WO2018182135A1 - Blue photosensitive resin composition, color filter produced by using same, and image display device - Google Patents
Blue photosensitive resin composition, color filter produced by using same, and image display device Download PDFInfo
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- WO2018182135A1 WO2018182135A1 PCT/KR2017/013933 KR2017013933W WO2018182135A1 WO 2018182135 A1 WO2018182135 A1 WO 2018182135A1 KR 2017013933 W KR2017013933 W KR 2017013933W WO 2018182135 A1 WO2018182135 A1 WO 2018182135A1
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- photosensitive resin
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- resin composition
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- blue photosensitive
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Definitions
- the present invention relates to a blue photosensitive resin composition, a color filter manufactured using the same, and an image display device.
- the color filter is a thin film type optical component that extracts three colors of red, green, and blue from white light and makes them possible in fine pixel units.
- the size of one pixel is about tens to hundreds of micrometers.
- Such a color filter includes a black matrix layer formed in a predetermined pattern on a transparent substrate to shield the boundary between each pixel, and a plurality of colors (typically red (R), green (G) and The pixel units in which the three primary colors of blue (B) are arranged in a predetermined order are stacked in this order.
- Korean Patent Publication No. 2007-0094679 suggests that color reproducibility can be improved by having a color filter layer formed of quantum dots, and Korean Patent Publication No. 2009-0036373 uses a conventional color filter as a quantum dot phosphor. It is proposed that the display quality can be improved by improving the luminous efficiency by replacing the light emitting layer.
- the photosensitive resin composition developed to manufacture a color filter has not sufficiently satisfied the requirements such as development speed control, fine pattern formation, excellent optical efficiency and viewing angle to be sufficiently used in the process.
- the present invention is to control the development speed, to solve the problem caused by the process residue by eliminating the residue of the fine pattern, to improve the poor display, to implement a color filter, especially a self-luminous color filter to ensure excellent light efficiency and viewing angle It is an object of the present invention to provide a blue photosensitive resin composition capable of this, a color filter and an image display device manufactured using the same.
- the present invention provides a blue photosensitive resin composition comprising a scattering particle, a blue colorant, a binder resin, a cardo-based binder resin, a photoinitiator, a photopolymerizable compound, a thermosetting agent and a solvent, wherein the photopolymerizable compound comprises an alkylene oxide. It provides a blue photosensitive resin composition characterized by including a compound.
- the present invention also provides a color filter comprising a blue pattern layer made of the above-described blue photosensitive resin composition.
- the present invention is the color filter; And a light source emitting blue light.
- the present invention includes a photopolymerizable compound containing alkylene oxide in the blue photosensitive resin composition, to control the development speed, solve the problem caused by the process residue by eliminating the residue of the pattern, and poor display problems are improved
- the present invention provides a color filter in which the problem of resist non-developing is improved.
- it is possible to provide a high-quality self-luminous color filter having an excellent viewing angle by adjusting the taper.
- the blue photosensitive resin composition of the present invention may include a cardo-based binder resin, a photoinitiator, a photopolymerizable compound and a solvent as scattering particles, a blue colorant, and a binder resin, and in particular, the photopolymerizable compound may include ethylene oxide or propylene oxide.
- the color filter including the blue pattern layer prepared by using the blue photosensitive resin composition of the present invention can solve the problem caused by the residue on the process by controlling the development speed and eliminating the residue of the pattern. .
- a color filter in particular, a self-luminous color filter, in which a problem of poor display is improved and an issue of resist non-developing is improved.
- the scattering particles of the present invention may be a metal oxide having an average particle diameter of 10 to 1000 nm, more preferably when the average particle diameter is in the range of 30 to 500 nm. In this case, when the average particle diameter is less than the above range, sufficient scattering effect of the incident light cannot be expected, and when the average particle diameter is above the above range, the surface of the self-luminous layer of uniform quality cannot be obtained.
- the metal oxide is Li, Be, B, Na, Mg, Al, Si, K, Ca, Sc, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, Rb, Sr, Y, Mo, Cs, Ba, La, Hf, W, Tl, Pb, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Ti, Sb, Sn, Zr, Nb, It may be an oxide including one metal selected from the group consisting of Ce, Ta, In, and combinations thereof.
- the scattering particles may be appropriately adjusted as necessary to the average particle diameter and the content in the entire composition to sufficiently improve the light emission intensity of the color filter.
- the scattering particles may be included in 0.1 to 50% by weight relative to the total weight of solids in the blue photosensitive resin, preferably 5 to 35% by weight.
- the scattering particles are in the above preferred range, the effect of increasing the light emission intensity can be obtained, and the stability of the composition can be ensured.
- examples of the blue pigment include compounds classified as pigments in the color index (Published by The society of Dyers and Colourists), and more specifically, the color index (CI) as follows.
- pigment of number is mentioned, It is not necessarily limited to these.
- Blue pigments are specifically described, for example, in C.I. Pigment blue 15: 3, 15: 4, 15: 6, 16, 21, 28, and 76, and the like.
- Pigment Blue 15: 3, Pigment Blue 15: 6, Pigment Blue 16 It is preferable to include at least 1 type selected from the group which consists of.
- the blue colorant of the present invention may further comprise a blue dye, which is a known dye which is described in a compound or dyeing note (color dyed yarn) classified as a dye in the color index (published by The Society of Dyers and Colourists). And dyes.
- a blue dye which is a known dye which is described in a compound or dyeing note (color dyed yarn) classified as a dye in the color index (published by The Society of Dyers and Colourists). And dyes.
- the said blue dye can be used individually or in combination of 2 or more types, respectively.
- the blue colorant of the present invention may further include a purple colorant as an additional colorant.
- the purple coloring agent may comprise at least one of a purple pigment and a purple dye, wherein the purple pigment is specifically C.I. Pigment violet 1, 14, 19, 23, 29, 32, 33, 36, 37 and 38, among which C.I. It is more preferred to include pigment violet 23.
- Purple dyes are specifically, C.I. Solvent violet, C.I. acid violet, C.I. acid violet, C.I. modanto violet, and the like, but are not limited thereto.
- the C.I. Solvent violet is C.I. Solvent violet 8, 9, 13, 14, 36, 37, 47 and 49, and the like. More preferably, solvent violet 13 is included.
- C.I. acid violet includes C.I. Acid violet 6B, 7, 9, 17, 19 and 66, and the like. More preferably, acid violet 66 is included.
- CI direct violet includes CI direct violet 47, 52, 54, 59, 60, 65, 66, 79, 80, 81, 82, 84, 89, 90, 93, 95, 96, 103 and 104. .
- the blue colorant may be used in an amount of 0.1 to 50% by weight, preferably 0.5 to 30% by weight, based on the total weight of solids in the blue photosensitive resin.
- content of the blue colorant satisfies the above range, it is possible to suppress the reflection of external light, to effectively exhibit the emission intensity of the color, and to ensure the stability of the viscosity.
- the blue colorant and the scattering particles are included even though the blue quantum dots are not included, thereby reducing the efficiency of the blue pixel of the color filter, particularly the self-luminous color filter.
- the binder resin of this invention contains cardo system binder resin.
- the cardo-based binder resin has reactivity and alkali solubility due to the action of light or heat and acts as a dispersion medium of the coloring material.
- the cardo-based binder resin contained in the blue photosensitive resin composition of the present invention is not limited as long as it is a resin that acts as a binder resin for scattering particles and is soluble in an alkaline developer used in the developing step for producing a color filter.
- the cardo-based binder resin of the present invention may include one or more of the compounds represented by Formulas 1-1 and 1-2.
- R 1 , R 2 , R 3 and R 4 are each independently, Is;
- X is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a hydroxyl group
- R 5 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms.
- the compound represented by Chemical Formula 1-1 may be synthesized by the compound represented by Chemical Formula 2-1, and the compound represented by Chemical Formula 1-2 may be synthesized using the compound represented by Chemical Formula 2-2. .
- the compound represented by Chemical Formula 1-1 may be synthesized by the compound represented by Chemical Formula 2-1, and the compound represented by Chemical Formula 1-2 may be synthesized using the compound represented by Chemical Formula 2-2. .
- the compound represented by Formula 1-1 is at least one of the compounds represented by Formula 1-1-1 and Formula 1-1-2, and the compound represented by Formula 1-2 is represented by Formula 1-2- 1 and one or more compounds represented by Formula 1-2-2.
- the cardo-based binder resin is 9,9-bis (3-cinnamic diester) fluorene (9,9-bis (3-cinnamic diester) fluorene), 9,9-bis (3- cinnamoyl, 4-hydride Hydroxyphenyl) fluorene (9,9-bis (3-cinnamoil, 4-hydroxyphenyl) fluorene), 9,9-bis (glycidyl methacrylate ether) fluorene (9,9-bis (glycidyl methacrylate ether) fluorene), 9,9-bis (3,4-dihydroxyphenyl) fluorene dinamic ester (9,9-bis (3,4-dihydroxyphenyl) fluorene dicinnamic ester), 3,6-diglycidyl meta Acrylate ether spiro (3,6-diglycidyl methacrylate ether spiro (fluorene-9,9-xantene)), 9,9-bis (3-ally
- It can be prepared by reacting with at least one selected from the group consisting of aromatic polyhydric carboxylic acid anhydrides such as pyromellitic anhydride, benzophenone tetracarboxylic acid dianhydride, biphenyltetracarboxylic acid dianhydride, and bitenyl ether tetracarboxylic acid dianhydride. It is not limited.
- aromatic polyhydric carboxylic acid anhydrides such as pyromellitic anhydride, benzophenone tetracarboxylic acid dianhydride, biphenyltetracarboxylic acid dianhydride, and bitenyl ether tetracarboxylic acid dianhydride. It is not limited.
- the present invention may further include an acrylic alkali-soluble resin as a binder resin.
- the acrylic alkali-soluble resin include a carboxyl group-containing monomer and a copolymer with another monomer copolymerizable with the monomer.
- a carboxyl group-containing monomer unsaturated carboxylic acids, such as unsaturated monocarboxylic acid, unsaturated polycarboxylic acid, such as unsaturated polyhydric carboxylic acid which has one or more carboxyl groups in molecules, such as unsaturated dicarboxylic acid and unsaturated tricarboxylic acid, are mentioned, for example. have.
- unsaturated monocarboxylic acid acrylic acid, methacrylic acid, crotonic acid, (alpha)-chloroacrylic acid, cinnamic acid etc. are mentioned, for example.
- unsaturated dicarboxylic acid a maleic acid, a fumaric acid, itaconic acid, a citraconic acid, a mesaconic acid, etc. are mentioned, for example.
- the unsaturated polyhydric carboxylic acid may be an acid anhydride, and specific examples thereof include maleic anhydride, itaconic anhydride and citraconic anhydride.
- the unsaturated polyhydric carboxylic acid may be mono (2-methacrylyloxyalkyl) ester thereof, for example, succinic mono (2-acryloyloxyethyl), succinic acid mono (2-methacryloyloxyethyl) And phthalic acid mono (2-acryloyloxyethyl), phthalic acid mono (2-methacryloyloxyethyl) and the like.
- the unsaturated polyhydric carboxylic acid may be mono (meth) acrylate of the sock end dicarboxy polymer, and examples thereof include? -Carboxypolycaprolactone monoacrylate and? -Carboxypolycaprolactone monomethacrylate. .
- carboxyl group-containing monomers can be used individually or in mixture of 2 or more types, respectively.
- styrene (alpha) -methylstyrene, o-vinyl toluene, m-vinyl toluene, p-vinyl toluene, p-chloro styrene, o-methoxy styrene, m-meth Oxy styrene, p-methoxy styrene, o-vinyl benzyl methyl ether, m-vinyl benzyl methyl ether, p-vinyl benzyl methyl ether, o-vinyl benzyl glycidyl ether, m-vinyl benzyl glycidyl ether, p- Aromatic vinyl compounds such as vinyl benzyl
- Unsaturated carboxylic acid esters 2-aminoethyl acrylate, 2-aminoethyl methacrylate, 2-dimethylaminoethyl acrylate, 2-dimethylaminoethyl methacrylate, 2-aminopropyl acrylate, 2-aminopropyl methacrylate, 2-dimethyl Unsaturated carboxyl such as aminopropyl acrylate, 2-dimethylaminopropyl methacrylate, 3-aminopropyl acrylate, 3-aminopropyl methacrylate, 3-dimethylaminopropyl acrylate and 3-dimethylaminopropyl methacrylate Acid aminoalkyl esters; Unsaturated carboxylic acid glycidyl esters such as glycidyl acrylate and glycidyl methacrylate; Carboxylic acid vinyl esters such as vinyl acetate, vinyl propionate, vinyl butyrate and vinyl benzoate; Un
- Unsaturated imides such as N-cyclohexylmaleimide; Aliphatic conjugated dienes such as 1,3-butadiene, isoprene and chloroprene; And monoacryloyl or monomethacryloyl groups at the terminal of the polymer molecular chain of polystyrene, polymethylacrylate, polymethylmethacrylate, poly-n-butylacrylate, poly-n-butylmethacrylate, polysiloxane. And macromonomers to have. These monomers can be used individually or in mixture of 2 or more types, respectively.
- bulky monomers such as monomers having a norbornyl skeleton, monomers having an adamantane skeleton, and monomers having a rosin skeleton as the other monomers copolymerizable with the carboxyl group-containing monomer are preferable because they tend to lower the dielectric constant.
- the acid value is preferably in the range of 20 to 200 (KOH mg / g). If the acid value is in the above range, the solubility in the developing solution is improved, so that the non-exposed part is easily dissolved and the sensitivity is increased, and as a result, the pattern of the exposed part remains at the time of development to improve the film remaining ratio.
- the acid value is a value measured as the amount (mg) of potassium hydroxide required to neutralize 1 g of the acrylic polymer, and can usually be obtained by titration using an aqueous potassium hydroxide solution.
- the polystyrene reduced weight average molecular weight (hereinafter, simply referred to as 'weight average molecular weight') measured by gel permeation chromatography (GPC; tetrahydrofuran as an eluting solvent) is 2,000 to 200,000, preferably 3,000 to 100,000.
- GPC gel permeation chromatography
- Cardo binder resin or acrylic alkali-soluble resin is preferable.
- the molecular weight is in the above range, the hardness of the coating film is improved, the residual film ratio is high, the solubility of the non-exposed portion in the developer is excellent and the resolution tends to be improved, which is preferable.
- the molecular weight distribution [weight average molecular weight (Mw) / number average molecular weight (Mn)] of the cardo-based binder resin and / or the acrylic alkali-soluble resin is preferably 1.0 to 6.0, and more preferably 1.5 to 6.0. If molecular weight distribution [weight average molecular weight (Mw) / number average molecular weight (Mn)] is 1.5-6.0, since developability is excellent, it is preferable.
- the binder resin of the present invention may use 5 to 85% by weight, preferably 5 to 60% by weight based on the total weight of solids in the blue photosensitive resin.
- the solubility in the developing solution is sufficient, and development residues are less likely to occur on the substrate of the non-pixel portion. It is preferable because this tends to be good.
- the photopolymerizable compound included in the blue photosensitive resin composition of the present invention is a compound that can be polymerized by the action of light and a photopolymerization initiator described below, and specifically, a photopolymerizable compound containing alkylene oxide, preferably ethylene oxide and / or propylene oxide. And a photopolymerizable compound containing a.
- a photopolymerizable compound added with ethylene oxide and / or propylene oxide is included, various problems that may occur due to process residues can be solved by controlling the development speed, eliminating the residues of the pattern, and improving display defects. It is possible to eliminate the resist non-development, and to adjust the taper, to form an excellent viewing angle, it is possible to manufacture a device of high quality image quality.
- the alkylene oxide modified pentaerythritol (meth) acrylate compound As a photopolymerizable compound containing the said alkylene oxide, the alkylene oxide modified pentaerythritol (meth) acrylate compound, the alkylene oxide modified dipentaerythritol (meth) acrylate compound, and the alkylene oxide modified trimetholpropane ( Meta) acrylate compounds, and alkylene oxide modified glycerin (meth) acrylate compounds, and more specifically, ethylene oxide modified trimetholpropane triacrylate, ethylene oxide modified dipentaerythritol hexaacrylate, and ethylene oxide.
- the alkylene oxide modified pentaerythritol (meth) acrylate compound As a photopolymerizable compound containing the said alkylene oxide, the alkylene oxide modified pentaerythritol (meth) acrylate compound, the alkylene oxide modified dipentaery
- Modified pentaerythritol tetraacrylate ethylene oxide modified pentaerythritol tetraacrylate, propylene oxide modified pentaerythritol tetraacrylate, ethoxylated pentaerythritol tetraacrylate, ethoxylated dipentaerythritol hex Oh, and the like Cri rate, propoxy federated pentaerythritol polyacrylate, propoxy federated dipentaerythritol hexa acridine rate, ethoxy federated glycerol triacrylate.
- the blue photosensitive resin composition of this invention may further contain the conventional photopolymerizable compound which does not contain an alkylene oxide.
- the photopolymerizable compound using the monofunctional monomer, bifunctional monomer, and other polyfunctional monomer which do not contain ethylene oxide and a propylene oxide is mentioned.
- the monofunctional monomers include nonylphenylcarbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexylcarbitol acrylate, 2-hydroxyethyl acrylate and N-vinylpyrroli Money, etc.
- Specific examples of the bifunctional monomer include 1,6-hexanediol di (meth) acrylate, ethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, Bis (acryloyloxyethyl) ether of bisphenol A, 3-methylpentanediol di (meth) acrylate, etc. are mentioned.
- polyfunctional monomers include trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, di Pentaerythritol hexa (meth) acrylate etc. are mentioned. Of these, bifunctional or higher polyfunctional monomers are preferably used.
- the photopolymerizable compound may be used in an amount of 5 to 50% by weight, preferably 5 to 30% by weight, based on the total weight of solids in the blue photosensitive resin. If the photopolymerizable compound is within the above range, there is no reduction in photosensitivity, sufficient strength of the film, no loss of pattern during development, good pattern construction even in the fine pattern portion, and tendency of smoothness of the resist. desirable.
- the photoinitiator used in the present invention initiates a radical reaction of the photosensitive resin composition, causes curing, improves sensitivity, and preferably contains an acetophenone-based compound.
- an acetophenone type compound for example, diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyl dimethyl ketal, 2-hydroxy-1- [4- (2 -Hydroxyethoxy) phenyl] -2-methylpropane-1-one, 1-hydroxycyclohexylphenyl ketone, 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropane-1- On, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan-1-one, 2-hydroxy-2-methyl [4- (1-methylvinyl) phenyl] propane-1- Oligomers, etc.
- photoinitiators other than the said acetophenone series can be used in combination.
- Photopolymerization initiators other than the acetophenone series include active radical generators, sensitizers, and acid generators that generate active radicals by irradiation with light.
- an active radical generating agent a benzoin compound, a benzophenone type compound, a thioxanthone type compound, a triazine type compound, etc. are mentioned, for example.
- benzoin type compound benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoisobutyl ether, etc. are mentioned, for example.
- benzophenone type compound for example, benzophenone, methyl o-benzoyl benzoate, 4-phenylzophenone, 4-benzoyl-4'-methyldiphenyl sulfide, 3,3 ', 4,4'- tetra ( t-butylperoxycarbonyl) benzophenone, 2,4,6-trimethylbenzophenone, etc. are mentioned.
- thioxanthone type compound 2-isopropyl thioxanthone, 4-isopropyl thioxanthone, 2, 4- diethyl thioxanthone, 2, 4- dichloro thioxanthone, 1-chloro-, for example 4-propoxy city oxanthone etc. are mentioned.
- Examples of the active radical generator include 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 2,2, -bis (o-chlorophenyl) -4,4 ', 5,5'-tetra Phenyl-1,2'-biimidazole, 10-butyl-2-chloroacridone, 2-ethylanthraquinone, benzyl, 9,10-phenanthrenequinone, camphorquinone, methyl phenylglyoxylate, titanocene Compounds and the like can be used.
- Examples of the acid generator include 4-hydroxyphenyldimethylsulfonium p-toluenesulfonate, 4-hydroxyphenyldimethylsulfonium hexafluoroantimonate and 4-acetoxyphenyldimethylsulfonium p-toluenesulfo.
- a triazine photopolymerization initiator is also used as an acid generator.
- the photoinitiator may be included 0.1 to 30% by weight, preferably 0.3 to 20% by weight relative to the total weight of solids in the blue photosensitive resin. If it exists in the said range, since the blue photosensitive resin composition becomes highly sensitive and the intensity
- photoinitiator start adjuvant can be used.
