US20100068112A1 - Wide temperature range dielectric absorber - Google Patents
Wide temperature range dielectric absorber Download PDFInfo
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- US20100068112A1 US20100068112A1 US12/619,453 US61945309A US2010068112A1 US 20100068112 A1 US20100068112 A1 US 20100068112A1 US 61945309 A US61945309 A US 61945309A US 2010068112 A1 US2010068112 A1 US 2010068112A1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q17/00—Devices for absorbing waves radiated from an antenna; Combinations of such devices with active antenna elements or systems
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3205—Alkaline earth oxides or oxide forming salts thereof, e.g. beryllium oxide
- C04B2235/3213—Strontium oxides or oxide-forming salts thereof
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3224—Rare earth oxide or oxide forming salts thereof, e.g. scandium oxide
- C04B2235/3227—Lanthanum oxide or oxide-forming salts thereof
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/327—Iron group oxides, their mixed metal oxides, or oxide-forming salts thereof
- C04B2235/3275—Cobalt oxides, cobaltates or cobaltites or oxide forming salts thereof, e.g. bismuth cobaltate, zinc cobaltite
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/74—Physical characteristics
- C04B2235/76—Crystal structural characteristics, e.g. symmetry
- C04B2235/768—Perovskite structure ABO3
Definitions
- the present invention relates to the field of dielectric absorbers. More specifically, the invention relates to dielectric absorbers of electromagnetic radiation.
- a structure In many applications, such as aviation applications, it can be desirable for a structure to be “invisible” to or undetectable. For example, aircraft invisible to electromagnetic radiation is less likely to be spotted on a radar system, which can be desirable in some applications.
- Conventional approaches have utilized oxide or dielectric absorbent coatings comprising ferromagnetic materials to reduce reflection of electromagnetic waves. However, a ferromagnetic material loses its characteristic ferromagnetic ability at temperatures above the Curie temperature for that material, causing the net magnetization of the ferromagnetic material to be zero.
- a dielectric absorber capable of uniformly absorbing electromagnetic radiation.
- one conventional method for shielding an aircraft from electromagnetic radiation utilizes a single material dielectric absorber coated on the aircraft.
- many components of an aircraft can reach temperatures in excess of the effective electromagnetic absorption temperature, causing the absorber coating to be ineffective at absorbing electromagnetic radiation at that temperature.
- a single material dielectric absorber is ineffective at providing uniform electromagnetic radiation absorption over the entire temperature range.
- a wide temperature range dielectric absorber substantially as shown in and/or described in connection with at least one of the figures, and as set forth more completely in the claims.
- FIG. 1 shows a ternary phase diagram of dielectric absorbers in accordance with one embodiment of the present invention.
- FIG. 2 is a plot displaying the absorption characteristics of dielectric absorbers in accordance with one embodiment of the present invention.
- the present invention is directed to a wide temperature range dielectric absorber.
- the principles of the invention, as defined by the claims appended herein, can obviously be applied beyond the specifically described embodiments of the invention described herein.
- certain details have been left out in order to not obscure the inventive aspects of the invention. The details left out are within the knowledge of a person of ordinary skill in the art.
- FIG. 1 represents ternary phase diagram 100 at 1100° C. in air of a ternary system including a primary component group of lanthanum oxide, strontium oxide, and cobalt oxide, in accordance with one embodiment of the present invention.
- Ternary phase diagram 100 further includes trapezoidal dielectric region 108 , which is bounded by points 110 , 112 , 114 , and 116 .
- line 118 extends from point 112 to point 114
- line 120 extends from point 110 to point 116
- line 122 extends along line 124 from point 114 to point 116
- line 126 extends from point 112 to point 110 .
- Line 118 represents the upper bound of trapezoidal dielectric region 108 , and extends from point 112 to point 114 .
- the chemical formula of the composition along line 118 is La 1-x Sr x CoO 3 ⁇ y , where “x” can have a value ranging from 0 to 0.9.
- the value of “x” is one factor in determining the value of “y,” which is largely based on the oxidation state of the cobalt.
- the composition along line 118 has the perovskite crystalline structure.
- the chemical formula of the composition at point 112 is known to be LaCoO 3 , and does not contain any strontium oxide because it lies on the line between lanthanum oxide vertex 102 and cobalt oxide vertex 106 .
- Moving from point 112 towards point 114 along line 118 changes the chemical composition of the ternary system by increasing the mole percent of strontium oxide in the composition and decreasing the mole percent of lanthanum oxide in the composition.
