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WO2018127565A3 - Guiding device and associated system - Google Patents

Guiding device and associated system Download PDF

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Publication number
WO2018127565A3
WO2018127565A3 PCT/EP2018/050278 EP2018050278W WO2018127565A3 WO 2018127565 A3 WO2018127565 A3 WO 2018127565A3 EP 2018050278 W EP2018050278 W EP 2018050278W WO 2018127565 A3 WO2018127565 A3 WO 2018127565A3
Authority
WO
WIPO (PCT)
Prior art keywords
gas
euv
radiation
vessel wall
inner vessel
Prior art date
Application number
PCT/EP2018/050278
Other languages
French (fr)
Other versions
WO2018127565A2 (en
Inventor
Dzmitry Labetski
Christianus Wilhelmus Johannes Berendsen
Rui Miguel DUARTE RODRIGES NUNES
Alexander Igorevich ERSHOV
Kornelis Frits FEENSTRA
Igor Vladimirovich FOMENKOV
Klaus Martin HUMMLER
Arun JOHNKADAKSHAM
Matthias KRAUSHAAR
Andrew David LAFORGE
Marc Guy Langlois
Maksim LOGINOV
Yue Ma
Seyedmohammad MOJAB
Kerim NADIR
Alexander SHATALOV
John Tom STEWART
Henricus Gerardus Tegenbosch
Chunguang Xia
Original Assignee
Asml Netherlands B.V.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to CN202311317803.5A priority Critical patent/CN117202469A/en
Priority to JP2019531630A priority patent/JP7193459B2/en
Priority to KR1020197022981A priority patent/KR102536355B1/en
Priority to US16/469,689 priority patent/US10955749B2/en
Priority to CN201880006126.6A priority patent/CN110169206B/en
Application filed by Asml Netherlands B.V. filed Critical Asml Netherlands B.V.
Publication of WO2018127565A2 publication Critical patent/WO2018127565A2/en
Publication of WO2018127565A3 publication Critical patent/WO2018127565A3/en
Anticipated expiration legal-status Critical
Priority to US17/155,951 priority patent/US11822252B2/en
Priority to JP2022140574A priority patent/JP7465923B2/en
Priority to US18/380,439 priority patent/US12389519B2/en
Priority to JP2024059164A priority patent/JP7664446B2/en
Priority to JP2025063322A priority patent/JP2025108499A/en
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/009—Auxiliary arrangements not involved in the plasma generation
    • H05G2/0094—Reduction, prevention or protection from contamination; Cleaning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/009—Auxiliary arrangements not involved in the plasma generation
    • H05G2/0092—Housing of the apparatus for producing X-rays; Environment inside the housing

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • X-Ray Techniques (AREA)

Abstract

A radiation source including a chamber including a plasma formation region, a radiation collector arranged in the chamber, the radiation collector configured to collect radiation emitted at the plasma formation region and to direct the collected radiation to an intermediate focus region, a debris mitigation system configured to direct a first gas flow from the intermediate focus region towards the plasma formation region, and a guiding device arranged in the chamber such that the first gas flow is directed around the guiding device. A system and apparatus for reducing contamination of an inner vessel wall of an EUV vessel is provided. The system and apparatus include inner vessel wall supplies of gas that introduce gas via a plurality of nozzles away from the inner vessel wall. The system and apparatus also optionally include an asymmetric exhaust to exhaust gas from the EUV vessel while providing flow geometries that promote a direction of gas away from the inner vessel wall and an EUV collector within the EUV vessel.
PCT/EP2018/050278 2017-01-06 2018-01-05 Guiding device and associated system Ceased WO2018127565A2 (en)

Priority Applications (10)

Application Number Priority Date Filing Date Title
CN202311317803.5A CN117202469A (en) 2017-01-06 2018-01-05 Guiding device and associated system
JP2019531630A JP7193459B2 (en) 2017-01-06 2018-01-05 Extreme ultraviolet source (EUV source)
KR1020197022981A KR102536355B1 (en) 2017-01-06 2018-01-05 Guidance devices and related systems
US16/469,689 US10955749B2 (en) 2017-01-06 2018-01-05 Guiding device and associated system
CN201880006126.6A CN110169206B (en) 2017-01-06 2018-01-05 Boot device and associated systems
US17/155,951 US11822252B2 (en) 2017-01-06 2021-01-22 Guiding device and associated system
JP2022140574A JP7465923B2 (en) 2017-01-06 2022-09-05 Extreme ultraviolet radiation source
US18/380,439 US12389519B2 (en) 2017-01-06 2023-10-16 Guiding device and associated system
JP2024059164A JP7664446B2 (en) 2017-01-06 2024-04-01 RADIATION SOURCE, LITHOGRAPHY SYSTEM AND INSPECTION SYSTEM
JP2025063322A JP2025108499A (en) 2017-01-06 2025-04-07 Guidance devices and related systems

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US201715400929A 2017-01-06 2017-01-06
US15/400,929 2017-01-06
EP17158280.2 2017-02-28
EP17158280 2017-02-28
US201762596629P 2017-12-08 2017-12-08
US62/596,629 2017-12-08