- a photoinitiator adjuvant may be used in combination with a photoinitiator, and is a compound used in order to accelerate superposition
- photopolymerization start adjuvant an amine compound, an alkoxy anthracene type compound, a thioxanthone type compound, etc. are mentioned.
- Examples of the amine compound include triethanolamine, methyl diethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, and 2-dimethylamino benzoic acid.
- Ethyl, 2-ethylhexyl 4-dimethylaminobenzoic acid, N, N-dimethylparatoluidine, 4,4'-bis (dimethylamino) benzphenone (commonly known as Michler's ketone), 4,4'-bis (diethyl Amino) benzophenone, 4, 4'-bis (ethylmethylamino) benzophenone, etc. are mentioned, Among these, 4,4'-bis (diethylamino) benzophenone is preferable.
- an alkoxy anthracene type compound 9,10- dimethoxy anthracene, 2-ethyl-9,10- dimethoxy anthracene, 9,10- diethoxy anthracene, 2-ethyl-9, 10- diethoxy anthracene, for example.
- Etc. can be mentioned.
- a thioxanthone type compound 2-isopropyl thioxanthone, 4-isopropyl thioxanthone, 2, 4- diethyl thioxanthone, 2, 4- dichloro thioxanthone, 1-chloro- 4-propoxy city oxanthone etc. are mentioned.
- photoinitiators (D) may be used alone or in combination of a plurality thereof.
- a commercially available thing can be used as a photoinitiator starter,
- brand name "EAB-F” manufactured by Hodogaya Chemical Co., Ltd.
- EAB-F manufactured by Hodogaya Chemical Co., Ltd.
- the amount thereof is usually 10 mol or less, preferably 0.01 to 5 mol, per mol of the photopolymerization initiator.
- the sensitivity of a blue photosensitive resin composition becomes higher and the productivity of the color filter formed using this composition tends to improve, it is preferable.
- the solvent contained in the blue photosensitive resin composition of this invention is not specifically limited, Various organic solvents used in the field of a blue photosensitive resin composition can be used. Specific examples thereof include ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, and diethylene.
- ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, and diethylene.
- Diethylene glycol dialkyl ethers such as glycol dipropyl ether and diethylene glycol dibutyl ether, ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate, propylene glycol monomethyl ether acetate, and propylene glycol Alkylene glycol alkyl ether acetates such as monoethyl ether acetate, propylene glycol monopropyl ether acetate, methoxybutyl acetate and methoxypentyl acetate, aromatic hydrocarbons such as benzene, toluene, xylene and mesitylene, methyl Ketones such as methyl ketone, acetone, methyl amyl ketone, methyl isobutyl ketone, cyclohexanone, ethanol, propanol, butanol, hexanol, cyclohexanol, alcohol
- organic solvents having a boiling point of 100 to 200 are preferable in the solvents in terms of applicability and dryness, and more preferably alkylene glycol alkyl ether acetates, ketones and ethyl 3-ethoxypropionate.
- esters such as methyl 3-methoxypropionate, and more preferably propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, cyclohexanone, ethyl 3-ethoxypropionate, and 3-methoxy Methyl propionate etc. are mentioned.
- These solvents can be used individually or in mixture of 2 or more types, respectively.
- Content of the solvent in the blue photosensitive resin composition of this invention can be contained 60-90 mass%, Preferably it is 60-85 mass% with respect to the whole blue photosensitive resin composition containing it.
- content of a solvent is the said range, since applicability
- the blue pattern layer blue photosensitive resin composition which concerns on this invention is a filler, another high molecular compound, a pigment dispersant as needed.
- Additives such as an adhesion promoter, antioxidant, a ultraviolet absorber, and an aggregation inhibitor, can be further included.
- the other polymer compound examples include curable resins such as epoxy resins and maleimide resins, thermoplastic resins such as polyvinyl alcohol, polyacrylic acid, polyethylene glycol monoalkyl ethers, polyfluoroalkyl acrylates, polyesters, polyurethanes, and the like. Can be.
- surfactants can be used as the pigment dispersant, and examples thereof include surfactants such as silicone, fluorine, ester, cationic, anionic, nonionic and amphoteric. These can be used individually or in combination of 2 types or more, respectively.
- polyoxyethylene alkyl ether For example, polyoxyethylene alkyl ether, polyoxyethylene alkyl peer ether, polyethyleneglycol diester, sorbitan fatty acid ester, fatty acid modified polyester, tertiary amine modified polyurethane , Polyethylenimine, etc.
- trade names include KP (manufactured by Shin-Etsu Chemical Co., Ltd.), POLYFLOW (manufactured by Kyoeisha Chemical Co., Ltd.), EFTOP (manufactured by Tochem Products), MEGAFAC (manufactured by Dainippon Ink Chemical Industries, Ltd.), Florard (manufactured by Sumitomo 3M), Asahi guard, Surflon (above, manufactured by Asahi Glass), Sol SLSPERSE (made by Genka Corporation), EFKA (made by EFKA Chemicals), PB 821 (made by Ajinomoto Co., Ltd.), etc. are mentioned.
- adhesion promoter for example, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, N- (2-aminoethyl) -3-aminopropyltrimethoxysilane, 3-aminoprotriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2 -(3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-mercaptopropyl Trimethoxysilane etc. are mentioned. Specific examples of the antioxidant include 2,2'-
- ultraviolet absorber examples include 2- (3-tert-butyl-2-hydroxy-5-methylphenyl) -5-chlorobenzothiazole, alkoxybenzophenone and the like.
- aggregation inhibitor examples include sodium polyacrylate and the like.
- the additives can be used by those skilled in the art as appropriate without departing from the effect of the present invention.
- the additive may be used in an amount of 0.05 to 10 parts by weight, preferably 0.1 to 10 parts by weight, more preferably 0.1 to 5 parts by weight, based on 100 parts by weight of the total blue photosensitive resin composition, but is not limited thereto.
- the blue photosensitive resin composition which concerns on this invention can be manufactured, for example by the following method.
- the scattering particles are mixed with the solvent in advance and dispersed using a bead mill or the like until the average particle diameter becomes 30 to 500 nm.
- a dispersing agent can be further used as needed, and some or all of binder resin may be mix
- the remaining dispersion of the binder resin, the photopolymerizable compound, the photopolymerization initiator, other components used as necessary, and additional solvents as necessary, are further added to the obtained dispersion (hereinafter sometimes referred to as a mill base) to a predetermined concentration.
- a desired blue photosensitive resin composition can be obtained.
- Another aspect of the present invention relates to a color filter comprising a blue pattern layer containing a cured product of the blue photosensitive resin composition for forming a blue pattern layer described above.
- the color filter according to the present invention is made of the blue photosensitive resin composition for forming the blue pattern layer instead of the blue quantum dots, the manufacturing cost can be lowered and an excellent viewing angle can be obtained.
- the color filter including the blue pattern layer prepared using the blue photosensitive resin composition of the present invention controls the development speed
- the color filter includes a substrate and a blue pattern layer formed on the substrate.
- the substrate may be the substrate of the color filter itself, or may be a portion where the color filter is positioned in a display device or the like, and is not particularly limited.
- the substrate may be glass, silicon (Si), silicon oxide (SiOx), or a polymer substrate, and the polymer substrate may be polyethersulfone (PES) or polycarbonate (PC).
- the blue pattern layer is a layer including the blue photosensitive resin composition of the present invention, and may be a layer formed by applying the blue photosensitive resin composition for forming a blue pattern layer and exposing, developing and thermosetting in a predetermined pattern. Can be formed by carrying out methods commonly known in the art.
- the color filter may further include one or more selected from the group consisting of a red pattern layer and a green pattern layer.
- the red pattern layer or green pattern layer may include a quantum dot and / or scattering particles.
- the color filter according to the present invention may include a red pattern layer including a red quantum dot or a green pattern layer including a green quantum dot, and the red pattern layer or the green pattern layer may include scattering particles.
- the red pattern layer or the green pattern layer may emit red light or blue light, respectively, by a light source emitting blue light, which will be described later.
- the scattering particles included in the red pattern layer or the green pattern layer may include a metal oxide having an average particle diameter of 30 to 500nm, the details of the scattering particles and the metal oxide The content of the scattering particles and the metal oxide contained in the blue photosensitive resin composition according to the invention can be applied.
- the shape, configuration, and content of the quantum dots included in the red pattern layer or the green pattern layer are not limited, and quantum dots commonly used in the art may be applied.
- the color filter including the substrate and the pattern layer may further include a partition formed between each pattern, and may further include a black matrix, but is not limited thereto.
- the color filter may be a self-luminous color filter.
- the above-described color filter And a light source emitting blue light.
- the image display apparatus includes a color filter including a blue pattern layer including a cured product of the above-described blue photosensitive resin composition and a light source emitting blue light.
- the color filter of the present invention can be applied to various image display devices such as electroluminescent display devices, plasma display devices, field emission display devices, as well as ordinary liquid crystal display devices.
- the image display device includes a color filter including a blue pattern layer and the light source according to the present invention
- a color filter including a blue pattern layer and the light source according to the present invention there is an advantage of having excellent light emission intensity or viewing angle.
- the blue pattern layer included in the color filter according to the present invention does not include blue quantum dots, there is an advantage in that an image display device having low manufacturing cost can be manufactured.
- a flask equipped with a stirrer, a thermometer reflux condenser, a dropping lot, and a nitrogen inlet tube was prepared, and as the monomer dropping lot, 74.8 g (0.20 mol) of benzylmaleimide, 43.2 g (0.30 mol) of acrylic acid, and vinyltoluene 118.0 g (0.50 mol), 4 g of t-butylperoxy-2-ethylhexanoate and 40 g of propylene glycol monomethyl ether acetate (PGMEA) were added thereto, followed by stirring and mixing.
- PGMEA propylene glycol monomethyl ether acetate
- n-dodecanethiol 6g and PGMEA24g were added, and the thing mixed with stirring was prepared.
- the temperature was melt
- the temperature was heated to 120 ° C. to completely dissolve it.
- the acid value was measured and stirred until the acid value was less than 1.0 mgKOH / g. It took 11 hours to reach the target (0.8).
- the temperature of the reactor was lowered to room temperature to obtain a colorless transparent compound of formula 1-2-1.
- the temperature was melt
- the temperature was heated to 120 ° C. to completely dissolve it.
- the acid value was measured and stirred until the acid value was less than 1.0 mgKOH / g. It took 11 hours to reach the target (0.8).
- the temperature of the reactor was lowered to room temperature to obtain a colorless transparent compound of formula 1-2-2.
- HLC-8120GPC manufactured by Tosoh Corporation
- the ratio of the weight average molecular weight and number average molecular weight obtained above was made into molecular weight distribution (Mw / Mn).
- Color filters were prepared using the metal oxide photosensitive resin compositions prepared in Examples 1 to 9 and Comparative Examples 1 to 7. That is, each of the photosensitive resin composition was applied on a glass substrate by spin coating, and then placed on a heating plate and maintained at a temperature of 100 ° C. for 3 minutes to form a thin film.
- test photomask having a transmissive pattern of 20 mm x 20 mm square and a line / space pattern of 1 to 100 ⁇ m was placed on the thin film and irradiated with ultraviolet rays at a distance of 100 ⁇ m from the test photomask.
- the ultraviolet light source was irradiated with an exposure amount (365 nm) of 200 mJ / cm 2 under an atmospheric atmosphere using an ultra high pressure mercury lamp (trade name USH-250D) manufactured by Ushio Denki Co., Ltd., and no special optical filter was used.
- an ultra high pressure mercury lamp (trade name USH-250D) manufactured by Ushio Denki Co., Ltd., and no special optical filter was used.
- the thin film irradiated with ultraviolet rays was developed by soaking for 80 seconds in a KOH aqueous solution developing solution of pH 10.5.
- the thin film coated glass plate was washed with distilled water, dried by blowing nitrogen gas, and heated in a heating oven at 150 ° C. for 10 minutes to prepare a color filter pattern.
- the film thickness of the color pattern prepared above was 5.0 ⁇ m.
- the color filters prepared from the blue photosensitive resin compositions of Examples 1 to 5 and Comparative Examples 1 to 3 were evaluated as shown in Table 3 below. Evaluation criteria for each experiment are as follows.
- Sensitivity The degree of formation of a flawless thin film of the sensitivity mask fine pattern (1 to 60) (the lower the value, the better the sensitivity).
- Pattern Stability Pattern error after exposure of pattern mask at low exposure amount (20-100mJ)
- ⁇ , X is the result confirmed by the optical microscope of the three-dimensional surface shaper.
- Tapered line width ( ⁇ m) Post-exposure line width of 100 ⁇ m pattern of pattern mask.
- the developing speed exceeds 60 seconds, it is impossible to manufacture within a given process time, and if it exceeds 30 seconds, the roughness of the pattern surface becomes uneven and uniformity may also be reduced.
- the development speed was less than 30 seconds, and the sensitivity was less than 60, and it was confirmed that the pattern stability and the taper line width had excellent effects.
- Comparative Example 1 the scattering particles are not included, the pattern stability is unstable, causing an imbalance of the pattern.
- Comparative Example 2 when combined with only acrylic resin, the scattering particles and the blue colorant could not be supported as strongly as the cardo-based binder resin, and thus peeled off, and in Comparative Example 3, photopolymerizable without ethylene oxide and propylene oxide In the case of the compound, the development speed was significantly decreased, and the long development speed confirmed that pattern stability and pattern imbalance occurred.
- the size of the pattern obtained through the line / space pattern mask designed to 100 ⁇ m of the color filters manufactured using the metal oxide photosensitive resins prepared in Examples 1 to 5 and Comparative Examples 1 to 3 was obtained by OM equipment (ECLIPSE LV100POL Nikon). G) through the pattern size was measured, the results are shown in Table 4 below.
- the difference between the design value of the line / space pattern mask and the measured value of the obtained fine pattern is 20 ⁇ m or more, it is difficult to implement the fine pixel.
- Diffusion rate (B 70 + B 20 ) / 2 x B 5 x 100
- I means light intensity measured at each angle, and means measured at B 70, B 20, B 5 70 degrees, 20 degrees and 5 degrees.
- Examples 1 to 5 including the photopolymerizable compound added with ethylene oxide and propylene oxide had a diffusion ratio of 85 or more, and it was confirmed that the viewing angle was very excellent.
- Comparative Examples 1 and 3 the diffusion rate was remarkably dropped compared to Examples 1 to 5, and it was confirmed that the diffusion angle could not be measured because the viewing angle was lowered or peeled off.
- the present invention includes a photopolymerizable compound containing alkylene oxide in the blue photosensitive resin composition, to control the development speed, solve the problem caused by the process residue by eliminating the residue of the pattern, and poor display problems are improved
- the present invention provides a color filter in which the problem of resist non-developing is improved.
- it is possible to provide a high-quality self-luminous color filter having an excellent viewing angle by adjusting the taper.
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Abstract
Description
본 발명은 청색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치에 관한 것이다.The present invention relates to a blue photosensitive resin composition, a color filter manufactured using the same, and an image display device.
컬러필터는 백색광에서 적색, 녹색 및 청색의 3가지 색을 추출하여 미세한 화소단위로 가능하게 하는 박막 필름형 광학부품으로서, 한 화소의 크기가 수십에서 수백 마이크로미터 정도이다. 이러한 컬러필터는 각각의 화소 사이의 경계부분을 차광하기 위하여 투명 기판 상에 정해진 패턴으로 형성된 블랙 매트릭스 층 및 각각의 화소를 형성하기 위해 복수의 색(통상적으로 적색(R), 녹색(G) 및 청색(B))의 3원색을 정해진 순서로 배열한 화소부가 차례로 적층된 구조를 취하고 있다.The color filter is a thin film type optical component that extracts three colors of red, green, and blue from white light and makes them possible in fine pixel units. The size of one pixel is about tens to hundreds of micrometers. Such a color filter includes a black matrix layer formed in a predetermined pattern on a transparent substrate to shield the boundary between each pixel, and a plurality of colors (typically red (R), green (G) and The pixel units in which the three primary colors of blue (B) are arranged in a predetermined order are stacked in this order.
최근에는 컬러필터를 구현하는 방법 중의 하나로서, 안료 분산형의 감광성 수지를 이용한 안료 분산법이 적용되고 있으나, 광원에서 조사된 광이 컬러필터를 투과하는 과정에서 광의 일부가 컬러필터에 흡수되어 광 효율이 저하되고, 또한 색 필터에 포함되어 있는 안료의 특성으로 인하여 색재현이 저하되는 문제점이 발생하고 있다.Recently, as one of the methods of implementing a color filter, a pigment dispersion method using a pigment-dispersible photosensitive resin has been applied, but a part of the light is absorbed by the color filter while the light emitted from the light source passes through the color filter. The problem is that the efficiency is lowered and the color reproduction is lowered due to the characteristics of the pigment contained in the color filter.
이러한 문제점을 해결하기 위해 양자점을 포함하는 자발광 감광성 수지 조성물을 이용한 컬러필터 제조방법이 제안되었다.In order to solve this problem, a color filter manufacturing method using a self-luminous photosensitive resin composition including a quantum dot has been proposed.
구체적으로 대한민국 공개특허 제2007-0094679호는 양자점(Quantum Dot)들로 형성된 컬러필터층을 가져 색 재현성을 높일 수 있다고 제시하고 있고, 대한민국 공개특허 제2009-0036373호는 기존의 컬러필터를 양자점 형광체로 이루어진 발광층으로 대치함으로써 발광 효율을 향상시켜 표시품질을 개선할 수 있다고 제시하고 있다.Specifically, Korean Patent Publication No. 2007-0094679 suggests that color reproducibility can be improved by having a color filter layer formed of quantum dots, and Korean Patent Publication No. 2009-0036373 uses a conventional color filter as a quantum dot phosphor. It is proposed that the display quality can be improved by improving the luminous efficiency by replacing the light emitting layer.
그러나, 현재까지 컬러필터를 제조하기 위해 개발된 감광성 수지조성물은 공정상 사용하기 충분한 현상속도 제어, 미세패턴 형성, 우수한 광효율 및 시야각 확보 등의 요건을 충분히 만족시키지 못하였다.However, until now, the photosensitive resin composition developed to manufacture a color filter has not sufficiently satisfied the requirements such as development speed control, fine pattern formation, excellent optical efficiency and viewing angle to be sufficiently used in the process.
본 발명은, 현상속도를 제어하고, 미세패턴의 잔사를 없애 공정상의 잔사로 말미암아 나타나는 문제를 해결하고, 표시불량 문제가 개선되며, 우수한 광효율 및 시야각 확보가 가능한 컬러필터, 특히 자발광 컬러필터 구현이 가능한 청색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치를 제공하는 것을 목적으로 한다. The present invention is to control the development speed, to solve the problem caused by the process residue by eliminating the residue of the fine pattern, to improve the poor display, to implement a color filter, especially a self-luminous color filter to ensure excellent light efficiency and viewing angle It is an object of the present invention to provide a blue photosensitive resin composition capable of this, a color filter and an image display device manufactured using the same.
본 발명은, 산란입자, 청색 착색제, 바인더 수지로써 카도계 바인더 수지, 광개시제, 광중합성 화합물, 열경화제 및 용제를 포함하는 청색 감광성 수지 조성물로서, 상기 광중합성 화합물은 알킬렌 옥사이드를 포함하는 광중합성 화합물을 포함하는 것을 특징으로 하는, 청색 감광성 수지 조성물을 제공한다. The present invention provides a blue photosensitive resin composition comprising a scattering particle, a blue colorant, a binder resin, a cardo-based binder resin, a photoinitiator, a photopolymerizable compound, a thermosetting agent and a solvent, wherein the photopolymerizable compound comprises an alkylene oxide. It provides a blue photosensitive resin composition characterized by including a compound.
또한 본 발명은 상술한 청색 감광성 수지 조성물로 이루어진 청색 패턴층을 포함하는 컬러필터를 제공한다.The present invention also provides a color filter comprising a blue pattern layer made of the above-described blue photosensitive resin composition.
또한 본 발명은 상기 컬러필터; 및 청색광을 방출하는 광원;을 포함하는 화상표시장치를 제공한다.In another aspect, the present invention is the color filter; And a light source emitting blue light.
