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WO2008132843A1 - 感光性樹脂組成物、ドライフィルムおよびそれを用いた加工品 - Google Patents

感光性樹脂組成物、ドライフィルムおよびそれを用いた加工品 Download PDF

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Publication number
WO2008132843A1
WO2008132843A1 PCT/JP2008/001064 JP2008001064W WO2008132843A1 WO 2008132843 A1 WO2008132843 A1 WO 2008132843A1 JP 2008001064 W JP2008001064 W JP 2008001064W WO 2008132843 A1 WO2008132843 A1 WO 2008132843A1
Authority
WO
WIPO (PCT)
Prior art keywords
resin composition
photosensitive resin
same
dry film
processed work
Prior art date
Application number
PCT/JP2008/001064
Other languages
English (en)
French (fr)
Inventor
Katsuhiko Funaki
Etsuo Ohkawado
Kousuke Hirota
Syuji Tahara
Original Assignee
Mitsui Chemicals, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Chemicals, Inc. filed Critical Mitsui Chemicals, Inc.
Priority to CN2008800128154A priority Critical patent/CN101663617B/zh
Priority to US12/596,948 priority patent/US8361605B2/en
Priority to KR1020097022013A priority patent/KR101128207B1/ko
Priority to JP2009511687A priority patent/JP4814997B2/ja
Publication of WO2008132843A1 publication Critical patent/WO2008132843A1/ja

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/285—Permanent coating compositions
    • H05K3/287—Photosensitive compositions
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Materials For Photolithography (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

　プリント配線板作製時に施される各種金属のめっき工程において、めっきのもぐり、膜の剥がれなどの不具合を回避し、かつ、密着性、可撓性、絶縁信頼性、耐熱性に優れる配線保護膜を形成する感光性樹脂組成物を提供する。具体的には、（Ａ）カルボキシル基を有する高分子化合物、（Ｂ）少なくとも２つ以上の光重合可能な不飽和二重結合を有する化合物、（Ｃ）光重合開始剤、および特定の構造を表される（Ｄ）含窒素化合物を有する感光性樹脂組成物を提供する。
PCT/JP2008/001064 2007-04-24 2008-04-23 感光性樹脂組成物、ドライフィルムおよびそれを用いた加工品 WO2008132843A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CN2008800128154A CN101663617B (zh) 2007-04-24 2008-04-23 感光性树脂组合物、干膜及使用它的加工品
US12/596,948 US8361605B2 (en) 2007-04-24 2008-04-23 Photosensitive resin composition, dry film, and processed product made using the same
KR1020097022013A KR101128207B1 (ko) 2007-04-24 2008-04-23 감광성 수지 조성물, 드라이 필름 및 그것을 이용한 가공품
JP2009511687A JP4814997B2 (ja) 2007-04-24 2008-04-23 感光性樹脂組成物、ドライフィルムおよびそれを用いた加工品

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007113664 2007-04-24
JP2007-113664 2007-04-24

Publications (1)

Publication Number Publication Date
WO2008132843A1 true WO2008132843A1 (ja) 2008-11-06

Family

ID=39925314

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/001064 WO2008132843A1 (ja) 2007-04-24 2008-04-23 感光性樹脂組成物、ドライフィルムおよびそれを用いた加工品

Country Status (6)

Country Link
US (1) US8361605B2 (ja)
JP (1) JP4814997B2 (ja)
KR (1) KR101128207B1 (ja)
CN (1) CN101663617B (ja)
TW (1) TWI421632B (ja)
WO (1) WO2008132843A1 (ja)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102207680A (zh) * 2010-03-26 2011-10-05 住友化学株式会社 感光性树脂组合物
CN102549497A (zh) * 2009-09-10 2012-07-04 东丽株式会社 感光性树脂组合物及感光性树脂膜的制造方法
JP2012527009A (ja) * 2009-08-28 2012-11-01 エルジー・ケム・リミテッド 低温硬化性感光性樹脂組成物およびこれを用いて製造されたドライフィルム
JP2015175961A (ja) * 2014-03-14 2015-10-05 日立化成株式会社 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びタッチパネルの製造方法
CN107407878A (zh) * 2015-03-26 2017-11-28 东丽株式会社 感光性树脂组合物
JP2022083986A (ja) * 2020-11-25 2022-06-06 味の素株式会社 ポジ型感光性樹脂組成物
JP2023068718A (ja) * 2021-11-04 2023-05-18 コニカミノルタ株式会社 プリント配線板及びプリント回路板

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008132842A1 (ja) * 2007-04-24 2008-11-06 Mitsui Chemicals, Inc. 感光性樹脂組成物、ドライフィルムおよびそれを用いた加工品
KR101128207B1 (ko) * 2007-04-24 2012-03-23 미쓰이 가가쿠 가부시키가이샤 감광성 수지 조성물, 드라이 필름 및 그것을 이용한 가공품
EP2850114B1 (en) * 2012-05-18 2017-03-15 Ricoh Company, Ltd. Photopolymerizable composition, photopolymerizable inkjet ink, and ink cartridge
KR102440445B1 (ko) * 2013-08-02 2022-09-06 쇼와덴코머티리얼즈가부시끼가이샤 감광성 수지 조성물
CN109438735B (zh) * 2018-11-08 2021-07-20 株洲时代华鑫新材料技术有限公司 一种高导热聚酰亚胺基复合薄膜及其制备方法
TWI862717B (zh) * 2019-10-28 2024-11-21 日商日產化學股份有限公司 含多元羧酸之耐藥液性保護膜

