Detailed Description
Several embodiments of the apparatus for preparing and treating a gas stream according to the present invention will be described in detail below. These devices can be used in all applications where it is useful to process a gas stream by passing it through a volume of liquid. These devices can therefore also be used in various fields, such as, for example, non-exclusively: heat recovery in gas streams, in particular hot air streams or industrial fumes; passing a gas stream through the liquid volume to produce a heated or cooled gas stream; preparing a temperature-controlled and/or absolute humidity-controlled gas stream; humidifying or dehumidifying the air flow; purifying or filtering the gas flow; performing gas flow treatment by passing gas flow through liquid to perform chemical reaction; heating or air conditioning of a site or industrial building, commercial building or residential building; site or industrial building, commercial building or residential building air humidity control. The prepared gas stream can also be used for cooling, heating, humidifying or dehumidifying any type of object or surface.
With reference to the particular embodiment of fig. 1, the apparatus 1A for gas stream preparation and treatment comprises an exchange chamber 2 and a liquid reservoir in the form of a tank 3, which contains a liquid bath L, for example water.
The invention is not limited to the use of water as the liquid L but extends to any other type of liquid. As non-limiting and non-exhaustive examples, it may be beneficial in certain applications to use a liquid L having a curing temperature below 0 ℃ at atmospheric pressure, such as water containing additives of salts, sugars, glycols, alcohols. It may also be beneficial to use oil as the liquid L.
More specifically, in the embodiment of fig. 1, the bath 3 is hermetically closed, so that the liquid bath L contained in the bath 3 is isolated from the pressure outside the exchange chamber 2, for example from the atmospheric pressure when the apparatus 1A is in the open air.
In another variant, the bath 3 may be open, so that the liquid volume outside the exchange chamber 2 is, for example, at atmospheric pressure.
The lower surface of the lower part 20 of each exchange chamber 2 is open, thus forming a liquid inlet 2 a. The lower part 20 of each exchange chamber 2 is positioned in the bath 3 such that by filling the bath 3 with a sufficient level, the lower part 20 of each exchange chamber 2 is immersed in the bath of liquid contained in the bath 3, the immersed portion of each exchange chamber 2 containing a volume V of liquid.
The exchange chamber 2 comprises at least one gas flow discharge opening 2b in its upper part, which discharge opening 2b is positioned above the liquid volume V contained in the exchange chamber 2.
In order to supply new liquid to the bath 3, the apparatus 1A further comprises a supply device 4 for supplying new liquid, which supply device comprises a supply pipe 40 leading to the bath 3 above the liquid bath, which supply pipe is provided with a supply valve 41 for controlled supply of new liquid to the bath 3. In this embodiment, the bath 3 and the liquid supply means 4 for supplying liquid to the bath 3 form liquid supply means for supplying liquid to the exchange chamber 2.
The apparatus 1A further comprises a drain 5 comprising a drain pipe 50 whose base communicates with the interior of the basin 3 below the surface of the bath of liquid contained in the basin 3, the drain pipe being provided with a drain valve 51 for the controlled discharge of liquid out of the basin 3. In this embodiment, the basin 3 and said drainage means 5 form drainage means for discharging the liquid contained in the exchange chamber 2.
In another embodiment, not shown, the exchange chamber cannot be immersed in the bath 3 at the lower part, as described in international patent application WO2015/086979, but is closed at the lower part and the liquid supply is obtained directly through a pipe without using the bath 3.
The apparatus 1A further comprises pneumatic means 6 able, in operation, to generate an inlet flow F coming from outside the exchange chamber 2, so that the inlet flow F is introduced into the liquid volume V contained in the exchange chamber 2 below the surface S of said liquid volume, and an outlet flow F', treated by direct contact with said liquid volume, rises inside the exchange chamber 2, being discharged outside said exchange chamber 2 through the discharge opening 2b of the exchange chamber 2.
In the particular embodiment of fig. 1, the pneumatic means 6 are able to generate, in operation, an incoming airflow F from outside the exchange chamber 2 by suction. In a further variant, the pneumatic device 6 can generate the inlet air flow F by blowing in operation.
In the particular embodiment of fig. 1, the pneumatic means 6 comprise a fan 60, the inlet 60a of which is connected to the outlet 2b of the exchange chamber 2.
The fan 60 may be, for example, a centrifugal fan or any known type of gas compressor, such as an axial fan, a pump, etc.
The pneumatic means 6 also comprise injection means 61 which can introduce the incoming gas flow F into the liquid volume V contained in the exchange chamber 2 below the surface S of said volume.
In the particular embodiment of fig. 1, the injection means 61 comprise a vertical injection duct 610 positioned inside the exchange chamber 2, which comprises, at the upper part, an air inlet 610a for the entry of an air flow and, at the lower part, an air discharge 610b for the discharge of an air flow. The intake port 610a communicates with an intake duct 611 for intake of an air flow, which is positioned outside the exchange chamber 2. The intake duct includes an intake port 611a for intake of an air flow.