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
US201715400929A Continuation-In-Part 2017-01-06 2017-01-06

Related Child Applications (2)

Application Number Title Priority Date Filing Date
US16/469,689 A-371-Of-International US10955749B2 (en) 2017-01-06 2018-01-05 Guiding device and associated system
US17/155,951 Continuation US11822252B2 (en) 2017-01-06 2021-01-22 Guiding device and associated system

Publications (2)

Publication Number Publication Date
WO2018127565A2 WO2018127565A2 (en) 2018-07-12
WO2018127565A3 true WO2018127565A3 (en) 2018-09-27

Family

ID=62789234

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2018/050278 Ceased WO2018127565A2 (en) 2017-01-06 2018-01-05 Guiding device and associated system

Country Status (2)

Country Link
NL (1) NL2020238A (en)
WO (1) WO2018127565A2 (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2022644A (en) 2018-03-05 2019-09-10 Asml Netherlands Bv Prolonging optical element lifetime in an euv lithography system
US11979971B2 (en) * 2018-06-29 2024-05-07 Taiwan Semiconductor Manufacturing Company, Ltd. EUV light source and apparatus for lithography
NL2024042A (en) 2018-10-22 2020-05-07 Asml Netherlands Bv Apparatus for and method of reducing contamination from source material in an euv light source
US11153957B2 (en) 2018-10-31 2021-10-19 Taiwan Semiconductor Manufacturing Company Ltd. Apparatus and method for generating an electromagnetic radiation
JP7311296B2 (en) 2019-04-01 2023-07-19 ギガフォトン株式会社 EUV chamber apparatus, extreme ultraviolet light generation system, and electronic device manufacturing method
EP3798730A1 (en) 2019-09-30 2021-03-31 ASML Netherlands B.V. Radiation conduit
JP7630515B2 (en) * 2019-12-23 2025-02-17 エーエスエムエル ネザーランズ ビー．ブイ． Collector Flow Ring
JP7467174B2 (en) 2020-03-16 2024-04-15 ギガフォトン株式会社 Chamber apparatus, extreme ultraviolet light generating apparatus, and method for manufacturing electronic device
JP7389691B2 (en) 2020-03-18 2023-11-30 ギガフォトン株式会社 Extreme ultraviolet light generation device, extreme ultraviolet light generation system, and electronic device manufacturing method
JP2021152601A (en) 2020-03-24 2021-09-30 ギガフォトン株式会社 Extreme ultraviolet generator, and method for manufacturing electronic device
KR20220167375A (en) 2020-04-13 2022-12-20 에이에스엠엘 네델란즈 비.브이. Apparatus and method for controlling gas flow in an EUV light source
US12158576B2 (en) * 2021-05-28 2024-12-03 Kla Corporation Counterflow gas nozzle for contamination mitigation in extreme ultraviolet inspection systems
EP4203626A1 (en) * 2021-12-22 2023-06-28 ASML Netherlands B.V. Vessel for a radiation source
WO2024199928A1 (en) * 2023-03-30 2024-10-03 Asml Netherlands B.V. Gas flow apparatus and method for euv light source
WO2025153242A1 (en) * 2024-01-17 2025-07-24 Asml Netherlands B.V. Method and device for tuning flow velocity profile

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090073396A1 (en) * 2007-09-17 2009-03-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20090154642A1 (en) * 2007-12-14 2009-06-18 Cymer, Inc. System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
US20110164236A1 (en) * 2008-09-11 2011-07-07 Asml Netherlands B.V. Radiation source and lithographic apparatus
WO2011110383A1 (en) * 2010-03-12 2011-09-15 Asml Netherlands B.V. Radiation source, lithographic apparatus and device manufacturing method
US20140306115A1 (en) * 2013-04-10 2014-10-16 Kla-Tencor Corporation Debris Protection System For Reflective Optic Utilizing Gas Flow
US20150008335A1 (en) * 2013-02-14 2015-01-08 Kla-Tencor Corporation System and method for producing an exclusionary buffer gas flow in an euv light source

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090073396A1 (en) * 2007-09-17 2009-03-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20090154642A1 (en) * 2007-12-14 2009-06-18 Cymer, Inc. System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
US20110164236A1 (en) * 2008-09-11 2011-07-07 Asml Netherlands B.V. Radiation source and lithographic apparatus
WO2011110383A1 (en) * 2010-03-12 2011-09-15 Asml Netherlands B.V. Radiation source, lithographic apparatus and device manufacturing method
US20150008335A1 (en) * 2013-02-14 2015-01-08 Kla-Tencor Corporation System and method for producing an exclusionary buffer gas flow in an euv light source
US20140306115A1 (en) * 2013-04-10 2014-10-16 Kla-Tencor Corporation Debris Protection System For Reflective Optic Utilizing Gas Flow

Also Published As

Publication number Publication date
NL2020238A (en) 2018-07-23
WO2018127565A2 (en) 2018-07-12

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