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WO2003038479A3 - Structures et procedes de reduction d'aberration dans des systemes optiques - Google Patents

Structures et procedes de reduction d'aberration dans des systemes optiques Download PDF

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Publication number
WO2003038479A3
WO2003038479A3 PCT/US2002/034828 US0234828W WO03038479A3 WO 2003038479 A3 WO2003038479 A3 WO 2003038479A3 US 0234828 W US0234828 W US 0234828W WO 03038479 A3 WO03038479 A3 WO 03038479A3
Authority
WO
WIPO (PCT)
Prior art keywords
structures
methods
retardance
optical systems
optical
Prior art date
Application number
PCT/US2002/034828
Other languages
English (en)
Other versions
WO2003038479A2 (fr
Inventor
James Mcguire Jr
Original Assignee
Optical Res Associates
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/178,935 external-priority patent/US6844972B2/en
Priority claimed from US10/178,937 external-priority patent/US6995908B2/en
Priority claimed from US10/178,601 external-priority patent/US7453641B2/en
Priority claimed from US10/178,621 external-priority patent/US6970232B2/en
Application filed by Optical Res Associates filed Critical Optical Res Associates
Priority to EP02795578A priority Critical patent/EP1451619A4/fr
Priority to AU2002360329A priority patent/AU2002360329A1/en
Priority to JP2003540693A priority patent/JP2005508018A/ja
Publication of WO2003038479A2 publication Critical patent/WO2003038479A2/fr
Publication of WO2003038479A3 publication Critical patent/WO2003038479A3/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Polarising Elements (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

L'invention concerne un système optique comprenant des éléments optiques cristallins cubiques multiples et au moins un rotateur de polarisation dans lequel les réseaux cristallins des éléments optiques cristallins cubiques sont orientés les uns par rapport aux autres, de sorte à réduire les effets de biréfringence intrinsèque et produire un système à retard réduit. Ce système optique peut être un système de réfraction ou un système catadioptrique comportant une ouverture numérique élevée et utilisant une lumière d'une longueur d'onde de 248 nanomètres ou inférieure. Le retard net du système est inférieur à la somme des contributions de retard des éléments optiques respectifs. Dans un mode de réalisation, tous les éléments optiques cristallins cubiques sont orientés selon des directions de réseaux cristallins cubiques tridimensionnels identiques, un rotateur de polarisation à 90° divise le système en groupe avant et groupe arrière, de sorte que le retard net du groupe avant est équilibré par le retard net du groupe arrière. Ce système optique peut être utilisé dans un outil de photolithographie destiné à former des motifs sur des substrats, tels que des substrats semiconducteurs, pour produire des dispositifs semiconducteurs.
PCT/US2002/034828 2001-10-30 2002-10-30 Structures et procedes de reduction d'aberration dans des systemes optiques WO2003038479A2 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP02795578A EP1451619A4 (fr) 2001-10-30 2002-10-30 Structures et procedes de reduction d'aberration dans des systemes optiques
AU2002360329A AU2002360329A1 (en) 2001-10-30 2002-10-30 Structures and methods for reducing aberration in optical systems
JP2003540693A JP2005508018A (ja) 2001-10-30 2002-10-30 光学系における収差を軽減する構造及び方法

Applications Claiming Priority (18)

Application Number Priority Date Filing Date Title
US33509301P 2001-10-30 2001-10-30
US60/335,093 2001-10-30
US33218301P 2001-11-21 2001-11-21
US60/332,183 2001-11-21
US36380802P 2002-03-12 2002-03-12
US60/363,808 2002-03-12
US36791102P 2002-03-26 2002-03-26
US60/367,911 2002-03-26
US38542702P 2002-05-31 2002-05-31
US60/385,427 2002-05-31
US10/178,621 2002-06-20
US10/178,935 US6844972B2 (en) 2001-10-30 2002-06-20 Reducing aberration in optical systems comprising cubic crystalline optical elements
US10/178,937 US6995908B2 (en) 2001-10-30 2002-06-20 Methods for reducing aberration in optical systems
US10/178,601 2002-06-20
US10/178,601 US7453641B2 (en) 2001-10-30 2002-06-20 Structures and methods for reducing aberration in optical systems
US10/178,935 2002-06-20
US10/178,937 2002-06-20
US10/178,621 US6970232B2 (en) 2001-10-30 2002-06-20 Structures and methods for reducing aberration in integrated circuit fabrication systems

Publications (2)

Publication Number Publication Date
WO2003038479A2 WO2003038479A2 (fr) 2003-05-08
WO2003038479A3 true WO2003038479A3 (fr) 2004-01-29

Family

ID=27578632

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2002/034828 WO2003038479A2 (fr) 2001-10-30 2002-10-30 Structures et procedes de reduction d'aberration dans des systemes optiques

Country Status (4)

Country Link
EP (1) EP1451619A4 (fr)
JP (1) JP2005508018A (fr)
AU (1) AU2002360329A1 (fr)
WO (1) WO2003038479A2 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7145720B2 (en) 2001-05-15 2006-12-05 Carl Zeiss Smt Ag Objective with fluoride crystal lenses
US7239447B2 (en) 2001-05-15 2007-07-03 Carl Zeiss Smt Ag Objective with crystal lenses

