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WO1992003841A3 - Device for evaporating material by means of a vacuum arc discharge and process - Google Patents

Device for evaporating material by means of a vacuum arc discharge and process Download PDF

Info

Publication number
WO1992003841A3
WO1992003841A3 PCT/EP1991/001446 EP9101446W WO9203841A3 WO 1992003841 A3 WO1992003841 A3 WO 1992003841A3 EP 9101446 W EP9101446 W EP 9101446W WO 9203841 A3 WO9203841 A3 WO 9203841A3
Authority
WO
WIPO (PCT)
Prior art keywords
automatically consumed
arc discharge
vacuum arc
hot
anode
Prior art date
Application number
PCT/EP1991/001446
Other languages
German (de)
French (fr)
Other versions
WO1992003841A2 (en
Inventor
Horst Ehrich
Brunhilde Hasse
Michael Mausbach
Original Assignee
Ehrich Plasma Coating
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ehrich Plasma Coating filed Critical Ehrich Plasma Coating
Publication of WO1992003841A2 publication Critical patent/WO1992003841A2/en
Publication of WO1992003841A3 publication Critical patent/WO1992003841A3/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325Electric arc evaporation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055Arc discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32532Electrodes
    • H01J37/32614Consumable cathodes for arc discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32623Mechanical discharge control means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32Processing objects by plasma generation
    • H01J2237/33Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332Coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention describes a device for evaporating material by means of a vacuum arch discharge with an automatically consumed cathode and an automatically consumed hot anode in an underpressure chamber and a process for increasing the usefull life of electrodes in material evaporation by means of a vacuum arc discharge with a hot automatically consumed anode and a cold automatically consumed cathode, a process for striking a vacuum arc discharge with a cold automatically consumed cathode and a hot automatically consumed anode and a process for controlling the degree of ionisation of the vapour impinging on an object to be coated in surface coating by means of a vacuum arc discharge with a cold automatically consumed cathode and a hot automatically consumed anode.
PCT/EP1991/001446 1990-08-22 1991-08-01 Device for evaporating material by means of a vacuum arc discharge and process WO1992003841A2 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE4026494A DE4026494A1 (en) 1990-08-22 1990-08-22 DEVICE FOR EVAPORATING MATERIAL BY VACUUM ARC DISCHARGE AND METHOD
DEP4026494.7 1990-08-22
DE4042337A DE4042337C1 (en) 1990-08-22 1990-08-22 Controlling degree of ionisation of vapour for surface coating - by preventing straight line current flow between hot anode target surface and cold cathode by using movable wall between them

Publications (2)

Publication Number Publication Date
WO1992003841A2 WO1992003841A2 (en) 1992-03-05
WO1992003841A3 true WO1992003841A3 (en) 1992-04-16

Family

ID=39523631

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP1991/001446 WO1992003841A2 (en) 1990-08-22 1991-08-01 Device for evaporating material by means of a vacuum arc discharge and process

Country Status (3)

Country Link
AU (1) AU8291191A (en)
DE (2) DE4026494A1 (en)
WO (1) WO1992003841A2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6982119B2 (en) 2002-04-15 2006-01-03 The Coca-Cola Company Coating composition containing an epoxide additive and structures coated therewith

