[go: up one dir, main page]

US20100068112A1 - Wide temperature range dielectric absorber - Google Patents

Wide temperature range dielectric absorber Download PDF

Info

Publication number
US20100068112A1
US20100068112A1 US12/619,453 US61945309A US2010068112A1 US 20100068112 A1 US20100068112 A1 US 20100068112A1 US 61945309 A US61945309 A US 61945309A US 2010068112 A1 US2010068112 A1 US 2010068112A1
Authority
US
United States
Prior art keywords
dielectric
crystalline structure
temperature range
line
point
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US12/619,453
Inventor
Michael D. Hill
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Trans Tech Inc
Allumax TTI LLC
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to US12/619,453 priority Critical patent/US20100068112A1/en
Publication of US20100068112A1 publication Critical patent/US20100068112A1/en
Assigned to TRANS-TECH, INC. reassignment TRANS-TECH, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: SKYWORKS SOLUTIONS, INC.
Assigned to SKYWORKS SOLUTIONS, INC. reassignment SKYWORKS SOLUTIONS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: TRANS-TECH, INC.
Assigned to TRANS-TECH, INC. reassignment TRANS-TECH, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: SKYWORKS SOLUTIONS, INC.
Assigned to ALLUMAX TTI, LLC reassignment ALLUMAX TTI, LLC ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: TRANS-TECH, INC.
Abandoned legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01QANTENNAS, i.e. RADIO AERIALS
    • H01Q17/00Devices for absorbing waves radiated from an antenna; Combinations of such devices with active antenna elements or systems
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3205Alkaline earth oxides or oxide forming salts thereof, e.g. beryllium oxide
    • C04B2235/3213Strontium oxides or oxide-forming salts thereof
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3224Rare earth oxide or oxide forming salts thereof, e.g. scandium oxide
    • C04B2235/3227Lanthanum oxide or oxide-forming salts thereof
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/327Iron group oxides, their mixed metal oxides, or oxide-forming salts thereof
    • C04B2235/3275Cobalt oxides, cobaltates or cobaltites or oxide forming salts thereof, e.g. bismuth cobaltate, zinc cobaltite
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/74Physical characteristics
    • C04B2235/76Crystal structural characteristics, e.g. symmetry
    • C04B2235/768Perovskite structure ABO3