본 발명은 상기 청색 감광성 수지 조성물에 알킬렌 옥사이드를 포함하는 광중합성 화합물을 포함하여, 현상속도를 제어하고, 패턴의 잔사를 없애 공정상의 잔사로 말미암아 나타나는 문제를 해결하고, 표시불량 문제가 개선되며, 레지스트 미현상의 문제가 개선된 컬러필터를 제공한다. 또한, 테이퍼 조절을 통하여 우수한 시야각을 갖는 고품질 화질의 자발광 컬러필터를 제공할 수 있다.The present invention includes a photopolymerizable compound containing alkylene oxide in the blue photosensitive resin composition, to control the development speed, solve the problem caused by the process residue by eliminating the residue of the pattern, and poor display problems are improved In addition, the present invention provides a color filter in which the problem of resist non-developing is improved. In addition, it is possible to provide a high-quality self-luminous color filter having an excellent viewing angle by adjusting the taper.
본 발명의 청색 감광성 수지 조성물은 산란입자, 청색 착색제, 바인더 수지로써 카도계 바인더 수지, 광개시제, 광중합성 화합물 및 용제를 포함할 수 있으며, 특히, 상기 광중합성 화합물은 에틸렌 옥사이드 또는 프로필렌 옥사이드를 포함하는 광중합성 화합물을 포함함으로써, 본 발명의 청색 감광성 수지 조성물을 이용하여 제조된 청색 패턴층을 포함하는 컬러필터는 현상속도를 제어하고, 패턴의 잔사를 없애 공정상의 잔사로 말미암아 나타나는 문제를 해결할 수 있다. 또한, 표시불량 문제가 개선되며, 레지스트 미현상의 문제가 개선된 컬러필터, 특히 자발광 컬러필터를 제공 할 수 있다. 또한, 우수한 시야각을 갖는 고품질 화질의 컬러필터, 특히 자발광 컬러필터 및 이를 포함하는 화상표시 장치를 제공할 수 있다.The blue photosensitive resin composition of the present invention may include a cardo-based binder resin, a photoinitiator, a photopolymerizable compound and a solvent as scattering particles, a blue colorant, and a binder resin, and in particular, the photopolymerizable compound may include ethylene oxide or propylene oxide. By including the photopolymerizable compound, the color filter including the blue pattern layer prepared by using the blue photosensitive resin composition of the present invention can solve the problem caused by the residue on the process by controlling the development speed and eliminating the residue of the pattern. . In addition, it is possible to provide a color filter, in particular, a self-luminous color filter, in which a problem of poor display is improved and an issue of resist non-developing is improved. In addition, it is possible to provide a color filter having an excellent viewing angle, in particular a self-luminous color filter, and an image display device including the same.
이하, 본 발명의 구성을 상세히 설명한다. Hereinafter, the configuration of the present invention will be described in detail.
산란입자Scattering particles
본 발명의 산란입자는 평균입경이 10 내지 1000 nm의 평균입경을 가지는 금속 산화물 일 수 있으며, 평균입경이 30 내지 500 nm범위 일 경우 보다 바람직 하다. 이때 평균 입경이 상기 범위 미만일 경우, 입사된 빛의 충분한 산란 효과를 기대할 수 없고, 평균 입경이 상기 범위 초과일 경우에는 조성물 내에 가라 앉거나 균일한 품질의 자발광층 표면을 얻을 수 없다. The scattering particles of the present invention may be a metal oxide having an average particle diameter of 10 to 1000 nm, more preferably when the average particle diameter is in the range of 30 to 500 nm. In this case, when the average particle diameter is less than the above range, sufficient scattering effect of the incident light cannot be expected, and when the average particle diameter is above the above range, the surface of the self-luminous layer of uniform quality cannot be obtained.
상기 금속산화물은 Li, Be, B, Na, Mg, Al, Si, K, Ca, Sc, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, Rb, Sr, Y, Mo, Cs, Ba, La, Hf, W, Tl, Pb, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Ti, Sb, Sn, Zr, Nb, Ce, Ta, In 및 이들의 조합으로 이루어진 군에서 선택된 1종의 금속을 포함하는 산화물일 수 있다. 보다 구체적으로 Al2O3, SiO2, ZnO, ZrO2, BaTiO3, TiO2, Ta2O5, Ti3O5, ZnO, Nb2O3, SnO, 및 MgO 등으로 이루어진 군에서 선택되는 1종 이상 일 수 있다. 필요한 경우 아크릴레이트 등의 불포화 결합을 갖는 화합물로 표면 처리된 재질도 사용 가능하다.The metal oxide is Li, Be, B, Na, Mg, Al, Si, K, Ca, Sc, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, Rb, Sr, Y, Mo, Cs, Ba, La, Hf, W, Tl, Pb, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Ti, Sb, Sn, Zr, Nb, It may be an oxide including one metal selected from the group consisting of Ce, Ta, In, and combinations thereof. More specifically, Al 2 O 3 , SiO 2 , ZnO, ZrO 2 , BaTiO 3 , TiO 2 , Ta 2 O 5 , Ti 3 O 5 , ZnO, Nb 2 O 3 , SnO, MgO and the like selected from the group It may be one or more. If necessary, a material surface-treated with a compound having an unsaturated bond such as acrylate may be used.
상기 산란입자는 컬러필터의 발광 세기를 충분히 향상시킬 수 있도록 평균입경 및 전체 조성물 내의 함량을 필요에 따라 적절히 조절 할 수 있다.The scattering particles may be appropriately adjusted as necessary to the average particle diameter and the content in the entire composition to sufficiently improve the light emission intensity of the color filter.
또한, 상기 산란입자는 청색 감광성 수지 중의 고형분 총 중량에 대하여 0.1 내지 50중량%으로 포함 될 수 있으며, 바람직하기로 5 내지 35 중량%로 사용할 수 있다. 산란입자가 상기 바람직한 범위 내에 있으면, 발광세기의 증가 효과를 얻을 수 있고, 조성물의 안정성을 확보할 수 있다. In addition, the scattering particles may be included in 0.1 to 50% by weight relative to the total weight of solids in the blue photosensitive resin, preferably 5 to 35% by weight. When the scattering particles are in the above preferred range, the effect of increasing the light emission intensity can be obtained, and the stability of the composition can be ensured.
청색 착색제 Blue colorant
본 발명의 청색 착색제에 있어서, 청색 안료로는 구체적으로 색지수(The society of Dyers and Colourists 출판)에서 피그먼트로 분류되어 있는 화합물을 들 수 있고, 보다 구체적으로는 이하와 같은 색지수(C.I.) 번호의 안료를 들 수 있지만, 반드시 이들로 한정되는 것은 아니다. 청색 안료는 구체적으로 예를 들어, C.I. 피그먼트 블루 15:3, 15:4, 15:6, 16, 21, 28, 및 76 등을 들 수 있으며, C.I. 피그먼트 블루 15:3, 피그먼트 블루 15:6, 피그먼트 블루 16으로 이루어진 군으로부터 선택되는 1종 이상을 포함하는 것이 바람직하다.In the blue colorant of the present invention, examples of the blue pigment include compounds classified as pigments in the color index (Published by The society of Dyers and Colourists), and more specifically, the color index (CI) as follows. Although pigment of number is mentioned, It is not necessarily limited to these. Blue pigments are specifically described, for example, in C.I. Pigment blue 15: 3, 15: 4, 15: 6, 16, 21, 28, and 76, and the like. Pigment Blue 15: 3, Pigment Blue 15: 6, Pigment Blue 16 It is preferable to include at least 1 type selected from the group which consists of.
본 발명의 청색 착색제는 청색 염료를 더 포함할 수 있으며, 청색 염료로는 컬러 인덱스(The Society of Dyers and Colourists 출판)내에 염료로 분류되어 있는 화합물 또는 염색 노트(색염사)에 기재되어 있는 공지의 염료를 들 수 있다.The blue colorant of the present invention may further comprise a blue dye, which is a known dye which is described in a compound or dyeing note (color dyed yarn) classified as a dye in the color index (published by The Society of Dyers and Colourists). And dyes.
상기 추가로 사용할 수 있는 염료를 구체적으로 예를 들면, Specific examples of the dye which can be used further include
C.I. 솔벤트 염료로서,C.I. As solvent dyes,
C.I. 솔벤트 블루 5, 35, 36, 37, 44, 45, 59, 67 및 70 등을 들 수 있으며, C.I. 솔벤트 블루 35, 36, 44, 45 및 70 중 1종 이상을 포함함이 보다 바람직하다. C.I. Solvent blue 5, 35, 36, 37, 44, 45, 59, 67 and 70, and the like. More preferably at least one of Solvent Blue 35, 36, 44, 45 and 70.
또한, C.I. 애시드 염료로서,In addition, C.I. As an acid dye,
C.I.애시드 블루 1, 7, 9, 15, 18, 23, 25, 27, 29, 40, 42, 45, 51, 62, 70, 74, 80, 83, 86, 87, 90, 92, 96, 103, 112, 113, 120, 129, 138, 147, 150, 158, 171, 182, 192, 210, 242, 243, 256, 259, 267, 278, 280, 285, 290, 296, 315, 324:1, 335 및 340등을 들 수 있으며, 그 중에서도 C.I. 애시드 블루 80 및 90중 1종이상을 포함함이 보다 바람직하다. CI acid blue 1, 7, 9, 15, 18, 23, 25, 27, 29, 40, 42, 45, 51, 62, 70, 74, 80, 83, 86, 87, 90, 92, 96, 103 , 112, 113, 120, 129, 138, 147, 150, 158, 171, 182, 192, 210, 242, 243, 256, 259, 267, 278, 280, 285, 290, 296, 315, 324: 1 , 335 and 340, among others CI More preferably, it contains one or more of acid blue 80 and 90.
또한, C.I. 다이렉트 염료로서,In addition, C.I. As a direct dye,
C.I.다이렉트 블루 38, 44, 57, 70, 77, 80, 81, 84, 85, 86, 90, 93, 94, 95, 97, 98, 99, 100, 101, 106, 107, 108, 109, 113, 114, 115, 117, 119, 137, 149, 150, 153, 155, 156, 158, 159, 160, 161, 162, 163, 164, 166, 167, 170, 171, 172, 173, 188, 189, 190, 192, 193, 194, 196, 198, 199, 200, 207, 209, 210, 212, 213, 214, 222, 228, 229, 237, 238, 242, 243, 244, 245, 247, 248, 250, 251, 252, 256, 257, 259, 260, 268, 274, 275 및 293등을 들수 있다.CI direct blue 38, 44, 57, 70, 77, 80, 81, 84, 85, 86, 90, 93, 94, 95, 97, 98, 99, 100, 101, 106, 107, 108, 109, 113 , 114, 115, 117, 119, 137, 149, 150, 153, 155, 156, 158, 159, 160, 161, 162, 163, 164, 166, 167, 170, 171, 172, 173, 188, 189 , 190, 192, 193, 194, 196, 198, 199, 200, 207, 209, 210, 212, 213, 214, 222, 228, 229, 237, 238, 242, 243, 244, 245, 247, 248 , 250, 251, 252, 256, 257, 259, 260, 268, 274, 275 and 293.
C.I.모단토 블루 1, 2, 3, 7, 8, 9, 12, 13, 15, 16, 19, 20, 21, 22, 23, 24, 26, 30, 31, 32, 39, 40, 41, 43, 44, 48, 49, 53, 61, 74, 77, 83 및 84등을 들 수 있다. CI Modanto Blue 1, 2, 3, 7, 8, 9, 12, 13, 15, 16, 19, 20, 21, 22, 23, 24, 26, 30, 31, 32, 39, 40, 41, 43, 44, 48, 49, 53, 61, 74, 77, 83, 84, etc. are mentioned.
상기 청색 염료는 각각 단독 또는 2종 이상을 조합하여 사용할 수 있다.The said blue dye can be used individually or in combination of 2 or more types, respectively.
본 발명의 청색 착색제는 추가 착색제로서, 자색 착색제를 더 포함할 수 있다. 자색착색제는 자색 안료 및 자색 염료 중 하나이상을 포함할 수 있으며, 상기 자색 안료는 구체적으로, C.I. 피그먼트 바이올렛 1, 14, 19, 23, 29, 32, 33, 36, 37 및 38등을 들 수 있으며, 그 중에서도 C.I. 피그먼트 바이올렛 23을 포함함이 보다 바람직 하다. The blue colorant of the present invention may further include a purple colorant as an additional colorant. The purple coloring agent may comprise at least one of a purple pigment and a purple dye, wherein the purple pigment is specifically C.I. Pigment violet 1, 14, 19, 23, 29, 32, 33, 36, 37 and 38, among which C.I. It is more preferred to include pigment violet 23.
자색염료는 구체적으로, C.I. 솔벤트 바이올렛, C.I.애시드 바이올렛, C.I.애시드 바이올렛, C.I.모단토 바이올렛 등을 들 수 있으나, 이에 한정되는 것은 아니다.Purple dyes are specifically, C.I. Solvent violet, C.I. acid violet, C.I. acid violet, C.I. modanto violet, and the like, but are not limited thereto.
구체적으로 상기 C.I. 솔벤트 바이올렛은 C.I. 솔벤트 바이올렛 8, 9, 13, 14, 36, 37, 47 및 49 등을 들 수 있으며, C.I. 솔벤트 바이올렛 13을 포함함이 보다 바람직 하다. C.I.애시드 바이올렛으로는 C.I. 애시드 바이올렛 6B, 7, 9, 17, 19 및 66 등을 들 수 있으며, C.I. 애시드 바이올렛 66을 포함함이 보다 바람직하다. C.I.다이렉트 바이올렛으로는 C.I.다이렉트 바이올렛 47, 52, 54, 59, 60, 65, 66, 79, 80, 81, 82, 84, 89, 90, 93, 95, 96, 103 및 104 등을 들 수 있다.Specifically, the C.I. Solvent violet is C.I. Solvent violet 8, 9, 13, 14, 36, 37, 47 and 49, and the like. More preferably, solvent violet 13 is included. C.I. acid violet includes C.I. Acid violet 6B, 7, 9, 17, 19 and 66, and the like. More preferably, acid violet 66 is included. CI direct violet includes CI direct violet 47, 52, 54, 59, 60, 65, 66, 79, 80, 81, 82, 84, 89, 90, 93, 95, 96, 103 and 104. .
또한, C.I.모단토 바이올렛 1, 2, 4, 5, 7, 14, 22, 24, 30, 31, 32, 37, 40, 41, 44, 45, 47, 48, 53 및 58 등을 들 수 있다.Furthermore, CI modanto violet 1, 2, 4, 5, 7, 14, 22, 24, 30, 31, 32, 37, 40, 41, 44, 45, 47, 48, 53, 58, etc. are mentioned. .
상기 청색 착색제는 청색 감광성 수지 중의 고형분 총 중량에 대하여 0.1 내지 50중량%를 사용할 수 있으며, 바람직하게는 0.5 내지 30중량%고 사용할 수 있다. 청색 착색제의 함량이 상기 범위를 만족하는 경우, 외광 반사를 억제하고, 색의 발광 세기를 효과적으로 나타낼 수 있으며, 점도의 안정성을 확보할 수 있다. The blue colorant may be used in an amount of 0.1 to 50% by weight, preferably 0.5 to 30% by weight, based on the total weight of solids in the blue photosensitive resin. When the content of the blue colorant satisfies the above range, it is possible to suppress the reflection of external light, to effectively exhibit the emission intensity of the color, and to ensure the stability of the viscosity.
본 발명에서는 청색 양자점을 포함하지 않음에도 청색 착색제 및 산란입자를 포함함으로써, 컬러필터, 특히 자발광 컬러필터의 청색 화소의 효율의 저하를 방지할 수 있다.In the present invention, the blue colorant and the scattering particles are included even though the blue quantum dots are not included, thereby reducing the efficiency of the blue pixel of the color filter, particularly the self-luminous color filter.
바인더 수지Binder resin
본 발명의 바인더 수지는, 카도계 바인더 수지를 포함한다. 상기 카도계 바인더 수지는 광이나 열의 작용에 의한 반응성 및 알칼리 용해성을 갖고, 착색재료의 분산매로서 작용한다. 본 발명의 청색 감광성 수지 조성물에 함유되는 카도계 바인더 수지는 산란입자에 대한 결합제수지로서 작용하고, 컬러필터의 제조를 위한 현상 단계에서 사용된 알칼리성 현상액에 용해 가능한 수지라면 제한되지 않는다.The binder resin of this invention contains cardo system binder resin. The cardo-based binder resin has reactivity and alkali solubility due to the action of light or heat and acts as a dispersion medium of the coloring material. The cardo-based binder resin contained in the blue photosensitive resin composition of the present invention is not limited as long as it is a resin that acts as a binder resin for scattering particles and is soluble in an alkaline developer used in the developing step for producing a color filter.
본 발명의 카도계 바인더 수지는 화학식 1-1 및 화학식 1-2로 표시되는 화합물 중 하나 이상을 포함하는 것일 수 있다.The cardo-based binder resin of the present invention may include one or more of the compounds represented by Formulas 1-1 and 1-2.
[화학식 1-1][Formula 1-1]
[화학식 1-2][Formula 1-2]
상기 화학식 1-1 또는 화학식 1-2 에서, In Chemical Formula 1-1 or Chemical Formula 1-2,
R1, R2, R3 및 R4는 각각 독립적으로, 이며; R 1 , R 2 , R 3 and R 4 are each independently, Is;
X는 수소 원자, 탄소수 1 내지 5의 알킬기, 또는 수산기이고;X is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a hydroxyl group;
R5는 수소 원자 또는 탄소수 1 내지 5의 알킬기 이다.R 5 is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms.
본 발명에서 상기 화학식 1-1로 표시되는 화합물은 하기 화학식 2-1로 표시되는 화합물로 합성되고, 화학식 1-2로 표시되는 화합물은 화학식 2-2로 표시되는 화합물을 이용하여 합성될 수 있다.In the present invention, the compound represented by Chemical Formula 1-1 may be synthesized by the compound represented by Chemical Formula 2-1, and the compound represented by Chemical Formula 1-2 may be synthesized using the compound represented by Chemical Formula 2-2. .
본 발명에서 상기 화학식 1-1로 표시되는 화합물은 하기 화학식 2-1로 표시되는 화합물로 합성되고, 화학식 1-2로 표시되는 화합물은 화학식 2-2로 표시되는 화합물을 이용하여 합성될 수 있다. In the present invention, the compound represented by Chemical Formula 1-1 may be synthesized by the compound represented by Chemical Formula 2-1, and the compound represented by Chemical Formula 1-2 may be synthesized using the compound represented by Chemical Formula 2-2. .
[화학식 2-1][Formula 2-1]
[화학식 2-2][Formula 2-2]
구체적으로, 상기 화학식 1-1로 표시되는 화합물은 화학식 1-1-1 및 화학식 1-1-2로 표시되는 화합물 중 하나 이상이고, 상기 화학식 1-2로 표시되는 화합물은 화학식 1-2-1 및 화학식 1-2-2로 표시되는 화합물 중 하나 이상일 수 있다. Specifically, the compound represented by Formula 1-1 is at least one of the compounds represented by Formula 1-1-1 and Formula 1-1-2, and the compound represented by Formula 1-2 is represented by Formula 1-2- 1 and one or more compounds represented by Formula 1-2-2.
