JPH11337724A - Method for manufacturing color filter panel and method for manufacturing liquid crystal display device - Google Patents

Abstract

(57) [Problem] To provide a method of manufacturing a color filter panel or a color filter panel capable of shortening the manufacturing time of a liquid crystal display device. A method of manufacturing a color filter panel formed by arranging a plurality of colored resist layers on a transparent substrate, the method including: a post-baking step after forming a resist pattern for each colored resist layer;
A method for producing a color filter panel, which is performed under conditions that do not cause a failure in the development performed later, and that after all the patterns of the colored resist layers are formed, all the resist layers are sufficiently cured at once. A method of manufacturing a liquid crystal display device using the same.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a color filter panel, particularly a color filter panel for a liquid crystal panel. The present invention also relates to a method for manufacturing a liquid crystal display device.

[0002]

2. Description of the Related Art The structure of a color filter panel used for a liquid crystal panel or the like is generally as shown in FIG. That is, the color filter panel generally has a red colored resist layer 13, a green colored resist layer 14, and a blue colored resist layer 15 provided on a glass substrate 11. If necessary, a black matrix 12 formed of a black colored resist layer may be provided.

FIG. 2 shows a flow of a conventional general method of manufacturing a color filter panel having such a configuration. This flow includes a substrate cleaning step (a), a substrate drying step (b), a resist coating step (c), a pre-bake step (d), an exposure step (e), a development step (f),
A post-bake step (g) is performed, and this series of processing is performed for each colored resist layer.

[0004] This flow is described as follows. First, in the substrate cleaning step (a), a cleaning process for removing foreign substances and the like attached to the substrate is performed, and then in the substrate drying step (b), moisture remaining on the cleaned substrate is dried.
As a drying means, a method of drying residual moisture by applying heat to a substrate by an IR heater, a hot plate or the like is generally used. Next, in a resist coating step (C), a colored resist is used. Is applied, the colored resist layer is heated in the pre-bake step (d) to volatilize the solvent component contained in the resist layer.
Thereafter, in the exposure step (e), a baking process of the formation pattern of the colored resist layer is performed, and then, in a development step (f), the formation pattern is developed. Finally, in a post-baking step (g), the photosensitive material in the patterned colored resist layer is removed by heating, and the resist layer is further cured. As a result, in the developing step (f), which is performed during the formation process of the subsequently formed colored resist layer of another color, the colored resist layer is brought into a state where defects such as peeling of the resist layer do not occur. .

Generally, as a post-baking step (g) processing means, a colored oven layer is cured by performing a baking process for about one hour using a clean oven or the like.

Thereafter, a similar series of manufacturing steps are repeated for the formation of the remaining colored resist layer, thereby forming a color filter panel.

[0007]

In the conventional manufacturing method as described above, a series of processing steps from a substrate cleaning step to a post-baking step are required for each formation of each colored resist layer, and the time required for the manufacturing is increased. There was a problem that becomes longer.

[0008]

Means for Solving the Problems [Summary of the Invention] <Summary> The method of manufacturing a color filter panel of the present invention is as follows.
A method for producing a color filter panel formed by arranging a plurality of colored resist layers on a transparent substrate, for each colored resist layer, a resist layer coating step of applying a photosensitive resist composition on the substrate, In a pre-bake step of volatilizing a solvent component contained in the resist layer, an exposure step of baking a pattern, a development step of developing a baked pattern, and a development step performed later, a provisional curing step of curing the applied resist layer to a level that does not cause defects. Repeating the post-baking step, and performing a batch post-baking step to sufficiently cure all the applied resist layers after the final temporary post-baking step or instead of the final temporary post-baking step. It is.

Further, a method of manufacturing a liquid crystal display device according to the present invention comprises:
A method for manufacturing a liquid crystal display device in which liquid crystal is sealed between an array substrate having pixel electrodes disposed on a transparent substrate and a transparent counter substrate disposed opposite to the array substrate. Any one of the inner surfaces of the substrate, a color filter layer formed by disposing a plurality of colored resist layers, for each colored resist layer, a resist layer coating step of applying a photosensitive resist composition on the substrate, In a pre-bake step of volatilizing a solvent component contained in the resist layer, an exposure step of baking a pattern, a development step of developing a baked pattern, and a development step performed later, a provisional curing step of curing the applied resist layer to a level that does not cause defects. Repeat the post-bake step, after the last temporary post-bake step, or in place of the last temporary post-bake step, It is characterized in m placing by performing batch post-baking step of curing of the coated resist layer sufficiently.