Definitions

  • the present invention relates to the field of dielectric absorbers. More specifically, the invention relates to dielectric absorbers of electromagnetic radiation.
  • a structure In many applications, such as aviation applications, it can be desirable for a structure to be “invisible” to or undetectable. For example, aircraft invisible to electromagnetic radiation is less likely to be spotted on a radar system, which can be desirable in some applications.
  • Conventional approaches have utilized oxide or dielectric absorbent coatings comprising ferromagnetic materials to reduce reflection of electromagnetic waves. However, a ferromagnetic material loses its characteristic ferromagnetic ability at temperatures above the Curie temperature for that material, causing the net magnetization of the ferromagnetic material to be zero.
  • a dielectric absorber capable of uniformly absorbing electromagnetic radiation.
  • one conventional method for shielding an aircraft from electromagnetic radiation utilizes a single material dielectric absorber coated on the aircraft.
  • many components of an aircraft can reach temperatures in excess of the effective electromagnetic absorption temperature, causing the absorber coating to be ineffective at absorbing electromagnetic radiation at that temperature.
  • a single material dielectric absorber is ineffective at providing uniform electromagnetic radiation absorption over the entire temperature range.
  • a wide temperature range dielectric absorber substantially as shown in and/or described in connection with at least one of the figures, and as set forth more completely in the claims.
  • FIG. 1 shows a ternary phase diagram of dielectric absorbers in accordance with one embodiment of the present invention.
  • FIG. 2 is a plot displaying the absorption characteristics of dielectric absorbers in accordance with one embodiment of the present invention.
  • the present invention is directed to a wide temperature range dielectric absorber.
  • the principles of the invention, as defined by the claims appended herein, can obviously be applied beyond the specifically described embodiments of the invention described herein.
  • certain details have been left out in order to not obscure the inventive aspects of the invention. The details left out are within the knowledge of a person of ordinary skill in the art.
  • FIG. 1 represents ternary phase diagram 100 at 1100° C. in air of a ternary system including a primary component group of lanthanum oxide, strontium oxide, and cobalt oxide, in accordance with one embodiment of the present invention.
  • Ternary phase diagram 100 further includes trapezoidal dielectric region 108 , which is bounded by points 110 , 112 , 114 , and 116 .
  • line 118 extends from point 112 to point 114
  • line 120 extends from point 110 to point 116
  • line 122 extends along line 124 from point 114 to point 116
  • line 126 extends from point 112 to point 110 .
  • Line 118 represents the upper bound of trapezoidal dielectric region 108 , and extends from point 112 to point 114 .
  • the chemical formula of the composition along line 118 is La 1-x Sr x CoO 3 ⁇ y , where “x” can have a value ranging from 0 to 0.9.
  • the value of “x” is one factor in determining the value of “y,” which is largely based on the oxidation state of the cobalt.
  • the composition along line 118 has the perovskite crystalline structure.
  • the chemical formula of the composition at point 112 is known to be LaCoO 3 , and does not contain any strontium oxide because it lies on the line between lanthanum oxide vertex 102 and cobalt oxide vertex 106 .
  • Moving from point 112 towards point 114 along line 118 changes the chemical composition of the ternary system by increasing the mole percent of strontium oxide in the composition and decreasing the mole percent of lanthanum oxide in the composition.
  • the mole percent of cobalt oxide in the composition remains constant along line 118 .
  • Line 120 represents the lower bound of trapezoidal dielectric region 108 , and extends from point 110 to point 116 .
  • the chemical formula of the composition along line 120 is La 2-x Sr x CoO 4 ⁇ y , where “x” can have a value ranging from 0 to 0.9.
  • the value of “x” is one factor in determining the value of “y,” which is largely based on the oxidation state of the cobalt.
  • the composition along line 120 has the potassium nickel fluoride crystalline structure.
  • the chemical formula of the composition at point 110 is known to be La 2 CoO 4 , and does not contain any strontium oxide because it lies on the line between lanthanum oxide vertex 102 and cobalt oxide vertex 106 .
  • Moving from point 110 towards point 116 along line 120 changes the chemical composition of the ternary system by increasing the mole percent of strontium oxide in the composition and decreasing the mole percent of lanthanum oxide in the composition.
  • the mole percent of cobalt oxide in the composition remains constant along line 120 .
  • Line 122 represents the right-hand bound of trapezoidal dielectric region 108 , and extends from point 114 to point 116 along line 124 .
  • Line 124 is created by drawing a line from the cobalt oxide vertex 106 through the 90 mole percent marker on the line between lanthanum oxide vertex 102 and strontium oxide vertex 104 .