[화학식 1-1-1][Formula 1-1-1]
[화학식 1-1-2][Formula 1-1-2]
[화학식 1-2-1][Formula 1-2-1]
[화학식 1-2-2][Formula 1-2-2]
상기 카도계 바인더 수지는 9,9-비스(3-시나믹 디에스테르)플루오렌(9,9-bis(3-cinnamic diester)fluorene), 9,9-비스(3-시나모일, 4-하이드록시페닐)플루오렌(9,9-bis(3-cinnamoil, 4-hydroxyphenyl)fluorene), 9,9-비스(글리시딜 메타크릴레이트 에테르)플루오렌(9,9-bis(glycidyl methacrylate ether)fluorene), 9,9-비스(3,4-디하이드록시페닐)플루오렌 디시나믹 에스테르(9,9-bis(3,4-dihydroxyphenyl)fluorene dicinnamic ester), 3,6-디글리시딜 메타크릴레이트 에테르 스피로(플루오렌-9,9-잔텐)(3,6-diglycidyl methacrylate ether spiro(fluorene-9,9-xantene)), 9,9-비스(3-알릴, 4-하이드록시페닐플루오렌)(9,9-bis(3-allyl, 4-hydroxyphenlylfluorene), 9,9-비스(4-알릴록시페닐)플루오렌(`9,9-bis(4-allyloxyphenyl)fluorene) 및 9,9-비스(3,4-메타크릴릭 디에스테르)플루오렌(9,9-bis(3,4-methacrylic diester)fluorine)로 이루어진 군에서 선택된 적어도 1종과 산무수화합물로서 무수말레인산, 무수숙신산, 무수이타콘산, 무수프탈산, 무수테트라히드로프탈산, 무수헥사히드로프탈산, 무수메틸렌도 메틸렌테트라히드로프탈산, 무수클로로렌드산, 무수메틸테트라히드로프탈산으로 이루어진 군 또는 산2무수물로서 무수피로멜리트산, 벤조페논테트라카르복시산2무수물, 바이페닐테트라카르복시산2무수물, 바이테닐에테르테트라카르복시산2무수물 등의 방향족다가카르복시시산무수물로 이루어진 군에서 선택된 적어도 1종과 반응을 시켜 제조할 수 있으나 이에 한정되지 않는다. The cardo-based binder resin is 9,9-bis (3-cinnamic diester) fluorene (9,9-bis (3-cinnamic diester) fluorene), 9,9-bis (3- cinnamoyl, 4-hydride Hydroxyphenyl) fluorene (9,9-bis (3-cinnamoil, 4-hydroxyphenyl) fluorene), 9,9-bis (glycidyl methacrylate ether) fluorene (9,9-bis (glycidyl methacrylate ether) fluorene), 9,9-bis (3,4-dihydroxyphenyl) fluorene dinamic ester (9,9-bis (3,4-dihydroxyphenyl) fluorene dicinnamic ester), 3,6-diglycidyl meta Acrylate ether spiro (3,6-diglycidyl methacrylate ether spiro (fluorene-9,9-xantene)), 9,9-bis (3-allyl, 4-hydroxyphenylflu Orene) (9,9-bis (3-allyl, 4-hydroxyphenlylfluorene), 9,9-bis (4-allyloxyphenyl) fluorene (`9,9-bis (4-allyloxyphenyl) fluorene) and 9,9 Acid anhydrides with at least one member selected from the group consisting of bis (3,4-methacrylic diester) fluorene (9,9-bis (3,4-methacrylic diester) fluorine) Maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methylene anhydrous methylenetetrahydrophthalic anhydride, anhydrous chlororenic acid, methyltetrahydrophthalic anhydride, or an acid dianhydride. It can be prepared by reacting with at least one selected from the group consisting of aromatic polyhydric carboxylic acid anhydrides such as pyromellitic anhydride, benzophenone tetracarboxylic acid dianhydride, biphenyltetracarboxylic acid dianhydride, and bitenyl ether tetracarboxylic acid dianhydride. It is not limited.
본 발명은 바인더 수지로써 아크릴계 알칼리 가용성 수지가 더 포함될 수 있다. 상기 아크릴계 알칼리 가용성 수지는 예를 들면 카르복실기 함유 단량체, 및 이 단량체와 공중합 가능한 다른 단량체와의 공중합체등을 들 수 있다. 카르복실기 함유 단량체로서는, 예를 들면 불포화 모노카르복실산이나, 불포화 디카르복실산, 불포화 트리카르복실산 등의 분자 중에 1개 이상의 카르복실기를 갖는 불포화 다가 카르복실산 등의 불포화 카르복실산 등을 들수 있다. 여기서, 불포화 모노카르복실산으로서는, 예를 들면 아크릴산, 메타크릴산, 크로톤산, α-클로로아크릴산, 신남산 등을 들 수 있다. 불포화 디카르복실산으로서는, 예를 들면 말레산, 푸마르산, 이타콘산, 시트라콘산, 메사콘산 등을 들 수 있다. 불포화 다가 카르복실산은 산무수물일 수도 있으며, 구체적으로는 말레산 무수물, 이타콘산 무수물, 시트라콘산 무수물 등을 들 수 있다. 또한, 불포화 다가 카르복실산은 그의 모노(2-메타크릴일옥시알킬)에스테르일 수도 있으며, 예를 들면 숙신산 모노(2-아크릴로일옥시에틸), 숙신산 모노(2-메타크릴로일옥시에틸), 프탈산 모노(2-아크릴로일옥시에틸), 프탈산 모노(2-메타크릴로일옥시에틸) 등을 들 수 있다. 불포화 다가 카르복실산은 그 양말단 디카르복시 중합체의 모노(메타)아크릴레이트일 수도 있으며, 예를 들면 ω-카르복시폴리카프로락톤 모노아크릴레이트, ω-카르복시폴리카프로락톤 모노메타크릴레이트 등을 들 수 있다. 이들 카르복실기 함유 단량체는 각각 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다. 상기 카르복실기 함유 단량체와 공중합 가능한 다른 단량체로서는, 예를 들면 스티렌, α-메틸스티렌, o-비닐톨루엔, m-비닐톨루엔, p-비닐톨루엔, p-클로로스티렌, o-메톡시스티렌, m-메톡시스티렌, p-메톡시스티렌, o-비닐벤질메틸에테르, m-비닐벤질메틸에테르, p-비닐벤질메틸에테르, o-비닐벤질글리시딜에테르, m-비닐벤질글리시딜에테르, p-비닐벤질글리시딜에테르, 인덴 등의 방향족 비닐 화합물; 메틸아크릴레이트, 메틸메타크릴레이트, 에틸아크릴레이트, 에틸메타크릴레이트, n-프로필아크릴레이트, n-프로필메타크릴레이트, i-프로필아크릴레이트, i-프로필메타크릴레이트, n-부틸아크릴레이트, n-부틸메타크릴레이트, i-부틸아크릴레이트, i-부틸메타크릴레이트, sec-부틸아크릴레이트, sec-부틸메타크릴레이트, t-부틸아크릴레이트, t-부틸메타크릴레이트, 2-히드록시에틸아크릴레이트, 2-히드록시에틸메타크릴레이트, 2-히드록시프로필아크릴레이트, 2-히드록시프로필메타크릴레이트, 3-히드록시프 로필아크릴레이트, 3-히드록시프로필메타크릴레이트, 2-히드록시부틸아크릴레이트, 2-히드록시부틸메타크릴레이 트, 3-히드록시부틸아크릴레이트, 3-히드록시부틸메타크릴레이트, 4-히드록시부틸아크릴레이트, 4-히드록시부틸메타크릴레이트, 알릴아크릴레이트, 알릴메타크릴레이트, 벤질아크릴레이트, 벤질메타크릴레이트, 시클로헥실아크릴레이트, 시클로헥실메타크릴레이트, 페닐아크릴레이트, 페닐메타크릴레이트, 2-메톡시에틸아크릴레이트, 2-메톡시에틸메타크릴레이트, 2-페녹시에틸아크릴레이트, 2-페녹시에틸메타크릴레이트, 메톡시디에틸렌글리콜아크릴레이트, 메톡시디에틸렌글리콜메타크릴레이트, 메톡시트리에틸렌글리콜아크릴레이트, 메톡시트리에틸렌글리콜메타크릴레이트, 메톡시프로필렌글리콜아크릴레이트, 메톡시프로필렌글리콜메타크릴레이트, 메톡시디프로필렌글리콜아크릴레이트, 메톡시디프로필렌글리콜메타크릴레이트, 이소보르닐아크릴레이트, 이소보르닐메타크릴레이트, 디시클로펜타디에닐아크릴레이트, 디시클로펜타디에틸메타크릴레이트, 아다만틸(메타)아크릴레이트, 노르보르닐(메타)아크릴레이트, 2-히드록시-3-페녹시프로필아크릴레이트, 2-히드록시-3-페녹시프로필메타크릴레이트, 글리세롤모노아크릴레이트, 글리세롤모노메타크릴레이트 등의 불포화 카르복실산 에스테르류; 2-아미노에틸아크릴레이트, 2-아미노에틸메타크릴레이트, 2-디메틸아미노에틸아크릴레이트, 2-디메틸아미노에틸 메타크릴레이트, 2-아미노프로필아크릴레이트, 2-아미노프로필메타크릴레이트, 2-디메틸아미노프로필아크릴레이트, 2-디메틸아미노프로필메타크릴레이트, 3-아미노프로필아크릴레이트, 3-아미노프로필메타크릴레이트, 3-디메틸아미노프로필아크릴레이트, 3-디메틸아미노프로필메타크릴레이트 등의 불포화 카르복실산 아미노알킬에스테르류; 글리시딜아크릴레이트, 글리시딜메타크릴레이트 등의 불포화 카르복실산 글리시딜에스테르류; 아세트산 비닐, 프로피온산 비닐, 부티르산 비닐, 벤조산 비닐 등의 카르복실산 비닐에스테르류; 비닐메틸에테르, 비닐에틸에테르, 알릴글리시딜에테르 등의 불포화 에테르류; 아크릴로니트릴, 메타크릴로니트릴, α-클로로아크릴로니트릴, 시안화 비닐리덴 등의 시안화 비닐 화합물; 아크릴아미드, 메타크릴아미드, α-클로로아크릴아미드, N-2-히드록시에틸아크릴아미드, N-2-히드록시에틸메타크릴아미드 등의 불포화 아미드류; 말레이미드, 벤질말레이미드, N-페닐말레이미드. N-시클로헥실말레이미드 등의 불포화 이미드류; 1,3-부타디엔, 이소프렌, 클로로프렌 등의 지방족 공액 디엔류; 및 폴리스티렌, 폴리메틸아크릴레이트, 폴리메틸메타크릴레이트, 폴리-n-부틸아크릴레이트, 폴리-n-부틸메타크릴레이트, 폴리실록산의 중합체 분자쇄의 말단에 모노아크릴로일기 또는 모노메타크릴로일기를 갖는 거대 단량체류등을 들 수 있다. 이들 단량체는 각각 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다. 특히, 상기 카르복실기 함유 단량체와 공중합 가능한 다른 단량체로서 노르보닐 골격을 갖는 단량체, 아다만탄골격을 갖는 단량체, 로진 골격을 갖는 단량체 등의 벌키성 단량체가 비유전 상수값을 낮추는 경향이 있기 때문에 바람직하다.The present invention may further include an acrylic alkali-soluble resin as a binder resin. Examples of the acrylic alkali-soluble resin include a carboxyl group-containing monomer and a copolymer with another monomer copolymerizable with the monomer. As a carboxyl group-containing monomer, unsaturated carboxylic acids, such as unsaturated monocarboxylic acid, unsaturated polycarboxylic acid, such as unsaturated polyhydric carboxylic acid which has one or more carboxyl groups in molecules, such as unsaturated dicarboxylic acid and unsaturated tricarboxylic acid, are mentioned, for example. have. Here, as unsaturated monocarboxylic acid, acrylic acid, methacrylic acid, crotonic acid, (alpha)-chloroacrylic acid, cinnamic acid etc. are mentioned, for example. As unsaturated dicarboxylic acid, a maleic acid, a fumaric acid, itaconic acid, a citraconic acid, a mesaconic acid, etc. are mentioned, for example. The unsaturated polyhydric carboxylic acid may be an acid anhydride, and specific examples thereof include maleic anhydride, itaconic anhydride and citraconic anhydride. In addition, the unsaturated polyhydric carboxylic acid may be mono (2-methacrylyloxyalkyl) ester thereof, for example, succinic mono (2-acryloyloxyethyl), succinic acid mono (2-methacryloyloxyethyl) And phthalic acid mono (2-acryloyloxyethyl), phthalic acid mono (2-methacryloyloxyethyl) and the like. The unsaturated polyhydric carboxylic acid may be mono (meth) acrylate of the sock end dicarboxy polymer, and examples thereof include? -Carboxypolycaprolactone monoacrylate and? -Carboxypolycaprolactone monomethacrylate. . These carboxyl group-containing monomers can be used individually or in mixture of 2 or more types, respectively. As another monomer copolymerizable with the said carboxyl group-containing monomer, For example, styrene, (alpha) -methylstyrene, o-vinyl toluene, m-vinyl toluene, p-vinyl toluene, p-chloro styrene, o-methoxy styrene, m-meth Oxy styrene, p-methoxy styrene, o-vinyl benzyl methyl ether, m-vinyl benzyl methyl ether, p-vinyl benzyl methyl ether, o-vinyl benzyl glycidyl ether, m-vinyl benzyl glycidyl ether, p- Aromatic vinyl compounds such as vinyl benzyl glycidyl ether and indene; Methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, n-propyl acrylate, n-propyl methacrylate, i-propyl acrylate, i-propyl methacrylate, n-butyl acrylate, n-butyl methacrylate, i-butyl acrylate, i-butyl methacrylate, sec-butyl acrylate, sec-butyl methacrylate, t-butyl acrylate, t-butyl methacrylate, 2-hydroxy Ethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 3-hydroxy propyl acrylate, 3-hydroxypropyl methacrylate, 2- Hydroxybutyl acrylate, 2-hydroxybutyl methacrylate, 3-hydroxybutyl acrylate, 3-hydroxybutyl methacrylate, 4-hydroxybutyl acrylate, 4-hydroxybutyl methacrylate, Allyl Acrylate, allyl methacrylate, benzyl acrylate, benzyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, phenyl acrylate, phenyl methacrylate, 2-methoxyethyl acrylate, 2-methoxyethyl Methacrylate, 2-phenoxyethyl acrylate, 2-phenoxyethyl methacrylate, methoxydiethylene glycol acrylate, methoxydiethylene glycol methacrylate, methoxytriethylene glycol acrylate, methoxytriethylene glycol meth Methacrylate, methoxy propylene glycol acrylate, methoxy propylene glycol methacrylate, methoxy dipropylene glycol acrylate, methoxy dipropylene glycol methacrylate, isobornyl acrylate, isobornyl methacrylate, dicyclopentadier Nyl acrylate, dicyclopentadiethyl methacrylate, adamantyl (meth) Acrylate, norbornyl (meth) acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-hydroxy-3-phenoxypropyl methacrylate, glycerol monoacrylate, glycerol monomethacrylate, etc. Unsaturated carboxylic acid esters; 2-aminoethyl acrylate, 2-aminoethyl methacrylate, 2-dimethylaminoethyl acrylate, 2-dimethylaminoethyl methacrylate, 2-aminopropyl acrylate, 2-aminopropyl methacrylate, 2-dimethyl Unsaturated carboxyl such as aminopropyl acrylate, 2-dimethylaminopropyl methacrylate, 3-aminopropyl acrylate, 3-aminopropyl methacrylate, 3-dimethylaminopropyl acrylate and 3-dimethylaminopropyl methacrylate Acid aminoalkyl esters; Unsaturated carboxylic acid glycidyl esters such as glycidyl acrylate and glycidyl methacrylate; Carboxylic acid vinyl esters such as vinyl acetate, vinyl propionate, vinyl butyrate and vinyl benzoate; Unsaturated ethers such as vinyl methyl ether, vinyl ethyl ether and allyl glycidyl ether; Vinyl cyanide compounds such as acrylonitrile, methacrylonitrile, α-chloroacrylonitrile and vinylidene cyanide; Unsaturated amides such as acrylamide, methacrylamide, α-chloroacrylamide, N-2-hydroxyethylacrylamide and N-2-hydroxyethyl methacrylamide; Maleimide, benzylmaleimide, N-phenylmaleimide. Unsaturated imides such as N-cyclohexylmaleimide; Aliphatic conjugated dienes such as 1,3-butadiene, isoprene and chloroprene; And monoacryloyl or monomethacryloyl groups at the terminal of the polymer molecular chain of polystyrene, polymethylacrylate, polymethylmethacrylate, poly-n-butylacrylate, poly-n-butylmethacrylate, polysiloxane. And macromonomers to have. These monomers can be used individually or in mixture of 2 or more types, respectively. In particular, bulky monomers such as monomers having a norbornyl skeleton, monomers having an adamantane skeleton, and monomers having a rosin skeleton as the other monomers copolymerizable with the carboxyl group-containing monomer are preferable because they tend to lower the dielectric constant. .
본 발명의 카도계 바인더 수지 및/또는 아크릴계 알칼리 가용성 수지로는 산가가 20 내지 200(KOH ㎎/g)의 범위가 바람직하다. 산가가 상기 범위에 있으면, 현상액 중의 용해성이 향상되어, 비-노출부가 쉽게 용해되고 감도가 증가하여, 결과적으로 노출부의 패턴이 현상시에 남아서 잔막율(film remaining ratio)을 개선하게 되어 바람직하다. 여기서 산가란, 아크릴계 중합체 1g을 중화하는 데 필요한 수산화칼륨의 양(mg)으로서 측정되는 값이며, 통상적으로 수산화칼륨 수용액을 사용하여 적정함으로써 구할 수 있다. 또한, 겔 투과 크로마토그래피(GPC; 테트라히드로퓨란을 용출용제로 함)로 측정한 폴리스티렌 환산 중량평균분자량(이하, 간단히 '중량평균분자량'이라고 한다)인 2,000 내지 200,000, 바람직하게는 3,000 내지 100,000인 카도계 바인더 수지 또는 아크릴계 알칼리 가용성 수지가 바람직하다. 분자량이 상기 범위에 있으면, 코팅 필름의 경도가 향상되어, 잔막율이 높고, 현상액 중의 비-노출부의 용해성이 탁월하고 해상도가 향상되는 경향이 있어 바람직하다.As the cardo binder resin and / or the acrylic alkali-soluble resin of the present invention, the acid value is preferably in the range of 20 to 200 (KOH mg / g). If the acid value is in the above range, the solubility in the developing solution is improved, so that the non-exposed part is easily dissolved and the sensitivity is increased, and as a result, the pattern of the exposed part remains at the time of development to improve the film remaining ratio. The acid value is a value measured as the amount (mg) of potassium hydroxide required to neutralize 1 g of the acrylic polymer, and can usually be obtained by titration using an aqueous potassium hydroxide solution. Also, the polystyrene reduced weight average molecular weight (hereinafter, simply referred to as 'weight average molecular weight') measured by gel permeation chromatography (GPC; tetrahydrofuran as an eluting solvent) is 2,000 to 200,000, preferably 3,000 to 100,000. Cardo binder resin or acrylic alkali-soluble resin is preferable. When the molecular weight is in the above range, the hardness of the coating film is improved, the residual film ratio is high, the solubility of the non-exposed portion in the developer is excellent and the resolution tends to be improved, which is preferable.
카도계 바인더 수지 및/또는 아크릴계 알칼리 가용성 수지의 분자량 분포[중량평균분자량(Mw)/수평균분자량(Mn)]는 1.0 내지 6.0 인 것이 바람직하고, 1.5내지 6.0인 것이 보다 바람직하다. 분자량분포[중량평균분자량(Mw)/수평균분자량(Mn)]가 1.5 내지 6.0이면 현상성이 우수하기 때문에 바람직하다. The molecular weight distribution [weight average molecular weight (Mw) / number average molecular weight (Mn)] of the cardo-based binder resin and / or the acrylic alkali-soluble resin is preferably 1.0 to 6.0, and more preferably 1.5 to 6.0. If molecular weight distribution [weight average molecular weight (Mw) / number average molecular weight (Mn)] is 1.5-6.0, since developability is excellent, it is preferable.
본 발명의 바인더 수지는 청색 감광성 수지 중의 고형분 총 중량에 대하여 5 내지 85중량%, 바람직하게는 5 내지 60중량%를 사용할 수 있다. 바인더 수지의 함유량이 상기의 범위 내에 있으면 현상액에의 용해성이 충분하여 비화소 부분의 기판상에 현상 잔사가 발생하기 어렵고, 현상시에 노광부의 화소 부분의 막 감소가 생기기 어려워 비화소 부분의 누락성이 양호한 경향이 있으므로 바람직하다. The binder resin of the present invention may use 5 to 85% by weight, preferably 5 to 60% by weight based on the total weight of solids in the blue photosensitive resin. When the content of the binder resin is within the above range, the solubility in the developing solution is sufficient, and development residues are less likely to occur on the substrate of the non-pixel portion. It is preferable because this tends to be good.
광중합성 화합물Photopolymerizable compound
본 발명의 청색 감광성 수지 조성물에 포함되는 광중합성 화합물은 광 및 후술하는 광중합 개시제의 작용으로 중합 가능한 화합물로서, 구체적으로 알킬렌 옥사이드를 포함하는 광중합성 화합물, 바람직하게는 에틸렌 옥사이드 및/또는 프로필렌 옥사이드를 포함하는 광중합성 화합물을 들 수 잇다. 상기 에틸렌 옥사이드 및/또는 프로필렌 옥사이드가 부가된 광중합성 화합물을 포함할 경우 현상속도를 제어하고, 패턴의 잔사를 없애, 공정상의 잔사로 말미암아 나타날 수 있는 여러 문제들을 해결할 수 있어, 표시불량을 개선할 수 있으며, 레지스트 미현상을 없앨 수있고, 테이퍼 조절등을 통해, 우수한 시야각 을 형성하여, 고품질 화질의 소자를 제조할 수 있다. The photopolymerizable compound included in the blue photosensitive resin composition of the present invention is a compound that can be polymerized by the action of light and a photopolymerization initiator described below, and specifically, a photopolymerizable compound containing alkylene oxide, preferably ethylene oxide and / or propylene oxide. And a photopolymerizable compound containing a. When the photopolymerizable compound added with ethylene oxide and / or propylene oxide is included, various problems that may occur due to process residues can be solved by controlling the development speed, eliminating the residues of the pattern, and improving display defects. It is possible to eliminate the resist non-development, and to adjust the taper, to form an excellent viewing angle, it is possible to manufacture a device of high quality image quality.
