[go: up one dir, main page]

KR100517008B1 - 파릴렌 중합체 층의 형성 방법 및 파릴렌 중합체 층을 포함하는 다층 구조물 - Google Patents

파릴렌 중합체 층의 형성 방법 및 파릴렌 중합체 층을 포함하는 다층 구조물 Download PDF

Info

Publication number
KR100517008B1
KR100517008B1 KR10-1999-7003622A KR19997003622A KR100517008B1 KR 100517008 B1 KR100517008 B1 KR 100517008B1 KR 19997003622 A KR19997003622 A KR 19997003622A KR 100517008 B1 KR100517008 B1 KR 100517008B1
Authority
KR
South Korea
Prior art keywords
delete delete
layer
parylene
parylene polymer
polymer layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR10-1999-7003622A
Other languages
English (en)
Korean (ko)
Other versions
KR20000052803A (ko
Inventor
워리존
올슨로저에이.
비치윌리암에프.
Original Assignee
스페셜티 코팅 시스템즈, 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 스페셜티 코팅 시스템즈, 인코포레이티드 filed Critical 스페셜티 코팅 시스템즈, 인코포레이티드
Publication of KR20000052803A publication Critical patent/KR20000052803A/ko
Application granted granted Critical
Publication of KR100517008B1 publication Critical patent/KR100517008B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/60Deposition of organic layers from vapour phase
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/24Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/62Plasma-deposition of organic layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/14Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by electrical means
    • B05D3/141Plasma treatment
    • B05D3/145After-treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Physical Vapour Deposition (AREA)
  • Formation Of Insulating Films (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Chemical Vapour Deposition (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Laminated Bodies (AREA)
KR10-1999-7003622A 1996-10-25 1997-10-24 파릴렌 중합체 층의 형성 방법 및 파릴렌 중합체 층을 포함하는 다층 구조물 Expired - Fee Related KR100517008B1 (ko)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US73831996A 1996-10-25 1996-10-25
US8/738,319 1996-10-25
US92893197A 1997-09-12 1997-09-12
US08/738,319 1997-09-12
US8/928,931 1997-09-12
US08/928,931 1997-09-12

Publications (2)

Publication Number Publication Date
KR20000052803A KR20000052803A (ko) 2000-08-25
KR100517008B1 true KR100517008B1 (ko) 2005-09-27

Family

ID=27113349

Family Applications (1)

Application Number Title Priority Date Filing Date
KR10-1999-7003622A Expired - Fee Related KR100517008B1 (ko) 1996-10-25 1997-10-24 파릴렌 중합체 층의 형성 방법 및 파릴렌 중합체 층을 포함하는 다층 구조물

Country Status (7)

