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WO2009037965A1 - Procédé de fabrication de panneau d'affichage à cristaux liquides et photomasque - Google Patents

Procédé de fabrication de panneau d'affichage à cristaux liquides et photomasque Download PDF

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Publication number
WO2009037965A1
WO2009037965A1 PCT/JP2008/065708 JP2008065708W WO2009037965A1 WO 2009037965 A1 WO2009037965 A1 WO 2009037965A1 JP 2008065708 W JP2008065708 W JP 2008065708W WO 2009037965 A1 WO2009037965 A1 WO 2009037965A1
Authority
WO
WIPO (PCT)
Prior art keywords
exposure
liquid crystal
crystal display
display panel
photomask
Prior art date
Application number
PCT/JP2008/065708
Other languages
English (en)
Japanese (ja)
Inventor
Masahiro Matsuda
Masanori Takeuchi
Original Assignee
Sharp Kabushiki Kaisha
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Kabushiki Kaisha filed Critical Sharp Kabushiki Kaisha
Publication of WO2009037965A1 publication Critical patent/WO2009037965A1/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133707—Structures for producing distorted electric fields, e.g. bumps, protrusions, recesses, slits in pixel electrodes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Sustainable Development (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

L'invention porte sur un procédé de fabrication qui est appliqué à la fabrication d'un panneau d'affichage à cristaux liquides à multiples pilotes d'élément d'image. Le procédé de fabrication inclut une étape de photolithographie consistant à effectuer une exposition par photorépétition pour fabriquer un substrat à matrice active et un contre-substrat, constituant tous deux un panneau d'affichage à cristaux liquides. L'étape d'exposition par photorépétition présente une première étape d'exposition, dans laquelle un premier photomasque (M1) est utilisé, et une seconde étape d'exposition (M2), dans laquelle un second photomasque (M2) est utilisé. Un motif d'exposition est déterminé en unités de sous-éléments d'image (17a·17b) pour une région commune (m1·m2) où les régions d'exposition aux première et seconde étapes d'exposition sont superposées les unes sur les autres, et ainsi chaque motif de sous-élément d'image est formé séparément dans chaque étape d'exposition. Ainsi, un panneau d'affichage à cristaux liquides à multiples pilotes d'éléments d'image avec une définition d'affichage améliorée est fabriqué par exposition par photorépétition.
PCT/JP2008/065708 2007-09-19 2008-09-02 Procédé de fabrication de panneau d'affichage à cristaux liquides et photomasque WO2009037965A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-242890 2007-09-19
JP2007242890 2007-09-19

Publications (1)

Publication Number Publication Date
WO2009037965A1 true WO2009037965A1 (fr) 2009-03-26

Family

ID=40467784

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/065708 WO2009037965A1 (fr) 2007-09-19 2008-09-02 Procédé de fabrication de panneau d'affichage à cristaux liquides et photomasque

Country Status (1)

Country Link
WO (1) WO2009037965A1 (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102687078A (zh) * 2010-01-25 2012-09-19 夏普株式会社 曝光装置、液晶显示装置及其制造方法
WO2013031230A1 (fr) * 2011-09-02 2013-03-07 パナソニック株式会社 Procédé de fabrication d'un panneau d'affichage
WO2014132819A1 (fr) * 2013-02-26 2014-09-04 堺ディスプレイプロダクト株式会社 Procédé de fabrication d'un filtre couleur et dispositif d'affichage à cristaux liquides
CN111427231A (zh) * 2020-04-09 2020-07-17 深圳市华星光电半导体显示技术有限公司 掩膜板和新型产线
CN115793313A (zh) * 2022-10-25 2023-03-14 福州京东方光电科技有限公司 显示面板、电子设备及显示面板的制作方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06324474A (ja) * 1993-05-10 1994-11-25 Nikon Corp フオトマスク及び露光方法
JP2000066235A (ja) * 1998-08-20 2000-03-03 Mitsubishi Electric Corp 液晶表示装置およびその製造方法
WO2007102382A1 (fr) * 2006-03-06 2007-09-13 Sharp Kabushiki Kaisha substrat À matrice active, dispositif d'affichage, ET rÉcepteur de tÉlÉvision

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06324474A (ja) * 1993-05-10 1994-11-25 Nikon Corp フオトマスク及び露光方法
JP2000066235A (ja) * 1998-08-20 2000-03-03 Mitsubishi Electric Corp 液晶表示装置およびその製造方法
WO2007102382A1 (fr) * 2006-03-06 2007-09-13 Sharp Kabushiki Kaisha substrat À matrice active, dispositif d'affichage, ET rÉcepteur de tÉlÉvision

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102687078A (zh) * 2010-01-25 2012-09-19 夏普株式会社 曝光装置、液晶显示装置及其制造方法
CN102687078B (zh) * 2010-01-25 2014-09-17 夏普株式会社 曝光装置、液晶显示装置及其制造方法
WO2013031230A1 (fr) * 2011-09-02 2013-03-07 パナソニック株式会社 Procédé de fabrication d'un panneau d'affichage
JP2013054893A (ja) * 2011-09-02 2013-03-21 Panasonic Corp 表示パネルの製造方法
US9245930B2 (en) 2011-09-02 2016-01-26 Joled Inc. Method of manufacturing display panel
WO2014132819A1 (fr) * 2013-02-26 2014-09-04 堺ディスプレイプロダクト株式会社 Procédé de fabrication d'un filtre couleur et dispositif d'affichage à cristaux liquides
CN111427231A (zh) * 2020-04-09 2020-07-17 深圳市华星光电半导体显示技术有限公司 掩膜板和新型产线
CN115793313A (zh) * 2022-10-25 2023-03-14 福州京东方光电科技有限公司 显示面板、电子设备及显示面板的制作方法
CN115793313B (zh) * 2022-10-25 2024-05-03 福州京东方光电科技有限公司 显示面板、电子设备及显示面板的制作方法

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