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AUPP156698A0 - New method for hydrogen passivation - Google Patents

New method for hydrogen passivation

Info

Publication number
AUPP156698A0
AUPP156698A0 AUPP1566A AUPP156698A AUPP156698A0 AU PP156698 A0 AUPP156698 A0 AU PP156698A0 AU PP1566 A AUPP1566 A AU PP1566A AU PP156698 A AUPP156698 A AU PP156698A AU PP156698 A0 AUPP156698 A0 AU PP156698A0
Authority
AU
Australia
Prior art keywords
new method
hydrogen passivation
passivation
hydrogen
new
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AUPP1566A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pacific Solar Pty Ltd
Original Assignee
Pacific Solar Pty Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pacific Solar Pty Ltd filed Critical Pacific Solar Pty Ltd
Priority to AUPP1566A priority Critical patent/AUPP156698A0/en
Publication of AUPP156698A0 publication Critical patent/AUPP156698A0/en
Priority to AU22594/99A priority patent/AU2259499A/en
Priority to PCT/AU1999/000057 priority patent/WO1999039385A1/fr
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/3003—Hydrogenation or deuterisation, e.g. using atomic hydrogen from a plasma

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
AUPP1566A 1998-01-30 1998-01-30 New method for hydrogen passivation Abandoned AUPP156698A0 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
AUPP1566A AUPP156698A0 (en) 1998-01-30 1998-01-30 New method for hydrogen passivation
AU22594/99A AU2259499A (en) 1998-01-30 1999-01-28 Method for hydrogen passivation and multichamber hollow cathode apparatus
PCT/AU1999/000057 WO1999039385A1 (fr) 1998-01-30 1999-01-28 Procede de passivation a l'hydrogene et appareil cathodique creux a multiples chambres

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
AUPP1566A AUPP156698A0 (en) 1998-01-30 1998-01-30 New method for hydrogen passivation

Publications (1)

Publication Number Publication Date
AUPP156698A0 true AUPP156698A0 (en) 1998-02-19

Family

ID=3805844

Family Applications (1)

Application Number Title Priority Date Filing Date
AUPP1566A Abandoned AUPP156698A0 (en) 1998-01-30 1998-01-30 New method for hydrogen passivation

Country Status (2)

Country Link
AU (1) AUPP156698A0 (fr)
WO (1) WO1999039385A1 (fr)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE50209826D1 (de) * 2001-01-16 2007-05-10 Forsch Applikationslabor Plasm Vorrichtung zur plasmagestützten bearbeitung von oberflächen planarer substrate
EP3294045B1 (fr) 2004-07-21 2019-03-27 Mevion Medical Systems, Inc. Générateur de forme d'onde de fréquence radio programmable pour un synchrocyclotron
US7179678B1 (en) 2004-08-26 2007-02-20 Hewlett-Packard Development Company, L.P. EBIC response enhancement in type III-VI semiconductor material on silicon
EP2389977A3 (fr) 2005-11-18 2012-01-25 Still River Systems, Inc. Radiothérapie à particules chargées
US8003964B2 (en) 2007-10-11 2011-08-23 Still River Systems Incorporated Applying a particle beam to a patient
US8581523B2 (en) * 2007-11-30 2013-11-12 Mevion Medical Systems, Inc. Interrupted particle source
US8933650B2 (en) 2007-11-30 2015-01-13 Mevion Medical Systems, Inc. Matching a resonant frequency of a resonant cavity to a frequency of an input voltage
CN104813748B (zh) 2012-09-28 2019-07-09 梅维昂医疗系统股份有限公司 聚焦粒子束
EP2900326B1 (fr) 2012-09-28 2019-05-01 Mevion Medical Systems, Inc. Commande de thérapie par particules
EP2901824B1 (fr) 2012-09-28 2020-04-15 Mevion Medical Systems, Inc. Éléments d'homogénéisation de champ magnétique permettant d'ajuster la position de la bobine principale et procédé correspondant
JP6138947B2 (ja) 2012-09-28 2017-05-31 メビオン・メディカル・システムズ・インコーポレーテッド 磁場再生器
TW201424467A (zh) 2012-09-28 2014-06-16 Mevion Medical Systems Inc 一粒子束之強度控制
US10254739B2 (en) 2012-09-28 2019-04-09 Mevion Medical Systems, Inc. Coil positioning system
EP2901820B1 (fr) 2012-09-28 2021-02-17 Mevion Medical Systems, Inc. Focalisation d'un faisceau de particules à l'aide d'une variation de champ magnétique
TW201422278A (zh) 2012-09-28 2014-06-16 Mevion Medical Systems Inc 粒子加速器之控制系統
WO2014052719A2 (fr) 2012-09-28 2014-04-03 Mevion Medical Systems, Inc. Réglage de l'énergie d'un faisceau de particules
US9730308B2 (en) 2013-06-12 2017-08-08 Mevion Medical Systems, Inc. Particle accelerator that produces charged particles having variable energies
WO2015048468A1 (fr) 2013-09-27 2015-04-02 Mevion Medical Systems, Inc. Balayage par un faisceau de particules
US10675487B2 (en) 2013-12-20 2020-06-09 Mevion Medical Systems, Inc. Energy degrader enabling high-speed energy switching
US9962560B2 (en) 2013-12-20 2018-05-08 Mevion Medical Systems, Inc. Collimator and energy degrader
US9661736B2 (en) 2014-02-20 2017-05-23 Mevion Medical Systems, Inc. Scanning system for a particle therapy system
US9950194B2 (en) 2014-09-09 2018-04-24 Mevion Medical Systems, Inc. Patient positioning system
US10786689B2 (en) 2015-11-10 2020-09-29 Mevion Medical Systems, Inc. Adaptive aperture
JP7059245B2 (ja) 2016-07-08 2022-04-25 メビオン・メディカル・システムズ・インコーポレーテッド 治療計画の決定
US11103730B2 (en) 2017-02-23 2021-08-31 Mevion Medical Systems, Inc. Automated treatment in particle therapy
WO2019006253A1 (fr) 2017-06-30 2019-01-03 Mevion Medical Systems, Inc. Collimateur configurable commandé au moyen de moteurs linéaires
US11291861B2 (en) 2019-03-08 2022-04-05 Mevion Medical Systems, Inc. Delivery of radiation by column and generating a treatment plan therefor

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4664890A (en) * 1984-06-22 1987-05-12 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Glow-discharge decomposition apparatus
WO1989003584A1 (fr) * 1987-10-14 1989-04-20 Unisearch Limited Chambre de traitement sous vide a electrodes multiples
US5490910A (en) * 1992-03-09 1996-02-13 Tulip Memory Systems, Inc. Circularly symmetric sputtering apparatus with hollow-cathode plasma devices
US5711998A (en) * 1996-05-31 1998-01-27 Lam Research Corporation Method of polycrystalline silicon hydrogenation

Also Published As

Publication number Publication date
WO1999039385A1 (fr) 1999-08-05

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