[go: up one dir, main page]

Zhao et al., 2022 - Google Patents

Progress of GaN‐based optoelectronic devices integrated with optical resonances

Zhao et al., 2022

Document ID
9785603164499051991
Author
Zhao L
Liu C
Wang K
Publication year
Publication venue
Small

External Links

Snippet

Being direct wide bandgap, III‐nitride (III‐N) semiconductors have many applications in optoelectronics, including light‐emitting diodes, lasers, detectors, photocatalysis, etc. Incorporation of III‐N semiconductors with high‐efficiency optical resonances including …
Continue reading at onlinelibrary.wiley.com (other versions)

Classifications

    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/02Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
    • H01L33/20Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01SDEVICES USING STIMULATED EMISSION
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting lasers (SE-lasers)
    • H01S5/183Surface-emitting lasers (SE-lasers) having a vertical cavity (VCSE-lasers)
    • H01S5/18308Surface-emitting lasers (SE-lasers) having a vertical cavity (VCSE-lasers) having a special structure for lateral current or light confinement
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01SDEVICES USING STIMULATED EMISSION
    • H01S5/00Semiconductor lasers
    • H01S5/30Structure or shape of the active region; Materials used for the active region
    • H01S5/34Structure or shape of the active region; Materials used for the active region comprising quantum well, or supperlattice structures, e.g. single quantum well lasers (SQW lasers), multiple quantum well lasers (MQW lasers), graded index separate confinement hetrostructure lasers (GRINSCH lasers)
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L31/00Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus peculiar to the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus peculiar to the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/0352Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus peculiar to the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
    • H01L31/035209Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus peculiar to the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions comprising a quantum structures
    • H01L31/035227Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus peculiar to the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions comprising a quantum structures the quantum structure being quantum wires, or nano-rods
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANO-TECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE OR TREATMENT OF NANO-STRUCTURES
    • B82Y20/00Nano-optics, e.g. quantum optics or photonic crystals
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B6/00Light guides
    • G02B6/10Light guides of the optical waveguide type
    • G02B6/12Light guides of the optical waveguide type of the integrated circuit kind
    • G02B6/122Light guides of the optical waveguide type of the integrated circuit kind basic optical elements, e.g. light-guiding paths

Similar Documents

Publication Publication Date Title
Zhao et al. Progress of GaN‐based optoelectronic devices integrated with optical resonances
Makarov et al. Halide‐perovskite resonant nanophotonics
Hsieh et al. Perovskite quantum dot lasing in a gap-plasmon nanocavity with ultralow threshold
Ra et al. An electrically pumped surface-emitting semiconductor green laser
Couteau et al. Nanowire lasers
Liu et al. Hybrid light emitters and UV solar‐blind avalanche photodiodes based on III‐nitride semiconductors
Liu et al. Emerging light‐emitting materials for photonic integration
Zhuang et al. Multicolor semiconductor lasers
Alias et al. Review of nanophotonics approaches using nanostructures and nanofabrication for III-nitrides ultraviolet-photonic devices
Zhang et al. Advances in III‐nitride semiconductor microdisk lasers
Ho et al. Low-threshold near-infrared GaAs–AlGaAs core–shell nanowire plasmon laser
Johnson et al. Optical cavity effects in ZnO nanowire lasers and waveguides
Geng et al. Enhancement of light output power from LEDs based on monolayer colloidal crystal
Coulon et al. Displacement Talbot lithography for nano-engineering of III-nitride materials
Wang et al. Nanowire optoelectronics
Huang et al. Top-and bottom-emission-enhanced electroluminescence of deep-UV light-emitting diodes induced by localised surface plasmons
Lu et al. Upconversion plasmonic lasing from an organolead trihalide perovskite nanocrystal with low threshold
Yokoo et al. Subwavelength nanowire lasers on a silicon photonic crystal operating at telecom wavelengths
Kim et al. Room‐Temperature InGaAs Nanowire Array Band‐Edge Lasers on Patterned Silicon‐on‐Insulator Platforms
Watkins et al. Surface normal lasing from CdSe nanoplatelets coupled to aluminum plasmonic nanoparticle lattices
Notomi et al. Nanowire photonics toward wide wavelength range and subwavelength confinement
Zhu et al. Research progress of gallium nitride microdisk cavity laser
Romeira et al. Efficient light extraction in subwavelength GaAs/AlGaAs nanopillars for nanoscale light-emitting devices
Saxena et al. Semiconductor nanolasers
Tang et al. Micro–Nanostructure‐Assisted Luminescence in Perovskite Devices