを加え、80℃で1時間撹拌した。溶液を室温まで下げたのち、固体をろ取し、飽和炭酸水素ナトリウム水溶液100ml、水100mL、ヘキサン/酢酸エチル=2/1の混合溶液100mLで洗浄し、乾燥させることでエチル 2-(4-ヒドロキシ-3-オキサゾール-5-イル-フェニル)-4-メチル-1,3-チアゾール-5-カルボキシレート4.9gを得た。
1H-NMR(400MHz,CDCl3)δ(ppm):1.30(3H,t,J=7.3Hz),2.68(3H,s),4.28(3H,q,J=7.3Hz),7.09(1H,d,J=8.8Hz),7.61(1H,s),7.83(1H,dd,J=8.8,2.0Hz),8.27(1H,,s),8.46(1H,s),
11.31(1H,brs)
(5)トリフェニルホスフィン52.5mgをテトラヒドロフラン500uLに溶解させ、シクロブチルメタノール17.2mg、ジエチルアゾジカルボキシレート40.4mgを加え、窒素雰囲気化、室温で30分撹拌した。反応混合液にエチル 2-(4-ヒドロキシ-3-オキサゾール-5-イル-フェニル)-4-メチル-1,3-チアゾール-5-カルボキシレート33.0mgを加え、室温で12時間撹拌した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行うことでエチル 2-[4-(シクロブチルメトキシ)-3-オキサゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートの粗体を得た。
(6)上記で得られたエチル 2-[4-(シクロブチルメトキシ)-3-オキサゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートの粗体をテトラヒドロフラン/メタノール=1/1の混合溶液1.0mLに溶解し、2M水酸化ナトリウム水溶液250uLを加えて、室温で6時間撹拌した。反応混合液に2M塩酸250uLを加え、減圧濃縮した後に常法により精製することで2-[4-(シクロブチルメトキシ)-3-オキサゾール-5-イル-フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸21.0mgを得た。
1H-NMR(400MHz,DMSO d6)δ(ppm):1.87-2.02(4H,m),2.11-2.16(2H,m),2.67(3H,s),2.89(1H,m),4.21(2H,d,J=6.8Hz),7.29(1H,d,J=8.8Hz),7.51(1H,s),7.93(1H,dd,J=8.8,2.4Hz),8.30(1H,d,J=2.4Hz),8.50(1H,s),13.32(1H,s)
HPLC保持時間:12.66分
Obs Mass(M++H):371.1052
Pred Mass(M++H):371.1060
Formula(M):C19H18N2O4S Example 69 Synthesis of 2- [4- (cyclobutylmethoxy) -3-oxazol-5-yl-phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid (Compound No. 69 ) (Synthesis) Law C)
(1) 10.5 g of 5-bromosalicylaldehyde and 9.0 g of potassium carbonate were suspended in 100.0 mL of dimethylformamide and stirred at 0 ° C. for 30 minutes in a nitrogen atmosphere. To the reaction mixture, 5.6 g of methoxymethyl chloride was slowly added and stirred at room temperature for 24 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried and concentrated under reduced pressure to obtain a crude product of 5-bromo-2- (methoxymethoxy) benzaldehyde.
(2) To the 5-bromo-2- (methoxymethoxy) benzaldehyde obtained above, 1.05 g of potassium bicarbonate, 561 mg of palladium (II) acetate and 4.1 g of copper (I) bromide were added, and 100 mL of toluene was added. Suspended. Thereafter, 9.4 g of ethyl 4-methyl-1,3-thiazole-5-carboxylate, 881 mg of isobutyric acid and 1.4 g of di-t-butylcyclohexylphosphine were added and heated at 130 ° C. for 15 hours under a nitrogen atmosphere. . The reaction mixture was filtered through Celite to remove insolubles, water was added to the filtrate, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried, concentrated under reduced pressure, and purified by a conventional method to obtain ethyl 2- [3-formyl-4- (methoxymethoxy) phenyl] -1,3-thiazole-5-carboxylate. 34 g was obtained.
(3) 1.24 g of ethyl 2- [3-formyl-4- (methoxymethoxy) phenyl] -1,3-thiazole-5-carboxylate obtained above, 10.8 g of p-toluenesulfonylmethyl isocyanide, potassium carbonate 7.7 g was added, suspended in 100.0 mL of ethanol, and heated at 80 ° C. for 15 hours under a nitrogen atmosphere. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure, and the resulting crude product is separated and purified by silica gel column chromatography to give ethyl 2- [4- (methoxymethoxy) -3-oxazole-5- Yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylate (6.2 g).
(4) 6.2 g of ethyl 2- [4- (methoxymethoxy) -3-oxazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylate obtained above was added to tetrahydrofuran / It melt | dissolved in the mixed solution 80.0mL of methanol = 1/1, 22 mL of 6M hydrochloric acid was added slowly, and it stirred at 50 degreeC for 15 hours. The solvent was removed by concentration under reduced pressure, 100 mL of a mixed solution of hexane / ethyl acetate = 2/1 was added, and the mixture was stirred at 80 ° C. for 1 hour. After the solution is cooled to room temperature, the solid is collected by filtration, washed with 100 ml of a saturated aqueous sodium hydrogen carbonate solution, 100 mL of water, and 100 mL of a mixed solution of hexane / ethyl acetate = 2/1, and dried to give ethyl 2- (4- There were obtained 4.9 g of hydroxy-3-oxazol-5-yl-phenyl) -4-methyl-1,3-thiazole-5-carboxylate.
1 H-NMR (400 MHz, CDCl 3 ) δ (ppm): 1.30 (3H, t, J = 7.3 Hz), 2.68 (3H, s), 4.28 (3H, q, J = 7) .3 Hz), 7.09 (1H, d, J = 8.8 Hz), 7.61 (1H, s), 7.83 (1H, dd, J = 8.8, 2.0 Hz), 8.27 (1H, s), 8.46 (1H, s),
11.31 (1H, brs)
(5) 52.5 mg of triphenylphosphine was dissolved in 500 uL of tetrahydrofuran, 17.2 mg of cyclobutylmethanol and 40.4 mg of diethyl azodicarboxylate were added, and the mixture was stirred in a nitrogen atmosphere at room temperature for 30 minutes. Ethyl 2- (4-hydroxy-3-oxazol-5-yl-phenyl) -4-methyl-1,3-thiazole-5-carboxylate (33.0 mg) was added to the reaction mixture, and the mixture was stirred at room temperature for 12 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure to give ethyl 2- [4- (cyclobutylmethoxy) -3-oxazol-5-yl) phenyl] -4-methyl-1,3-thiazole- A crude product of 5-carboxylate was obtained.
(6) The crude product of ethyl 2- [4- (cyclobutylmethoxy) -3-oxazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylate obtained above was added to tetrahydrofuran. Dissolved in 1.0 mL of a mixed solution of / methanol = 1/1, 250 uL of 2M aqueous sodium hydroxide solution was added, and the mixture was stirred at room temperature for 6 hours. 2- [4- (cyclobutylmethoxy) -3-oxazol-5-yl-phenyl] -4-methyl-1,3 was added to the reaction mixture by adding 250 uL of 2M hydrochloric acid, concentrating under reduced pressure, and purifying by a conventional method. -21.0 mg of thiazole-5-carboxylic acid was obtained.
1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 1.87-2.02 (4H, m), 2.11-2.16 (2H, m), 2.67 (3H, s) 2.89 (1H, m), 4.21 (2H, d, J = 6.8 Hz), 7.29 (1H, d, J = 8.8 Hz), 7.51 (1H, s), 7 .93 (1H, dd, J = 8.8, 2.4 Hz), 8.30 (1H, d, J = 2.4 Hz), 8.50 (1H, s), 13.32 (1H, s)
HPLC retention time: 12.66 minutes Obs Mass (M + + H): 371.1052
Pred Mass (M + + H): 371.1060
Formula (M): C 19 H 18 N 2 O 4 S
(1)5-ブロモサリシルアルデヒド10.5gと炭酸カリウム9.0gをジメチルホルムアミド100.0mLに懸濁させ、窒素雰囲気下、0℃で30分撹拌した。反応混合液にメトキシメチルクロリド5.6gをゆっくりと加え、室温で24時間撹拌した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行うことで5-ブロモ-2-(メトキシメトキシ)ベンズアルデヒドの粗体を得た。
(2)上記で得られた5-ブロモ-2-(メトキシメトキシ)ベンズアルデヒドに炭酸水素化カリウム1.05g、酢酸パラジウム(II)561mg、臭化銅(I)4.1gを加え、トルエン100mLに懸濁させた。その後にエチル 4-メチル-1,3-チアゾール-5-カルボキシレート9.4g、イソ酪酸881mg及びジ-t-ブチルシクロヘキシルホスフィン1.4gを加えて、窒素雰囲気下、130℃で15時間加熱した。反応混合液をセライトろ過して不溶物を取り除き、ろ液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮した後に常法により精製し、エチル 2-[3-ホルミル-4-(メトキシメトキシ)フェニル]-1,3-チアゾール-5-カルボキシレート1.34gを得た。
(3)上記で得たエチル 2-[3-ホルミル-4-(メトキシメトキシ)フェニル]-1,3-チアゾール-5-カルボキシレート1.24gにp-トルエンスルホニルメチルイソシアニド10.8g、炭酸カリウム7.7gを加え、エタノール100.0mLに懸濁させ、窒素雰囲気下、80℃で15時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、エチル 2-[4-(メトキシメトキシ)-3-オキサゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボキシレート6.2gを得た。
(4)上記で得られたエチル 2-[4-(メトキシメトキシ)-3-オキサゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボキシレート6.2gをテトラヒドロフラン/メタノール=1/1の混合溶液80.0mLに溶解し、6M塩酸22mLをゆっくりと加え、50℃で15時間撹拌した。減圧濃縮して溶媒を除去し、ヘキサン/酢酸エチル=2/1の混合溶液100mLを加え、80℃で1時間撹拌した。溶液を室温まで下げたのち、固体をろ取し、飽和炭酸水素ナトリウム水溶液100ml、水100mL、ヘキサン/酢酸エチル=2/1の混合溶液100mLで洗浄し、乾燥させることでエチル 2-(4-ヒドロキシ-3-オキサゾール-5-イル-フェニル)-4-メチル-1,3-チアゾール-5-カルボキシレート4.9gを得た。
1H-NMR(400MHz,CDCl3)δ(ppm):1.30(3H,t,J=7.3Hz),2.68(3H,s),4.28(3H,q,J=7.3Hz),7.09(1H,d,J=8.8Hz),7.61(1H,s),7.83(1H,dd,J=8.8,2.0Hz),8.27(1H,,s),8.46(1H,s),
11.31(1H,brs)
(5)トリフェニルホスフィン52.5mgをテトラヒドロフラン500uLに溶解させ、シクロブチルメタノール17.2mg、ジエチルアゾジカルボキシレート40.4mgを加え、窒素雰囲気化、室温で30分撹拌した。反応混合液にエチル 2-(4-ヒドロキシ-3-オキサゾール-5-イル-フェニル)-4-メチル-1,3-チアゾール-5-カルボキシレート33.0mgを加え、室温で12時間撹拌した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行うことでエチル 2-[4-(シクロブチルメトキシ)-3-オキサゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートの粗体を得た。
(6)上記で得られたエチル 2-[4-(シクロブチルメトキシ)-3-オキサゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートの粗体をテトラヒドロフラン/メタノール=1/1の混合溶液1.0mLに溶解し、2M水酸化ナトリウム水溶液250uLを加えて、室温で6時間撹拌した。反応混合液に2M塩酸250uLを加え、減圧濃縮した後に常法により精製することで2-[4-(シクロブチルメトキシ)-3-オキサゾール-5-イル-フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸21.0mgを得た。
1H-NMR(400MHz,DMSO d6)δ(ppm):1.87-2.02(4H,m),2.11-2.16(2H,m),2.67(3H,s),2.89(1H,m),4.21(2H,d,J=6.8Hz),7.29(1H,d,J=8.8Hz),7.51(1H,s),7.93(1H,dd,J=8.8,2.4Hz),8.30(1H,d,J=2.4Hz),8.50(1H,s),13.32(1H,s)
HPLC保持時間:12.66分
Obs Mass(M++H):371.1052
Pred Mass(M++H):371.1060
Formula(M):C19H18N2O4S Example 69 Synthesis of 2- [4- (cyclobutylmethoxy) -3-oxazol-5-yl-phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid (Compound No. 69 ) (Synthesis) Law C)
(1) 10.5 g of 5-bromosalicylaldehyde and 9.0 g of potassium carbonate were suspended in 100.0 mL of dimethylformamide and stirred at 0 ° C. for 30 minutes in a nitrogen atmosphere. To the reaction mixture, 5.6 g of methoxymethyl chloride was slowly added and stirred at room temperature for 24 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried and concentrated under reduced pressure to obtain a crude product of 5-bromo-2- (methoxymethoxy) benzaldehyde.
(2) To the 5-bromo-2- (methoxymethoxy) benzaldehyde obtained above, 1.05 g of potassium bicarbonate, 561 mg of palladium (II) acetate and 4.1 g of copper (I) bromide were added, and 100 mL of toluene was added. Suspended. Thereafter, 9.4 g of ethyl 4-methyl-1,3-thiazole-5-carboxylate, 881 mg of isobutyric acid and 1.4 g of di-t-butylcyclohexylphosphine were added and heated at 130 ° C. for 15 hours under a nitrogen atmosphere. . The reaction mixture was filtered through Celite to remove insolubles, water was added to the filtrate, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried, concentrated under reduced pressure, and purified by a conventional method to obtain ethyl 2- [3-formyl-4- (methoxymethoxy) phenyl] -1,3-thiazole-5-carboxylate. 34 g was obtained.
(3) 1.24 g of ethyl 2- [3-formyl-4- (methoxymethoxy) phenyl] -1,3-thiazole-5-carboxylate obtained above, 10.8 g of p-toluenesulfonylmethyl isocyanide, potassium carbonate 7.7 g was added, suspended in 100.0 mL of ethanol, and heated at 80 ° C. for 15 hours under a nitrogen atmosphere. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure, and the resulting crude product is separated and purified by silica gel column chromatography to give ethyl 2- [4- (methoxymethoxy) -3-oxazole-5- Yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylate (6.2 g).
(4) 6.2 g of ethyl 2- [4- (methoxymethoxy) -3-oxazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylate obtained above was added to tetrahydrofuran / It melt | dissolved in the mixed solution 80.0mL of methanol = 1/1, 22 mL of 6M hydrochloric acid was added slowly, and it stirred at 50 degreeC for 15 hours. The solvent was removed by concentration under reduced pressure, 100 mL of a mixed solution of hexane / ethyl acetate = 2/1 was added, and the mixture was stirred at 80 ° C. for 1 hour. After the solution is cooled to room temperature, the solid is collected by filtration, washed with 100 ml of a saturated aqueous sodium hydrogen carbonate solution, 100 mL of water, and 100 mL of a mixed solution of hexane / ethyl acetate = 2/1, and dried to give ethyl 2- (4- There were obtained 4.9 g of hydroxy-3-oxazol-5-yl-phenyl) -4-methyl-1,3-thiazole-5-carboxylate.
1 H-NMR (400 MHz, CDCl 3 ) δ (ppm): 1.30 (3H, t, J = 7.3 Hz), 2.68 (3H, s), 4.28 (3H, q, J = 7) .3 Hz), 7.09 (1H, d, J = 8.8 Hz), 7.61 (1H, s), 7.83 (1H, dd, J = 8.8, 2.0 Hz), 8.27 (1H, s), 8.46 (1H, s),
11.31 (1H, brs)
(5) 52.5 mg of triphenylphosphine was dissolved in 500 uL of tetrahydrofuran, 17.2 mg of cyclobutylmethanol and 40.4 mg of diethyl azodicarboxylate were added, and the mixture was stirred in a nitrogen atmosphere at room temperature for 30 minutes. Ethyl 2- (4-hydroxy-3-oxazol-5-yl-phenyl) -4-methyl-1,3-thiazole-5-carboxylate (33.0 mg) was added to the reaction mixture, and the mixture was stirred at room temperature for 12 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure to give ethyl 2- [4- (cyclobutylmethoxy) -3-oxazol-5-yl) phenyl] -4-methyl-1,3-thiazole- A crude product of 5-carboxylate was obtained.
(6) The crude product of ethyl 2- [4- (cyclobutylmethoxy) -3-oxazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylate obtained above was added to tetrahydrofuran. Dissolved in 1.0 mL of a mixed solution of / methanol = 1/1, 250 uL of 2M aqueous sodium hydroxide solution was added, and the mixture was stirred at room temperature for 6 hours. 2- [4- (cyclobutylmethoxy) -3-oxazol-5-yl-phenyl] -4-methyl-1,3 was added to the reaction mixture by adding 250 uL of 2M hydrochloric acid, concentrating under reduced pressure, and purifying by a conventional method. -21.0 mg of thiazole-5-carboxylic acid was obtained.
1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 1.87-2.02 (4H, m), 2.11-2.16 (2H, m), 2.67 (3H, s) 2.89 (1H, m), 4.21 (2H, d, J = 6.8 Hz), 7.29 (1H, d, J = 8.8 Hz), 7.51 (1H, s), 7 .93 (1H, dd, J = 8.8, 2.4 Hz), 8.30 (1H, d, J = 2.4 Hz), 8.50 (1H, s), 13.32 (1H, s)
HPLC retention time: 12.66 minutes Obs Mass (M + + H): 371.1052
Pred Mass (M + + H): 371.1060
Formula (M): C 19 H 18 N 2 O 4 S
[実施例70-83]
実施例69と同様にして、化合物番号70-83を合成した。 [Examples 70-83]
Compound Nos. 70 to 83 were synthesized in the same manner as Example 69.
実施例69と同様にして、化合物番号70-83を合成した。 [Examples 70-83]
Compound Nos. 70 to 83 were synthesized in the same manner as Example 69.
[実施例84]2-[4-イソブトキシ-3-(1H-テトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸(化合物番号84)の合成(合成法D)
(1)エチル 2-[3-シアノ-4-イソブトキシフェニル]-4-メチル-1,3-チアゾール-5-カルボキシレート689mg、アジ化ナトリウム780mgおよび塩化アンモニウム642mgをジメチルホルムアミド10.0mLに懸濁させ、窒素雰囲気下、120℃で16時間加熱した。反応混合液に2M塩酸6mLを加え、生じた固体をろ過し、水で洗浄後、減圧化で乾燥させ、エチル 2-[4-イソブトキシ-3-(1H-テトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボキシレート745mgを得た。
(2)上記で得られたエチル 2-[4-イソブトキシ-3-(1H-テトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボキシレート155mgをテトラヒドロフラン/メタノール=1/1の混合溶液3.0mLに溶解し、2M水酸化ナトリウム水溶液0.8mLを加えて、室温で2時間撹拌した。反応混合液に2M塩酸0.8mLを加え、減圧濃縮した後に常法により精製し、2-[4-イソブトキシ-3-(1H-テトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸53.7mgを得た。
1H-NMR(400MHz,DMSO d6)δ(ppm):0.90(6H,d,J=6.4Hz),2.13-2.20(1H,m),2.67(3H,s),4.05(2H,d,J=6.8Hz),7.41(1H,d,J=8.8Hz),8.13(1H,dd,J=2.4,8.0Hz),8.49-8.50(1H,m)
HPLC保持時間:9.97分
Obs Mass(M++H):360.1127
Pred Mass(M++H):360.1125
Formula(M):C16H17N5O3S [Example 84] Synthesis of 2- [4-isobutoxy-3- (1H-tetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid (Compound No. 84 ) (Synthesis Method) D)
(1) Ethyl 2- [3-cyano-4-isobutoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylate (689 mg), sodium azide (780 mg) and ammonium chloride (642 mg) were suspended in 10.0 mL of dimethylformamide. It was made turbid and heated at 120 ° C. for 16 hours under a nitrogen atmosphere. To the reaction mixture was added 6 mL of 2M hydrochloric acid, and the resulting solid was filtered, washed with water, dried under reduced pressure, and ethyl 2- [4-isobutoxy-3- (1H-tetrazol-5-yl) phenyl]- 745 mg of 4-methyl-1,3-thiazole-5-carboxylate was obtained.
(2) Ethyl 2- [4-isobutoxy-3- (1H-tetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylate (155 mg) obtained above was added to tetrahydrofuran / methanol = It melt | dissolved in 3.0 mL of 1/1 mixed solution, 2 M sodium hydroxide aqueous solution 0.8 mL was added, and it stirred at room temperature for 2 hours. To the reaction mixture was added 0.8 mL of 2M hydrochloric acid, and the mixture was concentrated under reduced pressure and purified by a conventional method. 2- [4-isobutoxy-3- (1H-tetrazol-5-yl) phenyl] -4-methyl-1,3 -53.7 mg of thiazole-5-carboxylic acid were obtained.
1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 0.90 (6H, d, J = 6.4 Hz), 2.13-2.20 (1H, m), 2.67 (3H, s), 4.05 (2H, d, J = 6.8 Hz), 7.41 (1H, d, J = 8.8 Hz), 8.13 (1H, dd, J = 2.4, 8.0 Hz) ), 8.49-8.50 (1H, m)
HPLC retention time: 9.97 minutes Obs Mass (M + + H): 360.1127
Pred Mass (M + + H): 360.1125
Formula (M): C 16 H 17 N 5 O 3 S
(1)エチル 2-[3-シアノ-4-イソブトキシフェニル]-4-メチル-1,3-チアゾール-5-カルボキシレート689mg、アジ化ナトリウム780mgおよび塩化アンモニウム642mgをジメチルホルムアミド10.0mLに懸濁させ、窒素雰囲気下、120℃で16時間加熱した。反応混合液に2M塩酸6mLを加え、生じた固体をろ過し、水で洗浄後、減圧化で乾燥させ、エチル 2-[4-イソブトキシ-3-(1H-テトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボキシレート745mgを得た。
(2)上記で得られたエチル 2-[4-イソブトキシ-3-(1H-テトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボキシレート155mgをテトラヒドロフラン/メタノール=1/1の混合溶液3.0mLに溶解し、2M水酸化ナトリウム水溶液0.8mLを加えて、室温で2時間撹拌した。反応混合液に2M塩酸0.8mLを加え、減圧濃縮した後に常法により精製し、2-[4-イソブトキシ-3-(1H-テトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸53.7mgを得た。
1H-NMR(400MHz,DMSO d6)δ(ppm):0.90(6H,d,J=6.4Hz),2.13-2.20(1H,m),2.67(3H,s),4.05(2H,d,J=6.8Hz),7.41(1H,d,J=8.8Hz),8.13(1H,dd,J=2.4,8.0Hz),8.49-8.50(1H,m)
HPLC保持時間:9.97分
Obs Mass(M++H):360.1127
Pred Mass(M++H):360.1125
Formula(M):C16H17N5O3S [Example 84] Synthesis of 2- [4-isobutoxy-3- (1H-tetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid (Compound No. 84 ) (Synthesis Method) D)
(1) Ethyl 2- [3-cyano-4-isobutoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylate (689 mg), sodium azide (780 mg) and ammonium chloride (642 mg) were suspended in 10.0 mL of dimethylformamide. It was made turbid and heated at 120 ° C. for 16 hours under a nitrogen atmosphere. To the reaction mixture was added 6 mL of 2M hydrochloric acid, and the resulting solid was filtered, washed with water, dried under reduced pressure, and ethyl 2- [4-isobutoxy-3- (1H-tetrazol-5-yl) phenyl]- 745 mg of 4-methyl-1,3-thiazole-5-carboxylate was obtained.
(2) Ethyl 2- [4-isobutoxy-3- (1H-tetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylate (155 mg) obtained above was added to tetrahydrofuran / methanol = It melt | dissolved in 3.0 mL of 1/1 mixed solution, 2 M sodium hydroxide aqueous solution 0.8 mL was added, and it stirred at room temperature for 2 hours. To the reaction mixture was added 0.8 mL of 2M hydrochloric acid, and the mixture was concentrated under reduced pressure and purified by a conventional method. 2- [4-isobutoxy-3- (1H-tetrazol-5-yl) phenyl] -4-methyl-1,3 -53.7 mg of thiazole-5-carboxylic acid were obtained.
1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 0.90 (6H, d, J = 6.4 Hz), 2.13-2.20 (1H, m), 2.67 (3H, s), 4.05 (2H, d, J = 6.8 Hz), 7.41 (1H, d, J = 8.8 Hz), 8.13 (1H, dd, J = 2.4, 8.0 Hz) ), 8.49-8.50 (1H, m)
HPLC retention time: 9.97 minutes Obs Mass (M + + H): 360.1127
Pred Mass (M + + H): 360.1125
Formula (M): C 16 H 17 N 5 O 3 S
[実施例85]
実施例84と同様にして、化合物番号85を合成した。 [Example 85]
Compound No. 85 was synthesized in the same manner as Example 84.
実施例84と同様にして、化合物番号85を合成した。 [Example 85]
Compound No. 85 was synthesized in the same manner as Example 84.
[実施例86,87]2-[4-イソブトキシ-3-(1-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸(化合物番号86)および2-[4-イソブトキシ-3-(2-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸(化合物番号87)の合成(合成法D)
(1)エチル 2-[4-イソブトキシ-3-(1H-テトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボキシレート194mgと炭酸カリウム172mgをジメチルホルムアミド2.0mLに懸濁させ、ヨウ化メチル177mgを加え、窒素雰囲気下、室温で20時間撹拌した。反応混合液に水5.0mLと酢酸エチル5.0mLを加えて撹拌し、有機層を濃縮することでエチル 2-[4-イソブトキシ-3-(1-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートとエチル 2-[4-イソブトキシ-3-(2-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートの混合物を得た。
(2)上記で得られた混合物をテトラヒドロフラン/メタノール=1/1の混合溶液4.0mLに溶解し、2M水酸化ナトリウム水溶液1.0mLを加えて、室温で6時間撹拌した。反応混合液に2M塩酸1.0mLを加え、減圧濃縮した後に常法により精製し、2-[4-イソブトキシ-3-(1-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸67.7mgおよび2-[4-イソブトキシ-3-(2-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸50.1mgをそれぞれ得た。
(化合物番号86)1H-NMR(400MHz,DMSO d6)δ(ppm):0.82(6H,d,J=8.0Hz),1.93(1H,septet,J=8.0Hz),2.65(3H,s),3.92-3.94(5H,m),7.40(1H,d,J=8.0Hz),8.06(1H,d,J=4.0Hz),8.19(1H,dd,J=8.0, 4.0Hz),13.38(1H,s)
HPLC保持時間:10.53分
Obs Mass(M++H):374.1276
Pred Mass(M++H):374.1281
Formula(M):C17H19N5O3S
(化合物番号87)1H-NMR(400MHz,DMSO d6)δ(ppm):1.00(6H,d,J=8.0Hz),2.02(1H,septet,J=8.0Hz),2.66(3H,s),3.94(2H,d,J=8.0Hz),4.43(3H,s),7.32(1H,d,J=8.0Hz),8.06(1H,d,J=8.0),8.43(1H,d,J=4.0Hz),13.34(1H,s)
HPLC保持時間:11.70分
Obs Mass(M++H):374.1281
Pred Mass(M++H):374.1281
Formula(M):C17H19N5O3S [Examples 86, 87] 2- [4-Isobutoxy-3- (1-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid (Compound No. 86 ) and 2 Synthesis of — [4-isobutoxy-3- (2-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid (Compound No. 87 ) (Synthesis Method D)
(1) Ethyl 2- [4-isobutoxy-3- (1H-tetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylate (194 mg) and potassium carbonate (172 mg) and dimethylformamide (2.0 mL) And 177 mg of methyl iodide was added, and the mixture was stirred at room temperature for 20 hours under a nitrogen atmosphere. To the reaction mixture, 5.0 mL of water and 5.0 mL of ethyl acetate were added and stirred, and the organic layer was concentrated to give ethyl 2- [4-isobutoxy-3- (1-methyltetrazol-5-yl) phenyl]- 4-methyl-1,3-thiazole-5-carboxylate and ethyl 2- [4-isobutoxy-3- (2-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5 A mixture of carboxylates was obtained.
(2) The mixture obtained above was dissolved in 4.0 mL of a tetrahydrofuran / methanol = 1/1 mixed solution, 1.0 mL of 2M aqueous sodium hydroxide solution was added, and the mixture was stirred at room temperature for 6 hours. To the reaction mixture was added 1.0 mL of 2M hydrochloric acid, and the mixture was concentrated under reduced pressure and purified by a conventional method to obtain 2- [4-isobutoxy-3- (1-methyltetrazol-5-yl) phenyl] -4-methyl-1, 67.7 mg of 3-thiazole-5-carboxylic acid and 2- [4-isobutoxy-3- (2-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid 1 mg each was obtained.
(Compound No. 86 ) 1 H-NMR (400 MHz, DMSO d6) δ (ppm): 0.82 (6H, d, J = 8.0 Hz), 1.93 (1H, septet, J = 8.0 Hz), 2.65 (3H, s), 3.92-3.94 (5H, m), 7.40 (1H, d, J = 8.0 Hz), 8.06 (1H, d, J = 4.0 Hz) ), 8.19 (1H, dd, J = 8.0, 4.0 Hz), 13.38 (1H, s)
HPLC retention time: 10.53 minutes Obs Mass (M + + H) : 374.1276
Pred Mass (M + + H): 374.1281
Formula (M): C 17 H 19 N 5 O 3 S
(Compound No. 87 ) 1 H-NMR (400 MHz, DMSO d6) δ (ppm): 1.00 (6H, d, J = 8.0 Hz), 2.02 (1H, septet, J = 8.0 Hz), 2.66 (3H, s), 3.94 (2H, d, J = 8.0 Hz), 4.43 (3H, s), 7.32 (1H, d, J = 8.0 Hz), 8. 06 (1H, d, J = 8.0), 8.43 (1H, d, J = 4.0 Hz), 13.34 (1H, s)
HPLC retention time: 11.70 minutes Obs Mass (M + + H): 374.1281
Pred Mass (M + + H): 374.1281
Formula (M): C 17 H 19 N 5 O 3 S
(1)エチル 2-[4-イソブトキシ-3-(1H-テトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボキシレート194mgと炭酸カリウム172mgをジメチルホルムアミド2.0mLに懸濁させ、ヨウ化メチル177mgを加え、窒素雰囲気下、室温で20時間撹拌した。反応混合液に水5.0mLと酢酸エチル5.0mLを加えて撹拌し、有機層を濃縮することでエチル 2-[4-イソブトキシ-3-(1-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートとエチル 2-[4-イソブトキシ-3-(2-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートの混合物を得た。
(2)上記で得られた混合物をテトラヒドロフラン/メタノール=1/1の混合溶液4.0mLに溶解し、2M水酸化ナトリウム水溶液1.0mLを加えて、室温で6時間撹拌した。反応混合液に2M塩酸1.0mLを加え、減圧濃縮した後に常法により精製し、2-[4-イソブトキシ-3-(1-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸67.7mgおよび2-[4-イソブトキシ-3-(2-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸50.1mgをそれぞれ得た。
(化合物番号86)1H-NMR(400MHz,DMSO d6)δ(ppm):0.82(6H,d,J=8.0Hz),1.93(1H,septet,J=8.0Hz),2.65(3H,s),3.92-3.94(5H,m),7.40(1H,d,J=8.0Hz),8.06(1H,d,J=4.0Hz),8.19(1H,dd,J=8.0, 4.0Hz),13.38(1H,s)
HPLC保持時間:10.53分
Obs Mass(M++H):374.1276
Pred Mass(M++H):374.1281
Formula(M):C17H19N5O3S
(化合物番号87)1H-NMR(400MHz,DMSO d6)δ(ppm):1.00(6H,d,J=8.0Hz),2.02(1H,septet,J=8.0Hz),2.66(3H,s),3.94(2H,d,J=8.0Hz),4.43(3H,s),7.32(1H,d,J=8.0Hz),8.06(1H,d,J=8.0),8.43(1H,d,J=4.0Hz),13.34(1H,s)
HPLC保持時間:11.70分
Obs Mass(M++H):374.1281
Pred Mass(M++H):374.1281
Formula(M):C17H19N5O3S [Examples 86, 87] 2- [4-Isobutoxy-3- (1-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid (Compound No. 86 ) and 2 Synthesis of — [4-isobutoxy-3- (2-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid (Compound No. 87 ) (Synthesis Method D)
(1) Ethyl 2- [4-isobutoxy-3- (1H-tetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylate (194 mg) and potassium carbonate (172 mg) and dimethylformamide (2.0 mL) And 177 mg of methyl iodide was added, and the mixture was stirred at room temperature for 20 hours under a nitrogen atmosphere. To the reaction mixture, 5.0 mL of water and 5.0 mL of ethyl acetate were added and stirred, and the organic layer was concentrated to give ethyl 2- [4-isobutoxy-3- (1-methyltetrazol-5-yl) phenyl]- 4-methyl-1,3-thiazole-5-carboxylate and ethyl 2- [4-isobutoxy-3- (2-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5 A mixture of carboxylates was obtained.