  • Line 124 intersects line 118 at point 114 , and intersects line 120 at point 116 .
  • Line 126 represents the left-hand bound of trapezoidal dielectric region 108 , and extends from point 112 to point 110 along the line between lanthanum oxide vertex 102 and cobalt oxide vertex 106 .
  • Line 126 intersects line 118 at point 112 , and intersects line 120 at point 110 .
  • the composition represented by line 126 contains only lanthanum oxide and cobalt oxide.
  • any point within the portion of trapezoidal dielectric region 108 that is below line 118 and above line 120 represents a composition that includes either the perovskite crystalline structure or the potassium nickel fluoride crystalline structure, or both.
  • the chemistry of the composition represented by trapezoidal dielectric region 108 is unique in that two independent phases (i.e., the perovskite crystalline structure and the potassium nickel fluoride crystalline structure) co-exist together in a single composition.
  • the mole percent of the individual oxides (i.e., lanthanum oxide, strontium oxide, and cobalt oxide) in the composition depends on the specific location selected within trapezoidal dielectric region 108 .
  • the mole percent of cobalt oxide in the composition increases towards line 118 and decreases towards line 120 .
  • moving from line 126 towards line 122 increases the mole percent of strontium oxide in the composition and decreases the mole percent of lanthanum oxide in the composition.
  • the formula (1-z)[La 1-x Sr x CoO 3 ⁇ y ]z[La 2-x Sr x CoO 4 ⁇ y ] represents the chemical composition of any point within trapezoidal dielectric region 108 .
  • “x” can have a value ranging from 0 to 0.9
  • “z” can have a value ranging from 0 to 1.
  • the value of “x” is one factor in determining the value of “y,” which is largely based on the oxidation state of the cobalt.
  • ternary phase diagram 100 represents a composition of lanthanum oxide, strontium oxide, and cobalt oxide.
  • the portion of ternary phase diagram 100 found within trapezoidal dielectric region 108 represents a stable composition of these oxides and forms either the perovskite or the potassium nickel fluoride crystalline structure, or both.
  • Each individual phase contains two different valence states of cobalt allowing for different absorption mechanisms.
  • the embodiment of the invention in FIG. 1 advantageously creates a two-phase oxide dielectric absorber (i.e.
  • a two-phase oxide material or coating with a flatter curve for absorption of electromagnetic waves or light over a wider range of temperatures.
  • This is called a two-phase oxide dielectric absorber because two atomic arrangements exist in the composition (i.e., both the perovskite and potassium nickel fluoride crystalline structures). Because the two arrangements are chemically compatible throughout the entire temperature range (i.e. up to 1100° C.), they are able to co-exist together and do not react to form a third phase.
  • FIG. 2 shows plot 200 displaying the absorption characteristics of dielectric absorbers, in accordance with one embodiment of the present invention.
  • Plot 200 displays the percentage of absorption of electromagnetic radiation as temperature increases for single-phase dielectric absorption material 102 , single-phase dielectric absorption material 204 , and two-phase dielectric absorption material 206 .
  • single-phase dielectric absorption material 202 absorbs a high percentage of electromagnetic radiation from temperature 208 to temperature 210 .
  • single-phase dielectric absorption material 202 might effectively absorb electromagnetic radiation from 700° C. to 900° C.
  • single-phase dielectric absorption material 202 does not effectively absorb electromagnetic radiation, as the absorption curve tapers off.
  • single-phase dielectric absorption material 204 displays a high percentage of electromagnetic absorption from temperature 210 to temperature 212 .
  • single-phase dielectric absorption material 204 might effectively absorb electromagnetic radiation from 900° C. to 1100° C.
  • single-phase dielectric absorption material 204 does not effectively absorb electromagnetic radiation, as the absorption curve tapers off.
  • An embodiment of the present invention effectively combines two single-phase dielectric absorption materials, such as single-phase dielectric absorption materials 202 and 204 , to form two-phase dielectric absorption material 206 with a very broad temperature range of absorption.
  • two single-phase dielectric absorption materials 202 and 204 to form two-phase dielectric absorption material 206 , the temperature range of absorption can be expanded to 700° C. to 1100° C. Since two-phase dielectric absorption material 206 provides uniform absorption of electromagnetic radiation across a broader temperature range, the present invention advantageously provides for more effective electromagnetic absorption in high temperature applications.
  • Two-phase dielectric absorption material 206 includes both the perovskite crystalline structure and the potassium nickel fluoride crystalline structure, so two atomic arrangements exist in two-phase dielectric absorption material 206 . Because the two arrangements are chemically compatible throughout the entire temperature range (i.e. up to 1100° C.), they are able to co-exist together and do not react to form a third phase.

