WO1997035045B1 - Dispositif d'injection de vapeur cloisonne interieurement servant a distribuer des melanges sources de vapeurs reactives pour le depot chimique en phase vapeur - Google Patents
Dispositif d'injection de vapeur cloisonne interieurement servant a distribuer des melanges sources de vapeurs reactives pour le depot chimique en phase vapeurInfo
- Publication number
- WO1997035045B1 WO1997035045B1 PCT/US1997/005690 US9705690W WO9735045B1 WO 1997035045 B1 WO1997035045 B1 WO 1997035045B1 US 9705690 W US9705690 W US 9705690W WO 9735045 B1 WO9735045 B1 WO 9735045B1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- housing
- interior volume
- baffle plate
- showerhead
- front wall
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title claims abstract 11
- 239000003153 chemical reaction reagent Substances 0.000 title claims 15
- 238000005229 chemical vapour deposition Methods 0.000 title claims 4
- 239000012530 fluid Substances 0.000 claims abstract 34
- 238000007599 discharging Methods 0.000 claims abstract 5
- 239000000758 substrate Substances 0.000 claims 17
- 238000000034 method Methods 0.000 claims 8
- 239000002243 precursor Substances 0.000 claims 8
- 238000000151 deposition Methods 0.000 claims 3
- 239000007800 oxidant agent Substances 0.000 claims 3
- 230000001590 oxidative effect Effects 0.000 claims 3
- 230000004323 axial length Effects 0.000 claims 2
- 230000008021 deposition Effects 0.000 claims 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims 1
- 229910052746 lanthanum Inorganic materials 0.000 claims 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 229910052712 strontium Inorganic materials 0.000 claims 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 claims 1
- 229910052726 zirconium Inorganic materials 0.000 claims 1
- 239000010409 thin film Substances 0.000 abstract 1
Abstract
Dispositif de dispersion et de pulvérisation (2) servant à mélanger plusieurs flux de vapeur et comprenant un boîtier (10) comportant des parois avant et arrière (12, 14), ainsi qu'une paroi latérale (16) intermédiaire, le tout définissant un volume intérieur (15). La paroi avant possède une multiplicité d'ouvertures d'évacuation (20) d'un mélange de vapeur servant à évacuer du boîtier ledit mélange, des passages d'écoulement (24) liés au boîtier pour l'introduction des fluides dans ce dernier et, au moins, une chicane (18) montée dans le volume intérieur du boîtier, ladite chicane et la paroi latérale créant entre elles un passage annulaire d'écoulement (21), au moins un des fluides respectifs étant dirigé contre ladite chicane, lorsqu'il est introduit dans le volume intérieur du boîtier, afin d'être distribué dans ledit volume. Ce dispositif à chicane peut être utilisé avantageusement afin de créer des couches minces par dépôt chimique en phase vapeur présentant une composition et une épaisseur de grande homogénéité.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US621,088 | 1996-03-22 | ||
| US08/621,088 US5741363A (en) | 1996-03-22 | 1996-03-22 | Interiorly partitioned vapor injector for delivery of source reagent vapor mixtures for chemical vapor deposition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| WO1997035045A1 WO1997035045A1 (fr) | 1997-09-25 |
| WO1997035045B1 true WO1997035045B1 (fr) | 1997-11-13 |
Family
ID=24488662
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/US1997/005690 WO1997035045A1 (fr) | 1996-03-22 | 1997-03-24 | Dispositif d'injection de vapeur cloisonne interieurement servant a distribuer des melanges sources de vapeurs reactives pour le depot chimique en phase vapeur |
Country Status (2)
| Country | Link |
|---|---|
| US (2) | US5741363A (fr) |
| WO (1) | WO1997035045A1 (fr) |
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| DE102010000388A1 (de) * | 2010-02-11 | 2011-08-11 | Aixtron Ag, 52134 | Gaseinlassorgan mit Prallplattenanordnung |
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| US10351955B2 (en) * | 2013-12-18 | 2019-07-16 | Lam Research Corporation | Semiconductor substrate processing apparatus including uniformity baffles |
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| US10378107B2 (en) | 2015-05-22 | 2019-08-13 | Lam Research Corporation | Low volume showerhead with faceplate holes for improved flow uniformity |
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-
1996
- 1996-03-22 US US08/621,088 patent/US5741363A/en not_active Expired - Lifetime
-
1997
- 1997-03-24 WO PCT/US1997/005690 patent/WO1997035045A1/fr active Application Filing
-
1998
- 1998-02-03 US US09/017,384 patent/US6010748A/en not_active Expired - Fee Related
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