<Effects> According to the method of the present invention, in the production of a color filter layer of a color filter panel or a liquid crystal display device, it is possible to reduce the time required for the post-baking step when forming a resist layer of each color. Therefore, the manufacturing time of the color filter panel can be reduced, and the throughput can be improved.

[Description of the Invention] Conventionally, a color filter panel formed by arranging a plurality of colored resist layers on a glass substrate has a (a) substrate cleaning step and (b) substrate drying Process, (c) resist coating process, (d) pre-bake process, (e) exposure process, (f)
It was manufactured by performing each of the development step and (g) the post-bake step for each colored resist layer. Here, in the conventional method, in the post-baking step, baking is generally performed at 190 to 210 ° C. for 60 to 80 minutes.
This is because, as described above, the formed resist layer is completely coated so that defects such as peeling of the resist layer do not occur during the developing step in the forming step of the colored resist layer formed in the next step. It was intended to be in a cured state.

However, when the purpose is only to prevent defects in the development step of the colored resist layer formed in the next stage, it is understood that it is not necessary to completely cure the resist layer unlike the conventional post-baking step. Was. That is,
Compared with the conventional post-baking process, the baking at a remarkably low temperature and in a short time makes it possible to prevent defects in the subsequent developing process.

A method for manufacturing a color filter panel of the present invention incorporating such a low-temperature and short-time baking step (hereinafter referred to as a temporary post-baking step) is as shown in FIG. That is, the method for producing a color filter panel of the present invention is formed by arranging a plurality of colored resist layers on a transparent substrate, and for each colored resist layer, a resist layer coating step, a pre-baking step, an exposure step, The developing step and the temporary post-baking step are repeated, and then, or instead of the final temporary post-baking step, a batch post-baking step of sufficiently curing all the applied resist layers is performed. Here, the colored resist layer is, for example, black, red, green,
And blue color resist layers.

The substrate on which the resist layer is applied may be any substrate as long as it is transparent and will not be denatured or deformed by heat treatment or the like in the color filter manufacturing process. Generally, a transparent oxide dielectric, such as glass or quartz, is used.
Of these, it is preferable to use glass from the viewpoint of cost and the like.

Prior to the application of the resist layer, the substrate can be, and preferably is, washed. Although any method can be used for cleaning the substrate, brushing cleaning, ultrasonic cleaning, immersion in isopropanol, and other methods can be used. When the substrate is cleaned, the substrate is usually dried before applying the resist layer. When water is used for cleaning, for example, a drying process is performed on a hot plate at 120 ° C. for 30 minutes. Is performed.

Prior to the manufacture of the color filter panel,
If necessary, signal lines, electrodes, switching elements, transparent conductive films, and other electronic elements can be provided on the substrate. These functions as a drive circuit when the color filter panel is used for a display device. Arbitrary methods can be used for disposing these electronic elements.

The resist composition applied on the substrate may be a positive photosensitive composition or a negative photosensitive composition, and any photosensitive composition can be used. The photosensitive resin used in this composition is also optional, but for example, photosensitive polyimide, SbQ-PVA-based resin, photosensitive acrylic resin, photosensitive epoxy resin, etc. are generally used.

The method of applying the photosensitive composition to the substrate is also optional, and includes spin coating, dip coating,
Doctor blade methods, curtain coating, and other methods are used.

In order to form a colored resist layer, a dye or pigment is dissolved or dispersed in the photosensitive composition, and any of these dyes or pigments can be used. Specific examples include organic pigments, inorganic pigments, and others.

The resist layer applied on the substrate is subsequently subjected to a heat treatment in a pre-bake step to remove a solvent component contained in the resist layer. This prebaking step is generally performed at 50 to 60 ° C. for 5 to 10 minutes. At this time, the solvent in the resist layer does not need to be completely removed, but only needs to be removed to the extent that it does not interfere with the subsequent exposure.

