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WO2018181722A1 - Film protecteur pour électrode de panneau tactile et panneau tactile - Google Patents

Film protecteur pour électrode de panneau tactile et panneau tactile Download PDF

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Publication number
WO2018181722A1
WO2018181722A1 PCT/JP2018/013268 JP2018013268W WO2018181722A1 WO 2018181722 A1 WO2018181722 A1 WO 2018181722A1 JP 2018013268 W JP2018013268 W JP 2018013268W WO 2018181722 A1 WO2018181722 A1 WO 2018181722A1
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WIPO (PCT)
Prior art keywords
touch panel
protective film
electrode
film
photosensitive
Prior art date
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Ceased
Application number
PCT/JP2018/013268
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English (en)
Japanese (ja)
Inventor
真弓 佐藤
昂平 平尾
智紀 寺脇
正芳 小澤
真奈美 桐生
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Resonac Corp
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Hitachi Chemical Co Ltd
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Filing date
Publication date
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Publication of WO2018181722A1 publication Critical patent/WO2018181722A1/fr
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means

Definitions

  • the present invention relates to a protective film for a touch panel electrode and a touch panel.
  • Liquid crystal displays are used for large electronic devices such as personal computers and televisions, small electronic devices such as car navigation systems, mobile phones and electronic dictionaries, and display devices such as OA (Office Automation, Office Automation) and FA (Factory Automation, Factory Automation) devices. Elements and touch panels (touch sensors) are used.
  • Touch panels have already been put to practical use in various methods, but in recent years, the use of capacitive touch panels has progressed.
  • a projected capacitive touch panel which is a kind of capacitive touch panel, generally, a plurality of X electrodes and a plurality of orthogonal to the X electrodes are used to express two-dimensional coordinates by the X axis and the Y axis.
  • the Y electrode forms a two-layer structure.
  • conductive meshes such as Ag nanowires and carbon nanotubes, Ag meshes, Cu meshes and the like has been studied as these electrodes, but ITO (Indium-Tin- Oxide) is still mainstream.
  • the frame area of the touch panel is an area where the touch position cannot be detected, reducing the area of the frame area is an important factor for improving the product value.
  • a metal wiring is required to transmit a touch position detection signal, and the metal wiring is generally formed of copper, silver, or the like.
  • corrosive components such as moisture and salt may enter the sensing region from the inside when the fingertip comes into contact. If a corrosive component enters the touch panel, the metal wiring corrodes, and there is a risk of an increase in electrical resistance between the electrode and the drive circuit, disconnection, or the like.
  • a capacitive projection type touch panel in which an insulating layer is formed on metal is disclosed (for example, Patent Document 1).
  • a silicon dioxide layer is formed on a metal by a plasma chemical vapor deposition method (plasma CVD method) to prevent corrosion of the metal.
  • plasma CVD method plasma chemical vapor deposition method
  • Patent Document 2 there is known a method in which a photosensitive layer made of a photosensitive resin composition is provided on a predetermined substrate, and this photosensitive layer is exposed and developed (for example, Patent Document 2).
  • a film-like resist film having a desired thickness is bonded onto a base material, and thereafter, exposure and development are performed to form a resist film at a necessary location.
  • JP 2011-28594 A International Publication No. 2013/084886
  • This invention is made in view of such a situation, and it aims at providing the touchscreen provided with the protective film which can suppress the raise of the resistance value of the touchscreen electrode accompanying the bending of a touchscreen, and the said protective film.
  • the present invention is a touch panel electrode protective film obtained by curing a photosensitive resin composition containing a binder polymer having a weight average molecular weight of 100,000 or more, a photopolymerizable compound, and a photopolymerization initiator. It is.
  • this protective film can solve the above problems as follows.
  • a protective film is not formed on the touch panel electrode provided on the base material
  • the touch panel electrode cannot follow the base material due to generation of cracks, and is peeled off from the adherend.
  • poor connection between the touch panel electrodes occurs, and the resistance value increases.
  • a predetermined protective film is formed on the touch panel electrode
  • the protective film presses the touch panel electrode even if the touch panel electrode becomes unable to follow the base material due to the occurrence of cracks. Connection failure between the electrodes is less likely to occur. Therefore, it is considered that an increase in the resistance value of the touch panel can be suppressed by forming a protective film on the touch panel electrode.
  • the protective film is preferably provided in the bent region of the touch panel.
  • the minimum value of the light transmittance at 400 to 700 nm of the protective film is preferably 90% or more.
  • the thickness of the protective film is preferably 50 ⁇ m or less.
  • the present invention is a touch panel including a base material, an electrode provided on the base material, and the protective film provided on the electrode.
  • the present invention it is possible to provide a protective film that can suppress an increase in the resistance value of the touch panel electrode accompanying bending of the touch panel, and a touch panel including the protective film.
  • FIG. 1A and 1B are schematic cross-sectional views showing one embodiment of a photosensitive element, respectively.
  • FIG. 2A is a schematic top view illustrating an aspect of a capacitive touch panel.
  • FIG. 2B is a partial cross-sectional view taken along the line II of C portion shown in FIG.
  • FIG. 3A is a perspective view showing an example of a flexible touch panel.
  • FIG. 3B is a cross-sectional view taken along the line II-II shown in FIG. 4A and 4B are perspective views showing another example of a touch panel having flexibility.
  • the touch panel electrode is provided not only in an electrode provided in a sensing area (also referred to as “touch screen area”) of the touch panel but also in a frame area that is an area other than the sensing area (touch screen area). Also includes metal wiring.
  • the electrode provided with the protective film may be either one of the electrode provided in the sensing region and the metal wiring provided in the frame region, or both.
  • (meth) acrylic acid means “acrylic acid” or “methacrylic acid”.
  • (Meth) acrylate means “acrylate” or “methacrylate”.
  • a or B means that it is at least one of A and B, that is, it may be both A and B.
  • the materials, components, and the like exemplified in this specification may be used alone or in combination of two or more.
  • process includes not only an independent process but also a process that can be clearly distinguished from other processes if the intended action of the process is achieved.
  • numerical values indicated by using “to” include numerical values described before and after “to” as the minimum value and the maximum value, respectively.
  • each component in the composition is the total amount of the plurality of substances present in the composition unless there is a specific notice when there are a plurality of substances corresponding to each component in the composition. means.