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)

Abstract

According to one exemplary embodiment, a wide temperature range dielectric absorber includes a dielectric absorber comprising a blend of lanthanum oxide, strontium oxide, and cobalt oxide, and is represented by (1-z)[La1-xSrxCoO3±y]+z[La2-xSrxCoO4±y]. The dielectric absorber includes a first crystalline structure existing independently from a second crystalline structure causing the dielectric absorption composition to have a wide temperature range of electromagnetic radiation absorption. In one embodiment, the first crystalline structure is a perovskite crystalline structure and the second crystalline structure is a potassium nickel fluoride crystalline structure.

Description

  • The present application claims the benefit of and priority to a pending provisional patent application entitled “High Temperature Dielectric Absorber,” Ser. No. 60/811,919 filed on Jun. 8, 2006. The disclosure in that pending provisional application is hereby incorporated fully by reference into the present application.
  • BACKGROUND OF THE INVENTION
  • 1. Field of the Invention
  • The present invention relates to the field of dielectric absorbers. More specifically, the invention relates to dielectric absorbers of electromagnetic radiation.
  • 2. Background Art
  • In many applications, such as aviation applications, it can be desirable for a structure to be “invisible” to or undetectable. For example, aircraft invisible to electromagnetic radiation is less likely to be spotted on a radar system, which can be desirable in some applications. Conventional approaches have utilized oxide or dielectric absorbent coatings comprising ferromagnetic materials to reduce reflection of electromagnetic waves. However, a ferromagnetic material loses its characteristic ferromagnetic ability at temperatures above the Curie temperature for that material, causing the net magnetization of the ferromagnetic material to be zero.
  • In applications subjected to a broad temperature range including very high temperatures, such as up to 1100° C., it has proven very difficult to provide a dielectric absorber capable of uniformly absorbing electromagnetic radiation. For example, one conventional method for shielding an aircraft from electromagnetic radiation utilizes a single material dielectric absorber coated on the aircraft. However, many components of an aircraft can reach temperatures in excess of the effective electromagnetic absorption temperature, causing the absorber coating to be ineffective at absorbing electromagnetic radiation at that temperature. Furthermore, in applications subjected to a very broad temperature range, a single material dielectric absorber is ineffective at providing uniform electromagnetic radiation absorption over the entire temperature range.
  • Thus there is a need in the art for a high temperature dielectric absorber with a wider temperature range of electromagnetic absorption.
  • SUMMARY OF THE INVENTION
  • A wide temperature range dielectric absorber, substantially as shown in and/or described in connection with at least one of the figures, and as set forth more completely in the claims.
  • BRIEF DESCRIPTION OF THE DRAWINGS
  • FIG. 1 shows a ternary phase diagram of dielectric absorbers in accordance with one embodiment of the present invention.
  • FIG. 2 is a plot displaying the absorption characteristics of dielectric absorbers in accordance with one embodiment of the present invention.
  • DETAILED DESCRIPTION OF THE INVENTION
  • The present invention is directed to a wide temperature range dielectric absorber. Although the invention is described with respect to specific embodiments, the principles of the invention, as defined by the claims appended herein, can obviously be applied beyond the specifically described embodiments of the invention described herein. Moreover, in the description of the present invention, certain details have been left out in order to not obscure the inventive aspects of the invention. The details left out are within the knowledge of a person of ordinary skill in the art.
  • The drawings in the present application and their accompanying detailed description are directed to merely exemplary embodiments of the invention. To maintain brevity, other embodiments of the invention which use the principles of the present invention are not specifically described in the present application and are not specifically illustrated by the present drawings.
  • FIG. 1 represents ternary phase diagram 100 at 1100° C. in air of a ternary system including a primary component group of lanthanum oxide, strontium oxide, and cobalt oxide, in accordance with one embodiment of the present invention. Ternary phase diagram 100 further includes trapezoidal dielectric region 108, which is bounded by points 110, 112, 114, and 116. In the present embodiment, line 118 extends from point 112 to point 114, line 120 extends from point 110 to point 116, line 122 extends along line 124 from point 114 to point 116, and line 126 extends from point 112 to point 110.
  • Line 118 represents the upper bound of trapezoidal dielectric region 108, and extends from point 112 to point 114. The chemical formula of the composition along line 118 is La1-xSrxCoO3±y, where “x” can have a value ranging from 0 to 0.9. The value of “x” is one factor in determining the value of “y,” which is largely based on the oxidation state of the cobalt. In the present embodiment, the composition along line 118 has the perovskite crystalline structure. The chemical formula of the composition at point 112 is known to be LaCoO3, and does not contain any strontium oxide because it lies on the line between lanthanum oxide vertex 102 and cobalt oxide vertex 106. Moving from point 112 towards point 114 along line 118 changes the chemical composition of the ternary system by increasing the mole percent of strontium oxide in the composition and decreasing the mole percent of lanthanum oxide in the composition. The mole percent of cobalt oxide in the composition remains constant along line 118.
  • Line 120 represents the lower bound of trapezoidal dielectric region 108, and extends from point 110 to point 116. The chemical formula of the composition along line 120 is La2-xSrxCoO4±y, where “x” can have a value ranging from 0 to 0.9. The value of “x” is one factor in determining the value of “y,” which is largely based on the oxidation state of the cobalt. In the present embodiment, the composition along line 120 has the potassium nickel fluoride crystalline structure. The chemical formula of the composition at point 110 is known to be La2CoO4, and does not contain any strontium oxide because it lies on the line between lanthanum oxide vertex 102 and cobalt oxide vertex 106. Moving from point 110 towards point 116 along line 120 changes the chemical composition of the ternary system by increasing the mole percent of strontium oxide in the composition and decreasing the mole percent of lanthanum oxide in the composition. The mole percent of cobalt oxide in the composition remains constant along line 120.
