CN112232022B - Method and system for dynamically adjusting parameters and designing Chinese character patterns and layouts - Google Patents

Abstract

The invention discloses a Chinese character glyph and layout design method and system for dynamically adjusting parameters, which includes: (1) for each Chinese character, determine the corresponding relationship between the glyph image and the glyph vector outline, extract the character skeleton in the glyph image, and compare the character After skeleton pruning, a skeleton point set is constructed, and the contour nodes on the glyph outline are matched with the nearest skeleton points. The matched skeleton points are skeleton key points; (2) The construction of the vector glyph model includes the following composition information: skeleton key point set, The first offset vector of the outline node relative to the matching skeleton key point, the vertical and horizontal alignment information between the outline nodes, the closed outline information to which the outline node belongs, and the proportion of the glyph area occupying the font body frame; (3) Through visual real-time input parameters, you can Based on this vector glyph model, the adjustment of Chinese character structure and stroke characteristics and the design of the layout of Chinese character works are realized to meet user needs.

Description

Chinese character glyph and layout design method and system for dynamically adjusting parameters

Technical field

The invention belongs to the technical fields of artificial intelligence art and computer-aided design, and specifically relates to a Chinese character glyph and layout design method and system for dynamically adjusting parameters.

Background technique

Chinese character art forms such as calligraphy and seal cutting, as well as Chinese character font design works, have been widely presented on mobile phones, computers, etc., or have been digitally processed and presented on advertisements, books and other printed matter. However, the creation and modification of Chinese character art and design works in the digital environment are greatly restricted, often requiring designers to have knowledge of operating professional design software, with low adjustability and customizability. The variable font technology produced in recent years can meet the needs of end users for dynamic and adjustable fonts, but it requires a very high engineering level in font design, so it is difficult to popularize Chinese fonts. The methods of modifying and customizing Chinese character arts such as calligraphy and seal cutting and Chinese character font design works are still very immature.

The patent application with publication number CN 107818544A discloses a character scaling method, and the patent application with publication number CN105513006A discloses a TrueType font outline thickness adjustment method and device. Both of these technical contents use the extracted skeleton information to achieve glyph deformation methods. However, each method is a change in a specific way, is not universally applicable, and cannot meet application needs.

Contents of the invention

The purpose of the present invention is to provide a Chinese character glyph and layout design method and system that dynamically adjusts parameters, represents Chinese characters through a constructed vector glyph model, and facilitates users to design Chinese character glyphs and layouts.

In order to achieve the above-mentioned object of the invention, the present invention provides the following technical solutions:

A Chinese character glyph and layout design method that dynamically adjusts parameters, including the following steps:

(1) Preprocess Chinese character glyphs, including glyph vector outlines stored in vector form and glyph images stored as images, so that each Chinese character glyph has a matching image and vector representation, and extract the character skeleton in the glyph image , build a skeleton point set after pruning the character skeleton, match the contour nodes on the glyph outline with the nearest skeleton point, and the matched skeleton point is the skeleton key point;

(2) Construct a vector glyph model. The vector glyph model includes the following composition information: skeleton key point set, the first offset vector of the contour node relative to the matching skeleton key point, vertical and horizontal alignment information between contour nodes, and closed contour information to which the contour node belongs. , the ratio of the font area to the font body frame;

(3) Glyph and layout design, including changing the structure of Chinese characters through parameter transformation of skeleton key points based on the vector glyph model; performing parameter transformation on the first offset vector and outline point arrangement and coordinates to change the stroke characteristics and outline of Chinese characters The vertical and horizontal alignment relationship of nodes and the closed outline information of the outline nodes will assist the restoration of the glyph model to vector glyphs to maintain the original relationship between the outlines of the glyphs and the alignment relationship of the outline nodes; design the layout of Chinese character works based on the proportion of the glyph area occupying the font body frame.