  • the photosensitive resin composition includes a binder polymer (also referred to as “(A) component”), a photopolymerizable compound (also referred to as “(B) component”), and a photopolymerization initiator (also referred to as “(C) component”). ) And.
  • binder polymer examples include a binder polymer having a carboxyl group from the viewpoint of enabling patterning by alkali development.
  • the binder polymer having a carboxyl group is, for example, a copolymer having a polymerizable monomer having a carboxyl group and another polymerizable monomer as a constituent unit, preferably (a) (meth) acrylic acid, And (b) a copolymer having a structural unit derived from an alkyl (meth) acrylate.
  • Examples of the (meth) acrylic acid alkyl ester include (meth) acrylic acid methyl ester, (meth) acrylic acid ethyl ester, (meth) acrylic acid butyl ester, (meth) acrylic acid 2-ethylhexyl ester, (meth) acrylic And acid hydroxyl ethyl ester.
  • the copolymer may further have another monomer as a constituent unit that can be copolymerized with at least one of the components (a) and (b).
  • Other monomers that can be copolymerized with at least one of the components (a) and (b) include, for example, (meth) acrylic acid glycidyl ester, (meth) acrylic acid benzyl ester, styrene, dicyclopentanyl ( And (meth) acrylate and dicyclopentenyloxyethyl (meth) acrylate.
  • (meth) acrylic acid, (meth) acrylic acid glycidyl ester, (meth) acrylic acid benzyl ester, styrene from the viewpoints of alkali developability, especially alkali developability for inorganic alkaline aqueous solution, patterning property, and transparency.
  • a structure derived from at least one compound selected from the group consisting of: (meth) acrylic acid methyl ester, (meth) acrylic acid ethyl ester, (meth) acrylic acid butyl ester, and (meth) acrylic acid-2-ethylhexyl ester Binder polymers having units are preferred.
  • the weight average molecular weight of the binder polymer as component (A) is 100,000 or more, and preferably 120,000 or more, more preferably 140000 or more, and further preferably 160000 or more from the viewpoint of further excellent film formability and flexibility. . From the viewpoint of resolution, the weight average molecular weight of the binder polymer is preferably 300000 or less, more preferably 250,000 or less, and even more preferably 200000 or less. In the present specification, the weight average molecular weight means a value obtained under the same measurement conditions as in Examples.
  • the acid value of the binder polymer as component (A) may be 75 mgKOH / g or more from the viewpoint of easily forming a protective film having a desired shape, and the ease and protection of controlling the shape of the protective film From the viewpoint of achieving compatibility with the rust prevention property of the film, it is preferably 75 to 200 mgKOH / g, more preferably 75 to 150 mgKOH / g, and still more preferably 75 to 120 mgKOH / g.
  • the acid value of the binder polymer as the component (A) means a value obtained under the same measurement conditions as in the examples of the present specification.
  • the hydroxyl value of the binder polymer as component (A) is preferably 50 mgKOH / g or less, more preferably 45 mgKOH / g or less, from the viewpoint of further improving the rust prevention property.
  • the hydroxyl value of (A) component means the value obtained on the same measurement conditions as the Example of this specification.
  • the content of the component (A) is preferably 35 parts by mass or more with respect to 100 parts by mass of the total amount of the component (A) and the component (B) from the viewpoint of maintaining transparency and suitably forming a desired pattern. More preferably, it is 40 parts by mass or more, more preferably 50 parts by mass or more, and particularly preferably 55 parts by mass or more.
  • Photopolymerizable compound (B) As a photopolymerizable compound which is a component, the photopolymerizable compound which has an ethylenically unsaturated group is mentioned.
  • Examples of the photopolymerizable compound having an ethylenically unsaturated group include a monofunctional vinyl monomer having one polymerizable ethylenically unsaturated group in the molecule and two polymerizable ethylenically unsaturated groups in the molecule. Examples thereof include a bifunctional vinyl monomer and a polyfunctional vinyl monomer having at least three polymerizable ethylenically unsaturated groups in the molecule.
  • (meth) acrylic acid exemplified as a monomer suitable for the component (A) to have as a structural unit , (Meth) acrylic acid alkyl esters and monomers copolymerizable therewith.
  • bifunctional vinyl monomer having two polymerizable ethylenically unsaturated groups in the molecule examples include polyethylene glycol di (meth) acrylate (having 2 to 14 ethoxy groups), trimethylolpropane di (meta).
  • bisphenol A polyoxyethylene diacrylate ie 2,2-bis (4-acryloxypolyethoxyphenyl) propane
  • Bisphenol A polyoxyethylene dimethacrylate ie 2,2-bis (4-methacryloxy
  • the polyfunctional vinyl monomer having at least three polymerizable ethylenically unsaturated groups in the molecule can be obtained, for example, by reacting a polyhydric alcohol having at least three hydroxyl groups with an ⁇ , ⁇ -unsaturated carboxylic acid.
  • Examples of compounds obtained by reacting a polyhydric alcohol with an ⁇ , ⁇ -unsaturated carboxylic acid include trimethylolpropane tri (meth) acrylate, tetramethylolmethanetri (meth) acrylate, and tetramethylolmethanetetra (meth). Examples include acrylate, dipentaerythritol penta (meth) acrylate, and dipentaerythritol hexa (meth) acrylate.
  • Examples of the compound obtained by addition reaction of a compound having a glycidyl group and an ⁇ , ⁇ -unsaturated carboxylic acid include trimethylolpropane triglycidyl ether triacrylate.
  • urethane monomers examples include tris ((meth) acryloxytetraethylene glycol isocyanate) hexamethylene isocyanurate.
  • the component (B) preferably contains a polyfunctional vinyl monomer having at least three polymerizable ethylenically unsaturated groups.
  • the component (B) is preferably a (meth) acrylate compound having a skeleton derived from pentaerythritol, or a (meth) acrylate compound having a skeleton derived from dipentaerythritol, from the viewpoint of electrode corrosion inhibition and ease of development.
  • a (meth) acrylate compound having a skeleton derived from trimethylolpropane more preferably a (meth) acrylate compound having a skeleton derived from dipentaerythritol and a skeleton derived from trimethylolpropane (meta ) At least one selected from acrylate compounds.