  • Line 122 represents the right-hand bound of trapezoidal dielectric region 108, and extends from point 114 to point 116 along line 124. Line 124 is created by drawing a line from the cobalt oxide vertex 106 through the 90 mole percent marker on the line between lanthanum oxide vertex 102 and strontium oxide vertex 104. Line 124 intersects line 118 at point 114, and intersects line 120 at point 116.
  • Line 126 represents the left-hand bound of trapezoidal dielectric region 108, and extends from point 112 to point 110 along the line between lanthanum oxide vertex 102 and cobalt oxide vertex 106. Line 126 intersects line 118 at point 112, and intersects line 120 at point 110. The composition represented by line 126 contains only lanthanum oxide and cobalt oxide.
  • In the present embodiment, any point within the portion of trapezoidal dielectric region 108 that is below line 118 and above line 120 represents a composition that includes either the perovskite crystalline structure or the potassium nickel fluoride crystalline structure, or both. The chemistry of the composition represented by trapezoidal dielectric region 108 is unique in that two independent phases (i.e., the perovskite crystalline structure and the potassium nickel fluoride crystalline structure) co-exist together in a single composition. The mole percent of the individual oxides (i.e., lanthanum oxide, strontium oxide, and cobalt oxide) in the composition depends on the specific location selected within trapezoidal dielectric region 108. For example, the mole percent of cobalt oxide in the composition increases towards line 118 and decreases towards line 120. Similarly, moving from line 126 towards line 122 increases the mole percent of strontium oxide in the composition and decreases the mole percent of lanthanum oxide in the composition. The formula (1-z)[La1-xSrxCoO3±y]z[La2-xSrxCoO4±y] represents the chemical composition of any point within trapezoidal dielectric region 108. In this formula, “x” can have a value ranging from 0 to 0.9, and “z” can have a value ranging from 0 to 1. The value of “x” is one factor in determining the value of “y,” which is largely based on the oxidation state of the cobalt.
  • In the embodiment of the present invention in FIG. 1, ternary phase diagram 100 represents a composition of lanthanum oxide, strontium oxide, and cobalt oxide. The portion of ternary phase diagram 100 found within trapezoidal dielectric region 108 represents a stable composition of these oxides and forms either the perovskite or the potassium nickel fluoride crystalline structure, or both. Each individual phase contains two different valence states of cobalt allowing for different absorption mechanisms. In addition, by combining these chemically compatible materials that have different temperature-dependent properties for absorption of light or other electromagnetic waves, such as those generated and used in the radar technology, the embodiment of the invention in FIG. 1 advantageously creates a two-phase oxide dielectric absorber (i.e. a two-phase oxide material or coating) with a flatter curve for absorption of electromagnetic waves or light over a wider range of temperatures. This is called a two-phase oxide dielectric absorber because two atomic arrangements exist in the composition (i.e., both the perovskite and potassium nickel fluoride crystalline structures). Because the two arrangements are chemically compatible throughout the entire temperature range (i.e. up to 1100° C.), they are able to co-exist together and do not react to form a third phase.
  • FIG. 2 shows plot 200 displaying the absorption characteristics of dielectric absorbers, in accordance with one embodiment of the present invention. Plot 200 displays the percentage of absorption of electromagnetic radiation as temperature increases for single-phase dielectric absorption material 102, single-phase dielectric absorption material 204, and two-phase dielectric absorption material 206.
  • As shown in FIG. 2, single-phase dielectric absorption material 202 absorbs a high percentage of electromagnetic radiation from temperature 208 to temperature 210. For example, single-phase dielectric absorption material 202 might effectively absorb electromagnetic radiation from 700° C. to 900° C. As shown in FIG. 2, once the temperature increases beyond temperature 210, single-phase dielectric absorption material 202 does not effectively absorb electromagnetic radiation, as the absorption curve tapers off. Similarly, single-phase dielectric absorption material 204 displays a high percentage of electromagnetic absorption from temperature 210 to temperature 212. For example, single-phase dielectric absorption material 204 might effectively absorb electromagnetic radiation from 900° C. to 1100° C. As shown in FIG. 2, once the temperature increases beyond temperature 212, single-phase dielectric absorption material 204 does not effectively absorb electromagnetic radiation, as the absorption curve tapers off.
  • An embodiment of the present invention, as shown in FIG. 2, effectively combines two single-phase dielectric absorption materials, such as single-phase dielectric absorption materials 202 and 204, to form two-phase dielectric absorption material 206 with a very broad temperature range of absorption. For example, by combining single-phase dielectric absorption materials 202 and 204 to form two-phase dielectric absorption material 206, the temperature range of absorption can be expanded to 700° C. to 1100° C. Since two-phase dielectric absorption material 206 provides uniform absorption of electromagnetic radiation across a broader temperature range, the present invention advantageously provides for more effective electromagnetic absorption in high temperature applications. Two-phase dielectric absorption material 206 includes both the perovskite crystalline structure and the potassium nickel fluoride crystalline structure, so two atomic arrangements exist in two-phase dielectric absorption material 206. Because the two arrangements are chemically compatible throughout the entire temperature range (i.e. up to 1100° C.), they are able to co-exist together and do not react to form a third phase.
  • From the above description of the invention it is manifest that various techniques can be used for implementing the concepts of the present invention without departing from its scope. Moreover, while the invention has been described with specific reference to certain embodiments, a person of ordinary skill in the art would appreciate that changes can be made in form and detail without departing from the spirit and the scope of the invention. Thus, the described embodiments are to be considered in all respects as illustrative and not restrictive. It should also be understood that the invention is not limited to the particular embodiments described herein but is capable of many rearrangements, modifications, and substitutions without departing from the scope of the invention.
  • Thus, wide temperature range dielectric absorber has been described.