상기 알킬렌옥사이드를 포함하는 광중합성 화합물로서는, 알킬렌옥사이드 변성 펜타에리트리톨(메타)아크릴레이트 화합물, 알킬렌옥사이드 변성 디펜타에리트리톨(메타)아크릴레이트 화합물, 알킬렌옥사이드 변성 트리메티롤프로판(메타)아크릴레이트 화합물, 및 알킬렌옥사이드 변성 글리세린(메타)아크릴레이트 화합물을 들 수 있으며, 보다 구체적으로 에틸렌옥사이드 변성 트리메티롤프로판트리아크릴레이트, 에틸렌옥사이드 변성 디펜타에리트리톨헥사아크릴레이트, 에틸렌옥사이드 변성 펜타에리트리톨테트라아크릴레이트, 에틸렌옥사이드 변성 펜타에리트리톨테트라아크릴레이트, 프로필렌 옥사이드 변성 펜타에리트리톨테트라아크릴레이트, 에톡시레이티드 펜타에리스리톨 테트라아크릴레이트, 에톡시레이티드 디펜타에리스리톨 헥사아크리레이트, 프로폭시레이티드 펜타에리스리톨 폴리아크릴레이트, 프로폭시레이티드 디펜타에리스리톨 헥사아크리레이트, 에톡시레이티드 글리세린 트리아크릴레이트 등을 들 수 있다. 에톡시레이티드 펜타에리스리톨 테트라아크릴레이트, 에톡시레이티드 디펜타에리스리톨 헥사아크리레이트, 프로폭시레이티드 펜타에리스리톨 폴리아크릴레이트를 포함함이 보다 바람직 하다. As a photopolymerizable compound containing the said alkylene oxide, the alkylene oxide modified pentaerythritol (meth) acrylate compound, the alkylene oxide modified dipentaerythritol (meth) acrylate compound, and the alkylene oxide modified trimetholpropane ( Meta) acrylate compounds, and alkylene oxide modified glycerin (meth) acrylate compounds, and more specifically, ethylene oxide modified trimetholpropane triacrylate, ethylene oxide modified dipentaerythritol hexaacrylate, and ethylene oxide. Modified pentaerythritol tetraacrylate, ethylene oxide modified pentaerythritol tetraacrylate, propylene oxide modified pentaerythritol tetraacrylate, ethoxylated pentaerythritol tetraacrylate, ethoxylated dipentaerythritol hex Oh, and the like Cri rate, propoxy federated pentaerythritol polyacrylate, propoxy federated dipentaerythritol hexa acridine rate, ethoxy federated glycerol triacrylate. It is more preferable to include ethoxylated pentaerythritol tetraacrylate, ethoxylated dipentaerythritol hexaacrylate, and propoxylated pentaerythritol polyacrylate.
본 발명의 청색 감광성 수지 조성물은 알킬렌 옥사이드를 포함하지 않는 통상의 광중합성 화합물을 더 포함할 수 있다. 구체적으로, 에틸렌 옥사이드 및 프로필렌 옥사이드를 포함하지 않는 단관능 단량체, 2관능 단량체, 그 밖의 다관능 단량체를 사용하는 광중합성 화합물을 들 수 있다. The blue photosensitive resin composition of this invention may further contain the conventional photopolymerizable compound which does not contain an alkylene oxide. Specifically, the photopolymerizable compound using the monofunctional monomer, bifunctional monomer, and other polyfunctional monomer which do not contain ethylene oxide and a propylene oxide is mentioned.
단관능 단량체의 구체예로는 노닐페닐카르비톨아크릴레이트, 2-히드록시-3-페녹시프로필아크릴레이트, 2-에틸헥실카르비톨아크릴레이트, 2-히드록시에틸아크릴레이트, N-비닐피롤리돈 등을 들 수 있다. 2관능 단량체의 구체예로는 1,6-헥산디올디(메타)아크릴레이트, 에틸렌글리콜디(메타)아크릴레이트, 네오펜틸글리콜디(메타)아크릴레이트, 트리에틸렌글리콜디(메타)아크릴레이트, 비스페놀 A의 비스(아크릴로일옥시에틸)에테르, 3-메틸펜탄디올디(메타)아크릴레이트 등을 들 수 있다. 그 밖의 다관능 단량체의 구체예로서는 트리메틸올프로판트리(메타)아크릴레이트, 펜타에리트리톨트리(메타)아크릴레이트, 펜타에리트리톨테트라(메타)아크릴레이트, 디펜타에리트리톨펜타(메타)아크릴레이트, 디펜타에리트리톨헥사(메타)아크릴레이트 등을 들 수 있다. 이들 중에서 2관능 이상의 다관능 단량체가 바람직하게 사용된다. 상기 광중합성 화합물은 청색 감광성 수지 중의 고형분 총 중량에 대하여 5 내지 50중량%를 사용할 수 있으며, 바람직하게는 5 내지 30중량%로 사용할 수 있다. 광중합성 화합물이 상기 범위이면 광감도의 저감이 없어, 필름의 강도가 충분하고, 현상시 패턴의 소실이 없어, 미세패턴부에서도 패턴의 구축이 양호하며, 레지스트의 평활성이 양호하게 되는 경향이 있기 때문에 바람직하다.Specific examples of the monofunctional monomers include nonylphenylcarbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexylcarbitol acrylate, 2-hydroxyethyl acrylate and N-vinylpyrroli Money, etc. Specific examples of the bifunctional monomer include 1,6-hexanediol di (meth) acrylate, ethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, Bis (acryloyloxyethyl) ether of bisphenol A, 3-methylpentanediol di (meth) acrylate, etc. are mentioned. Specific examples of other polyfunctional monomers include trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, di Pentaerythritol hexa (meth) acrylate etc. are mentioned. Of these, bifunctional or higher polyfunctional monomers are preferably used. The photopolymerizable compound may be used in an amount of 5 to 50% by weight, preferably 5 to 30% by weight, based on the total weight of solids in the blue photosensitive resin. If the photopolymerizable compound is within the above range, there is no reduction in photosensitivity, sufficient strength of the film, no loss of pattern during development, good pattern construction even in the fine pattern portion, and tendency of smoothness of the resist. desirable.
광개시제Photoinitiator
본 발명에서 사용되는 광중합 개시제는 감광성 수지 조성물의 라디칼 반응을 개시시켜, 경화를 일으키고, 감도를 향상시키는 역할을 하며, 아세토페논계 화합물을 함유하는 것이 바람직하다. 아세토페논계 화합물로는, 예를 들면, 디에톡시아세토페논, 2-히드록시-2-메틸-1-페닐프로판-1-온, 벤질디메틸케탈, 2-히드록시-1-[4-(2-히드록시에톡시)페닐]-2-메틸프로판-1-온, 1-히드록시시클로헥실페닐케톤, 2-메틸-1-(4-메틸티오페닐)-2-모르폴리노프로판-1-온, 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)부탄-1-온, 2-히드록시-2-메틸[4-(1-메틸비닐)페닐]프로판-1-온의 올리고머 등을 들 수 있고, 바람직하게는 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)부탄-1-온 등을 들 수 있다. 또한, 상기 아세토페논계 이외의 광중합 개시제를 조합하여 사용할 수 있다. 아세토페논계 이외의 광중합 개시제는 빛을 조사함으로써 활성 라디칼을 발생하는 활성 라디칼 발생제, 증감제, 산발생제 등을 들 수 있다. 활성라디칼 발생제로는, 예를 들면, 벤조인계 화합물, 벤조페논계 화합물, 티옥산톤계 화합물, 트리아진계 화합물등을 들 수 있다. 벤조인계 화합물로는, 예를 들면, 벤조인, 벤조인메틸에테르, 벤조인에틸에테르, 벤조인이소프로필에테르, 벤조이소부틸에테르 등을 들 수 있다. 벤조페논계 화합물로는, 예를 들면, 벤조페논, o-벤조일벤조산메틸, 4-페닐조페논, 4-벤조일-4'-메틸디페닐설파이드, 3,3',4,4'-테트라(t-부틸퍼옥시카보닐)벤조페논, 2,4,6-트리메틸벤조페논 등을 들 수 있다. 티옥산톤계 화합물로는, 예를 들면, 2-이소프로필티옥산톤, 4-이소프로필티옥산톤, 2,4-디에틸티옥산톤, 2,4-디클로로티옥산톤, 1-클로로-4-프로폭시티옥산톤 등을 들 수 있다. 트리아진계 화합물로는, 예를 들면, 2,4-비스(트리클로로메틸)-6-(4-메톡시페닐)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-(4-메톡시나프틸)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-(4-메톡시스티릴)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(5-메틸퓨란-2-일)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(퓨란-2-일)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(4-디에틸아미노-2-메틸페닐)에테닐]-1,3,5-트리아진,2,4-비스(트리클로로메틸)-6-[2-(3,4디메톡시페닐)에테닐]-1,3,5-트리아진 등을 들 수 있다. 상기 활성 라디칼 발생제로는, 예를 들면, 2,4,6-트리메틸벤조일디페닐포스핀옥사이드, 2,2,-비스(o-클로르로페닐)-4,4', 5,5'-테트라페닐-1,2'-비이미다졸, 10-부틸-2-클로로아크리돈, 2-에틸안트라퀴논, 벤질, 9,10-페난트렌퀴논, 캄포르퀴논, 페닐글리옥실산메틸, 티타노센 화합물 등을 사용할 수 있다. 상기 산발생제로는 예를 들면, 4-히드록시페닐디메틸설포늄 p-톨루엔설포네이트, 4-히드록시페닐디메틸설포늄헥사플루오로안티모네이트, 4-아세톡시페닐디메틸설포늄 p-톨루엔설포네이트, 4-아세톡시페닐메틸벤질설포늄헥사 플루오로안티모네이트, 트리페닐설포늄 p-톨루엔설포네이트, 트리페닐설포늄헥사플루오로안티모네이트, 디페닐요오도늄 p-톨루엔설포네이트, 디페닐요오도늄헥사플루오로안티모네이트 등의 오늄염류나 니트로벤질토실레이트류, 벤조인토실레이트류 등을 들 수 있다. 또한, 활성 라디칼 발생제로서 상기 화합물 중에는 활성 라디칼과 동시에 산을 발생하는 화합물도 있으며, 예를들면, 트리아진계 광중합 개시제는 산 발생제로서도 사용된다. The photoinitiator used in the present invention initiates a radical reaction of the photosensitive resin composition, causes curing, improves sensitivity, and preferably contains an acetophenone-based compound. As an acetophenone type compound, for example, diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyl dimethyl ketal, 2-hydroxy-1- [4- (2 -Hydroxyethoxy) phenyl] -2-methylpropane-1-one, 1-hydroxycyclohexylphenyl ketone, 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropane-1- On, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan-1-one, 2-hydroxy-2-methyl [4- (1-methylvinyl) phenyl] propane-1- Oligomers, etc. may be mentioned, and 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan-1-one and the like are preferable. Moreover, photoinitiators other than the said acetophenone series can be used in combination. Photopolymerization initiators other than the acetophenone series include active radical generators, sensitizers, and acid generators that generate active radicals by irradiation with light. As an active radical generating agent, a benzoin compound, a benzophenone type compound, a thioxanthone type compound, a triazine type compound, etc. are mentioned, for example. As a benzoin type compound, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoisobutyl ether, etc. are mentioned, for example. As a benzophenone type compound, for example, benzophenone, methyl o-benzoyl benzoate, 4-phenylzophenone, 4-benzoyl-4'-methyldiphenyl sulfide, 3,3 ', 4,4'- tetra ( t-butylperoxycarbonyl) benzophenone, 2,4,6-trimethylbenzophenone, etc. are mentioned. As a thioxanthone type compound, 2-isopropyl thioxanthone, 4-isopropyl thioxanthone, 2, 4- diethyl thioxanthone, 2, 4- dichloro thioxanthone, 1-chloro-, for example 4-propoxy city oxanthone etc. are mentioned. As a triazine type compound, 2, 4-bis (trichloromethyl) -6- (4-methoxyphenyl) -1, 3, 5- triazine, 2, 4-bis (trichloromethyl), for example -6- (4-methoxynaphthyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- (4-methoxystyryl) -1,3,5-tri Azine, 2,4-bis (trichloromethyl) -6- [2- (5-methylfuran-2-yl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl ) -6- [2- (furan-2-yl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (4-diethylamino- 2-methylphenyl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (3,4dimethoxyphenyl) ethenyl] -1,3,5 -Triazine and the like. Examples of the active radical generator include 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 2,2, -bis (o-chlorophenyl) -4,4 ', 5,5'-tetra Phenyl-1,2'-biimidazole, 10-butyl-2-chloroacridone, 2-ethylanthraquinone, benzyl, 9,10-phenanthrenequinone, camphorquinone, methyl phenylglyoxylate, titanocene Compounds and the like can be used. Examples of the acid generator include 4-hydroxyphenyldimethylsulfonium p-toluenesulfonate, 4-hydroxyphenyldimethylsulfonium hexafluoroantimonate and 4-acetoxyphenyldimethylsulfonium p-toluenesulfo. Acetate, 4-acetoxyphenylmethylbenzylsulfonium hexafluoroantimonate, triphenylsulfonium p-toluenesulfonate, triphenylsulfonium hexafluoroantimonate, diphenyliodonium p-toluenesulfonate, Onium salts, such as diphenyl iodonium hexafluoro antimonate, nitrobenzyl tosylate, benzoin tosylate, etc. are mentioned. In addition, there are some compounds which generate an acid simultaneously with the active radicals in the compound as an active radical generator, for example, a triazine photopolymerization initiator is also used as an acid generator.
상기 광개시제는 청색 감광성 수지 중의 고형분 총 중량에 대하여 0.1 내지 30중량%, 바람직하게는 0.3 내지 20중량% 포함될 수 있다. 상기의 범위에 있으면 청색 감광성 수지 조성물이 고감도화되어 이 조성물을 사용하여 형성한 화소부의 강도나, 이 화소부의 표면에서의 평활성이 양호하게 되는 경향이 있기 때문에 바람직하다. The photoinitiator may be included 0.1 to 30% by weight, preferably 0.3 to 20% by weight relative to the total weight of solids in the blue photosensitive resin. If it exists in the said range, since the blue photosensitive resin composition becomes highly sensitive and the intensity | strength of the pixel part formed using this composition and the smoothness in the surface of this pixel part tend to become favorable, it is preferable.
나아가, 본 발명에서는 광중합 개시 조제를 사용할 수 있다. 광중합 개시 조제는 광중합 개시제와 조합하여 사용되는 경우가 있으며, 광중합 개시제에 의해 중합이 개시된 광중합성 화합물의 중합을 촉진시키기 위해 사용되는 화합물이다. 광중합 개시 조제로서는, 아민계 화합물, 알콕시안트라센계 화합물, 티옥산톤계 화합물 등을 들수 있다.Furthermore, in this invention, photoinitiator start adjuvant can be used. A photoinitiator adjuvant may be used in combination with a photoinitiator, and is a compound used in order to accelerate superposition | polymerization of the photopolymerizable compound in which superposition | polymerization was started by a photoinitiator. As photopolymerization start adjuvant, an amine compound, an alkoxy anthracene type compound, a thioxanthone type compound, etc. are mentioned.
아민계 화합물로는, 예를 들면, 트리에탄올아민, 메틸디에탄올아민, 트리이소프로판올아민, 4-디메틸아미노벤조산메틸, 4-디메틸아미노벤조산에틸, 4-디메틸아미노벤조산이소아밀, 벤조산2-디메틸아미노에틸, 4-디메틸아미노벤조산 2-에틸헥실, N,N-디메틸파라톨루이딘, 4,4'-비스(디메틸아미노)벤즈페논(통칭, 미힐러즈케톤), 4,4'-비스(디에틸아미노)벤조페논, 4,4'-비스(에틸메틸아미노)벤조페논 등을 들 수 있으며, 이 중에서도 4,4'-비스(디에틸아미노)벤조페논이 바람직하다. 알콕시안트라센계 화합물로는, 예를 들면, 9,10-디메톡시안트라센, 2-에틸-9,10-디메톡시안트라센, 9,10-디에톡시안트라센, 2-에틸-9,10-디에톡시안트라센 등을 들 수 있다. 티옥산톤계화합물로는, 예를 들면, 2-이소프로필티옥산톤, 4-이소프로필티옥산톤, 2,4-디에틸티옥산톤, 2,4-디클로로티옥산톤, 1-클로로-4-프로폭시티옥산톤 등을 들 수 있다. 이러한 광중합 개시제(D)는 단독으로 또는 복수를 조합하여 사용해도 지장이 없다. 또한, 광중합 개시 조제로서시판되는 것을 사용할 수 있으며, 시판되는 광중합 개시 조제로는, 예를 들면, 상품명 「EAB-F」[제조원: 호도가야가가쿠고교가부시키가이샤] 등을 들 수 있다. Examples of the amine compound include triethanolamine, methyl diethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, and 2-dimethylamino benzoic acid. Ethyl, 2-ethylhexyl 4-dimethylaminobenzoic acid, N, N-dimethylparatoluidine, 4,4'-bis (dimethylamino) benzphenone (commonly known as Michler's ketone), 4,4'-bis (diethyl Amino) benzophenone, 4, 4'-bis (ethylmethylamino) benzophenone, etc. are mentioned, Among these, 4,4'-bis (diethylamino) benzophenone is preferable. As an alkoxy anthracene type compound, 9,10- dimethoxy anthracene, 2-ethyl-9,10- dimethoxy anthracene, 9,10- diethoxy anthracene, 2-ethyl-9, 10- diethoxy anthracene, for example. Etc. can be mentioned. As a thioxanthone type compound, 2-isopropyl thioxanthone, 4-isopropyl thioxanthone, 2, 4- diethyl thioxanthone, 2, 4- dichloro thioxanthone, 1-chloro- 4-propoxy city oxanthone etc. are mentioned. These photoinitiators (D) may be used alone or in combination of a plurality thereof. In addition, a commercially available thing can be used as a photoinitiator starter, As a commercially available photoinitiator starter, brand name "EAB-F" (manufacturer: Hodogaya Chemical Co., Ltd.) etc. are mentioned, for example.
이들 광중합 개시 조제를 사용하는 경우, 이의 사용량은 광중합 개시제 1몰당 통상적으로 10몰 이하, 바람직하게는 0.01~5몰이 바람직하다. 상기의 범위에 있으면 청색 감광성 수지 조성물의 감도가 더 높아지고, 이 조성물을 사용하여 형성되는 컬러필터의 생산성이 향상되는 경향이 있기 때문에 바람직하다. In the case of using these photopolymerization initiation assistants, the amount thereof is usually 10 mol or less, preferably 0.01 to 5 mol, per mol of the photopolymerization initiator. When it exists in the said range, since the sensitivity of a blue photosensitive resin composition becomes higher and the productivity of the color filter formed using this composition tends to improve, it is preferable.