The substrate having undergone the pre-bake step is subsequently exposed imagewise in an exposure step. The method of exposure may be a method of performing exposure through a predetermined mask pattern or a method of performing exposure by directly scanning the photosensitive layer with actinic radiation. As the actinic radiation used for exposure, any one can be used as long as it has a wavelength at which the photosensitive composition has sensitivity. Specifically, ultraviolet light, i-line, h-line, or g-line of a mercury lamp, xenon lamp light, deep UV light (for example, excimer laser light such as KrF or ArF), X-ray, synchrotron orbital radiation (SOR), Electron beams, gamma rays, ion beams, and others can be used.

The exposed substrate is subsequently developed. The development is performed by a method corresponding to the resist composition used, but is generally performed with an aqueous alkali solution. As the developer used, any one known in the art can be used. Specifically, (a) an organic alkali aqueous solution, for example, a tetramethylammonium hydroxide aqueous solution, a tetraethylammonium hydroxide aqueous solution,
Aqueous solutions of choline and others, and (ii) aqueous solutions of inorganic alkalis, such as aqueous solutions of potassium hydroxide, aqueous sodium hydroxide, and others. Although the concentration of the alkali developer is not limited, it is generally preferable that the concentration is 15 mol% or less.

Subsequently, temporary baking is performed in a temporary post-baking step (however, after the last resist layer is applied, final baking may be performed in a batch post-baking step described later instead of this). The heat treatment can be performed by any method known in the art, but is generally performed by heating on a hot plate or in a heating furnace, or by irradiating infrared rays.

The temporary post-baking treatment of the present invention is performed under the condition that the applied resist layer is cured to a level that does not cause defects. This condition is generally lower in temperature and / or shorter than the post-baking treatment in the conventional method. Specifically, the calcination in the tentative post-baking step is 80 to 100 ° C, preferably 90 ° C,
The reaction is performed under conditions of up to 15 minutes, preferably 10 minutes.

In the method of manufacturing a color filter panel according to the present invention, a plurality of colored resist layers are sequentially applied on a substrate by the method described above. Then, at the stage when the application of all the colored resist layers is completed, or instead of the final temporary post-baking process, a batch post-baking process is performed to complete the color filter manufacturing process. The batch post-bake treatment is for completely curing the applied resist layer, and is generally performed at 180 to 220 ° C., preferably 200 ° C., 50 to 80 minutes, preferably 60 minutes.
Is performed under the following conditions. As the heating means, a method similar to the above-mentioned temporary post-baking treatment can be used.

After the development step in the method of the present invention, or before or after the temporary post-bake step or the batch post-bake step, a washing step can be combined. This cleaning step is for cleaning impurities and the like by development, and can be performed by, for example, immersion in isopropanol, ultrasonic cleaning, ultraviolet cleaning, pure water cleaning, or other methods. Further, a drying treatment can be performed subsequently. As a drying method, a centrifugal drier or the like can be used in addition to drying by general heating. Also,
Drying can also be performed in a temporary post-baking step or a batch post-baking step.

The method for manufacturing a liquid crystal display device of the present invention utilizes the above-described method for manufacturing a color filter panel.

A liquid crystal display device is generally manufactured by sealing liquid crystal between an array substrate having pixel electrodes disposed on a transparent substrate and a transparent counter substrate disposed opposite to the array substrate. In the method for manufacturing a liquid crystal display device of the present invention, these array substrate and counter substrate can be manufactured by any method except for a method of forming a color filter layer.

Electronic devices can be arranged on the array substrate or on both the array substrate and the counter substrate. In a liquid crystal display device, a pixel electrode for driving is required.However, a pixel electrode is arranged on an array substrate and a counter electrode is arranged on a counter substrate. Can also. In addition, a switching element, a shield electrode, a drain electrode, a signal line, a scanning line, and other electronic elements other than these pixel electrodes are arranged on the substrate as needed.

Before or after the arrangement of these electronic elements, by the above-described method of manufacturing a color filter panel,
A color filter layer is formed. This color filter layer may be disposed on either the array substrate or the opposing substrate, or may be disposed on either the upper layer or the lower layer of the electronic element disposed on the substrate. Here, one of the preferable embodiments is to dispose a color filter layer on the electronic element arranged on the array substrate.

In the method of manufacturing a liquid crystal display device according to the present invention,
Liquid crystal is sealed in the space defined by the two substrates, and it is preferable that the surface of each substrate that contacts the liquid crystal be subjected to an alignment treatment. This alignment treatment is performed after necessary elements are arranged on each substrate.