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4200429A1 (en) * 1992-01-10 1993-07-15 Ehrich Plasma Coating METHOD FOR IONIZING THERMALLY PRODUCED MATERIAL STEAMS AND DEVICE FOR IMPLEMENTING THE METHOD
DE4203371C1 (en) * 1992-02-06 1993-02-25 Multi-Arc Oberflaechentechnik Gmbh, 5060 Bergisch Gladbach, De
DE4223091C1 (en) * 1992-07-14 1993-07-01 Vtd-Vakuumtechnik Dresden Gmbh, O-8017 Dresden, De Water cooled holder for inserted exchangeable target - comprises housing, cooling plate and axially freely movable metal bellows, vacuum arc discharge vapour deposition appts.
DE4409761B4 (en) * 1994-03-22 2007-12-27 Vtd Vakuumtechnik Dresden Gmbh Device for plasma assisted evaporation in an arc discharge plasma
DE4444763C2 (en) * 1994-12-19 1996-11-21 Apvv Angewandte Plasma Vakuum Electrode for material evaporation for the coating of substrates
DE19600993A1 (en) * 1995-01-13 1996-08-08 Technics Plasma Gmbh Appts. for high rate anodic evapn. for substrate coating
DE19521419C2 (en) * 1995-06-14 1997-11-27 Plasma Applikation Mbh Ges Evaporator unit for the evaporation of materials in an electrical vacuum arc
US6223683B1 (en) 1997-03-14 2001-05-01 The Coca-Cola Company Hollow plastic containers with an external very thin coating of low permeability to gases and vapors through plasma-assisted deposition of inorganic substances and method and system for making the coating
US6251233B1 (en) 1998-08-03 2001-06-26 The Coca-Cola Company Plasma-enhanced vacuum vapor deposition system including systems for evaporation of a solid, producing an electric arc discharge and measuring ionization and evaporation
EP1103630B1 (en) * 1999-11-17 2003-12-17 Applied Films GmbH & Co. KG Electrode assembly
US6740378B1 (en) 2000-08-24 2004-05-25 The Coca-Cola Company Multilayer polymeric/zero valent material structure for enhanced gas or vapor barrier and uv barrier and method for making same
US6720052B1 (en) 2000-08-24 2004-04-13 The Coca-Cola Company Multilayer polymeric/inorganic oxide structure with top coat for enhanced gas or vapor barrier and method for making same
US6599584B2 (en) 2001-04-27 2003-07-29 The Coca-Cola Company Barrier coated plastic containers and coating methods therefor
DE102020124270A1 (en) 2020-09-17 2022-03-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein Process and device for anodic arc evaporation
DE102024107070A1 (en) * 2024-03-12 2025-09-18 Oerlikon Surface Solutions AG, Pfäffikon, Zweigniederlassung Balzers ARC source with confinement ring system with variable height

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2106545A (en) * 1981-02-23 1983-04-13 Rimma Ivanovna Stupak Consumable cathode for electric-arc evaporator of metal
DE3239131A1 (en) * 1982-10-22 1984-04-26 Ulrich 8950 Kaufbeuren Goetz Process for the thermal vaporisation of metals in vacuo
EP0158972A2 (en) * 1984-04-12 1985-10-23 Plasco Dr. Ehrich Plasma-Coating GmbH Method and apparatus for the vaporisation of a material in a vacuum chamber by an arc discharge
EP0277341A2 (en) * 1987-02-03 1988-08-10 Balzers Aktiengesellschaft Device for the application of an arc
DE3829260A1 (en) * 1988-08-29 1990-03-01 Multi Arc Gmbh Plasma-coating chamber with removable guard screen
JPH06149358A (en) * 1992-11-13 1994-05-27 Matsushita Electric Works Ltd Mobile robot

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1496697A (en) * 1965-10-20 1967-09-29 Gen Precision Inc Apparatus for coating the surface of a substrate
US3562141A (en) * 1968-02-23 1971-02-09 John R Morley Vacuum vapor deposition utilizing low voltage electron beam
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
US4197157A (en) * 1975-03-19 1980-04-08 Arthur D. Little, Inc. Method for forming refractory tubing
AT376460B (en) * 1982-09-17 1984-11-26 Kljuchko Gennady V PLASMA ARC DEVICE FOR APPLYING COVERS

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2106545A (en) * 1981-02-23 1983-04-13 Rimma Ivanovna Stupak Consumable cathode for electric-arc evaporator of metal
DE3239131A1 (en) * 1982-10-22 1984-04-26 Ulrich 8950 Kaufbeuren Goetz Process for the thermal vaporisation of metals in vacuo
EP0158972A2 (en) * 1984-04-12 1985-10-23 Plasco Dr. Ehrich Plasma-Coating GmbH Method and apparatus for the vaporisation of a material in a vacuum chamber by an arc discharge
EP0277341A2 (en) * 1987-02-03 1988-08-10 Balzers Aktiengesellschaft Device for the application of an arc
DE3829260A1 (en) * 1988-08-29 1990-03-01 Multi Arc Gmbh Plasma-coating chamber with removable guard screen
JPH06149358A (en) * 1992-11-13 1994-05-27 Matsushita Electric Works Ltd Mobile robot

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Patent Abstracts of Japan, Band 10, Nr. 209 (E-421)[2265], 22. Juli 1986; & JP, A, 6149358 (SEIKO EPSON CORP.) 11. März 1986, siehe das ganze Dokument *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6982119B2 (en) 2002-04-15 2006-01-03 The Coca-Cola Company Coating composition containing an epoxide additive and structures coated therewith

Also Published As

Publication number Publication date
AU8291191A (en) 1992-03-17
WO1992003841A2 (en) 1992-03-05
DE4042337C1 (en) 1991-09-12
DE4026494A1 (en) 1992-02-27
DE4026494C2 (en) 1992-05-21

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