WO2008136813A3 - Semiconductor memory having both volatile and non-volatile functionality and method of operating - Google Patents
Semiconductor memory having both volatile and non-volatile functionality and method of operating Download PDFInfo
- Publication number
- WO2008136813A3 WO2008136813A3 PCT/US2007/024544 US2007024544W WO2008136813A3 WO 2008136813 A3 WO2008136813 A3 WO 2008136813A3 US 2007024544 W US2007024544 W US 2007024544W WO 2008136813 A3 WO2008136813 A3 WO 2008136813A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- volatile
- semiconductor memory
- operating
- floating gate
- functionality
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/711—Insulated-gate field-effect transistors [IGFET] having floating bodies
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C14/00—Digital stores characterised by arrangements of cells having volatile and non-volatile storage properties for back-up when the power is down
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B69/00—Erasable-and-programmable ROM [EPROM] devices not provided for in groups H10B41/00 - H10B63/00, e.g. ultraviolet erasable-and-programmable ROM [UVEPROM] devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/01—Manufacture or treatment
- H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
- H10D30/0411—Manufacture or treatment of FETs having insulated gates [IGFET] of FETs having floating gates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/68—Floating-gate IGFETs
- H10D30/681—Floating-gate IGFETs having only two programming levels
Landscapes
- Non-Volatile Memory (AREA)
- Semiconductor Memories (AREA)
Abstract
Semiconductor memory having both volatile and non-volatile modes and methods of operation. A semiconductor memory cell includes a floating gate or trapping layer positioned in between first and second locations and above a surface of the substrate and insulated from the surface by an insulating layer; the floating gate or trapping layer being configured to receive transfer of data stored by the volatile memory and store the data as nonvolatile memory in the floating gate or trapping layer upon interruption of power to the memory cell.
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US86177806P | 2006-11-29 | 2006-11-29 | |
US60/861,778 | 2006-11-29 | ||
US98237407P | 2007-10-24 | 2007-10-24 | |
US98238207P | 2007-10-24 | 2007-10-24 | |
US60/982,374 | 2007-10-24 | ||
US60/982,382 | 2007-10-24 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2008136813A2 WO2008136813A2 (en) | 2008-11-13 |
WO2008136813A3 true WO2008136813A3 (en) | 2008-12-31 |
Family
ID=39944139
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2007/024544 WO2008136813A2 (en) | 2006-11-29 | 2007-11-29 | Semiconductor memory having both volatile and non-volatile functionality and method of operating |
Country Status (1)
Country | Link |
---|---|
WO (1) | WO2008136813A2 (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5519831A (en) * | 1991-06-12 | 1996-05-21 | Intel Corporation | Non-volatile disk cache |
US20050024968A1 (en) * | 2003-07-31 | 2005-02-03 | Brocade Communications Systems, Inc. | Apparatus for reducing data corruption in a non-volatile memory |
US20060125010A1 (en) * | 2003-02-10 | 2006-06-15 | Arup Bhattacharyya | Methods of forming transistor constructions |
-
2007
- 2007-11-29 WO PCT/US2007/024544 patent/WO2008136813A2/en active Application Filing
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5519831A (en) * | 1991-06-12 | 1996-05-21 | Intel Corporation | Non-volatile disk cache |
US20060125010A1 (en) * | 2003-02-10 | 2006-06-15 | Arup Bhattacharyya | Methods of forming transistor constructions |
US20050024968A1 (en) * | 2003-07-31 | 2005-02-03 | Brocade Communications Systems, Inc. | Apparatus for reducing data corruption in a non-volatile memory |
Also Published As
Publication number | Publication date |
---|---|
WO2008136813A2 (en) | 2008-11-13 |
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