  • (meth) acrylate having a skeleton derived from dipentaerythritol means an esterified product of dipentaerythritol and (meth) acrylic acid.
  • the esterified product also includes a compound modified with an alkyleneoxy group.
  • the number of ester bonds in one molecule of the esterified product is preferably 6.
  • the esterified product may contain a compound having 1 to 5 ester bonds in one molecule.
  • the (meth) acrylate compound having a skeleton derived from trimethylolpropane means an esterified product of trimethylolpropane and (meth) acrylic acid.
  • the esterified product also includes a compound modified with an alkyleneoxy group.
  • the number of ester bonds in one molecule of the esterified product is preferably 3.
  • the esterified product may include an esterified product having 1 to 2 ester bonds in one molecule.
  • the ratio of the polyfunctional vinyl monomer having at least three polymerizable ethylenically unsaturated groups in the molecule is the photopolymerizability contained in the photosensitive resin composition from the viewpoint of obtaining photocurability and electrode corrosion inhibition.
  • it is 30 mass parts or more with respect to 100 mass parts of total amounts of a compound ((B) component), More preferably, it is 50 mass parts or more, More preferably, it is 75 mass parts or more.
  • (A) component is 35-85 mass parts with respect to 100 mass parts of total amounts of (A) component and (B) component, and
  • the component (B) is preferably 15 to 65 parts by mass, the component (A) is preferably 40 to 80 parts by mass, the component (B) is more preferably 20 to 60 parts by mass, and the component (A) is 50 to 50 parts by mass. It is more preferable that 70 parts by mass and the component (B) are 30 to 50 parts by mass, and it is particularly preferable that the component (A) is 55 to 65 parts by mass and the component (B) is 35 to 45 parts by mass.
  • the photosensitive resin composition has sufficient coating properties and film properties when a photosensitive element to be described later is formed by making the content of the component (A) and the component (B) within the above range, Sensitivity, photocurability, developability, and electrode corrosion inhibition can be sufficiently secured.
  • the content of the component (A) is preferably 35 parts by mass with respect to 100 parts by mass of the total amount of the components (A) and (B). As mentioned above, More preferably, it is 40 mass parts or more, More preferably, it is 50 mass parts or more, Most preferably, it is 55 mass parts or more.
  • Examples of the photopolymerization initiator (C) include oxime ester compounds and alkylphenone compounds.
  • the component (C) can form a pattern with sufficient resolution even when the protective film is highly transparent and the protective film is a thin film (for example, a film having a thickness of 10 ⁇ m or less). Therefore, it preferably contains at least one selected from the group consisting of oxime ester compounds and alkylphenone compounds.
  • Examples of the oxime ester compound include compounds represented by the following general formula (C-1).
  • R 1 represents an alkyl group having 1 to 12 carbon atoms or a cycloalkyl group having 3 to 20 carbon atoms. As long as the effects of the present invention are not impaired, the compound represented by the formula (C-1) may have a substituent on the aromatic ring.
  • R 1 is preferably an alkyl group having 3 to 10 carbon atoms or a cycloalkyl group having 4 to 15 carbon atoms, more preferably an alkyl group having 4 to 8 carbon atoms or a cycloalkyl group having 4 to 10 carbon atoms.
  • Examples of the compound represented by the formula (C-1) include (1,2-octanedione, 1- [4- (phenylthio) phenyl-, 2- (O-benzoyloxime)] and the like.
  • -Octanedione, 1- [4- (phenylthio) phenyl-, 2- (O-benzoyloxime)] is available as IRGACURE OXE 01 (trade name, manufactured by BASF Japan Ltd.).
  • alkylphenone compound examples include a compound represented by the following general formula (C-2) (2,2-dimethoxy-1,2-diphenylethane-1-one). 2,2-dimethoxy-1,2-diphenylethane-1-one is available as IRGACURE 651 (trade name, manufactured by BASF Japan Ltd.).
  • alkylphenone compound in addition to the compound represented by the above formula (C-2), for example, 1-hydroxy-cyclohexyl-phenyl-ketone, 2-hydroxy-2-methyl-1-phenyl-propan-1-one, 1- [4- (2-hydroxyethoxy) -phenyl] -2-hydroxy-2-methyl-1-propan-1-one, 2-hydroxy-1- ⁇ 4- [4- (2-hydroxy-2- Methyl-propionyl) -benzyl] phenyl ⁇ -2-methyl-propan-1-one, 1.3 ⁇ -aminoalkylphenone, 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1,2- (dimethylamino) -2-[(4-methylphenyl Yl) methyl] -1- [4- (4-morpholinyl) phenyl] -1-
  • 1-hydroxy-cyclohexyl-phenyl-ketone is IRGACURE 184 (trade name, manufactured by BASF Japan), and 2-hydroxy-2-methyl-1-phenyl-propan-1-one is IRGACURE 1173 (BASF Japan)
  • Product name 1- [4- (2-hydroxyethoxy) -phenyl] -2-hydroxy-2-methyl-1-propan-1-one is IRGACURE 2959 (trade name, manufactured by BASF Japan Ltd.)
  • 2-Hydroxy-1- ⁇ 4- [4- (2-hydroxy-2-methyl-propionyl) -benzyl] phenyl ⁇ -2-methyl-propan-1-one is IRGACURE 127 (BASF Japan Ltd., (Product name) can be obtained respectively.
  • Component may be other photopolymerization initiators other than the oxime ester compound and the alkylphenone compound.
  • photopolymerization initiators include aromatic ketones such as benzophenone and 4-methoxy-4′-dimethylaminobenzophenone; benzoin ether compounds such as benzoin methyl ether, benzoin ethyl ether and benzoin phenyl ether; benzoin and methyl benzoin Benzoin compounds such as ethyl benzoin; benzyl derivatives such as benzyl dimethyl ketal; acridine derivatives such as 9-phenylacridine and 1,7-bis (9,9′-acridinyl) heptane; N-phenylglycine and N-phenylglycine derivatives A coumarin compound; an oxazole compound and the like.
  • component (C) a combination of a thioxanthone compound and a tertiary
  • the content of the component (C) is preferably 0.1 parts by mass or more from the viewpoint of excellent sensitivity to light and resolution with respect to 100 parts by mass of the total amount of the components (A) and (B). From the viewpoint of excellent light transmittance at 400 to 700 nm, it is preferably 20 parts by mass or less.