(2) The mixture obtained above was dissolved in 4.0 mL of a tetrahydrofuran / methanol = 1/1 mixed solution, 1.0 mL of 2M aqueous sodium hydroxide solution was added, and the mixture was stirred at room temperature for 6 hours. To the reaction mixture was added 1.0 mL of 2M hydrochloric acid, and the mixture was concentrated under reduced pressure and purified by a conventional method to obtain 2- [4-isobutoxy-3- (1-methyltetrazol-5-yl) phenyl] -4-methyl-1, 67.7 mg of 3-thiazole-5-carboxylic acid and 2- [4-isobutoxy-3- (2-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid 1 mg each was obtained.
(Compound No. 86 ) 1 H-NMR (400 MHz, DMSO d6) δ (ppm): 0.82 (6H, d, J = 8.0 Hz), 1.93 (1H, septet, J = 8.0 Hz), 2.65 (3H, s), 3.92-3.94 (5H, m), 7.40 (1H, d, J = 8.0 Hz), 8.06 (1H, d, J = 4.0 Hz) ), 8.19 (1H, dd, J = 8.0, 4.0 Hz), 13.38 (1H, s)
HPLC retention time: 10.53 minutes Obs Mass (M + + H) : 374.1276
Pred Mass (M + + H): 374.1281
Formula (M): C 17 H 19 N 5 O 3 S
(Compound No. 87 ) 1 H-NMR (400 MHz, DMSO d6) δ (ppm): 1.00 (6H, d, J = 8.0 Hz), 2.02 (1H, septet, J = 8.0 Hz), 2.66 (3H, s), 3.94 (2H, d, J = 8.0 Hz), 4.43 (3H, s), 7.32 (1H, d, J = 8.0 Hz), 8. 06 (1H, d, J = 8.0), 8.43 (1H, d, J = 4.0 Hz), 13.34 (1H, s)
HPLC retention time: 11.70 minutes Obs Mass (M + + H): 374.1281
Pred Mass (M + + H): 374.1281
Formula (M): C 17 H 19 N 5 O 3 S
[実施例88-105]
実施例86、87と同様にして、化合物番号88-105を合成した。 [Examples 88-105]
Compound Nos. 88 to 105 were synthesized in the same manner as in Examples 86 and 87.
実施例86、87と同様にして、化合物番号88-105を合成した。 [Examples 88-105]
Compound Nos. 88 to 105 were synthesized in the same manner as in Examples 86 and 87.
[実施例106、107]4-メチル-2-[3-(1-メチルテトラゾール-5-イル)-4-フェノキシフェニル]-1,3-チアゾール-5-カルボン酸(化合物番号106)および4-メチル-2-[3-(2-メチルテトラゾール-5-イル)-4-フェノキシフェニル]-1,3-チアゾール-5-カルボン酸(化合物番号107)の合成(合成法D)
(1)実施例84と同様にして、エチル 2-(3-シアノ-4-フェノキシフェニル)-4-メチル-1,3-チアゾール-5-カルボキシレートを用いて、エチル 2-[3-(1H-テトラゾール-5-イル)-4-フェノキシフェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートを得た。
(2)実施例86、87と同様にして、エチル 2-[3-(1H-テトラゾール-5-イル)-4-フェノキシフェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートを用いて、4-メチル-2-[3-(1-メチルテトラゾール-5-イル)-4-フェノキシフェニル]-1,3-チアゾール-5-カルボン酸16.4mgおよび4-メチル-2-[3-(2-メチルテトラゾール-5-イル)-4-フェノキシフェニル]-1,3-チアゾール-5-カルボン酸14.7mgをそれぞれ得た。
(化合物番号106)1H-NMR(400MHz,DMSO d6)δ(ppm):2.68(3H,s),4.09(3H,m),7.06(1H,d,J=8.8Hz),7.18-7.27(3H,m),7.40-7.48(2H,m),8.20-8.25(2H,m),13.44(1H,brs)
HPLC保持時間:10.55分
Obs Mass(M++H):394.0970
Pred Mass(M++H):394.0968
Formula(M):C19H15N5O3S
(化合物番号107)1H-NMR(400MHz,DMSO d6)δ(ppm):2.70(3H,s),4.43(3H,s),7.09-7.24(4H,m),7.41-7.47(2H,m),8.08-8.12(1H,m),8.62(1H,d,J=2.4Hz),13.40(1H,brs)
HPLC保持時間:11.35分
Obs Mass(M++H):394.0970
Pred Mass(M++H):394.0968
Formula(M):C19H15N5O3S [Examples 106 and 107] 4-Methyl-2- [3- (1-methyltetrazol-5-yl) -4-phenoxyphenyl] -1,3-thiazole-5-carboxylic acid (Compound No. 106 ) and 4 Synthesis of -methyl-2- [3- (2-methyltetrazol-5-yl) -4-phenoxyphenyl] -1,3-thiazole-5-carboxylic acid (Compound No. 107 ) (Synthesis Method D)
(1) In the same manner as in Example 84, using ethyl 2- (3-cyano-4-phenoxyphenyl) -4-methyl-1,3-thiazole-5-carboxylate, ethyl 2- [3- ( 1H-tetrazol-5-yl) -4-phenoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylate was obtained.
(2) Ethyl 2- [3- (1H-tetrazol-5-yl) -4-phenoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylate is obtained in the same manner as in Examples 86 and 87. 1-mg of 4-methyl-2- [3- (1-methyltetrazol-5-yl) -4-phenoxyphenyl] -1,3-thiazole-5-carboxylic acid and 4-methyl-2- [ 14.7 mg of 3- (2-methyltetrazol-5-yl) -4-phenoxyphenyl] -1,3-thiazole-5-carboxylic acid was obtained.
(Compound No. 106 ) 1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 2.68 (3H, s), 4.09 (3H, m), 7.06 (1H, d, J = 8 .8 Hz), 7.18-7.27 (3H, m), 7.40-7.48 (2H, m), 8.20-8.25 (2H, m), 13.44 (1H, brs) )
HPLC retention time: 10.55 minutes Obs Mass (M + + H) : 394.0970
Pred Mass (M + + H): 394.0968
Formula (M): C 19 H 15 N 5 O 3 S
(Compound No. 107 ) 1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 2.70 (3H, s), 4.43 (3H, s), 7.09-7.24 (4H, m ), 7.41-7.47 (2H, m), 8.08-8.12 (1H, m), 8.62 (1H, d, J = 2.4 Hz), 13.40 (1H, brs) )
HPLC retention time: 11.35 minutes Obs Mass (M + + H) : 394.0970
Pred Mass (M + + H): 394.0968
Formula (M): C 19 H 15 N 5 O 3 S
(1)実施例84と同様にして、エチル 2-(3-シアノ-4-フェノキシフェニル)-4-メチル-1,3-チアゾール-5-カルボキシレートを用いて、エチル 2-[3-(1H-テトラゾール-5-イル)-4-フェノキシフェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートを得た。
(2)実施例86、87と同様にして、エチル 2-[3-(1H-テトラゾール-5-イル)-4-フェノキシフェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートを用いて、4-メチル-2-[3-(1-メチルテトラゾール-5-イル)-4-フェノキシフェニル]-1,3-チアゾール-5-カルボン酸16.4mgおよび4-メチル-2-[3-(2-メチルテトラゾール-5-イル)-4-フェノキシフェニル]-1,3-チアゾール-5-カルボン酸14.7mgをそれぞれ得た。
(化合物番号106)1H-NMR(400MHz,DMSO d6)δ(ppm):2.68(3H,s),4.09(3H,m),7.06(1H,d,J=8.8Hz),7.18-7.27(3H,m),7.40-7.48(2H,m),8.20-8.25(2H,m),13.44(1H,brs)
HPLC保持時間:10.55分
Obs Mass(M++H):394.0970
Pred Mass(M++H):394.0968
Formula(M):C19H15N5O3S
(化合物番号107)1H-NMR(400MHz,DMSO d6)δ(ppm):2.70(3H,s),4.43(3H,s),7.09-7.24(4H,m),7.41-7.47(2H,m),8.08-8.12(1H,m),8.62(1H,d,J=2.4Hz),13.40(1H,brs)
HPLC保持時間:11.35分
Obs Mass(M++H):394.0970
Pred Mass(M++H):394.0968
Formula(M):C19H15N5O3S [Examples 106 and 107] 4-Methyl-2- [3- (1-methyltetrazol-5-yl) -4-phenoxyphenyl] -1,3-thiazole-5-carboxylic acid (Compound No. 106 ) and 4 Synthesis of -methyl-2- [3- (2-methyltetrazol-5-yl) -4-phenoxyphenyl] -1,3-thiazole-5-carboxylic acid (Compound No. 107 ) (Synthesis Method D)
(1) In the same manner as in Example 84, using ethyl 2- (3-cyano-4-phenoxyphenyl) -4-methyl-1,3-thiazole-5-carboxylate, ethyl 2- [3- ( 1H-tetrazol-5-yl) -4-phenoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylate was obtained.
(2) Ethyl 2- [3- (1H-tetrazol-5-yl) -4-phenoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylate is obtained in the same manner as in Examples 86 and 87. 1-mg of 4-methyl-2- [3- (1-methyltetrazol-5-yl) -4-phenoxyphenyl] -1,3-thiazole-5-carboxylic acid and 4-methyl-2- [ 14.7 mg of 3- (2-methyltetrazol-5-yl) -4-phenoxyphenyl] -1,3-thiazole-5-carboxylic acid was obtained.
(Compound No. 106 ) 1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 2.68 (3H, s), 4.09 (3H, m), 7.06 (1H, d, J = 8 .8 Hz), 7.18-7.27 (3H, m), 7.40-7.48 (2H, m), 8.20-8.25 (2H, m), 13.44 (1H, brs) )
HPLC retention time: 10.55 minutes Obs Mass (M + + H) : 394.0970
Pred Mass (M + + H): 394.0968
Formula (M): C 19 H 15 N 5 O 3 S
(Compound No. 107 ) 1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 2.70 (3H, s), 4.43 (3H, s), 7.09-7.24 (4H, m ), 7.41-7.47 (2H, m), 8.08-8.12 (1H, m), 8.62 (1H, d, J = 2.4 Hz), 13.40 (1H, brs) )
HPLC retention time: 11.35 minutes Obs Mass (M + + H) : 394.0970
Pred Mass (M + + H): 394.0968
Formula (M): C 19 H 15 N 5 O 3 S
[実施例108-141]
実施例106、107と同様にして、化合物番号108-141を合成した。 [Examples 108-141]
In the same manner as in Example 107, Compound No. 108 - was synthesized 141.
実施例106、107と同様にして、化合物番号108-141を合成した。 [Examples 108-141]
In the same manner as in Example 107, Compound No. 108 - was synthesized 141.
[実施例142、143]4-メチル-2-[3-(1-メチルテトラゾール-5-イル)-4-フェニルフェニル]-1,3-チアゾール-5-カルボン酸(化合物番号142)および4-メチル-2-[3-(2-メチルテトラゾール-5-イル)-4-フェニルフェニル]-1,3-チアゾール-5-カルボン酸(化合物番号143)の合成
(1)実施例84と同様にして、エチル 2-(3-シアノ-4-フェニルフェニル)-4-メチル-1,3-チアゾール-5-カルボキシレートを用いて、エチル 2-[3-(1H-テトラゾール-5-イル)-4-フェニルフェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートを得た。
(2)実施例86、87と同様にして、エチル 2-[3-(1H-1,2,3,4-テトラゾール-5-イル)-4-フェニルフェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートを用いて、4-メチル-2-[3-(1-メチルテトラゾール-5-イル)-4-フェニルフェニル]-1,3-チアゾール-5-カルボン酸51.9mgおよび4-メチル-2-[3-(2-メチルテトラゾール-5-イル)-4-フェニルフェニル]-1,3-チアゾール-5-カルボン酸32.8mgをそれぞれ得た。
(化合物番号142)1H-NMR(400MHz,DMSO d6)δ(ppm):2.69(3H,s),3.44(3H,m),7.11-7.13(2H,m),7.35-7.37(3H,m),7.79(1H,d,J=8.4Hz),8.23(1H,d,J=2.0Hz),8.31(1H,dd,J=2.0,8.8Hz)
HPLC保持時間:10.49分
Obs Mass(M++H):378.1017
Pred Mass(M++H):378.1017
Formula(M):C19H15N5O2S
(化合物番号143)1H-NMR(400MHz,DMSO d6)δ(ppm):2.70(3H,s),4.31(3H,m),7.17-7.20(2H,m),7.32-7.34(3H,m),7.64(1H,d,J=7.6Hz),8.18(1H,dd,J=2.0,8.8Hz),8.34(1H,d,J=2.0Hz)
HPLC保持時間:11.34分
Obs Mass(M++H):378.1023
Pred Mass(M++H):378.1017
Formula(M):C19H15N5O2S [Examples 142 and 143] 4-Methyl-2- [3- (1-methyltetrazol-5-yl) -4-phenylphenyl] -1,3-thiazole-5-carboxylic acid (Compound No. 142 ) and 4 Synthesis of —methyl-2- [3- (2-methyltetrazol-5-yl) -4-phenylphenyl] -1,3-thiazole-5-carboxylic acid (Compound No. 143 ) (1) Same as Example 84 To ethyl 2- [3- (1H-tetrazol-5-yl) using ethyl 2- (3-cyano-4-phenylphenyl) -4-methyl-1,3-thiazol-5-carboxylate -4-Phenylphenyl] -4-methyl-1,3-thiazole-5-carboxylate was obtained.
(2) In the same manner as in Examples 86 and 87, ethyl 2- [3- (1H-1,2,3,4-tetrazol-5-yl) -4-phenylphenyl] -4-methyl-1,3 Using 5-thiazole-5-carboxylate, 51.9 mg of 4-methyl-2- [3- (1-methyltetrazol-5-yl) -4-phenylphenyl] -1,3-thiazole-5-carboxylic acid And 32.8 mg of 4-methyl-2- [3- (2-methyltetrazol-5-yl) -4-phenylphenyl] -1,3-thiazole-5-carboxylic acid were obtained.
(Compound No. 142 ) 1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 2.69 (3H, s), 3.44 (3H, m), 7.11-7.13 (2H, m ), 7.35-7.37 (3H, m), 7.79 (1H, d, J = 8.4 Hz), 8.23 (1H, d, J = 2.0 Hz), 8.31 (1H , Dd, J = 2.0, 8.8 Hz)
HPLC retention time: 10.49 minutes Obs Mass (M + + H) : 378.1017
Pred Mass (M + + H): 378.1017
Formula (M): C 19 H 15 N 5 O 2 S
(Compound No. 143 ) 1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 2.70 (3H, s), 4.31 (3H, m), 7.17-7.20 (2H, m ), 7.32-7.34 (3H, m), 7.64 (1H, d, J = 7.6 Hz), 8.18 (1H, dd, J = 2.0, 8.8 Hz), 8 .34 (1H, d, J = 2.0Hz)
HPLC retention time: 11.34 minutes Obs Mass (M + + H) : 378.1023
Pred Mass (M + + H): 378.1017
Formula (M): C 19 H 15 N 5 O 2 S
(1)実施例84と同様にして、エチル 2-(3-シアノ-4-フェニルフェニル)-4-メチル-1,3-チアゾール-5-カルボキシレートを用いて、エチル 2-[3-(1H-テトラゾール-5-イル)-4-フェニルフェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートを得た。
(2)実施例86、87と同様にして、エチル 2-[3-(1H-1,2,3,4-テトラゾール-5-イル)-4-フェニルフェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートを用いて、4-メチル-2-[3-(1-メチルテトラゾール-5-イル)-4-フェニルフェニル]-1,3-チアゾール-5-カルボン酸51.9mgおよび4-メチル-2-[3-(2-メチルテトラゾール-5-イル)-4-フェニルフェニル]-1,3-チアゾール-5-カルボン酸32.8mgをそれぞれ得た。
(化合物番号142)1H-NMR(400MHz,DMSO d6)δ(ppm):2.69(3H,s),3.44(3H,m),7.11-7.13(2H,m),7.35-7.37(3H,m),7.79(1H,d,J=8.4Hz),8.23(1H,d,J=2.0Hz),8.31(1H,dd,J=2.0,8.8Hz)
HPLC保持時間:10.49分
Obs Mass(M++H):378.1017
Pred Mass(M++H):378.1017
Formula(M):C19H15N5O2S
(化合物番号143)1H-NMR(400MHz,DMSO d6)δ(ppm):2.70(3H,s),4.31(3H,m),7.17-7.20(2H,m),7.32-7.34(3H,m),7.64(1H,d,J=7.6Hz),8.18(1H,dd,J=2.0,8.8Hz),8.34(1H,d,J=2.0Hz)
HPLC保持時間:11.34分
Obs Mass(M++H):378.1023
Pred Mass(M++H):378.1017
Formula(M):C19H15N5O2S [Examples 142 and 143] 4-Methyl-2- [3- (1-methyltetrazol-5-yl) -4-phenylphenyl] -1,3-thiazole-5-carboxylic acid (Compound No. 142 ) and 4 Synthesis of —methyl-2- [3- (2-methyltetrazol-5-yl) -4-phenylphenyl] -1,3-thiazole-5-carboxylic acid (Compound No. 143 ) (1) Same as Example 84 To ethyl 2- [3- (1H-tetrazol-5-yl) using ethyl 2- (3-cyano-4-phenylphenyl) -4-methyl-1,3-thiazol-5-carboxylate -4-Phenylphenyl] -4-methyl-1,3-thiazole-5-carboxylate was obtained.
(2) In the same manner as in Examples 86 and 87, ethyl 2- [3- (1H-1,2,3,4-tetrazol-5-yl) -4-phenylphenyl] -4-methyl-1,3 Using 5-thiazole-5-carboxylate, 51.9 mg of 4-methyl-2- [3- (1-methyltetrazol-5-yl) -4-phenylphenyl] -1,3-thiazole-5-carboxylic acid And 32.8 mg of 4-methyl-2- [3- (2-methyltetrazol-5-yl) -4-phenylphenyl] -1,3-thiazole-5-carboxylic acid were obtained.
(Compound No. 142 ) 1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 2.69 (3H, s), 3.44 (3H, m), 7.11-7.13 (2H, m ), 7.35-7.37 (3H, m), 7.79 (1H, d, J = 8.4 Hz), 8.23 (1H, d, J = 2.0 Hz), 8.31 (1H , Dd, J = 2.0, 8.8 Hz)
HPLC retention time: 10.49 minutes Obs Mass (M + + H) : 378.1017
Pred Mass (M + + H): 378.1017
Formula (M): C 19 H 15 N 5 O 2 S
(Compound No. 143 ) 1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 2.70 (3H, s), 4.31 (3H, m), 7.17-7.20 (2H, m ), 7.32-7.34 (3H, m), 7.64 (1H, d, J = 7.6 Hz), 8.18 (1H, dd, J = 2.0, 8.8 Hz), 8 .34 (1H, d, J = 2.0Hz)
HPLC retention time: 11.34 minutes Obs Mass (M + + H) : 378.1023
Pred Mass (M + + H): 378.1017
Formula (M): C 19 H 15 N 5 O 2 S
[実施例144]2-[4-イソブトキシ-3-(5-メチル-1,2,4-オキサジアゾール-3-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸(化合物番号144)の合成(合成法E)
(1)エチル 2-[3-シアノ-4-イソブトキシフェニル]-4-メチル-1,3-チアゾール-5-カルボキシレート34.4mgにヒドロキシルアミン・1塩酸塩8.2mgを加え、ピリジン1mLに懸濁させ、窒素雰囲気下、110℃で14時間加熱した。反応混合液を減圧濃縮して、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、エチル 2-[4-イソブトキ-3-(N’-ヒドロキシカルバミミドイル)フェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートの粗体を得た。
ESI/MS m/e:378.1(M++H,C18H24N3O4S).
(2)エチル 2-[4-イソブトキ-3-(N’-ヒドロキシカルバミミドイル)フェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートの粗体をピリジン1mLに懸濁させ、反応溶液にアセチルクロリド9.4mgを加え、窒素雰囲気下、100℃で6時間加熱した。反応混合液を減圧濃縮して、水と酢酸エチルを加えて抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、エチル 4-メチル-2-[4-イソブトキ-3-(5-メチル-1,2,4-オキサジアゾール-3-イル)フェニル]-1,3-チアゾール-5-カルボキシレートの粗体を得た。
ESI/MS m/e:402.1(M++H,C20H24N3O4S)
(3)上記で得られたエチル 4-メチル-2-[4-イソブトキ-3-(5-メチル-1,2,4-オキサジアゾール-3-イル)フェニル]-1,3-チアゾール-5-カルボキシレートの粗体をテトラヒドロフラン/メタノール=1/1の混合溶液1mLに溶解し、2M水酸化ナトリウム水溶液0.2mLを加えて、室温で4時間撹拌した。反応混合液に2M塩酸0.2mLを加え、水3mL、酢酸エチル4mLを加えて撹拌し、有機相を濃縮した後に常法により精製し、2-[4-イソブトキシ-3-(5-メチル-1,2,4-オキサジアゾール-3-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸20.6mgを得た。
1H-NMR(400MHz,DMSO d6)δ(ppm):1.02(6H,d,J=6.4Hz),2.02-2.10(1H,m),2.66(3H,s),3.95(2H,d,J=6.0Hz),7.30(1H,d,J=8.8Hz),8.05(1H,dd,J= 2.4,8.8Hz),8.51(1H,d,J=2.4Hz),13.34(1H,brs)
HPLC保持時間:12.40分
Obs Mass(M++H):347.1156
Pred Mass(M++H):347.1169
Formula(M):C18H19N3O4S [Example 144] 2- [4-Isobutoxy-3- (5-methyl-1,2,4-oxadiazol-3-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid Synthesis of (Compound No. 144 ) (Synthesis Method E)
(1) 8.2 mg of hydroxylamine monohydrochloride is added to 34.4 mg of ethyl 2- [3-cyano-4-isobutoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylate, and 1 mL of pyridine is added. And heated at 110 ° C. for 14 hours under a nitrogen atmosphere. The reaction mixture was concentrated under reduced pressure, and the resulting crude product was separated and purified by silica gel column chromatography to obtain ethyl 2- [4-isobutoxy-3- (N′-hydroxycarbamimidoyl) phenyl] -4- A crude product of methyl-1,3-thiazole-5-carboxylate was obtained.
ESI / MS m / e: 378.1 (M + + H, C 18 H 24 N 3 O 4 S).
(2) A crude product of ethyl 2- [4-isobutoxy-3- (N′-hydroxycarbamimidoyl) phenyl] -4-methyl-1,3-thiazole-5-carboxylate was suspended in 1 mL of pyridine, To the reaction solution, 9.4 mg of acetyl chloride was added and heated at 100 ° C. for 6 hours under a nitrogen atmosphere. The reaction mixture was concentrated under reduced pressure and extracted with water and ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure to give ethyl 4-methyl-2- [4-isobutoxy-3- (5-methyl-1,2,4-oxadiazol-3-yl) phenyl. ] A crude product of 1,3-thiazole-5-carboxylate was obtained.
ESI / MS m / e: 402.1 (M + + H, C 20 H 24 N 3 O 4 S)
(3) Ethyl 4-methyl-2- [4-isobutoxy-3- (5-methyl-1,2,4-oxadiazol-3-yl) phenyl] -1,3-thiazole-obtained above The crude product of 5-carboxylate was dissolved in 1 mL of a mixed solution of tetrahydrofuran / methanol = 1/1, 0.2 mL of 2M aqueous sodium hydroxide solution was added, and the mixture was stirred at room temperature for 4 hours. To the reaction mixture was added 0.2 mL of 2M hydrochloric acid, and 3 mL of water and 4 mL of ethyl acetate were added and stirred. The organic phase was concentrated and then purified by a conventional method, and 2- [4-isobutoxy-3- (5-methyl- There were obtained 20.6 mg of 1,2,4-oxadiazol-3-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid.
1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 1.02 (6H, d, J = 6.4 Hz), 2.02-2.10 (1H, m), 2.66 (3H, s), 3.95 (2H, d, J = 6.0 Hz), 7.30 (1H, d, J = 8.8 Hz), 8.05 (1H, dd, J = 2.4, 8.8 Hz) ), 8.51 (1H, d, J = 2.4 Hz), 13.34 (1H, brs)
HPLC retention time: 12.40 minutes Obs Mass (M + + H): 347.1156
Pred Mass (M + + H): 347.1169
Formula (M): C 18 H 19 N 3 O 4 S
(1)エチル 2-[3-シアノ-4-イソブトキシフェニル]-4-メチル-1,3-チアゾール-5-カルボキシレート34.4mgにヒドロキシルアミン・1塩酸塩8.2mgを加え、ピリジン1mLに懸濁させ、窒素雰囲気下、110℃で14時間加熱した。反応混合液を減圧濃縮して、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、エチル 2-[4-イソブトキ-3-(N’-ヒドロキシカルバミミドイル)フェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートの粗体を得た。
ESI/MS m/e:378.1(M++H,C18H24N3O4S).
(2)エチル 2-[4-イソブトキ-3-(N’-ヒドロキシカルバミミドイル)フェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートの粗体をピリジン1mLに懸濁させ、反応溶液にアセチルクロリド9.4mgを加え、窒素雰囲気下、100℃で6時間加熱した。反応混合液を減圧濃縮して、水と酢酸エチルを加えて抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、エチル 4-メチル-2-[4-イソブトキ-3-(5-メチル-1,2,4-オキサジアゾール-3-イル)フェニル]-1,3-チアゾール-5-カルボキシレートの粗体を得た。
ESI/MS m/e:402.1(M++H,C20H24N3O4S)
(3)上記で得られたエチル 4-メチル-2-[4-イソブトキ-3-(5-メチル-1,2,4-オキサジアゾール-3-イル)フェニル]-1,3-チアゾール-5-カルボキシレートの粗体をテトラヒドロフラン/メタノール=1/1の混合溶液1mLに溶解し、2M水酸化ナトリウム水溶液0.2mLを加えて、室温で4時間撹拌した。反応混合液に2M塩酸0.2mLを加え、水3mL、酢酸エチル4mLを加えて撹拌し、有機相を濃縮した後に常法により精製し、2-[4-イソブトキシ-3-(5-メチル-1,2,4-オキサジアゾール-3-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸20.6mgを得た。
1H-NMR(400MHz,DMSO d6)δ(ppm):1.02(6H,d,J=6.4Hz),2.02-2.10(1H,m),2.66(3H,s),3.95(2H,d,J=6.0Hz),7.30(1H,d,J=8.8Hz),8.05(1H,dd,J= 2.4,8.8Hz),8.51(1H,d,J=2.4Hz),13.34(1H,brs)
HPLC保持時間:12.40分
Obs Mass(M++H):347.1156
Pred Mass(M++H):347.1169
Formula(M):C18H19N3O4S [Example 144] 2- [4-Isobutoxy-3- (5-methyl-1,2,4-oxadiazol-3-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid Synthesis of (Compound No. 144 ) (Synthesis Method E)
(1) 8.2 mg of hydroxylamine monohydrochloride is added to 34.4 mg of ethyl 2- [3-cyano-4-isobutoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylate, and 1 mL of pyridine is added. And heated at 110 ° C. for 14 hours under a nitrogen atmosphere. The reaction mixture was concentrated under reduced pressure, and the resulting crude product was separated and purified by silica gel column chromatography to obtain ethyl 2- [4-isobutoxy-3- (N′-hydroxycarbamimidoyl) phenyl] -4- A crude product of methyl-1,3-thiazole-5-carboxylate was obtained.
ESI / MS m / e: 378.1 (M + + H, C 18 H 24 N 3 O 4 S).
(2) A crude product of ethyl 2- [4-isobutoxy-3- (N′-hydroxycarbamimidoyl) phenyl] -4-methyl-1,3-thiazole-5-carboxylate was suspended in 1 mL of pyridine, To the reaction solution, 9.4 mg of acetyl chloride was added and heated at 100 ° C. for 6 hours under a nitrogen atmosphere. The reaction mixture was concentrated under reduced pressure and extracted with water and ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure to give ethyl 4-methyl-2- [4-isobutoxy-3- (5-methyl-1,2,4-oxadiazol-3-yl) phenyl. ] A crude product of 1,3-thiazole-5-carboxylate was obtained.
ESI / MS m / e: 402.1 (M + + H, C 20 H 24 N 3 O 4 S)
(3) Ethyl 4-methyl-2- [4-isobutoxy-3- (5-methyl-1,2,4-oxadiazol-3-yl) phenyl] -1,3-thiazole-obtained above The crude product of 5-carboxylate was dissolved in 1 mL of a mixed solution of tetrahydrofuran / methanol = 1/1, 0.2 mL of 2M aqueous sodium hydroxide solution was added, and the mixture was stirred at room temperature for 4 hours. To the reaction mixture was added 0.2 mL of 2M hydrochloric acid, and 3 mL of water and 4 mL of ethyl acetate were added and stirred. The organic phase was concentrated and then purified by a conventional method, and 2- [4-isobutoxy-3- (5-methyl- There were obtained 20.6 mg of 1,2,4-oxadiazol-3-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid.
1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 1.02 (6H, d, J = 6.4 Hz), 2.02-2.10 (1H, m), 2.66 (3H, s), 3.95 (2H, d, J = 6.0 Hz), 7.30 (1H, d, J = 8.8 Hz), 8.05 (1H, dd, J = 2.4, 8.8 Hz) ), 8.51 (1H, d, J = 2.4 Hz), 13.34 (1H, brs)
HPLC retention time: 12.40 minutes Obs Mass (M + + H): 347.1156
Pred Mass (M + + H): 347.1169
Formula (M): C 18 H 19 N 3 O 4 S
[実施例145]2-(4-イソブトキシ-3-イソオキサゾール-3-イル-フェニル)-4-メチル-1,3-チアゾール-5-カルボン酸(化合物番号145)の合成(合成法F)
(1)エチル 2-(3-ホルミル-4-イソブトキシフェニル)-4-メチル-1,3-チアゾール-5-カルボキシレート173.7mgにヒドロキシルアミン・1水和物30.6mgを加え、ピリジン2mLに懸濁させ、窒素雰囲気下、100℃で2時間加熱した。反応混合液を減圧濃縮して、エチル 2-[3-(ヒドロキシイミノ)メチル-4-イソブトキシフェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートの粗体を得た。
ESI/MS m/e:363.1(M++H,C18H23N2O4S)
(2)エチル 2-[3-(ヒドロキシイミノ)メチル-4-イソブトキシフェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートの粗体をジメチルホルムアミド2mLに懸濁させ、反応溶液にN-クロロスクシンイミド100.1mgを加え、窒素雰囲気下、100℃で14時間加熱した。反応混合液に水と酢酸エチルを加えて抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、エチル 2-[3-クロロ(ヒドロキシイミノ)メチル-4-イソブトキシフェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートの粗体を得た。
ESI/MS m/e:397.0、399.0(M++H,C18H22ClN2O4S).
(3)上記で得られたエチル 2-[3-クロロ(ヒドロキシイミノ)メチル-4-イソブトキシフェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートの粗体半分に対して、炭酸カリウム69.1mgを加え、トルエン2mLに懸濁させ、、反応溶液にエチニルトリメチルシラン24.6mgを加え、窒素雰囲気下、110℃で14時間加熱した。反応混合液に水と酢酸エチルを加えて抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、エチル 4-メチル-2-(4-イソブトキシ-3-イソオキサゾール-3-イル)フェニル)-1,3-チアゾール-5-カルボキシレートの粗体を得た。
ESI/MS m/e:387.1(M++H,C20H23N2O4S)
(4)上記で得られたエチル 4-メチル-2-(4-イソブトキシ-3-イソオキサゾール-3-イル)フェニル)-1,3-チアゾール-5-カルボキシレートの粗体をテトラヒドロフラン/メタノール=1/1の混合溶液1mLに溶解し、2M水酸化ナトリウム水溶液0.2mLを加えて、室温で4時間撹拌した。反応混合液に2M塩酸0.2mLを加え、水3mL、酢酸エチル4mLを加えて撹拌し、有機相を濃縮した後に常法により精製し、2-(4-イソブトキシ-3-イソオキサゾール-3-イル-フェニル)-4-メチル-1,3-チアゾール-5-カルボン酸25.7mgを得た。
1H-NMR(400MHz,DMSO d6)δ(ppm):0.99(6H,d,J=6.4Hz),2.07-2.13(1H,m),2.66(3H,s),3.95(2H,d,J=6.4Hz),6.96-6.97(1H,m),7.31(1H,d,J=8.8Hz),8.05(1H,dd,J= 2.4,8.8Hz),8.34(1H,d,J=2.4Hz),13.34(1H,brs)
HPLC保持時間:12.60分
Obs Mass(M++H):359.1062
Pred Mass(M++H):359.1060
Formula(M):C18H18N2O4S Example 145 Synthesis of 2- (4-isobutoxy-3-isoxazol-3-yl-phenyl) -4-methyl-1,3-thiazole-5-carboxylic acid (Compound No. 145 ) (Synthesis Method F)
(1) Ethyl 2- (3-formyl-4-isobutoxyphenyl) -4-methyl-1,3-thiazole-5-carboxylate is added to 33.7 mg of hydroxylamine monohydrate to 173.7 mg of pyridine It was suspended in 2 mL and heated at 100 ° C. for 2 hours under a nitrogen atmosphere. The reaction mixture was concentrated under reduced pressure to obtain a crude product of ethyl 2- [3- (hydroxyimino) methyl-4-isobutoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylate.