For the alignment treatment, a rubbing method, an oblique deposition method, an ion beam method, a solution coating method, a plasma polymerization method, and any other method can be used. In the method of manufacturing a liquid crystal display device of the present invention, Preferably, the alignment treatment is performed by a rubbing treatment.

The rubbing treatment is performed by rubbing the substrate surface in one direction with a cloth or the like. In this method, an orientation agent is usually applied to a substrate and rubbed by a roll around which a rotating cloth is wound. Here, the rubbing treatment can be performed by the method shown in FIG. Hollow roll 5
02 is formed from a flexible material, for example, rubber, and the hollow roll is loaded inside a cylindrical continuous cloth 503, for example, cotton, and the hollow roll is filled with high-pressure gas and expanded to form a hollow roll. The substrate 501 can be rubbed while the outside is in close contact with the cylindrical cloth. According to this method, the amount of contact between the substrate and the cloth (also referred to as "hair contact amount") does not change with time, and can be kept constant at all times. Further, since the roll and the cloth are brought into close contact with each other by the pressure of a high-pressure gas, it is possible to prevent foaming or the like which is likely to occur when an adhesive tape or the like is used.

After the rubbing process is performed as necessary, the array substrate and the opposing substrate are combined, and a liquid crystal is filled in a gap therebetween to form a liquid crystal display device. Any liquid crystal can be selected.

[0035]

EXAMPLE 1 A color filter panel comprises a black matrix 12, a red colored resist layer 13, a green colored resist layer 14, and a blue colored resist layer 15 formed of a black colored resist layer, as shown in FIG. The case will be described.

As shown in FIG. 3, a black colored resist layer (BK layer), a red colored resist layer (R layer), a green colored resist layer (G layer), and a blue colored resist layer (B layer)
Is formed. Here, the firing conditions of the BK layer, the R layer, and the G layer in the temporary post-baking step are 90 ° C. /
10 minutes. By performing the treatment in the temporary post-baking step under these conditions, the substrate drying treatment after the original development treatment is satisfied, and the colored resist layer formed immediately before that is treated in the subsequent development step. Thus, a state in which a defect such as peeling of the resist layer does not occur can be achieved. Then, after the last development step of the layer B, baking is performed in a batch post-baking step. This batch post-baking step is performed at 200 ° C./60 minutes. This condition is the same as the condition of the post-baking step in the method of applying the next layer after completely curing each layer. By baking under these conditions, the post-baking process of the B layer, the post-baking process of the BK layer, the R layer, and the G layer are performed together with the execution of the post-baking process of the B layer. The layer will be cured.

According to the method of the present invention, as compared with the conventional method of manufacturing a color filter panel in which four post-baking steps are performed, the post-baking process is performed without changing the structure of the manufacturing steps. It is possible to perform the process only once. As a result, the total time of the post-baking process, which previously required about 4 hours, can be reduced by 3 hours, and the manufacturing time of the color filter panel can be greatly reduced. It is possible to shorten it.

Embodiment 2 A method of manufacturing the active matrix type liquid crystal display device shown in FIG. 4 will be described. First, the scanning lines 402 are provided on the transparent substrate 401 on the side forming the array substrate 432 which is an electrode substrate for a liquid crystal display element, and the insulating film 403 is formed over the entire surface.
Is formed. At a predetermined position corresponding to the scanning line 402 on the insulating film 403, a semiconductor layer 414, a signal line (not shown),
A source electrode 406 is provided. These are switching elements (TFT (Thin Film Transiste)
r)) Construct 404.

First, a red-colored resist composition is applied to the array substrate, prebaked, and imagewise exposed to print a pattern. After the imagewise exposure, a development process and a temporary post-bake process (about 90 ° C./about 10 minutes) are performed. Thus, a red colored resist layer 407R is formed.

Next, a green colored resist composition is applied, prebaked, imagewise exposed, developed, and temporarily post-baked to form a red colored resist layer 407G. Similarly, a blue colored resist layer 407B is formed. When forming the blue colored resist layer, a batch post-baking process (about 200 ° C./about 6 ° C.) is performed instead of the temporary post-baking process.
0 minutes) to fully cure all of the red, green and blue colored resist layers.

Next, a colored resist layer 407R for each color is formed.
ITO (Indium Tin) on 407G and 407B
Oxide) is formed.
The pixel electrode penetrates a part of each color resist layer and is connected to the source electrode 406.