  • the content of the component (C) is preferably 0.1 to 20 parts by weight, more preferably 1 to 10 parts by weight, and still more preferably 2 parts per 100 parts by weight of the total amount of the components (A) and (B). Is 5 parts by mass.
  • a protective film on a part of the ITO electrode of the touch panel for example, a part where a protective layer is not formed in the sensing area, and a metal layer such as copper is formed on the ITO electrode in the frame area and the ITO electrode.
  • unnecessary portions can be removed by performing exposure and development after providing a photosensitive layer on the entire surface (the entire surface of the touch panel).
  • the photosensitive layer is required to have good developability so as to have sufficient adhesion to the electrode to be protected and no development residue occurs in unnecessary portions.
  • the photosensitive resin composition of the present embodiment is preferably a phosphoric ester having an ethylenically unsaturated group (hereinafter also referred to as component (D)). Containing.
  • component (D) ethylenically unsaturated group
  • the phosphate ester containing an ethylenically unsaturated group may overlap with the said (B) component, it shall not be contained in (B) component.
  • the phosphoric acid ester having an ethylenically unsaturated group as component (D) is preferably from the viewpoint of achieving both high adhesion and developability to the ITO electrode while ensuring sufficient protection against rust of the protective film.
  • These are compounds represented by the following general formula (D-1).
  • the compound represented by the formula (D-1) is available as a commercial product such as PM-21 (manufactured by Nippon Kayaku Co., Ltd.).
  • the photosensitive resin composition according to the present embodiment is optionally provided with an adhesion imparting agent such as a silane coupling agent, a leveling agent, a plasticizer, a filler, an antifoaming agent, a flame retardant, a stabilizer, and an oxidation agent.
  • an inhibitor, a fragrance, a thermal crosslinking agent, a polymerization inhibitor and the like may be contained in an amount of 0.01 to 20 parts by mass with respect to 100 parts by mass of the total amount of component (A) and component (B).
  • the photosensitive resin composition may further contain a water-soluble compound to the extent that it does not significantly impair the function of the protective film.
  • the photosensitive resin composition according to this embodiment can be used for forming a photosensitive layer.
  • a coating solution is prepared by uniformly dissolving or dispersing the photosensitive resin composition in a solvent, and a coating film is formed by coating the coating solution on, for example, a support substrate, and the solvent is removed by drying.
  • a photosensitive layer can be formed.
  • Examples of the solvent include ketones, aromatic hydrocarbons, alcohols, ethers, esters, alkyl halides and the like from the viewpoints of solubility of each component, ease of film formation, and the like.
  • Examples of the ketone include acetone, methyl ethyl ketone, and methyl isobutyl ketone.
  • Examples of the aromatic hydrocarbon include toluene.
  • Examples of the alcohol include monohydric alcohols and dihydric alcohols (glycols). Examples of the monohydric alcohol include methanol, ethanol, propanol, butanol and the like.
  • Examples of the glycol include methylene glycol, ethylene glycol, propylene glycol and the like.
  • Examples of the ether include alkylene glycol alkyl ether and alkylene glycol alkyl ether acetate.
  • Examples of the alkylene glycol alkyl ether include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol ethyl methyl ether, diethylene glycol diethyl ether, and propylene glycol monomethyl ether.
  • Examples of the alkylene glycol alkyl ether acetate include ethylene glycol monobutyl ether acetate, diethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, and the like.
  • Examples of the halogenated ester include chloroform and methylene chloride.
  • Application methods include known methods such as micro gravure coating, spin coating, dip coating, curtain flow coating, roll coating, spray coating, and slit coating.
  • the photosensitive resin composition according to the present embodiment is used for forming a protective film for a touch panel electrode, and is excellent in adhesion to the base material of the touch panel.
  • the photosensitive resin composition is suitable for forming a protective film provided in a bent region of the touch panel. According to this photosensitive resin composition, generation
  • the photosensitive resin composition of the present embodiment is suitably used regardless of the type of device on which the touch sensor is mounted as long as it is intended to protect the electrodes of the touch sensor.
  • the device include a liquid crystal display device, an organic electroluminescence display device, a smartphone, and a tablet PC.
  • the photosensitive resin composition according to the present embodiment is preferably used after being formed into a film shape like a photosensitive element described later.
  • a roll-to-roll process can be easily realized, a solvent drying process can be shortened, and the production process can be greatly shortened and cost can be greatly reduced.
  • FIG. 1A is a schematic cross-sectional view showing an embodiment of a photosensitive element.
  • the photosensitive element 1 ⁇ / b> A includes a support film 2 and a photosensitive layer 3 made of the photosensitive resin composition provided on the support film 2.
  • a of photosensitive elements prepare the coating liquid containing the photosensitive resin composition which concerns on this embodiment, for example, apply
  • the coating liquid can be obtained by uniformly dissolving or dispersing each component constituting the photosensitive resin composition according to the present embodiment described above in a solvent.
  • the solvent is not particularly limited, and a known solvent can be used.
  • a known solvent can be used.
  • those exemplified as the solvent for the photosensitive resin composition can be similarly used.
  • Application methods include, for example, doctor blade coating method, Meyer bar coating method, roll coating method, screen coating method, spinner coating method, inkjet coating method, spray coating method, dip coating method, gravure coating method, curtain coating method, die coating Examples thereof include a coating method.
  • the drying conditions are not particularly limited, but the drying temperature is preferably 60 to 130 ° C., and the drying time is preferably 0.5 to 30 minutes.
  • a polymer film As the support film 2, a polymer film can be used.
  • the polymer film include films made of polyethylene terephthalate, polycarbonate, polyethylene, polypropylene, cycloolefin polymer, polyethersulfone, and the like.
  • the thickness of the support film 2 is preferably 5 to 100 ⁇ m, more preferably 10 to 70 ⁇ m, and still more preferably, from the viewpoints of ensuring coverage and suppressing a reduction in resolution when irradiated with actinic rays through the support film 2. Is from 15 to 40 ⁇ m, particularly preferably from 20 to 35 ⁇ m.
  • the thickness of the photosensitive layer 3 is sufficient to protect the electrode, and is dried (after the solvent is volatilized) so that the level difference on the surface of the touch sensor caused by the partial electrode protective film formation is minimized.