Preferably, when the glyph vector outline is represented by a second-order or third-order Bessel spline, the preprocessing process of Chinese characters also includes: determining the association between the handle point and the nearest outline node;

The vector glyph model also includes the following component information: the association between the handle point and the outline node, the second offset vector of the handle point relative to the associated outline node, the vertical and horizontal alignment information between the handle points, and the vertical and horizontal alignment information between the handle point and the outline node;

The glyph and layout design process also includes: changing the structure of Chinese characters through parameter transformation of the second offset vector, and maintaining the original handle points and outline nodes of the glyph through the vertical and horizontal alignment information of the handle points and the vertical and horizontal alignment relationships between the handle points and outline nodes. Alignment relationship, parameter transformation is performed on the second offset vector and outline point arrangement and coordinates to change the stroke characteristics of Chinese characters.

A Chinese character glyph and layout design system that dynamically and interactively adjusts parameters, including:

A glyph model reading unit, used to read the vector glyph model generated by the above dynamically adjusted parameter Chinese character glyph and layout design method;

The glyph and layout design unit is used to receive real-time input parameters from the user, and use the above-mentioned Chinese character glyph and layout design method of dynamically adjusting parameters based on the parameters to change the structure of Chinese characters, change the characteristics of Chinese character strokes, and design the layout of Chinese characters;

The visualization unit is used to visualize the design results of the glyph and layout design unit in real time;

Save export unit: Save or export the design results of glyph and layout design units.

Compared with the prior art, the beneficial effects of the present invention are:

The invention provides a Chinese character glyph and layout design method and system that dynamically adjusts parameters by abstracting Chinese characters into a vector glyph model for representation. Since the vector glyph model contains comprehensive Chinese character glyph information, through visual real-time input parameters, Based on this vector glyph model, the adjustment of Chinese character structure and stroke characteristics and the design of the layout of Chinese character works can be realized to meet user needs.

Description of drawings

In order to explain the embodiments of the present invention or the technical solutions in the prior art more clearly, the drawings needed to be used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings in the following description are only These are some embodiments of the present invention. For those of ordinary skill in the art, other drawings can be obtained based on these drawings without exerting creative efforts.

Figure 1 is a flow chart of a Chinese character glyph and layout design method for dynamically adjusting parameters provided by the embodiment:

Figure 2 is a schematic diagram for explaining the terminology of the Chinese character "东" provided by the embodiment;

Figure 3(a) and Figure 3(b) are schematic diagrams before and after the change of palace in Chinese characters provided by the embodiment;

Figure 4 is a schematic diagram of changing the east center of gravity of Chinese characters provided by the embodiment;

Figure 5(a), Figure 5(b) and Figure 5(c) are schematic diagrams of the layout of Chinese character works designed with different layout parameters provided by the embodiment;

Figure 6 is a schematic structural diagram of a Chinese character glyph and layout design system for dynamically interactive parameter adjustment provided by the embodiment.

Detailed ways

In order to make the purpose, technical solutions and advantages of the present invention more clear, the present invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention and do not limit the scope of the present invention.

Terminology:

Hit-or-miss: In image morphology, two structuring elements are used to detect pixels that can be completely covered by the first structuring element and not covered by the second structuring element. They are often used in applications such as pattern detection.

Zhonggong: refers to the degree to which the Chinese character structure tightens or relaxes toward the center.

Center of gravity: refers to the height of the visual center point of the font.

Handle points: (Bezier handles, off-points) refer to the points on the Bezier curve that are not on the curve and control the bending of the curve.

Figure 2 is a schematic diagram for explaining the terminology of the Chinese character "东" provided by the embodiment. As shown in Figure 2, the thin lines are the glyph outlines, the thick lines are the skeleton lines, the boxes with the thin lines are the outline nodes, the triangles with the thin lines are the starting nodes of the outline, the asterisks on the thick lines are the key points of the skeleton, and the ones outside the thin lines are the key points of the skeleton. Circles are handle points.

