[go: up one dir, main page]

WO2008132842A1 - 感光性樹脂組成物、ドライフィルムおよびそれを用いた加工品 - Google Patents

感光性樹脂組成物、ドライフィルムおよびそれを用いた加工品 Download PDF

Info

Publication number
WO2008132842A1
WO2008132842A1 PCT/JP2008/001063 JP2008001063W WO2008132842A1 WO 2008132842 A1 WO2008132842 A1 WO 2008132842A1 JP 2008001063 W JP2008001063 W JP 2008001063W WO 2008132842 A1 WO2008132842 A1 WO 2008132842A1
Authority
WO
WIPO (PCT)
Prior art keywords
integer
dry film
resin composition
photosensitive resin
hydrogen atom
Prior art date
Application number
PCT/JP2008/001063
Other languages
English (en)
French (fr)
Inventor
Katsuhiko Funaki
Etsuo Ohkawado
Kousuke Hirota
Syuji Tahara
Original Assignee
Mitsui Chemicals, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Chemicals, Inc. filed Critical Mitsui Chemicals, Inc.
Priority to US12/596,952 priority Critical patent/US8409784B2/en
Priority to JP2009511686A priority patent/JP5167252B2/ja
Priority to KR1020097022011A priority patent/KR101161929B1/ko
Priority to CN2008800133769A priority patent/CN101675387B/zh
Publication of WO2008132842A1 publication Critical patent/WO2008132842A1/ja

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/04—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polycarbonamides, polyesteramides or polyimides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/285—Permanent coating compositions
    • H05K3/287—Photosensitive compositions
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Materials For Photolithography (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)

Abstract

　本発明は、環境に負荷を与える可能性の高いハロゲン含有化合物類およびアンチモン化合物を含まず、硬化後に良好な難燃性を発現し、特に近年の厳しい屈曲耐性、絶縁信頼性の要求に応える感光性樹脂組成物を提供する。具体的に本発明により、（Ａ）下記一般式（１）で表される（メタ）アクリレート化合物、（Ｂ）ポリイミド前駆体、および（Ｃ）光重合開始剤を含有することを特徴とする感光性樹脂組成物。（式中、Ｒ1は水素原子またはメチル基を表し、Ｒ２は水素原子または一価の有機基を表し、ｎおよびｍはそれぞれ１～５の整数を表す。ｐは０～６の整数を表し、ｑおよびｒはそれぞれ０～４の整数を表し、ｓは０～６の整数を表す。ｐとｑとｒとｓの和は６である。ｐとｓの和は３～６であればよいが、好ましくは６である。）
PCT/JP2008/001063 2007-04-24 2008-04-23 感光性樹脂組成物、ドライフィルムおよびそれを用いた加工品 WO2008132842A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
US12/596,952 US8409784B2 (en) 2007-04-24 2008-04-23 Photosensitive resin composition, dry film, and processed product made using the same
JP2009511686A JP5167252B2 (ja) 2007-04-24 2008-04-23 感光性樹脂組成物、ドライフィルムおよびそれを用いた加工品
KR1020097022011A KR101161929B1 (ko) 2007-04-24 2008-04-23 감광성 수지 조성물, 드라이 필름 및 그것을 이용한 가공품
CN2008800133769A CN101675387B (zh) 2007-04-24 2008-04-23 感光性树脂组合物、干膜以及使用该干膜的加工品

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007-113665 2007-04-24
JP2007113665 2007-04-24
JP2007-242638 2007-09-19
JP2007242638 2007-09-19

Publications (1)

Publication Number Publication Date
WO2008132842A1 true WO2008132842A1 (ja) 2008-11-06

Family

ID=39925313

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/001063 WO2008132842A1 (ja) 2007-04-24 2008-04-23 感光性樹脂組成物、ドライフィルムおよびそれを用いた加工品

Country Status (6)

Country Link
US (1) US8409784B2 (ja)
JP (1) JP5167252B2 (ja)
KR (1) KR101161929B1 (ja)
CN (1) CN101675387B (ja)
TW (1) TWI477894B (ja)
WO (1) WO2008132842A1 (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009186861A (ja) * 2008-02-08 2009-08-20 Asahi Kasei E-Materials Corp 感光性樹脂組成物
JP2010113245A (ja) * 2008-11-07 2010-05-20 Taiyo Ink Mfg Ltd 難燃性光硬化性樹脂組成物、そのドライフィルム及び硬化物並びにそれらを用いたプリント配線板
JP2013054361A (ja) * 2012-10-01 2013-03-21 Taiyo Holdings Co Ltd 難燃性光硬化性樹脂組成物、そのドライフィルム及び硬化物並びにそれらを用いたプリント配線板
WO2017169763A1 (ja) * 2016-03-30 2017-10-05 東レ株式会社 ネガ型感光性樹脂組成物、硬化膜、硬化膜を具備する表示装置、並びにその製造方法