  • the thickness is preferably 20 ⁇ m or less, more preferably 1 ⁇ m to 9 ⁇ m, still more preferably 1 ⁇ m to 8 ⁇ m, particularly preferably 2 ⁇ m to 8 ⁇ m, and most preferably 3 ⁇ m to 8 ⁇ m.
  • the minimum value of the light transmittance at 400 to 700 nm of the photosensitive layer 3 is preferably 90% or more, more preferably 92% or more, and further preferably 95% or more. If the minimum value of light transmittance in the wavelength range of 400 to 700 nm, which is a general visible light wavelength range, is 90% or more, the transparent electrode in the sensing area of the touch sensor is protected, and the frame of the touch sensor When the protective layer is visible from the edge of the sensing area when protecting the metal layer in the area (for example, a layer in which a copper layer is formed on the ITO electrode), the image display quality, color, brightness, etc. in the sensing area are reduced. Can be sufficiently suppressed.
  • the minimum value of the light transmittance at 400 to 700 nm of the photosensitive layer is obtained by measuring the light transmittance at a measurement wavelength region of 400 to 700 nm using an ultraviolet-visible spectrophotometer. It means the minimum value of light transmittance in the region.
  • the light transmittance is measured on the cured photosensitive layer formed by irradiating the photosensitive layer having a thickness of 10 ⁇ m or less formed on the support film with ultraviolet rays, followed by photocuring and then removing the support film.
  • b * in the CIELAB color system of the photosensitive layer 3 is preferably ⁇ 0.2 to 1.0, more preferably 0.0 to 0.7, and still more preferably. 0.1 to 0.5.
  • b * in the CIELAB color system is Preferably, it is -0.2 to 1.0.
  • b * in the CIELAB color system refers to, for example, Konica Minolta for a cured photosensitive layer that is photocured by irradiating a photosensitive layer having a thickness of 10 ⁇ m or less formed on a support film with ultraviolet rays. It means a value obtained by measurement using a spectrocolorimeter “CM-5” manufactured by Co., Ltd. under the conditions of a D65 light source and a viewing angle of 2 °.
  • CM-5 spectrocolorimeter
  • the photosensitive element of the present embodiment may include other appropriately selected layers in addition to the photosensitive layer as long as a desired effect is obtained.
  • the photosensitive element may be provided with one of these layers alone, or may be provided with two or more.
  • the photosensitive element may include two or more layers of the same kind.
  • the photosensitive element 1B is provided on the surface of the photosensitive layer 3 opposite to the support film 2 in addition to the support film 2 and the photosensitive layer 3.
  • a protective film (cover film) 4 may be further provided. That is, the photosensitive element 1 ⁇ / b> B according to the embodiment includes the support film 2, the photosensitive layer 3, and the protective film 4 in this order.
  • Examples of the protective film 4 include polyethylene, polypropylene, polyethylene terephthalate, polycarbonate, polyethylene-vinyl acetate copolymer, and a film made of a laminated film of polyethylene-vinyl acetate copolymer and polyethylene.
  • the thickness of the protective film 4 is preferably 5 to 100 ⁇ m.
  • the thickness of the protective film 4 is preferably 70 ⁇ m or less, more preferably 60 ⁇ m or less, still more preferably 50 ⁇ m or less, and particularly preferably 40 ⁇ m or less from the viewpoint of storing the photosensitive element 1B in a roll shape.
  • Photosensitive elements 1A and 1B can be stored in roll form or used.
  • the photosensitive elements 1 ⁇ / b> A and 1 ⁇ / b> B are suitable for forming a protective film for a touch panel electrode by including the photosensitive layer 3 formed of the photosensitive resin composition, and are excellent in adhesion with the base material of the touch panel. Can be formed.
  • FIG. 2 is a schematic diagram illustrating an example of a capacitive touch panel.
  • FIG. 2A is a schematic top view of the touch panel, and
  • FIG. 2B is a partial cross-sectional view taken along line II of C portion shown in FIG.
  • the touch panel 5 includes a base material (transparent base material) 6 and a touch panel electrode provided on the base material 6.
  • a touch screen area 7 for detecting touch position coordinates is formed on one side of the touch panel 5.
  • a first transparent electrode 8, a second transparent electrode 9, a metal wiring (lead wiring) 10, a connection electrode 11, and a connection terminal 12 are provided.
  • the base material 6 provided with the touch panel electrode shown by FIG. 2 (a), (b) is obtained by the following procedures, for example. After forming a metal film by sputtering in the order of ITO and Cu on a substrate 6 such as a PET film, an etching photosensitive film is pasted on the metal film to form a desired resist pattern, and unnecessary Cu is chlorinated. After removing with an etching solution such as an iron aqueous solution, the resist pattern is peeled off.
  • Examples of the substrate 6 include substrates such as glass plates, plastic plates, and ceramic plates that are generally used for touch sensors.
  • Examples of the touch panel electrode include electrodes formed of ITO, Cu, Al, Mo, or the like.
  • the first transparent electrode 8 and the second transparent electrode 9 are provided in the touch screen area 7 in order to detect a capacitance change.
  • the first transparent electrode 8 and the second transparent electrode 9 detect the X coordinate and the Y coordinate of the touch position, respectively.
  • the metal wiring 10 transmits a detection signal of the touch position by the first transparent electrode 8 and the second transparent electrode 9 to an external circuit.
  • the metal wiring 10 and the first transparent electrode 8 and the second transparent electrode 9 are connected to each other by a connection electrode 11 provided on the first transparent electrode 8 and the second transparent electrode 9.
  • One end of the metal wiring 10 is connected to the first transparent electrode 8 and the second transparent electrode 9.
  • the other end of the metal wiring 10 is provided with a connection terminal 12 for connection to an external circuit.
  • the first transparent electrode 8, the second transparent electrode 9, the metal wiring 10, the connection electrode 11, and a part of the connection terminal 12 are protected so as to cover them.
  • a membrane 13 is arranged.
  • the protective film 13 may be in direct contact with the touch panel electrode such as the metal wiring 10 and the base material 6 or may be provided on the touch panel electrode such as the metal wiring 10 and the base material 6 through another layer. .
  • the protective film 13 is suitably formed using the photosensitive resin composition or photosensitive element of this embodiment.