용제solvent
본 발명의 청색 감광성 수지 조성물에 함유되는 용제는 특별히 제한되지 않으며 청색 감광성 수지 조성물의 분야에서 사용되고 있는 각종 유기 용제를 사용할 수 있다. 그의 구체예로서는 에틸렌글리콜 모노메틸 에테르, 에틸렌글리콜 모노에틸 에테르, 에틸렌글리콜 모노프로필 에테르, 에틸렌글리콜 모노부틸 에테르 등의 에틸렌글리콜 모노알킬 에테르류, 디에틸렌글리콜 디메틸에테르, 디에틸렌글리콜 디에틸에테르, 디에틸렌글리콜디프로필에테르, 디에틸렌글리콜디부틸에테르 등의 디에틸렌글리콜디알킬에테르류, 메틸셀로솔브아세테이트, 에틸셀로솔브아세테이트 등의 에틸렌글리콜 알킬에테르 아세테이트류, 프로필렌글리콜 모노메틸에테르아세테이트, 프로필렌글리콜 모노에틸에테르아세테이트, 프로필렌글리콜 모노프로필에테르아세테이트, 메톡시부틸 아세테이트 및 메톡시펜틸 아세테이트 등의 알킬렌글리콜알킬에테르 아세테이트류, 벤젠, 톨루엔, 크실렌, 메시틸렌 등의 방향족 탄화수소류, 메틸에틸케톤, 아세톤, 메틸아밀케톤, 메틸이소부틸케톤, 시클로헥사논등의 케톤류, 에탄올, 프로판올, 부탄올, 헥사놀, 시클로헥산올, 에틸렌글리콜, 글리세린 등의 알코올류, 3-에톡시프로피온산 에틸, 3-메톡시프로피온산 메틸 등의 에스테르류, -부티롤락톤 등의 환상 에스테르류 등을 들수 있다. 상기의 용제 중, 도포성, 건조성면에서 바람직하게는 상기 용제 중에서 비점이 100 내지 200인 유기 용제를 들 수 있고, 보다 바람직하게는 알킬렌글리콜알킬에테르아세테이트류, 케톤류, 3-에톡시프로피온산 에틸이나, 3-메톡시프로피온산 메틸 등의 에스테르류를 들 수 있으며, 더욱 바람직하게는 프로필렌글리콜 모노메틸에테르아세테이트, 프로필렌글리콜 모노에틸에테르아세테이트, 시클로헥사논, 3-에톡시프로피온산 에틸, 3-메톡시프로피온산 메틸 등을 들 수 있다. 이들 용제는 각각 단독으로 또는 2종류 이상 혼합하여 사용할 수 있다.The solvent contained in the blue photosensitive resin composition of this invention is not specifically limited, Various organic solvents used in the field of a blue photosensitive resin composition can be used. Specific examples thereof include ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, and diethylene. Diethylene glycol dialkyl ethers such as glycol dipropyl ether and diethylene glycol dibutyl ether, ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate, propylene glycol monomethyl ether acetate, and propylene glycol Alkylene glycol alkyl ether acetates such as monoethyl ether acetate, propylene glycol monopropyl ether acetate, methoxybutyl acetate and methoxypentyl acetate, aromatic hydrocarbons such as benzene, toluene, xylene and mesitylene, methyl Ketones such as methyl ketone, acetone, methyl amyl ketone, methyl isobutyl ketone, cyclohexanone, ethanol, propanol, butanol, hexanol, cyclohexanol, alcohols such as ethylene glycol, glycerin, ethyl 3-ethoxypropionate, Ester, such as 3-methoxy methyl propionate, Cyclic ester, such as -butyrolactone, etc. are mentioned. Among the above solvents, organic solvents having a boiling point of 100 to 200 are preferable in the solvents in terms of applicability and dryness, and more preferably alkylene glycol alkyl ether acetates, ketones and ethyl 3-ethoxypropionate. And esters such as methyl 3-methoxypropionate, and more preferably propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, cyclohexanone, ethyl 3-ethoxypropionate, and 3-methoxy Methyl propionate etc. are mentioned. These solvents can be used individually or in mixture of 2 or more types, respectively.
본 발명의 청색 감광성 수지 조성물 중의 용제의 함유량은 그것을 포함하는 청색 감광성 수지 조성물 전체량에 대하여 60 내지 90질량%, 바람직하게는 60 내지 85 질량% 포함될 수 있다. 용제의 함유량이 상기 범위이면 롤 코터, 스핀 코터, 슬릿 앤드 스핀 코터, 슬릿 코터(다이 코터라고도 하는 경우가 있음), 잉크젯 등의 도포 장치로 도포했을 때 도포성이 양호해지는 경향이 있기 때문에 바람직하다.Content of the solvent in the blue photosensitive resin composition of this invention can be contained 60-90 mass%, Preferably it is 60-85 mass% with respect to the whole blue photosensitive resin composition containing it. When content of a solvent is the said range, since applicability | paintability tends to be favorable, when apply | coating with coating apparatuses, such as a roll coater, a spin coater, a slit and spin coater, a slit coater (also called a die coater), and inkjet, it is preferable. .
첨가제additive
본 발명에 따른 청색 패턴층 청색 감광성 수지 조성물은 필요에 따라 충진제, 다른 고분자 화합물, 안료 분산제. 밀착 촉진제, 산화 방지제, 자외선 흡수제, 응집 방지제 등의 첨가제를 추가로 포함할 수 있다.The blue pattern layer blue photosensitive resin composition which concerns on this invention is a filler, another high molecular compound, a pigment dispersant as needed. Additives, such as an adhesion promoter, antioxidant, a ultraviolet absorber, and an aggregation inhibitor, can be further included.
상기 다른 고분자 화합물로서는 구체적으로 에폭시 수지, 말레이미드 수지 등의 경화성 수지, 폴리비닐알코올, 폴리아크릴산, 폴리에틸렌글리콜모노알킬에테르, 폴리플루오로알킬아크릴레이트, 폴리에스테르, 폴리우레탄 등의 열가소성 수지 등을 들 수 있다. Specific examples of the other polymer compound include curable resins such as epoxy resins and maleimide resins, thermoplastic resins such as polyvinyl alcohol, polyacrylic acid, polyethylene glycol monoalkyl ethers, polyfluoroalkyl acrylates, polyesters, polyurethanes, and the like. Can be.
상기 안료 분산제로서는 시판되는 계면 활성제를 이용할 수 있고, 예를 들면 실리콘계, 불소계, 에스테르계, 양이온계, 음이온계, 비이온계, 양성 등의 계면 활성제 등을 들 수 있다. 이들은 각각 단독으로 또는 2종 이상을 조합하여 사용될 수 있다. Commercially available surfactants can be used as the pigment dispersant, and examples thereof include surfactants such as silicone, fluorine, ester, cationic, anionic, nonionic and amphoteric. These can be used individually or in combination of 2 types or more, respectively.
상기의 계면 활성제로서, 예를 들면 폴리옥시에틸렌알킬에테르류, 폴리옥시에틸렌알킬페에테르류, 폴리에틸렌글리콜 디에스테르류, 소르비탄 지방상 에스테르류, 지방산 변성 폴리에스테르류, 3급아민 변성 폴리우레탄류, 폴리에틸렌이민류 등이 있으며 이외에, 상품명으로 KP(신에쯔 가가꾸 고교㈜ 제조), 폴리플로우(POLYFLOW)(교에이샤 가가꾸㈜ 제조), 에프톱(EFTOP)(토켐 프로덕츠사 제조), 메가팩(MEGAFAC)(다이닛본 잉크 가가꾸 고교㈜ 제조), 플로라드(Flourad)(스미또모 쓰리엠㈜ 제조), 아사히가드(Asahi guard), 서플(Surflon)(이상, 아사히 글라스㈜ 제조), 솔스퍼스(SOLSPERSE)(제네까㈜ 제조), EFKA(EFKA 케미칼스사 제조), PB 821(아지노모또㈜ 제조) 등을 들 수 있다. As said surfactant, For example, polyoxyethylene alkyl ether, polyoxyethylene alkyl peer ether, polyethyleneglycol diester, sorbitan fatty acid ester, fatty acid modified polyester, tertiary amine modified polyurethane , Polyethylenimine, etc., trade names include KP (manufactured by Shin-Etsu Chemical Co., Ltd.), POLYFLOW (manufactured by Kyoeisha Chemical Co., Ltd.), EFTOP (manufactured by Tochem Products), MEGAFAC (manufactured by Dainippon Ink Chemical Industries, Ltd.), Florard (manufactured by Sumitomo 3M), Asahi guard, Surflon (above, manufactured by Asahi Glass), Sol SLSPERSE (made by Genka Corporation), EFKA (made by EFKA Chemicals), PB 821 (made by Ajinomoto Co., Ltd.), etc. are mentioned.
상기 밀착 촉진제로서, 예를 들면 비닐트리메톡시실란, 비닐트리에톡시실란, 비닐트리스(2-메톡시에톡시)실란, N-(2-아미노에틸)-3-아미노프로필메틸디메톡시실란, N-(2-아미노에틸)-3-아미노프로필트리메톡시실란, 3-아미노프로트리에톡시실란, 3-글리시독시프로필트리메톡시실란, 3-글리시독시프로필메틸디메톡시실란, 2-(3,4-에폭시시클로헥실)에틸트리메톡시실란, 3-클로로프로필메틸디메톡시실란, 3-클로로프로필트리메톡시실란, 3-메타크릴옥시프로필트리메톡시실란, 3-머캅토프로필트리메톡시실란 등을 들 수 있다. 산화 방지제로서는 구체적으로 2,2'-티오비스(4-메틸-6-t-부틸페놀), 2,6-디-<81> t-부틸-4-메틸페놀 등을 들 수 있다. As the adhesion promoter, for example, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, N- (2-aminoethyl) -3-aminopropyltrimethoxysilane, 3-aminoprotriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2 -(3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-mercaptopropyl Trimethoxysilane etc. are mentioned. Specific examples of the antioxidant include 2,2'-thiobis (4-methyl-6-t-butylphenol), 2,6-di-t-butyl-4-methylphenol, and the like.
상기 자외선 흡수제로서는 구체적으로 2-(3-tert-부틸-2-히드록시-5-메틸페닐)-5-클로로벤조티리아졸, 알콕시벤조페논 등을 들 수 있다. Specific examples of the ultraviolet absorber include 2- (3-tert-butyl-2-hydroxy-5-methylphenyl) -5-chlorobenzothiazole, alkoxybenzophenone and the like.
상기 응집 방지제로서는 구체적으로 폴리아크릴산 나트륨 등을 들 수 있다.Specific examples of the aggregation inhibitor include sodium polyacrylate and the like.
상기 첨가제는 본 발명의 효과를 저해하지 않는 범위에서 당업자가 적절히 추가하여 사용이 가능하다. 예컨대 상기 첨가제는 상기 청색 감광성 수지 조성물 전체 100 중량부에 대하여 0.05 내지 10 중량부, 바람직하게는 0.1 내지 10 중량부, 더욱 바람직하게는 0.1 내지 5 중량부로 사용할 수 있으나 이에 한정되는 것은 아니다.The additives can be used by those skilled in the art as appropriate without departing from the effect of the present invention. For example, the additive may be used in an amount of 0.05 to 10 parts by weight, preferably 0.1 to 10 parts by weight, more preferably 0.1 to 5 parts by weight, based on 100 parts by weight of the total blue photosensitive resin composition, but is not limited thereto.
본 발명에 따른 청색 감광성 수지 조성물은 예컨대 이하와 같은 방법에 의해 제조될 수 있다. 산란입자를 미리 용제와 혼합하여 평균입경이 30 내지 500nm가 될 때까지 비드 밀 등을 이용하여 분산시킨다. 이때, 필요에 따라 분산제를 추가로 사용할 수 있고, 바인더 수지의 일부 또는 전부가 배합될 수도 있다. 얻어진 분산액(이하, 밀 베이스라고 하는 경우도 있음)에 바인더 수지의 나머지, 광중합성 화합물, 광중합 개시제, 필요에 따라 사용되는 그밖의 성분과 필요에 따라 추가의 용제를 소정의 농도가 되도록 더 첨가하여 목적하는 청색 감광성 수지 조성물을 얻을 수 있다.The blue photosensitive resin composition which concerns on this invention can be manufactured, for example by the following method. The scattering particles are mixed with the solvent in advance and dispersed using a bead mill or the like until the average particle diameter becomes 30 to 500 nm. At this time, a dispersing agent can be further used as needed, and some or all of binder resin may be mix | blended. The remaining dispersion of the binder resin, the photopolymerizable compound, the photopolymerization initiator, other components used as necessary, and additional solvents as necessary, are further added to the obtained dispersion (hereinafter sometimes referred to as a mill base) to a predetermined concentration. A desired blue photosensitive resin composition can be obtained.
<컬러필터 및 화상표시장치><Color filter and image display device>
본 발명의 또 다른 양태는 전술한 청색 패턴층 형성용 청색 감광성 수지 조성물의 경화물을 포함하는 청색 패턴층을 포함하는 컬러필터에 관한 것이다.Another aspect of the present invention relates to a color filter comprising a blue pattern layer containing a cured product of the blue photosensitive resin composition for forming a blue pattern layer described above.
본 발명에 따른 컬러필터는 청색 양자점 대신 전술한 청색 패턴층 형성용 청색 감광성 수지 조성물로 제조되기 때문에 제조단가를 낮출 수 있고, 우수한 시야각을 확보할 수 있는 이점이 있다. Since the color filter according to the present invention is made of the blue photosensitive resin composition for forming the blue pattern layer instead of the blue quantum dots, the manufacturing cost can be lowered and an excellent viewing angle can be obtained.
또한, 본 발명의 청색 감광성 수지 조성물에 에틸렌 옥사이드 또는 프로필렌 옥사이드를 포함하는 광중합성 화합물을 포함함으로써, 본 발명의 청색 감광성 수지 조성물을 이용하여 제조된 청색 패턴층을 포함하는 컬러필터는 현상속도를 제어하고, 패턴의 잔사를 없애 공정상의 잔사로 말미암아 나타나는 문제를 해결하고, 표시불량 문제가 개선되며, 레지스트 미현상의 문제가 개선된 컬러필터, 특히 자발광 컬러필터 구현이 가능 할 수 있다. In addition, by including a photopolymerizable compound containing ethylene oxide or propylene oxide in the blue photosensitive resin composition of the present invention, the color filter including the blue pattern layer prepared using the blue photosensitive resin composition of the present invention controls the development speed In addition, it may be possible to solve the problem caused by the process residue by eliminating the residue of the pattern, to improve the display defect problem, and to implement the color filter, in particular, the self-luminous color filter, which is improved in the problem of the resist undeveloped.
상기 컬러필터는 기판 및 상기 기판의 상부에 형성된 청색 패턴층을 포함한다.The color filter includes a substrate and a blue pattern layer formed on the substrate.
상기 기판은 상기 컬러필터 자체 기판일 수 있으며, 또는 디스플레이 장치 등에 컬러필터가 위치되는 부위일 수도 있는 것으로, 특별히 제한되지 않는다. 상기 기판은 유리, 실리콘(Si), 실리콘 산화물(SiOx) 또는 고분자 기판일 수 있으며, 상기 고분자 기판은 폴리에테르설폰(polyethersulfone, PES) 또는 폴리카보네이트(polycarbonate, PC) 등일 수 있다.The substrate may be the substrate of the color filter itself, or may be a portion where the color filter is positioned in a display device or the like, and is not particularly limited. The substrate may be glass, silicon (Si), silicon oxide (SiOx), or a polymer substrate, and the polymer substrate may be polyethersulfone (PES) or polycarbonate (PC).
상기 청색 패턴층은 본 발명의 청색 감광성 수지 조성물을 포함하는 층으로, 상기 청색 패턴층 형성용 청색 감광성 수지 조성물을 도포하고 소정의 패턴으로 노광, 현상 및 열경화하여 형성된 층일 수 있으며, 상기 패턴층은 당업계에서 통상적으로 알려진 방법을 수행함으로써 형성할 수 있다. The blue pattern layer is a layer including the blue photosensitive resin composition of the present invention, and may be a layer formed by applying the blue photosensitive resin composition for forming a blue pattern layer and exposing, developing and thermosetting in a predetermined pattern. Can be formed by carrying out methods commonly known in the art.
본 발명의 또 다른 실시형태에 있어서, 상기 컬러필터는 적색 패턴층 및 녹색 패턴층으로 이루어진 군에서 선택되는 1 이상을 더 포함할 수 있다.In another embodiment of the present invention, the color filter may further include one or more selected from the group consisting of a red pattern layer and a green pattern layer.
본 발명의 또 다른 실시형태에 있어서, 상기 적색 패턴층 또는 녹색 패턴층은 양자점 및/또는 산란입자를 포함할 수 있다. 구체적으로, 본 발명에 따른 컬러필터는 적 양자점을 포함하는 적색 패턴층 또는 녹 양자점을 포함하는 녹색 패턴층을 포함할 수 있으며, 상기 적색 패턴층 또는 녹색 패턴층은 산란입자를 포함할 수 있다. 상기 적색 패턴층 또는 녹색 패턴층은 후술할 청색광을 방출하는 광원에 의하여 각각 적색광 또는 청색광을 방출할 수 있다.In another embodiment of the present invention, the red pattern layer or green pattern layer may include a quantum dot and / or scattering particles. Specifically, the color filter according to the present invention may include a red pattern layer including a red quantum dot or a green pattern layer including a green quantum dot, and the red pattern layer or the green pattern layer may include scattering particles. The red pattern layer or the green pattern layer may emit red light or blue light, respectively, by a light source emitting blue light, which will be described later.
본 발명의 또 다른 실시형태에 있어서, 상기 적색 패턴층 또는 녹색 패턴층에 포함되는 산란입자는 평균입경이 30 내지 500nm인 금속산화물을 포함할 수 있으며, 상기 산란입자 및 금속산화물에 관한 내용은 본 발명에 따른 청색 감광성 수지 조성물 내에 포함되는 산란입자 및 금속산화물에 관한 내용을 적용할 수 있다.In another embodiment of the present invention, the scattering particles included in the red pattern layer or the green pattern layer may include a metal oxide having an average particle diameter of 30 to 500nm, the details of the scattering particles and the metal oxide The content of the scattering particles and the metal oxide contained in the blue photosensitive resin composition according to the invention can be applied.
본 발명에 있어서, 상기 적색 패턴층 또는 녹색 패턴층에 포함되는 양자점의 형태, 구성 및 그 함량은 한정되지 않으며, 당업계에서 통상적으로 사용되는 양자점을 적용할 수 있다.In the present invention, the shape, configuration, and content of the quantum dots included in the red pattern layer or the green pattern layer are not limited, and quantum dots commonly used in the art may be applied.
상기와 같은 기판 및 패턴층을 포함하는 컬러필터는 각 패턴 사이에 형성된 격벽을 더 포함할 수 있으며, 블랙 매트릭스를 더 포함할 수 있으나 이에 한정되지는 않는다.The color filter including the substrate and the pattern layer may further include a partition formed between each pattern, and may further include a black matrix, but is not limited thereto.
본 발명에 있어서, 상기 컬러필터는 자발광 컬러필터일 수 있다.In the present invention, the color filter may be a self-luminous color filter.
본 발명의 또 다른 양태는, 전술한 컬러필터; 및 청색광을 방출하는 광원;을 포함하는 화상표시장치에 관한 것이다. 요컨대, 본 발명에 따른 화상표시장치는 전술한 청색 감광성 수지 조성물의 경화물을 포함하는 청색 패턴층을 포함하는 컬러필터와 청색광을 방출하는 광원을 포함한다.Another aspect of the invention, the above-described color filter; And a light source emitting blue light. In short, the image display apparatus according to the present invention includes a color filter including a blue pattern layer including a cured product of the above-described blue photosensitive resin composition and a light source emitting blue light.
본 발명의 컬러필터는 통상의 액정 표시 장치뿐만 아니라, 전계 발광 표시장치, 플라스마 표시 장치, 전계 방출 표시 장치 등 각종 화상 표시 장치에 적용이 가능하다.The color filter of the present invention can be applied to various image display devices such as electroluminescent display devices, plasma display devices, field emission display devices, as well as ordinary liquid crystal display devices.
상기 화상표시장치가 본 발명에 따른 청색 패턴층을 포함하는 컬러필터와 상기 광원을 포함하는 경우 우수한 발광강도 또는 시야각을 가지는 이점이 있다. 또한, 본 발명에 따른 컬러필터에 포함되는 청색 패턴층은 청 양자점을 포함하지 않기 때문에 제조단가가 낮은 화상표시장치를 제조할 수 있는 이점이 있다.When the image display device includes a color filter including a blue pattern layer and the light source according to the present invention, there is an advantage of having excellent light emission intensity or viewing angle. In addition, since the blue pattern layer included in the color filter according to the present invention does not include blue quantum dots, there is an advantage in that an image display device having low manufacturing cost can be manufactured.
이하, 본 명세서를 구체적으로 설명하기 위해 실시예를 들어 상세히 설명한다. 그러나, 본 명세서에 따른 실시예들은 여러 가지 다른 형태로 변형될 수 있으며, 본 명세서의 범위가 아래에서 상술하는 실시예들에 한정되는 것으로 해석되지는 않는다. 본 명세서의 실시예들은 당업계에서 평균적인 지식을 가진 자에게 본 명세서를 보다 완전하게 설명하기 위해 제공되는 것이다. 또한, 이하에서 함유량을 나타내는 "%" 및 "부"는 특별히 언급하지 않는 한 중량 기준이다.Hereinafter, the present invention will be described in detail with reference to Examples. However, the embodiments according to the present disclosure may be modified in various other forms, and the scope of the present specification is not to be interpreted as being limited to the embodiments described below. The embodiments of the present specification are provided to more fully describe the present specification to those skilled in the art. In addition, "%" and "part" which show content below are a basis of weight unless there is particular notice.