- the mole percent of cobalt oxide in the composition remains constant along line 118 .
- Line 120 represents the lower bound of trapezoidal dielectric region 108 , and extends from point 110 to point 116 .
- the chemical formula of the composition along line 120 is La 2-x Sr x CoO 4 ⁇ y , where “x” can have a value ranging from 0 to 0.9.
- the value of “x” is one factor in determining the value of “y,” which is largely based on the oxidation state of the cobalt.
- the composition along line 120 has the potassium nickel fluoride crystalline structure.
- the chemical formula of the composition at point 110 is known to be La 2 CoO 4 , and does not contain any strontium oxide because it lies on the line between lanthanum oxide vertex 102 and cobalt oxide vertex 106 .
- Moving from point 110 towards point 116 along line 120 changes the chemical composition of the ternary system by increasing the mole percent of strontium oxide in the composition and decreasing the mole percent of lanthanum oxide in the composition.
- the mole percent of cobalt oxide in the composition remains constant along line 120 .
- Line 122 represents the right-hand bound of trapezoidal dielectric region 108 , and extends from point 114 to point 116 along line 124 .
- Line 124 is created by drawing a line from the cobalt oxide vertex 106 through the 90 mole percent marker on the line between lanthanum oxide vertex 102 and strontium oxide vertex 104 .
- Line 124 intersects line 118 at point 114 , and intersects line 120 at point 116 .
- Line 126 represents the left-hand bound of trapezoidal dielectric region 108 , and extends from point 112 to point 110 along the line between lanthanum oxide vertex 102 and cobalt oxide vertex 106 .
- Line 126 intersects line 118 at point 112 , and intersects line 120 at point 110 .
- the composition represented by line 126 contains only lanthanum oxide and cobalt oxide.
- any point within the portion of trapezoidal dielectric region 108 that is below line 118 and above line 120 represents a composition that includes either the perovskite crystalline structure or the potassium nickel fluoride crystalline structure, or both.
- the chemistry of the composition represented by trapezoidal dielectric region 108 is unique in that two independent phases (i.e., the perovskite crystalline structure and the potassium nickel fluoride crystalline structure) co-exist together in a single composition.
- the mole percent of the individual oxides (i.e., lanthanum oxide, strontium oxide, and cobalt oxide) in the composition depends on the specific location selected within trapezoidal dielectric region 108 .
- the mole percent of cobalt oxide in the composition increases towards line 118 and decreases towards line 120 .
- moving from line 126 towards line 122 increases the mole percent of strontium oxide in the composition and decreases the mole percent of lanthanum oxide in the composition.
- the formula (1-z)[La 1-x Sr x CoO 3 ⁇ y ]z[La 2-x Sr x CoO 4 ⁇ y ] represents the chemical composition of any point within trapezoidal dielectric region 108 .
- “x” can have a value ranging from 0 to 0.9
- “z” can have a value ranging from 0 to 1.
- the value of “x” is one factor in determining the value of “y,” which is largely based on the oxidation state of the cobalt.
- ternary phase diagram 100 represents a composition of lanthanum oxide, strontium oxide, and cobalt oxide.
- the portion of ternary phase diagram 100 found within trapezoidal dielectric region 108 represents a stable composition of these oxides and forms either the perovskite or the potassium nickel fluoride crystalline structure, or both.
- Each individual phase contains two different valence states of cobalt allowing for different absorption mechanisms.
- the embodiment of the invention in FIG. 1 advantageously creates a two-phase oxide dielectric absorber (i.e.
- a two-phase oxide material or coating with a flatter curve for absorption of electromagnetic waves or light over a wider range of temperatures.
- This is called a two-phase oxide dielectric absorber because two atomic arrangements exist in the composition (i.e., both the perovskite and potassium nickel fluoride crystalline structures). Because the two arrangements are chemically compatible throughout the entire temperature range (i.e. up to 1100° C.), they are able to co-exist together and do not react to form a third phase.
- FIG. 2 shows plot 200 displaying the absorption characteristics of dielectric absorbers, in accordance with one embodiment of the present invention.
- Plot 200 displays the percentage of absorption of electromagnetic radiation as temperature increases for single-phase dielectric absorption material 102 , single-phase dielectric absorption material 204 , and two-phase dielectric absorption material 206 .
- single-phase dielectric absorption material 202 absorbs a high percentage of electromagnetic radiation from temperature 208 to temperature 210 .
- single-phase dielectric absorption material 202 might effectively absorb electromagnetic radiation from 700° C. to 900° C.