ESI / MS m / e: 363.1 (M + + H, C 18 H 23 N 2 O 4 S)
(2) A crude product of ethyl 2- [3- (hydroxyimino) methyl-4-isobutoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylate is suspended in 2 mL of dimethylformamide, and the reaction solution Was added with 100.1 mg of N-chlorosuccinimide and heated at 100 ° C. for 14 hours in a nitrogen atmosphere. Water and ethyl acetate were added to the reaction mixture for extraction. The organic layer is washed with brine, dried and concentrated under reduced pressure to give ethyl 2- [3-chloro (hydroxyimino) methyl-4-isobutoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylate. A crude product was obtained.
ESI / MS m / e: 397.0, 399.0 (M + + H, C 18 H 22 ClN 2 O 4 S).
(3) For the crude half of ethyl 2- [3-chloro (hydroxyimino) methyl-4-isobutoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylate obtained above, 69.1 mg of potassium carbonate was added, suspended in 2 mL of toluene, and 24.6 mg of ethynyltrimethylsilane was added to the reaction solution, followed by heating at 110 ° C. for 14 hours under a nitrogen atmosphere. Water and ethyl acetate were added to the reaction mixture for extraction. The organic layer is washed with brine, dried and concentrated under reduced pressure to give ethyl 4-methyl-2- (4-isobutoxy-3-isoxazol-3-yl) phenyl) -1,3-thiazole-5-carboxylate A crude product was obtained.
ESI / MS m / e: 387.1 (M + + H, C 20 H 23 N 2 O 4 S)
(4) A crude product of ethyl 4-methyl-2- (4-isobutoxy-3-isoxazol-3-yl) phenyl) -1,3-thiazole-5-carboxylate obtained above was added to tetrahydrofuran / methanol = It melt | dissolved in 1 mL of 1/1 mixed solution, 0.2 mL of 2M sodium hydroxide aqueous solution was added, and it stirred at room temperature for 4 hours. To the reaction mixture, 0.2 mL of 2M hydrochloric acid was added, and 3 mL of water and 4 mL of ethyl acetate were added and stirred. The organic phase was concentrated and then purified by a conventional method, and 2- (4-isobutoxy-3-isoxazole-3- 25.7 mg of (yl-phenyl) -4-methyl-1,3-thiazole-5-carboxylic acid were obtained.
1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 0.99 (6H, d, J = 6.4 Hz), 2.07-2.13 (1H, m), 2.66 (3H, s), 3.95 (2H, d, J = 6.4 Hz), 6.96-6.97 (1H, m), 7.31 (1H, d, J = 8.8 Hz), 8.05 ( 1H, dd, J = 2.4, 8.8 Hz), 8.34 (1H, d, J = 2.4 Hz), 13.34 (1H, brs)
HPLC retention time: 12.60 minutes Obs Mass (M + + H) : 359.1062
Pred Mass (M + + H): 359.1060
Formula (M): C 18 H 18 N 2 O 4 S
(1)エチル 2-(3-ホルミル-4-イソブトキシフェニル)-4-メチル-1,3-チアゾール-5-カルボキシレート173.7mgにヒドロキシルアミン・1水和物30.6mgを加え、ピリジン2mLに懸濁させ、窒素雰囲気下、100℃で2時間加熱した。反応混合液を減圧濃縮して、エチル 2-[3-(ヒドロキシイミノ)メチル-4-イソブトキシフェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートの粗体を得た。
ESI/MS m/e:363.1(M++H,C18H23N2O4S)
(2)エチル 2-[3-(ヒドロキシイミノ)メチル-4-イソブトキシフェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートの粗体をジメチルホルムアミド2mLに懸濁させ、反応溶液にN-クロロスクシンイミド100.1mgを加え、窒素雰囲気下、100℃で14時間加熱した。反応混合液に水と酢酸エチルを加えて抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、エチル 2-[3-クロロ(ヒドロキシイミノ)メチル-4-イソブトキシフェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートの粗体を得た。
ESI/MS m/e:397.0、399.0(M++H,C18H22ClN2O4S).
(3)上記で得られたエチル 2-[3-クロロ(ヒドロキシイミノ)メチル-4-イソブトキシフェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートの粗体半分に対して、炭酸カリウム69.1mgを加え、トルエン2mLに懸濁させ、、反応溶液にエチニルトリメチルシラン24.6mgを加え、窒素雰囲気下、110℃で14時間加熱した。反応混合液に水と酢酸エチルを加えて抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、エチル 4-メチル-2-(4-イソブトキシ-3-イソオキサゾール-3-イル)フェニル)-1,3-チアゾール-5-カルボキシレートの粗体を得た。
ESI/MS m/e:387.1(M++H,C20H23N2O4S)
(4)上記で得られたエチル 4-メチル-2-(4-イソブトキシ-3-イソオキサゾール-3-イル)フェニル)-1,3-チアゾール-5-カルボキシレートの粗体をテトラヒドロフラン/メタノール=1/1の混合溶液1mLに溶解し、2M水酸化ナトリウム水溶液0.2mLを加えて、室温で4時間撹拌した。反応混合液に2M塩酸0.2mLを加え、水3mL、酢酸エチル4mLを加えて撹拌し、有機相を濃縮した後に常法により精製し、2-(4-イソブトキシ-3-イソオキサゾール-3-イル-フェニル)-4-メチル-1,3-チアゾール-5-カルボン酸25.7mgを得た。
1H-NMR(400MHz,DMSO d6)δ(ppm):0.99(6H,d,J=6.4Hz),2.07-2.13(1H,m),2.66(3H,s),3.95(2H,d,J=6.4Hz),6.96-6.97(1H,m),7.31(1H,d,J=8.8Hz),8.05(1H,dd,J= 2.4,8.8Hz),8.34(1H,d,J=2.4Hz),13.34(1H,brs)
HPLC保持時間:12.60分
Obs Mass(M++H):359.1062
Pred Mass(M++H):359.1060
Formula(M):C18H18N2O4S Example 145 Synthesis of 2- (4-isobutoxy-3-isoxazol-3-yl-phenyl) -4-methyl-1,3-thiazole-5-carboxylic acid (Compound No. 145 ) (Synthesis Method F)
(1) Ethyl 2- (3-formyl-4-isobutoxyphenyl) -4-methyl-1,3-thiazole-5-carboxylate is added to 33.7 mg of hydroxylamine monohydrate to 173.7 mg of pyridine It was suspended in 2 mL and heated at 100 ° C. for 2 hours under a nitrogen atmosphere. The reaction mixture was concentrated under reduced pressure to obtain a crude product of ethyl 2- [3- (hydroxyimino) methyl-4-isobutoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylate.
ESI / MS m / e: 363.1 (M + + H, C 18 H 23 N 2 O 4 S)
(2) A crude product of ethyl 2- [3- (hydroxyimino) methyl-4-isobutoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylate is suspended in 2 mL of dimethylformamide, and the reaction solution Was added with 100.1 mg of N-chlorosuccinimide and heated at 100 ° C. for 14 hours in a nitrogen atmosphere. Water and ethyl acetate were added to the reaction mixture for extraction. The organic layer is washed with brine, dried and concentrated under reduced pressure to give ethyl 2- [3-chloro (hydroxyimino) methyl-4-isobutoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylate. A crude product was obtained.
ESI / MS m / e: 397.0, 399.0 (M + + H, C 18 H 22 ClN 2 O 4 S).
(3) For the crude half of ethyl 2- [3-chloro (hydroxyimino) methyl-4-isobutoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylate obtained above, 69.1 mg of potassium carbonate was added, suspended in 2 mL of toluene, and 24.6 mg of ethynyltrimethylsilane was added to the reaction solution, followed by heating at 110 ° C. for 14 hours under a nitrogen atmosphere. Water and ethyl acetate were added to the reaction mixture for extraction. The organic layer is washed with brine, dried and concentrated under reduced pressure to give ethyl 4-methyl-2- (4-isobutoxy-3-isoxazol-3-yl) phenyl) -1,3-thiazole-5-carboxylate A crude product was obtained.
ESI / MS m / e: 387.1 (M + + H, C 20 H 23 N 2 O 4 S)
(4) A crude product of ethyl 4-methyl-2- (4-isobutoxy-3-isoxazol-3-yl) phenyl) -1,3-thiazole-5-carboxylate obtained above was added to tetrahydrofuran / methanol = It melt | dissolved in 1 mL of 1/1 mixed solution, 0.2 mL of 2M sodium hydroxide aqueous solution was added, and it stirred at room temperature for 4 hours. To the reaction mixture, 0.2 mL of 2M hydrochloric acid was added, and 3 mL of water and 4 mL of ethyl acetate were added and stirred. The organic phase was concentrated and then purified by a conventional method, and 2- (4-isobutoxy-3-isoxazole-3- 25.7 mg of (yl-phenyl) -4-methyl-1,3-thiazole-5-carboxylic acid were obtained.
1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 0.99 (6H, d, J = 6.4 Hz), 2.07-2.13 (1H, m), 2.66 (3H, s), 3.95 (2H, d, J = 6.4 Hz), 6.96-6.97 (1H, m), 7.31 (1H, d, J = 8.8 Hz), 8.05 ( 1H, dd, J = 2.4, 8.8 Hz), 8.34 (1H, d, J = 2.4 Hz), 13.34 (1H, brs)
HPLC retention time: 12.60 minutes Obs Mass (M + + H) : 359.1062
Pred Mass (M + + H): 359.1060
Formula (M): C 18 H 18 N 2 O 4 S
[実施例146]
実施例145と同様にして、化合物番号146を合成した。 [Example 146]
Compound No. 146 was synthesized in the same manner as Example 145.
実施例145と同様にして、化合物番号146を合成した。 [Example 146]
Compound No. 146 was synthesized in the same manner as Example 145.
[実施例147]2-[4-イソブトキシ-3-(1,2,4-オキサジアゾール-3-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸(化合物番号147)の合成(合成法E)
(1)エチル 2-[3-シアノ-4-イソブトキシフェニル]-4-メチル-1,3-チアゾール-5-カルボキシレート68.9mgにヒドロキシルアミン・1水和物12.8mgを加え、ピリジン1mLに懸濁させ、窒素雰囲気下、100℃で8時間加熱した。反応混合液を減圧濃縮して、エチル 2-[3-(N’-ヒドロキシカルバミミドイル)-4-イソブトキシフェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートの粗体を得た。
ESI/MS m/e:378.1(M++H,C18H24N3O4S)
(2)エチル 2-[3-(N’-ヒドロキシカルバミミドイル)-4-イソブトキシフェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートの粗体をトリフルオロ酢酸1mLに溶解させ、反応溶液にオルソギ酸トリメチル42.4mgを加え、窒素雰囲気下、80℃で4時間加熱した。室温まで冷却させた後、生じた固体をろ取し、乾燥、減圧濃縮することにより、2-[4-イソブトキシ-3-(1,2,4-オキサジアゾール-3-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸47.5mgを得た。
1H-NMR(400MHz,DMSO d6)δ(ppm):1.02(6H,d,J=6.4Hz),2.04-2.10(1H,m),2.67(3H,s),3.98(2H,d,J=6.4Hz),7.34(1H,d,J=8.8Hz),8.10(1H,dd,J=2.0,8.8Hz),8.53(1H,d,J=2.4Hz),9.71(1H,s),13.34(1H,s)
HPLC保持時間:12.02分
Obs Mass(M++H):360.0999
Pred Mass(M++H):360.1013
Formula(M):C17H17N3O4S [Example 147] 2- [4-Isobutoxy-3- (1,2,4-oxadiazol-3-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid (Compound No. 147) ) (Synthesis method E)
(1) Add 12.8 mg of hydroxylamine monohydrate to 68.9 mg of ethyl 2- [3-cyano-4-isobutoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylate, and add pyridine It was suspended in 1 mL and heated at 100 ° C. for 8 hours under a nitrogen atmosphere. The reaction mixture was concentrated under reduced pressure to give a crude product of ethyl 2- [3- (N′-hydroxycarbamimidoyl) -4-isobutoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylate. Obtained.
ESI / MS m / e: 378.1 (M + + H, C 18 H 24 N 3 O 4 S)
(2) A crude product of ethyl 2- [3- (N′-hydroxycarbamimidoyl) -4-isobutoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylate was dissolved in 1 mL of trifluoroacetic acid. Then, 42.4 mg of trimethyl orthoformate was added to the reaction solution, and the mixture was heated at 80 ° C. for 4 hours under a nitrogen atmosphere. After cooling to room temperature, the resulting solid is collected by filtration, dried and concentrated under reduced pressure to give 2- [4-isobutoxy-3- (1,2,4-oxadiazol-3-yl) phenyl]- 47.5 mg of 4-methyl-1,3-thiazole-5-carboxylic acid was obtained.
1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 1.02 (6H, d, J = 6.4 Hz), 2.04-2.10 (1H, m), 2.67 (3H, s), 3.98 (2H, d, J = 6.4 Hz), 7.34 (1H, d, J = 8.8 Hz), 8.10 (1H, dd, J = 2.0, 8.8 Hz) ), 8.53 (1H, d, J = 2.4 Hz), 9.71 (1H, s), 13.34 (1H, s)
HPLC retention time: 12.02 minutes Obs Mass (M + + H) : 360.0999
Pred Mass (M + + H): 360.0103
Formula (M): C 17 H 17 N 3 O 4 S
(1)エチル 2-[3-シアノ-4-イソブトキシフェニル]-4-メチル-1,3-チアゾール-5-カルボキシレート68.9mgにヒドロキシルアミン・1水和物12.8mgを加え、ピリジン1mLに懸濁させ、窒素雰囲気下、100℃で8時間加熱した。反応混合液を減圧濃縮して、エチル 2-[3-(N’-ヒドロキシカルバミミドイル)-4-イソブトキシフェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートの粗体を得た。
ESI/MS m/e:378.1(M++H,C18H24N3O4S)
(2)エチル 2-[3-(N’-ヒドロキシカルバミミドイル)-4-イソブトキシフェニル]-4-メチル-1,3-チアゾール-5-カルボキシレートの粗体をトリフルオロ酢酸1mLに溶解させ、反応溶液にオルソギ酸トリメチル42.4mgを加え、窒素雰囲気下、80℃で4時間加熱した。室温まで冷却させた後、生じた固体をろ取し、乾燥、減圧濃縮することにより、2-[4-イソブトキシ-3-(1,2,4-オキサジアゾール-3-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸47.5mgを得た。
1H-NMR(400MHz,DMSO d6)δ(ppm):1.02(6H,d,J=6.4Hz),2.04-2.10(1H,m),2.67(3H,s),3.98(2H,d,J=6.4Hz),7.34(1H,d,J=8.8Hz),8.10(1H,dd,J=2.0,8.8Hz),8.53(1H,d,J=2.4Hz),9.71(1H,s),13.34(1H,s)
HPLC保持時間:12.02分
Obs Mass(M++H):360.0999
Pred Mass(M++H):360.1013
Formula(M):C17H17N3O4S [Example 147] 2- [4-Isobutoxy-3- (1,2,4-oxadiazol-3-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid (Compound No. 147) ) (Synthesis method E)
(1) Add 12.8 mg of hydroxylamine monohydrate to 68.9 mg of ethyl 2- [3-cyano-4-isobutoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylate, and add pyridine It was suspended in 1 mL and heated at 100 ° C. for 8 hours under a nitrogen atmosphere. The reaction mixture was concentrated under reduced pressure to give a crude product of ethyl 2- [3- (N′-hydroxycarbamimidoyl) -4-isobutoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylate. Obtained.
ESI / MS m / e: 378.1 (M + + H, C 18 H 24 N 3 O 4 S)
(2) A crude product of ethyl 2- [3- (N′-hydroxycarbamimidoyl) -4-isobutoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylate was dissolved in 1 mL of trifluoroacetic acid. Then, 42.4 mg of trimethyl orthoformate was added to the reaction solution, and the mixture was heated at 80 ° C. for 4 hours under a nitrogen atmosphere. After cooling to room temperature, the resulting solid is collected by filtration, dried and concentrated under reduced pressure to give 2- [4-isobutoxy-3- (1,2,4-oxadiazol-3-yl) phenyl]- 47.5 mg of 4-methyl-1,3-thiazole-5-carboxylic acid was obtained.
1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 1.02 (6H, d, J = 6.4 Hz), 2.04-2.10 (1H, m), 2.67 (3H, s), 3.98 (2H, d, J = 6.4 Hz), 7.34 (1H, d, J = 8.8 Hz), 8.10 (1H, dd, J = 2.0, 8.8 Hz) ), 8.53 (1H, d, J = 2.4 Hz), 9.71 (1H, s), 13.34 (1H, s)
HPLC retention time: 12.02 minutes Obs Mass (M + + H) : 360.0999
Pred Mass (M + + H): 360.0103
Formula (M): C 17 H 17 N 3 O 4 S
[実施例148]2-[4-イソブトキシ-3-(3-メチル-1,2,4-オキサジアゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸(化合物番号148)の合成(合成法G)
(1)メチル 5-ブロモ-2-ヒドロキシベンゾエート1.16gおよび炭酸カリウム1.04gをジメチルホルムアミド20mLに懸濁させ、窒素雰囲気下、臭化イソブチル1.03gを加えて、100℃で14時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、メチル 5-ブロモ-2-イソブトキシベンゾエートの粗体2.65gを得た。
(2)メチル 5-ブロモ-2-イソブトキシベンゾエートの粗体2.65gをテトラヒドロフラン/メタノール=1/1の混合溶液20mLに溶解し、2M水酸化ナトリウム水溶液5.0mLを加えて、室温で3時間撹拌した。反応混合液に2M塩酸5.0mLを加え、水20mL、酢酸エチル40mLを加えて撹拌し、有機相を濃縮し、5-ブロモ-2-イソブトキシ安息香酸の粗体1.50gを得た。
(3)上記で得られた5-ブロモ-2-イソブトキシ安息香酸の粗体1.50gを塩化メチレン20mLに懸濁させ、反応混合液に塩化チオニル87.7μMを加えて、窒素雰囲気下、室温で2時間撹拌した。反応混合液を減圧濃縮して5-ブロモ-2-イソブトキシベンゾイルクロリドの粗体を得た。
(4)上記で得られた5-ブロモ-2-イソブトキシベンゾイルクロリド291.6mgをピリジン2.0mLに懸濁させ、アセトニトリルとヒドロキシルアミン・1水和物から調製したN’-ヒドロキシエタンイミドアミド148.1mgを加えた後に、窒素雰囲気下、100℃で3時間撹拌した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮して、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、5-(5-ブロモ-2-イソブトキシフェニル)-3-メチル-1,2,4-オキサジアゾール79.3mgを得た。
ESI/MS m/e:311.0,313.0(M++H,C13H16BrN2O2).
(5)上記で得られた5-(5-ブロモ-2-イソブトキシフェニル)-3-メチル-1,2,4-オキサジアゾール31.1mgに炭酸水素化カリウム21mg、塩化パラジウム(II)0.9mg、臭化銅(I)4.1mgを加え、トルエン1mLに懸濁させた。その後にエチル 4-メチル-1-1,3-チアゾール-5-カルボキシレート37.5mg、イソ酪酸1.9μL及びジ-t-ブチルシクロヘキシルホスフィン4.6mgを加えて、窒素雰囲気下、120℃で8時間加熱した。反応混合液をセライトろ過して不溶物を取り除き、ろ液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮した後に常法により精製し、エチル 4-メチル-2-[4-イソブトキシ-3-(3-メチル-1,2,4-オキサジアゾール-5-イル)フェニル]-1,3-チアゾール-5-カルボキシレート29.1mgを得た。
ESI/MS m/e:402.1(M++H,C20H24N3O4S)
(6)エチル 4-メチル-2-[4-イソブトキシ-3-(3-メチル-1,2,4-オキサジアゾール-5-イル)フェニル]-1,3-チアゾール-5-カルボキシレート29.1mgをテトラヒドロフラン/メタノール=1/1の混合溶液1.0mLに溶解し、2M水酸化ナトリウム水溶液0.2mLを加えて、室温で3時間撹拌した。反応混合液に2M塩酸0.2mLを加え、水2mL、酢酸エチル4mLを加えて撹拌し、有機相を濃縮した後に常法により精製し、2-[4-イソブトキシ-3-(3-メチル-1,2,4-オキサジアゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸17.7mgを得た。
1H-NMR(400MHz,DMSO d6)δ(ppm):1.03(6H,d,J=6.4Hz),2.06-2.12(1H,m),2.42(3H,s),2.66(3H,s),4.00(2H,d,J=6.4Hz),7.38(1H,d,J=8.8Hz),8.15(1H,dd,J=2.4,8.8Hz),8.55(1H,d,J=2.0Hz),13.37(1H,brs)
HPLC保持時間:12.76分
Obs Mass(M++H):374.1156
Pred Mass(M++H):374.1169
Formula(M):C18H19N3O4S [Example 148] 2- [4-Isobutoxy-3- (3-methyl-1,2,4-oxadiazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid Synthesis of (Compound No. 148 ) (Synthesis Method G)
(1) Suspend 1.16 g of methyl 5-bromo-2-hydroxybenzoate and 1.04 g of potassium carbonate in 20 mL of dimethylformamide, add 1.03 g of isobutyl bromide in a nitrogen atmosphere, and heat at 100 ° C. for 14 hours. did. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried and concentrated under reduced pressure to obtain 2.65 g of a crude product of methyl 5-bromo-2-isobutoxybenzoate.
(2) 2.65 g of a crude product of methyl 5-bromo-2-isobutoxybenzoate was dissolved in 20 mL of a mixed solution of tetrahydrofuran / methanol = 1/1. Stir for hours. To the reaction mixture, 2 M hydrochloric acid (5.0 mL) was added, water (20 mL) and ethyl acetate (40 mL) were added and stirred, and the organic phase was concentrated to obtain a crude product of 5-bromo-2-isobutoxybenzoic acid (1.50 g).
(3) 1.50 g of the crude 5-bromo-2-isobutoxybenzoic acid obtained above is suspended in 20 mL of methylene chloride, 87.7 μM of thionyl chloride is added to the reaction mixture, and the mixture is stirred at room temperature under a nitrogen atmosphere. For 2 hours. The reaction mixture was concentrated under reduced pressure to obtain a crude product of 5-bromo-2-isobutoxybenzoyl chloride.
(4) N'-hydroxyethaneimidoamide prepared from acetonitrile and hydroxylamine monohydrate by suspending 291.6 mg of 5-bromo-2-isobutoxybenzoyl chloride obtained above in 2.0 mL of pyridine After adding 148.1 mg, the mixture was stirred at 100 ° C. for 3 hours under a nitrogen atmosphere. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure, and the resulting crude product is separated and purified by silica gel column chromatography to give 5- (5-bromo-2-isobutoxyphenyl) -3-methyl. As a result, 79.3 mg of -1,2,4-oxadiazole was obtained.
ESI / MS m / e: 311.0,313.0 (M + + H, C 13 H 16 BrN 2 O 2).
(5) 31.1 mg of 5- (5-bromo-2-isobutoxyphenyl) -3-methyl-1,2,4-oxadiazole obtained above, 21 mg of potassium hydrogencarbonate, palladium (II) chloride 0.9 mg and 4.1 mg of copper (I) bromide were added and suspended in 1 mL of toluene. Thereafter, 37.5 mg of ethyl 4-methyl-1-1,3-thiazole-5-carboxylate, 1.9 μL of isobutyric acid and 4.6 mg of di-t-butylcyclohexylphosphine were added, and the reaction was performed at 120 ° C. under a nitrogen atmosphere. Heated for 8 hours. The reaction mixture was filtered through Celite to remove insolubles, water was added to the filtrate, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried, concentrated under reduced pressure, and purified by a conventional method. Ethyl 4-methyl-2- [4-isobutoxy-3- (3-methyl-1,2,4-oxadiazole- There were obtained 29.1 mg of 5-yl) phenyl] -1,3-thiazole-5-carboxylate.
ESI / MS m / e: 402.1 (M + + H, C 20 H 24 N 3 O 4 S)
(6) Ethyl 4-methyl-2- [4-isobutoxy-3- (3-methyl-1,2,4-oxadiazol-5-yl) phenyl] -1,3-thiazole-5-carboxylate 29 0.1 mg was dissolved in 1.0 mL of a mixed solution of tetrahydrofuran / methanol = 1/1, 0.2 mL of 2M aqueous sodium hydroxide solution was added, and the mixture was stirred at room temperature for 3 hours. To the reaction mixture was added 0.2 mL of 2M hydrochloric acid, and 2 mL of water and 4 mL of ethyl acetate were added and stirred. The organic phase was concentrated and purified by a conventional method, and 2- [4-isobutoxy-3- (3-methyl- 17.7 mg of 1,2,4-oxadiazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid was obtained.
1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 1.03 (6H, d, J = 6.4 Hz), 2.06-2.12 (1H, m), 2.42 (3H, s), 2.66 (3H, s), 4.00 (2H, d, J = 6.4 Hz), 7.38 (1H, d, J = 8.8 Hz), 8.15 (1H, dd, J = 2.4, 8.8 Hz), 8.55 (1H, d, J = 2.0 Hz), 13.37 (1H, brs)
HPLC retention time: 12.76 minutes Obs Mass (M + + H) : 374.1156
Pred Mass (M + + H): 374.1169
Formula (M): C 18 H 19 N 3 O 4 S
(1)メチル 5-ブロモ-2-ヒドロキシベンゾエート1.16gおよび炭酸カリウム1.04gをジメチルホルムアミド20mLに懸濁させ、窒素雰囲気下、臭化イソブチル1.03gを加えて、100℃で14時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、メチル 5-ブロモ-2-イソブトキシベンゾエートの粗体2.65gを得た。
(2)メチル 5-ブロモ-2-イソブトキシベンゾエートの粗体2.65gをテトラヒドロフラン/メタノール=1/1の混合溶液20mLに溶解し、2M水酸化ナトリウム水溶液5.0mLを加えて、室温で3時間撹拌した。反応混合液に2M塩酸5.0mLを加え、水20mL、酢酸エチル40mLを加えて撹拌し、有機相を濃縮し、5-ブロモ-2-イソブトキシ安息香酸の粗体1.50gを得た。
(3)上記で得られた5-ブロモ-2-イソブトキシ安息香酸の粗体1.50gを塩化メチレン20mLに懸濁させ、反応混合液に塩化チオニル87.7μMを加えて、窒素雰囲気下、室温で2時間撹拌した。反応混合液を減圧濃縮して5-ブロモ-2-イソブトキシベンゾイルクロリドの粗体を得た。
(4)上記で得られた5-ブロモ-2-イソブトキシベンゾイルクロリド291.6mgをピリジン2.0mLに懸濁させ、アセトニトリルとヒドロキシルアミン・1水和物から調製したN’-ヒドロキシエタンイミドアミド148.1mgを加えた後に、窒素雰囲気下、100℃で3時間撹拌した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮して、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、5-(5-ブロモ-2-イソブトキシフェニル)-3-メチル-1,2,4-オキサジアゾール79.3mgを得た。
ESI/MS m/e:311.0,313.0(M++H,C13H16BrN2O2).
(5)上記で得られた5-(5-ブロモ-2-イソブトキシフェニル)-3-メチル-1,2,4-オキサジアゾール31.1mgに炭酸水素化カリウム21mg、塩化パラジウム(II)0.9mg、臭化銅(I)4.1mgを加え、トルエン1mLに懸濁させた。その後にエチル 4-メチル-1-1,3-チアゾール-5-カルボキシレート37.5mg、イソ酪酸1.9μL及びジ-t-ブチルシクロヘキシルホスフィン4.6mgを加えて、窒素雰囲気下、120℃で8時間加熱した。反応混合液をセライトろ過して不溶物を取り除き、ろ液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮した後に常法により精製し、エチル 4-メチル-2-[4-イソブトキシ-3-(3-メチル-1,2,4-オキサジアゾール-5-イル)フェニル]-1,3-チアゾール-5-カルボキシレート29.1mgを得た。
ESI/MS m/e:402.1(M++H,C20H24N3O4S)
(6)エチル 4-メチル-2-[4-イソブトキシ-3-(3-メチル-1,2,4-オキサジアゾール-5-イル)フェニル]-1,3-チアゾール-5-カルボキシレート29.1mgをテトラヒドロフラン/メタノール=1/1の混合溶液1.0mLに溶解し、2M水酸化ナトリウム水溶液0.2mLを加えて、室温で3時間撹拌した。反応混合液に2M塩酸0.2mLを加え、水2mL、酢酸エチル4mLを加えて撹拌し、有機相を濃縮した後に常法により精製し、2-[4-イソブトキシ-3-(3-メチル-1,2,4-オキサジアゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸17.7mgを得た。
1H-NMR(400MHz,DMSO d6)δ(ppm):1.03(6H,d,J=6.4Hz),2.06-2.12(1H,m),2.42(3H,s),2.66(3H,s),4.00(2H,d,J=6.4Hz),7.38(1H,d,J=8.8Hz),8.15(1H,dd,J=2.4,8.8Hz),8.55(1H,d,J=2.0Hz),13.37(1H,brs)
HPLC保持時間:12.76分
Obs Mass(M++H):374.1156
Pred Mass(M++H):374.1169
Formula(M):C18H19N3O4S [Example 148] 2- [4-Isobutoxy-3- (3-methyl-1,2,4-oxadiazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid Synthesis of (Compound No. 148 ) (Synthesis Method G)
(1) Suspend 1.16 g of methyl 5-bromo-2-hydroxybenzoate and 1.04 g of potassium carbonate in 20 mL of dimethylformamide, add 1.03 g of isobutyl bromide in a nitrogen atmosphere, and heat at 100 ° C. for 14 hours. did. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried and concentrated under reduced pressure to obtain 2.65 g of a crude product of methyl 5-bromo-2-isobutoxybenzoate.
(2) 2.65 g of a crude product of methyl 5-bromo-2-isobutoxybenzoate was dissolved in 20 mL of a mixed solution of tetrahydrofuran / methanol = 1/1. Stir for hours. To the reaction mixture, 2 M hydrochloric acid (5.0 mL) was added, water (20 mL) and ethyl acetate (40 mL) were added and stirred, and the organic phase was concentrated to obtain a crude product of 5-bromo-2-isobutoxybenzoic acid (1.50 g).
(3) 1.50 g of the crude 5-bromo-2-isobutoxybenzoic acid obtained above is suspended in 20 mL of methylene chloride, 87.7 μM of thionyl chloride is added to the reaction mixture, and the mixture is stirred at room temperature under a nitrogen atmosphere. For 2 hours. The reaction mixture was concentrated under reduced pressure to obtain a crude product of 5-bromo-2-isobutoxybenzoyl chloride.
(4) N'-hydroxyethaneimidoamide prepared from acetonitrile and hydroxylamine monohydrate by suspending 291.6 mg of 5-bromo-2-isobutoxybenzoyl chloride obtained above in 2.0 mL of pyridine After adding 148.1 mg, the mixture was stirred at 100 ° C. for 3 hours under a nitrogen atmosphere. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure, and the resulting crude product is separated and purified by silica gel column chromatography to give 5- (5-bromo-2-isobutoxyphenyl) -3-methyl. As a result, 79.3 mg of -1,2,4-oxadiazole was obtained.
ESI / MS m / e: 311.0,313.0 (M + + H, C 13 H 16 BrN 2 O 2).