  • the protective film 13 is formed as follows, for example. First, the photosensitive layer which consists of the said photosensitive resin composition is provided on the base material 6 with which electrodes (touch panel electrode), such as the metal wiring 10, were provided (layer formation process). When a photosensitive element is used in the layer forming step, the photosensitive layer is transferred, for example, by pressing the photosensitive layer on the surface of the substrate 6 on which the metal wiring 10 or the like is provided while heating the photosensitive element. , Provided by stacking. In addition, when using the photosensitive element 1B provided with the protective film 4 as a photosensitive element, the protective film 4 is removed before pressure bonding. The photosensitive element may be transferred to the substrate after only the connecting portion with the other substrate is removed in a rectangular shape.
  • Crimping means includes a crimping roll.
  • the pressure roll may be provided with a heating means so that it can be heat-pressure bonded.
  • the heating temperature for thermocompression bonding is such that the components of the photosensitive layer are not easily cured or thermally decomposed while ensuring sufficient adhesion between the photosensitive layer and the substrate 6 and adhesion between the photosensitive layer and the touch panel electrode.
  • the temperature is preferably 10 to 160 ° C, more preferably 20 to 150 ° C, still more preferably 23 to 150 ° C.
  • the pressure during thermocompression bonding is a linear pressure from the viewpoint of suppressing deformation of the substrate 6 while ensuring sufficient adhesion between the photosensitive layer and the substrate 6, preferably 50 to 1 ⁇ 10 5 N / m. More preferably, it is 2.5 ⁇ 10 2 to 5 ⁇ 10 4 N / m, and further preferably 5 ⁇ 10 2 to 4 ⁇ 10 4 N / m.
  • the substrate 6 is preliminarily from the viewpoint of further improving the adhesion between the photosensitive layer and the substrate 6. Heat treatment.
  • the preheating temperature at this time is preferably 30 to 150 ° C.
  • a coating liquid containing the photosensitive resin composition and the solvent according to the present embodiment is prepared and applied to the surface of the substrate 6 on which the touch panel electrode is provided. And dried to form a photosensitive layer.
  • the support film on the photosensitive layer is transparent, it can be irradiated as it is, and if it is opaque, it is removed and then irradiated with actinic light.
  • a transparent polymer film is preferably used as the support film, and actinic rays are irradiated through the polymer film while it remains. In this case, the support film is removed after irradiation with actinic rays.
  • a known actinic light source can be used and is not particularly limited as long as it emits ultraviolet rays effectively.
  • the light source include a metal halide lamp, a carbon arc lamp, an ultrahigh pressure mercury lamp, a high pressure mercury lamp, and a xenon lamp.
  • the irradiation amount of actinic rays at this time is usually 1 ⁇ 10 2 to 1 ⁇ 10 4 J / m 2 , and heating can be accompanied at the time of irradiation.
  • the irradiation amount of this actinic ray is 1 ⁇ 10 2 J / m 2 or more, the photocuring effect tends to be sufficient, and when it is 1 ⁇ 10 4 J / m 2 or less, the photosensitive layer is discolored. It tends to be possible to suppress this.
  • the thickness of the protective film 13 is preferably 50 ⁇ m or less or 20 ⁇ m or less so that the step on the surface of the touch sensor that exhibits a sufficient effect for protecting the electrode and that is caused by partial formation of the protective film of the electrode is minimized. More preferably, they are 1 micrometer or more and 9 micrometers or less, More preferably, they are 1 micrometer or more and 8 micrometers or less, Especially preferably, they are 2 micrometers or more and 8 micrometers or less, Most preferably, they are 3 micrometers or more and 8 micrometers or less. Even if this protective film 13 is a thin film as described above, an increase in the resistance value of the touch panel electrode accompanying bending of the touch panel can be suppressed.
  • the minimum value of the light transmittance at 400 to 700 nm of the protective film 13 is preferably 90% or more, more preferably 92% or more, and still more preferably 95% or more from the viewpoint of excellent visibility. If the light transmittance of the protective film is 90% or more in the wavelength range of 400 to 700 nm, which is a general visible light wavelength range, the transparent electrode in the sensing area of the touch sensor is protected, and the touch sensor When the metal film in the frame area (for example, the copper layer formed on the ITO electrode) is protected and the protective film is visible from the edge of the sensing area, the image display quality, color, and brightness in the sensing area are reduced. Can be sufficiently suppressed.
  • b * in the CIELAB color system of the protective film 13 is preferably ⁇ 0.2 to 1.0, more preferably 0.0 to 0.7, and still more preferably 0.1 to 0.5.
  • the substrate 6 may further include an optical adjustment layer (also referred to as “index matching layer”), an insulating layer, and the like.
  • an optical adjustment layer also referred to as “index matching layer”
  • an insulating layer and the like.
  • the metal wiring 10 and the first transparent electrode 8 and the second transparent electrode 9 are connected to each other by the connection electrode 11, but in another aspect, the metal wiring and the first transparent electrode 8 The transparent electrode and the second transparent electrode may be directly connected to each other.
  • the place where the protective film 13 is provided may be changed as appropriate.
  • the protective film 13 is provided so as to cover all of the first transparent electrode 8, the second transparent electrode 9, the metal wiring 10, the connection electrode 11, and a part of the connection terminal 12. A part of each of the first transparent electrode, the second transparent electrode, and the connection terminal, and the metal wiring and the connection electrode may be provided.
  • the protective film 13 is provided as follows, for example. First, in the exposure step, the photosensitive layer is cured by irradiating a predetermined portion of the photosensitive layer with actinic rays through a photomask.
  • the photosensitive layer that has been irradiated with actinic rays is developed with a developing solution, and a portion that is not irradiated with actinic rays (that is, other than a predetermined portion of the photosensitive layer) is removed, whereby a protective film 13 that covers a portion of the electrode. Is formed (development process).
  • the protective film 13 is made of a cured product of the photosensitive resin composition according to the present embodiment and has a predetermined pattern.
  • the pattern in this specification includes not only the shape of the fine wiring that forms the circuit, but also a shape in which only the connection portion with the other substrate is removed in a rectangle, a shape in which only the sensing region of the substrate is removed, and the like. It is.
  • the developing step can be performed by a known method such as spraying, showering, rocking dipping, brushing, scrubbing, or the like, using a known developer such as an alkaline aqueous solution, an aqueous developer, or an organic solvent.