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JP2005208527A (ja) * 2004-01-26 2005-08-04 Asahi Kasei Electronics Co Ltd 感光性コーティング樹脂組成物
JP2005266757A (ja) * 2004-02-20 2005-09-29 Asahi Kasei Electronics Co Ltd 感光性樹脂組成物
JP2006342310A (ja) * 2005-06-10 2006-12-21 Kaneka Corp 新規ポリイミド前駆体およびその利用
JP2007094428A (ja) * 2006-12-12 2007-04-12 Hitachi Chem Co Ltd 感光性樹脂組成物及びこれを用いたレリーフパターンの製造法
JP2007094342A (ja) * 2005-09-02 2007-04-12 Kaneka Corp 難燃性を有する感光性樹脂組成物及びその利用

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US4963645A (en) * 1987-08-25 1990-10-16 Ube Industries, Ltd. Terminal-modified imide oligomer and solution composition of the same
JP3084585B2 (ja) * 1991-12-09 2000-09-04 チッソ株式会社 ポリイミド系感光性カバーコート剤
US5756260A (en) * 1993-02-16 1998-05-26 Sumitomo Bakelite Company Limited Photosensitive polyimide resin composition containing a stabilizer and method for formation of relief pattern using same
JP3526829B2 (ja) * 1999-01-21 2004-05-17 旭化成エレクトロニクス株式会社 ポリアミド酸エステル
JP2000321767A (ja) 1999-05-07 2000-11-24 Nichigo Morton Co Ltd 感光性樹脂組成物及びこれを用いたドライフィルムレジスト
JP4135793B2 (ja) 1999-12-03 2008-08-20 日本化薬株式会社 樹脂組成物、ソルダーレジスト樹脂組成物及びこれらの硬化物
EP1327642A4 (en) 2000-09-20 2006-07-19 Taiyo Ink Mfg Co Ltd CARBOXYLATED PHOTOSENSITIVE RESIN, THIS CONTAINING, ALKALI DEVELOPABLE, LIGHT-CURABLE / HEAT-CURABLE COMPOSITION, AND THEREOF HARDENED ARTICLE
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JP4683182B2 (ja) 2004-09-28 2011-05-11 山栄化学株式会社 感光性熱硬化性樹脂組成物、並びにレジスト被覆プリント配線板及びその製造法
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JP2006330193A (ja) 2005-05-24 2006-12-07 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント及びこれらを用いたプリント配線板の製造方法
KR101128207B1 (ko) * 2007-04-24 2012-03-23 미쓰이 가가쿠 가부시키가이샤 감광성 수지 조성물, 드라이 필름 및 그것을 이용한 가공품
US8362103B2 (en) * 2007-05-11 2013-01-29 Mitsui Chemicals, Inc. Resin composition, dry film, and processed product made using the same

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Publication number Priority date Publication date Assignee Title
JP2005208527A (ja) * 2004-01-26 2005-08-04 Asahi Kasei Electronics Co Ltd 感光性コーティング樹脂組成物
JP2005266757A (ja) * 2004-02-20 2005-09-29 Asahi Kasei Electronics Co Ltd 感光性樹脂組成物
JP2006342310A (ja) * 2005-06-10 2006-12-21 Kaneka Corp 新規ポリイミド前駆体およびその利用
JP2007094342A (ja) * 2005-09-02 2007-04-12 Kaneka Corp 難燃性を有する感光性樹脂組成物及びその利用
JP2007094428A (ja) * 2006-12-12 2007-04-12 Hitachi Chem Co Ltd 感光性樹脂組成物及びこれを用いたレリーフパターンの製造法

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012527009A (ja) * 2009-08-28 2012-11-01 エルジー・ケム・リミテッド 低温硬化性感光性樹脂組成物およびこれを用いて製造されたドライフィルム
CN102549497A (zh) * 2009-09-10 2012-07-04 东丽株式会社 感光性树脂组合物及感光性树脂膜的制造方法
CN102549497B (zh) * 2009-09-10 2013-07-31 东丽株式会社 感光性树脂组合物及感光性树脂膜的制造方法
CN102207680A (zh) * 2010-03-26 2011-10-05 住友化学株式会社 感光性树脂组合物
JP2015175961A (ja) * 2014-03-14 2015-10-05 日立化成株式会社 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びタッチパネルの製造方法
CN107407878A (zh) * 2015-03-26 2017-11-28 东丽株式会社 感光性树脂组合物
CN107407878B (zh) * 2015-03-26 2020-11-17 东丽株式会社 感光性树脂组合物
JP2022083986A (ja) * 2020-11-25 2022-06-06 味の素株式会社 ポジ型感光性樹脂組成物
JP7687192B2 (ja) 2020-11-25 2025-06-03 味の素株式会社 ポジ型感光性樹脂組成物
JP2023068718A (ja) * 2021-11-04 2023-05-18 コニカミノルタ株式会社 プリント配線板及びプリント回路板

Also Published As

Publication number Publication date
US8361605B2 (en) 2013-01-29
JP4814997B2 (ja) 2011-11-16
KR101128207B1 (ko) 2012-03-23
CN101663617B (zh) 2013-05-08
CN101663617A (zh) 2010-03-03
JPWO2008132843A1 (ja) 2010-07-22
US20100116532A1 (en) 2010-05-13
KR20100009552A (ko) 2010-01-27
TW200905389A (en) 2009-02-01
TWI421632B (zh) 2014-01-01

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