(5) 31.1 mg of 5- (5-bromo-2-isobutoxyphenyl) -3-methyl-1,2,4-oxadiazole obtained above, 21 mg of potassium hydrogencarbonate, palladium (II) chloride 0.9 mg and 4.1 mg of copper (I) bromide were added and suspended in 1 mL of toluene. Thereafter, 37.5 mg of ethyl 4-methyl-1-1,3-thiazole-5-carboxylate, 1.9 μL of isobutyric acid and 4.6 mg of di-t-butylcyclohexylphosphine were added, and the reaction was performed at 120 ° C. under a nitrogen atmosphere. Heated for 8 hours. The reaction mixture was filtered through Celite to remove insolubles, water was added to the filtrate, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried, concentrated under reduced pressure, and purified by a conventional method. Ethyl 4-methyl-2- [4-isobutoxy-3- (3-methyl-1,2,4-oxadiazole- There were obtained 29.1 mg of 5-yl) phenyl] -1,3-thiazole-5-carboxylate.
ESI / MS m / e: 402.1 (M + + H, C 20 H 24 N 3 O 4 S)
(6) Ethyl 4-methyl-2- [4-isobutoxy-3- (3-methyl-1,2,4-oxadiazol-5-yl) phenyl] -1,3-thiazole-5-carboxylate 29 0.1 mg was dissolved in 1.0 mL of a mixed solution of tetrahydrofuran / methanol = 1/1, 0.2 mL of 2M aqueous sodium hydroxide solution was added, and the mixture was stirred at room temperature for 3 hours. To the reaction mixture was added 0.2 mL of 2M hydrochloric acid, and 2 mL of water and 4 mL of ethyl acetate were added and stirred. The organic phase was concentrated and purified by a conventional method, and 2- [4-isobutoxy-3- (3-methyl- 17.7 mg of 1,2,4-oxadiazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid was obtained.
1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 1.03 (6H, d, J = 6.4 Hz), 2.06-2.12 (1H, m), 2.42 (3H, s), 2.66 (3H, s), 4.00 (2H, d, J = 6.4 Hz), 7.38 (1H, d, J = 8.8 Hz), 8.15 (1H, dd, J = 2.4, 8.8 Hz), 8.55 (1H, d, J = 2.0 Hz), 13.37 (1H, brs)
HPLC retention time: 12.76 minutes Obs Mass (M + + H) : 374.1156
Pred Mass (M + + H): 374.1169
Formula (M): C 18 H 19 N 3 O 4 S
[実施例149]1-(4-イソブトキシ-3-チアゾール-5-イル-フェニル)-1H-ピラゾール-4-カルボン酸(化合物番号149)の合成(合成法H)
(1)4-ヒドロキシ-ブロモベンゼン50gおよび水酸化ナトリウム17.3gをジメチルホルムアミド200mLに懸濁させ、窒素雰囲気下、ヨウ化イソブチル66.2gを加えて、60℃で14時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、常法により精製することで1-ブロモ-4-イソブトキシベンゼン34gを得た。
(2)1-ブロモ-4-イソブトキシベンゼン20gをトルエン200mLに溶解し、炭酸カリウム12.0g、ヨウ化銅16.6g、(1R,2R)-1-N,2-N-ジメチルシクロヘキサン-1,2-ジアミン37.2gを加えて、120℃で10時間撹拌した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、常法により精製することで、エチル 1-(4-イソブトキシフェニル)-1H-ピラゾール-4-カルボキシレート9.4gを得た。
(3)上記で得られた1-(4-イソブトキシフェニル)-1H-ピラゾール-4-カルボキシレート9.0gを酢酸50mLに懸濁させ、反応混合液に臭素4.9gを加えて、窒素雰囲気下、60℃で5時間撹拌した。反応混合液を減圧濃縮して飽和炭酸水素ナトリウム水溶液、酢酸エチルを加えて抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、常法により精製することで、エチル 1-(3-ブロモ-4-イソブトキシフェニル)-1H-ピラゾール-4-カルボキシレート9.7gを得た。
(4)上記で得られたエチル 1-(3-ブロモ-4-イソブトキシフェニル)-1H-ピラゾール-4-カルボキシレート2.4gにピナコールジボラン2.48g、酢酸カリウム1.26g、塩化パラジウム-1,1’-ビス(ジフェニルホスフィノ)フェロセン265mgを加え、1,4-ジオキサン30mLに懸濁させ、窒素雰囲気下、100℃で14時間加熱した。その後、反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、常法により精製することで、エチル 1-[4-イソブトキシ-3-(4,4,5,5-テトラメチル-1,3,2-ジオキサボラン-2-イル)フェニル]-1H-ピラゾール-4-カルボキシレート1.4gを得た。
(5)上記で得られたエチル 1-[4-イソブトキシ-3-(4,4,5,5-テトラメチル-1,3,2-ジオキサボラン-2-イル)フェニル]-1H-ピラゾール-4-カルボキシレート200mgに5-ブロモ-1,3-チアゾール119mg、炭酸カリウム134mg、塩化パラジウム-1,1’-ビス(ジフェニルホスフィノ)フェロセン20mgを加え、1,4-ジオキサン3mLと水1mLに懸濁させ、窒素雰囲気下、100℃で14時間加熱した。その後、反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、エチル 1-[4-イソブトキシ-3-(1,3-チアゾール-5-イル)フェニル]-1H-ピラゾール-4-カルボキシレートの粗体を得た。
(6)上記で得られたエチル 1-[4-イソブトキシ-3-(1,3-チアゾール-5-イル)フェニル]-1H-ピラゾール-4-カルボキシレートの粗体をテトラヒドロフラン/メタノール=1/1の混合溶液4.0mLに溶解し、2M水酸化ナトリウム水溶液0.5mLを加えて、室温で3時間撹拌した。反応混合液に2M塩酸0.5mLを加え、水10mL、酢酸エチル15mLを加えて撹拌し、有機相を濃縮した後に常法により精製し、1-[4-イソブトキシ-3-(1,3-チアゾール-5-イル)フェニル]-1H-ピラゾール-4-カルボン酸15.8mgを得た。
1H-NMR(300MHz,DMSO d6)δ(ppm):1.07(6H,d,J=6.9Hz),2.13-2.27(1H,m),3.99(2H,d,J=6.6Hz),7.31(1H,d,J=9.0Hz),7.88(1H,dd,J= 3.0,9.0Hz),8.08(1H,s),8.33(1H,d,J=2.7Hz),8.64(1H,s),9.15(2H,d,J=3.9Hz),12.65(1H,brs)
HPLC保持時間:10.61分
Obs Mass(M++H):344.1051
Pred Mass(M++H):344.1063
Formula(M):C17H17N3O3S [Example 149] Synthesis of 1- (4-isobutoxy-3-thiazol-5-yl-phenyl) -1H-pyrazole-4-carboxylic acid (Compound No. 149 ) (Synthesis Method H)
(1) 50 g of 4-hydroxy-bromobenzene and 17.3 g of sodium hydroxide were suspended in 200 mL of dimethylformamide, 66.2 g of isobutyl iodide was added under a nitrogen atmosphere, and the mixture was heated at 60 ° C. for 14 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried, concentrated under reduced pressure, and purified by a conventional method to obtain 34 g of 1-bromo-4-isobutoxybenzene.
(2) 20 g of 1-bromo-4-isobutoxybenzene is dissolved in 200 mL of toluene, and 12.0 g of potassium carbonate, 16.6 g of copper iodide, (1R, 2R) -1-N, 2-N-dimethylcyclohexane- 17.2-diamine 37.2g was added and it stirred at 120 degreeC for 10 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried, concentrated under reduced pressure, and purified by a conventional method to obtain 9.4 g of ethyl 1- (4-isobutoxyphenyl) -1H-pyrazole-4-carboxylate.
(3) 9.0 g of 1- (4-isobutoxyphenyl) -1H-pyrazole-4-carboxylate obtained above is suspended in 50 mL of acetic acid, 4.9 g of bromine is added to the reaction mixture, and nitrogen is added. The mixture was stirred at 60 ° C. for 5 hours under an atmosphere. The reaction mixture was concentrated under reduced pressure and extracted by adding a saturated aqueous sodium hydrogen carbonate solution and ethyl acetate. The organic layer was washed with brine, dried, concentrated under reduced pressure, and purified by a conventional method to obtain 9.7 g of ethyl 1- (3-bromo-4-isobutoxyphenyl) -1H-pyrazole-4-carboxylate. Got.
(4) 2.4 g of ethyl 1- (3-bromo-4-isobutoxyphenyl) -1H-pyrazole-4-carboxylate obtained above, 2.48 g of pinacol diborane, 1.26 g of potassium acetate, palladium chloride- 265 mg of 1,1′-bis (diphenylphosphino) ferrocene was added, suspended in 30 mL of 1,4-dioxane, and heated at 100 ° C. for 14 hours under a nitrogen atmosphere. Thereafter, water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried, concentrated under reduced pressure, and purified by a conventional method to give ethyl 1- [4-isobutoxy-3- (4,4,5,5-tetramethyl-1,3, 1.4 g of 2-dioxaboran-2-yl) phenyl] -1H-pyrazole-4-carboxylate was obtained.
(5) Ethyl 1- [4-isobutoxy-3- (4,4,5,5-tetramethyl-1,3,2-dioxaboran-2-yl) phenyl] -1H-pyrazole-4 obtained above -To 200 mg of carboxylate, add 119 mg of 5-bromo-1,3-thiazole, 134 mg of potassium carbonate, 20 mg of palladium chloride-1,1'-bis (diphenylphosphino) ferrocene, and suspend in 3 mL of 1,4-dioxane and 1 mL of water. It was made turbid and heated at 100 ° C. for 14 hours under a nitrogen atmosphere. Thereafter, water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried and concentrated under reduced pressure to give crude ethyl 1- [4-isobutoxy-3- (1,3-thiazol-5-yl) phenyl] -1H-pyrazole-4-carboxylate. Got the body.
(6) The crude product of ethyl 1- [4-isobutoxy-3- (1,3-thiazol-5-yl) phenyl] -1H-pyrazole-4-carboxylate obtained above was tetrahydrofuran / methanol = 1 / It melt | dissolved in 4.0 mL of 1 mixed solutions, 0.5 mL of 2M sodium hydroxide aqueous solution was added, and it stirred at room temperature for 3 hours. To the reaction mixture, 0.5 mL of 2M hydrochloric acid was added, and 10 mL of water and 15 mL of ethyl acetate were added and stirred. The organic phase was concentrated and purified by a conventional method, and 1- [4-isobutoxy-3- (1,3- 15.8 mg of thiazol-5-yl) phenyl] -1H-pyrazole-4-carboxylic acid was obtained.
1 H-NMR (300 MHz, DMSO d 6 ) δ (ppm): 1.07 (6H, d, J = 6.9 Hz), 2.13-2.27 (1H, m), 3.99 (2H, d, J = 6.6 Hz), 7.31 (1H, d, J = 9.0 Hz), 7.88 (1H, dd, J = 3.0, 9.0 Hz), 8.08 (1H, s) ), 8.33 (1H, d, J = 2.7 Hz), 8.64 (1H, s), 9.15 (2H, d, J = 3.9 Hz), 12.65 (1H, brs)
HPLC retention time: 10.61 minutes Obs Mass (M + + H) : 344.1051
Pred Mass (M + + H): 344.0106
Formula (M): C 17 H 17 N 3 O 3 S
(1)4-ヒドロキシ-ブロモベンゼン50gおよび水酸化ナトリウム17.3gをジメチルホルムアミド200mLに懸濁させ、窒素雰囲気下、ヨウ化イソブチル66.2gを加えて、60℃で14時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、常法により精製することで1-ブロモ-4-イソブトキシベンゼン34gを得た。
(2)1-ブロモ-4-イソブトキシベンゼン20gをトルエン200mLに溶解し、炭酸カリウム12.0g、ヨウ化銅16.6g、(1R,2R)-1-N,2-N-ジメチルシクロヘキサン-1,2-ジアミン37.2gを加えて、120℃で10時間撹拌した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、常法により精製することで、エチル 1-(4-イソブトキシフェニル)-1H-ピラゾール-4-カルボキシレート9.4gを得た。
(3)上記で得られた1-(4-イソブトキシフェニル)-1H-ピラゾール-4-カルボキシレート9.0gを酢酸50mLに懸濁させ、反応混合液に臭素4.9gを加えて、窒素雰囲気下、60℃で5時間撹拌した。反応混合液を減圧濃縮して飽和炭酸水素ナトリウム水溶液、酢酸エチルを加えて抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、常法により精製することで、エチル 1-(3-ブロモ-4-イソブトキシフェニル)-1H-ピラゾール-4-カルボキシレート9.7gを得た。
(4)上記で得られたエチル 1-(3-ブロモ-4-イソブトキシフェニル)-1H-ピラゾール-4-カルボキシレート2.4gにピナコールジボラン2.48g、酢酸カリウム1.26g、塩化パラジウム-1,1’-ビス(ジフェニルホスフィノ)フェロセン265mgを加え、1,4-ジオキサン30mLに懸濁させ、窒素雰囲気下、100℃で14時間加熱した。その後、反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、常法により精製することで、エチル 1-[4-イソブトキシ-3-(4,4,5,5-テトラメチル-1,3,2-ジオキサボラン-2-イル)フェニル]-1H-ピラゾール-4-カルボキシレート1.4gを得た。
(5)上記で得られたエチル 1-[4-イソブトキシ-3-(4,4,5,5-テトラメチル-1,3,2-ジオキサボラン-2-イル)フェニル]-1H-ピラゾール-4-カルボキシレート200mgに5-ブロモ-1,3-チアゾール119mg、炭酸カリウム134mg、塩化パラジウム-1,1’-ビス(ジフェニルホスフィノ)フェロセン20mgを加え、1,4-ジオキサン3mLと水1mLに懸濁させ、窒素雰囲気下、100℃で14時間加熱した。その後、反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、エチル 1-[4-イソブトキシ-3-(1,3-チアゾール-5-イル)フェニル]-1H-ピラゾール-4-カルボキシレートの粗体を得た。
(6)上記で得られたエチル 1-[4-イソブトキシ-3-(1,3-チアゾール-5-イル)フェニル]-1H-ピラゾール-4-カルボキシレートの粗体をテトラヒドロフラン/メタノール=1/1の混合溶液4.0mLに溶解し、2M水酸化ナトリウム水溶液0.5mLを加えて、室温で3時間撹拌した。反応混合液に2M塩酸0.5mLを加え、水10mL、酢酸エチル15mLを加えて撹拌し、有機相を濃縮した後に常法により精製し、1-[4-イソブトキシ-3-(1,3-チアゾール-5-イル)フェニル]-1H-ピラゾール-4-カルボン酸15.8mgを得た。
1H-NMR(300MHz,DMSO d6)δ(ppm):1.07(6H,d,J=6.9Hz),2.13-2.27(1H,m),3.99(2H,d,J=6.6Hz),7.31(1H,d,J=9.0Hz),7.88(1H,dd,J= 3.0,9.0Hz),8.08(1H,s),8.33(1H,d,J=2.7Hz),8.64(1H,s),9.15(2H,d,J=3.9Hz),12.65(1H,brs)
HPLC保持時間:10.61分
Obs Mass(M++H):344.1051
Pred Mass(M++H):344.1063
Formula(M):C17H17N3O3S [Example 149] Synthesis of 1- (4-isobutoxy-3-thiazol-5-yl-phenyl) -1H-pyrazole-4-carboxylic acid (Compound No. 149 ) (Synthesis Method H)
(1) 50 g of 4-hydroxy-bromobenzene and 17.3 g of sodium hydroxide were suspended in 200 mL of dimethylformamide, 66.2 g of isobutyl iodide was added under a nitrogen atmosphere, and the mixture was heated at 60 ° C. for 14 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried, concentrated under reduced pressure, and purified by a conventional method to obtain 34 g of 1-bromo-4-isobutoxybenzene.
(2) 20 g of 1-bromo-4-isobutoxybenzene is dissolved in 200 mL of toluene, and 12.0 g of potassium carbonate, 16.6 g of copper iodide, (1R, 2R) -1-N, 2-N-dimethylcyclohexane- 17.2-diamine 37.2g was added and it stirred at 120 degreeC for 10 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried, concentrated under reduced pressure, and purified by a conventional method to obtain 9.4 g of ethyl 1- (4-isobutoxyphenyl) -1H-pyrazole-4-carboxylate.
(3) 9.0 g of 1- (4-isobutoxyphenyl) -1H-pyrazole-4-carboxylate obtained above is suspended in 50 mL of acetic acid, 4.9 g of bromine is added to the reaction mixture, and nitrogen is added. The mixture was stirred at 60 ° C. for 5 hours under an atmosphere. The reaction mixture was concentrated under reduced pressure and extracted by adding a saturated aqueous sodium hydrogen carbonate solution and ethyl acetate. The organic layer was washed with brine, dried, concentrated under reduced pressure, and purified by a conventional method to obtain 9.7 g of ethyl 1- (3-bromo-4-isobutoxyphenyl) -1H-pyrazole-4-carboxylate. Got.
(4) 2.4 g of ethyl 1- (3-bromo-4-isobutoxyphenyl) -1H-pyrazole-4-carboxylate obtained above, 2.48 g of pinacol diborane, 1.26 g of potassium acetate, palladium chloride- 265 mg of 1,1′-bis (diphenylphosphino) ferrocene was added, suspended in 30 mL of 1,4-dioxane, and heated at 100 ° C. for 14 hours under a nitrogen atmosphere. Thereafter, water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried, concentrated under reduced pressure, and purified by a conventional method to give ethyl 1- [4-isobutoxy-3- (4,4,5,5-tetramethyl-1,3, 1.4 g of 2-dioxaboran-2-yl) phenyl] -1H-pyrazole-4-carboxylate was obtained.
(5) Ethyl 1- [4-isobutoxy-3- (4,4,5,5-tetramethyl-1,3,2-dioxaboran-2-yl) phenyl] -1H-pyrazole-4 obtained above -To 200 mg of carboxylate, add 119 mg of 5-bromo-1,3-thiazole, 134 mg of potassium carbonate, 20 mg of palladium chloride-1,1'-bis (diphenylphosphino) ferrocene, and suspend in 3 mL of 1,4-dioxane and 1 mL of water. It was made turbid and heated at 100 ° C. for 14 hours under a nitrogen atmosphere. Thereafter, water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried and concentrated under reduced pressure to give crude ethyl 1- [4-isobutoxy-3- (1,3-thiazol-5-yl) phenyl] -1H-pyrazole-4-carboxylate. Got the body.
(6) The crude product of ethyl 1- [4-isobutoxy-3- (1,3-thiazol-5-yl) phenyl] -1H-pyrazole-4-carboxylate obtained above was tetrahydrofuran / methanol = 1 / It melt | dissolved in 4.0 mL of 1 mixed solutions, 0.5 mL of 2M sodium hydroxide aqueous solution was added, and it stirred at room temperature for 3 hours. To the reaction mixture, 0.5 mL of 2M hydrochloric acid was added, and 10 mL of water and 15 mL of ethyl acetate were added and stirred. The organic phase was concentrated and purified by a conventional method, and 1- [4-isobutoxy-3- (1,3- 15.8 mg of thiazol-5-yl) phenyl] -1H-pyrazole-4-carboxylic acid was obtained.
1 H-NMR (300 MHz, DMSO d 6 ) δ (ppm): 1.07 (6H, d, J = 6.9 Hz), 2.13-2.27 (1H, m), 3.99 (2H, d, J = 6.6 Hz), 7.31 (1H, d, J = 9.0 Hz), 7.88 (1H, dd, J = 3.0, 9.0 Hz), 8.08 (1H, s) ), 8.33 (1H, d, J = 2.7 Hz), 8.64 (1H, s), 9.15 (2H, d, J = 3.9 Hz), 12.65 (1H, brs)
HPLC retention time: 10.61 minutes Obs Mass (M + + H) : 344.1051
Pred Mass (M + + H): 344.0106
Formula (M): C 17 H 17 N 3 O 3 S
[実施例150-162]
実施例149と同様にして、化合物番号150-162を合成した。 [Examples 150-162]
In the same manner as in Example 149, Compound No. 150 - was synthesized 162.
実施例149と同様にして、化合物番号150-162を合成した。 [Examples 150-162]
In the same manner as in Example 149, Compound No. 150 - was synthesized 162.
[実施例163]1-(4-イソブトキシ-3-オキサゾール-5-イル-フェニル)-1H-ピラゾール-4-カルボン酸(化合物番号163)の合成(合成法I)
(1)5-ブロモサリシルアルデヒド1.00g、炭酸カリウム1.04mg、2-メチルプロピルブロマイド1.03mgをN,N-ジメチルホルムアミド10.0mLに懸濁させ、窒素雰囲気下、90℃で8時間撹拌した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行うことで、5-ブロモ-2-イソブトキシベンズアルデヒドの粗体を得た。
(2)上記で得られた5-ブロモ-2-イソブトキシベンズアルデヒドにp-トルエンスルホニルメチルイソシアニド1.46gおよび炭酸カリウム1.04gを加え、エタノール12.0mLに懸濁させ、窒素雰囲気下、80℃で13時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、5-(5-ブロモ-2-イソブトキシフェニル)-1,3-オキサゾール574.0mgを得た。
(3)上記で得られた5-(5-ブロモ-2-イソブトキシフェニル)-1,3-オキサゾール29.6mgにエチル 4-ピラゾールカルボキシレート16.8mg、ヨウ化銅(I)1.9mg、(1S,2S)-(+)-N,N‘ジメチルシクロヘキサン-1,2-ジアミン2.84mgおよび炭酸カリウム27.6mgを加え、トルエン0.5mLに懸濁させ、窒素雰囲気下、110℃で13時間撹拌した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を減圧濃縮することでエチル 1-[4-イソブトキシ-3-(1,3-オキサゾール-5-イル)フェニル]-1H-ピラゾール-4-カルボキシレートの粗体を得た。
(4)上記で得られたエチル 1-[4-イソブトキシ-3-(1,3-オキサゾール-5-イル)フェニル]-1H-ピラゾール-4-カルボキシレートをテトラヒドロフラン/メタノール=1:1の混合溶液1.0mLに溶解し、2M水酸化ナトリウム水溶液250uLを加えて、室温で2時間撹拌した。反応混合液に2M塩酸250uLを加え、水2mL、酢酸エチル2mLを加えて撹拌し、有機相を濃縮した後に常法により精製することで1-(4-イソブトキシ-3-オキサゾール-5-イル-フェニル)-1H-ピラゾール-4-カルボン酸19.7mgを得た。
1H-NMR(400MHz,DMSO d6)δ(ppm):1.05(6H,d,J=6.4Hz),2.15-2.22(1H,m),3.99(2H,d,J=6.4Hz),7.29(1H,d,J=8.8Hz),7.60(1H,s),7.88(1H,d,J=8.8Hz),8.05(1H,d、J=1.2Hz),8.21(1H,d、J=1.2Hz),8.50(1H,s),9.01(1H,s),12.61(1H,brs)
HPLC保持時間:10.58分
Obs Mass(M++H):328.1295
Pred Mass(M++H):328.1292
Formula(M):C17H17N3O4 [Example 163] Synthesis of 1- (4-isobutoxy-3-oxazol-5-yl-phenyl) -1H-pyrazole-4-carboxylic acid (Compound No. 163 ) (Synthesis Method I)
(1) 1.00 g of 5-bromosalicylaldehyde, 1.04 mg of potassium carbonate, and 1.03 mg of 2-methylpropyl bromide are suspended in 10.0 mL of N, N-dimethylformamide, and are suspended at 90 ° C. under a nitrogen atmosphere. Stir for hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried and concentrated under reduced pressure to obtain a crude product of 5-bromo-2-isobutoxybenzaldehyde.
(2) To the 5-bromo-2-isobutoxybenzaldehyde obtained above, 1.46 g of p-toluenesulfonylmethyl isocyanide and 1.04 g of potassium carbonate are added and suspended in 12.0 mL of ethanol. Heat at 13 ° C. for 13 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure. The resulting crude product is separated and purified by silica gel column chromatography to give 5- (5-bromo-2-isobutoxyphenyl) -1,3. -574.0 mg of oxazole was obtained.
(3) 29.6 mg of 5- (5-bromo-2-isobutoxyphenyl) -1,3-oxazole obtained above, 16.8 mg of ethyl 4-pyrazolecarboxylate, 1.9 mg of copper (I) iodide , (1S, 2S)-(+)-N, N′dimethylcyclohexane-1,2-diamine (2.84 mg) and potassium carbonate (27.6 mg) were added, suspended in 0.5 mL of toluene, and 110 ° C. under a nitrogen atmosphere. For 13 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was concentrated under reduced pressure to obtain a crude product of ethyl 1- [4-isobutoxy-3- (1,3-oxazol-5-yl) phenyl] -1H-pyrazole-4-carboxylate.
(4) Mixing ethyl 1- [4-isobutoxy-3- (1,3-oxazol-5-yl) phenyl] -1H-pyrazole-4-carboxylate obtained above in tetrahydrofuran / methanol = 1: 1 It melt | dissolved in 1.0 mL of solution, 2 M sodium hydroxide aqueous solution 250uL was added, and it stirred at room temperature for 2 hours. To the reaction mixture was added 2M hydrochloric acid (250 uL), water (2 mL) and ethyl acetate (2 mL) were added and stirred, and the organic phase was concentrated and purified by a conventional method to obtain 1- (4-isobutoxy-3-oxazol-5-yl- 19.7 mg of (phenyl) -1H-pyrazole-4-carboxylic acid was obtained.
1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 1.05 (6H, d, J = 6.4 Hz), 2.15 to 2.22 (1 H, m), 3.99 (2H, d, J = 6.4 Hz), 7.29 (1H, d, J = 8.8 Hz), 7.60 (1H, s), 7.88 (1H, d, J = 8.8 Hz), 8. 05 (1H, d, J = 1.2 Hz), 8.21 (1 H, d, J = 1.2 Hz), 8.50 (1 H, s), 9.01 (1 H, s), 12.61 ( 1H, brs)
HPLC retention time: 10.58 minutes Obs Mass (M + + H) : 328.1295
Pred Mass (M + + H): 328.1292
Formula (M): C 17 H 17 N 3 O 4
(1)5-ブロモサリシルアルデヒド1.00g、炭酸カリウム1.04mg、2-メチルプロピルブロマイド1.03mgをN,N-ジメチルホルムアミド10.0mLに懸濁させ、窒素雰囲気下、90℃で8時間撹拌した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行うことで、5-ブロモ-2-イソブトキシベンズアルデヒドの粗体を得た。
(2)上記で得られた5-ブロモ-2-イソブトキシベンズアルデヒドにp-トルエンスルホニルメチルイソシアニド1.46gおよび炭酸カリウム1.04gを加え、エタノール12.0mLに懸濁させ、窒素雰囲気下、80℃で13時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、5-(5-ブロモ-2-イソブトキシフェニル)-1,3-オキサゾール574.0mgを得た。
(3)上記で得られた5-(5-ブロモ-2-イソブトキシフェニル)-1,3-オキサゾール29.6mgにエチル 4-ピラゾールカルボキシレート16.8mg、ヨウ化銅(I)1.9mg、(1S,2S)-(+)-N,N‘ジメチルシクロヘキサン-1,2-ジアミン2.84mgおよび炭酸カリウム27.6mgを加え、トルエン0.5mLに懸濁させ、窒素雰囲気下、110℃で13時間撹拌した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を減圧濃縮することでエチル 1-[4-イソブトキシ-3-(1,3-オキサゾール-5-イル)フェニル]-1H-ピラゾール-4-カルボキシレートの粗体を得た。
(4)上記で得られたエチル 1-[4-イソブトキシ-3-(1,3-オキサゾール-5-イル)フェニル]-1H-ピラゾール-4-カルボキシレートをテトラヒドロフラン/メタノール=1:1の混合溶液1.0mLに溶解し、2M水酸化ナトリウム水溶液250uLを加えて、室温で2時間撹拌した。反応混合液に2M塩酸250uLを加え、水2mL、酢酸エチル2mLを加えて撹拌し、有機相を濃縮した後に常法により精製することで1-(4-イソブトキシ-3-オキサゾール-5-イル-フェニル)-1H-ピラゾール-4-カルボン酸19.7mgを得た。
1H-NMR(400MHz,DMSO d6)δ(ppm):1.05(6H,d,J=6.4Hz),2.15-2.22(1H,m),3.99(2H,d,J=6.4Hz),7.29(1H,d,J=8.8Hz),7.60(1H,s),7.88(1H,d,J=8.8Hz),8.05(1H,d、J=1.2Hz),8.21(1H,d、J=1.2Hz),8.50(1H,s),9.01(1H,s),12.61(1H,brs)
HPLC保持時間:10.58分
Obs Mass(M++H):328.1295
Pred Mass(M++H):328.1292
Formula(M):C17H17N3O4 [Example 163] Synthesis of 1- (4-isobutoxy-3-oxazol-5-yl-phenyl) -1H-pyrazole-4-carboxylic acid (Compound No. 163 ) (Synthesis Method I)
(1) 1.00 g of 5-bromosalicylaldehyde, 1.04 mg of potassium carbonate, and 1.03 mg of 2-methylpropyl bromide are suspended in 10.0 mL of N, N-dimethylformamide, and are suspended at 90 ° C. under a nitrogen atmosphere. Stir for hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried and concentrated under reduced pressure to obtain a crude product of 5-bromo-2-isobutoxybenzaldehyde.
(2) To the 5-bromo-2-isobutoxybenzaldehyde obtained above, 1.46 g of p-toluenesulfonylmethyl isocyanide and 1.04 g of potassium carbonate are added and suspended in 12.0 mL of ethanol. Heat at 13 ° C. for 13 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure. The resulting crude product is separated and purified by silica gel column chromatography to give 5- (5-bromo-2-isobutoxyphenyl) -1,3. -574.0 mg of oxazole was obtained.
(3) 29.6 mg of 5- (5-bromo-2-isobutoxyphenyl) -1,3-oxazole obtained above, 16.8 mg of ethyl 4-pyrazolecarboxylate, 1.9 mg of copper (I) iodide , (1S, 2S)-(+)-N, N′dimethylcyclohexane-1,2-diamine (2.84 mg) and potassium carbonate (27.6 mg) were added, suspended in 0.5 mL of toluene, and 110 ° C. under a nitrogen atmosphere. For 13 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was concentrated under reduced pressure to obtain a crude product of ethyl 1- [4-isobutoxy-3- (1,3-oxazol-5-yl) phenyl] -1H-pyrazole-4-carboxylate.
(4) Mixing ethyl 1- [4-isobutoxy-3- (1,3-oxazol-5-yl) phenyl] -1H-pyrazole-4-carboxylate obtained above in tetrahydrofuran / methanol = 1: 1 It melt | dissolved in 1.0 mL of solution, 2 M sodium hydroxide aqueous solution 250uL was added, and it stirred at room temperature for 2 hours. To the reaction mixture was added 2M hydrochloric acid (250 uL), water (2 mL) and ethyl acetate (2 mL) were added and stirred, and the organic phase was concentrated and purified by a conventional method to obtain 1- (4-isobutoxy-3-oxazol-5-yl- 19.7 mg of (phenyl) -1H-pyrazole-4-carboxylic acid was obtained.
1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 1.05 (6H, d, J = 6.4 Hz), 2.15 to 2.22 (1 H, m), 3.99 (2H, d, J = 6.4 Hz), 7.29 (1H, d, J = 8.8 Hz), 7.60 (1H, s), 7.88 (1H, d, J = 8.8 Hz), 8. 05 (1H, d, J = 1.2 Hz), 8.21 (1 H, d, J = 1.2 Hz), 8.50 (1 H, s), 9.01 (1 H, s), 12.61 ( 1H, brs)
HPLC retention time: 10.58 minutes Obs Mass (M + + H) : 328.1295
Pred Mass (M + + H): 328.1292
Formula (M): C 17 H 17 N 3 O 4
[実施例164-166]
実施例163と同様にして、化合物番号164-166を合成した。 [Examples 164 to 166]
In the same manner as in Example 163, compound numbers 164 to 166 were synthesized.
実施例163と同様にして、化合物番号164-166を合成した。 [Examples 164 to 166]
In the same manner as in Example 163, compound numbers 164 to 166 were synthesized.