Claims (2)

1.-21. (canceled)
22. A single-phase dielectric absorber selected from the group consisting of [La1-xSrxCoO3±y] and [La2-xSrxCoO4±y], wherein cobalt exhibits two or more oxidation states.
US12/619,453 2006-06-08 2009-11-16 Wide temperature range dielectric absorber Abandoned US20100068112A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US12/619,453 US20100068112A1 (en) 2006-06-08 2009-11-16 Wide temperature range dielectric absorber

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US81191906P 2006-06-08 2006-06-08
US11/731,658 US7633424B1 (en) 2006-06-08 2007-03-30 Wide temperature range dielectric absorber
US12/619,453 US20100068112A1 (en) 2006-06-08 2009-11-16 Wide temperature range dielectric absorber

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
US11/731,658 Division US7633424B1 (en) 2006-06-08 2007-03-30 Wide temperature range dielectric absorber

Publications (1)

Publication Number Publication Date
US20100068112A1 true US20100068112A1 (en) 2010-03-18

Family

ID=41403279

Family Applications (2)

Application Number Title Priority Date Filing Date
US11/731,658 Active 2027-09-24 US7633424B1 (en) 2006-06-08 2007-03-30 Wide temperature range dielectric absorber
US12/619,453 Abandoned US20100068112A1 (en) 2006-06-08 2009-11-16 Wide temperature range dielectric absorber