Figure 1 is a flow chart of a Chinese character glyph and layout design method for dynamically adjusting parameters provided by the embodiment. As shown in Figure 1, the Chinese character glyph and layout design method includes the following steps:

Step 1: Preprocess Chinese character glyphs

In this embodiment, Chinese characters can come from a font library. For Chinese characters from a font library, the glyph vector outline of the Chinese character is directly read, and then the glyph vector outline is rasterized to convert the glyph outline into a glyph image, and the glyph image and glyph vector outline are determined. Correspondence; Chinese characters can also come from glyph images such as calligraphy and seal cutting. For this type, the glyph image of the Chinese character is directly read and the glyph image is converted into a vector outline. At the same time, the corresponding relationship between the glyph image and the glyph vector outline is determined, that is, the glyph image. The conversion relationship between coordinates and glyph vector coordinates. This conversion relationship is retained to ensure that the coordinate relationships between the two can be converted into each other. Among them, the vector outline can be represented by a second-order or third-order Bessel spline, or by a polygon.

On the basis of obtaining the glyph image, it is necessary to extract the character skeleton in the glyph image, prune the character skeleton and construct a skeleton point set, match the contour nodes on the glyph outline with the nearest skeleton point, and the matched skeleton point is the skeleton key point.

In this embodiment, the image morphology thinning algorithm and the central axis algorithm can be used to extract the character skeleton from the rasterized glyph image. Since the extracted character skeleton will contain some messy information, the character skeleton also needs to be pruned to make the character skeleton clean. Specifically, the character skeleton can be pruned in the following ways:

Method 1: Based on the distance from each point on the plane to the outline edge obtained by the central axis transformation, prune the skeleton points on the skeleton that are closer to the edge of the glyph outline; or,

Method 2: Use the hit-or-miss method to find the skeleton intersection points and erode the skeleton intersection points. At this time, the character skeleton will become a discrete line segment without intersection points. Find line segments that are too short and eliminate them to achieve glyph skeleton pruning.

After character skeleton pruning, the points on the character skeleton are constructed into a skeleton point set. Based on the skeleton point set, the contour nodes on the glyph outline are matched with the nearest skeleton points, and the matched skeleton points are the skeleton key points. When the glyph vector outline is represented by a second-order or third-order Bessel spline, it is also necessary to determine the association between the handle point and the nearest outline node, that is, to determine which outline node each handle point is connected to. Used for subsequent adjustment of pen shape characteristics.

Step 2: Build the vector glyph model

Construct a vector glyph model based on the result information of Chinese character preprocessing in step 1. The vector glyph model may specifically include: a skeleton key point set, the first offset vector of the outline node relative to the matching skeleton key point, the vertical and horizontal lines between the outline nodes Alignment information, closed outline information of the outline node, and the proportion of the glyph area occupying the font body frame. When the glyph vector outline is represented by a Bessel spline, the vector glyph model also includes the relationship between the handle points and the outline nodes. The handle points are relative to each other. The second offset vector associated with the contour node, vertical and horizontal alignment information between handle points, and vertical and horizontal alignment information between handle points and contour nodes.

Among them, the skeleton key points in the skeleton key point set represent the one-to-one correspondence between the selected key points and the contour nodes. During specific implementation, the skeleton key point set can be expressed as a sequence of two-dimensional point coordinates and stored in an array list with a length of 2. express.

The first offset vector of the outline node relative to the matching skeleton key point is represented as a sequence of two-dimensional vectors, and is specifically implemented as an array list with a length of 2; the length of the above skeleton key point list is the same as the length of the first offset vector list.

The relationship between handle points and contour nodes is specifically implemented as a list. The list records the subscripts of the contour nodes associated with the handle points in the order of the handle points, so that the relationship between the handle points and the contour nodes can be expressed simply and clearly.

The second offset vector of the handle point relative to the associated contour node is represented as a sequence of two-dimensional vectors, which is specifically implemented as an array list with a length of 2.

The vertical and horizontal alignment information between contour nodes, the vertical and horizontal alignment information between handle points, and the vertical and horizontal alignment information between handle points and contour nodes are referred to as the vertical and horizontal alignment information of contour nodes and handle points, that is, which nodes (nodes include contour nodes and handle points) have the same abscissa or ordinate; the specific implementation is two lists, respectively recording the numbers of nodes that need to be aligned with the abscissa or ordinate. Each list contains a point set sequence implemented with a string list, and the string specifies The subscripts of contour nodes and handle points are specified.