합성예: 바인더 수지의 합성Synthesis Example Synthesis of Binder Resin
제조예 1: 아크릴계 알칼리 가용성 수지Preparation Example 1: Acrylic Alkali Soluble Resin
교반기, 온도계 환류 냉각관, 적하 로트 및 질소 도입관을 구비한 플라스크를 준비하고, 한편, 모노머 적하 로 트로서, 벤질말레이미드 74.8g(0.20몰), 아크릴산 43.2g(0.30몰), 비닐톨루엔 118.0g(0.50몰), t-부틸퍼옥시-2-에틸헥사노에이트 4g, 프로필렌글리콜모노메틸에테르아세테이트(PGMEA) 40g를 투입 후 교반 혼합하여 준비하고, 연쇄 이동제 적하조로서, n-도데칸티올 6g, PGMEA 24g를 넣고 교반 혼합한 것을 준비했다. 이후 플라스크에 PGMEA 395g를 도입하고 플라스크내 분위기를 공기에서 질소로 한 후 교반하면서 플라스크의 온도를 90℃까지 승온했다. 이어서 모노머 및 연쇄 이동제를 적하 로트로부터 적하를 개시했다. 적하는, 90℃를 유지하면서, 각각 2h 동안 진행하고 1h 후에 110℃ 승온하여 3h 유지한 뒤, 가스 도입관을 도입시켜, 산소/질소=5/95(v/v) 혼합가스의 버블링을 개시했다. 이어서, 글리시딜메타크릴레이트 28.4g[(0.10몰), (본 반응에 사용한 아크릴산의 카르복실기에 대하여 33몰%)], 2,2'-메틸렌비스(4-메틸-6-t-부틸페놀) 0.4g, 트리에틸아민 0.8g를 플라스크내에 투입하여 110에서 8시간 반응을 계속하고, 고형분 산가가 70㎎KOH/g인 수지 A를 얻었다. GPC에 의해 측정한 폴리스티렌 환산의 중량평균분자량은 16,000이고, 분자량 분포(Mw/Mn)는 2.3이었다.A flask equipped with a stirrer, a thermometer reflux condenser, a dropping lot, and a nitrogen inlet tube was prepared, and as the monomer dropping lot, 74.8 g (0.20 mol) of benzylmaleimide, 43.2 g (0.30 mol) of acrylic acid, and vinyltoluene 118.0 g (0.50 mol), 4 g of t-butylperoxy-2-ethylhexanoate and 40 g of propylene glycol monomethyl ether acetate (PGMEA) were added thereto, followed by stirring and mixing. As a chain transfer agent dropping tank, n-dodecanethiol 6g and PGMEA24g were added, and the thing mixed with stirring was prepared. Thereafter, 395 g of PGMEA was introduced into the flask, and the atmosphere in the flask was changed to nitrogen from air, and then the temperature of the flask was raised to 90 ° C. while stirring. Subsequently, dropping of the monomer and the chain transfer agent was started from the dropping lot. The dropwise addition was carried out for 2 h each while maintaining 90 ° C., and after 1 h, the temperature was raised to 110 ° C. and maintained for 3 h. Started. Next, 28.4 g glycidyl methacrylate [(0.10 mol), (33 mol% with respect to the carboxyl group of acrylic acid used for this reaction)], 2,2'- methylenebis (4-methyl-6-t-butylphenol ) 0.4 g and 0.8 g of triethylamine were added to the flask, and the reaction was continued at 110 for 8 hours to obtain a resin A having a solid acid value of 70 mgKOH / g. The weight average molecular weight of polystyrene conversion measured by GPC was 16,000, and molecular weight distribution (Mw / Mn) was 2.3.
제조예 2: 화학식 1-1-1의 화합물의 합성 Preparation Example 2 Synthesis of Compound of Formula 1-1-1
3000ml 삼구 라운드 플라스크에 3',6'-디하이드록시스피로(플루오렌-9,9-잔텐)(3',6′'-dihydroxyspiro(fluorene-9,9-xantene) 364.4g과 t-부틸암모늄 브로마이드 0.4159g을 혼합하고, 에피클로로히드린 2359g을 넣고 90℃로 가열하여 반응시켰다. 액체크로마토그래피로 분석하여 3,6-디하이드록시스피로(플루오렌-9,9-잔텐)이 완전히 소진되면 30℃로 냉각하여 50% NaOH 수용액(3당량)을 천천히 첨가하였다. 액체 크로마토그래피로 분석하여 에피클로로히드린이 완전히 소진되었으면, 디클로로메탄으로 추출한 후 3회 수세한 후 유기층을 황산마그네슘으로 건조시킨 후 디클로로메탄을 감압 증류하고 디클로로메탄과 메탄올 혼합비 50:50을 사용하여 재결정하였다.364.4 g of 3 ', 6'-dihydroxyspiro (fluorene-9,9-xantene) and 3-, 6'-dihydroxyspiro (fluorene-9,9-xantene) in a 3000 ml three-neck round flask 0.4159 g of bromide was mixed and 2359 g of epichlorohydrin was added and reacted by heating to 90 ° C. When the 3,6-dihydroxyspiro (fluorene-9,9-xanthene) was completely consumed by liquid chromatography, 50% NaOH aqueous solution (3 equiv) was slowly added by cooling to 30 DEG C. After analysis by liquid chromatography, epichlorohydrin was completely consumed, the mixture was extracted with dichloromethane and washed three times, and then the organic layer was dried over magnesium sulfate. Then dichloromethane was distilled under reduced pressure and recrystallized using a dichloromethane and methanol mixture ratio of 50:50.
이렇게 합성된 에폭시 화합물 1당량과 t-부틸암모늄 브로마이드 0.004당량, 2,6-디이소부틸페놀 0.001당량, 아크릴산 2.2당량을 혼합한 후 용매 프로피렌 글리콜 모노메틸 에테르 아세테이트 24.89g을 넣어 혼합하였다. 이 반응 용액에 공기를 25ml/min으로 불어넣으면서 온도를 90~100℃로 가열 용해하였다. 반응 용액이 백탁한 상태에서 온도를 120까지 가열하여 완전히 용해시켰다. 용액이 투명해지고 점도가 높아지면 산가를 측정하여 산가가 1.0mgKOH/g미만이 될 때까지 교반하였다. 산가가 목표(0.8)에 이를 때까지 11시간이 필요했다. 반응 종결 후 반응기의 온도를 실온으로 내려 무색 투명한 화학식 1-1-1의 화합물을 얻었다.Thus, 1 equivalent of the epoxy compound, 0.004 equivalent of t-butylammonium bromide, 0.001 equivalent of 2,6-diisobutylphenol, and 2.2 equivalent of acrylic acid were mixed, and then 24.89 g of solvent propylene glycol monomethyl ether acetate was added thereto. The temperature was melt | dissolved by heating at 90-100 degreeC, blowing air into this reaction solution at 25 ml / min. The temperature was heated to 120 while the reaction solution was cloudy to completely dissolve. When the solution became clear and the viscosity became high, the acid value was measured and stirred until the acid value was less than 1.0 mgKOH / g. It took 11 hours to reach the target (0.8). After completion of the reaction, the temperature of the reactor was lowered to room temperature to obtain a colorless transparent compound of formula 1-1-1.
[화학식 1-1-1][Formula 1-1-1]
제조예 3 : 화학식 1-1-2의 화합물의 합성Preparation Example 3 Synthesis of Compound of Chemical Formula 1-1-2
3000ml 삼구 라운드 플라스크에 화학식 2-1의 3',6'-디하이드록시스피로(플루오렌-9,9-잔텐)(3',6′'-dihydroxyspiro(fluorene-9,9-xantene) 364.4g과 t-부틸암모늄 브로마이드 0.4159g을 혼합하고, 에피클로로히드린 2359g을 넣고 90℃로 가열하여 반응시켰다. 액체크로마토그래피로 분석하여 3,6-디하이드록시스피로(플루오렌-9,9-잔텐)이 완전히 소진되면 30℃로 냉각하여 50% NaOH 수용액(3당량)을 천천히 첨가하였다. 액체 크로마토그래피로 분석하여 에피클로로히드린이 완전히 소진되었으면, 디클로로메탄으로 추출한 후 3회 수세한 후 유기층을 황산마그네슘으로 건조시킨 후 디클로로메탄을 감압 증류하고 디클로로메탄과 메탄올 혼합비 50:50을 사용하여 재결정하였다.364.4 g of 3 ', 6'-dihydroxyspiro (fluorene-9,9-xanthene) (3', 6 ''-dihydroxyspiro (fluorene-9,9-xantene) of formula 2-1 in a 3000 ml three-neck round flask And 0.4159 g of t-butylammonium bromide were mixed, 2359 g of epichlorohydrin was added and heated to 90 ° C. The reaction was performed by liquid chromatography to analyze 3,6-dihydroxyspiro (fluorene-9,9-xanthene). ) Once completely consumed, cool it to 30 ° C. and slowly add 50% aqueous NaOH solution (3 equiv.) After analyzing by liquid chromatography, epichlorohydrin was completely consumed, extracted with dichloromethane and washed three times, and then the organic layer was washed. After drying over magnesium sulfate, dichloromethane was distilled under reduced pressure and recrystallized using a dichloromethane and methanol mixture ratio of 50:50.
이렇게 합성된 에폭시 화합물 1당량과 t-부틸암모늄 브로마이드 0.004당량, 2,6-디이소부틸페놀 0.001당량, 메타아크릴산 2.2당량을 혼합한 후 용매 프로피렌 글리콜 모노메틸 에테르 아세테이트 24.89g을 넣어 혼합하였다. 이 반응 용액에 공기를 25ml/min으로 불어넣으면서 온도를 90~100℃로 가열 용해하였다. 반응 용액이 백탁한 상태에서 온도를 120℃까지 가열하여 완전히 용해시켰다. 용액이 투명해지고 점도가 높아지면 산가를 측정하여 산가가 1.0mgKOH/g미만이 될 때까지 교반하였다. 산가가 목표(0.8)에 이를 때까지 11시간이 필요했다. 반응 종결 후 반응기의 온도를 실온으로 내려 무색 투명한 화학식 1-1-2의 화합물을 얻었다.Thus, 1 equivalent of the epoxy compound, 0.004 equivalent of t-butylammonium bromide, 0.001 equivalent of 2,6-diisobutylphenol, and 2.2 equivalent of methacrylic acid were mixed, and then 24.89 g of a solvent propylene glycol monomethyl ether acetate was added thereto. The temperature was melt | dissolved by heating at 90-100 degreeC, blowing air into this reaction solution at 25 ml / min. In the state where the reaction solution was cloudy, the temperature was heated to 120 ° C. to completely dissolve it. When the solution became clear and the viscosity became high, the acid value was measured and stirred until the acid value was less than 1.0 mgKOH / g. It took 11 hours to reach the target (0.8). After completion of the reaction, the temperature of the reactor was lowered to room temperature to obtain a colorless transparent compound of formula 1-1-2.
[화학식 1-1-2][Formula 1-1-2]
제조예 4 : 화학식 1-2-1의 화합물의 합성Preparation Example 4 Synthesis of Compound of Chemical Formula 1-2-1
3000ml 삼구 라운드 플라스크에 4,4'-(9H-잔텐-9,9-디일)디페놀(4,4'-(9H-xanthene-9,9-diyl)diphenol)364.4g과 t-부틸암모늄 브로마이드 0.4159g을 혼합하고, 에피클로로히드린 2359g을 넣고 90로 가열하여 반응시켰다. 액체크로마토그래피로 분석하여 4,4'-(9H-잔텐-9,9-디일)디페놀 (4,4'-(9Hxanthene-9,9-diyl)diphenol)이 완전히 소진되면 30℃로 냉각하여 50% NaOH 수용액 (3당량)을 천천히 첨가하였다. 액체 크로마토그래피로 분석하여 에피클로로히드린이 완전히 소진되었으면, 디클로로메탄으로 추출한 후 3회 수세한 후 유기층을 황산마그네슘으로 건조시킨 후 디클로로메탄을 감압 증류하고 디클로로메탄과 메탄올 혼합비 50:50을 사용하여 재결정하였다. 이렇게 합성된 에폭시 화합물 1당량과 t-부틸암모늄 브로마이드 0.004당량, 2,6-디이소부틸페놀 0.001당량, 아크릴산 2.2당량을 혼합한 후 용매 프로필렌글리콜모노메틸에테르아세테이트 24.89g을 넣어 혼합하였다. 이 반응 용액에 공기를 25ml/min으로 불어넣으면서 온도를 90~100℃로 가열 용해하였다. 반응 용액이 백탁한 상태에서 온도를 120℃까지 가열하여 완전히 용해시켰다. 용액이 투명해지고 점도가 높아지면 산가를 측정하여 산가가 1.0mgKOH/g미만이 될 때까지 교반하였다. 산가가 목표(0.8)에 이를 때까지 11시간이 필요했다. 반응 종결 후 반응기의 온도를 실온으로 내려 무색 투명한 화학식 1-2-1의 화합물을 얻었다.34.4 g of 4,4 '-(9H-xanthene-9,9-diyl) diphenol and 3-butylammonium bromide in a 3000 ml three-neck round flask 0.4159g was mixed, 2359g of epichlorohydrin was added and heated to 90 to react. By liquid chromatography, 4,4 '-(9H-xanthene-9,9-diyl) diphenol (4,4'-(9Hxanthene-9,9-diyl) diphenol) is completely depleted and cooled to 30 ℃. 50% NaOH aqueous solution (3 equiv) was added slowly. After epichlorohydrin was completely exhausted by liquid chromatography, the mixture was extracted with dichloromethane and washed three times. The organic layer was dried over magnesium sulfate, and dichloromethane was distilled under reduced pressure, and the mixture ratio of dichloromethane and methanol was 50:50. Recrystallized. Thus, 1 equivalent of the epoxy compound, 0.004 equivalent of t-butylammonium bromide, 0.001 equivalent of 2,6-diisobutylphenol and 2.2 equivalent of acrylic acid were mixed, and then 24.89 g of solvent propylene glycol monomethyl ether acetate was added thereto and mixed. The temperature was melt | dissolved by heating at 90-100 degreeC, blowing air into this reaction solution at 25 ml / min. In the state where the reaction solution was cloudy, the temperature was heated to 120 ° C. to completely dissolve it. When the solution became clear and the viscosity became high, the acid value was measured and stirred until the acid value was less than 1.0 mgKOH / g. It took 11 hours to reach the target (0.8). After completion of the reaction, the temperature of the reactor was lowered to room temperature to obtain a colorless transparent compound of formula 1-2-1.
[화학식 1-2-1][Formula 1-2-1]
제조예 5: 화학식 1-2-2의 화합물의 합성Preparation Example 5 Synthesis of Compound of Formula 1-2-2
3000ml 삼구 라운드 플라스크에 4,4'-(9H-잔텐-9,9-디일)디페놀(4,4'-(9H-xanthene-9,9-diyl)diphenol)364.4g과 t-부틸암모늄 브로마이드 0.4159g을 혼합하고, 에피클로로히드린 2359g을 넣고 90℃로 가열하여 반응시켰다. 액체크로마토그래피로 분석하여 4,4'-(9H-잔텐-9,9-디일)디페놀 (4,4'-(9Hxanthene-9,9-diyl)diphenol)이 완전히 소진되면 30℃로 냉각하여 50% NaOH 수용액 (3당량)을 천천히 첨가하였다. 액체 크로마토그래피로 분석하여 에피클로로히드린이 완전히 소진되었으면, 디클로로메탄으로 추출한 후 3회 수세한 후 유기층을 황산마그네슘으로 건조시킨 후 디클로로메탄을 감압 증류하고 디클로로메탄과 메탄올 혼합비 50:50을 사용하여 재결정하였다. 이렇게 합성된 에폭시 화합물 1당량과 t-부틸암모늄 브로마이드 0.004당량, 2,6-디이소부틸페놀 0.001당량, 메타아크릴산 2.2당량을 혼합한 후 용매 프로필렌글리콜모노메틸에테르아세테이트 24.89g을 넣어 혼합하였다. 이 반응 용액에 공기를 25ml/min으로 불어넣으면서 온도를 90~100℃로 가열 용해하였다. 반응 용액이 백탁한 상태에서 온도를 120℃까지 가열하여 완전히 용해시켰다. 용액이 투명해지고 점도가 높아지면 산가를 측정하여 산가가 1.0mgKOH/g미만이 될 때까지 교반하였다. 산가가 목표(0.8)에 이를 때까지 11시간이 필요했다. 반응 종결 후 반응기의 온도를 실온으로 내려 무색 투명한 화학식 1-2-2의 화합물을 얻었다.34.4 g of 4,4 '-(9H-xanthene-9,9-diyl) diphenol and 3-butylammonium bromide in a 3000 ml three-neck round flask 0.4159 g was mixed, 2359 g of epichlorohydrin was added, and the mixture was heated and reacted at 90 ° C. By liquid chromatography, 4,4 '-(9H-xanthene-9,9-diyl) diphenol (4,4'-(9Hxanthene-9,9-diyl) diphenol) is completely depleted and cooled to 30 ℃. 50% NaOH aqueous solution (3 equiv) was added slowly. After epichlorohydrin was completely exhausted by liquid chromatography, the mixture was extracted with dichloromethane and washed three times. The organic layer was dried over magnesium sulfate, and dichloromethane was distilled under reduced pressure, and the mixture ratio of dichloromethane and methanol was 50:50. Recrystallized. Thus, 1 equivalent of the epoxy compound, 0.004 equivalent of t-butylammonium bromide, 0.001 equivalent of 2,6-diisobutylphenol, and 2.2 equivalent of methacrylic acid were mixed, and then 24.89 g of solvent propylene glycol monomethyl ether acetate was added and mixed. The temperature was melt | dissolved by heating at 90-100 degreeC, blowing air into this reaction solution at 25 ml / min. In the state where the reaction solution was cloudy, the temperature was heated to 120 ° C. to completely dissolve it. When the solution became clear and the viscosity became high, the acid value was measured and stirred until the acid value was less than 1.0 mgKOH / g. It took 11 hours to reach the target (0.8). After completion of the reaction, the temperature of the reactor was lowered to room temperature to obtain a colorless transparent compound of formula 1-2-2.
