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WO2006035360A3 - Procede de formation d'un revetement sur un substrat, et revetement forme par ce procede - Google Patents

Procede de formation d'un revetement sur un substrat, et revetement forme par ce procede Download PDF

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Publication number
WO2006035360A3
WO2006035360A3 PCT/IB2005/053090 IB2005053090W WO2006035360A3 WO 2006035360 A3 WO2006035360 A3 WO 2006035360A3 IB 2005053090 W IB2005053090 W IB 2005053090W WO 2006035360 A3 WO2006035360 A3 WO 2006035360A3
Authority
WO
WIPO (PCT)
Prior art keywords
protective coating
coating
filler component
forming
porous matrix
Prior art date
Application number
PCT/IB2005/053090
Other languages
English (en)
Other versions
WO2006035360A2 (fr
Inventor
Danielle Beelen
Jongh Petra E De
Original Assignee
Koninkl Philips Electronics Nv
Danielle Beelen
Jongh Petra E De
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninkl Philips Electronics Nv, Danielle Beelen, Jongh Petra E De filed Critical Koninkl Philips Electronics Nv
Priority to EP05798271A priority Critical patent/EP1797016A2/fr
Priority to JP2007534130A priority patent/JP2008514415A/ja
Publication of WO2006035360A2 publication Critical patent/WO2006035360A2/fr
Publication of WO2006035360A3 publication Critical patent/WO2006035360A3/fr

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C03C17/007Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3435Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/291Oxides or nitrides or carbides, e.g. ceramics, glass
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/58Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
    • H01L23/585Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries comprising conductive layers or plates or strips or rods or rings
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/40Coatings comprising at least one inhomogeneous layer
    • C03C2217/425Coatings comprising at least one inhomogeneous layer consisting of a porous layer
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/40Coatings comprising at least one inhomogeneous layer
    • C03C2217/43Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/44Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the composition of the continuous phase
    • C03C2217/45Inorganic continuous phases
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/40Coatings comprising at least one inhomogeneous layer
    • C03C2217/43Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/46Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
    • C03C2217/47Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
    • C03C2217/475Inorganic materials
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/11Deposition methods from solutions or suspensions
    • C03C2218/113Deposition methods from solutions or suspensions by sol-gel processes
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/11Deposition methods from solutions or suspensions
    • C03C2218/116Deposition methods from solutions or suspensions by spin-coating, centrifugation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/3011Impedance

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Composite Materials (AREA)
  • Ceramic Engineering (AREA)
  • Paints Or Removers (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

La présente invention concerne un procédé de formation d'un revêtement de protection sur un substrat électronique, tel qu'un CI. Le revêtement de protection présente une bonne résistance mécanique, chimique et physique et une opacité appropriée. Selon l'invention, une matrice poreuse (comprenant de préférence Ti02) est formée et remplie d'un élément de charge, tel que des particules de TiN, pouvant absorber ou diffuser la lumière. Après une étape de polymérisation, un élément précurseur de renfort est ajouté. Lors de la préparation du revêtement de protection, une quantité préétablie de l'élément de charge est utilisée pour obtenir au moins 40 % en volume de l'élément de charge présent dans le revêtement de protection finalement réalisé, sur la base de la matrice poreuse obtenue.
PCT/IB2005/053090 2004-09-30 2005-09-20 Procede de formation d'un revetement sur un substrat, et revetement forme par ce procede WO2006035360A2 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP05798271A EP1797016A2 (fr) 2004-09-30 2005-09-20 Procede de formation d'un revetement sur un substrat, et revetement forme par ce procede
JP2007534130A JP2008514415A (ja) 2004-09-30 2005-09-20 基材上にコーティングを形成する方法、及び、こうして形成されたコーティング

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP04104791 2004-09-30
EP04104791.1 2004-09-30

Publications (2)

Publication Number Publication Date
WO2006035360A2 WO2006035360A2 (fr) 2006-04-06
WO2006035360A3 true WO2006035360A3 (fr) 2006-08-03

Family

ID=36119265

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IB2005/053090 WO2006035360A2 (fr) 2004-09-30 2005-09-20 Procede de formation d'un revetement sur un substrat, et revetement forme par ce procede

Country Status (5)

Country Link
EP (1) EP1797016A2 (fr)
JP (1) JP2008514415A (fr)
CN (1) CN101031519A (fr)
TW (1) TW200626519A (fr)
WO (1) WO2006035360A2 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140105430A (ko) * 2011-08-02 2014-09-01 다우 글로벌 테크놀로지스 엘엘씨 수분으로부터 보호하기 위하여 복잡한 표면 상에 공형 코팅된 결정질 특징을 갖는 얇은 차단 필름을 갖는 광전자 장치
CN107188616B (zh) * 2017-05-23 2019-08-23 佛山欧神诺陶瓷有限公司 一种裂纹砖及其制备方法
CN112517352B (zh) * 2020-10-13 2022-07-22 江苏大学 一种纳米颗粒负载多孔超宽光谱吸收涂层及制备方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5665422A (en) * 1991-03-19 1997-09-09 Hitachi, Ltd. Process for formation of an ultra fine particle film
US5711987A (en) * 1996-10-04 1998-01-27 Dow Corning Corporation Electronic coatings
US6198155B1 (en) * 1998-06-10 2001-03-06 U.S. Philips Corporation Semiconductor device comprising an integrated circuit provided with a ceramic security coating and method of manufacturing such a device
WO2004031445A1 (fr) * 2002-10-03 2004-04-15 Alberta Research Council Inc. Revetement protecteur ceramique

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5665422A (en) * 1991-03-19 1997-09-09 Hitachi, Ltd. Process for formation of an ultra fine particle film
US5711987A (en) * 1996-10-04 1998-01-27 Dow Corning Corporation Electronic coatings
US6198155B1 (en) * 1998-06-10 2001-03-06 U.S. Philips Corporation Semiconductor device comprising an integrated circuit provided with a ceramic security coating and method of manufacturing such a device
WO2004031445A1 (fr) * 2002-10-03 2004-04-15 Alberta Research Council Inc. Revetement protecteur ceramique

Also Published As

Publication number Publication date
EP1797016A2 (fr) 2007-06-20
TW200626519A (en) 2006-08-01
CN101031519A (zh) 2007-09-05
JP2008514415A (ja) 2008-05-08
WO2006035360A2 (fr) 2006-04-06

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