Country Link
EP (1) EP0934127B1 (fr)
JP (1) JP2002505803A (fr)
KR (1) KR100517008B1 (fr)
CN (1) CN1089281C (fr)
AU (1) AU5087198A (fr)
DE (1) DE69707005T2 (fr)
WO (1) WO1998018570A1 (fr)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6020458A (en) 1997-10-24 2000-02-01 Quester Technology, Inc. Precursors for making low dielectric constant materials with improved thermal stability
DE19859695A1 (de) * 1998-12-23 2000-06-29 Leybold Systems Gmbh Verfahren zum Beschichten von Substraten aus Kunststoff
US6558315B1 (en) 2000-03-15 2003-05-06 Ams Research Corporation Parylene-coated components for inflatable penile prosthesis
US6729527B2 (en) 2001-01-30 2004-05-04 Kulicke & Soffa Investments, Inc. Bonding tool with polymer coating
RU2218364C2 (ru) * 2001-07-27 2003-12-10 Федеральное государственное унитарное предприятие "Научно-исследовательский физико-химический институт им. Л.Я. Карпова" ПЛЕНКА ИЗ ПОЛИ ( α,α,α′,α′- ТЕТРАФТОРПАРАКСИЛИЛЕНА), СПОСОБ ЕЕ ПОЛУЧЕНИЯ И ПОЛУПРОВОДНИКОВЫЙ ПРИБОР С ЕЕ ИСПОЛЬЗОВАНИЕМ
RU2218365C2 (ru) * 2001-07-27 2003-12-10 Федеральное государственное унитарное предприятие "Научно-исследовательский физико-химический институт им. Л.Я.Карпова" Пористая пленка из полипараксилилена и его замещенных, способ ее получения и полупроводниковый прибор с её использованием
KR100422570B1 (ko) * 2001-10-20 2004-03-11 최재영 방열시트용 수지 조성물 및 이를 이용한 방열시트의제조방법
KR100468319B1 (ko) * 2002-03-12 2005-01-27 (주)누리셀 파릴렌 고분자막 코팅 장치
KR20040051097A (ko) * 2002-12-11 2004-06-18 패럴린코리아(주) 패럴린(parylene) 고분자 코팅의 접착력을 증진시키는전처리 방법 및 이를 응용한 장치
RU2268900C2 (ru) * 2003-11-13 2006-01-27 Федеральное государственное унитарное предприятие "Научно-исследовательский физико-химический институт им. Л.Я. Карпова" СПОСОБ ПОЛУЧЕНИЯ ПОРИСТОЙ ПЛЕНКИ ИЗ ПОЛИ (α, α, α', α'-ТЕТРАФТОРПАРАКСИЛИЛЕНА) И ПОРИСТАЯ ПЛЕНКА
WO2006063081A2 (fr) * 2004-12-07 2006-06-15 M-Flex Multi-Fineline Electronix, Inc. Circuit miniature et composants d'inducteurs, et procédés de fabrication associés
ATE360224T1 (de) * 2004-12-16 2007-05-15 Ecole D Ingenieurs Arc Verfahren zur herstellung einer vorrichtung mit einer kunststoffmembran und so erhaltene vorrichtung
JP4831561B2 (ja) * 2005-05-16 2011-12-07 独立行政法人産業技術総合研究所 有機無機ハイブリッド薄膜及びその製造方法
US20090142227A1 (en) * 2005-07-01 2009-06-04 Manfred Fuchs Parylene Coating and Method for the Production Thereof
DE102005040648A1 (de) 2005-08-27 2007-03-01 Leybold Vacuum Gmbh Beschichtete Gegenstände
US20070148390A1 (en) * 2005-12-27 2007-06-28 Specialty Coating Systems, Inc. Fluorinated coatings
RU2539694C2 (ru) * 2008-04-16 2015-01-27 ЭйчЗедОу, ИНК. Процесс нанесения покрытия на металл и электронное устройство для применения в морских условиях и других окружающих средах
GB2479154A (en) * 2010-03-30 2011-10-05 Camvac Ltd Electron flux coated substrate
CN102140666A (zh) * 2011-01-14 2011-08-03 成都图南电子有限公司 一种粘接钕铁硼磁体涂覆方法及其制备得到的多层结构
NL2015934B1 (en) * 2015-12-10 2017-07-03 Veco B V Filter for brewing beverages.
US20190184686A1 (en) * 2016-08-22 2019-06-20 Corning Incorporated Articles of controllably bonded sheets and methods for making same
KR102095363B1 (ko) * 2017-11-20 2020-04-02 주식회사 아이오에프 자가 세척이 가능한 파릴렌 증착 장비
DE102019200208A1 (de) 2019-01-10 2020-07-16 Carl Zeiss Smt Gmbh Verfahren zum in situ dynamischen Schutz einer Oberfläche und optische Anordnung
KR102643650B1 (ko) * 2021-10-14 2024-03-05 연세대학교 산학협력단 단열 특성이 향상된 실리카 에어로젤 기반 단열 재료, 이의 제조방법 및 이를 구비하는 구조물과 기계장치
CN114204133B (zh) * 2021-12-09 2024-07-12 惠州亿纬锂能股份有限公司 一种解决卷绕式电芯膨胀的方法
CN116445882A (zh) * 2023-03-03 2023-07-18 深圳市信维通信股份有限公司 挠性覆铜板及其制备方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2006702A1 (de) * 1970-02-13 1971-08-19 Siemens Ag Verfahren zum Überziehen von Korpern mit isolierenden Stoffen
US3901994A (en) * 1974-02-04 1975-08-26 Rca Corp Metallized video disc having a dielectric coating thereon
US4500562A (en) * 1983-03-02 1985-02-19 The United States Of America As Represented By The United States Department Of Energy Di-p-xylylene polymer and method for making the same
JPS6391925A (ja) * 1986-10-03 1988-04-22 Canon Inc 電子放出素子
US5154978A (en) * 1989-03-22 1992-10-13 Tdk Corporation Highly corrosion-resistant rare-earth-iron magnets
US5139813A (en) * 1990-09-28 1992-08-18 Union Carbide Chemicals & Plastics Technology Corporation Method for inducing fluorescence in parylene films by an active plasma
RU1819687C (ru) * 1991-04-01 1993-06-07 Институт механики металлополимерных систем АН БССР Способ получени покрыти из поли- @ -ксилилена
RU2002519C1 (ru) * 1991-04-01 1993-11-15 Анатолий Михайлович Красовский Способ получени покрытий из поли-N-ксилилена
JP2797905B2 (ja) * 1993-06-25 1998-09-17 凸版印刷株式会社 有機薄膜el素子
JPH0971672A (ja) * 1995-09-08 1997-03-18 Fuji Electric Co Ltd ポリパラキシリレン薄膜の改質方法
US5538758A (en) * 1995-10-27 1996-07-23 Specialty Coating Systems, Inc. Method and apparatus for the deposition of parylene AF4 onto semiconductor wafers