The closed contour information to which the contour node belongs is specifically implemented as a list, and the list node records the subscripts of the closed contour to which the contour node belongs in order.

The ratio of the font area to the font body frame is a value in the range of (0,1).

The above representation method of vector glyph model is easier to manipulate than the original outline representation, which means that the structure operation of Chinese characters can be more flexible, and the structure and stroke shape of Chinese characters can be operated separately to a certain extent. It is relatively easy to calculate, can achieve real-time calculation, and can achieve multiple deformations at the same time.

The above vector glyph model construction process is not only for the entire Chinese character. When the input Chinese character glyph is separated by strokes, the above vector glyph model construction method can also be used to store the vector representation of the strokes.

Step 3: Font and layout design

In this embodiment, the font and layout design are based on the above-mentioned vector font model. The specific process includes: based on the vector glyph model, changing the structure of Chinese characters by performing parameter transformation on the key points of the skeleton; determining the strokes by analyzing the vertical and horizontal alignment information between the outline nodes and the closed outline information to which the outline nodes belong, and adjusting the outline nodes and the first offset of the strokes. Shift vectors are used for parameter transformation to change the stroke characteristics of Chinese characters; the layout of Chinese character works is designed based on the proportion of the glyph area occupying the character body frame.

In one implementation, when changing the structure of Chinese characters, the stroke characteristics are kept unchanged and the representation method of the vector glyph model is fully utilized. The specific process is: linearly adjusting the skeleton key points and the second offset vector by setting the adjustment scale parameters. Transformation realizes the adjustment of the size and width of Chinese characters; the adjustment of the palace and center of gravity of Chinese characters is realized by applying a change function to the key points of the skeleton.

For Chinese characters whose horizontal and vertical coordinates range is [0,n], when adjusting the size and width of Chinese characters, set the adjustment ratio parameter a. Based on the adjustment ratio parameter a, the coordinates of the new skeleton key points are obtained as a(R-(n /2,n/2))+(n/2,n/2), the new second offset vector of the handle point relative to the associated contour node is aL ₁ , where the adjustment scale parameter a includes the height adjustment scale parameter a ₁ and Width adjustment scale parameter a ₂ , R is the original skeleton key point coordinates, and L ₁ is the original second offset vector of the handle point relative to the associated outline node.

When the height adjustment ratio parameter a1 and the width adjustment ratio parameter a2 are equal, the size of Chinese characters can be adjusted. When the height adjustment ratio parameter a1 and the width adjustment ratio parameter a2 are not equal, the adjustment of different widths and heights of Chinese characters can be realized. .

When adjusting the Chinese character palace, select a function defined on the interval [-1,1], and each continuous interval on the interval [0,1] is not convex or concave as the change function, and set the change function Adjust the parameters, take the original skeleton key points as input, use the change function that determines the adjustment parameters to calculate the original skeleton key points, obtain new skeleton key points, and obtain the Chinese characters adjusted by the middle palace based on the new skeleton key points.

For example, the coordinates of any skeleton key point in the skeleton key point set from [0, n] to [-1, 1] are (x, y). Contraction/expansion of the horizontal center palace can change the abscissa coordinate according to the following function Make the following transformation: (sign(x)|x| ^2-c ,sign(y)|y| ^2-d ), where c and d are adjustment parameters in the range of (0,2), respectively controlling the horizontal and Vertical uterus; when the adjustment parameter value is >1, the uterus expands; when the adjustment parameter value is <1, the uterus contracts. Taking seal cutting as an example of "replacing the old with the new", the schematic diagrams of the Zhonggong before and after the change are shown in Figure 3(a) and Figure 3(b).

When adjusting the center of gravity of Chinese characters, select a concave or convex function defined in the interval [0,1] as the change function, set the adjustment parameters of the change function, take the original skeleton key points as input, and use the change function that determines the adjustment parameters to modify the original Skeleton key points are calculated to obtain new skeleton key points, and Chinese characters with adjusted center of gravity are obtained based on the new skeleton key points.