- single-phase dielectric absorption material 202 does not effectively absorb electromagnetic radiation, as the absorption curve tapers off.
- single-phase dielectric absorption material 204 displays a high percentage of electromagnetic absorption from temperature 210 to temperature 212 .
- single-phase dielectric absorption material 204 might effectively absorb electromagnetic radiation from 900° C. to 1100° C.
- single-phase dielectric absorption material 204 does not effectively absorb electromagnetic radiation, as the absorption curve tapers off.
- An embodiment of the present invention effectively combines two single-phase dielectric absorption materials, such as single-phase dielectric absorption materials 202 and 204 , to form two-phase dielectric absorption material 206 with a very broad temperature range of absorption.
- two single-phase dielectric absorption materials 202 and 204 to form two-phase dielectric absorption material 206 , the temperature range of absorption can be expanded to 700° C. to 1100° C. Since two-phase dielectric absorption material 206 provides uniform absorption of electromagnetic radiation across a broader temperature range, the present invention advantageously provides for more effective electromagnetic absorption in high temperature applications.
- Two-phase dielectric absorption material 206 includes both the perovskite crystalline structure and the potassium nickel fluoride crystalline structure, so two atomic arrangements exist in two-phase dielectric absorption material 206 . Because the two arrangements are chemically compatible throughout the entire temperature range (i.e. up to 1100° C.), they are able to co-exist together and do not react to form a third phase.
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Abstract
Description
- The present application claims the benefit of and priority to a pending provisional patent application entitled “High Temperature Dielectric Absorber,” Ser. No. 60/811,919 filed on Jun. 8, 2006. The disclosure in that pending provisional application is hereby incorporated fully by reference into the present application.
- 1. Field of the Invention
- The present invention relates to the field of dielectric absorbers. More specifically, the invention relates to dielectric absorbers of electromagnetic radiation.
- 2. Background Art
- In many applications, such as aviation applications, it can be desirable for a structure to be “invisible” to or undetectable. For example, aircraft invisible to electromagnetic radiation is less likely to be spotted on a radar system, which can be desirable in some applications. Conventional approaches have utilized oxide or dielectric absorbent coatings comprising ferromagnetic materials to reduce reflection of electromagnetic waves. However, a ferromagnetic material loses its characteristic ferromagnetic ability at temperatures above the Curie temperature for that material, causing the net magnetization of the ferromagnetic material to be zero.
- In applications subjected to a broad temperature range including very high temperatures, such as up to 1100° C., it has proven very difficult to provide a dielectric absorber capable of uniformly absorbing electromagnetic radiation. For example, one conventional method for shielding an aircraft from electromagnetic radiation utilizes a single material dielectric absorber coated on the aircraft. However, many components of an aircraft can reach temperatures in excess of the effective electromagnetic absorption temperature, causing the absorber coating to be ineffective at absorbing electromagnetic radiation at that temperature. Furthermore, in applications subjected to a very broad temperature range, a single material dielectric absorber is ineffective at providing uniform electromagnetic radiation absorption over the entire temperature range.
- Thus there is a need in the art for a high temperature dielectric absorber with a wider temperature range of electromagnetic absorption.
- A wide temperature range dielectric absorber, substantially as shown in and/or described in connection with at least one of the figures, and as set forth more completely in the claims.
-
FIG. 1 shows a ternary phase diagram of dielectric absorbers in accordance with one embodiment of the present invention. -
FIG. 2 is a plot displaying the absorption characteristics of dielectric absorbers in accordance with one embodiment of the present invention. - The present invention is directed to a wide temperature range dielectric absorber. Although the invention is described with respect to specific embodiments, the principles of the invention, as defined by the claims appended herein, can obviously be applied beyond the specifically described embodiments of the invention described herein. Moreover, in the description of the present invention, certain details have been left out in order to not obscure the inventive aspects of the invention. The details left out are within the knowledge of a person of ordinary skill in the art.
- The drawings in the present application and their accompanying detailed description are directed to merely exemplary embodiments of the invention. To maintain brevity, other embodiments of the invention which use the principles of the present invention are not specifically described in the present application and are not specifically illustrated by the present drawings.