[実施例167]2-[5-フェニル-4-(2H-テトラゾール-5-イル)-2-ピリジル]-1,3-チアゾール-5-カルボン酸(化合物番号167)の合成(合成法J)
(1)5-ブロモ-2-クロロピリジン-4-カルバルデヒド8.80g、フェニルボロン酸5.36gおよび炭酸カリウム11.06gを1,4-ジオキサン/水=4/1の混合溶液100mLに懸濁させ、テトラキス(トリフェニルホスフィン)パラジウム924mgを加え、窒素雰囲気下、80℃で5時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、2-クロロ-5-フェニルピリジン-4-カルバルデヒドを10.80g得た。
1H-NMR(400MHz,CDCl3)δ(ppm):7.3-7.42(2H,m),7.50-7.60(3H,m),7.81(1H,d,J=0.6Hz),8.61(1H,d,J=0.6Hz),9.99(1H,s)
ESI/MS m/e:218.0、220.0(M++H,C12H9ClNO)
(2)2-クロロ-5-フェニルピリジン-4-カルバルデヒド10.80g、ヒドロキシルアミン・1塩酸塩5.56g、ギ酸ナトリウム5.44gをギ酸100mLに懸濁させ、無水酢酸12.2gを加え、窒素雰囲気下、100℃で2時間加熱した。水100mLを加え、常法により精製し、2-クロロ-5-フェニルピリジン-4-カルボニトリルを6.34g得た。
1H-NMR(400MHz,CDCl3)δ(ppm):7.27(1H,s),7.5-7.6(4H,m),7.67(1H,s),8.63(1H,s)
ESI/MS m/e:215.0、217.0(M++H,C12H8ClN2)
(3)2-クロロ-5-フェニルピリジン-4-カルボニトリル3.12gに炭酸水素化カリウム3.06g、塩化パラジウム(II)129mg、臭化銅(I)598mgを加え、トルエン40mLに懸濁させた。その後にエチル 1,3-チアゾール-5-カルボキシレート3.43g、イソ酪酸269μL及びジ-t-ブチルシクロヘキシルホスフィン664mgを加えて、窒素雰囲気下、120℃で6時間加熱した。反応混合液をセライトろ過して不溶物を取り除き、ろ液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮した後に常法により精製し、エチル 2-(4-シアノ-5-フェニルピリジン-2-イル)-1,3-チアゾール-5-カルボキシレート2.92gを得た。
ESI/MS m/e:336.0(M++H,C18H14N3O2S)
1H-NMR(400MHz,DMSO d6)δ(ppm):1.33(3H,t,J=6.8Hz),4.35(2H,q,J=6.8Hz),7.58-7.63(3H,m),7.73-7.76(2H,m),8.60(1H,s),8.65(1H,s),9.03(1H,s)
(4)得られたエチル 2-(4-シアノ-5-フェニルピリジン-2-イル)-1,3-チアゾール-5-カルボキシレートを実施例84と同様にして、2-[5-フェニル-4-(2H-テトラゾール-5-イル)-2-ピリジル]-1,3-チアゾール-5-カルボン酸を得た。
HPLC保持時間:8.92分
Obs Mass(M++H):351.0669
Pred Mass(M++H):351.0659
Formula(M):C16H10N6O2S Example 167 Synthesis of 2- [5-phenyl-4- (2H-tetrazol-5-yl) -2-pyridyl] -1,3-thiazole-5-carboxylic acid (Compound No. 167 ) (Synthesis Method J )
(1) Suspend 8.80 g of 5-bromo-2-chloropyridine-4-carbaldehyde, 5.36 g of phenylboronic acid and 11.06 g of potassium carbonate in 100 mL of a mixed solution of 1,4-dioxane / water = 4/1. The mixture was made turbid, tetrakis (triphenylphosphine) palladium (924 mg) was added, and the mixture was heated at 80 ° C. for 5 hours under a nitrogen atmosphere. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried and concentrated under reduced pressure to obtain 10.80 g of 2-chloro-5-phenylpyridine-4-carbaldehyde.
1 H-NMR (400 MHz, CDCl 3 ) δ (ppm): 7.3-7.42 (2H, m), 7.50-7.60 (3H, m), 7.81 (1H, d, J = 0.6 Hz), 8.61 (1H, d, J = 0.6 Hz), 9.99 (1H, s)
ESI / MS m / e: 218.0, 220.0 (M + + H, C 12 H 9 ClNO)
(2) Suspend 10.80 g of 2-chloro-5-phenylpyridine-4-carbaldehyde, 5.56 g of hydroxylamine monohydrochloride and 5.44 g of sodium formate in 100 mL of formic acid, and add 12.2 g of acetic anhydride. The mixture was heated at 100 ° C. for 2 hours in a nitrogen atmosphere. 100 mL of water was added and the mixture was purified by a conventional method to obtain 6.34 g of 2-chloro-5-phenylpyridine-4-carbonitrile.
1 H-NMR (400 MHz, CDCl 3 ) δ (ppm): 7.27 (1H, s), 7.5-7.6 (4H, m), 7.67 (1H, s), 8.63 ( 1H, s)
ESI / MS m / e: 215.0, 217.0 (M + + H, C 12 H 8 ClN 2 )
(3) To 3.02 g of 2-chloro-5-phenylpyridine-4-carbonitrile, 3.06 g of potassium hydrogen carbonate, 129 mg of palladium (II) chloride and 598 mg of copper (I) bromide were added, and suspended in 40 mL of toluene. I let you. Thereafter, 3.43 g of ethyl 1,3-thiazole-5-carboxylate, 269 μL of isobutyric acid and 664 mg of di-t-butylcyclohexylphosphine were added, followed by heating at 120 ° C. for 6 hours in a nitrogen atmosphere. The reaction mixture was filtered through Celite to remove insolubles, water was added to the filtrate, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried, concentrated under reduced pressure, and purified by a conventional method to obtain ethyl 2- (4-cyano-5-phenylpyridin-2-yl) -1,3-thiazole-5-carboxylate 2 .92 g was obtained.
ESI / MS m / e: 336.0 (M + + H, C 18 H 14 N 3 O 2 S)
1 H-NMR (400 MHz, DMSO d6) δ (ppm): 1.33 (3H, t, J = 6.8 Hz), 4.35 (2H, q, J = 6.8 Hz), 7.58-7 .63 (3H, m), 7.73-7.76 (2H, m), 8.60 (1H, s), 8.65 (1H, s), 9.03 (1H, s)
(4) The obtained ethyl 2- (4-cyano-5-phenylpyridin-2-yl) -1,3-thiazole-5-carboxylate was treated in the same manner as in Example 84 to give 2- [5-phenyl- 4- (2H-tetrazol-5-yl) -2-pyridyl] -1,3-thiazole-5-carboxylic acid was obtained.
HPLC retention time: 8.92 minutes Obs Mass (M + + H): 351.0669
Pred Mass (M + + H): 351.0659
Formula (M): C 16 H 10 N 6 O 2 S
(1)5-ブロモ-2-クロロピリジン-4-カルバルデヒド8.80g、フェニルボロン酸5.36gおよび炭酸カリウム11.06gを1,4-ジオキサン/水=4/1の混合溶液100mLに懸濁させ、テトラキス(トリフェニルホスフィン)パラジウム924mgを加え、窒素雰囲気下、80℃で5時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、2-クロロ-5-フェニルピリジン-4-カルバルデヒドを10.80g得た。
1H-NMR(400MHz,CDCl3)δ(ppm):7.3-7.42(2H,m),7.50-7.60(3H,m),7.81(1H,d,J=0.6Hz),8.61(1H,d,J=0.6Hz),9.99(1H,s)
ESI/MS m/e:218.0、220.0(M++H,C12H9ClNO)
(2)2-クロロ-5-フェニルピリジン-4-カルバルデヒド10.80g、ヒドロキシルアミン・1塩酸塩5.56g、ギ酸ナトリウム5.44gをギ酸100mLに懸濁させ、無水酢酸12.2gを加え、窒素雰囲気下、100℃で2時間加熱した。水100mLを加え、常法により精製し、2-クロロ-5-フェニルピリジン-4-カルボニトリルを6.34g得た。
1H-NMR(400MHz,CDCl3)δ(ppm):7.27(1H,s),7.5-7.6(4H,m),7.67(1H,s),8.63(1H,s)
ESI/MS m/e:215.0、217.0(M++H,C12H8ClN2)
(3)2-クロロ-5-フェニルピリジン-4-カルボニトリル3.12gに炭酸水素化カリウム3.06g、塩化パラジウム(II)129mg、臭化銅(I)598mgを加え、トルエン40mLに懸濁させた。その後にエチル 1,3-チアゾール-5-カルボキシレート3.43g、イソ酪酸269μL及びジ-t-ブチルシクロヘキシルホスフィン664mgを加えて、窒素雰囲気下、120℃で6時間加熱した。反応混合液をセライトろ過して不溶物を取り除き、ろ液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮した後に常法により精製し、エチル 2-(4-シアノ-5-フェニルピリジン-2-イル)-1,3-チアゾール-5-カルボキシレート2.92gを得た。
ESI/MS m/e:336.0(M++H,C18H14N3O2S)
1H-NMR(400MHz,DMSO d6)δ(ppm):1.33(3H,t,J=6.8Hz),4.35(2H,q,J=6.8Hz),7.58-7.63(3H,m),7.73-7.76(2H,m),8.60(1H,s),8.65(1H,s),9.03(1H,s)
(4)得られたエチル 2-(4-シアノ-5-フェニルピリジン-2-イル)-1,3-チアゾール-5-カルボキシレートを実施例84と同様にして、2-[5-フェニル-4-(2H-テトラゾール-5-イル)-2-ピリジル]-1,3-チアゾール-5-カルボン酸を得た。
HPLC保持時間:8.92分
Obs Mass(M++H):351.0669
Pred Mass(M++H):351.0659
Formula(M):C16H10N6O2S Example 167 Synthesis of 2- [5-phenyl-4- (2H-tetrazol-5-yl) -2-pyridyl] -1,3-thiazole-5-carboxylic acid (Compound No. 167 ) (Synthesis Method J )
(1) Suspend 8.80 g of 5-bromo-2-chloropyridine-4-carbaldehyde, 5.36 g of phenylboronic acid and 11.06 g of potassium carbonate in 100 mL of a mixed solution of 1,4-dioxane / water = 4/1. The mixture was made turbid, tetrakis (triphenylphosphine) palladium (924 mg) was added, and the mixture was heated at 80 ° C. for 5 hours under a nitrogen atmosphere. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried and concentrated under reduced pressure to obtain 10.80 g of 2-chloro-5-phenylpyridine-4-carbaldehyde.
1 H-NMR (400 MHz, CDCl 3 ) δ (ppm): 7.3-7.42 (2H, m), 7.50-7.60 (3H, m), 7.81 (1H, d, J = 0.6 Hz), 8.61 (1H, d, J = 0.6 Hz), 9.99 (1H, s)
ESI / MS m / e: 218.0, 220.0 (M + + H, C 12 H 9 ClNO)
(2) Suspend 10.80 g of 2-chloro-5-phenylpyridine-4-carbaldehyde, 5.56 g of hydroxylamine monohydrochloride and 5.44 g of sodium formate in 100 mL of formic acid, and add 12.2 g of acetic anhydride. The mixture was heated at 100 ° C. for 2 hours in a nitrogen atmosphere. 100 mL of water was added and the mixture was purified by a conventional method to obtain 6.34 g of 2-chloro-5-phenylpyridine-4-carbonitrile.
1 H-NMR (400 MHz, CDCl 3 ) δ (ppm): 7.27 (1H, s), 7.5-7.6 (4H, m), 7.67 (1H, s), 8.63 ( 1H, s)
ESI / MS m / e: 215.0, 217.0 (M + + H, C 12 H 8 ClN 2 )
(3) To 3.02 g of 2-chloro-5-phenylpyridine-4-carbonitrile, 3.06 g of potassium hydrogen carbonate, 129 mg of palladium (II) chloride and 598 mg of copper (I) bromide were added, and suspended in 40 mL of toluene. I let you. Thereafter, 3.43 g of ethyl 1,3-thiazole-5-carboxylate, 269 μL of isobutyric acid and 664 mg of di-t-butylcyclohexylphosphine were added, followed by heating at 120 ° C. for 6 hours in a nitrogen atmosphere. The reaction mixture was filtered through Celite to remove insolubles, water was added to the filtrate, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried, concentrated under reduced pressure, and purified by a conventional method to obtain ethyl 2- (4-cyano-5-phenylpyridin-2-yl) -1,3-thiazole-5-carboxylate 2 .92 g was obtained.
ESI / MS m / e: 336.0 (M + + H, C 18 H 14 N 3 O 2 S)
1 H-NMR (400 MHz, DMSO d6) δ (ppm): 1.33 (3H, t, J = 6.8 Hz), 4.35 (2H, q, J = 6.8 Hz), 7.58-7 .63 (3H, m), 7.73-7.76 (2H, m), 8.60 (1H, s), 8.65 (1H, s), 9.03 (1H, s)
(4) The obtained ethyl 2- (4-cyano-5-phenylpyridin-2-yl) -1,3-thiazole-5-carboxylate was treated in the same manner as in Example 84 to give 2- [5-phenyl- 4- (2H-tetrazol-5-yl) -2-pyridyl] -1,3-thiazole-5-carboxylic acid was obtained.
HPLC retention time: 8.92 minutes Obs Mass (M + + H): 351.0669
Pred Mass (M + + H): 351.0659
Formula (M): C 16 H 10 N 6 O 2 S
[実施例168]
実施例167と同様にして、化合物番号168を合成した。 [Example 168]
Compound No. 168 was synthesized in the same manner as Example 167.
実施例167と同様にして、化合物番号168を合成した。 [Example 168]
Compound No. 168 was synthesized in the same manner as Example 167.
[実施例169]2-(4-オキサゾール-5-イル-5-フェニル-2-ピリジル)-1,3-チアゾール-5-カルボン酸(化合物番号169)の合成(合成法K)
(1)実施例167で得られた2-クロロ-5-フェニルピリジン-4-カルバルデヒド312mgに炭酸水素化カリウム306mg、塩化パラジウム(II)12.9mg、臭化銅(I)59.8mgを加え、トルエン4.0mLに懸濁させた。その後にエチル 1,3-チアゾール-5-カルボキシレート343mg、イソ酪酸26.9μL及びジ-t-ブチルシクロヘキシルホスフィン66.4mgを加えて、窒素雰囲気下、120℃で6時間加熱した。反応混合液をセライトろ過して不溶物を取り除き、ろ液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮した後に常法により精製し、エチル 2-(4-ホルミル-5-フェニルピリジン-2-イル)-1,3-チアゾール-5-カルボキシレートの粗体を得た。
(2)上記で得られたエチル 2-(4-ホルミル-5-フェニルピリジン-2-イル)-1,3-チアゾール-5-カルボキシレートの粗体をメタノール1.5mLに懸濁させ、p-トルエンスルホニルメチルイソシアニド117.1mgおよび炭酸カリウム110.6mgを加え、窒素雰囲気下、80℃で4時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、エチル 2-[4-(1,3,-オキサゾール-5-イル)-5-フェニルピリジン-2-イル]-1,3-チアゾール-5-カルボキシレートの粗体をを得た。
(3)上記で得られたエチル 2-[4-(1,3,-オキサゾール-5-イル)-5-フェニルピリジン-2-イル]-1,3-チアゾール-5-カルボキシレートの粗体をテトラヒドロフラン/メタノール=1/1の混合溶液2.0mLに溶解し、2M水酸化ナトリウム水溶液0.6mLを加えて、室温で3時間撹拌した。反応混合液に2M塩酸0.6mLを加え、減圧濃縮した後に常法により精製した。水50mLおよびヘキサン/酢酸エチル=1/1混合溶媒20mLで洗浄後、減圧下乾燥させることで2-(4-オキサゾール-5-イル-5-フェニル-2-ピリジル)-1,3-チアゾール-5-カルボン酸6.7mgを得た。
1H-NMR(400MHz,DMSO d6)δ(ppm):6.57(1H,s),7.40-7.44(2H,s),7.52-7.55(3H,m),8.48(1H,s),8.52(2H,d,J=1.2Hz),8.64(1H,s),13.74(1H,s)
HPLC保持時間:10.67分
Obs Mass(M++H):350.0586
Pred Mass(M++H):350.0594
Formula(M):C18H11N3O3S Example 169 Synthesis of 2- (4-oxazol-5-yl-5-phenyl-2-pyridyl) -1,3-thiazole-5-carboxylic acid (Compound No. 169 ) (Synthesis Method K)
(1) To 312 mg of 2-chloro-5-phenylpyridine-4-carbaldehyde obtained in Example 167, 306 mg of potassium bicarbonate, 12.9 mg of palladium (II) chloride, and 59.8 mg of copper (I) bromide were added. In addition, it was suspended in 4.0 mL of toluene. Thereafter, 343 mg of ethyl 1,3-thiazole-5-carboxylate, 26.9 μL of isobutyric acid and 66.4 mg of di-t-butylcyclohexylphosphine were added, and the mixture was heated at 120 ° C. for 6 hours in a nitrogen atmosphere. The reaction mixture was filtered through Celite to remove insolubles, water was added to the filtrate, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried, concentrated under reduced pressure, and purified by a conventional method to obtain ethyl 2- (4-formyl-5-phenylpyridin-2-yl) -1,3-thiazole-5-carboxylate. A crude product was obtained.
(2) The crude product of ethyl 2- (4-formyl-5-phenylpyridin-2-yl) -1,3-thiazole-5-carboxylate obtained above was suspended in 1.5 mL of methanol, and p. -Toluenesulfonylmethyl isocyanide (117.1 mg) and potassium carbonate (110.6 mg) were added, and the mixture was heated at 80 ° C for 4 hours under a nitrogen atmosphere. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure, and the resulting crude product is separated and purified by silica gel column chromatography to obtain ethyl 2- [4- (1,3, -oxazol-5-yl). ) -5-Phenylpyridin-2-yl] -1,3-thiazole-5-carboxylate was obtained.
(3) Crude product of ethyl 2- [4- (1,3, -oxazol-5-yl) -5-phenylpyridin-2-yl] -1,3-thiazole-5-carboxylate obtained above Was dissolved in 2.0 mL of a mixed solution of tetrahydrofuran / methanol = 1/1, 0.6 mL of 2M aqueous sodium hydroxide solution was added, and the mixture was stirred at room temperature for 3 hours. The reaction mixture was added with 0.6 mL of 2M hydrochloric acid, concentrated under reduced pressure, and purified by a conventional method. After washing with 50 mL of water and 20 mL of hexane / ethyl acetate = 1/1 mixed solvent, it was dried under reduced pressure to give 2- (4-oxazol-5-yl-5-phenyl-2-pyridyl) -1,3-thiazole- 6.7 mg of 5-carboxylic acid was obtained.
1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 6.57 (1H, s), 7.40-7.44 (2H, s), 7.52 to 7.55 (3H, m) , 8.48 (1H, s), 8.52 (2H, d, J = 1.2 Hz), 8.64 (1H, s), 13.74 (1H, s)
HPLC retention time: 10.67 minutes Obs Mass (M + + H) : 350.0586
Pred Mass (M + + H): 350.0594
Formula (M): C 18 H 11 N 3 O 3 S
(1)実施例167で得られた2-クロロ-5-フェニルピリジン-4-カルバルデヒド312mgに炭酸水素化カリウム306mg、塩化パラジウム(II)12.9mg、臭化銅(I)59.8mgを加え、トルエン4.0mLに懸濁させた。その後にエチル 1,3-チアゾール-5-カルボキシレート343mg、イソ酪酸26.9μL及びジ-t-ブチルシクロヘキシルホスフィン66.4mgを加えて、窒素雰囲気下、120℃で6時間加熱した。反応混合液をセライトろ過して不溶物を取り除き、ろ液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮した後に常法により精製し、エチル 2-(4-ホルミル-5-フェニルピリジン-2-イル)-1,3-チアゾール-5-カルボキシレートの粗体を得た。
(2)上記で得られたエチル 2-(4-ホルミル-5-フェニルピリジン-2-イル)-1,3-チアゾール-5-カルボキシレートの粗体をメタノール1.5mLに懸濁させ、p-トルエンスルホニルメチルイソシアニド117.1mgおよび炭酸カリウム110.6mgを加え、窒素雰囲気下、80℃で4時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、エチル 2-[4-(1,3,-オキサゾール-5-イル)-5-フェニルピリジン-2-イル]-1,3-チアゾール-5-カルボキシレートの粗体をを得た。
(3)上記で得られたエチル 2-[4-(1,3,-オキサゾール-5-イル)-5-フェニルピリジン-2-イル]-1,3-チアゾール-5-カルボキシレートの粗体をテトラヒドロフラン/メタノール=1/1の混合溶液2.0mLに溶解し、2M水酸化ナトリウム水溶液0.6mLを加えて、室温で3時間撹拌した。反応混合液に2M塩酸0.6mLを加え、減圧濃縮した後に常法により精製した。水50mLおよびヘキサン/酢酸エチル=1/1混合溶媒20mLで洗浄後、減圧下乾燥させることで2-(4-オキサゾール-5-イル-5-フェニル-2-ピリジル)-1,3-チアゾール-5-カルボン酸6.7mgを得た。
1H-NMR(400MHz,DMSO d6)δ(ppm):6.57(1H,s),7.40-7.44(2H,s),7.52-7.55(3H,m),8.48(1H,s),8.52(2H,d,J=1.2Hz),8.64(1H,s),13.74(1H,s)
HPLC保持時間:10.67分
Obs Mass(M++H):350.0586
Pred Mass(M++H):350.0594
Formula(M):C18H11N3O3S Example 169 Synthesis of 2- (4-oxazol-5-yl-5-phenyl-2-pyridyl) -1,3-thiazole-5-carboxylic acid (Compound No. 169 ) (Synthesis Method K)
(1) To 312 mg of 2-chloro-5-phenylpyridine-4-carbaldehyde obtained in Example 167, 306 mg of potassium bicarbonate, 12.9 mg of palladium (II) chloride, and 59.8 mg of copper (I) bromide were added. In addition, it was suspended in 4.0 mL of toluene. Thereafter, 343 mg of ethyl 1,3-thiazole-5-carboxylate, 26.9 μL of isobutyric acid and 66.4 mg of di-t-butylcyclohexylphosphine were added, and the mixture was heated at 120 ° C. for 6 hours in a nitrogen atmosphere. The reaction mixture was filtered through Celite to remove insolubles, water was added to the filtrate, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried, concentrated under reduced pressure, and purified by a conventional method to obtain ethyl 2- (4-formyl-5-phenylpyridin-2-yl) -1,3-thiazole-5-carboxylate. A crude product was obtained.
(2) The crude product of ethyl 2- (4-formyl-5-phenylpyridin-2-yl) -1,3-thiazole-5-carboxylate obtained above was suspended in 1.5 mL of methanol, and p. -Toluenesulfonylmethyl isocyanide (117.1 mg) and potassium carbonate (110.6 mg) were added, and the mixture was heated at 80 ° C for 4 hours under a nitrogen atmosphere. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure, and the resulting crude product is separated and purified by silica gel column chromatography to obtain ethyl 2- [4- (1,3, -oxazol-5-yl). ) -5-Phenylpyridin-2-yl] -1,3-thiazole-5-carboxylate was obtained.
(3) Crude product of ethyl 2- [4- (1,3, -oxazol-5-yl) -5-phenylpyridin-2-yl] -1,3-thiazole-5-carboxylate obtained above Was dissolved in 2.0 mL of a mixed solution of tetrahydrofuran / methanol = 1/1, 0.6 mL of 2M aqueous sodium hydroxide solution was added, and the mixture was stirred at room temperature for 3 hours. The reaction mixture was added with 0.6 mL of 2M hydrochloric acid, concentrated under reduced pressure, and purified by a conventional method. After washing with 50 mL of water and 20 mL of hexane / ethyl acetate = 1/1 mixed solvent, it was dried under reduced pressure to give 2- (4-oxazol-5-yl-5-phenyl-2-pyridyl) -1,3-thiazole- 6.7 mg of 5-carboxylic acid was obtained.
1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 6.57 (1H, s), 7.40-7.44 (2H, s), 7.52 to 7.55 (3H, m) , 8.48 (1H, s), 8.52 (2H, d, J = 1.2 Hz), 8.64 (1H, s), 13.74 (1H, s)
HPLC retention time: 10.67 minutes Obs Mass (M + + H) : 350.0586
Pred Mass (M + + H): 350.0594
Formula (M): C 18 H 11 N 3 O 3 S
[実施例170]
実施例169と同様にして、化合物番号170を合成した。 [Example 170]
Compound No. 170 was synthesized in the same manner as Example 169.
実施例169と同様にして、化合物番号170を合成した。 [Example 170]
Compound No. 170 was synthesized in the same manner as Example 169.
[実施例171]2-(5-イソブトキシ-4-オキサゾール-5-イル-2-ピリジル)-4-メチル-1,3-チアゾール-5-カルボン酸(化合物番号171)の合成(合成法K)
(1)2-クロロ-5-ヒドロキシピリジン1.30gおよび炭酸セシウム4.89gをN,N-ジメチルホルムアミド20mLに懸濁させ、臭化イソブチル2.06gを加え、窒素雰囲気下、40℃で4時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、2-クロロ-5-イソブトシピリジンを1.73g得た。
(2)上記で得られた2-クロロ-5-イソブトシピリジン1.73gをテトラヒドロフラン50mLに溶解し、窒素雰囲気下、テトラメチルエチレンジアミン(TMEDA)2.01mLを加えて、-78℃に冷却した。その溶液に1.6Mのn-ブチルリチウムヘキサン溶液7.0mLをゆっくりと滴下し、3時間撹拌した後に、メチルホルメート691μLを滴下し、室温で終夜撹拌させた。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、2-クロロ-5-イソブトシピリジン-4-カルバルデヒド366mgを得た。
(3)上記で得られた2-クロロ-5-イソブトシピリジン-4-カルバルデヒドを実施例169と同様にして、2-(5-イソブトキシ-4-オキサゾール-5-イル-2-ピリジル)-4-メチル-1,3-チアゾール-5-カルボン酸を得た。
1H-NMR(400MHz,DMSO d6)δ(ppm):1.05(6H,d,J=7.2Hz),2.18-2.24(1H,m),2.67(3H,s),4.07(2H、d、J=6.4Hz),7.76-7.79(2H,m),8.10(1H,dd,J=4.0、8.0Hz),8.06(1H,s)
HPLC保持時間:11.35分
Obs Mass(M++H):360.1010
Pred Mass(M++H):360.1013
Formula(M):C17H17N3O4S [Example 171] Synthesis of 2- (5-isobutoxy-4-oxazol-5-yl-2-pyridyl) -4-methyl-1,3-thiazole-5-carboxylic acid (Compound No. 171 ) (Synthesis Method K) )
(1) 1.30 g of 2-chloro-5-hydroxypyridine and 4.89 g of cesium carbonate are suspended in 20 mL of N, N-dimethylformamide, 2.06 g of isobutyl bromide is added, and 4% at 40 ° C. under a nitrogen atmosphere. Heated for hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried and concentrated under reduced pressure to obtain 1.73 g of 2-chloro-5-isobutoxypyridine.
(2) Dissolve 1.73 g of 2-chloro-5-isobutoxypyridine obtained above in 50 mL of tetrahydrofuran, add 2.01 mL of tetramethylethylenediamine (TMEDA) under nitrogen atmosphere, and cool to −78 ° C. did. To the solution, 7.0 mL of 1.6 M n-butyllithium hexane solution was slowly added dropwise and stirred for 3 hours, and then 691 μL of methyl formate was added dropwise and stirred overnight at room temperature. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure. The resulting crude product is separated and purified by silica gel column chromatography to obtain 366 mg of 2-chloro-5-isobutoxypyridine-4-carbaldehyde. Obtained.
(3) In the same manner as in Example 169, 2- (5-isobutoxy-4-oxazol-5-yl-2-pyridyl) was obtained in the same manner as in Example 169. ) -4-Methyl-1,3-thiazole-5-carboxylic acid was obtained.
1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 1.05 (6H, d, J = 7.2 Hz), 2.18-2.24 (1H, m), 2.67 (3H, s), 4.07 (2H, d, J = 6.4 Hz), 7.76-7.79 (2H, m), 8.10 (1H, dd, J = 4.0, 8.0 Hz), 8.06 (1H, s)
HPLC retention time: 11.35 minutes Obs Mass (M + + H): 360.1010
Pred Mass (M + + H): 360.0103
Formula (M): C 17 H 17 N 3 O 4 S
(1)2-クロロ-5-ヒドロキシピリジン1.30gおよび炭酸セシウム4.89gをN,N-ジメチルホルムアミド20mLに懸濁させ、臭化イソブチル2.06gを加え、窒素雰囲気下、40℃で4時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、2-クロロ-5-イソブトシピリジンを1.73g得た。
(2)上記で得られた2-クロロ-5-イソブトシピリジン1.73gをテトラヒドロフラン50mLに溶解し、窒素雰囲気下、テトラメチルエチレンジアミン(TMEDA)2.01mLを加えて、-78℃に冷却した。その溶液に1.6Mのn-ブチルリチウムヘキサン溶液7.0mLをゆっくりと滴下し、3時間撹拌した後に、メチルホルメート691μLを滴下し、室温で終夜撹拌させた。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、2-クロロ-5-イソブトシピリジン-4-カルバルデヒド366mgを得た。
(3)上記で得られた2-クロロ-5-イソブトシピリジン-4-カルバルデヒドを実施例169と同様にして、2-(5-イソブトキシ-4-オキサゾール-5-イル-2-ピリジル)-4-メチル-1,3-チアゾール-5-カルボン酸を得た。
1H-NMR(400MHz,DMSO d6)δ(ppm):1.05(6H,d,J=7.2Hz),2.18-2.24(1H,m),2.67(3H,s),4.07(2H、d、J=6.4Hz),7.76-7.79(2H,m),8.10(1H,dd,J=4.0、8.0Hz),8.06(1H,s)
HPLC保持時間:11.35分
Obs Mass(M++H):360.1010
Pred Mass(M++H):360.1013
Formula(M):C17H17N3O4S [Example 171] Synthesis of 2- (5-isobutoxy-4-oxazol-5-yl-2-pyridyl) -4-methyl-1,3-thiazole-5-carboxylic acid (Compound No. 171 ) (Synthesis Method K) )
(1) 1.30 g of 2-chloro-5-hydroxypyridine and 4.89 g of cesium carbonate are suspended in 20 mL of N, N-dimethylformamide, 2.06 g of isobutyl bromide is added, and 4% at 40 ° C. under a nitrogen atmosphere. Heated for hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried and concentrated under reduced pressure to obtain 1.73 g of 2-chloro-5-isobutoxypyridine.
(2) Dissolve 1.73 g of 2-chloro-5-isobutoxypyridine obtained above in 50 mL of tetrahydrofuran, add 2.01 mL of tetramethylethylenediamine (TMEDA) under nitrogen atmosphere, and cool to −78 ° C. did. To the solution, 7.0 mL of 1.6 M n-butyllithium hexane solution was slowly added dropwise and stirred for 3 hours, and then 691 μL of methyl formate was added dropwise and stirred overnight at room temperature. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure. The resulting crude product is separated and purified by silica gel column chromatography to obtain 366 mg of 2-chloro-5-isobutoxypyridine-4-carbaldehyde. Obtained.
(3) In the same manner as in Example 169, 2- (5-isobutoxy-4-oxazol-5-yl-2-pyridyl) was obtained in the same manner as in Example 169. ) -4-Methyl-1,3-thiazole-5-carboxylic acid was obtained.