Further, an alignment film 424 made of polyimide is formed as the uppermost layer. This alignment film is formed by applying polyimide onto an array substrate on which necessary wiring and a color filter are formed, and then aligning molecules by rubbing. The rubbing process is performed by the device shown in FIG.

On the other hand, on the transparent substrate 401 constituting the counter substrate 431, a counter electrode 422 made of ITO and an alignment film 424 made of polyimide are sequentially formed on the entire surface.

Further, the opposing substrate 431 and the array substrate 4
A liquid crystal cell is assembled by setting opposing surfaces on which 32 wiring electrodes and the like are formed to face each other, and setting and holding a substrate interval at a predetermined interval by a spacer (not shown), and enclosing liquid crystal in each gap. Thus, the liquid crystal layer 23 is formed, and the liquid crystal display element 30 is formed. If necessary, the counter substrate 43
A polarizing plate (not shown) is attached on the outer surface of the first and array substrates 432 to form an active matrix type liquid crystal display element 430.

[0045]

According to the method of the present invention, the time required for the post-baking step when forming the resist layers of the respective colors can be shortened, and the manufacturing time of the color filter panel can be shortened. As described above, the throughput can be improved.

[Brief description of the drawings]

FIG. 1 is a schematic cross-sectional view of a color filter panel manufactured by the method of the present invention.

FIG. 2 is a flowchart showing a conventional color filter panel manufacturing process.

FIG. 3 is a flowchart showing a manufacturing process of the color filter panel of the present invention.

FIG. 4 is a schematic cross-sectional view of a liquid crystal display device manufactured by the method of the present invention.

FIG. 5 is a schematic view showing an alignment film rubbing method that can be used in the method of the present invention.

[Explanation of symbols]

 101 Substrate 102 Black colored resist layer 103 Red colored resist layer 104 Green colored resist layer 105 Blue colored resist layer 401 Transparent substrate 402 Scan line 403 Insulating film 404 Switching element (TFT) 406 Source electrode 407R Red colored resist layer 407G Green colored resist layer 407B Blue colored resist layer 408 Pixel electrode 411 Through hole 414 Semiconductor layer 422 Counter electrode (common electrode) 423 Liquid crystal layer 424 Alignment film 430 Liquid crystal display element 431 Counter substrate 432 Array substrate

Claims (5)

[Claims] 1. A method for manufacturing a color filter panel formed by arranging a plurality of colored resist layers on a transparent substrate, wherein a photosensitive resist composition is applied on the substrate for each colored resist layer. In the resist layer coating step, the pre-bake step of volatilizing the solvent component contained in the resist layer, the exposure step of baking the pattern, the development step of developing the baked pattern, and the development step performed later, the coated resist layer does not cause defects. Repeat the temporary post-baking step to cure to a level, and after the last temporary post-baking step or in place of the last temporary post-baking step, perform a batch post-baking step to fully cure all applied resist layers. Characteristic color filter panel manufacturing method. 2. The method for producing a color filter panel according to claim 1, wherein the baking in the temporary post-baking step is performed at a temperature at which a photosensitive material contained in the applied resist layer can be removed. 3. A method of manufacturing a liquid crystal display device in which liquid crystal is sealed between an array substrate having pixel electrodes disposed on a transparent substrate and a transparent counter substrate disposed opposite to the array substrate. A color filter layer formed by arranging a plurality of colored resist layers on one of the inner surfaces of two opposing substrates is coated with a photosensitive resist composition on the substrate for each colored resist layer. Resist layer coating step, a pre-bake step of volatilizing a solvent component contained in the resist layer, an exposure step of printing a pattern,
In the developing step of developing the baked pattern and the subsequent developing step, the temporary post-baking step of curing the applied resist layer to a level that does not cause defects is repeated, after the final temporary post-baking step, or after the last temporary post-baking step. A method for manufacturing a liquid crystal display device, wherein the liquid crystal display device is arranged by performing a collective post-baking step of sufficiently curing all the applied resist layers instead of the baking step. 4. The method for manufacturing a liquid crystal display device according to claim 3, wherein a color filter layer is formed on the pixel electrodes arranged on the array substrate. 5. The method for producing a color filter panel according to claim 3, wherein the baking in the temporary post-baking step is performed at a temperature at which a photosensitive material contained in the applied resist layer can be removed.