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103694701B (zh) * 2012-09-27 2017-07-21 新日铁住金化学株式会社 聚酰胺酸组合物、聚酰亚胺组合物、电路基板及其使用方法与层压体以及其制造方法
KR20150045329A (ko) * 2013-10-18 2015-04-28 삼성디스플레이 주식회사 유기 발광 장치
CN109438735B (zh) * 2018-11-08 2021-07-20 株洲时代华鑫新材料技术有限公司 一种高导热聚酰亚胺基复合薄膜及其制备方法
TWI862717B (zh) * 2019-10-28 2024-11-21 日商日產化學股份有限公司 含多元羧酸之耐藥液性保護膜

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000338667A (ja) * 1999-03-24 2000-12-08 Fujitsu Ltd 感光性高誘電体組成物、その組成物からなる感光性高誘電体膜のパターン形成方法、及びその組成物を用いて製造したコンデンサ内蔵型多層回路基板
JP2001163936A (ja) * 1999-12-03 2001-06-19 Nippon Kayaku Co Ltd 樹脂組成物、ソルダーレジスト樹脂組成物及びこれらの硬化物
JP2007293001A (ja) * 2006-04-25 2007-11-08 Mitsui Chemicals Inc 保護膜形成用ドライフィルムおよびそれを用いた加工品

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5921646A (ja) * 1982-06-25 1984-02-03 Nippon Kayaku Co Ltd エチレン性不飽和化合物およびその製造法
US4963645A (en) * 1987-08-25 1990-10-16 Ube Industries, Ltd. Terminal-modified imide oligomer and solution composition of the same
JP3084585B2 (ja) * 1991-12-09 2000-09-04 チッソ株式会社 ポリイミド系感光性カバーコート剤
US5756260A (en) * 1993-02-16 1998-05-26 Sumitomo Bakelite Company Limited Photosensitive polyimide resin composition containing a stabilizer and method for formation of relief pattern using same
JP3526829B2 (ja) * 1999-01-21 2004-05-17 旭化成エレクトロニクス株式会社 ポリアミド酸エステル
SG97168A1 (en) * 1999-12-15 2003-07-18 Ciba Sc Holding Ag Photosensitive resin composition
EP1327642A4 (en) 2000-09-20 2006-07-19 Taiyo Ink Mfg Co Ltd CARBOXYLATED PHOTOSENSITIVE RESIN, THIS CONTAINING, ALKALI DEVELOPABLE, LIGHT-CURABLE / HEAT-CURABLE COMPOSITION, AND THEREOF HARDENED ARTICLE
ATE530951T1 (de) * 2001-07-26 2011-11-15 Basf Se Lichtempfindliche harzzusammensetzung
KR100529577B1 (ko) * 2001-11-22 2005-11-17 미쓰이 가가쿠 가부시키가이샤 감광성 수지조성물, 드라이필름 및 그것을 이용한 가공부품
JP3715963B2 (ja) 2001-11-22 2005-11-16 三井化学株式会社 感光性樹脂組成物、ドライフィルムおよびそれを用いた加工部品
CN100578359C (zh) * 2003-03-06 2010-01-06 日本化药株式会社 感光树脂组合物和其固化物
CN1285970C (zh) * 2003-06-03 2006-11-22 三井化学株式会社 布线保护膜形成用组合物及其用途
US7851124B2 (en) * 2003-06-03 2010-12-14 Mitsui Chemicals, Inc. Composition for forming wiring protective film and uses thereof
WO2005061586A1 (ja) * 2003-12-22 2005-07-07 Nippon Kayaku Kabushiki Kaisha 不飽和基含有ポリアミド酸樹脂及びそれを用いた感光性樹脂組成物並びにその硬化物
JP4627146B2 (ja) * 2004-03-29 2011-02-09 京セラケミカル株式会社 感光性熱硬化型樹脂組成物及びフレキシブルプリント配線板
JP2005300785A (ja) 2004-04-09 2005-10-27 Taiyo Ink Mfg Ltd 光硬化性・熱硬化性樹脂組成物及びその硬化塗膜
JP4461037B2 (ja) * 2005-02-09 2010-05-12 ニチゴー・モートン株式会社 感光性樹脂組成物およびそれを用いてなる感光性樹脂積層体
JP2006251715A (ja) * 2005-03-14 2006-09-21 Kaneka Corp 難燃性を有する感光性樹脂組成物及び感光性ドライフィルムレジスト
KR101128207B1 (ko) * 2007-04-24 2012-03-23 미쓰이 가가쿠 가부시키가이샤 감광성 수지 조성물, 드라이 필름 및 그것을 이용한 가공품
US8362103B2 (en) * 2007-05-11 2013-01-29 Mitsui Chemicals, Inc. Resin composition, dry film, and processed product made using the same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000338667A (ja) * 1999-03-24 2000-12-08 Fujitsu Ltd 感光性高誘電体組成物、その組成物からなる感光性高誘電体膜のパターン形成方法、及びその組成物を用いて製造したコンデンサ内蔵型多層回路基板
JP2001163936A (ja) * 1999-12-03 2001-06-19 Nippon Kayaku Co Ltd 樹脂組成物、ソルダーレジスト樹脂組成物及びこれらの硬化物
JP2007293001A (ja) * 2006-04-25 2007-11-08 Mitsui Chemicals Inc 保護膜形成用ドライフィルムおよびそれを用いた加工品