[화학식 1-2-2][Formula 1-2-2]
제조예 6 : 카도계 바인더 수지의 합성(A-1)Preparation Example 6 Synthesis of Cardo-Based Binder Resin (A-1)
제조예 2의 화학식 1-1-1의 화합물 307.0g에 프로필렌글리콜모노메틸에테르아세테이트 600g을 첨가하여 용해한 후, 비페닐테트라카르복실산 2무수물 78g 및 브롬화테트라에틸암모늄 1g을 혼합하고 서서히 승온시켜 110~115℃ 에서 4시간 동안 반응시켰다. 산 무수물기의 소실을 확인한 후, 1,2,3,6-테트라히드로무수프탈산 38.0g을 혼합하여 90℃ 에서 6시간 동안 반응시켜 카도계 바인더 수지로 중합하였다. 무수물의 소실은 IR 스펙트럼에 의해 확인하였다.중량평균분자량: 3500After dissolving 600 g of propylene glycol monomethyl ether acetate in 307.0 g of the compound of Formula 1-1-1 of Preparation Example 2, 78 g of biphenyl tetracarboxylic dianhydride and 1 g of tetraethylammonium bromide were mixed and gradually warmed up to 110 The reaction was carried out at ˜115 ° C. for 4 hours. After confirming the disappearance of the acid anhydride group, 38.0 g of 1,2,3,6-tetrahydrophthalic anhydride was mixed and reacted at 90 ° C. for 6 hours to polymerize with a cardo binder resin. Loss of anhydride was confirmed by IR spectrum. Weight average molecular weight: 3500
제조예 7: 카도계 바인더 수지의 합성(A-2)Preparation Example 7 Synthesis of Cardo-Based Binder Resin (A-2)
제조예 3의 화학식 1-1-2의 화합물 307.0g에 프로필렌글리콜모노메틸에테르아세테이트 600g을 첨가하여 용해한 후, 비페닐테트라카르복실산 2무수물 78g 및 브롬화테트라에틸암모늄 1g을 혼합하고 서서히 승온시켜 110~115℃ 에서 4시간 동안 반응시켰다. 산 무수물기의 소실을 확인한 후, 1,2,3,6-테트라히드로무수프탈산 38.0g을 혼합하여 90℃ 에서 6시간 동안 반응시켜 카도계 바인더 수지로 중합하였다. 무수물의 소실은 IR 스펙트럼에 의해 확인하였다.중량평균분자량: 3800After dissolving 600 g of propylene glycol monomethyl ether acetate in 307.0 g of the compound of Formula 1-1-2 of Preparation Example 3, 78 g of biphenyltetracarboxylic dianhydride and 1 g of tetraethylammonium bromide were mixed and gradually warmed up. The reaction was carried out at ˜115 ° C. for 4 hours. After confirming the disappearance of the acid anhydride group, 38.0 g of 1,2,3,6-tetrahydrophthalic anhydride was mixed and reacted at 90 ° C. for 6 hours to polymerize with a cardo binder resin. Loss of anhydride was confirmed by IR spectrum. Weight average molecular weight: 3800
제조예 8 : 카도계 바인더 수지의 합성(A-3)Preparation Example 8 Synthesis of Cardo-Based Binder Resin (A-3)
제조예 4의 화학식 1-2-1의 화합물 307.0g에 프로필렌글리콜모노메틸에테르아세테이트 600g을 첨가하여 용해한 후, 페닐테트라카르복실산 2무수물 78g 및 브롬화테트라에틸암모늄 1g을 혼합하고 서서히 승온시켜 110~115℃ 에서 4시간 동안 반응시켰다. 산 무수물기의 소실을 확인한 후, 1,2,3,6-테트라히드로무수프탈산 38.0g을 혼합하여 90℃ 에서 6시간 동안 반응시켜 카도계 바인더 수지로 중합하였다. 무수물의 소실은 IR 스펙트럼에 의해 확인하였다.중량평균분자량: 4500After dissolving 600 g of propylene glycol monomethyl ether acetate in 307.0 g of the compound of Formula 1-2-1 of Preparation Example 4, 78 g of phenyltetracarboxylic dianhydride and 1 g of tetraethylammonium bromide were mixed and gradually warmed up to 110 to The reaction was carried out at 115 ° C. for 4 hours. After confirming the disappearance of the acid anhydride group, 38.0 g of 1,2,3,6-tetrahydrophthalic anhydride was mixed and reacted at 90 ° C. for 6 hours to polymerize with a cardo binder resin. Loss of anhydride was confirmed by IR spectrum. Weight average molecular weight: 4500
제조예 9 : 카도계 바인더 수지의 합성(A-4)Preparation Example 9 Synthesis of Cardo-Based Binder Resin (A-4)
제조예 5의 화학식 1-2-2의 화합물 307.0g에 프로필렌글리콜모노메틸에테르아세테이트 600g을 첨가하여 용해한 후, 페닐테트라카르복실산 2무수물 78g 및 브롬화테트라에틸암모늄 1g을 혼합하고 서서히 승온시켜 110~115℃ 에서 4시간 동안 반응시켰다. 산 무수물기의 소실을 확인한 후, 1,2,3,6-테트라히드로무수프탈산 38.0g을 혼합하여 90℃ 에서 6시간 동안 반응시켜 카도계 바인더 수지로 중합하였다. 무수물의 소실은 IR 스펙트럼에 의해 확인하였다.중량평균분자량: 4900After dissolving 600 g of propylene glycol monomethyl ether acetate in 307.0 g of the compound of formula 1-2-2 of Preparation Example 5, 78 g of phenyltetracarboxylic dianhydride and 1 g of tetraethylammonium bromide were mixed and gradually warmed up to 110 ~. The reaction was carried out at 115 ° C. for 4 hours. After confirming the disappearance of the acid anhydride group, 38.0 g of 1,2,3,6-tetrahydrophthalic anhydride was mixed and reacted at 90 ° C. for 6 hours to polymerize with a cardo binder resin. Loss of anhydride was confirmed by IR spectrum. Weight average molecular weight: 4900
장치: HLC-8120GPC(도소㈜ 제조)Equipment: HLC-8120GPC (manufactured by Tosoh Corporation)
칼럼: TSK-GELG4000HXL + TSK-GELG2000HXL(직렬 접속)Column: TSK-GELG4000HXL + TSK-GELG2000HXL (Serial Connection)
칼럼 온도: 40℃Column temperature: 40 ℃
이동상 용제: 테트라히드로퓨란Mobile phase solvent: tetrahydrofuran
유속: 1.0 ㎖/분Flow rate: 1.0 ml / min
주입량: 50 ㎕Injection volume: 50 μl
검출기: RIDetector: RI
측정 시료 농도: 0.6 중량%(용제 = 테트라히드로퓨란)Sample concentration measured: 0.6 wt% (solvent = tetrahydrofuran)
교정용 표준 물질: TSK STANDARD POLYSTYRENE F-40, F-4, F-1, A-2500, A-500(도소㈜ 제조)Calibration standard: TSK STANDARD POLYSTYRENE F-40, F-4, F-1, A-2500, A-500 (manufactured by Tosoh Corporation)
상기에서 얻어진 중량 평균 분자량 및 수평균 분자량의 비를 분자량 분포(Mw/Mn)로 하였다.The ratio of the weight average molecular weight and number average molecular weight obtained above was made into molecular weight distribution (Mw / Mn).
실시예 1 내지 9 비교예 1 내지 7: 청색 감광성 수지 조성물의 제조Examples 1 to 9 Comparative Examples 1 to 7: Preparation of Blue Photosensitive Resin Compositions
하기 표 1 내지 3의 조성에 따라, 실시예 1 내지 9 비교예 1 내지 3의 청색 감광성 수지 조성물을 제조하였다. (표 1은 산란입자를 나타내고, 표 2는 실시예의 및 비교예의 조성물의 구성 및 함량을 나타낸다.)To the blue photosensitive resin composition of Examples 1 to 9 Comparative Examples 1 to 3 according to the composition of Tables 1 to 3. (Table 1 shows scattering particles, and Table 2 shows the composition and content of the compositions of Examples and Comparative Examples.)
[표 1]TABLE 1
[표 2]TABLE 2
컬러필터의 제조Manufacture of color filter
상기 실시예 1 내지 9 및 비교예 1 내지 7에서 제조된 금속산화물 감광성 수지조성물을 이용하여 컬러필터를 제조하였다. 즉, 상기 각각의 감광성 수지 조성물을 스핀 코팅법으로 유리 기판 위에 도포한 다음, 가열판 위에 놓고 100 ℃의 온도에서 3 분간 유지하여 박막을 형성시켰다. Color filters were prepared using the metal oxide photosensitive resin compositions prepared in Examples 1 to 9 and Comparative Examples 1 to 7. That is, each of the photosensitive resin composition was applied on a glass substrate by spin coating, and then placed on a heating plate and maintained at a temperature of 100 ° C. for 3 minutes to form a thin film.
이어서 상기 박막 위에 가로x세로 20mm x 20mm 정사각형의 투과 패턴과 1 내지 100 ㎛의 라인/스페이스 패턴을 갖는 시험 포토마스크를 올려놓고 시험 포토마스크와의 간격을 100 ㎛로 하여 자외선을 조사하였다. Subsequently, a test photomask having a transmissive pattern of 20 mm x 20 mm square and a line / space pattern of 1 to 100 μm was placed on the thin film and irradiated with ultraviolet rays at a distance of 100 μm from the test photomask.
이때, 자외선광원은 우시오 덴끼㈜제의 초고압 수은 램프(상품명 USH-250D)를 이용하여 대기 분위기하에 200 mJ/㎠의 노광량(365 ㎚)으로 광조사하였으며, 특별한 광학 필터는 사용하지 않았다. At this time, the ultraviolet light source was irradiated with an exposure amount (365 nm) of 200 mJ / cm 2 under an atmospheric atmosphere using an ultra high pressure mercury lamp (trade name USH-250D) manufactured by Ushio Denki Co., Ltd., and no special optical filter was used.
상기에서 자외선이 조사된 박막을 pH 10.5의 KOH 수용액 현상 용액에 80 초 동안 담궈 현상하였다. 이 박막이 입혀진 유리판을 증류수를 사용하여 세척한 다음, 질소 가스를 불어서 건조하고, 150 ℃의 가열 오븐에서 10 분 동안 가열하여 컬러필터 패턴을 제조하였다. 상기에서 제조된 컬러 패턴의 필름 두께는 5.0 ㎛이었다.The thin film irradiated with ultraviolet rays was developed by soaking for 80 seconds in a KOH aqueous solution developing solution of pH 10.5. The thin film coated glass plate was washed with distilled water, dried by blowing nitrogen gas, and heated in a heating oven at 150 ° C. for 10 minutes to prepare a color filter pattern. The film thickness of the color pattern prepared above was 5.0 μm.
실험예 1: 컬러필터의 현상속도, 감도, 패턴안정성, 테이퍼 선폭 및 형태 실험 Experimental Example 1: Development speed, sensitivity, pattern stability, taper line width and shape of color filter
상기 실시예 1 내지 5 및 비교예 1 내지 3의 청색 감광성 수지 조성물로 제조된 컬러필터를 대상으로 하기 표 3과 같이 평가 하였다. 각 실험에 대한 평가기준은 하기와 같다. The color filters prepared from the blue photosensitive resin compositions of Examples 1 to 5 and Comparative Examples 1 to 3 were evaluated as shown in Table 3 below. Evaluation criteria for each experiment are as follows.
현상속도(sec): 현상<Spray Developer HPMJ 방식>시 비노광부가 현상액에 최초로 용해되는데 걸리는 시간Development speed (sec): Time taken for the first non-exposure part to dissolve in the developer during development <Spray Developer HPMJ method>
감도: 감도 마스크 미세 패턴(1~60)의 뜯김이 없는 박막을 형성한 정도(수치가 낮을수록 감도가 우수)Sensitivity: The degree of formation of a flawless thin film of the sensitivity mask fine pattern (1 to 60) (the lower the value, the better the sensitivity).
패턴 안정성: 저노광량(20~100mJ)에서의 패턴 마스크의 노광후의 패턴의 오류 정도Pattern Stability: Pattern error after exposure of pattern mask at low exposure amount (20-100mJ)
○: 패턴상 오류 없음○: no error on the pattern
X: 패턴상 오류 3개 이상 X: 3 or more errors on the pattern
○, X는 3차원 표면 형상기의 광학현미경을 통한 확인 결과.○, X is the result confirmed by the optical microscope of the three-dimensional surface shaper.
테이퍼 선폭(㎛): 패턴 마스크의 100㎛ 패턴의 노광후 선폭. Tapered line width (µm): Post-exposure line width of 100 µm pattern of pattern mask.
[표 3]TABLE 3
현상속도가 60초 이상을 넘어가게 되면, 주어진 공정 시간안에 제조가 불가하고, 30초이상을 넘어가게되면, 패턴 표면의 거칠기가 균일하지 않게되며, Uniformity 또한 감소될 수 있다. 본원발명의 실시예 1 내지 5는 현상속도가 30초 미만이고, 감도가 60이하로 우수하였으며, 패턴안정성 및 테이퍼 선폭 모두 우수한 효과를 가짐을 확인하였다. 반면, 비교예 1의 경우, 산란입자가 포함되지 않아, 패턴 안정성이 불안하며, 패턴의 불균형을 일으켰다. 비교예 2의 경우, 아크릴 수지만으로 결합하게 되면, 산란입자와 청색 착색제를 카도계 바인더 수지만큼 강하게 지지하지 못하여, 박리가 되었으며, 비교예 3의 경우, 에틸렌 옥사이드 및 프로필렌 옥사이드를 포함하지 않는 광중합성 화합물의 경우, 현상 속도가 현저히 떨어졌으며, 긴 현상속도에 의해, 패턴 안정성과 패턴의 불균형이 일어남을 확인 하였다. If the developing speed exceeds 60 seconds, it is impossible to manufacture within a given process time, and if it exceeds 30 seconds, the roughness of the pattern surface becomes uneven and uniformity may also be reduced. In Examples 1 to 5 of the present invention, the development speed was less than 30 seconds, and the sensitivity was less than 60, and it was confirmed that the pattern stability and the taper line width had excellent effects. On the other hand, in Comparative Example 1, the scattering particles are not included, the pattern stability is unstable, causing an imbalance of the pattern. In the case of Comparative Example 2, when combined with only acrylic resin, the scattering particles and the blue colorant could not be supported as strongly as the cardo-based binder resin, and thus peeled off, and in Comparative Example 3, photopolymerizable without ethylene oxide and propylene oxide In the case of the compound, the development speed was significantly decreased, and the long development speed confirmed that pattern stability and pattern imbalance occurred.
실험예 2 : 미세 패턴 측정Experimental Example 2 Fine Pattern Measurement
상기 실시예 1 내지 5 및 비교예 1 내지 3에서 제조된 금속산화물 감광성 수지를 사용하여 제조된 컬러필터 중 100 ㎛로 설계된 라인/스페이스 패턴 마스크를 통해 얻어진, 패턴의 크기를 OM장비(ECLIPSE LV100POL 니콘사)를 통해 패턴 크기를 측정하였고, 그 결과를 하기 표 4에 기재하였다. The size of the pattern obtained through the line / space pattern mask designed to 100 μm of the color filters manufactured using the metal oxide photosensitive resins prepared in Examples 1 to 5 and Comparative Examples 1 to 3 was obtained by OM equipment (ECLIPSE LV100POL Nikon). G) through the pattern size was measured, the results are shown in Table 4 below.
[표 4]TABLE 4
라인/스페이스 패턴 마스크의 설계값과 얻어진 미세 패턴의 측정값과의 차이가 20 μm 이상이면, 미세화소의 구현이 어려워진다.If the difference between the design value of the line / space pattern mask and the measured value of the obtained fine pattern is 20 µm or more, it is difficult to implement the fine pixel.
이에 표 4에서 확인 할 수 있듯이, 에틸렌 옥사이드 및 프로필렌 옥사이드가 부가된 광중합성 화합물을 포함하는 실시예 1 내지 4의 경우 20 μm 미만의 미세패턴을 형성하였음을 확인하였다. 반면 비교예 1 내지 3의 경우 미세패턴이 불량하게 형성되거나, 박리되어 패턴 형성 여부를 확일 할 수 없음을 확인하였다. As can be seen in Table 4, in Examples 1 to 4 including a photopolymerizable compound to which ethylene oxide and propylene oxide were added, it was confirmed that a micropattern of less than 20 μm was formed. On the other hand, in the case of Comparative Examples 1 to 3 it was confirmed that the fine pattern is poorly formed or peeled off to determine whether the pattern is formed.
실험예 3 : 발광 강도 측정Experimental Example 3 Measurement of Luminescence Intensity
상기 실시예 1 내지 5 및 비교예 1 내지 3에서 제조된 금속산화물 감광성 수지를 사용하여 제조된 컬러필터 중 20 x 20 mm 정사각형의 패턴으로 형성된 부분에 365 nm Tube형 4 W UV조사기(VL-4LC, VILBER LOURMAT)를 통하여 광 변환된 영역을 측정하였으며, 실시예 1 내지 5 및 비교예 1 내지 3은 450 nm영역에서의 발광 강도를 Spectrum meter(Ocean Optics사)를 이용하여 측정하였다. 그 결과를 하기 표 5에 기재하였다. 365 nm tube type 4 W UV irradiator (VL-4LC) on the portion formed in the pattern of 20 x 20 mm square of the color filter prepared using the metal oxide photosensitive resin prepared in Examples 1 to 5 and Comparative Examples 1 to 3 , VILBER LOURMAT) was used to measure the light conversion region, and Examples 1 to 5 and Comparative Examples 1 to 3 measured the emission intensity in the 450 nm region using a Spectrum meter (Ocean Optics). The results are shown in Table 5 below.
[표 5]TABLE 5
측정된 발광 강도가 높을수록 광효율이 높음을 의미한다. 이에 표 6을 보면, 에틸렌 옥사이드 및 프로필렌 옥사이드가 부가된 광중합성 화합물을 포함하는 실시예 1 내지 5의 경우, 발광 강도가 3 이상으로 우수하게 향상되었음을 확인할 수 있었다. 반면, 비교예 1 내지 3의 경우 광효율이 2 이하로 저하되었음을 확인할 수 있었다.The higher the measured light emission intensity, the higher the light efficiency. In Table 6, it can be seen that in Examples 1 to 5 including the photopolymerizable compound to which ethylene oxide and propylene oxide were added, the emission intensity was improved to 3 or more. On the other hand, in Comparative Examples 1 to 3 it was confirmed that the light efficiency was lowered to 2 or less.
실험예 4 : 시야각 측정Experimental Example 4 Viewing Angle Measurement
상기 실시예 1 내지 5 및 비교예 1 내지 3에서 제조된 금속산화물 감광성 수지를 사용하여 제조된 컬러필터 중 20 x 20 mm 정사각형의 패턴으로 형성된 부분에 투광조건에서의 시야각에 따른 광 Intensity를 변각광도계(GC-5000L, Nippon Denshoku)를 사용하여 측정하였고, 하기 식 1을 이용하여 확산율을 산출하였다.An optical intensity according to the viewing angle under light transmission conditions in a portion of a color filter manufactured using the metal oxide photosensitive resin prepared in Examples 1 to 5 and Comparative Examples 1 to 3 in a pattern of 20 x 20 mm square. It was measured using (GC-5000L, Nippon Denshoku), and the diffusion rate was calculated using the following equation 1.
[식 1][Equation 1]
확산율 = (B70 + B20) / 2 x B5 x 100Diffusion rate = (B 70 + B 20 ) / 2 x B 5 x 100
(Bθ=Iθ/cosθ)(B θ = I θ / cosθ)
I는 각 각도에서 측정된 광 Intensity를 의미하고, B70, B20, B5 70도, 20도, 5도에서 측정한 것을 의미한다.I means light intensity measured at each angle, and means measured at B 70, B 20, B 5 70 degrees, 20 degrees and 5 degrees.
[표 6]TABLE 6
측정된 확산율이 높을수록 시야각이 좋아짐을 의미한다. 이에 표 7을 보면, 에틸렌 옥사이드 및 프로필렌 옥사이드가 부가된 광중합성 화합물을 포함하는 실시예 1 내지 5는 확산율이 85이상으로, 시야각이 매우 우수하게 향상되었음을 확인할 수 있었다. 반면, 비교예 1 및 3 의 경우 확산율이 실시예1 내지 5와 대비하여 현저히 떨어졌으며, 시야각이 저하되거나, 박리되어 확산율을 측정할 수 없음을 확인할 수 있었다.The higher the measured diffusion, the better the viewing angle. In Table 7, Examples 1 to 5 including the photopolymerizable compound added with ethylene oxide and propylene oxide had a diffusion ratio of 85 or more, and it was confirmed that the viewing angle was very excellent. On the other hand, in Comparative Examples 1 and 3, the diffusion rate was remarkably dropped compared to Examples 1 to 5, and it was confirmed that the diffusion angle could not be measured because the viewing angle was lowered or peeled off.
본 발명은 상기 청색 감광성 수지 조성물에 알킬렌 옥사이드를 포함하는 광중합성 화합물을 포함하여, 현상속도를 제어하고, 패턴의 잔사를 없애 공정상의 잔사로 말미암아 나타나는 문제를 해결하고, 표시불량 문제가 개선되며, 레지스트 미현상의 문제가 개선된 컬러필터를 제공한다. 또한, 테이퍼 조절을 통하여 우수한 시야각을 갖는 고품질 화질의 자발광 컬러필터를 제공할 수 있다.The present invention includes a photopolymerizable compound containing alkylene oxide in the blue photosensitive resin composition, to control the development speed, solve the problem caused by the process residue by eliminating the residue of the pattern, and poor display problems are improved In addition, the present invention provides a color filter in which the problem of resist non-developing is improved. In addition, it is possible to provide a high-quality self-luminous color filter having an excellent viewing angle by adjusting the taper.
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KR20170011208A (en) * | 2015-07-22 | 2017-02-02 | 동우 화인켐 주식회사 | Color filter, method for producing the same and image display device employing color filter |
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KR20180111076A (en) | 2018-10-11 |
JP2020515898A (en) | 2020-05-28 |
TW201837097A (en) | 2018-10-16 |
TWI732073B (en) | 2021-07-01 |
CN110446975B (en) | 2025-01-28 |
WO2018182135A9 (en) | 2018-11-08 |
KR102300331B1 (en) | 2021-09-09 |
CN110446975A (en) | 2019-11-12 |
JP7030837B2 (en) | 2022-03-07 |
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