  • a known developer such as an alkaline aqueous solution, an aqueous developer, or an organic solvent.
  • the development step is preferably performed by spray development using an alkaline aqueous solution from the viewpoint of environment and safety.
  • the development temperature and time may be adjusted according to the developability of the photosensitive resin composition according to the present embodiment.
  • the base of the alkaline aqueous solution remaining in the photosensitive layer after development and photocuring is subjected to an acid treatment by a known method such as spraying, rocking immersion, brushing or scrubbing using an organic acid, an inorganic acid or an aqueous acid solution thereof. (Neutralization treatment).
  • an acid treatment by a known method such as spraying, rocking immersion, brushing or scrubbing using an organic acid, an inorganic acid or an aqueous acid solution thereof.
  • the water washing process can also be performed after an acid treatment (neutralization treatment).
  • the cured product of the photosensitive layer may be further cured after curing by irradiation with actinic light, after development, and if necessary, by irradiation with actinic light (for example, 5 ⁇ 10 3 to 2 ⁇ 10 4 J / m 2 ).
  • actinic light for example, 5 ⁇ 10 3 to 2 ⁇ 10 4 J / m 2 .
  • the photosensitive resin composition according to the present embodiment exhibits excellent adhesion to a metal even without a heating step after development, but if necessary, instead of irradiation with actinic rays after development, or A heat treatment (80 to 160 ° C.) may be applied in combination with the irradiation with actinic rays.
  • FIG. 3A is a perspective view showing an example of a flexible touch panel.
  • FIG. 3B is a cross-sectional view taken along the line II-II shown in FIG.
  • the touch panel 5 ⁇ / b> A includes a touch panel substrate 14 and a protective film 13 provided on the touch panel substrate 14.
  • the base material 6 and the touch panel electrode in FIG. 2 are collectively referred to as a touch panel substrate 14 for simplification. That is, the touch panel 5A includes a base material 6, a touch panel electrode provided on the base material 6, and a protective film 13 provided so as to cover at least a part of the touch panel electrode.
  • the touch panel 5A having flexibility is bent in a direction perpendicular to the XY plane ( ⁇ Z direction, opposite to the protective film 13 of the touch panel substrate 14) near both ends in the X direction, and extends in the Y direction. It has a bending region R1.
  • the protective film 13 is provided on at least a part of the bent region R1.
  • the bent region means a region folded with a predetermined curvature radius or a region that can be folded with a predetermined curvature radius.
  • the predetermined radius of curvature is, for example, 40 mm or less, 10 mm or less, or 5 mm or less.
  • the touch panel may be folded in the folding region. In other embodiments, the touch panel may have a bent region near the center.
  • the touch panel 5B has an XY plane direction ( ⁇ Y direction, the main surface of the touch panel 5B) so that the protective film 13 is inside near the center in the Y direction. (Horizontal direction) is folded 180 degrees (also referred to as inward bending) and has a bent region R2 extending in the X direction.
  • the protective film 13 is provided on at least a part of the bending region R2.
  • the touch panel 5C has an XY plane direction ( ⁇ Y direction, touch panel 5B) so that the protective film 13 is outside near the center in the Y direction. It is folded 180 ° (horizontal direction with respect to the main surface) (also referred to as outer bending) and has a bent region R3 extending in the X direction.
  • the protective film 13 is provided in at least a part of the bending region R3.
  • the protective film 13 is formed of the photosensitive resin composition and has excellent adhesion to the touch panel substrate 14 (base material 6), the touch panel 5A, 5B, 5C having flexibility as described above is used. Preferably used. Moreover, the protective film 13 can suppress generation
  • binder polymer solution (A1)] (1) shown in Table 1 was charged into a flask equipped with a stirrer, a reflux condenser, an inert gas inlet, and a thermometer. The temperature was raised to 80 ° C. in a nitrogen gas atmosphere, and while keeping the reaction temperature at 80 ° C. ⁇ 2 ° C., (2) shown in Table 1 was uniformly added dropwise over 4 hours. After the dropwise addition of (2), stirring was continued at 80 ° C. ⁇ 2 ° C. for 6 hours to obtain a binder polymer solution (solid content: 45 mass%) (A1). The weight average molecular weight of the binder polymer was 65000, the acid value was 91 mgKOH / g, the hydroxyl value was 2 mgKOH / g, and the glass transition temperature (Tg) was 70 ° C.
  • binder polymer solution (A2) A binder polymer solution (A2) was prepared in the same manner as the binder polymer solution (A1) except that the charged amount of (2) shown in Table 1 was changed.
  • the weight average molecular weight of the binder polymer was 180,000, the acid value was 91 mgKOH / g, the hydroxyl value was 2 mgKOH / g, and the glass transition temperature (Tg) was 75 ° C.
  • a binder polymer solution (A3) was prepared in the same manner as the binder polymer solution (A1) except that the charged amount of (2) shown in Table 1 was changed.
  • the weight average molecular weight of the binder polymer (A3) was 290000, the acid value was 91 mgKOH / g, the hydroxyl value was 2 mgKOH / g, and the glass transition temperature (Tg) was 77 ° C.
  • the weight average molecular weight (Mw) was measured by gel permeation chromatography (GPC), and was derived by conversion using a standard polystyrene calibration curve.
  • GPC condition Pump Hitachi L-6000 type (product name, manufactured by Hitachi, Ltd.) Column: Gelpack GL-R420, Gelpack GL-R430, Gelpack GL-R440 (above, manufactured by Hitachi Chemical Co., Ltd., product name) Eluent: Tetrahydrofuran Measurement temperature: 40 ° C Flow rate: 2.05 mL / min Detector: Hitachi L-3300 type RI (manufactured by Hitachi, Ltd., product name)
  • the acid value was measured by a neutralization titration method based on JIS K0070 as shown below. First, the binder polymer solution was heated at 130 ° C. for 1 hour to remove volatile matter, thereby obtaining a solid content. Then, after accurately weighing 1 g of the solid binder polymer, 30 g of acetone was added to the binder polymer, and this was uniformly dissolved to obtain a resin solution. Next, an appropriate amount of an indicator, phenolphthalein, was added to the resin solution, and neutralization titration was performed using a 0.1 mol / L potassium hydroxide aqueous solution. And the acid value was computed by following Formula.