-
FIG. 1 represents ternary phase diagram 100 at 1100° C. in air of a ternary system including a primary component group of lanthanum oxide, strontium oxide, and cobalt oxide, in accordance with one embodiment of the present invention. Ternary phase diagram 100 further includes trapezoidaldielectric region 108, which is bounded bypoints line 118 extends frompoint 112 topoint 114,line 120 extends frompoint 110 topoint 116,line 122 extends alongline 124 frompoint 114 topoint 116, andline 126 extends frompoint 112 topoint 110. -
Line 118 represents the upper bound of trapezoidaldielectric region 108, and extends frompoint 112 topoint 114. The chemical formula of the composition alongline 118 is La1-xSrxCoO3±y, where “x” can have a value ranging from 0 to 0.9. The value of “x” is one factor in determining the value of “y,” which is largely based on the oxidation state of the cobalt. In the present embodiment, the composition alongline 118 has the perovskite crystalline structure. The chemical formula of the composition atpoint 112 is known to be LaCoO3, and does not contain any strontium oxide because it lies on the line betweenlanthanum oxide vertex 102 andcobalt oxide vertex 106. Moving frompoint 112 towardspoint 114 alongline 118 changes the chemical composition of the ternary system by increasing the mole percent of strontium oxide in the composition and decreasing the mole percent of lanthanum oxide in the composition. The mole percent of cobalt oxide in the composition remains constant alongline 118. -
Line 120 represents the lower bound of trapezoidaldielectric region 108, and extends frompoint 110 topoint 116. The chemical formula of the composition alongline 120 is La2-xSrxCoO4±y, where “x” can have a value ranging from 0 to 0.9. The value of “x” is one factor in determining the value of “y,” which is largely based on the oxidation state of the cobalt. In the present embodiment, the composition alongline 120 has the potassium nickel fluoride crystalline structure. The chemical formula of the composition atpoint 110 is known to be La2CoO4, and does not contain any strontium oxide because it lies on the line betweenlanthanum oxide vertex 102 andcobalt oxide vertex 106. Moving frompoint 110 towardspoint 116 alongline 120 changes the chemical composition of the ternary system by increasing the mole percent of strontium oxide in the composition and decreasing the mole percent of lanthanum oxide in the composition. The mole percent of cobalt oxide in the composition remains constant alongline 120. -
Line 122 represents the right-hand bound of trapezoidaldielectric region 108, and extends frompoint 114 topoint 116 alongline 124.Line 124 is created by drawing a line from thecobalt oxide vertex 106 through the 90 mole percent marker on the line betweenlanthanum oxide vertex 102 andstrontium oxide vertex 104.Line 124 intersectsline 118 atpoint 114, and intersectsline 120 atpoint 116. -
Line 126 represents the left-hand bound of trapezoidaldielectric region 108, and extends frompoint 112 topoint 110 along the line betweenlanthanum oxide vertex 102 andcobalt oxide vertex 106.Line 126 intersectsline 118 atpoint 112, and intersectsline 120 atpoint 110. The composition represented byline 126 contains only lanthanum oxide and cobalt oxide. - In the present embodiment, any point within the portion of trapezoidal
dielectric region 108 that is belowline 118 and aboveline 120 represents a composition that includes either the perovskite crystalline structure or the potassium nickel fluoride crystalline structure, or both. The chemistry of the composition represented by trapezoidaldielectric region 108 is unique in that two independent phases (i.e., the perovskite crystalline structure and the potassium nickel fluoride crystalline structure) co-exist together in a single composition. The mole percent of the individual oxides (i.e., lanthanum oxide, strontium oxide, and cobalt oxide) in the composition depends on the specific location selected within trapezoidaldielectric region 108. For example, the mole percent of cobalt oxide in the composition increases towardsline 118 and decreases towardsline 120. Similarly, moving fromline 126 towardsline 122 increases the mole percent of strontium oxide in the composition and decreases the mole percent of lanthanum oxide in the composition. The formula (1-z)[La1-xSrxCoO3±y]z[La2-xSrxCoO4±y] represents the chemical composition of any point within trapezoidaldielectric region 108. In this formula, “x” can have a value ranging from 0 to 0.9, and “z” can have a value ranging from 0 to 1. The value of “x” is one factor in determining the value of “y,” which is largely based on the oxidation state of the cobalt. - In the embodiment of the present invention in