For example, assume that the coordinates of any skeleton key point in the skeleton key point set from [0,1000] to [0,1] are (x, y). To increase/lower the center of gravity, the vertical coordinate can be changed according to the following change function: Transformation: (1-(1-y) ^e ) ^1-e , where e is an adjustment parameter that controls the center of gravity; when the adjustment parameter value > 1, the center of gravity increases, and when the adjustment parameter value < 1, the center of gravity decreases. Taking the bold Chinese character "东" as an example, the schematic diagram of changing the center of gravity is shown in Figure 4.

In this embodiment, the Chinese character stroke characteristics include stroke thickness, stroke thickness contrast, stroke and stroke shape, softness and hardness of stippling and stroke, etc.

In another embodiment, when changing the stroke thickness and stroke thickness contrast, the offset adjustment ratio b is set, and the new first offset vector of the outline node relative to the matching skeleton key point is bL ₂ , where L ₂ is The original first offset vector of the silhouette node relative to the matching skeleton keypoint. Assume that the coordinates of the first offset vector are (Δx, Δy). Changes in thickness and contrast can be achieved by simply multiplying the first offset vector by the offset adjustment ratio b. For example, thickening in the horizontal direction can be multiplied by Δx. Multiply the adjustment ratio b, and/or vertical bolding can multiply the adjustment ratio b on Δy.

When changing the shape of the stroke, stippling, and softness of the stroke, traverse the outline nodes and handle points, match the pen shape characteristics that match the current traversal point and several adjacent points, and record the starting outline corresponding to the matched pen shape characteristics. Node, the pen shape characteristics are modified by changing the coordinate value or adding or subtracting point operations on several point sequences adjacent to the current traversed point. The pen shape characteristics adopt the outline node and handle point sorting mode, three-point angle, two-point distance or Curve normal description.

Among them, the sorting mode of outline nodes and handle points indicates the specific arrangement of nodes and handle points in the outline surrounding direction. For example, on the glyph outline, find all children that match the (node, handle point, handle point, node, node) pattern. Sequence (part of the outline), the three-point angle is the angle size of the specific three nodes or handle points in the found subsequence. The distance between two points is the distance between two specific nodes or handle points in the found subsequence. The normal direction of the curve is the direction vector on the found part of the contour where a certain point (node or point on the contour curve) is perpendicular to the tangent line along the contour and points to the outside of the contour.

In another implementation, when designing the layout of a Chinese character work based on the proportion of the font area occupying the character body frame, in the Chinese character work, the area proportion occupied by each Chinese character is positively correlated with the proportion of the font area occupying the character body frame.

According to the extension range of the glyph strokes and the proportion of the glyph area occupying the font body frame, the position size that each glyph should occupy in the Chinese character work is comprehensively considered. Taking the layout of seal cutting as an example, in order to achieve the most balanced text layout on the printing surface, the proportion information of the glyph area to the font body frame can be used to calculate the glyph bounding box, so that the strokes of the glyphs filled in the bounding box are distributed as evenly as possible on the printing surface. superior. This layout state can be integrated with the geometric mean layout that directly divides the printing surface into equal parts using the interpolation method, thereby achieving the goal of parametric control of the layout. Taking the seal cutting "One Heart and One Mind" as an example, the schematic diagrams of the layout of Chinese character works designed with different layout parameters are shown in Figure 5(a), Figure 5(b) and Figure 5(c).

The embodiment also provides a Chinese character glyph and layout design system that dynamically and interactively adjusts parameters, including:

The glyph model reading unit 601 is used to read the vector glyph model generated by the Chinese character glyph and layout design method of dynamically adjusting parameters;

The font and layout design unit 602 is used to receive parameters input by the user in real time. The parameters include the adjustment ratio parameter a, the adjustment parameter for adjusting the middle palace and the center of gravity, and the offset adjustment ratio b. Based on this parameter, the Chinese characters using the above dynamic adjustment parameters are Use font and layout design methods to change the structure of Chinese characters, change the characteristics of Chinese character strokes and design the layout of Chinese characters;

The visualization unit 603 is used to visualize the design results of the font and layout design unit in real time;

Save and export unit 604: save or export the design results of the font and layout design unit. The design results include the adjusted fonts and/or images, vectors or fonts corresponding to the entire work.