Also Published As

Publication number Publication date
DE69707005D1 (de) 2001-10-31
AU5087198A (en) 1998-05-22
KR20000052803A (ko) 2000-08-25
CN1244143A (zh) 2000-02-09
CN1089281C (zh) 2002-08-21
WO1998018570A1 (fr) 1998-05-07
EP0934127A1 (fr) 1999-08-11
JP2002505803A (ja) 2002-02-19
DE69707005T2 (de) 2002-07-04
EP0934127B1 (fr) 2001-09-26

Similar Documents

Publication Publication Date Title
KR100517008B1 (ko) 파릴렌 중합체 층의 형성 방법 및 파릴렌 중합체 층을 포함하는 다층 구조물
US5879808A (en) Parylene polymer layers
WO1998018570A9 (fr) Procede de fabrication de revetement a base de parylene
KR100404536B1 (ko) 유전 상수 κ가 낮은 무기/유기 혼성 박막 및 이를제조하는 방법
US6699784B2 (en) Method for depositing a low k dielectric film (K>3.5) for hard mask application
US4938995A (en) Fluoropolymer thin film coatings and method of preparation by plasma polymerization
WO1997015951A1 (fr) Couches de polymere de parylene
WO2000054329A1 (fr) Dispositif semi-conducteur et procede de fabrication correspondant
KR19990082991A (ko) 반도체 장치의 제조 방법
US5057336A (en) Method of forming high purity SiO2 thin film
JP4242648B2 (ja) 金属イオン拡散バリア層
US20020086109A1 (en) Silica insulation film with a reduced dielectric constant and method of forming the same
CN1308375A (zh) 扩散阻挡层和带扩散阻挡层的半导体器件
JP3508629B2 (ja) 耐熱低誘電率薄膜の形成方法、その耐熱低誘電率薄膜からなる半導体層間絶縁膜及びこの半導体層間絶縁膜を用いた半導体装置
US20070237970A1 (en) Diffusion barrier with low dielectric constant and semiconductor device containing same
KR20060131645A (ko) 반도체 장치 및 그 제조 방법
US20010010840A1 (en) Electrically insulating resin composition and method for forming thin film therefrom
Lang et al. Vapor deposition of very low k polymer films, poly (naphthalene), poly (fluorinated naphthalene)
EP0794569A2 (fr) Film de carbone amorphe, procédé de fabrication et dispositif semi-conducteur l'utilisant
JP3662401B2 (ja) 絶縁材料及びその製造方法、フッ素化フラーレン含有膜の製造方法、並びに半導体装置及びその製造方法
Endo et al. Preparation and properties of fluorinated amorphous carbon thin films by plasma enhanced chemical vapor deposition
US20100093174A1 (en) Method of manufacturing low-k dielectric film, and formation of air-gap using the low-k dielectric film
KR20010062216A (ko) 반도체 장치에서 트래핑된 전하를 줄이기 위한 방법 및 장치
JPH06112336A (ja) 半導体装置の製造方法
Tokuyama et al. Properties of methyl boron nitride film for next generation low-k interconnection

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PN2301 Change of applicant

St.27 status event code: A-3-3-R10-R13-asn-PN2301

St.27 status event code: A-3-3-R10-R11-asn-PN2301

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

FPAY Annual fee payment

Payment date: 20080916

Year of fee payment: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20090917

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20090917