Family Applications Before (1)

Application Number Title Priority Date Filing Date
US11/731,658 Active 2027-09-24 US7633424B1 (en) 2006-06-08 2007-03-30 Wide temperature range dielectric absorber

Country Status (1)

Country Link
US (2) US7633424B1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007036154A (en) * 2005-07-29 2007-02-08 Bussan Nanotech Research Institute Inc Electromagnetic wave absorber
US9828658B2 (en) 2013-08-13 2017-11-28 Rolls-Royce Corporation Composite niobium-bearing superalloys
US9938610B2 (en) 2013-09-20 2018-04-10 Rolls-Royce Corporation High temperature niobium-bearing superalloys

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5644838A (en) * 1995-01-03 1997-07-08 Texas Instruments Incorporated Method of fabricating a focal plane array for hybrid thermal imaging system
US5757000A (en) * 1996-04-09 1998-05-26 Texas Instruments Incorporated Reduced stress focal plane array for thermal imaging system and method
US5847390A (en) * 1996-04-09 1998-12-08 Texas Instruments Incorporated Reduced stress electrode for focal plane array of thermal imaging system and method
US5949071A (en) * 1997-08-14 1999-09-07 Sandia Corporation Uncooled thin film pyroelectric IR detector with aerogel thermal isolation
US6361825B1 (en) * 1995-06-07 2002-03-26 Texas Instruments Incorporated Micro-bolometer cell structure
US20040182306A1 (en) * 2003-03-21 2004-09-23 Butt Darryl Paul Method of forming a joint
US6802987B1 (en) * 1998-10-22 2004-10-12 Texas Instruments Incorporated Integrated circuit ferroelectric infrared detector and method
US6884631B2 (en) * 2002-03-29 2005-04-26 Seiko Epson Corporation Method of forming a ferroelectric film by direct annealing of the ferroelectric film using laser or lamp followed by a second annealing through a light transmission and/or absorption film
US6924155B2 (en) * 2002-08-14 2005-08-02 Seiko Epson Corporation Ferroelectric memory, method of fabricating the same, semiconductor device, and method of fabricating the same
US6966998B1 (en) * 1998-11-06 2005-11-22 Alexander Rollo Spowart Security printing

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5644838A (en) * 1995-01-03 1997-07-08 Texas Instruments Incorporated Method of fabricating a focal plane array for hybrid thermal imaging system
US5743006A (en) * 1995-01-03 1998-04-28 Texas Instruments Incorporated Method for fabricating a focal plane array for thermal imaging system
US6361825B1 (en) * 1995-06-07 2002-03-26 Texas Instruments Incorporated Micro-bolometer cell structure
US5757000A (en) * 1996-04-09 1998-05-26 Texas Instruments Incorporated Reduced stress focal plane array for thermal imaging system and method
US5847390A (en) * 1996-04-09 1998-12-08 Texas Instruments Incorporated Reduced stress electrode for focal plane array of thermal imaging system and method
US5949071A (en) * 1997-08-14 1999-09-07 Sandia Corporation Uncooled thin film pyroelectric IR detector with aerogel thermal isolation
US6802987B1 (en) * 1998-10-22 2004-10-12 Texas Instruments Incorporated Integrated circuit ferroelectric infrared detector and method
US6966998B1 (en) * 1998-11-06 2005-11-22 Alexander Rollo Spowart Security printing
US6884631B2 (en) * 2002-03-29 2005-04-26 Seiko Epson Corporation Method of forming a ferroelectric film by direct annealing of the ferroelectric film using laser or lamp followed by a second annealing through a light transmission and/or absorption film
US6924155B2 (en) * 2002-08-14 2005-08-02 Seiko Epson Corporation Ferroelectric memory, method of fabricating the same, semiconductor device, and method of fabricating the same
US20040182306A1 (en) * 2003-03-21 2004-09-23 Butt Darryl Paul Method of forming a joint