1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 1.05 (6H, d, J = 7.2 Hz), 2.18-2.24 (1H, m), 2.67 (3H, s), 4.07 (2H, d, J = 6.4 Hz), 7.76-7.79 (2H, m), 8.10 (1H, dd, J = 4.0, 8.0 Hz), 8.06 (1H, s)
HPLC retention time: 11.35 minutes Obs Mass (M + + H): 360.1010
Pred Mass (M + + H): 360.0103
Formula (M): C 17 H 17 N 3 O 4 S
[実施例172]2-(5-イソブトキシ-4-ピリミジン-5-イル-2-ピリジル)-4-メチル-1,3-チアゾール-5-カルボン酸(化合物番号172)の合成(合成法L)
(1)5-ヒドロキシ-2-メチルピリジン5.0gをテトラヒドロフラン50mLに懸濁させ、窒素雰囲気下、0℃において水素化ナトリウム2.4gを少しずつ加えた。0℃において1時間撹拌させた後に、メトキシメチルクロリド4.43gを滴下し、室温において1時間撹拌させた。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、5-(メトキシメトキシ)-2-メチルピリジン5.6gを得た。
(2)5-(メトキシメトキシ)-2-メチルピリジン5.6gをテトラヒドロフラン50mLに懸濁させ、窒素雰囲気下、-78℃において1.6Mのt-ブチルリチウムヘキサン溶液27.42mLをゆっくりと滴下し、1時間撹拌した後に、四臭化炭素18.20gを滴下し、室温で3時間撹拌させた。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、4-ブロモ-5-(メトキシメトキシ)-2-メチルピリジン5.1gを得た。
(3)4-ブロモ-5-(メトキシメトキシ)-2-メチルピリジン5.1gを塩化メチレン50mLに懸濁させ、窒素雰囲気下、室温においてトリフルオロメチル酢酸3.76gを加えて、終夜撹拌させた。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、4-ブロモ-5-ヒドロキシ-2-メチルピリジン2.8gを得た。
(4)4-ブロモ-5-ヒドロキシ-2-メチルピリジン2.8gおよび炭酸カリウム3.07gをN,N-ジメチルホルムアミド40mLに懸濁させ、臭化イソブチル3.06gを加え、窒素雰囲気下、110℃で4時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、4-ブロモ-5-イソブトキシ-2-メチルピリジン2.7gを得た。
(5)4-ブロモ-5-イソブトキシ-2-メチルピリジン2.7gを水20mLに懸濁させ、過マンガン酸カリウム3.48gを加えて、窒素雰囲気下、80℃で終夜撹拌させた。反応混合液を2M塩酸で酸性にした後に、2M水酸化ナトリウム水溶液と塩化メチレンを加えて分液し、水層を2M塩酸で再び酸性にすることで、4-ブロモ-5-イソブトキシピリジン-2-カルボン酸1.3gを得た。
(6)4-ブロモ-5-イソブトキシピリジン-2-カルボン酸1.3gをN,N-ジメチルホルムアミド10mLに懸濁させ、オキザリルクロリド722mgを加え、窒素雰囲気下、室温で2時間撹拌させた後、塩化メチレン20mLを加え、0℃においてアンモニア水を滴下させた。反応混合液を室温で1時間撹拌させた後に、飽和重層水を加え、塩化メチレンで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、4-ブロモ-5-イソブトキシピリジン-2-カルボキシアミド1.1gを得た。
(7)4-ブロモ-5-イソブトキシピリジン-2-カルボキシアミド1.5gをテトラヒドロフラン20mLに懸濁させ、トリフェニルホスフィン2.89gおよびジイソプロピルエチルアミン1.35gを加えて、窒素雰囲気下、50℃で終夜撹拌させた。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、4-ブロモ-5-イソブトキシピリジン-2-カルボニトリル1.2gを得た。
(8)4-ブロモ-5-イソブトキシピリジン-2-カルボニトリル200mg、ピリミジン-5-ボロン酸146mgおよび炭酸カリウム217mgを1,4-ジオキサン/水=4/1の混合溶液2.0mLに懸濁させ、テトラキス(トリフェニルホスフィン)パラジウム45mgを加え、窒素雰囲気下、100℃で12時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、常法により精製することで、5-イソブトキシ-4-(ピリミジン-5-イル)ピリジン-2-カルボニトリル85mgを得た。
(9)5-イソブトキシ-4-(ピリミジン-5-イル)ピリジン-2-カルボニトリル85mgをエタノール2.0mLに懸濁させ、硫化水素ガスを加えて、室温で3時間撹拌させた。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、常法により精製することで、5-イソブトキシ-4-(ピリミジン-5-イル)ピリジン-2-カルボチオアミド70mgを得た。
(10)5-イソブトキシ-4-(ピリミジン-5-イル)ピリジン-2-カルボチオアミド70mgをエタノール2.0mLに懸濁させ、エチル-2-クロロアセトアセテート60.0mgを加え、窒素雰囲気下、80℃で5時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、常法により精製することで、エチル 4-メチル-2-[5-イソブトキシ-4-(ピリミジン-5-イル)ピリジン-2-イル]-1,3-チアゾール-5-カルボキシレート65mgを得た。
(11)エチル 4-メチル-2-[5-イソブトキシ-4-(ピリミジン-5-イル)ピリジン-2-イル]-1,3-チアゾール-5-カルボキシレート65mgをテトラヒドロフラン/メタノール=1/1の混合溶液2.0mLに溶解し、2M水酸化ナトリウム水溶液0.6mLを加えて、室温で3時間撹拌した。反応混合液に2M塩酸0.6mLを加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、常法により精製することで、2-(5-イソブトキシ-4-ピリミジン-5-イル-2-ピリジル)-4-メチル-1,3-チアゾール-5-カルボン酸30.6mgを得た。
1H-NMR(300MHz,DMSO d6)δ(ppm):0.98(6H,d,J=6.6Hz),2.01-2.12(1H,m),2.74(3H,s),4.12(2H,d,J=6.3Hz),8.25(1H,s),8.68(1H,s),9.17(2H,s),9.32(1H,s),13.41(1H,brs)
HPLC保持時間:10.66分
Obs Mass(M++H):371.1160
Pred Mass(M++H):371.1172
Formula(M):C18H18N4O3S Example 172 Synthesis of 2- (5-isobutoxy-4-pyrimidin-5-yl-2-pyridyl) -4-methyl-1,3-thiazole-5-carboxylic acid (Compound No. 172 ) (Synthesis Method L )
(1) 5.0 g of 5-hydroxy-2-methylpyridine was suspended in 50 mL of tetrahydrofuran, and 2.4 g of sodium hydride was added little by little at 0 ° C. in a nitrogen atmosphere. After stirring at 0 ° C. for 1 hour, 4.43 g of methoxymethyl chloride was added dropwise, and the mixture was stirred at room temperature for 1 hour. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried and concentrated under reduced pressure, and the resulting crude product was separated and purified by silica gel column chromatography to obtain 5.6 g of 5- (methoxymethoxy) -2-methylpyridine. .
(2) 5.6 g of 5- (methoxymethoxy) -2-methylpyridine is suspended in 50 mL of tetrahydrofuran, and 27.42 mL of 1.6 M t-butyllithium hexane solution is slowly added dropwise at −78 ° C. in a nitrogen atmosphere. Then, after stirring for 1 hour, 18.20 g of carbon tetrabromide was added dropwise and allowed to stir at room temperature for 3 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure, and the resulting crude product is separated and purified by silica gel column chromatography to give 4-bromo-5- (methoxymethoxy) -2-methylpyridine. 1 g was obtained.
(3) Suspend 5.1 g of 4-bromo-5- (methoxymethoxy) -2-methylpyridine in 50 mL of methylene chloride, add 3.76 g of trifluoromethylacetic acid at room temperature under a nitrogen atmosphere, and stir overnight. It was. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure. The resulting crude product is separated and purified by silica gel column chromatography to obtain 2.8 g of 4-bromo-5-hydroxy-2-methylpyridine. It was.
(4) 2.8 g of 4-bromo-5-hydroxy-2-methylpyridine and 3.07 g of potassium carbonate are suspended in 40 mL of N, N-dimethylformamide, and 3.06 g of isobutyl bromide is added. Heated at 110 ° C. for 4 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure. The resulting crude product is separated and purified by silica gel column chromatography to obtain 2.7 g of 4-bromo-5-isobutoxy-2-methylpyridine. It was.
(5) 2.7 g of 4-bromo-5-isobutoxy-2-methylpyridine was suspended in 20 mL of water, 3.48 g of potassium permanganate was added, and the mixture was stirred at 80 ° C. overnight under a nitrogen atmosphere. The reaction mixture was acidified with 2M hydrochloric acid, 2M aqueous sodium hydroxide solution and methylene chloride were added and separated, and the aqueous layer was acidified again with 2M hydrochloric acid to give 4-bromo-5-isobutoxypyridine- 1.3 g of 2-carboxylic acid was obtained.
(6) Suspend 1.3 g of 4-bromo-5-isobutoxypyridine-2-carboxylic acid in 10 mL of N, N-dimethylformamide, add 722 mg of oxalyl chloride, and stir at room temperature for 2 hours in a nitrogen atmosphere. After that, 20 mL of methylene chloride was added, and aqueous ammonia was added dropwise at 0 ° C. The reaction mixture was allowed to stir at room temperature for 1 hour, saturated layered water was added, and the mixture was extracted with methylene chloride. The organic layer is washed with brine, dried and concentrated under reduced pressure. The resulting crude product is separated and purified by silica gel column chromatography to give 1.1 g of 4-bromo-5-isobutoxypyridine-2-carboxamide. Got.
(7) Suspend 1.5 g of 4-bromo-5-isobutoxypyridine-2-carboxamide in 20 mL of tetrahydrofuran, add 2.89 g of triphenylphosphine and 1.35 g of diisopropylethylamine, and add 50 ° C. under a nitrogen atmosphere. And allowed to stir overnight. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure. The resulting crude product is separated and purified by silica gel column chromatography to obtain 1.2 g of 4-bromo-5-isobutoxypyridine-2-carbonitrile. Got.
(8) 200 mg of 4-bromo-5-isobutoxypyridine-2-carbonitrile, 146 mg of pyrimidine-5-boronic acid and 217 mg of potassium carbonate are suspended in 2.0 mL of a mixed solution of 1,4-dioxane / water = 4/1. The mixture was made turbid, 45 mg of tetrakis (triphenylphosphine) palladium was added, and the mixture was heated at 100 ° C. for 12 hours under a nitrogen atmosphere. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried, concentrated under reduced pressure, and purified by a conventional method to obtain 85 mg of 5-isobutoxy-4- (pyrimidin-5-yl) pyridine-2-carbonitrile.
(9) 85 mg of 5-isobutoxy-4- (pyrimidin-5-yl) pyridine-2-carbonitrile was suspended in 2.0 mL of ethanol, hydrogen sulfide gas was added, and the mixture was stirred at room temperature for 3 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried, concentrated under reduced pressure, and purified by a conventional method to obtain 70 mg of 5-isobutoxy-4- (pyrimidin-5-yl) pyridine-2-carbothioamide.
(10) 70 mg of 5-isobutoxy-4- (pyrimidin-5-yl) pyridine-2-carbothioamide is suspended in 2.0 mL of ethanol, 60.0 mg of ethyl-2-chloroacetoacetate is added, and under a nitrogen atmosphere, Heated at 80 ° C. for 5 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried, concentrated under reduced pressure, and purified by a conventional method to give ethyl 4-methyl-2- [5-isobutoxy-4- (pyrimidin-5-yl) pyridin-2-yl. ] 65 mg of 1,3-thiazole-5-carboxylate was obtained.
(11) 65 mg of ethyl 4-methyl-2- [5-isobutoxy-4- (pyrimidin-5-yl) pyridin-2-yl] -1,3-thiazole-5-carboxylate was added to tetrahydrofuran / methanol = 1/1. Was dissolved in 2.0 mL of a mixed solution, and 0.6 mL of 2M aqueous sodium hydroxide solution was added thereto, followed by stirring at room temperature for 3 hours. To the reaction mixture was added 0.6 mL of 2M hydrochloric acid, and extracted with ethyl acetate. The organic layer is washed with brine, dried, concentrated under reduced pressure, and purified by a conventional method to give 2- (5-isobutoxy-4-pyrimidin-5-yl-2-pyridyl) -4-methyl-1, 30.6 mg of 3-thiazole-5-carboxylic acid was obtained.
1 H-NMR (300 MHz, DMSO d 6 ) δ (ppm): 0.98 (6H, d, J = 6.6 Hz), 2.01-2.12 (1H, m), 2.74 (3H, s), 4.12 (2H, d, J = 6.3 Hz), 8.25 (1H, s), 8.68 (1H, s), 9.17 (2H, s), 9.32 (1H) , S), 13.41 (1H, brs)
HPLC retention time: 10.66 minutes Obs Mass (M + + H) : 371.1160
Pred Mass (M + + H): 371.1172
Formula (M): C 18 H 18 N 4 O 3 S
(1)5-ヒドロキシ-2-メチルピリジン5.0gをテトラヒドロフラン50mLに懸濁させ、窒素雰囲気下、0℃において水素化ナトリウム2.4gを少しずつ加えた。0℃において1時間撹拌させた後に、メトキシメチルクロリド4.43gを滴下し、室温において1時間撹拌させた。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、5-(メトキシメトキシ)-2-メチルピリジン5.6gを得た。
(2)5-(メトキシメトキシ)-2-メチルピリジン5.6gをテトラヒドロフラン50mLに懸濁させ、窒素雰囲気下、-78℃において1.6Mのt-ブチルリチウムヘキサン溶液27.42mLをゆっくりと滴下し、1時間撹拌した後に、四臭化炭素18.20gを滴下し、室温で3時間撹拌させた。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、4-ブロモ-5-(メトキシメトキシ)-2-メチルピリジン5.1gを得た。
(3)4-ブロモ-5-(メトキシメトキシ)-2-メチルピリジン5.1gを塩化メチレン50mLに懸濁させ、窒素雰囲気下、室温においてトリフルオロメチル酢酸3.76gを加えて、終夜撹拌させた。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、4-ブロモ-5-ヒドロキシ-2-メチルピリジン2.8gを得た。
(4)4-ブロモ-5-ヒドロキシ-2-メチルピリジン2.8gおよび炭酸カリウム3.07gをN,N-ジメチルホルムアミド40mLに懸濁させ、臭化イソブチル3.06gを加え、窒素雰囲気下、110℃で4時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、4-ブロモ-5-イソブトキシ-2-メチルピリジン2.7gを得た。
(5)4-ブロモ-5-イソブトキシ-2-メチルピリジン2.7gを水20mLに懸濁させ、過マンガン酸カリウム3.48gを加えて、窒素雰囲気下、80℃で終夜撹拌させた。反応混合液を2M塩酸で酸性にした後に、2M水酸化ナトリウム水溶液と塩化メチレンを加えて分液し、水層を2M塩酸で再び酸性にすることで、4-ブロモ-5-イソブトキシピリジン-2-カルボン酸1.3gを得た。
(6)4-ブロモ-5-イソブトキシピリジン-2-カルボン酸1.3gをN,N-ジメチルホルムアミド10mLに懸濁させ、オキザリルクロリド722mgを加え、窒素雰囲気下、室温で2時間撹拌させた後、塩化メチレン20mLを加え、0℃においてアンモニア水を滴下させた。反応混合液を室温で1時間撹拌させた後に、飽和重層水を加え、塩化メチレンで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、4-ブロモ-5-イソブトキシピリジン-2-カルボキシアミド1.1gを得た。
(7)4-ブロモ-5-イソブトキシピリジン-2-カルボキシアミド1.5gをテトラヒドロフラン20mLに懸濁させ、トリフェニルホスフィン2.89gおよびジイソプロピルエチルアミン1.35gを加えて、窒素雰囲気下、50℃で終夜撹拌させた。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、得られた粗体をシリカゲルカラムクロマトグラフィーで分離精製することで、4-ブロモ-5-イソブトキシピリジン-2-カルボニトリル1.2gを得た。
(8)4-ブロモ-5-イソブトキシピリジン-2-カルボニトリル200mg、ピリミジン-5-ボロン酸146mgおよび炭酸カリウム217mgを1,4-ジオキサン/水=4/1の混合溶液2.0mLに懸濁させ、テトラキス(トリフェニルホスフィン)パラジウム45mgを加え、窒素雰囲気下、100℃で12時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、常法により精製することで、5-イソブトキシ-4-(ピリミジン-5-イル)ピリジン-2-カルボニトリル85mgを得た。
(9)5-イソブトキシ-4-(ピリミジン-5-イル)ピリジン-2-カルボニトリル85mgをエタノール2.0mLに懸濁させ、硫化水素ガスを加えて、室温で3時間撹拌させた。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、常法により精製することで、5-イソブトキシ-4-(ピリミジン-5-イル)ピリジン-2-カルボチオアミド70mgを得た。
(10)5-イソブトキシ-4-(ピリミジン-5-イル)ピリジン-2-カルボチオアミド70mgをエタノール2.0mLに懸濁させ、エチル-2-クロロアセトアセテート60.0mgを加え、窒素雰囲気下、80℃で5時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、常法により精製することで、エチル 4-メチル-2-[5-イソブトキシ-4-(ピリミジン-5-イル)ピリジン-2-イル]-1,3-チアゾール-5-カルボキシレート65mgを得た。
(11)エチル 4-メチル-2-[5-イソブトキシ-4-(ピリミジン-5-イル)ピリジン-2-イル]-1,3-チアゾール-5-カルボキシレート65mgをテトラヒドロフラン/メタノール=1/1の混合溶液2.0mLに溶解し、2M水酸化ナトリウム水溶液0.6mLを加えて、室温で3時間撹拌した。反応混合液に2M塩酸0.6mLを加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、常法により精製することで、2-(5-イソブトキシ-4-ピリミジン-5-イル-2-ピリジル)-4-メチル-1,3-チアゾール-5-カルボン酸30.6mgを得た。
1H-NMR(300MHz,DMSO d6)δ(ppm):0.98(6H,d,J=6.6Hz),2.01-2.12(1H,m),2.74(3H,s),4.12(2H,d,J=6.3Hz),8.25(1H,s),8.68(1H,s),9.17(2H,s),9.32(1H,s),13.41(1H,brs)
HPLC保持時間:10.66分
Obs Mass(M++H):371.1160
Pred Mass(M++H):371.1172
Formula(M):C18H18N4O3S Example 172 Synthesis of 2- (5-isobutoxy-4-pyrimidin-5-yl-2-pyridyl) -4-methyl-1,3-thiazole-5-carboxylic acid (Compound No. 172 ) (Synthesis Method L )
(1) 5.0 g of 5-hydroxy-2-methylpyridine was suspended in 50 mL of tetrahydrofuran, and 2.4 g of sodium hydride was added little by little at 0 ° C. in a nitrogen atmosphere. After stirring at 0 ° C. for 1 hour, 4.43 g of methoxymethyl chloride was added dropwise, and the mixture was stirred at room temperature for 1 hour. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried and concentrated under reduced pressure, and the resulting crude product was separated and purified by silica gel column chromatography to obtain 5.6 g of 5- (methoxymethoxy) -2-methylpyridine. .
(2) 5.6 g of 5- (methoxymethoxy) -2-methylpyridine is suspended in 50 mL of tetrahydrofuran, and 27.42 mL of 1.6 M t-butyllithium hexane solution is slowly added dropwise at −78 ° C. in a nitrogen atmosphere. Then, after stirring for 1 hour, 18.20 g of carbon tetrabromide was added dropwise and allowed to stir at room temperature for 3 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure, and the resulting crude product is separated and purified by silica gel column chromatography to give 4-bromo-5- (methoxymethoxy) -2-methylpyridine. 1 g was obtained.
(3) Suspend 5.1 g of 4-bromo-5- (methoxymethoxy) -2-methylpyridine in 50 mL of methylene chloride, add 3.76 g of trifluoromethylacetic acid at room temperature under a nitrogen atmosphere, and stir overnight. It was. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure. The resulting crude product is separated and purified by silica gel column chromatography to obtain 2.8 g of 4-bromo-5-hydroxy-2-methylpyridine. It was.
(4) 2.8 g of 4-bromo-5-hydroxy-2-methylpyridine and 3.07 g of potassium carbonate are suspended in 40 mL of N, N-dimethylformamide, and 3.06 g of isobutyl bromide is added. Heated at 110 ° C. for 4 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure. The resulting crude product is separated and purified by silica gel column chromatography to obtain 2.7 g of 4-bromo-5-isobutoxy-2-methylpyridine. It was.
(5) 2.7 g of 4-bromo-5-isobutoxy-2-methylpyridine was suspended in 20 mL of water, 3.48 g of potassium permanganate was added, and the mixture was stirred at 80 ° C. overnight under a nitrogen atmosphere. The reaction mixture was acidified with 2M hydrochloric acid, 2M aqueous sodium hydroxide solution and methylene chloride were added and separated, and the aqueous layer was acidified again with 2M hydrochloric acid to give 4-bromo-5-isobutoxypyridine- 1.3 g of 2-carboxylic acid was obtained.
(6) Suspend 1.3 g of 4-bromo-5-isobutoxypyridine-2-carboxylic acid in 10 mL of N, N-dimethylformamide, add 722 mg of oxalyl chloride, and stir at room temperature for 2 hours in a nitrogen atmosphere. After that, 20 mL of methylene chloride was added, and aqueous ammonia was added dropwise at 0 ° C. The reaction mixture was allowed to stir at room temperature for 1 hour, saturated layered water was added, and the mixture was extracted with methylene chloride. The organic layer is washed with brine, dried and concentrated under reduced pressure. The resulting crude product is separated and purified by silica gel column chromatography to give 1.1 g of 4-bromo-5-isobutoxypyridine-2-carboxamide. Got.
(7) Suspend 1.5 g of 4-bromo-5-isobutoxypyridine-2-carboxamide in 20 mL of tetrahydrofuran, add 2.89 g of triphenylphosphine and 1.35 g of diisopropylethylamine, and add 50 ° C. under a nitrogen atmosphere. And allowed to stir overnight. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried and concentrated under reduced pressure. The resulting crude product is separated and purified by silica gel column chromatography to obtain 1.2 g of 4-bromo-5-isobutoxypyridine-2-carbonitrile. Got.
(8) 200 mg of 4-bromo-5-isobutoxypyridine-2-carbonitrile, 146 mg of pyrimidine-5-boronic acid and 217 mg of potassium carbonate are suspended in 2.0 mL of a mixed solution of 1,4-dioxane / water = 4/1. The mixture was made turbid, 45 mg of tetrakis (triphenylphosphine) palladium was added, and the mixture was heated at 100 ° C. for 12 hours under a nitrogen atmosphere. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried, concentrated under reduced pressure, and purified by a conventional method to obtain 85 mg of 5-isobutoxy-4- (pyrimidin-5-yl) pyridine-2-carbonitrile.
(9) 85 mg of 5-isobutoxy-4- (pyrimidin-5-yl) pyridine-2-carbonitrile was suspended in 2.0 mL of ethanol, hydrogen sulfide gas was added, and the mixture was stirred at room temperature for 3 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried, concentrated under reduced pressure, and purified by a conventional method to obtain 70 mg of 5-isobutoxy-4- (pyrimidin-5-yl) pyridine-2-carbothioamide.
(10) 70 mg of 5-isobutoxy-4- (pyrimidin-5-yl) pyridine-2-carbothioamide is suspended in 2.0 mL of ethanol, 60.0 mg of ethyl-2-chloroacetoacetate is added, and under a nitrogen atmosphere, Heated at 80 ° C. for 5 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried, concentrated under reduced pressure, and purified by a conventional method to give ethyl 4-methyl-2- [5-isobutoxy-4- (pyrimidin-5-yl) pyridin-2-yl. ] 65 mg of 1,3-thiazole-5-carboxylate was obtained.
(11) 65 mg of ethyl 4-methyl-2- [5-isobutoxy-4- (pyrimidin-5-yl) pyridin-2-yl] -1,3-thiazole-5-carboxylate was added to tetrahydrofuran / methanol = 1/1. Was dissolved in 2.0 mL of a mixed solution, and 0.6 mL of 2M aqueous sodium hydroxide solution was added thereto, followed by stirring at room temperature for 3 hours. To the reaction mixture was added 0.6 mL of 2M hydrochloric acid, and extracted with ethyl acetate. The organic layer is washed with brine, dried, concentrated under reduced pressure, and purified by a conventional method to give 2- (5-isobutoxy-4-pyrimidin-5-yl-2-pyridyl) -4-methyl-1, 30.6 mg of 3-thiazole-5-carboxylic acid was obtained.
1 H-NMR (300 MHz, DMSO d 6 ) δ (ppm): 0.98 (6H, d, J = 6.6 Hz), 2.01-2.12 (1H, m), 2.74 (3H, s), 4.12 (2H, d, J = 6.3 Hz), 8.25 (1H, s), 8.68 (1H, s), 9.17 (2H, s), 9.32 (1H) , S), 13.41 (1H, brs)
HPLC retention time: 10.66 minutes Obs Mass (M + + H) : 371.1160
Pred Mass (M + + H): 371.1172
Formula (M): C 18 H 18 N 4 O 3 S
[実施例173および174]
実施例172と同様にして、化合物番号173および174を合成した。 [Examples 173 and 174]
In the same manner as in Example 172, compound numbers 173 and 174 were synthesized.
実施例172と同様にして、化合物番号173および174を合成した。 [Examples 173 and 174]
In the same manner as in Example 172, compound numbers 173 and 174 were synthesized.
[実施例175]1-(5-イソブトキシ-4-オキサゾール-5-イル-2-ピリジル)-1H-ピラゾール-4-カルボン酸(化合物番号175)の合成(合成法M)
(1)2-ブロモ-5-ヒドロキシピリジンから実施例171と同様にして、2-ブロモ-5-イソブトキシピリジン-4-カルバルデヒドを得た。
(2)2-ブロモ-5-イソブトキシピリジン-4-カルバルデヒド103gをエタノール2.0mLに懸濁させ、p-トルエンスルホニルメチルイソシアニド117.1mgおよび炭酸カリウム82.9mgを加え、窒素雰囲気下、80℃で4時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、2-ブロモ-5-イソブトキシ-4-(1,3-オキサゾール-5-イル)ピリジンの粗体を得た。
(3)上記で得られた2-ブロモ-5-イソブトキシ-4-(1,3-オキサゾール-5-イル)ピリジンの粗体119mgにエチル 4-ピラゾールカルボキシレート84.1mg、ヨウ化銅(I)11.4mg、(1S,2S)-(+)-N,N’-ジメチルシクロヘキサン-1,2-ジアミン17.1mgおよび炭酸カリウム110.6mgを加え、トルエン1.6mLに懸濁させ、窒素雰囲気下、110℃で13時間撹拌した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、常法により精製することで、エチル 1-[5-イソブトキシ-4-(1,3-オキサゾール-5-イル)ピリジン-2-イル]-1H-ピラゾール-4-カルボキシレート31mgを得た。
(4)上記で得られたエチル 1-[5-イソブトキシ-4-(1,3-オキサゾール-5-イル)ピリジン-2-イル]-1H-ピラゾール-4-カルボキシレート31mgをテトラヒドロフラン/メタノール=1:1の混合溶液1.0mLに溶解し、2M水酸化ナトリウム水溶液250uLを加えて、室温で3時間撹拌した。反応混合液に2M塩酸250uLを加え、水2mL、酢酸エチル2mLを加えて撹拌し、有機相を濃縮した後に常法により精製することで1-(5-イソブトキシ-4-オキサゾール-5-イル-2-ピリジル)-1H-ピラゾール-4-カルボン酸11.9mgを得た。
1H-NMR(400MHz,DMSO d6)δ(ppm):1.06(6H,d,J=6.8Hz),2.19-2.25(1H,m),4.14(2H,d,J=6.4Hz),7.79(1H,s),8.13(1H,s),8,17(1H,s),8.43(1H,s),8.67(1H,s),8.84(1H,s),12.74(1H,brs)
HPLC保持時間:10.61分
Obs Mass(M++H):329.1235
Pred Mass(M++H):329.1244
Formula(M):C16H16N4O4 Example 175 Synthesis of 1- (5-isobutoxy-4-oxazol-5-yl-2-pyridyl) -1H-pyrazole-4-carboxylic acid (Compound No. 175 ) (Synthesis Method M)
(1) 2-Bromo-5-isobutoxypyridine-4-carbaldehyde was obtained from 2-bromo-5-hydroxypyridine in the same manner as in Example 171.
(2) 103 g of 2-bromo-5-isobutoxypyridine-4-carbaldehyde was suspended in 2.0 mL of ethanol, 117.1 mg of p-toluenesulfonylmethyl isocyanide and 82.9 mg of potassium carbonate were added, and under a nitrogen atmosphere, Heated at 80 ° C. for 4 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried and concentrated under reduced pressure to give a crude product of 2-bromo-5-isobutoxy-4- (1,3-oxazol-5-yl) pyridine.
(3) 119 mg of the crude 2-bromo-5-isobutoxy-4- (1,3-oxazol-5-yl) pyridine obtained above was added to 84.1 mg of ethyl 4-pyrazolecarboxylate and copper iodide (I ) 11.4 mg, (1S, 2S)-(+)-N, N′-dimethylcyclohexane-1,2-diamine (17.1 mg) and potassium carbonate (110.6 mg) are added, suspended in 1.6 mL of toluene, and nitrogen is added. The mixture was stirred at 110 ° C. for 13 hours under an atmosphere. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried, concentrated under reduced pressure, and purified by a conventional method to give ethyl 1- [5-isobutoxy-4- (1,3-oxazol-5-yl) pyridin-2-yl ] -1 H-pyrazole-4-carboxylate 31 mg was obtained.
(4) 31 mg of ethyl 1- [5-isobutoxy-4- (1,3-oxazol-5-yl) pyridin-2-yl] -1H-pyrazole-4-carboxylate obtained above was added to tetrahydrofuran / methanol = It melt | dissolved in 1.0 mL of 1: 1 mixed solution, 2 M sodium hydroxide aqueous solution 250uL was added, and it stirred at room temperature for 3 hours. To the reaction mixture was added 2M hydrochloric acid (250 uL), water (2 mL) and ethyl acetate (2 mL) were added and stirred, and the organic phase was concentrated and purified by a conventional method to obtain 1- (5-isobutoxy-4-oxazol-5-yl- 11.9 mg of 2-pyridyl) -1H-pyrazole-4-carboxylic acid was obtained.
1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 1.06 (6H, d, J = 6.8 Hz), 2.19-2.25 (1H, m), 4.14 (2H, d, J = 6.4 Hz), 7.79 (1H, s), 8.13 (1H, s), 8, 17 (1H, s), 8.43 (1H, s), 8.67 (1H) , S), 8.84 (1H, s), 12.74 (1H, brs)
HPLC retention time: 10.61 minutes Obs Mass (M + + H) : 329.1235
Pred Mass (M + + H): 329.1244
Formula (M): C 16 H 16 N 4 O 4
(1)2-ブロモ-5-ヒドロキシピリジンから実施例171と同様にして、2-ブロモ-5-イソブトキシピリジン-4-カルバルデヒドを得た。
(2)2-ブロモ-5-イソブトキシピリジン-4-カルバルデヒド103gをエタノール2.0mLに懸濁させ、p-トルエンスルホニルメチルイソシアニド117.1mgおよび炭酸カリウム82.9mgを加え、窒素雰囲気下、80℃で4時間加熱した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、2-ブロモ-5-イソブトキシ-4-(1,3-オキサゾール-5-イル)ピリジンの粗体を得た。
(3)上記で得られた2-ブロモ-5-イソブトキシ-4-(1,3-オキサゾール-5-イル)ピリジンの粗体119mgにエチル 4-ピラゾールカルボキシレート84.1mg、ヨウ化銅(I)11.4mg、(1S,2S)-(+)-N,N’-ジメチルシクロヘキサン-1,2-ジアミン17.1mgおよび炭酸カリウム110.6mgを加え、トルエン1.6mLに懸濁させ、窒素雰囲気下、110℃で13時間撹拌した。反応混合液に水を加え、酢酸エチルで抽出した。有機層を食塩水で洗浄後、乾燥、減圧濃縮を行い、常法により精製することで、エチル 1-[5-イソブトキシ-4-(1,3-オキサゾール-5-イル)ピリジン-2-イル]-1H-ピラゾール-4-カルボキシレート31mgを得た。
(4)上記で得られたエチル 1-[5-イソブトキシ-4-(1,3-オキサゾール-5-イル)ピリジン-2-イル]-1H-ピラゾール-4-カルボキシレート31mgをテトラヒドロフラン/メタノール=1:1の混合溶液1.0mLに溶解し、2M水酸化ナトリウム水溶液250uLを加えて、室温で3時間撹拌した。反応混合液に2M塩酸250uLを加え、水2mL、酢酸エチル2mLを加えて撹拌し、有機相を濃縮した後に常法により精製することで1-(5-イソブトキシ-4-オキサゾール-5-イル-2-ピリジル)-1H-ピラゾール-4-カルボン酸11.9mgを得た。
1H-NMR(400MHz,DMSO d6)δ(ppm):1.06(6H,d,J=6.8Hz),2.19-2.25(1H,m),4.14(2H,d,J=6.4Hz),7.79(1H,s),8.13(1H,s),8,17(1H,s),8.43(1H,s),8.67(1H,s),8.84(1H,s),12.74(1H,brs)
HPLC保持時間:10.61分
Obs Mass(M++H):329.1235
Pred Mass(M++H):329.1244
Formula(M):C16H16N4O4 Example 175 Synthesis of 1- (5-isobutoxy-4-oxazol-5-yl-2-pyridyl) -1H-pyrazole-4-carboxylic acid (Compound No. 175 ) (Synthesis Method M)
(1) 2-Bromo-5-isobutoxypyridine-4-carbaldehyde was obtained from 2-bromo-5-hydroxypyridine in the same manner as in Example 171.
(2) 103 g of 2-bromo-5-isobutoxypyridine-4-carbaldehyde was suspended in 2.0 mL of ethanol, 117.1 mg of p-toluenesulfonylmethyl isocyanide and 82.9 mg of potassium carbonate were added, and under a nitrogen atmosphere, Heated at 80 ° C. for 4 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed with brine, dried and concentrated under reduced pressure to give a crude product of 2-bromo-5-isobutoxy-4- (1,3-oxazol-5-yl) pyridine.
(3) 119 mg of the crude 2-bromo-5-isobutoxy-4- (1,3-oxazol-5-yl) pyridine obtained above was added to 84.1 mg of ethyl 4-pyrazolecarboxylate and copper iodide (I ) 11.4 mg, (1S, 2S)-(+)-N, N′-dimethylcyclohexane-1,2-diamine (17.1 mg) and potassium carbonate (110.6 mg) are added, suspended in 1.6 mL of toluene, and nitrogen is added. The mixture was stirred at 110 ° C. for 13 hours under an atmosphere. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer is washed with brine, dried, concentrated under reduced pressure, and purified by a conventional method to give ethyl 1- [5-isobutoxy-4- (1,3-oxazol-5-yl) pyridin-2-yl ] -1 H-pyrazole-4-carboxylate 31 mg was obtained.