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10123725A1 (de) 2001-05-15 2002-11-21 Zeiss Carl Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren
JP3639807B2 (ja) 2001-06-27 2005-04-20 キヤノン株式会社 光学素子及び製造方法
US7292388B2 (en) 2002-05-08 2007-11-06 Carl Zeiss Smt Ag Lens made of a crystalline material
DE10328938A1 (de) 2003-06-27 2005-01-20 Carl Zeiss Smt Ag Korrektureinrichtung zur Kompensation von Störungen der Polarisationsverteilung sowie Projektionsobjektiv für die Mikrolithografie
KR101248328B1 (ko) * 2004-06-04 2013-04-01 칼 짜이스 에스엠티 게엠베하 강도 변동이 보상된 투사 시스템 및 이를 위한 보상 요소
DE102005030839A1 (de) * 2005-07-01 2007-01-11 Carl Zeiss Smt Ag Projektionsbelichtungsanlage mit einer Mehrzahl von Projektionsobjektiven
DE102007055063A1 (de) * 2007-11-16 2009-05-28 Carl Zeiss Smt Ag Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage
DE102007055567A1 (de) * 2007-11-20 2009-05-28 Carl Zeiss Smt Ag Optisches System

Citations (7)

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Publication number Priority date Publication date Assignee Title
US3758201A (en) * 1971-07-15 1973-09-11 American Optical Corp Optical system for improved eye refraction
US4239329A (en) * 1978-08-04 1980-12-16 Nippon Telegraph And Telephone Public Corporation Optical nonreciprocal device
US4534649A (en) * 1981-10-30 1985-08-13 Downs Michael J Surface profile interferometer
US4576479A (en) * 1982-05-17 1986-03-18 Downs Michael J Apparatus and method for investigation of a surface
US5033830A (en) * 1989-10-04 1991-07-23 At&T Bell Laboratories Polarization independent optical isolator
US5537260A (en) * 1993-01-26 1996-07-16 Svg Lithography Systems, Inc. Catadioptric optical reduction system with high numerical aperture
US6252712B1 (en) * 1998-02-20 2001-06-26 Carl-Zeiss-Stiftung Optical system with polarization compensator

Family Cites Families (9)

* Cited by examiner, † Cited by third party
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US3052152A (en) * 1959-03-27 1962-09-04 American Optical Corp Optical compensating system
US4918395A (en) * 1988-11-21 1990-04-17 Spectra-Physics Multipass laser amplifier with at least one expanded pass
JP3083957B2 (ja) * 1994-06-16 2000-09-04 株式会社ニコン 光リソグラフィー用蛍石
JP4014716B2 (ja) * 1997-06-24 2007-11-28 オリンパス株式会社 偏光補償光学系を有する光学系
JP3239881B2 (ja) * 1998-11-16 2001-12-17 キヤノン株式会社 光学系及びそれを用いた投影装置
JP2000164489A (ja) * 1998-11-26 2000-06-16 Nikon Corp 走査型投影露光装置
JP2001210497A (ja) * 2000-01-26 2001-08-03 Mitsubishi Electric Corp 加速器
JP2001228401A (ja) * 2000-02-16 2001-08-24 Canon Inc 投影光学系、および該投影光学系による投影露光装置、デバイス製造方法
US7301605B2 (en) * 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3758201A (en) * 1971-07-15 1973-09-11 American Optical Corp Optical system for improved eye refraction
US4239329A (en) * 1978-08-04 1980-12-16 Nippon Telegraph And Telephone Public Corporation Optical nonreciprocal device
US4534649A (en) * 1981-10-30 1985-08-13 Downs Michael J Surface profile interferometer
US4576479A (en) * 1982-05-17 1986-03-18 Downs Michael J Apparatus and method for investigation of a surface
US5033830A (en) * 1989-10-04 1991-07-23 At&T Bell Laboratories Polarization independent optical isolator
US5537260A (en) * 1993-01-26 1996-07-16 Svg Lithography Systems, Inc. Catadioptric optical reduction system with high numerical aperture
US6252712B1 (en) * 1998-02-20 2001-06-26 Carl-Zeiss-Stiftung Optical system with polarization compensator

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP1451619A4 *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7145720B2 (en) 2001-05-15 2006-12-05 Carl Zeiss Smt Ag Objective with fluoride crystal lenses
US7239447B2 (en) 2001-05-15 2007-07-03 Carl Zeiss Smt Ag Objective with crystal lenses
US7382536B2 (en) 2001-05-15 2008-06-03 Carl Zeiss Smt Ag Objective with fluoride crystal lenses

Also Published As

Publication number Publication date
JP2005508018A (ja) 2005-03-24
EP1451619A2 (fr) 2004-09-01
EP1451619A4 (fr) 2007-10-03
WO2003038479A2 (fr) 2003-05-08
AU2002360329A1 (en) 2003-05-12

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