Also Published As

Publication number Publication date
US7633424B1 (en) 2009-12-15

Similar Documents

Publication Publication Date Title
US9123460B2 (en) Ferrite composition for high frequency bead and chip bead comprising the same
Li et al. Attractive microwave-absorbing properties of La1− xSrxMnO3 manganite powders
Sundarayya et al. Mössbauer spectroscopic study of spin reorientation in Mn-substituted yttrium orthoferrite
KR101470901B1 (en) Heat-reflecting film with the visibility improvement and the thermal barrier and thermal insulation characteristics
US7633424B1 (en) Wide temperature range dielectric absorber
KR102450588B1 (en) Radio wave absorbing laminated film, manufacturing method thereof, and device comprising same
Yu et al. Stochastic resonance in the fractional Langevin equation driven by multiplicative noise and periodically modulated noise
Yakita et al. Co and Mn doping effect in polycrystalline (Ca, La) and (Ca, Pr) FeAs2 superconductors
Sahoo et al. Influence of compositional variation on structural, electrical and magnetic characteristics of (Ba1− xGd)(Ti1− xFex) O3 (0.2≤ x≤ 0.5)
Jiang et al. Microwave absorbing properties of La0. 1Ca0. 9MnO3 porous microsphere synthesized by method of precipitation
Bai et al. Charge trapping memory device based on the Ga2O3 films as trapping and blocking layer
Kumar et al. Magnetothermopower, magnetoresistance and magnetothermal conductivity in La0. 95Sr0. 05Co1− xMnxO3 (0.00≤ x≤ 1.00)
Kaur et al. Influence of Co-In doping in M-type barium–strontium hexagonal ferrite on microwave absorption
Bai et al. Regulation of depletion layer width in Pb (Zr, Ti) O3/Nb: SrTiO3 heterostructures
Wang et al. Superconductivity in the ternary iridium–arsenide BaIr2As2
Mahmood et al. Theoretical investigation of optical properties and band gap engineering for Zn1− xTMxTe (TM= Fe, Co) alloys by modified Becke–Johnson potential
Kobayashi et al. Crystal structure determination under high pressure in the iron-based ladder superconductor BaFe2S3
Li et al. High-temperature thermoelectric properties of Ca0. 92La0. 04RE0. 04MnO3 (RE= Sm, Dy and Yb) prepared by coprecipitation
Hatano et al. Investigation of displacement property and electric reliability of (Li, Na, K) NbO3-based multilayer piezoceramics
Kaur et al. Modulation of microwave properties of La–Sr hexagonal ferrite with doping of Co–Zr and change in thickness
Khan et al. Enhanced energy storage properties of La3+ modified 0.92 Bi0. 5Na0. 5TiO3-0.06 Ba (Zr0. 2Ti0. 8) O3-0.02 NaNbO3 ternary ceramic system
Sharbati et al. Effect of Ho3+ substitution on magnetic and microwave absorption properties of Sr (ZnZr) 0.5 Fe12O19 hexagonal ferrite nanoparticles
Chen et al. Ferroelectricity of pristine Hf0. 5Zr0. 5O2 films fabricated by atomic layer deposition
Tanaka et al. Mössbauer spectra and electric properties of 57Fe-enriched BiFeO3 thin films
CN108483500B (en) A novel rare earth doped apatite structure wave absorbing material, preparation method and application thereof

Legal Events

Date Code Title Description
STCB Information on status: application discontinuation

Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION

AS Assignment

Owner name: TRANS-TECH, INC., MARYLAND

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:SKYWORKS SOLUTIONS, INC.;REEL/FRAME:037974/0433

Effective date: 20151015

AS Assignment

Owner name: SKYWORKS SOLUTIONS, INC., MASSACHUSETTS

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:TRANS-TECH, INC.;REEL/FRAME:038260/0189

Effective date: 20151027

AS Assignment

Owner name: TRANS-TECH, INC., MARYLAND

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:SKYWORKS SOLUTIONS, INC.;REEL/FRAME:063727/0270

Effective date: 20230407

AS Assignment

Owner name: ALLUMAX TTI, LLC, MICHIGAN

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:TRANS-TECH, INC.;REEL/FRAME:063991/0097

Effective date: 20230407