Depending on the application, this air inlet 611a may, for example, open to the open air, or may be connected to any equipment or any facility in which the air flow F is captured.
When the fan 60 is operated, the inside of the exchange chamber 2 is depressurized. When the fan 60 is operating, the pressure in the bath 3 outside the exchange chamber 2 and above the liquid bath L is equal to the pressure P in the incoming air flow F at the inlet of the injection duct 610, since the bath 3 is closedin. The pressure PinGreater than the pressure P above the liquid volume in the exchange chamber 2out。
Pressure difference Δ P (Δ P ═ P)in-Pout) In the exchange chamber 2 (FIG. 1) is represented by a liquid level (FIG. 1/height h) liter in the exchange chamber 2High and the liquid level (figure 1/height H) drops in the tank 3 outside the exchange chamber 2.
The liquid level h and the liquid volume V in the exchange chamber 2 depend on this pressure difference ap.
When the fan 60 is operated, it draws an intake air flow F which enters the injection duct 610 of the exchange chamber 2 through the intake port 610a of the injection duct 610. This (untreated) incoming gas flow F is introduced into the non-immersed portion of the injection pipe 610, through the discharge outlet 610b of the immersed lower portion of the injection pipe 610, below the surface S of the liquid volume V contained in the immersed lower portion of the exchange chamber 2. The exhaust flow F' treated by direct contact with said volume of liquid contained in the exchange chamber 2 rises inside the exchange chamber 2 outside the injection duct 610 and is discharged outside said exchange chamber through the discharge opening 2b thereof. This exhaust air flow F' is drawn by the fan 60 and is exhausted in the form of an air flow F "(fig. 1).
Depending on the application, the air outlet 60b of the fan 60 may, for example, open to the open air, or may be connected to a duct (not shown) for conveying the air flow F "to another device or to another installation without being directly discharged to the free air.
Sensible and latent heat exchange between the gas and the liquid takes place when the temperature of the liquid volume V in the exchange chamber 2 differs from the temperature of the gas flow F before it is introduced into the liquid volume V.
Temperature T of liquid volumeliquideBelow the initial temperature T of the gas flow F before it is introduced into the liquid volumeinitialeWhile the gas flow F' is cooled. More specifically, the temperature of the outgoing air flow F' has been reduced, and may for example be substantially equal to the temperature T of the liquid volumeliquideAnd (5) the consistency is achieved. This at the same time results in the output air flow F 'from the device 1A being dehumidified compared to the incoming air flow F, the absolute humidity (weight of water per unit volume of air) in the output air flow F' being lower than that of the incoming air flow F.
On the contrary, when the temperature T of the liquid volumeliquideAbove the initial temperature TinitialeThe output air flow F 'is heated, the temperature of the output air flow F' can be, for example, substantially equal to the temperature T of the liquid volumeliquideAnd (5) the consistency is achieved. This at the same time results in the output air flow F 'from the device 1A being humidified compared to the incoming air flow F, the absolute humidity (weight of water per unit volume of air) in the output air flow F' being higher than that of the incoming air flow F.
In some applications, the apparatus 1A may be used to filter or purify an incoming gas stream F by passing the incoming gas stream through a volume of liquid V. The apparatus 1A may also be used to condense or evaporate one or more compounds carried in the incoming gas stream F by passing the incoming gas stream F through a volume of liquid V. Depending on the application, the temperature of the liquid volume may be higher or lower than the temperature of the incoming gas stream F, or substantially equal to the temperature of the incoming gas stream F. When the temperature of the liquid volume is substantially equal to the temperature of the incoming gas flow F, an outgoing gas flow F' is generated at the outlet of the device 1A, neither heated nor cooled, having substantially the same temperature as the incoming gas flow F.
In the embodiment of fig. 1, fan 60 may generate airflows F and F' by suction. In another variant, the fan 60 can be connected to the air inlet 610a of the injection duct 610 so as to generate these air flows F and F' by blowing and not by suction.
With reference to fig. 1, the apparatus 1A comprises a first operating parameter X for measurement in the output airflow FoutIn this case above the volume of the liquid L in the exchange chamber 2.
The apparatus 1A further comprises a second operating parameter X for measurement in the incoming gas flow FinIn this case in the inlet duct 611 and close to the inlet 610a of the injection pipe 610.
The apparatus 1A also comprises electronic regulation means 9 able to automatically control the liquid supply means 4 and the liquid discharge means 5 during operation of the apparatus, so as to normally depend at least on the first operating parameter XoutFor example at least one set value XCThe height h (or in other words the level) of the liquid in the exchange chamber 2 is automatically adjusted.
More specifically, the electronic regulation means 9 are able to automatically control the liquid supply means 4 and the liquid discharge means 5 so as to also be dependent on the second operating parameter XinPreferably according to the difference Xout-Xin(absolute value orAlgebraic value) automatically adjusts the height h of the liquid in the exchange chamber 2.