  • Acid value 0.1 ⁇ V ⁇ f 1 ⁇ 56.1 / (Wp ⁇ I / 100)
  • V is a titration amount (mL) of 0.1 mol / L potassium hydroxide aqueous solution used for titration
  • f 1 is a factor (concentration conversion factor) of 0.1 mol / L potassium hydroxide aqueous solution
  • Wp is a measured resin.
  • the mass (g) and I of the solution indicate the proportion (mass%) of the non-volatile content in the measured resin solution.
  • the hydroxyl value was measured by a neutralization titration method based on JIS K0070 as shown below.
  • the binder polymer solution was heated at 130 ° C. for 1 hour to remove volatile matter, thereby obtaining a solid content.
  • the binder polymer was put into an Erlenmeyer flask, 10 mL of 10 mass% acetic anhydride pyridine solution was added to uniformly dissolve the binder polymer, and heated at 100 ° C. for 1 hour. . After heating, 10 mL of water and 10 mL of pyridine were added and heated at 100 ° C.
  • Hydroxyl value (AB) ⁇ f 2 ⁇ 28.05 / S + D
  • A is the amount (mL) of 0.5 mol / L potassium hydroxide ethanol solution used for the blank test
  • B is the amount (mL) of 0.5 mol / L potassium hydroxide ethanol solution used for titration
  • f 2 Is a factor (concentration conversion factor) of 0.5 mol / L potassium hydroxide ethanol solution
  • S is the mass (g) of the binder polymer
  • D is the acid value.
  • the above process was performed without adding a binder polymer.
  • Example 1 Preparation of coating solution containing photosensitive resin composition
  • the materials shown in Table 2 were mixed for 15 minutes using a stirrer to prepare a coating solution containing a photosensitive resin composition for forming a protective film.
  • a polyethylene terephthalate film having a thickness of 50 ⁇ m was used as the support film.
  • the coating solution containing the photosensitive resin composition prepared above was uniformly applied on the support film.
  • the solvent was removed by drying with a hot air convection dryer at 100 ° C. for 3 minutes to form a photosensitive layer (photosensitive resin composition layer) made of the photosensitive resin composition.
  • the resulting photosensitive layer had a thickness of 5 ⁇ m.
  • a 25 ⁇ m thick polyethylene film was laminated as a protective film on the obtained photosensitive layer to produce a photosensitive element for forming a protective film.
  • the photosensitive element obtained above was subjected to a roll temperature of 110 ° C., a substrate feed rate of 0.6 m / min, and a pressure of pressure (cylinder pressure) of 0.4 MPa so that ITO of ITO-TEG and the photosensitive layer were in contact with each other.
  • a laminate was prepared by laminating on ITO-TEG and laminating a photosensitive layer and a polyethylene terephthalate film on ITO-TEG.
  • ITO compression direction ⁇ Inward bending (ITO compression direction)>
  • the sample for flexibility test on the planar load U-shaped stretch tester (Yuasa System Equipment Co., Ltd., device name: DLDMMLH-FS) so that the radius of curvature is 1 mm, and in the direction that ITO compresses at 60 rpm It was bent 200,000 times.
  • the photosensitive layer of the obtained laminate was exposed at an exposure amount of 1000 mJ / m 2 (i-line (wavelength 365 nm)). Measured value), and irradiated with ultraviolet rays. Thereafter, the support film was removed to obtain a sample for light transmittance measurement having a cured film of a photosensitive layer having a thickness of 5 ⁇ m.
  • the light transmittance was measured in a measurement wavelength range of 400 to 700 nm using a UV-visible spectrophotometer (U-3310) manufactured by Hitachi High-Technologies Corporation, and the minimum value was calculated. .
  • L *, a *, and b * in the CIELAB color system were measured with a light source D65 using a spectrocolorimeter CM-5 manufactured by Konica Minolta.
  • the total light transmittance and haze were measured using the haze meter and the haze meter (Nippon Denshoku Industries Co., Ltd. make, apparatus name: NDH7000). The results are shown in Table 2.
  • Example 2 A protective film was formed using a photosensitive element in the same manner as in Example 1 except that the composition of the photosensitive resin composition was changed as shown in Table 2, and the above tests and measurements were performed. The results are shown in Table 2.

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Abstract

Selon un mode de réalisation, la présente invention concerne un film protecteur pour une électrode de panneau tactile qui est obtenu par durcissement d'une composition de résine photosensible contenant : un polymère liant ayant un poids moléculaire moyen en poids de 100 000 ou plus ; un composé photopolymérisable ; et un initiateur de photopolymérisation.
PCT/JP2018/013268 2017-03-29 2018-03-29 Film protecteur pour électrode de panneau tactile et panneau tactile Ceased WO2018181722A1 (fr)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015170404A (ja) * 2014-03-05 2015-09-28 株式会社東芝 透明導電体およびこれを用いたデバイス
WO2016047691A1 (fr) * 2014-09-24 2016-03-31 旭化成イーマテリアルズ株式会社 Composition de résine photosensible, stratifié de résine photosensible, procédé de production de motif de résine, film durci et dispositif d'affichage
JP2016155978A (ja) * 2015-02-26 2016-09-01 富士フイルム株式会社 タッチパネル電極保護膜形成用組成物、転写フィルム、透明積層体、タッチパネル用電極の保護膜及びその形成方法、静電容量型入力装置、並びに、画像表示装置
JP2016192005A (ja) * 2015-03-31 2016-11-10 グンゼ株式会社 タッチパネルおよびその製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015170404A (ja) * 2014-03-05 2015-09-28 株式会社東芝 透明導電体およびこれを用いたデバイス
WO2016047691A1 (fr) * 2014-09-24 2016-03-31 旭化成イーマテリアルズ株式会社 Composition de résine photosensible, stratifié de résine photosensible, procédé de production de motif de résine, film durci et dispositif d'affichage
JP2016155978A (ja) * 2015-02-26 2016-09-01 富士フイルム株式会社 タッチパネル電極保護膜形成用組成物、転写フィルム、透明積層体、タッチパネル用電極の保護膜及びその形成方法、静電容量型入力装置、並びに、画像表示装置
JP2016192005A (ja) * 2015-03-31 2016-11-10 グンゼ株式会社 タッチパネルおよびその製造方法

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