In the entire Chinese character glyph and layout design system that dynamically and interactively adjusts parameters, first read the glyph image and convert it into a vector, or directly read the font vector outline, and convert it into a vector glyph model based on the vector outline and preprocessing information. The vector The glyph model is stored in the Chinese character glyph and layout design system. When applying, the user can visually adjust the parameters. The system changes the glyph and layout based on the adjusted parameters, and then exports the adjusted work image or vector image.

The above-mentioned Chinese character glyph and layout design method and system for dynamically adjusting parameters is represented by abstracting Chinese characters into a vector glyph model. Since the vector glyph model contains comprehensive Chinese character glyph information, through visual real-time input parameters, it can be based on the The vector glyph model realizes the adjustment of Chinese character structure and stroke characteristics and the design of the layout of Chinese character works to meet user needs.

The above-described specific embodiments describe in detail the technical solutions and beneficial effects of the present invention. It should be understood that the above are only the most preferred embodiments of the present invention and are not intended to limit the present invention. Any modifications, additions, equivalent substitutions, etc. made within the scope of the invention shall be included in the protection scope of the present invention.

Claims (10)

1. A Chinese character glyph and layout design method that dynamically adjusts parameters, which is characterized by including the following steps: (1) Preprocess Chinese character glyphs, including glyph vector outlines stored in vector form and glyph images stored as images, so that each Chinese character glyph has a matching image and vector representation, and extract the character skeleton in the glyph image , build a skeleton point set after pruning the character skeleton, match the contour nodes on the glyph outline with the nearest skeleton point, and the matched skeleton point is the skeleton key point; (2) Construct a vector glyph model. The vector glyph model includes the following composition information: skeleton key point set, the first offset vector of the contour node relative to the matching skeleton key point, vertical and horizontal alignment information between contour nodes, and closed contour information to which the contour node belongs. , the ratio of the font area to the font body frame; (3) Glyph and layout design, including changing the structure of Chinese characters through parameter transformation of skeleton key points based on the vector glyph model; performing parameter transformation on the first offset vector and outline point arrangement and coordinates to change the stroke characteristics and outline of Chinese characters The vertical and horizontal alignment relationship of nodes and the closed outline information of the outline nodes will assist the restoration of the glyph model to vector glyphs to maintain the original relationship between the outlines of the glyphs and the alignment relationship of the outline nodes; design the layout of Chinese character works based on the proportion of the glyph area occupying the font body frame. 2. The Chinese character glyph and layout design method of dynamically adjusting parameters according to claim 1, characterized in that when the glyph vector outline is represented by a second-order or third-order Bessel spline, the preprocessing process of Chinese characters also includes: Determine the relationship between the handle point and the nearest contour node; The vector glyph model also includes the following component information: the association between the handle point and the outline node, the second offset vector of the handle point relative to the associated outline node, the vertical and horizontal alignment information between the handle points, and the vertical and horizontal alignment information between the handle point and the outline node; The glyph and layout design process also includes: changing the structure of Chinese characters through parameter transformation of the second offset vector, and maintaining the original handle points and outline nodes of the glyph through the vertical and horizontal alignment information of the handle points and the vertical and horizontal alignment relationships between the handle points and outline nodes. Alignment relationship, parameter transformation is performed on the second offset vector and outline point arrangement and coordinates to change the stroke characteristics of Chinese characters. 3. The Chinese character glyph and layout design method for dynamically adjusting parameters as claimed in claim 2, characterized in that the character skeleton is extracted from the rasterized glyph image using a thinning algorithm of image morphology and a central axis algorithm. 4. The Chinese character glyph and layout design method for dynamically adjusting parameters as claimed in claim 2, characterized in that the character skeleton is pruned in the following manner: Method 1: Based on the distance from each point on the plane to the outline edge obtained by the central axis transformation, prune the skeleton points on the skeleton that are closer to the edge of the glyph outline; or, Method 2: Use the hit-or-miss method to find the skeleton intersections and erode the skeleton intersections. At this time, the character skeleton will become a discrete line segment without intersections. Find the line segments that are too short and eliminate them to achieve glyph skeleton pruning. 