FIG. 1 , ternary phase diagram 100 represents a composition of lanthanum oxide, strontium oxide, and cobalt oxide. The portion of ternary phase diagram 100 found within trapezoidaldielectric region 108 represents a stable composition of these oxides and forms either the perovskite or the potassium nickel fluoride crystalline structure, or both. Each individual phase contains two different valence states of cobalt allowing for different absorption mechanisms. In addition, by combining these chemically compatible materials that have different temperature-dependent properties for absorption of light or other electromagnetic waves, such as those generated and used in the radar technology, the embodiment of the invention inFIG. 1 advantageously creates a two-phase oxide dielectric absorber (i.e. a two-phase oxide material or coating) with a flatter curve for absorption of electromagnetic waves or light over a wider range of temperatures. This is called a two-phase oxide dielectric absorber because two atomic arrangements exist in the composition (i.e., both the perovskite and potassium nickel fluoride crystalline structures). Because the two arrangements are chemically compatible throughout the entire temperature range (i.e. up to 1100° C.), they are able to co-exist together and do not react to form a third phase. -
FIG. 2 showsplot 200 displaying the absorption characteristics of dielectric absorbers, in accordance with one embodiment of the present invention. Plot 200 displays the percentage of absorption of electromagnetic radiation as temperature increases for single-phasedielectric absorption material 102, single-phasedielectric absorption material 204, and two-phasedielectric absorption material 206. - As shown in
FIG. 2 , single-phasedielectric absorption material 202 absorbs a high percentage of electromagnetic radiation fromtemperature 208 totemperature 210. For example, single-phasedielectric absorption material 202 might effectively absorb electromagnetic radiation from 700° C. to 900° C. As shown inFIG. 2 , once the temperature increases beyondtemperature 210, single-phasedielectric absorption material 202 does not effectively absorb electromagnetic radiation, as the absorption curve tapers off. Similarly, single-phasedielectric absorption material 204 displays a high percentage of electromagnetic absorption fromtemperature 210 totemperature 212. For example, single-phasedielectric absorption material 204 might effectively absorb electromagnetic radiation from 900° C. to 1100° C. As shown inFIG. 2 , once the temperature increases beyondtemperature 212, single-phasedielectric absorption material 204 does not effectively absorb electromagnetic radiation, as the absorption curve tapers off. - An embodiment of the present invention, as shown in
FIG. 2 , effectively combines two single-phase dielectric absorption materials, such as single-phasedielectric absorption materials dielectric absorption material 206 with a very broad temperature range of absorption. For example, by combining single-phasedielectric absorption materials dielectric absorption material 206, the temperature range of absorption can be expanded to 700° C. to 1100° C. Since two-phasedielectric absorption material 206 provides uniform absorption of electromagnetic radiation across a broader temperature range, the present invention advantageously provides for more effective electromagnetic absorption in high temperature applications. Two-phasedielectric absorption material 206 includes both the perovskite crystalline structure and the potassium nickel fluoride crystalline structure, so two atomic arrangements exist in two-phasedielectric absorption material 206. Because the two arrangements are chemically compatible throughout the entire temperature range (i.e. up to 1100° C.), they are able to co-exist together and do not react to form a third phase. - From the above description of the invention it is manifest that various techniques can be used for implementing the concepts of the present invention without departing from its scope. Moreover, while the invention has been described with specific reference to certain embodiments, a person of ordinary skill in the art would appreciate that changes can be made in form and detail without departing from the spirit and the scope of the invention. Thus, the described embodiments are to be considered in all respects as illustrative and not restrictive. It should also be understood that the invention is not limited to the particular embodiments described herein but is capable of many rearrangements, modifications, and substitutions without departing from the scope of the invention.
- Thus, wide temperature range dielectric absorber has been described.
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US11/731,658 US7633424B1 (en) | 2006-06-08 | 2007-03-30 | Wide temperature range dielectric absorber |
US12/619,453 US20100068112A1 (en) | 2006-06-08 | 2009-11-16 | Wide temperature range dielectric absorber |
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US9828658B2 (en) | 2013-08-13 | 2017-11-28 | Rolls-Royce Corporation | Composite niobium-bearing superalloys |
US9938610B2 (en) | 2013-09-20 | 2018-04-10 | Rolls-Royce Corporation | High temperature niobium-bearing superalloys |
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US6884631B2 (en) * | 2002-03-29 | 2005-04-26 | Seiko Epson Corporation | Method of forming a ferroelectric film by direct annealing of the ferroelectric film using laser or lamp followed by a second annealing through a light transmission and/or absorption film |
US6924155B2 (en) * | 2002-08-14 | 2005-08-02 | Seiko Epson Corporation | Ferroelectric memory, method of fabricating the same, semiconductor device, and method of fabricating the same |
US20040182306A1 (en) * | 2003-03-21 | 2004-09-23 | Butt Darryl Paul | Method of forming a joint |
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