For example, when XoutGreater than XCWhen, or when the difference X isout-Xin(absolute value) greater than XCThe electronic regulating device 9 automatically controls the liquid supply device 4 so as to increase the level h of the liquid in the exchange chamber 2. On the contrary, when XoutLess than XCWhen, or when the difference X isout-Xin(absolute value) less than XCThe electronic regulating means 9 automatically controls the draining means 5 so as to lower the level h of the liquid in the exchange chamber 2.
In many applications, the pressure P in the gas flow F at the inlet of the exchange chamber 2inAnd/or the pressure P in the gas flow F' at the outlet of the exchange chamber 2outUncontrolled changes can occur because of the absence of the adjusting means 9, which automatically result in a change in the liquid level h in the exchange chamber 2 to compensate for the pressure change. This variation in the liquid level causes a variation in the operating point of the apparatus, the exchange between the liquid volume and the gas flow in the exchange chamber being detrimentally altered uncontrollably. Also in some applications, even the pressure P in the gas flow at the inlet of the exchange chamber 2inAnd the pressure P of the gas flow at the outlet of the exchange chamber 2outAlways constant, but it may prove useful to be able to vary the operating point of the plant and therefore the level of exchange between the gas flow and the liquid volume, for example in order to make it optimal.
Thus, in the first embodiment, the first operating parameter XoutMay be the pressure P in the treated gas flow Fout(Xout=Pout) And a second operating parameter XinMay be the pressure P in the incoming gas flow Fin(Xin=Pin) The first and second measuring devices 7 and 8 are, for example, pitot probes.
By acting on the pressure PoutMore specifically according to the pressure difference Pout-PinAutomatically adjusting the height h of the liquid in the exchange chamber 2, ensuring that the quality of the exchange between the operating point of the installation, and therefore the incoming gas flow F, and the liquid in the chamber 2 is always correct, independent of the pressure PinAnd PoutInfluence.
In the second embodimentIn (1), a first operating parameter XoutMay be the temperature T measured in the treated gas flow Fout(Xout=Tout) And a second operating parameter XinMay be the temperature T measured in the incoming gas flow Fin(Xin=Tin) In this case the first and second measuring means 7 and 8 are temperature probes.
In a third embodiment, the first operating parameter XoutMay be the concentration C of the (chemical or particulate) component measured in the treated gas stream Fout(Xout=Cout) And a second operating parameter XinMay be the concentration C of the component measured in the incoming gas stream Fin(Xin=Cin) In this case the first and second measuring means 7 and 8 are detectors of the component.
By way of non-limiting and non-exhaustive example, in the treatment of a gas stream consisting of combustion fumes, in particular industrial fumes, the chemical component may be Nitrogen Oxides (NO)x) The liquid volume is used in the exchange chamber to capture these nitrogen oxides. In other applications, the compounds captured in the liquid may be selected from the following table, without limitation and without exhaustive: COV (volatile organic Compounds), SOxHAP (polycyclic aromatic hydrocarbons), CO2、NH3And chloramine.
Another apparatus 1B of the invention is shown in fig. 2, which differs from the apparatus 1A of fig. 1 in that:
a first operating parameter (X) for measurement in the liquid contained in the exchange chamber 2out) Is measured by the first measuring device 7',
a second operating parameter (X) for measurement in the liquid contained in the tank 3 outside the exchange chamber 2in) And a second measuring device 8'.
In another variant, the first operating parameter (X) can be measured in the liquid coming from the exchange chamber 2out)。
In another variant, said second operating parameter (X)in) Can be measured in the new liquid before it is introduced into the bath 3 and thus into the exchange chamber 2,for example measured in the supply pipe 40 upstream or downstream of the valve 41.
Within the framework of the invention, the first operating parameter (X)out) May be the concentration of the Compound (CL) in the liquid contained in the exchange chamber 2out) And the second operating parameter may be the concentration of the compound in the liquid outside the exchange chamber 2 (CL)in)。
Within the framework of the invention, the first operating parameter (X)out) May be the pH value (pH) of the liquid contained in the exchange chamber 2out) And the second operating parameter may be the pH value (pH) of the liquid outside the exchange chamber 2in) In this case, the first and second measuring devices 7 'and 8' are pH measuring probes.
In a modified variant of the invention, in addition to adjusting the liquid level h in the exchange chamber 2, the electronic adjusting means 9 can also be designed, for example programmed, to automatically control the valves 41 and 51 so as to be able to continuously or intermittently update the liquid in the exchange chamber 2, preferably during operation of the apparatus, on the basis of parameters measured in the liquid in the exchange chamber 2 or in the liquid from the exchange chamber 2 and/or in a new liquid before introduction into the exchange chamber 2, such as the pH value of the liquid and/or the concentration of compounds in the liquid and/or the liquid temperature, and/or on the basis of parameters measured in the incoming gas flow F and/or parameters measured in the outgoing gas flow F', such as in particular the gas flow temperature or the concentration of components in the gas flow.