5. The Chinese character glyph and layout design method of dynamically adjusting parameters as claimed in claim 2, characterized in that when changing the structure of Chinese characters, linear transformation is performed on the key points of the skeleton and the second offset vector by setting the adjustment proportion parameters to realize the alignment. Adjustment of Chinese character size and width; Adjustment of the palace and center of gravity of Chinese characters is achieved by applying a change function to the key points of the skeleton. 6. The Chinese character glyph and layout design method for dynamically adjusting parameters as claimed in claim 5, characterized in that, for Chinese characters whose horizontal and vertical coordinate ranges are [0, n], when adjusting the size and width of Chinese characters, the setting adjustment Scale parameter a. According to the adjustment of scale parameter a, the coordinates of the key points of the new skeleton are a(R-(n/2,n/2))+(n/2,n/2). The handle points are relative to the associated contour nodes. The new second offset vector is aL ₁ , where the adjustment scale parameter a includes the height adjustment scale parameter a ₁ and the width adjustment scale parameter a ₂ , R is the original skeleton key point coordinates, and L ₁ is the original coordinate of the handle point relative to the associated contour node. Second offset vector. 7. The Chinese character glyph and layout design method for dynamically adjusting parameters as claimed in claim 5, characterized in that when adjusting the Chinese character palace, the selection is defined in the interval [-1,1], and in the interval [0,1 The function that is neither convex nor concave for each continuous interval on ] is a change function. Set the adjustment parameters of the change function, take the original skeleton key points as input, and use the change function that determines the adjustment parameters to calculate the original skeleton key points, and we get The new skeleton details are used to obtain the Chinese characters adjusted by the middle palace based on the new skeleton details; When adjusting the center of gravity of Chinese characters, select a concave or convex function defined in the interval [0,1] as the change function, set the adjustment parameters of the change function, take the original skeleton key points as input, and use the change function that determines the adjustment parameters to modify the original Skeleton key points are calculated to obtain new skeleton key points, and Chinese characters with adjusted center of gravity are obtained based on the new skeleton key points. 8. The Chinese character glyph and layout design method for dynamically adjusting parameters as claimed in claim 2, wherein the Chinese character stroke characteristics include stroke thickness, stroke thickness contrast, stroke and stroke shape, softness and hardness of stippling and stroke. ; When changing the stroke thickness and stroke thickness contrast, set the offset adjustment ratio b, and the new first offset vector of the outline node relative to the matching skeleton key point is bL ₂ , where L ₂ is the outline node relative to the matching skeleton key point The original first offset vector of the point; When changing the shape of the stroke, stippling, and softness of the stroke, traverse the outline nodes and handle points, match the pen shape characteristics that match the current traversal point and several adjacent points, and record the starting outline corresponding to the matched pen shape characteristics. Node, the pen shape characteristics are modified by changing the coordinate value or adding or subtracting point operations on several point sequences adjacent to the current traversed point. The pen shape characteristics adopt the outline node and handle point sorting mode, three-point angle, two-point distance or Curve normal description. 9. The Chinese character glyph and layout design method for dynamically adjusting parameters as claimed in claim 2, characterized in that when designing the layout of a Chinese character work based on the proportion of the glyph area occupying the character body frame, in the Chinese character work, the area occupied by each Chinese character The proportion is positively related to the proportion of the font area occupying the font body frame. 10. A Chinese character glyph and layout design system that dynamically and interactively adjusts parameters, which is characterized by including: A glyph model reading unit, used to read the vector glyph model generated by the Chinese character glyph and layout design method of dynamically adjusting parameters according to any one of claims 1 to 9; The font and layout design unit is used to receive real-time input parameters from the user, and use the Chinese character font and layout design method of dynamically adjusting parameters according to any one of claims 1 to 9 to achieve changing the structure of Chinese characters and changing the stroke shape of Chinese characters. Features and design Chinese character layout; The visualization unit is used to visualize the design results of the glyph and layout design unit in real time; Save export unit: Save or export the design results of glyph and layout design units.