(4) 31 mg of ethyl 1- [5-isobutoxy-4- (1,3-oxazol-5-yl) pyridin-2-yl] -1H-pyrazole-4-carboxylate obtained above was added to tetrahydrofuran / methanol = It melt | dissolved in 1.0 mL of 1: 1 mixed solution, 2 M sodium hydroxide aqueous solution 250uL was added, and it stirred at room temperature for 3 hours. To the reaction mixture was added 2M hydrochloric acid (250 uL), water (2 mL) and ethyl acetate (2 mL) were added and stirred, and the organic phase was concentrated and purified by a conventional method to obtain 1- (5-isobutoxy-4-oxazol-5-yl- 11.9 mg of 2-pyridyl) -1H-pyrazole-4-carboxylic acid was obtained.
1 H-NMR (400 MHz, DMSO d 6 ) δ (ppm): 1.06 (6H, d, J = 6.8 Hz), 2.19-2.25 (1H, m), 4.14 (2H, d, J = 6.4 Hz), 7.79 (1H, s), 8.13 (1H, s), 8, 17 (1H, s), 8.43 (1H, s), 8.67 (1H) , S), 8.84 (1H, s), 12.74 (1H, brs)
HPLC retention time: 10.61 minutes Obs Mass (M + + H) : 329.1235
Pred Mass (M + + H): 329.1244
Formula (M): C 16 H 16 N 4 O 4
[実施例176]
以上の実施例の方法に従って合成された化合物について、キサンチンオキシダーゼ阻害活性を測定した。
(1)試験化合物の調製
試験化合物をDMSO(シグマ社製)に20mMの濃度になるように溶解した後、使用時の目的の濃度に調製して用いた。
(2)測定方法
本発明化合物のキサンチンオキシダーゼ阻害活性評価を文献記載の方法(Method Enzymatic Analysis,1,521-522,1974)を一部改変して実施した。本評価はオキシダーゼ型キサンチンオキシダーゼ阻害活性評価に基づく。すなわち、あらかじめ20mM水酸化ナトリウム溶液にて10mMに調製したキサンチン(シグマ社製)溶液を100mMリン酸緩衝液を用いて30μMに調製し、96穴プレートに75μL/穴ずつ加えた。最終濃度の100倍になるようにDMSOにて希釈した各試験化合物を1.5μL/穴ずつ添加し、ミキシング後にマイクロプレートリーダーSPECTRA max Plus384(モレキュラーデバイス社製)にて290nmの吸光度を測定した。続けてオキシダーゼ型キサンチンオキシダーゼ(バターミルク由来、Calbiochem社製)を100mMリン酸緩衝液を用いて30.6mU/mLに調製し、73.5μL/穴ずつ加えた。ミキシング後速やかに290nmにおける吸光度変化を5分間測定した。試験化合物溶液の代わりにDMSOを添加したときの酵素活性を100%として試験化合物の阻害率を計算し、用量応答曲線にフィットさせてオキシダーゼ型キサンチンオキシダーゼに対する50%阻害濃度を計算した。
この結果を次の表に示す。但し、表中の記号(+、++、+++)は以下の通りの阻害活性値を表しているものとする。
10.0nM≦IC50:+
5.0nM≦IC50<10.0nM:++
1.0nM≦IC50<5.0nM:+++ [Example 176]
About the compound synthesize | combined according to the method of the above Example, the xanthine oxidase inhibitory activity was measured.
(1) Preparation of test compound A test compound was dissolved in DMSO (manufactured by Sigma) so as to have a concentration of 20 mM, and then adjusted to a target concentration at the time of use.
(2) Measurement method The xanthine oxidase inhibitory activity of the compounds of the present invention was evaluated by partially modifying the method described in the literature (Method Enzymatic Analysis, 1,521-522, 1974). This evaluation is based on the evaluation of oxidase type xanthine oxidase inhibitory activity. That is, a xanthine (manufactured by Sigma) solution prepared to 10 mM in a 20 mM sodium hydroxide solution in advance was prepared to 30 μM using a 100 mM phosphate buffer, and 75 μL / well was added to a 96-well plate. Each test compound diluted with DMSO to a final concentration of 100 times was added at 1.5 μL / well, and after mixing, the absorbance at 290 nm was measured with a microplate reader SPECTRA max Plus 384 (manufactured by Molecular Devices). Subsequently, oxidase-type xanthine oxidase (derived from buttermilk, Calbiochem) was prepared to 30.6 mU / mL using 100 mM phosphate buffer, and 73.5 μL / well was added. Immediately after mixing, the change in absorbance at 290 nm was measured for 5 minutes. The inhibition rate of the test compound was calculated by setting the enzyme activity when DMSO was added instead of the test compound solution as 100%, and a 50% inhibitory concentration against the oxidase type xanthine oxidase was calculated by fitting to a dose response curve.
The results are shown in the following table. However, the symbols (+, ++, ++) in the table represent the inhibitory activity values as follows.
10.0 nM ≦ IC 50 : +
5.0 nM ≦ IC 50 <10.0 nM: ++
1.0 nM ≦ IC 50 <5.0 nM: +++
以上の実施例の方法に従って合成された化合物について、キサンチンオキシダーゼ阻害活性を測定した。
(1)試験化合物の調製
試験化合物をDMSO(シグマ社製)に20mMの濃度になるように溶解した後、使用時の目的の濃度に調製して用いた。
(2)測定方法
本発明化合物のキサンチンオキシダーゼ阻害活性評価を文献記載の方法(Method Enzymatic Analysis,1,521-522,1974)を一部改変して実施した。本評価はオキシダーゼ型キサンチンオキシダーゼ阻害活性評価に基づく。すなわち、あらかじめ20mM水酸化ナトリウム溶液にて10mMに調製したキサンチン(シグマ社製)溶液を100mMリン酸緩衝液を用いて30μMに調製し、96穴プレートに75μL/穴ずつ加えた。最終濃度の100倍になるようにDMSOにて希釈した各試験化合物を1.5μL/穴ずつ添加し、ミキシング後にマイクロプレートリーダーSPECTRA max Plus384(モレキュラーデバイス社製)にて290nmの吸光度を測定した。続けてオキシダーゼ型キサンチンオキシダーゼ(バターミルク由来、Calbiochem社製)を100mMリン酸緩衝液を用いて30.6mU/mLに調製し、73.5μL/穴ずつ加えた。ミキシング後速やかに290nmにおける吸光度変化を5分間測定した。試験化合物溶液の代わりにDMSOを添加したときの酵素活性を100%として試験化合物の阻害率を計算し、用量応答曲線にフィットさせてオキシダーゼ型キサンチンオキシダーゼに対する50%阻害濃度を計算した。
この結果を次の表に示す。但し、表中の記号(+、++、+++)は以下の通りの阻害活性値を表しているものとする。
10.0nM≦IC50:+
5.0nM≦IC50<10.0nM:++
1.0nM≦IC50<5.0nM:+++ [Example 176]
About the compound synthesize | combined according to the method of the above Example, the xanthine oxidase inhibitory activity was measured.
(1) Preparation of test compound A test compound was dissolved in DMSO (manufactured by Sigma) so as to have a concentration of 20 mM, and then adjusted to a target concentration at the time of use.
(2) Measurement method The xanthine oxidase inhibitory activity of the compounds of the present invention was evaluated by partially modifying the method described in the literature (Method Enzymatic Analysis, 1,521-522, 1974). This evaluation is based on the evaluation of oxidase type xanthine oxidase inhibitory activity. That is, a xanthine (manufactured by Sigma) solution prepared to 10 mM in a 20 mM sodium hydroxide solution in advance was prepared to 30 μM using a 100 mM phosphate buffer, and 75 μL / well was added to a 96-well plate. Each test compound diluted with DMSO to a final concentration of 100 times was added at 1.5 μL / well, and after mixing, the absorbance at 290 nm was measured with a microplate reader SPECTRA max Plus 384 (manufactured by Molecular Devices). Subsequently, oxidase-type xanthine oxidase (derived from buttermilk, Calbiochem) was prepared to 30.6 mU / mL using 100 mM phosphate buffer, and 73.5 μL / well was added. Immediately after mixing, the change in absorbance at 290 nm was measured for 5 minutes. The inhibition rate of the test compound was calculated by setting the enzyme activity when DMSO was added instead of the test compound solution as 100%, and a 50% inhibitory concentration against the oxidase type xanthine oxidase was calculated by fitting to a dose response curve.
The results are shown in the following table. However, the symbols (+, ++, ++) in the table represent the inhibitory activity values as follows.
10.0 nM ≦ IC 50 : +
5.0 nM ≦ IC 50 <10.0 nM: ++
1.0 nM ≦ IC 50 <5.0 nM: +++
[実施例177]
血中尿酸低下作用(正常ラット)
化合物番号6、67および86の化合物について、血中尿酸低下作用を確認した。8~9週齢のSprague-Dawley系雄性ラット(日本チャールス・リバー株式会社)に0.5%メチルセルロース液に懸濁した試験化合物を経口ゾンデを用いて強制投与した。投与後2時間に尾静脈より採血した後、血漿を分離した。血中尿酸値は尿酸測定キット(LタイプワコーUA・F:和光純薬工業)を用いて、ウリカーゼ法にて吸光度計を用いて測定し、尿酸低下率を下式により求めた。
尿酸低下率(%)=(対照動物の尿酸値-試験化合物投与動物の尿酸値)x100/対照動物の尿酸値
化合物番号6、67及び86の化合物は10mg/kgの用量で投与後2時間において、尿酸低下率50%以上を示した。以上のように、本発明化合物の強力な尿酸低下作用が示された。 [Example 177]
Blood uric acid lowering effect (normal rat)
The compounds Nos. 6 , 67 and 86 were confirmed to have a blood uric acid lowering effect. Test compounds suspended in 0.5% methylcellulose solution were forcibly administered to male Sprague-Dawley rats (Charles River Japan Co., Ltd.) 8-9 weeks old using an oral sonde. Two hours after administration, blood was collected from the tail vein, and plasma was separated. The blood uric acid level was measured using a uric acid measurement kit (L type Wako UA • F: Wako Pure Chemical Industries) with an absorptiometer by the uricase method, and the uric acid reduction rate was determined by the following equation.
Uric acid reduction rate (%) = (Uric acid level of control animals−Uric acid level of animals receiving test compound) × 100 / Uric acid level of control animals Compound Nos. 6 , 67 and 86 were administered at a dose of 10 mg / kg at 2 hours after administration. The uric acid reduction rate was 50% or more. As described above, the strong uric acid lowering action of the compound of the present invention was shown.
血中尿酸低下作用(正常ラット)
化合物番号6、67および86の化合物について、血中尿酸低下作用を確認した。8~9週齢のSprague-Dawley系雄性ラット(日本チャールス・リバー株式会社)に0.5%メチルセルロース液に懸濁した試験化合物を経口ゾンデを用いて強制投与した。投与後2時間に尾静脈より採血した後、血漿を分離した。血中尿酸値は尿酸測定キット(LタイプワコーUA・F:和光純薬工業)を用いて、ウリカーゼ法にて吸光度計を用いて測定し、尿酸低下率を下式により求めた。
尿酸低下率(%)=(対照動物の尿酸値-試験化合物投与動物の尿酸値)x100/対照動物の尿酸値
化合物番号6、67及び86の化合物は10mg/kgの用量で投与後2時間において、尿酸低下率50%以上を示した。以上のように、本発明化合物の強力な尿酸低下作用が示された。 [Example 177]
Blood uric acid lowering effect (normal rat)
The compounds Nos. 6 , 67 and 86 were confirmed to have a blood uric acid lowering effect. Test compounds suspended in 0.5% methylcellulose solution were forcibly administered to male Sprague-Dawley rats (Charles River Japan Co., Ltd.) 8-9 weeks old using an oral sonde. Two hours after administration, blood was collected from the tail vein, and plasma was separated. The blood uric acid level was measured using a uric acid measurement kit (L type Wako UA • F: Wako Pure Chemical Industries) with an absorptiometer by the uricase method, and the uric acid reduction rate was determined by the following equation.
Uric acid reduction rate (%) = (Uric acid level of control animals−Uric acid level of animals receiving test compound) × 100 / Uric acid level of control animals Compound Nos. 6 , 67 and 86 were administered at a dose of 10 mg / kg at 2 hours after administration. The uric acid reduction rate was 50% or more. As described above, the strong uric acid lowering action of the compound of the present invention was shown.
本発明の前記式(I)で表される化合物、およびその製薬学的に許容される塩は、キサンチンオキシダーゼ阻害活性を有し、キサンチンオキシダーゼ阻害剤として臨床で応用可能な、特に、痛風、高尿酸血症、腫瘍崩壊症候群、尿路結石、高血圧症、脂質異常症、糖尿病、動脈硬化症や心不全等の心血管疾患、糖尿病性腎症等の腎疾患、慢性閉塞性肺疾患等の呼吸器疾患、炎症性腸疾患または自己免疫性疾患等、キサンチンオキシダーゼの関与する疾患の治療薬または予防薬として使用することができる。
The compound represented by the above formula (I) of the present invention and a pharmaceutically acceptable salt thereof have xanthine oxidase inhibitory activity and are clinically applicable as xanthine oxidase inhibitors. Respiratory organs such as uricemia, tumor lysis syndrome, urolithiasis, hypertension, dyslipidemia, diabetes, cardiovascular diseases such as arteriosclerosis and heart failure, renal diseases such as diabetic nephropathy, chronic obstructive pulmonary disease It can be used as a therapeutic or prophylactic agent for diseases involving xanthine oxidase such as diseases, inflammatory bowel diseases or autoimmune diseases.
Claims (18)
- 式(I)で表される化合物またはその製薬学的に許容される塩。
[式中、
R0は、次のR01またはR02を表す。
R1は、1もしくは複数の炭素数1~6のアルキル基、炭素数1~6のアルコキシ基もしくはハロゲン原子で置換されていてもよいアリール基、OR、環を形成していてもよいNRR’、またはSRを表し、ここで、RおよびR’は独立して、水素原子、1もしくは複数の炭素数1~8のアルコキシ基、ハロゲン原子もしくは水酸基で置換されていてもよい炭素数1~8のアルキル基、1もしくは複数の炭素数1~6のアルキル基、炭素数1~6のアルコキシ基、ハロゲン原子もしくはシアノ基で置換されていてもよいアリール基、または1もしくは複数の炭素数1~6のアルキル基、炭素数1~6のアルコキシ基もしくはハロゲン原子で置換されていてもよいヘテロアリール基を表す。
R2は、水素原子、アミノ基、または1もしくは複数のハロゲン原子で置換されていてもよい炭素数1~8のアルキル基を表す。
X1は、CR3または窒素原子を表し、ここで、R3は水素原子、またはハロゲン原子を表す。
環Aは、1もしくは複数の炭素数1~3のアルコキシ基もしくはハロゲン原子で置換されていてもよい炭素数1~6のアルキル基、1もしくは複数のハロゲン原子で置換されていてもよい炭素数1~6のアルコキシ基、およびハロゲン原子からなる群より選択される1~4個の基で置換されていてもよい5または6員の単環性のヘテロアレーンを表す。] A compound represented by formula (I) or a pharmaceutically acceptable salt thereof.
[Where:
R 0 represents the following R 01 or R 02 .
R 1 represents one or a plurality of alkyl groups having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an aryl group optionally substituted with a halogen atom, OR, or NRR ′ which may form a ring. Or SR, wherein R and R ′ are each independently a hydrogen atom, one or more alkoxy groups having 1 to 8 carbon atoms, a halogen atom or a hydroxyl group optionally substituted with a hydroxyl group. 1 or a plurality of alkyl groups having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an aryl group optionally substituted with a halogen atom or a cyano group, or one or more carbon atoms having 1 to 6 carbon atoms 6 represents an alkyl group having 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, or a heteroaryl group optionally substituted with a halogen atom.
R 2 represents a hydrogen atom, an amino group, or an alkyl group having 1 to 8 carbon atoms which may be substituted with one or more halogen atoms.
X 1 represents CR 3 or a nitrogen atom, wherein R 3 represents a hydrogen atom or a halogen atom.
Ring A is an alkyl group having 1 to 6 carbon atoms which may be substituted with one or more alkoxy groups having 1 to 3 carbon atoms or a halogen atom, and the number of carbons which may be substituted with one or more halogen atoms. It represents a 5- or 6-membered monocyclic heteroarene which may be substituted with 1 to 6 alkoxy groups and 1 to 4 groups selected from the group consisting of halogen atoms. ] - X1がCR3であり、R3が水素原子またはフッ素原子である、請求項1または2記載の化合物またはその製薬学的に許容される塩。 The compound according to claim 1 or 2, or a pharmaceutically acceptable salt thereof, wherein X 1 is CR 3 and R 3 is a hydrogen atom or a fluorine atom.
- X1が窒素原子である、請求項1または2記載の化合物またはその製薬学的に許容される塩。 X 1 is a nitrogen atom, a compound or a pharmaceutically acceptable salt thereof according to claim 1 or 2 wherein.
- R0がR01である、請求項1~4のいずれかに記載の化合物またはその製薬学的に許容される塩。 The compound or a pharmaceutically acceptable salt thereof according to any one of claims 1 to 4, wherein R 0 is R 01 .
- R2がメチル基である、請求項1~5のいずれかに記載の化合物またはその製薬学的に許容される塩。 The compound or a pharmaceutically acceptable salt thereof according to any one of claims 1 to 5, wherein R 2 is a methyl group.
- R2が水素原子である、請求項1~5のいずれかに記載の化合物またはその製薬学的に許容される塩。 The compound or a pharmaceutically acceptable salt thereof according to any one of claims 1 to 5, wherein R 2 is a hydrogen atom.
- R0がR02である、請求項1~4のいずれかに記載の化合物またはその製薬学的に許容される塩。 The compound or a pharmaceutically acceptable salt thereof according to any one of claims 1 to 4, wherein R 0 is R 02 .
- R2が水素原子またはアミノ基である、請求項8記載の化合物またはその製薬学的に許容される塩。 The compound or a pharmaceutically acceptable salt thereof according to claim 8, wherein R 2 is a hydrogen atom or an amino group.
- R1がORである、請求項1~9のいずれかに記載の化合物またはその製薬学的に許容される塩。 The compound or a pharmaceutically acceptable salt thereof according to any one of claims 1 to 9, wherein R 1 is OR.
- Rが1もしくは複数の炭素数1~8のアルコキシ基またはハロゲン原子で置換されていてもよい炭素数1~8のアルキル基である、請求項10記載の化合物またはその製薬学的に許容される塩。 11. The compound according to claim 10 or a pharmaceutically acceptable compound thereof, wherein R is one or more alkoxy groups having 1 to 8 carbon atoms or an alkyl group having 1 to 8 carbon atoms which may be substituted with a halogen atom. salt.
- Rが1もしくは複数の炭素数1~3のアルキル基、炭素数1~3のアルコキシ基、ハロゲン原子もしくはシアノ基で置換されていてもよいアリール基である、請求項10記載の化合物またはその製薬学的に許容される塩。 The compound according to claim 10, wherein R is an aryl group optionally substituted by one or more alkyl groups having 1 to 3 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, a halogen atom or a cyano group, or a pharmaceutical thereof A chemically acceptable salt.
- R1が1もしくは複数の炭素数1~3のアルキル基、炭素数1~3のアルコキシ基もしくはハロゲン原子で置換されていてもよいアリール基である、請求項1~9のいずれかに記載の化合物またはその製薬学的に許容される塩。 The R 1 is one or more alkyl groups having 1 to 3 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, or an aryl group optionally substituted with a halogen atom. A compound or a pharmaceutically acceptable salt thereof.
- 以下の(1)~(175)より選択されるいずれかの化合物またはその製薬学的に許容される塩。
(1)2-[4-イソブトキシ-3-(2-ピリジル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(2)2-[4-イソブトキシ-3-(3-ピリジル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(3)2-[4-イソブトキシ-3-(4-ピリジル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(4)2-(4-イソブトキシ-3-チアゾール-2-イル-フェニル)-4-メチル-1,3-チアゾール-5-カルボン酸
(5)2-(4-イソブトキシ-3-チアゾール-4-イル-フェニル)-4-メチル-1,3-チアゾール-5-カルボン酸
(6)2-(4-イソブトキシ-3-チアゾール-5-イル-フェニル)-4-メチル-1,3-チアゾール-5-カルボン酸
(7)2-(4-イソブトキシ-3-ピラジン-2-イル-フェニル)-4-メチル-1,3-チアゾール-5-カルボン酸
(8)2-[4-イソブトキシ-3-(3-チエニル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(9)2-[3-(3-フリル)-4-イソブトキシフェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(10)2-[3-(3,5-ジメチルイソオキサゾール-4-イル)-4-イソブトキシフェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(11)2-[4-(2,2-ジメチルプロポキシ)-3-チアゾール-5-イル-フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(12)2-[4-(シクロブチルメトキシ)-3-チアゾール-5-イル-フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(13)2-[4-(シクロペンチルメトキシ)-3-チアゾール-5-イル-フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(14)2-[4-(シクロペントキシ)-3-チアゾール-5-イル-フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(15)2-[4-(シクロヘキサオキシ)-3-チアゾール-5-イル-フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(16)2-[3-(3-フリル)-4-フェノキシフェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(17)2-[4-(2-フルオロフェノキシ)-3-(3-フリル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(18)2-(4-イソブトキシ-3-イソチアゾール-4-イル-フェニル)-4-メチル-1,3-チアゾール-5-カルボン酸
(19)2-[4-イソブトキシ-3-(1,3,4-チアジアゾール-2-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(20)2-(4-イソブトキシ-3-イソオキサゾール-4-イル-フェニル)-4-メチル-1,3-チアゾール-5-カルボン酸
(21)2-[4-イソブトキシ-3-(1H-ピラゾール-4-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(22)2-[4-イソブトキシ-3-(3-メチル-1H-ピラゾール-4-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(23)2-[3-(1H-イミダゾール-4-イル)-4-イソブトキシフェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(24)2-[4-イソブトキシ-3-(3-メチルイミダゾール-4-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(25)2-[4-イソブトキシ-3-(1-メチルピラゾール-4-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(26)2-(4-イソブトキシ-3-ピリミジン-5-イル-フェニル)-4-メチル-1,3-チアゾール-5-カルボン酸
(27)2-[4-イソブトキシ-3-(2-メチルチアゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(28)2-[3-(1,2-ジメチルイミダゾール-4-イル)-4-イソブトキシフェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(29)2-[3-(2,3-ジメチルイミダゾール-4-イル)-4-イソブトキシフェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(30)2-[3-(3,5-ジメチルイソオキサゾール-4-イル)-4-(2,2-ジメチルプロポキシ)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(31)2-[4-(シクロペンチルメトキシ)-3-(3,5-ジメチルイソオキサゾール-4-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(32)2-[4-(シクロペントキシ)-3-(3,5-ジメチルイソオキサゾール-4-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(33)2-[4-(シクロヘキサオキシ)-3-(3,5-ジメチルイソオキサゾール-4-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(34)2-[4-(2,2-ジフルオロエトキシ)-3-(3,5-ジメチルイソオキサゾール-4-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(35)2-[3-(3,5-ジメチルイソオキサゾール-4-イル)-4-イソプロポキシフェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(36)2-(4-イソプロポキシ-3-ピリミジン-5-イル-フェニル)-4-メチル-1,3-チアゾール-5-カルボン酸
(37)2-[4-(2,2-ジメチルプロポキシ)-3-ピリミジン-5-イル-フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(38)2-[4-(2,2-ジフルオロエトキシ)-3-ピリミジン-5-イル-フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(39)4-メチル-2-(4-フェノキシ-3-ピリミジン-5-イル-フェニル)-1,3-チアゾール-5-カルボン酸
(40)2-[3-(3,5-ジメチルイソオキサゾール-4-イル)-4-フェノキシフェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(41)2-[3-(3,5-ジメチルイソオキサゾール-4-イル)-4-(2-フルオロフェノキシ)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(42)2-[3-(3,5-ジメチルイソオキサゾール-4-イル)-4-(2-メトキシフェノキシ)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(43)2-[4-(2,6-ジフルオロフェノキシ)-3-(3,5-ジメチルイソオキサゾール-4-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(44)4-メチル-2-[4-(2-メチルフェノキシ)-3-ピリミジン-5-イル-フェニル]-1,3-チアゾール-5-カルボン酸
(45)2-[4-(2-フルオロフェノキシ)-3-ピリミジン-5-イル-フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(46)2-[4-(2-フルオロ-5-メチルフェノキシ)-3-ピリミジン-5-イル-フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(47)2-[4-(2,5-ジフルオロフェノキシ)-3-ピリミジン-5-イル-フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(48)2-[4-(2,6-ジフルオロフェノキシ)-3-ピリミジン-5-イル-フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(49)4-メチル-2-[4-フェノキシ-3-(3-ピリジル)フェニル]-1,3-チアゾール-5-カルボン酸
(50)4-メチル-2-[4-フェノキシ-3-(4-ピリジル)フェニル]-1,3-チアゾール-5-カルボン酸
(51)4-メチル-2-(4-フェノキシ-3-チアゾール-5-イル-フェニル)-1,3-チアゾール-5-カルボン酸
(52)2-[4-(2,2-ジフルオロエトキシ)-3-チアゾール-5-イル-フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(53)4-メチル-2-[3-チアゾール-5-イル-4-(2,2,2-トリフルオロエトキシ)フェニル]-1,3-チアゾール-5-カルボン酸
(54)4-メチル-2-[4-[(3R)-テトラヒドロフラン-3-イル]オキシ-3-チアゾール-5-イル-フェニル]-1,3-チアゾール-5-カルボン酸
(55)2-[3-(3,5-ジメチルイソオキサゾール-4-イル)-4-(3-フルオロフェノキシ)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(56)2-[3-(3,5-ジメチルイソオキサゾール-4-イル)-4-(2-メチルフェノキシ)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(57)2-[3-(3,5-ジメチルイソオキサゾール-4-イル)-4-(3-メチルフェノキシ)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(58)2-[3-(3,5-ジメチルイソオキサゾール-4-イル)-4-(4-メチルフェノキシ)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(59)2-[4-(2-クロロフェノキシ)-3-(3,5-ジメチルイソオキサゾール-4-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(60)2-[3-(3,5-ジメチルイソオキサゾール-4-イル)-4-(4-フルオロ-3-メチルフェノキシ)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(61)2-[3-(3,5-ジメチルイソオキサゾール-4-イル)-4-(4-フルオロ-2-メチルフェノキシ)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(62)2-[4-(2,4-ジフルオロフェノキシ)-3-(3,5-ジメチルイソオキサゾール-4-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(63)2-[4-(2,5-ジフルオロフェノキシ)-3-(3,5-ジメチルイソオキサゾール-4-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(64)2-[3-(3,5-ジメチルイソオキサゾール-4-イル)-4-(2-フルオロ-5-メチルフェノキシ)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(65)2-[3-(3,5-ジメチルイソオキサゾール-4-イル)-4-(3-フルオロ-5-メチルフェノキシ)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(66)2-[3-(3,5-ジメチルイソオキサゾール-4-イル)-4-(2-フルオロ-6-メトキシフェノキシ)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(67)2-(4-イソブトキシ-3-オキサゾール-5-イル-フェニル)-4-メチル-1,3-チアゾール-5-カルボン酸
(68)2-(2-フルオロ-4-イソブトキシ-5-オキサゾール-5-イル-フェニル)-4-メチル-1,3-チアゾール-5-カルボン酸
(69)2-[4-(シクロブチルメトキシ)-3-オキサゾール-5-イル-フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(70)2-[4-(シクロペンチルメトキシ)-3-オキサゾール-5-イル-フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(71)2-[4-(シクロブトキシ)-3-オキサゾール-5-イル-フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(72)2-[4-(シクロペントキシ)-3-オキサゾール-5-イル-フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(73)2-[4-(シクロプロピルメトキシ)-3-オキサゾール-5-イル-フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(74)4-メチル-2-[4-[(1R)-1-メチルプロポキシ]-3-オキサゾール-5-イル-フェニル]-1,3-チアゾール-5-カルボン酸
(75)2-[4-(2,2-ジフルオロエトキシ)-3-オキサゾール-5-イル-フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(76)4-メチル-2-[3-オキサゾール-5-イル-4-[(3R)-テトラヒドロフラン-3-イル]オキシフェニル]-1,3-チアゾール-5-カルボン酸
(77)2-[4-[(1R,2R)-2-フルオロシクロヘキサオキシ]-3-オキサゾール-5-イル-フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(78)2-[4-(1-シクロプロピルエトキシ)-3-オキサゾール-5-イル-フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(79)2-[4-(1,2-ジメチルプロポキシ)-3-オキサゾール-5-イル-フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(80)4-メチル-2-[4-[(2-メチルシクロプロピル)メトキシ]-3-オキサゾール-5-イル-フェニル]-1,3-チアゾール-5-カルボン酸
(81)2-[4-(2,2-ジメチルプロポキシ)-3-オキサゾール-5-イル-フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(82)4-メチル-2-[4-[(3-メチルオキセタン-3-イル)メトキシ]-3-オキサゾール-5-イル-フェニル]-1,3-チアゾール-5-カルボン酸
(83)2-[4-イソブトキシ-3-(4-メチルオキサゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(84)2-[4-イソブトキシ-3-(1H-テトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(85)2-[4-イソブトキシ-3-(2H-テトラゾール-5-イル)フェニル]-1,3-チアゾール-5-カルボン酸
(86)2-[4-イソブトキシ-3-(1-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(87)2-[4-イソブトキシ-3-(2-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(88)2-[3-(2-エチルテトラゾール-5-イル)-4-イソブトキシフェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(89)2-[3-(1-エチルテトラゾール-5-イル)-4-イソブトキシフェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(90)2-[4-(2,2-ジメチルプロポキシ)-3-(1-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(91)4-メチル-2-[4-[(1R)-1-メチルプロポキシ]-3-(1-メチルテトラゾール-5-イル)フェニル]-1,3-チアゾール-5-カルボン酸
(92)4-メチル-2-[4-[(1S)-1-メチルプロポキシ]-3-(1-メチルテトラゾール-5-イル)フェニル]-1,3-チアゾール-5-カルボン酸
(93)2-[4-(シクロブチルメトキシ)-3-(1-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(94)2-[4-(シクロペンチルメトキシ)-3-(1-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(95)2-[4-(シクロペントキシ)-3-(1-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(96)2-[4-(シクロヘキサオキシ)-3-(1-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(97)2-[4-(2,2-ジメチルプロポキシ)-3-(2-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(98)4-メチル-2-[4-[(1R)-1-メチルプロポキシ]-3-(2-メチルテトラゾール-5-イル)フェニル]-1,3-チアゾール-5-カルボン酸
(99)4-メチル-2-[4-[(1S)-1-メチルプロポキシ]-3-(2-メチルテトラゾール-5-イル)フェニル]-1,3-チアゾール-5-カルボン酸
(100)2-[4-(シクロブチルメトキシ)-3-(2-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(101)2-[4-(シクロペンチルメトキシ)-3-(2-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(102)2-[4-(シクロペントキシ)-3-(2-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(103)2-[4-(シクロヘキサオキシ)-3-(2-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(104)2-[2-フルオロ-4-イソブトキシ-5-(2-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(105)2-[2-フルオロ-4-イソブトキシ-5-(1-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(106)4-メチル-2-[3-(1-メチルテトラゾール-5-イル)-4-フェノキシフェニル]-1,3-チアゾール-5-カルボン酸
(107)4-メチル-2-[3-(2-メチルテトラゾール-5-イル)-4-フェノキシフェニル]-1,3-チアゾール-5-カルボン酸
(108)2-[4-(2-メトキシフェノキシ)-3-(1-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(109)2-[4-(2-フルオロフェノキシ)-3-(1-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(110)4-メチル-2-[4-(4-メチルフェノキシ)-3-(1-メチルテトラゾール-5-イル)フェニル]-1,3-チアゾール-5-カルボン酸
(111)2-[4-(2,5-ジフルオロフェノキシ)-3-(1-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(112)2-[4-(2-フルオロ-5-メチルフェノキシ)-3-(1-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(113)2-[4-(3-フルオロ-5-メチルフェノキシ)-3-(1-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(114)2-[4-(2-フルオロ-6-メトキシフェノキシ)-3-(1-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(115)2-[4-(2-フルオロフェノキシ)-3-(2-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(116)4-メチル-2-[4-(3-メチルフェノキシ)-3-(2-メチルテトラゾール-5-イル)フェニル]-1,3-チアゾール-5-カルボン酸
(117)4-メチル-2-[4-(4-メチルフェノキシ)-3-(2-メチルテトラゾール-5-イル)フェニル]-1,3-チアゾール-5-カルボン酸
(118)2-[4-(2,5-ジフルオロフェノキシ)-3-(2-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(119)2-[4-(2-フルオロ-5-メチルフェノキシ)-3-(2-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(120)2-[4-(3-フルオロ-5-メチルフェノキシ)-3-(2-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(121)2-[4-(2-フルオロ-6-メトキシフェノキシ)-3-(2-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(122)2-[4-(3-フルオロフェノキシ)-3-(1-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(123)4-メチル-2-[4-(2-メチルフェノキシ)-3-(1-メチルテトラゾール-5-イル)フェニル]-1,3-チアゾール-5-カルボン酸
(124)4-メチル-2-[4-(3-メチルフェノキシ)-3-(1-メチルテトラゾール-5-イル)フェニル]-1,3-チアゾール-5-カルボン酸
