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WO2009037965A1 - Liquid crystal display panel manufacturing method and photomask - Google Patents

Liquid crystal display panel manufacturing method and photomask Download PDF

Info

Publication number
WO2009037965A1
WO2009037965A1 PCT/JP2008/065708 JP2008065708W WO2009037965A1 WO 2009037965 A1 WO2009037965 A1 WO 2009037965A1 JP 2008065708 W JP2008065708 W JP 2008065708W WO 2009037965 A1 WO2009037965 A1 WO 2009037965A1
Authority
WO
WIPO (PCT)
Prior art keywords
exposure
liquid crystal
crystal display
display panel
photomask
Prior art date
Application number
PCT/JP2008/065708
Other languages
French (fr)
Japanese (ja)
Inventor
Masahiro Matsuda
Masanori Takeuchi
Original Assignee
Sharp Kabushiki Kaisha
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Kabushiki Kaisha filed Critical Sharp Kabushiki Kaisha
Publication of WO2009037965A1 publication Critical patent/WO2009037965A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133707—Structures for producing distorted electric fields, e.g. bumps, protrusions, recesses, slits in pixel electrodes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Sustainable Development (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

A manufacturing method of the invention is applied to manufacture of a multi-picture element drive liquid crystal display panel. The manufacturing method includes a photolithography step of performing step-and-repeat exposure to manufacture an active matrix substrate and a counter substrate both constituting a liquid crystal display panel. The step-and-repeat exposure step has a first exposure step in which a first photomask (M1) is used and a second exposure step (M2) in which a second photomask (M2) is used. An exposure pattern is determined in units of sub-picture elements (17a·17b) for a common region (m1·m2) where the exposure regions at the first and second exposure steps are superposed on one another, and thereby each sub-picture element pattern is formed separately in each exposure step. With this, a multi-picture element drive liquid crystal display panel with improved display definition is manufactured by step-and-repeat exposure.
PCT/JP2008/065708 2007-09-19 2008-09-02 Liquid crystal display panel manufacturing method and photomask WO2009037965A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-242890 2007-09-19
JP2007242890 2007-09-19

Publications (1)

Publication Number Publication Date
WO2009037965A1 true WO2009037965A1 (en) 2009-03-26

Family

ID=40467784

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/065708 WO2009037965A1 (en) 2007-09-19 2008-09-02 Liquid crystal display panel manufacturing method and photomask

Country Status (1)

Country Link
WO (1) WO2009037965A1 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102687078A (en) * 2010-01-25 2012-09-19 夏普株式会社 Exposure device, liquid crystal display device and manufacturing method thereof
WO2013031230A1 (en) * 2011-09-02 2013-03-07 パナソニック株式会社 Method for manufacturing display panel
WO2014132819A1 (en) * 2013-02-26 2014-09-04 堺ディスプレイプロダクト株式会社 Method for manufacturing color filter, and liquid crystal display device
CN111427231A (en) * 2020-04-09 2020-07-17 深圳市华星光电半导体显示技术有限公司 Mask plate and novel production line
CN115793313A (en) * 2022-10-25 2023-03-14 福州京东方光电科技有限公司 Display panel, electronic device and method for manufacturing display panel

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06324474A (en) * 1993-05-10 1994-11-25 Nikon Corp Photomask and exposing method
JP2000066235A (en) * 1998-08-20 2000-03-03 Mitsubishi Electric Corp Liquid crystal display device and manufacturing method thereof
WO2007102382A1 (en) * 2006-03-06 2007-09-13 Sharp Kabushiki Kaisha Active matrix substrate, display device, television receiver

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06324474A (en) * 1993-05-10 1994-11-25 Nikon Corp Photomask and exposing method
JP2000066235A (en) * 1998-08-20 2000-03-03 Mitsubishi Electric Corp Liquid crystal display device and manufacturing method thereof
WO2007102382A1 (en) * 2006-03-06 2007-09-13 Sharp Kabushiki Kaisha Active matrix substrate, display device, television receiver

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102687078A (en) * 2010-01-25 2012-09-19 夏普株式会社 Exposure device, liquid crystal display device and manufacturing method thereof
CN102687078B (en) * 2010-01-25 2014-09-17 夏普株式会社 Exposure device, liquid crystal display device and manufacturing method thereof
WO2013031230A1 (en) * 2011-09-02 2013-03-07 パナソニック株式会社 Method for manufacturing display panel
JP2013054893A (en) * 2011-09-02 2013-03-21 Panasonic Corp Manufacturing method of display panel
US9245930B2 (en) 2011-09-02 2016-01-26 Joled Inc. Method of manufacturing display panel
WO2014132819A1 (en) * 2013-02-26 2014-09-04 堺ディスプレイプロダクト株式会社 Method for manufacturing color filter, and liquid crystal display device
CN111427231A (en) * 2020-04-09 2020-07-17 深圳市华星光电半导体显示技术有限公司 Mask plate and novel production line
CN115793313A (en) * 2022-10-25 2023-03-14 福州京东方光电科技有限公司 Display panel, electronic device and method for manufacturing display panel
CN115793313B (en) * 2022-10-25 2024-05-03 福州京东方光电科技有限公司 Display panel, electronic device, and method for manufacturing display panel

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