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009186861A (ja) * 2008-02-08 2009-08-20 Asahi Kasei E-Materials Corp 感光性樹脂組成物
JP2010113245A (ja) * 2008-11-07 2010-05-20 Taiyo Ink Mfg Ltd 難燃性光硬化性樹脂組成物、そのドライフィルム及び硬化物並びにそれらを用いたプリント配線板
JP2013054361A (ja) * 2012-10-01 2013-03-21 Taiyo Holdings Co Ltd 難燃性光硬化性樹脂組成物、そのドライフィルム及び硬化物並びにそれらを用いたプリント配線板
WO2017169763A1 (ja) * 2016-03-30 2017-10-05 東レ株式会社 ネガ型感光性樹脂組成物、硬化膜、硬化膜を具備する表示装置、並びにその製造方法
JPWO2017169763A1 (ja) * 2016-03-30 2019-02-07 東レ株式会社 ネガ型感光性樹脂組成物、硬化膜、硬化膜を具備する表示装置、並びにその製造方法
US11086219B2 (en) 2016-03-30 2021-08-10 Toray Industries, Inc. Negative-type photosensitive resin composition, cured film, display device that includes the cured film, and production method therefor

Also Published As

Publication number Publication date
KR101161929B1 (ko) 2012-07-03
JPWO2008132842A1 (ja) 2010-07-22
US8409784B2 (en) 2013-04-02
CN101675387B (zh) 2012-10-10
TW200907568A (en) 2009-02-16
TWI477894B (zh) 2015-03-21
US20100084172A1 (en) 2010-04-08
KR20100009551A (ko) 2010-01-27
JP5167252B2 (ja) 2013-03-21
CN101675387A (zh) 2010-03-17

Similar Documents

Publication Publication Date Title
WO2008132842A1 (ja) 感光性樹脂組成物、ドライフィルムおよびそれを用いた加工品
MY146807A (en) Antireflective coating compositions
WO2008102259A3 (en) Antireflective coating composition based on a silicon polymer
WO2008108390A1 (ja) 光硬化性組成物およびこれを用いた硬化物
WO2009075233A1 (ja) アルカリ現像性を有する硬化性組成物およびそれを用いた絶縁性薄膜および薄膜トランジスタ
WO2009032898A3 (en) Compact input device
WO2008123564A3 (en) Pesticidal aerosol composition
WO2009147031A3 (en) Oxime ester photoinitiators
JP2014019799A5 (ja)
MY142016A (en) Antireflective compositions for photoresists
TW200745257A (en) Flame-retardant and light-diffusing polycarbonate resin composition and light-diffusing plate made of the same
WO2009145526A3 (en) Protective film composition for wafer dicing
WO2011119272A3 (en) Macro-photoinitiators and curable compositions thereof
WO2011087811A3 (en) Electroactive composition and electronic device made with the composition
WO2008143302A1 (ja) レジスト下層膜形成用組成物
WO2008090827A1 (ja) ポジ型感光性樹脂組成物
JP2007515514A5 (ja)
JP2011232584A5 (ja)
TW200730576A (en) Curable resin composition and anti-reflection film
ATE492613T1 (de) Bodensubstrat mit einer beschichtung aus einer härtbaren zusammensetzung
WO2008153154A1 (ja) 環状化合物、フォトレジスト基材及びフォトレジスト組成物
WO2008117575A1 (ja) 防水シート
WO2008102822A1 (ja) 紫外線吸収剤を含む高分子材料
WO2008103776A3 (en) Thermally cured underlayer for lithographic application
WO2008081852A1 (ja) 組成物及び該組成物を含む発光素子

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 200880013376.9

Country of ref document: CN

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 08738631

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2009511686

Country of ref document: JP

Kind code of ref document: A

ENP Entry into the national phase

Ref document number: 20097022011

Country of ref document: KR

Kind code of ref document: A

WWE Wipo information: entry into national phase

Ref document number: 12596952

Country of ref document: US

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 08738631

Country of ref document: EP

Kind code of ref document: A1