(125)2-[4-(2-クロロフェノキシ)-3-(1-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(126)2-[4-(4-フルオロ-3-メチルフェノキシ)-3-(1-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(127)2-[4-(4-フルオロ-2-メトキシフェノキシ)-3-(1-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(128)2-[4-(4-フルオロ-2-メチルフェノキシ)-3-(1-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(129)2-[4-(2,4-ジフルオロフェノキシ)-3-(1-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(130)2-[4-(2,6-ジフルオロフェノキシ)-3-(1-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(131)2-[4-(2-メトキシフェノキシ)-3-(2-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(132)2-[4-(3-フルオロフェノキシ)-3-(2-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(133)4-メチル-2-[4-(2-メチルフェノキシ)-3-(2-メチルテトラゾール-5-イル)フェニル]-1,3-チアゾール-5-カルボン酸
(134)2-[4-(2-クロロフェノキシ)-3-(2-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(135)2-[4-(4-フルオロ-3-メチルフェノキシ)-3-(2-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(136)2-[4-(4-フルオロ-2-メトキシフェノキシ)-3-(2-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(137)2-[4-(4-フルオロ-2-メチルフェノキシ)-3-(2-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(138)2-[4-(2,4-ジフルオロフェノキシ)-3-(2-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(139) 2-[4-(2,6-ジフルオロフェノキシ)-3-(2-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(140)2-[4-(2-シアノフェノキシ)-3-(1-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(141)2-[4-(2-シアノフェノキシ)-3-(2-メチルテトラゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(142)4-メチル-2-[3-(1-メチルテトラゾール-5-イル)-4-フェニルフェニル]-1,3-チアゾール-5-カルボン酸
(143)4-メチル-2-[3-(2-メチルテトラゾール-5-イル)-4-フェニルフェニル]-1,3-チアゾール-5-カルボン酸
(144)2-[4-イソブトキシ-3-(5-メチル-1,2,4-オキサジアゾール-3-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(145)2-(4-イソブトキシ-3-イソオキサゾール-3-イル-フェニル)-4-メチル-1,3-チアゾール-5-カルボン酸
(146)2-[4-イソブトキシ-3-[5-(メトキシメチル)イソオキサゾール-3-イル]フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(147)2-[4-イソブトキシ-3-(1,2,4-オキサジアゾール-3-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(148)2-[4-イソブトキシ-3-(3-メチル-1,2,4-オキサジアゾール-5-イル)フェニル]-4-メチル-1,3-チアゾール-5-カルボン酸
(149)1-(4-イソブトキシ-3-チアゾール-5-イル-フェニル)-1H-ピラゾール-4-カルボン酸
(150)3-アミノ-1-(4-イソブトキシ-3-チアゾール-5-イル-フェニル)-1H-ピラゾール-4-カルボン酸
(151)1-[4-イソブトキシ-3-(2-メチルチアゾール-5-イル)フェニル]-1H-ピラゾール-4-カルボン酸
(152)1-(4-イソブトキシ-3-イソチアゾール-4-イル-フェニル)-1H-ピラゾール-4-カルボン酸
(153)3-アミノ-1-(4-イソブトキシ-3-イソチアゾール-4-イル-フェニル)-1H-ピラゾール-4-カルボン酸
(154)1-[4-イソブトキシ-3-(1,3,4-チアジアゾール-2-イル)フェニル]-1H-ピラゾール-4-カルボン酸
(155)1-[3-(3,5-ジメチルイソオキサゾール-4-イル)-4-イソブトキシ-フェニル]-1H-ピラゾール-4-カルボン酸
(156)1-(4-イソブトキシ-3-ピリミジン-5-イル-フェニル)-1H-ピラゾール-4-カルボン酸
(157)3-アミノ-1-(4-イソブトキシ-3-ピリミジン-5-イル-フェニル)-1H-ピラゾール-4-カルボン酸
(158)3-アミノ-1-[4-イソブトキシ-3-(2-メチルチアゾール-5-イル)フェニル]-1H-ピラゾール-4-カルボン酸
(159)3-アミノ-1-[4-イソブトキシ-3-(1,3,4-チアジアゾール-2-イル)フェニル]-1H-ピラゾール-4-カルボン酸
(160)3-アミノ-1-[3-(3,5-ジメチルイソオキサゾール-4-イル)-4-イソブトキシフェニル]-1H-ピラゾール-4-カルボン酸
(161)1-(4-イソブトキシ-3-イソオキサゾール-4-イル-フェニル)-1H-ピラゾール-4-カルボン酸
(162)3-アミノ-1-(4-イソブトキシ-3-イソオキサゾール-4-イル-フェニル)-1H-ピラゾール-4-カルボン酸
(163)1-(4-イソブトキシ-3-オキサゾール-5-イル-フェニル)-1H-ピラゾール-4-カルボン酸
(164)1-(4-イソブトキシ-3-オキサゾール-5-イル-フェニル)-3-メチル-1H-ピラゾール-4-カルボン酸
(165)3-アミノ-1-(4-イソブトキシ-3-オキサゾール-5-イル-フェニル)-1H-ピラゾール-4-カルボン酸
(166)1-(4-イソブトキシ-3-オキサゾール-5-イル-フェニル)-3-(トリフルオロメチル)-1H-ピラゾール-4-カルボン酸
(167)2-[5-フェニル-4-(2H-テトラゾール-5-イル)-2-ピリジル]-1,3-チアゾール-5-カルボン酸
(168)4-メチル-2-[5-フェニル-4-(2H-テトラゾール-5-イル)-2-ピリジル]-1,3-チアゾール-5-カルボン酸
(169)2-(4-オキサゾール-5-イル-5-フェニル-2-ピリジル)-1,3-チアゾール-5-カルボン酸
(170)4-メチル-2-(4-オキサゾール-5-イル-5-フェニル-2-ピリジル)-1,3-チアゾール-5-カルボン酸
(171)2-(5-イソブトキシ-4-オキサゾール-5-イル-2-ピリジル)-4-メチル-1,3-チアゾール-5-カルボン酸
(172)2-(5-イソブトキシ-4-ピリミジン-5-イル-2-ピリジル)-4-メチル-1,3-チアゾール-5-カルボン酸
(173)2-[4-(3,5-ジメチルイソオキサゾール-4-イル)-5-イソブトキシ-2-ピリジル]-4-メチル-1,3-チアゾール-5-カルボン酸
(174)2-(5-イソブトキシ-4-イソチアゾール-4-イル-2-ピリジル)-4-メチル-1,3-チアゾール-5-カルボン酸
(175)1-(5-イソブトキシ-4-オキサゾール-5-イル-2-ピリジル)-1H-ピラゾール-4-カルボン酸 Any compound selected from the following (1) to (175) or a pharmaceutically acceptable salt thereof:
(1) 2- [4-Isobutoxy-3- (2-pyridyl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(2) 2- [4-Isobutoxy-3- (3-pyridyl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(3) 2- [4-Isobutoxy-3- (4-pyridyl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(4) 2- (4-Isobutoxy-3-thiazol-2-yl-phenyl) -4-methyl-1,3-thiazole-5-carboxylic acid
(5) 2- (4-Isobutoxy-3-thiazol-4-yl-phenyl) -4-methyl-1,3-thiazole-5-carboxylic acid
(6) 2- (4-Isobutoxy-3-thiazol-5-yl-phenyl) -4-methyl-1,3-thiazole-5-carboxylic acid
(7) 2- (4-Isobutoxy-3-pyrazin-2-yl-phenyl) -4-methyl-1,3-thiazole-5-carboxylic acid
(8) 2- [4-Isobutoxy-3- (3-thienyl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(9) 2- [3- (3-Furyl) -4-isobutoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(10) 2- [3- (3,5-Dimethylisoxazol-4-yl) -4-isobutoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(11) 2- [4- (2,2-dimethylpropoxy) -3-thiazol-5-yl-phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(12) 2- [4- (Cyclobutylmethoxy) -3-thiazol-5-yl-phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(13) 2- [4- (Cyclopentylmethoxy) -3-thiazol-5-yl-phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(14) 2- [4- (Cyclopentoxy) -3-thiazol-5-yl-phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(15) 2- [4- (Cyclohexaoxy) -3-thiazol-5-yl-phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(16) 2- [3- (3-Furyl) -4-phenoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(17) 2- [4- (2-Fluorophenoxy) -3- (3-furyl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(18) 2- (4-Isobutoxy-3-isothiazol-4-yl-phenyl) -4-methyl-1,3-thiazole-5-carboxylic acid
(19) 2- [4-Isobutoxy-3- (1,3,4-thiadiazol-2-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(20) 2- (4-Isobutoxy-3-isoxazol-4-yl-phenyl) -4-methyl-1,3-thiazole-5-carboxylic acid
(21) 2- [4-Isobutoxy-3- (1H-pyrazol-4-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(22) 2- [4-Isobutoxy-3- (3-methyl-1H-pyrazol-4-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(23) 2- [3- (1H-imidazol-4-yl) -4-isobutoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(24) 2- [4-Isobutoxy-3- (3-methylimidazol-4-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(25) 2- [4-Isobutoxy-3- (1-methylpyrazol-4-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(26) 2- (4-Isobutoxy-3-pyrimidin-5-yl-phenyl) -4-methyl-1,3-thiazole-5-carboxylic acid
(27) 2- [4-Isobutoxy-3- (2-methylthiazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(28) 2- [3- (1,2-Dimethylimidazol-4-yl) -4-isobutoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(29) 2- [3- (2,3-Dimethylimidazol-4-yl) -4-isobutoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(30) 2- [3- (3,5-Dimethylisoxazol-4-yl) -4- (2,2-dimethylpropoxy) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(31) 2- [4- (Cyclopentylmethoxy) -3- (3,5-dimethylisoxazol-4-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(32) 2- [4- (Cyclopentoxy) -3- (3,5-dimethylisoxazol-4-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(33) 2- [4- (Cyclohexaoxy) -3- (3,5-dimethylisoxazol-4-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(34) 2- [4- (2,2-difluoroethoxy) -3- (3,5-dimethylisoxazol-4-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(35) 2- [3- (3,5-Dimethylisoxazol-4-yl) -4-isopropoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(36) 2- (4-Isopropoxy-3-pyrimidin-5-yl-phenyl) -4-methyl-1,3-thiazole-5-carboxylic acid
(37) 2- [4- (2,2-Dimethylpropoxy) -3-pyrimidin-5-yl-phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(38) 2- [4- (2,2-Difluoroethoxy) -3-pyrimidin-5-yl-phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(39) 4-Methyl-2- (4-phenoxy-3-pyrimidin-5-yl-phenyl) -1,3-thiazole-5-carboxylic acid
(40) 2- [3- (3,5-Dimethylisoxazol-4-yl) -4-phenoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(41) 2- [3- (3,5-Dimethylisoxazol-4-yl) -4- (2-fluorophenoxy) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(42) 2- [3- (3,5-Dimethylisoxazol-4-yl) -4- (2-methoxyphenoxy) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(43) 2- [4- (2,6-Difluorophenoxy) -3- (3,5-dimethylisoxazol-4-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(44) 4-Methyl-2- [4- (2-methylphenoxy) -3-pyrimidin-5-yl-phenyl] -1,3-thiazole-5-carboxylic acid
(45) 2- [4- (2-Fluorophenoxy) -3-pyrimidin-5-yl-phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(46) 2- [4- (2-Fluoro-5-methylphenoxy) -3-pyrimidin-5-yl-phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(47) 2- [4- (2,5-Difluorophenoxy) -3-pyrimidin-5-yl-phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(48) 2- [4- (2,6-Difluorophenoxy) -3-pyrimidin-5-yl-phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(49) 4-Methyl-2- [4-phenoxy-3- (3-pyridyl) phenyl] -1,3-thiazole-5-carboxylic acid
(50) 4-Methyl-2- [4-phenoxy-3- (4-pyridyl) phenyl] -1,3-thiazole-5-carboxylic acid
(51) 4-Methyl-2- (4-phenoxy-3-thiazol-5-yl-phenyl) -1,3-thiazole-5-carboxylic acid
(52) 2- [4- (2,2-difluoroethoxy) -3-thiazol-5-yl-phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(53) 4-Methyl-2- [3-thiazol-5-yl-4- (2,2,2-trifluoroethoxy) phenyl] -1,3-thiazole-5-carboxylic acid
(54) 4-Methyl-2- [4-[(3R) -tetrahydrofuran-3-yl] oxy-3-thiazol-5-yl-phenyl] -1,3-thiazole-5-carboxylic acid
(55) 2- [3- (3,5-Dimethylisoxazol-4-yl) -4- (3-fluorophenoxy) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(56) 2- [3- (3,5-Dimethylisoxazol-4-yl) -4- (2-methylphenoxy) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(57) 2- [3- (3,5-Dimethylisoxazol-4-yl) -4- (3-methylphenoxy) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(58) 2- [3- (3,5-Dimethylisoxazol-4-yl) -4- (4-methylphenoxy) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(59) 2- [4- (2-Chlorophenoxy) -3- (3,5-dimethylisoxazol-4-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(60) 2- [3- (3,5-Dimethylisoxazol-4-yl) -4- (4-fluoro-3-methylphenoxy) phenyl] -4-methyl-1,3-thiazole-5-carvone acid
(61) 2- [3- (3,5-Dimethylisoxazol-4-yl) -4- (4-fluoro-2-methylphenoxy) phenyl] -4-methyl-1,3-thiazole-5-carvone acid
(62) 2- [4- (2,4-Difluorophenoxy) -3- (3,5-dimethylisoxazol-4-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(63) 2- [4- (2,5-difluorophenoxy) -3- (3,5-dimethylisoxazol-4-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(64) 2- [3- (3,5-Dimethylisoxazol-4-yl) -4- (2-fluoro-5-methylphenoxy) phenyl] -4-methyl-1,3-thiazole-5-carvone acid
(65) 2- [3- (3,5-Dimethylisoxazol-4-yl) -4- (3-fluoro-5-methylphenoxy) phenyl] -4-methyl-1,3-thiazole-5-carvone acid
(66) 2- [3- (3,5-Dimethylisoxazol-4-yl) -4- (2-fluoro-6-methoxyphenoxy) phenyl] -4-methyl-1,3-thiazole-5-carbon acid
(67) 2- (4-Isobutoxy-3-oxazol-5-yl-phenyl) -4-methyl-1,3-thiazole-5-carboxylic acid
(68) 2- (2-Fluoro-4-isobutoxy-5-oxazol-5-yl-phenyl) -4-methyl-1,3-thiazole-5-carboxylic acid
(69) 2- [4- (Cyclobutylmethoxy) -3-oxazol-5-yl-phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(70) 2- [4- (Cyclopentylmethoxy) -3-oxazol-5-yl-phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(71) 2- [4- (Cyclobutoxy) -3-oxazol-5-yl-phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(72) 2- [4- (Cyclopentoxy) -3-oxazol-5-yl-phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(73) 2- [4- (Cyclopropylmethoxy) -3-oxazol-5-yl-phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(74) 4-Methyl-2- [4-[(1R) -1-methylpropoxy] -3-oxazol-5-yl-phenyl] -1,3-thiazole-5-carboxylic acid
(75) 2- [4- (2,2-difluoroethoxy) -3-oxazol-5-yl-phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(76) 4-Methyl-2- [3-oxazol-5-yl-4-[(3R) -tetrahydrofuran-3-yl] oxyphenyl] -1,3-thiazole-5-carboxylic acid
(77) 2- [4-[(1R, 2R) -2-Fluorocyclohexaoxy] -3-oxazol-5-yl-phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(78) 2- [4- (1-Cyclopropylethoxy) -3-oxazol-5-yl-phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(79) 2- [4- (1,2-Dimethylpropoxy) -3-oxazol-5-yl-phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(80) 4-Methyl-2- [4-[(2-methylcyclopropyl) methoxy] -3-oxazol-5-yl-phenyl] -1,3-thiazole-5-carboxylic acid
(81) 2- [4- (2,2-Dimethylpropoxy) -3-oxazol-5-yl-phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(82) 4-Methyl-2- [4-[(3-methyloxetan-3-yl) methoxy] -3-oxazol-5-yl-phenyl] -1,3-thiazole-5-carboxylic acid
(83) 2- [4-Isobutoxy-3- (4-methyloxazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(84) 2- [4-Isobutoxy-3- (1H-tetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(85) 2- [4-Isobutoxy-3- (2H-tetrazol-5-yl) phenyl] -1,3-thiazole-5-carboxylic acid
(86) 2- [4-Isobutoxy-3- (1-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(87) 2- [4-Isobutoxy-3- (2-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(88) 2- [3- (2-Ethyltetrazol-5-yl) -4-isobutoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(89) 2- [3- (1-Ethyltetrazol-5-yl) -4-isobutoxyphenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(90) 2- [4- (2,2-Dimethylpropoxy) -3- (1-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(91) 4-Methyl-2- [4-[(1R) -1-methylpropoxy] -3- (1-methyltetrazol-5-yl) phenyl] -1,3-thiazole-5-carboxylic acid
(92) 4-Methyl-2- [4-[(1S) -1-methylpropoxy] -3- (1-methyltetrazol-5-yl) phenyl] -1,3-thiazole-5-carboxylic acid
(93) 2- [4- (Cyclobutylmethoxy) -3- (1-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(94) 2- [4- (Cyclopentylmethoxy) -3- (1-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(95) 2- [4- (Cyclopentoxy) -3- (1-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(96) 2- [4- (Cyclohexaoxy) -3- (1-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(97) 2- [4- (2,2-Dimethylpropoxy) -3- (2-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(98) 4-Methyl-2- [4-[(1R) -1-methylpropoxy] -3- (2-methyltetrazol-5-yl) phenyl] -1,3-thiazole-5-carboxylic acid
(99) 4-Methyl-2- [4-[(1S) -1-methylpropoxy] -3- (2-methyltetrazol-5-yl) phenyl] -1,3-thiazole-5-carboxylic acid
(100) 2- [4- (Cyclobutylmethoxy) -3- (2-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(101) 2- [4- (Cyclopentylmethoxy) -3- (2-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(102) 2- [4- (Cyclopentoxy) -3- (2-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(103) 2- [4- (Cyclohexaoxy) -3- (2-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(104) 2- [2-Fluoro-4-isobutoxy-5- (2-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(105) 2- [2-Fluoro-4-isobutoxy-5- (1-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(106) 4-Methyl-2- [3- (1-methyltetrazol-5-yl) -4-phenoxyphenyl] -1,3-thiazole-5-carboxylic acid
(107) 4-Methyl-2- [3- (2-methyltetrazol-5-yl) -4-phenoxyphenyl] -1,3-thiazole-5-carboxylic acid
(108) 2- [4- (2-methoxyphenoxy) -3- (1-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(109) 2- [4- (2-Fluorophenoxy) -3- (1-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(110) 4-Methyl-2- [4- (4-methylphenoxy) -3- (1-methyltetrazol-5-yl) phenyl] -1,3-thiazole-5-carboxylic acid
(111) 2- [4- (2,5-Difluorophenoxy) -3- (1-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(112) 2- [4- (2-Fluoro-5-methylphenoxy) -3- (1-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(113) 2- [4- (3-Fluoro-5-methylphenoxy) -3- (1-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(114) 2- [4- (2-Fluoro-6-methoxyphenoxy) -3- (1-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(115) 2- [4- (2-Fluorophenoxy) -3- (2-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(116) 4-Methyl-2- [4- (3-methylphenoxy) -3- (2-methyltetrazol-5-yl) phenyl] -1,3-thiazole-5-carboxylic acid
(117) 4-Methyl-2- [4- (4-methylphenoxy) -3- (2-methyltetrazol-5-yl) phenyl] -1,3-thiazole-5-carboxylic acid
(118) 2- [4- (2,5-difluorophenoxy) -3- (2-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(119) 2- [4- (2-Fluoro-5-methylphenoxy) -3- (2-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(120) 2- [4- (3-Fluoro-5-methylphenoxy) -3- (2-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(121) 2- [4- (2-Fluoro-6-methoxyphenoxy) -3- (2-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(122) 2- [4- (3-Fluorophenoxy) -3- (1-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(123) 4-Methyl-2- [4- (2-methylphenoxy) -3- (1-methyltetrazol-5-yl) phenyl] -1,3-thiazole-5-carboxylic acid
(124) 4-Methyl-2- [4- (3-methylphenoxy) -3- (1-methyltetrazol-5-yl) phenyl] -1,3-thiazole-5-carboxylic acid
(125) 2- [4- (2-Chlorophenoxy) -3- (1-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(126) 2- [4- (4-Fluoro-3-methylphenoxy) -3- (1-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(127) 2- [4- (4-Fluoro-2-methoxyphenoxy) -3- (1-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(128) 2- [4- (4-Fluoro-2-methylphenoxy) -3- (1-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(129) 2- [4- (2,4-Difluorophenoxy) -3- (1-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(130) 2- [4- (2,6-Difluorophenoxy) -3- (1-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(131) 2- [4- (2-Methoxyphenoxy) -3- (2-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(132) 2- [4- (3-Fluorophenoxy) -3- (2-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(133) 4-Methyl-2- [4- (2-methylphenoxy) -3- (2-methyltetrazol-5-yl) phenyl] -1,3-thiazole-5-carboxylic acid
(134) 2- [4- (2-Chlorophenoxy) -3- (2-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(135) 2- [4- (4-Fluoro-3-methylphenoxy) -3- (2-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(136) 2- [4- (4-Fluoro-2-methoxyphenoxy) -3- (2-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(137) 2- [4- (4-Fluoro-2-methylphenoxy) -3- (2-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(138) 2- [4- (2,4-Difluorophenoxy) -3- (2-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(139) 2- [4- (2,6-Difluorophenoxy) -3- (2-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(140) 2- [4- (2-Cyanophenoxy) -3- (1-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(141) 2- [4- (2-Cyanophenoxy) -3- (2-methyltetrazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(142) 4-Methyl-2- [3- (1-methyltetrazol-5-yl) -4-phenylphenyl] -1,3-thiazole-5-carboxylic acid
(143) 4-Methyl-2- [3- (2-methyltetrazol-5-yl) -4-phenylphenyl] -1,3-thiazole-5-carboxylic acid
(144) 2- [4-Isobutoxy-3- (5-methyl-1,2,4-oxadiazol-3-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(145) 2- (4-Isobutoxy-3-isoxazol-3-yl-phenyl) -4-methyl-1,3-thiazole-5-carboxylic acid
(146) 2- [4-Isobutoxy-3- [5- (methoxymethyl) isoxazol-3-yl] phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(147) 2- [4-Isobutoxy-3- (1,2,4-oxadiazol-3-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(148) 2- [4-Isobutoxy-3- (3-methyl-1,2,4-oxadiazol-5-yl) phenyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(149) 1- (4-Isobutoxy-3-thiazol-5-yl-phenyl) -1H-pyrazole-4-carboxylic acid
(150) 3-Amino-1- (4-isobutoxy-3-thiazol-5-yl-phenyl) -1H-pyrazole-4-carboxylic acid
(151) 1- [4-Isobutoxy-3- (2-methylthiazol-5-yl) phenyl] -1H-pyrazole-4-carboxylic acid
(152) 1- (4-Isobutoxy-3-isothiazol-4-yl-phenyl) -1H-pyrazole-4-carboxylic acid
(153) 3-Amino-1- (4-isobutoxy-3-isothiazol-4-yl-phenyl) -1H-pyrazole-4-carboxylic acid
(154) 1- [4-Isobutoxy-3- (1,3,4-thiadiazol-2-yl) phenyl] -1H-pyrazole-4-carboxylic acid
(155) 1- [3- (3,5-Dimethylisoxazol-4-yl) -4-isobutoxy-phenyl] -1H-pyrazole-4-carboxylic acid
(156) 1- (4-Isobutoxy-3-pyrimidin-5-yl-phenyl) -1H-pyrazole-4-carboxylic acid
(157) 3-Amino-1- (4-isobutoxy-3-pyrimidin-5-yl-phenyl) -1H-pyrazole-4-carboxylic acid
(158) 3-Amino-1- [4-isobutoxy-3- (2-methylthiazol-5-yl) phenyl] -1H-pyrazole-4-carboxylic acid
(159) 3-Amino-1- [4-isobutoxy-3- (1,3,4-thiadiazol-2-yl) phenyl] -1H-pyrazole-4-carboxylic acid
(160) 3-Amino-1- [3- (3,5-dimethylisoxazol-4-yl) -4-isobutoxyphenyl] -1H-pyrazole-4-carboxylic acid
(161) 1- (4-Isobutoxy-3-isoxazol-4-yl-phenyl) -1H-pyrazole-4-carboxylic acid
(162) 3-Amino-1- (4-isobutoxy-3-isoxazol-4-yl-phenyl) -1H-pyrazole-4-carboxylic acid
(163) 1- (4-Isobutoxy-3-oxazol-5-yl-phenyl) -1H-pyrazole-4-carboxylic acid
(164) 1- (4-Isobutoxy-3-oxazol-5-yl-phenyl) -3-methyl-1H-pyrazole-4-carboxylic acid
(165) 3-Amino-1- (4-isobutoxy-3-oxazol-5-yl-phenyl) -1H-pyrazole-4-carboxylic acid
(166) 1- (4-Isobutoxy-3-oxazol-5-yl-phenyl) -3- (trifluoromethyl) -1H-pyrazole-4-carboxylic acid
(167) 2- [5-Phenyl-4- (2H-tetrazol-5-yl) -2-pyridyl] -1,3-thiazole-5-carboxylic acid
(168) 4-Methyl-2- [5-phenyl-4- (2H-tetrazol-5-yl) -2-pyridyl] -1,3-thiazole-5-carboxylic acid
(169) 2- (4-Oxazol-5-yl-5-phenyl-2-pyridyl) -1,3-thiazole-5-carboxylic acid
(170) 4-Methyl-2- (4-oxazol-5-yl-5-phenyl-2-pyridyl) -1,3-thiazole-5-carboxylic acid
(171) 2- (5-Isobutoxy-4-oxazol-5-yl-2-pyridyl) -4-methyl-1,3-thiazole-5-carboxylic acid
(172) 2- (5-Isobutoxy-4-pyrimidin-5-yl-2-pyridyl) -4-methyl-1,3-thiazole-5-carboxylic acid
(173) 2- [4- (3,5-Dimethylisoxazol-4-yl) -5-isobutoxy-2-pyridyl] -4-methyl-1,3-thiazole-5-carboxylic acid
(174) 2- (5-Isobutoxy-4-isothiazol-4-yl-2-pyridyl) -4-methyl-1,3-thiazole-5-carboxylic acid
(175) 1- (5-isobutoxy-4-oxazol-5-yl-2-pyridyl) -1H-pyrazole-4-carboxylic acid - 請求項1~14のいずれかに記載の化合物またはその製薬学的に許容される塩と、製薬学的に許容される担体を含有する、医薬組成物。 A pharmaceutical composition comprising the compound according to any one of claims 1 to 14 or a pharmaceutically acceptable salt thereof and a pharmaceutically acceptable carrier.
- 請求項1~14のいずれかに記載の化合物またはその製薬学的に許容される塩を有効成分として含有する、キサンチンオキシダーゼ阻害剤。 A xanthine oxidase inhibitor comprising the compound according to any one of claims 1 to 14 or a pharmaceutically acceptable salt thereof as an active ingredient.
- 請求項1~14のいずれかに記載の化合物またはその製薬学的に許容される塩を有効成分として含有する、痛風、高尿酸血症、腫瘍崩壊症候群、尿路結石、高血圧症、脂質異常症、糖尿病、心血管疾患、腎疾患、呼吸器疾患、炎症性腸疾患または自己免疫性疾患の治療薬または予防薬。 Gout, hyperuricemia, tumor lysis syndrome, urolithiasis, hypertension, dyslipidemia comprising the compound according to any one of claims 1 to 14 or a pharmaceutically acceptable salt thereof as an active ingredient Drugs for treating or preventing diabetes, cardiovascular disease, kidney disease, respiratory disease, inflammatory bowel disease or autoimmune disease.
- 式(II)で表される化合物。
[式中、
R4は、次のR41またはR42を表す。
R5は、カルボキシル基の保護基を表す。
R1、R2、X1、環Aの定義は式(I)と同じである。] A compound represented by the formula (II).
[Where:
R 4 represents the following R 41 or R 42 .
R 5 represents a protecting group for a carboxyl group.
The definitions of R 1 , R 2 , X 1 and ring A are the same as in formula (I). ]
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014155026A JP2017165653A (en) | 2014-07-30 | 2014-07-30 | Azole carboxylic acid derivative |
| JP2014-155026 | 2014-07-30 |
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| Publication Number | Publication Date |
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| WO2016017699A1 true WO2016017699A1 (en) | 2016-02-04 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2015/071516 WO2016017699A1 (en) | 2014-07-30 | 2015-07-29 | Azole carboxylic acid derivative |
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| Country | Link |
|---|---|
| JP (1) | JP2017165653A (en) |
| AR (1) | AR101364A1 (en) |
| TW (1) | TW201619141A (en) |
| WO (1) | WO2016017699A1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017142091A1 (en) | 2016-02-19 | 2017-08-24 | 国立大学法人鳥取大学 | Therapeutic or prophylactic drug for dementia |
| CN113024534A (en) * | 2019-12-24 | 2021-06-25 | 武汉光谷亚太医药研究院有限公司 | 2-pyridylthiazole derivatives and use thereof |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1992009279A1 (en) * | 1990-11-30 | 1992-06-11 | Teijin Limited | 2-arylthiazole derivative and pharmaceutical composition containing the same |
| US20130190366A1 (en) * | 2010-02-19 | 2013-07-25 | Cadila Healthcare Limited | Substantially pure salts of febuxostat and processes for preparation thereof |
| JP5378988B2 (en) * | 2007-04-11 | 2013-12-25 | キッセイ薬品工業株式会社 | 5-membered heterocyclic derivatives and pharmaceutical uses thereof |
-
2014
- 2014-07-30 JP JP2014155026A patent/JP2017165653A/en active Pending
-
2015
- 2015-07-29 TW TW104124556A patent/TW201619141A/en unknown
- 2015-07-29 WO PCT/JP2015/071516 patent/WO2016017699A1/en active Application Filing
- 2015-07-29 AR ARP150102423A patent/AR101364A1/en unknown
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1992009279A1 (en) * | 1990-11-30 | 1992-06-11 | Teijin Limited | 2-arylthiazole derivative and pharmaceutical composition containing the same |
| JP5378988B2 (en) * | 2007-04-11 | 2013-12-25 | キッセイ薬品工業株式会社 | 5-membered heterocyclic derivatives and pharmaceutical uses thereof |
| US20130190366A1 (en) * | 2010-02-19 | 2013-07-25 | Cadila Healthcare Limited | Substantially pure salts of febuxostat and processes for preparation thereof |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017142091A1 (en) | 2016-02-19 | 2017-08-24 | 国立大学法人鳥取大学 | Therapeutic or prophylactic drug for dementia |
| CN109069490A (en) * | 2016-02-19 | 2018-12-21 | 国立大学法人鸟取大学 | Antidementia agent or preventive medicine |
| US11344539B2 (en) | 2016-02-19 | 2022-05-31 | National University Corporation Tottori University | Therapeutic or prophylactic drug for dementia |
| CN113024534A (en) * | 2019-12-24 | 2021-06-25 | 武汉光谷亚太医药研究院有限公司 | 2-pyridylthiazole derivatives and use thereof |
| CN113024534B (en) * | 2019-12-24 | 2023-03-21 | 武汉光谷亚太医药研究院有限公司 | 2-pyridylthiazole derivatives and use thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| AR101364A1 (en) | 2016-12-14 |
| TW201619141A (en) | 2016-06-01 |
| JP2017165653A (en) | 2017-09-21 |
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